CN105988621A - Touch screen and manufacturing method thereof - Google Patents
Touch screen and manufacturing method thereof Download PDFInfo
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- CN105988621A CN105988621A CN201510082968.8A CN201510082968A CN105988621A CN 105988621 A CN105988621 A CN 105988621A CN 201510082968 A CN201510082968 A CN 201510082968A CN 105988621 A CN105988621 A CN 105988621A
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Abstract
The invention provides a novel touch screen. The novel touch screen comprises a substrate, wherein the substrate comprises a display region and a border region; conducting layers are attached to a front side and a back side of the display region of the substrate; metal electrode leads are attached to a front side and a back side of the border region of the substrate; and one end of each of the metal electrode leads is electrically connected with the conducting layer on the same side of the substrate. Through adoption of the novel touch screen, the widths of light-sensitive silver paste electrode leads and distances between adjacent electrode leads are reduced, and the area of the border region is reduced greatly, so that the area of the display region of the touch screen is increased, and the effective utilization rate of the touch screen is increased.
Description
Technical field
The present invention relates to touch screen technology field, particularly to the touch screen film and preparation method thereof of a kind of two-sided conductive layer.
Background technology
Along with the development of touch screen technology, touch screen is applied to mobile phone, panel computer, television set, multimedia etc. more and more widely.
Common touch screen is typically by substrate, it is attached to the ITO(Indium Tin Oxide of substrate side, tin-doped indium oxide), and nano-silver thread, the conductive layers such as Graphene, and the contact conductor electrically connected with ITO conductive layer, substrate includes being positioned at the viewing area at middle part and around the rim area of viewing area, described contact conductor typically uses copper wire winding to form, copper cash thickness is generally 0.5 micron, by the method for steaming degree sputtering, copper film covered whole substrate, then the copper film in substrate viewing area is etched away, retain the copper film of rim area, owing to the steaming degree sputtering technology of copper film is sufficiently expensive, the production cost making touch screen is high.
The ITO conductive layer of above-mentioned touch screen is monolayer, its anti-noise ability is not enough, then the touch screen (DITO touch screen) with double-deck ITO conductive layer is created, make this touch screen to need through overbaking, acid-proof ink printing for the first time, etching and stripping for the first time, acid-proof ink printing for the second time, the steps such as second time etching and stripping, the positive and negative of substrate needs to be etched respectively, and when etching one side, need another side is carried out protection process, in order to avoid causing the interference to another side ITO conductive layer pattern or infringement, its processing technique is sufficiently complex, not only affect production efficiency, also affect the stability of product quality.
Further development along with touch screen technology, the gold-tinted processing procedure depending on lithographic techniques is applied in the preparation of touch screen, lithographic techniques is first to be transferred on sensitive material by the main pattern on light shield, utilize light to pass through light shield to be radiated on sensitive material, being dissolved by the part of illumination by sensitive material with solvent or retain, the photoresistance pattern being thusly-formed can be identical with light shield or in complementation.This technique enormously simplify preparation technology relative to normal etching scheme, improves the precision of etching, but owing to this technique needs to be exposed sensitive material, therefore, this use technique is difficult to prepare the touch screen with double-deck ITO conductive layer.
Summary of the invention
The technical problem to be solved is to provide a kind of novel touch screen with bilayer conductive layer and preparation method thereof.
In order to solve above-mentioned technical problem, the present invention adopts the following technical scheme that
A kind of touch screen, including substrate, described substrate includes that viewing area and rim area, described substrate viewing area positive and negative are all pasted with conductive layer, described substrate rim area positive and negative is all pasted with metal electrode lead-in wire, and one end of described metal electrode lead-in wire electrically connects with the conductive layer of described substrate the same side.
Described metal electrode lead-in wire starches contact conductor for photosensitive silver.
Described substrate is PET or PDMS or cyclic olefin polymer substrate.
Described conductive layer is the transparency conducting layers such as ITO, Graphene, CNT, nano-silver thread.
Described ITO conductive layer is made up of multiple ITO bus, and each ITO bus all electrically connects described photosensitive silver slurry contact conductor, mutually insulated between each ITO bus and between each photosensitive silver slurry contact conductor.
The width of described photosensitive silver slurry contact conductor is 20 to 40 microns, and the spacing between described adjacent two photosensitive silvers slurry contact conductor is 20 to 40 microns.
