CN106006647A - Trichlorosilane synthesis furnace - Google Patents
Trichlorosilane synthesis furnace Download PDFInfo
- Publication number
- CN106006647A CN106006647A CN201610326284.2A CN201610326284A CN106006647A CN 106006647 A CN106006647 A CN 106006647A CN 201610326284 A CN201610326284 A CN 201610326284A CN 106006647 A CN106006647 A CN 106006647A
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- CN
- China
- Prior art keywords
- spray tubes
- synthetic furnace
- middle casing
- trichlorosilane synthetic
- trichlorosilane
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/08—Compounds containing halogen
- C01B33/107—Halogenated silanes
- C01B33/1071—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof
- C01B33/10742—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof prepared by hydrochlorination of silicon or of a silicon-containing material
- C01B33/10757—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof prepared by hydrochlorination of silicon or of a silicon-containing material with the preferential formation of trichlorosilane
- C01B33/10763—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof prepared by hydrochlorination of silicon or of a silicon-containing material with the preferential formation of trichlorosilane from silicon
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- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Silicon Compounds (AREA)
Abstract
The invention belongs to the field of silicon chemical industry, and relates to a trichlorosilane synthesis furnace. The trichlorosilane synthesis furnace comprises a lower casing and a trapezoidal casing, wherein a gas distribution plate is arranged at the joint of the lower casing and the trapezoidal casing; rotating spray tubes and cylindrical spray tubes are uniformly arranged on the gas distribution plate of the trichlorosilane synthesis furnace and are arranged in a cross manner. According to the trichlorosilane synthesis furnace, two different types of spray tubes are arranged on the gas distribution plate and comprise the rotating spray tubes and the cylindrical spray tubes, the rotating spray tubes and the cylindrical spray tubes are arranged on the gas distribution plate in a cross manner, when hydrogen chloride gas enters a middle casing through the rotating spray tubes and the cylindrical spray tubes and is subjected to a reaction with silica powder, the hydrogen chloride gas sprayed from the rotating spray tubes and the hydrogen chloride gas sprayed from the cylindrical spray tubes interact with each other, so that the silica powder and the hydrogen chloride gas are sufficiently reacted, and further, the silica powder can be effectively prevented from falling on the gas distribution plate by means of spray holes in the rotating spray tubes and oblique spray holes in the cylindrical spray tubes.
Description
Technical field
The invention belongs to silicon chemical field, relate to a kind of trichlorosilane synthetic furnace.
Background technology
Trichlorosilane is the important source material producing polysilicon, along with polysilicon is in modern science and technology, national defence, industry
Deng the extensive application in field, the production of trichlorosilane have also been obtained fast development, improves product quality, reduction
Production cost, guarantee safety in production become the target that each manufacturer competitively chases.Utilize silica flour and chlorination
The process of hydrogen synthesizing trichlorosilane is: silica flour enters body of heater, hydrogen chloride from synthesis from synthetic furnace top-feed mouth
Stove low head enters body of heater, and the two reacts under preference temperature in stove, generates trichlorosilane and side-product
Silicon chloride..Existing trichlorosilane synthetic furnace typically uses unilateral feed way, i.e. hydrogen chloride and silica flour all
Being to enter body of heater from the side of synthetic furnace, this charging process easily causes hydrogen chloride gas and silica flour in synthesis
Skewness in stove, forms bias current, and then causes the bigger temperature difference, office occur between zones of different in synthetic furnace
When portion's temperature is too high, the by-product silicon tetrachloride of generation is more, but also likely damages furnace wall;And temperature
Time too low, easily generate side-product dichlorosilane, and react insufficient, unreacted hydrogen chloride gas know from experience into
Enter follow-up workshop section, affect the rate of capacity utilization.Therefore, for guaranteeing that the synthetic reaction of trichlorosilane is stably carried out,
It is necessary trichlorosilane synthetic furnace is improved.
Summary of the invention
The present invention is directed to above-mentioned problem, devise a kind of trichlorosilane synthetic furnace.
In order to achieve the above object, the technical solution used in the present invention is,
The present invention devises a kind of trichlorosilane synthetic furnace, including middle casing, the inside of described middle casing
Being provided with heat exchanger tube, the top of described middle casing is provided with upper shell, and bottom is provided with trapezoidal housing, institute
The bottom stating trapezoidal housing is provided with lower house, and described lower house is provided with gas with the junction of trapezoidal housing
Distribution grid, described gas distribution grid is evenly arranged with swivelling-nozzle and cylinder jet pipe, described swivelling-nozzle with
Cylinder jet pipe is arranged in a crossed manner, described gas distribution grid is provided with for accommodating swivelling-nozzle and cylinder jet pipe
Receiving hole.
