CN105976894A - Middle temperature sintering thick-film resistance paste based on high-temperature-resistant flexible substrate and preparation method thereof - Google Patents
Middle temperature sintering thick-film resistance paste based on high-temperature-resistant flexible substrate and preparation method thereof Download PDFInfo
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- H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
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- H—ELECTRICITY
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- H01C7/00—Non-adjustable resistors formed as one or more layers or coatings; Non-adjustable resistors made from powdered conducting material or powdered semi-conducting material with or without insulating material
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Abstract
The invention discloses middle temperature sintering thick-film resistance paste based on a high-temperature-resistant flexible substrate and a preparation method thereof. The thick-film resistance paste comprises an inorganic bonding phase, a composite function phase, a TCR regulator and an organic carrier. The inorganic bonding phase is formed by SiO2, Bi2O3, B2O3, P2O5, Al2O3, Li2O and CaF2; the composite function phase is formed by micron flake silver powders, micron spherical silver powders and nanometer silver powders; and the organic carrier is formed by organic solvents, macromolecule thickeners, high-temperature-resistant organic resin, surfactants, plasticizers, dispersants, antifoaming agents and thixotropic agents. The preparation method comprises the steps of preparation of the inorganic bonding phase, preparation of the composite function phase, preparation of the organic carrier and preparation of the resistance paste. The thick-film resistance paste is low in sintering temperature, short in sintering time, large in adhesive force, resistant to aging, high in flexibility, adjustable in square resistance, low and adjustable in resistance temperature coefficient and excellent in printing characteristic and sintering characteristic, and can be matched with the high-temperature-resistant flexible substrate.
Description
Technical field
The present invention relates to technical field of electronic materials, particularly relate to a kind of intermediate sintering temperature based on high-temperature flexible base material thick
Membrane resistance slurry and preparation method.
Background technology
In electric heating field, heating element wants that cube is little, power is big, thermal inertia is little, surface thermal load is big, power consumption
Low, the thermal efficiency is high, thermal starting is fast, power stability, stationary field uniformly, good manufacturability, body temp auto-controlled, safe and reliable to operation, the longevity
Life is long, applied widely, it is therefore desirable to use thick-film heating element.Thick-film resistor paste is the basic material manufacturing thick film element
Material, thick film heating resistance is typically, with the noble metal powder such as Au Ag Pt Pd, ruthenic oxide or its oxide as matrix, to add
As the glass phase of inorganic binder, and it is mixed to form heating resistor slurry with organic carrier, is then screen-printed to various base
On sheet, sinter in air atmosphere, 400 DEG C of-900 DEG C of temperature ranges and be prepared from.
Flexible electrothermal membrane is a kind of plyability conducting film, its advantage be can according to the power set and heating require into
Row is sheared, and the heater element made has the features such as light, thin, soft, simultaneously in planar heating, occupy quick heating, and thermal field is uniform
Characteristic.Flexible electrothermal membrane, because of its good pliability, electric conductivity and safety, becomes other heating element heater in some application
Do not caned substituted product, before household electrical appliance, power electronics, communication, the energy, aerospace field have a wide range of applications
Scape.
Most thick-film resistor pastes based on flexible parent metal in prior art, the electric heating that can only realize under low-voltage turns
Change, simultaneously because without self limiting temperature function, tensile strength is the highest, only can be used in the occasion that temperature is the highest.
Summary of the invention
Present invention aims to the deficiencies in the prior art and a kind of middle temperature based on high-temperature flexible base material is provided
Sintered thick film resistance slurry, should intermediate sintering temperature thick-film resistor paste based on high-temperature flexible base material have sintering temperature low, burn
The knot time is short, adhesive force is strong, height ageing-resistant, flexible, sheet resistance is adjustable, temperature-coefficient of electrical resistance is relatively low and adjustable, printing characteristic and burning
The advantage becoming characteristic good, and can match with high-temperature flexible base material well.
Another object of the present invention is to provide a kind of intermediate sintering temperature thick-film resistor paste based on high-temperature flexible base material
Preparation method, this preparation method can produce effectively prepares above-mentioned thick-film resistor paste.
For reaching above-mentioned purpose, the present invention is achieved through the following technical solutions.