Present invention also offers the preparation method of a kind of touch screen, comprise the steps:
1) providing substrate, and all attach conductive layer at the positive and negative of substrate, this substrate includes viewing area and rim area；
2) on the conductive layer of substrate positive and negative, photoresistance dry film it is covered each by；
3) respectively the photoresistance dry film of substrate positive and negative is selectively exposed, form exposed portion and non-exposed part, described exposed portion or non-exposed part and form the conductive layer pattern of substrate viewing area；
4) remove the photoresistance dry film beyond conductive layer pattern by development treatment, retain the photoresistance dry film part corresponding with conductive layer pattern；
5) by etching removal step 4) the photoresistance dry film that retains with the conductive material of the conductive layer of outer portion and decorporate retained photoresistance dry film to form viewing area and rim area on substrate, described conductive layer pattern is in viewing area；
6) respectively in substrate rim area positive back face printing photosensitive silver slurry；
7) to the selectively exposure of photosensitive silver slurry to obtain the silver slurry pattern having given shape, and obtaining photosensitive silver slurry contact conductor by development treatment, one end of described photosensitive silver slurry contact conductor electrically connects with bus described in step 5).
Described step 6) and step 7) are carried out under the conditions of gold-tinted.
Described photoresistance dry film is negative photoresistance dry film, step 2) under conditions of 80 to 110 DEG C, the covering of photoresistance dry film is completed by hot pressing.
Substrate positive and negative need to be sprayed weak caustic solution during step 4) development treatment simultaneously, first substrate positive and negative be sprayed strong acid solution during step 5) etching simultaneously, then spray strong base solution.
Described strong acid is chloroazotic acid, nitric acid or oxalic acid, described highly basic be sodium hydroxide, potassium hydroxide solution or concentration be the ethylenediamine of 1% to 6%.
Also including that pre-bake step, described prebake conditions are: prebake conditions 3 to 15 minutes at a temperature of 70 to 100 DEG C before the slurry exposure of described photosensitive silver, described exposure energy is 100mJ to 400mJ.
For DITO touch screen; when the sensitive material how making substrate upper and lower exposes, non-interference is always a great problem of this area; traditional laser engraving technique can punch the pattern of substrate levels easily; and traditional gold-tinted etching also can be the graphic-print of levels to different aspects; or need to be respectively completed the etching of the every one side of substrate, when one side is etched, need another side is taked salvo; add operation undoubtedly, reduce production efficiency.The present invention uses photoresistance dry film and photosensitive silver two-sided to be exposed substrate simultaneously, etch, and operation is simple, substantially increases the production efficiency of touch screen.
Additionally, the present invention reduces the pattern dimension of ITO further by the technique that gold-tinted etches, enhance light transmission, reduce etching stricture of vagina, and it is remarkably improved the sensitivity of touch screen, owing to the present invention reduces the spacing between photosensitive silver slurry contact conductor width and adjacent electrode lead-in wire, can significantly reduce rim area area with raising touch screen viewing area area, the effective rate of utilization of raising touch screen.
Accompanying drawing explanation
Fig. 1 is the sectional view of inventive touch screen；
Fig. 2 is bus and lower photosensitive silver slurry contact conductor schematic diagram under inventive touch screen；
Fig. 3 is bus and upper photosensitive silver slurry contact conductor schematic diagram on inventive touch screen；
Fig. 4 is the upper and lower bus of inventive touch screen and photosensitive silver slurry contact conductor composition principle figure；
Fig. 5 is the substrate attaching conductive layer；
Fig. 6 is the substrate covering photoresistance dry film；
Fig. 7 is the touch screen structure schematic diagram after etch process；
Fig. 8 is the touch screen structure schematic diagram after photoresistance dry film of decorporating；
Fig. 9 is the touch screen structure schematic diagram after printing photosensitive silver slurry.
Detailed description of the invention
The present invention will be further described below in conjunction with the accompanying drawings.