As preferably, the lateral surface of described swivelling-nozzle is provided with spray orifice.
As preferably, described cylinder jet pipe sidewall is provided with the folder of oblique spray orifice, described oblique spray orifice and horizontal plane
Angle is α.
As preferably, described α is 45 °~60 °.
As preferably, the sidewall of described lower house is provided with air inlet pipe.
As preferably, the sidewall of described middle casing is provided with silica flour inlet pipe, described silica flour inlet pipe is arranged
There is silica flour ejector.
As preferably, it is bolted to connection between described trapezoidal housing and lower house.
As preferably, it is bolted to connection between described middle casing and upper shell.
As preferably, it is bolted to connection between described middle casing and trapezoidal housing.
Compared with prior art, advantages of the present invention and good effect are,
The present invention is provided with two kinds of different jet pipes on gas gas distribution grid, and these two kinds of jet pipes are for rotating
Jet pipe and cylinder jet pipe, its swivelling-nozzle and cylinder jet pipe are arranged in a crossed manner on gas distribution grid, work as hydrogen chloride
Gas is entered into by swivelling-nozzle and cylinder jet pipe when reacting with silica flour in middle casing, its swivelling-nozzle with
Cylinder jet pipe ejection hydrogen chloride gas interact, make silica flour and hydrogen chloride gas fully react, again due to
On swivelling-nozzle, the setting of oblique spray orifice on spray orifice and cylinder jet pipe, can effectively avoid silica flour to fall at gas
On distribution grid.
Accompanying drawing explanation
In order to be illustrated more clearly that the technical scheme of the embodiment of the present invention, required in embodiment being described below
Accompanying drawing to be used is briefly described, it should be apparent that, the accompanying drawing in describing below is the one of the present invention
A little embodiments, for those of ordinary skill in the art, on the premise of not paying creative work,
Other accompanying drawing can also be obtained according to these accompanying drawings.
Fig. 1 is the perspective view of trichlorosilane synthetic furnace;
Fig. 2 is the perspective view of trichlorosilane synthetic furnace (lower house separates with trapezoidal housing);
Fig. 3 is the perspective view of gas distribution grid;
Fig. 4 is the front view of cylinder jet pipe;
Fig. 5 is the longitudinal sectional view of Fig. 4;
Fig. 6 is the perspective view of swivelling-nozzle;
In the most each figure, 1, trapezoidal housing;11, lower house;111, air inlet pipe;12, gas distribution grid;
121, swivelling-nozzle;1211, spray orifice;122, cylinder jet pipe;1221, oblique spray orifice;1222, gas leads to
Road;2, middle casing;201, silica flour inlet pipe;202, silica flour ejector;3, upper shell.
Detailed description of the invention
In order to be more clearly understood that the above-mentioned purpose of the present invention, feature and advantage, below in conjunction with the accompanying drawings and
The present invention will be further described for embodiment.It should be noted that in the case of not conflicting, the application's
Feature in embodiment and embodiment can be mutually combined.
Elaborate a lot of detail in the following description so that fully understanding the present invention, but, this
Bright can be different from other modes described here implement to use, therefore, the present invention is not limited to following
The restriction of the specific embodiment of prospectus.