As shown in Figures 1 to 4, touch screen of the present invention includes substrate 1, described substrate 1 includes being positioned at the viewing area in the middle part of substrate 1 and the rim area around viewing area periphery, the positive and negative of substrate viewing area is pasted with multiple upper bus 21 and lower bus 22 respectively, specifically, conductive layer described in the present embodiment is ITO conductive layer, i.e. indium tin oxide conductive layer, it it is a kind of light transmission conductive layer, the quantity of bus and the spacing of adjacent conductive bar can be determined according to the size of touch screen and the required precision reached, for a person skilled in the art, how to determine that the quantity of bus and the spacing of adjacent conductive bar are clearly.Conductive layer used by the present invention is in addition to using ITO conductive layer, it is also possible to use Graphene, the transparency conducting layer such as CNT or nano-silver thread
Substrate 1 described in the present embodiment is preferably PET(polyethylene terephthalate) substrate or be PDMS substrate, PDMS, i.e. Polydimethylsiloxane, polydimethylsiloxane, or be cyclic olefin polymer substrate, i.e. COP substrate (COP, i.e. Cyclic
Olefin Polymer).
As shown in Figure 4, bus described in the present embodiment is thread, banding or the strip of parallel distribution, mutual insulating between adjacent conductive bar, and the upper bus 21 of substrate 1 sets layout with lower bus 22 for intersecting.
Rim area positive and negative distribution at substrate 1 is provided with photosensitive silver slurry contact conductor 31 and lower photosensitive silver slurry contact conductor 32, the quantity of upper photosensitive silver slurry contact conductor 31 and upper bus quantity one_to_one corresponding, each upper bus 21 electrically connects a upper photosensitive silver slurry contact conductor 31, in like manner, each lower bus 22 electrically connects a lower photosensitive silver slurry contact conductor 32, mutually insulated between neighboring photosensitive ag paste electrode lead-in wire.
For reducing substrate 1 rim area area, between described in the present embodiment, the width of photosensitive silver slurry contact conductor is 20 to 70 microns, preferably 30 to 40 microns, thickness is 5 microns, spacing between described adjacent two photosensitive silvers slurry contact conductor positions 20 to 70 microns, preferably 30 microns to 40 microns.
Used by the present embodiment, photosensitive silver slurry is made up of Argent grain and resin, wherein the mass percent of Argent grain is 80～97%, it is preferably 85～90%, surplus is resin, the particle diameter of described Argent grain is 0.5～2 micron, described resin is preferably acrylic resin (acrylic), epoxy resin (epoxy) etc..
As shown in Figures 5 to 9, above-mentioned touch screen is prepared by the following method:
Step 1), as shown in Figure 5, substrate 1 is provided, it is cut to that there is a certain size and the sheet material of shape as required, then conductive layer and lower conductiving layer on the positive and negative of substrate 1 attaches respectively, this substrate includes viewing area and rim area, it is also possible to directly use the ITO conducting film attached on market.
Step 2), as shown in Figure 6, the upper conductive layer and lower conductiving layer of substrate 1 positive and negative are covered each by photoresistance dry film 41 and lower photoresistance dry film 42, the photoresistance dry film that the present embodiment is used is for bearing photoresistance dry film (by Du Pont, the companies such as Hitachi produce), concrete film covering method can be completed by hot pressing under conditions of 80 to 110 DEG C, preferably 80 to 90 DEG C.
Step 3), as shown in Figure 7, respectively the upper photoresistance dry film 41 on substrate 1 and lower photoresistance dry film 42 are selectively exposed to form different exposed portions and non-exposed part at positive and negative at the same time or separately by film (i.e. silver salt photographic film), described exposed portion is predisposed to make it possible to corresponding with above-mentioned bus shape and layout, in order to the photoresistance dry film stayed after development treatment is the photoresistance dry film of patterning.
Step 4), use the weak base such as sodium carbonate and deionized water spray after exposure, clean, remove the photoresistance dry film of unexposed portion, retain the photoresistance dry film of exposed portion, this is because, for negative photoresistance dry film, it shines the part of light and is varied without being dissolved in photoresistance developer solution because of chemical constitution, and the part not shining light can be dissolved in photoresistance developer solution.The photoresistance dry film of unexposed portion exposes the partial electroconductive layer on substrate 1 after being washed away.
Step 5), substrate 1 positive and negative is sprayed strong acid solution simultaneously, such as, chloroazotic acid, nitric acid or oxalic acid etc., etch away the conductive layer conductive material under former unexposed portion photoresistance dry film covers, then strong base solution is sprayed to substrate 1 positive and negative, such as mass concentration is preferably the sodium hydroxide of 1% to 15%, potassium hydroxide solution or organic alkali solution, or the ethylenediamines that mass concentration is 1% to 6% etc. are to decorporate the photoresistance dry film retained, expose the conductive layer that this photoresistance dry film is covered, now, conductive layer has been etched into the situation shown in Fig. 1, the most described substrate 1 is divided into viewing area and rim area, multiple bus patterns in parallel distribution are formed in described viewing area, as shown in Figure 8.