Embodiment 1, as shown in Figure 1, Figure 2, Figure 3 shows, the present invention devises a kind of trichlorosilane synthetic furnace,
Including middle casing 2, its middle casing 2 mainly hydrogen chloride gas and silica flour fully react after products therefrom
The closing chamber of trichlorosilane, is provided with heat exchanger tube in the inside of middle casing 2, arranges the main work of heat exchanger tube
Heat is provided to the reaction of hydrogen chloride gas and silica flour, in centre with being the heat utilizing its trichlorosilane itself
The top of housing 2 is provided with upper shell 3, and bottom is provided with trapezoidal housing 1, the Main Function of its upper shell 3
Being to flow out trichlorosilicane gas, the effect of trapezoidal housing 1 is to provide reaction compartment to hydrogen chloride gas and silica flour;
Being provided with lower house 11 in the bottom of trapezoidal housing 1, the effect of its lower house 11 is to take up hydrogen chloride gas,
It is provided with gas distribution grid 12 in the junction of lower house 11 and trapezoidal housing 1, its gas distribution grid 12
Effect is to cut off hydrogen chloride gas and silica flour direct reaction, has been uniformly arranged rotation spray on gas distribution grid 12
Pipe 121 and cylinder jet pipe 122, its swivelling-nozzle 121 and cylinder jet pipe 122 are arranged in a crossed manner, arrange rotation
The mainly effect of jet pipe 121 and cylinder jet pipe 122 is to change original hydrogen chloride gas to enter into trapezoidal housing
The flow direction of 1, is arranging position plus swivelling-nozzle 121 and cylinder jet pipe 122, i.e. hydrogen chloride gas
When body is by swivelling-nozzle 121 and cylinder jet pipe 122, in trapezoidal housing 1, form rotation ring wind, this rotation ring
Wind can drive the interior silica flour of trapezoidal housing 1 reminding housing inside turn, i.e. achieves the mesh of fully reaction
, in order to preferably install swivelling-nozzle 121 and cylinder jet pipe 122 on gas distribution grid 12, at gas
The receiving hole being matched therewith it is provided with on distribution grid 12.
Inventor is more preferable for the whole structure making the present invention, also done following design (as Fig. 4, Fig. 5,
Shown in Fig. 6):
Being provided with spray orifice 1211 on the lateral surface of swivelling-nozzle 121, its spray orifice 1211 is along rotation spray
The lateral surface of pipe 121 is arranged, and defines the trend of a rotation ring;
Oblique spray orifice 1221 it is provided with, its oblique spray orifice 1221 and folder of horizontal plane on the sidewall of cylinder jet pipe 122
Angle be α, α be 45 °~60 °, cylinder jet pipe 122 is additionally provided with gas passage 1222 (such as Fig. 5
Shown in), use the silica flour that mainly prevents being obliquely installed to drop into lower house 11 angle of oblique spray orifice 1221
In, it is also possible to being blown afloat by the silica flour fallen on gas distribution grid 12, the scope of this angle is also inventor
Drawn through substantial amounts of test;
Being provided with air inlet pipe 111 on the sidewall of lower house 11, air inlet pipe 111 is mainly used for carrying chlorination
Hydrogen;
It is provided with silica flour inlet pipe 201 on the sidewall of middle casing 2, silica flour inlet pipe 201 is provided with silica flour spray
Emitter 202, the Main Function of silica flour ejector 202 is silica flour atomization to be processed;
It is bolted to connection between trapezoidal housing 1 and lower house 11;Middle casing 2 and upper shell 3
Between be bolted to connection;It is bolted to connection between middle casing 2 and trapezoidal housing 1.
The above, be only presently preferred embodiments of the present invention, and the present invention not makees other form
Limiting, any those skilled in the art are changed possibly also with the technology contents of the disclosure above or are changed
Type is that the Equivalent embodiments of equivalent variations is applied to other field, but every without departing from technical solution of the present invention
Content, any simple modification above example made according to the technical spirit of the present invention, equivalent variations with
Remodeling, still falls within the protection domain of technical solution of the present invention.
Claims (9)
1. a trichlorosilane synthetic furnace, including middle casing, described middle casing be internally provided with heat exchange
Pipe, the top of described middle casing is provided with upper shell, and bottom is provided with trapezoidal housing, described trapezoidal housing
Bottom be provided with lower house, it is characterised in that the junction of described lower house and trapezoidal housing is provided with gas
Body distribution grid, described gas distribution grid is evenly arranged with swivelling-nozzle and cylinder jet pipe, described swivelling-nozzle
Arranged in a crossed manner with cylinder jet pipe, described gas distribution grid is provided with for accommodating swivelling-nozzle and cylinder jet pipe
Receiving hole.
Trichlorosilane synthetic furnace the most according to claim 1, it is characterised in that described swivelling-nozzle
Spray orifice it is provided with on lateral surface.
Trichlorosilane synthetic furnace the most according to claim 2, it is characterised in that described cylinder jet pipe side
Being provided with oblique spray orifice on wall, described oblique spray orifice is α with the angle of horizontal plane.
Trichlorosilane synthetic furnace the most according to claim 3, it is characterised in that described α is 45 °
~60 °.
Trichlorosilane synthetic furnace the most according to claim 4, it is characterised in that the side of described lower house
Air inlet pipe it is provided with on wall.
Trichlorosilane synthetic furnace the most according to claim 5, it is characterised in that described middle casing
It is provided with silica flour inlet pipe on sidewall, described silica flour inlet pipe is provided with silica flour ejector.