Step 6), as it is shown in figure 9, the light source applying the light source of specific wavelength, such as wavelength to be 193nm to 405nm wave band under the conditions of gold-tinted, preferably 193nm,
The mixing light source that the light source of 360nm, 395nm or 405nm wavelength or the mixing of above different wave length produce, positive back face printing photosensitive silver slurry in substrate 1 rim area respectively, printing process can use conventional steel wires screen printing, prebake conditions 3 to 15 minutes at a temperature of 70 to 100 DEG C after printing, preferably prebake conditions 10 minutes at a temperature of 90 DEG C.The exposure of silver slurry, development, solidification can repeat same process after completing one side again on second.Effective layout and technique can also be utilized to carry out single exposure, solidification of simultaneously developing.
Step 7), under the conditions of gold-tinted, utilizes the silver slurry film (i.e. silver salt photographic film) to the selectively exposure of photosensitive silver slurry to need higher energy, typically between 100mJ to 400mJ when obtaining having the silver slurry pattern exposure of given shape.After exposure, obtaining fine photosensitive silver slurry contact conductor pattern with weak caustic solution sprays such as sodium carbonate, one end of described photosensitive silver slurry contact conductor electrically connects with bus described in step 5).Photosensitive silver slurry development after also include that curing schedule, described condition of cure are: at 130 to 160 DEG C toast 15 to 100 minutes, solidification and step 6) in prebake conditions can carry out in the infra-red furnace of baking box or conveyor type.
Above example uses negative photoresistance dry film, in like manner, the present invention can also use forward photoresistance dry film, when using forward photoresistance dry film, its part shining light can be dissolved in photoresistance developer solution, and the part not shining light will not be dissolved in photoresistance developer solution, i.e. the photoresistance dry film of exposed portion can be washed away, and the photoresistance dry film of unexposed portion remains.
Obviously, the above embodiment of the present invention is only for clearly demonstrating example of the present invention, and is not the restriction to embodiments of the present invention.For those of ordinary skill in the field, can also make other changes in different forms on the basis of the above description, such as, photosensitive silver be starched contact conductor and changes copper electrode lead-in wire etc. into.Here without also cannot all of embodiment be given exhaustive.All any amendment, equivalent and improvement etc. made within the spirit and principles in the present invention, within should be included in the protection domain of the claims in the present invention.
Claims (11)
1. a touch screen, including substrate, described substrate includes viewing area and rim area, it is characterized in that, described substrate viewing area positive and negative is all pasted with light transmission conductive layer, described substrate rim area positive and negative is all pasted with metal electrode lead-in wire, and one end of described metal electrode lead-in wire electrically connects with the conductive layer of described substrate the same side.
Touch screen the most according to claim 1, it is characterised in that described metal electrode lead-in wire starches contact conductor for photosensitive silver.
3. according to the touch screen described in claim 1, it is characterised in that described substrate is PET or PDMS or cyclic olefin polymer substrate.
Touch screen the most according to claim 3, it is characterised in that described conductive layer is ITO conductive layer, graphene conductive layer or nano-silver thread conductive layer.
Touch screen the most according to claim 4, it is characterized in that, described ITO conductive layer is made up of multiple ITO bus, and each ITO bus all electrically connects described photosensitive silver slurry contact conductor, mutually insulated between each ITO bus and between each photosensitive silver slurry contact conductor.
Touch screen the most according to claim 1, it is characterised in that the width of described photosensitive silver slurry contact conductor is 20 to 70 microns, the spacing between described adjacent two photosensitive silvers slurry contact conductor is 20 to 70 microns.
7. the preparation method of a touch screen, it is characterised in that comprise the steps:
1) providing substrate, and all attach conductive layer at the positive and negative of substrate, this substrate includes viewing area and rim area；
2) on the conductive layer of substrate positive and negative, photoresistance dry film it is covered each by；
3) the photoresistance dry film of substrate positive and negative is selectively exposed, form exposed portion and non-exposed part, described exposed portion or non-exposed part and form the conductive layer pattern of substrate viewing area；
4) remove the photoresistance dry film beyond conductive layer pattern by development treatment, retain the photoresistance dry film part corresponding with conductive layer pattern；
5) by etching removal step 4) the photoresistance dry film that retains with the conductive material of the conductive layer of outer portion and decorporate retained photoresistance dry film to form viewing area and rim area on substrate, described conductive layer pattern is in viewing area；
6) respectively in substrate rim area positive back face printing photosensitive silver slurry；
7) to the selectively exposure of photosensitive silver slurry to obtain the silver slurry pattern having given shape, and obtaining photosensitive silver slurry contact conductor by development treatment, one end of described photosensitive silver slurry contact conductor electrically connects with bus described in step 5)；
Described step 2) carry out under the conditions of gold-tinted to step 7).