Trichlorosilane synthetic furnace the most according to claim 6, it is characterised in that described trapezoidal housing with
It is bolted to connection between lower house.
Trichlorosilane synthetic furnace the most according to claim 7, it is characterised in that described middle casing with
It is bolted to connection between upper shell.
Trichlorosilane synthetic furnace the most according to claim 8, it is characterised in that described middle casing with
It is bolted to connection between trapezoidal housing.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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CN201610326284.2A CN106006647B (en) | 2016-05-17 | 2016-05-17 | Trichlorosilane synthetic furnace |
Applications Claiming Priority (1)
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CN201610326284.2A CN106006647B (en) | 2016-05-17 | 2016-05-17 | Trichlorosilane synthetic furnace |
Publications (2)
Publication Number | Publication Date |
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CN106006647A true CN106006647A (en) | 2016-10-12 |
CN106006647B CN106006647B (en) | 2018-03-13 |
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CN201610326284.2A Expired - Fee Related CN106006647B (en) | 2016-05-17 | 2016-05-17 | Trichlorosilane synthetic furnace |
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN116621182A (en) * | 2023-05-26 | 2023-08-22 | 南京工业大学 | Novel trichlorosilane synthetic furnace |
Citations (8)
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JPS5881437A (en) * | 1981-11-11 | 1983-05-16 | Hitachi Ltd | Vapor phase growth apparatus |
JP2004172386A (en) * | 2002-11-20 | 2004-06-17 | Furukawa Co Ltd | Gas blowoff portion of vapor growing equipment |
CN101798087A (en) * | 2010-01-22 | 2010-08-11 | 江苏福斯特石化装备有限公司 | Gas-supplying structure of trichlorosilane synthetic furnace |
CN201981014U (en) * | 2011-03-25 | 2011-09-21 | 成都化工股份有限公司 | Trichlorosilane synthetic tower |
CN202988749U (en) * | 2013-01-09 | 2013-06-12 | 重庆水泵厂有限责任公司 | Trichlorosilane synthesis furnace |
CN203922739U (en) * | 2014-06-18 | 2014-11-05 | 四川永祥多晶硅有限公司 | A kind of trichlorosilane synthetic furnace |
CN204643856U (en) * | 2015-05-18 | 2015-09-16 | 中国化学赛鼎宁波工程有限公司 | A kind of equipment of preparing silane with trichlorosilane |
CN204714532U (en) * | 2015-06-12 | 2015-10-21 | 唐山三孚硅业股份有限公司 | A kind of trichlorosilane synthetic furnace |
-
2016
- 2016-05-17 CN CN201610326284.2A patent/CN106006647B/en not_active Expired - Fee Related
Patent Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5881437A (en) * | 1981-11-11 | 1983-05-16 | Hitachi Ltd | Vapor phase growth apparatus |
JP2004172386A (en) * | 2002-11-20 | 2004-06-17 | Furukawa Co Ltd | Gas blowoff portion of vapor growing equipment |
CN101798087A (en) * | 2010-01-22 | 2010-08-11 | 江苏福斯特石化装备有限公司 | Gas-supplying structure of trichlorosilane synthetic furnace |
CN201981014U (en) * | 2011-03-25 | 2011-09-21 | 成都化工股份有限公司 | Trichlorosilane synthetic tower |
CN202988749U (en) * | 2013-01-09 | 2013-06-12 | 重庆水泵厂有限责任公司 | Trichlorosilane synthesis furnace |
CN203922739U (en) * | 2014-06-18 | 2014-11-05 | 四川永祥多晶硅有限公司 | A kind of trichlorosilane synthetic furnace |
CN204643856U (en) * | 2015-05-18 | 2015-09-16 | 中国化学赛鼎宁波工程有限公司 | A kind of equipment of preparing silane with trichlorosilane |
CN204714532U (en) * | 2015-06-12 | 2015-10-21 | 唐山三孚硅业股份有限公司 | A kind of trichlorosilane synthetic furnace |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN116621182A (en) * | 2023-05-26 | 2023-08-22 | 南京工业大学 | Novel trichlorosilane synthetic furnace |
CN116621182B (en) * | 2023-05-26 | 2024-06-21 | 南京工业大学 | Novel trichlorosilane synthetic furnace |
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CN106006647B (en) | 2018-03-13 |
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Granted publication date: 20180313 Termination date: 20200517 |