The preparation method of touch screen the most according to claim 7, it is characterised in that described photoresistance dry film is negative photoresistance dry film, step 2) under conditions of 80 to 110 DEG C, the covering of photoresistance dry film is completed by hot pressing.
The preparation method of touch screen the most according to claim 7, it is characterised in that substrate positive and negative need to be sprayed weak caustic solution during step 4) development treatment simultaneously, first substrate positive and negative be sprayed strong acid solution during step 5) etching simultaneously, then spray strong base solution.
The preparation method of touch screen the most according to claim 9, it is characterised in that described strong acid is chloroazotic acid, nitric acid or oxalic acid, described highly basic be sodium hydroxide, potassium hydroxide solution or mass concentration be the ethylenediamine of 1% to 6%.
The preparation method of 11. touch screens according to claim 7, it is characterized in that, also including that pre-bake step, described prebake conditions are: prebake conditions 3 to 15 minutes at a temperature of 70 to 100 DEG C before the slurry exposure of described photosensitive silver, described exposure energy is 100mJ to 400mJ.
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| CN201410735746 | 2014-12-08 | ||
| CN2014107357467 | 2014-12-08 |
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| CN105988621A true CN105988621A (en) | 2016-10-05 |
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107219952A (en) * | 2017-05-26 | 2017-09-29 | 维沃移动通信有限公司 | A kind of touch-screen and mobile terminal |
| CN108919991A (en) * | 2018-06-05 | 2018-11-30 | 汉思高电子科技（义乌）有限公司 | A kind of preparation method of touch screen function piece or touch screen |
| CN109735825A (en) * | 2019-01-16 | 2019-05-10 | 无锡第六元素电子薄膜科技有限公司 | A method of metal substrate surface impurity graphene is removed using surfactant-free solution |
| CN110955359A (en) * | 2018-09-26 | 2020-04-03 | 南昌欧菲触控科技有限公司 | Touch screen, double-window process of touch screen and touch display device |
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| CN102880370A (en) * | 2012-10-26 | 2013-01-16 | 信利光电(汕尾)有限公司 | Touch inductor for capacitive touch screen with film structure and manufacturing method thereof |
| CN103309510A (en) * | 2013-06-08 | 2013-09-18 | 南昌欧菲光科技有限公司 | Touch screen electrode manufacturing method |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN101561729A (en) * | 2008-04-15 | 2009-10-21 | 宸鸿光电科技股份有限公司 | Method for producing transparent substrate double-sided conductive film of touch control circuit |
| CN102880370A (en) * | 2012-10-26 | 2013-01-16 | 信利光电(汕尾)有限公司 | Touch inductor for capacitive touch screen with film structure and manufacturing method thereof |
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107219952A (en) * | 2017-05-26 | 2017-09-29 | 维沃移动通信有限公司 | A kind of touch-screen and mobile terminal |
| CN108919991A (en) * | 2018-06-05 | 2018-11-30 | 汉思高电子科技（义乌）有限公司 | A kind of preparation method of touch screen function piece or touch screen |
| CN110955359A (en) * | 2018-09-26 | 2020-04-03 | 南昌欧菲触控科技有限公司 | Touch screen, double-window process of touch screen and touch display device |
| CN109735825A (en) * | 2019-01-16 | 2019-05-10 | 无锡第六元素电子薄膜科技有限公司 | A method of metal substrate surface impurity graphene is removed using surfactant-free solution |
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Address after: 6, No. 15, 241000 floating Hill Road, three mountain area, Anhui, Wuhu Applicant after: Wuhu Lunfeng Electronic Technology Co., Ltd. Address before: 523719 Guangdong city in Dongguan Province, Tangxia Town, Shigu south of the Five Ridges Road No. 106 billion square WITHUB Technology Park B3 third floor Applicant before: Dongguan Lunfeng Electronic Technology Co. Ltd. |
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