Intermediate sintering temperature thick-film resistor paste based on high-temperature flexible base material, includes the material of following weight portion, particularly as follows:
Inorganic adhesive phase 10%-30%
Complex function phase 49%-60%
TCR regulator 1%-5%
Organic carrier 20%-25%;
Wherein, inorganic bond is by SiO mutually2、Bi2O3、B2O3、P2O5、Al2O3、Li2O、CaF2It is unleaded that seven kinds of materials are formed
Low-temperature sintering glass dust, SiO in lead-free low-temperature sintered glass powder2、Bi2O3、B2O3、P2O5、Al2O3、Li2O、CaF2Seven kinds of materials
Weight portion is followed successively by 20%-40%, 15%-20%, 25%-30%, 7.5%-10%, 7.5%-10%, 2.5%-5%, 2.5%-5%;
The combined silver that complex function is made up of micron flakes argentum powder, the spherical argentum powder of micron and three kinds of materials of nanometer silver powder mutually
Powder, micron flakes argentum powder in mixing argentum powder, the spherical argentum powder of micron, the weight portion of three kinds of materials of nanometer silver powder be followed successively by 30%-45%,
35%-40%、20%-30%;
TCR regulator is in manganese dioxide, Red copper oxide, cobalt sesquioxide, nickel oxide, vanadic anhydride, iron sesquioxide
The mixture that a kind of or at least two is formed;
Organic carrier be organic solvent, macromolecule thickener, high temperature resistant organic resin, surfactant, plasticizer, dispersant,
The mixture that defoamer, eight kinds of materials of thixotropic agent are formed, organic solvent in organic carrier, macromolecule thickener, high temperature resistant has
Machine resin, surfactant, plasticizer, dispersant, defoamer, the weight portion of eight kinds of materials of thixotropic agent be followed successively by 30%-65%,
15%-20%、15%-25%、1%-5%、1%-5%、1%-5%、1%-5%、1%-5%。
Wherein, the particle size values of described lead-free low-temperature sintered glass powder is 1 μm-3 μm, and softening point is 300 DEG C-400 DEG C, averagely
Linear expansion coefficient is 3-9 × 10-6/℃。
Wherein, the particle size values of described complex function middle micron flakes argentum powder mutually is 1 m-3 m, and apparent density is 2.0-3.0
g/cm3, tap density is 3.0-4.0 g/cm3;The particle size values of the spherical argentum powder of micron is 1 m-3 m, and apparent density is 2.5-3.0
g/cm3, tap density is 3.0-4.0 g/cm3;The particle size values of nanometer silver powder is 10nm-50nm, and apparent density is 2.0-2.5 g/
cm3, tap density is 3.5-4.0 g/cm3。
Wherein, described organic solvent be Oleum Terebinthinae, terpineol, hexadecanol, butyl carbitol, butyl carbitol acetate,
Diethylene glycol monomethyl ether, dibutyl ethylene glycol ether, ethylene glycol ether acetate, tributyl citrate, tributyl phosphate, Isosorbide-5-Nitrae-fourth
In lactone, mixed dibasic acid ester, N-Methyl pyrrolidone, DMF, N,N-dimethylacetamide, dimethyl sulfoxide
The mixture that formed of a kind of or at least two.
Wherein, described macromolecule thickener is ethyl cellulose, hydroxyethyl cellulose, carboxymethyl cellulose, nitrocellulose
In element, polyvinyl alcohol, polyvinyl butyral resin, polyvinyl formal-acetal, polyvinyl acetate, polyvinylpyrrolidone one
The mixture that kind or at least two are formed.
Wherein, described high temperature resistant organic resin is polyester modified organic silicon resin, polyimide resin, fluorinated polyimide
One or at least two in resin, polybenzimidazole resin, polyphenylene quinoxaline, heteroaromatic poly methylene imine resin are formed
Mixture.
Wherein, described surfactant is lecithin, one in Span-85, tween 80 or at least two formed
Mixture;Described dispersant be the one in triammonium citrate, polymethyl acid amide, 1,4-dihydroxy sulfanilic acid or
The mixture that at least two is formed;Described plasticizer is dimethyl phthalate, diethyl phthalate, O-phthalic
The mixture that a kind of or at least two in dibutyl phthalate, dioctyl phthalate is formed.
Wherein, described defoamer is organosiloxane, polyethers, Polyethylene Glycol, ethylene-acrylic acid copolymer, polyglycerol ester
The mixture that a kind of or at least two in fat acid esters, polydimethylsiloxane, organic silicon modified by polyether is formed.
Wherein, described thixotropic agent is hexadecanol, polyamide wax, castor oil hydrogenated, thixotropy alkyd resin, organobentonite
Or the mixture that a kind of or at least two in aerosil is formed.
The preparation method of intermediate sintering temperature thick-film resistor paste based on high-temperature flexible base material, includes following technique step
Suddenly, particularly as follows:
A, prepare inorganic adhesive phase: by SiO2、Bi2O3、B2O3、P2O5、Al2O3、Li2O、CaF2In three-dimensional material mixer, mixing is all
Even, SiO in mixture2、Bi2O3、B2O3、P2O5、Al2O3、Li2O、CaF2In the weight portion of seven kinds of materials be followed successively by 20%-40%,
15%-20%, 25%-30%, 7.5%-10%, 7.5%-10%, 2.5%-5%, 2.5%-5%, then at smelting furnace melting, melting after mix homogeneously
Temperature is 1100 DEG C-1200 DEG C, and temperature retention time is within 3-6 hour, i.e. to obtain glass melts, then glass melts is carried out shrend also
Obtain glass, finally with distilled water for medium to glass ball milling 4-6 hour, i.e. obtain the lead-free low-temperature that particle size values is 1 μm-3 μm
Sintered glass powder;
B, preparation complex function phase: by micron flakes argentum powder, the spherical argentum powder of micron, nanometer silver powder mix homogeneously with the compound merit of preparation
Energy phase, complex function middle micron flakes argentum powder, the spherical argentum powder of micron, the weight portion of three kinds of materials of nanometer silver powder mutually are followed successively by 30%-
45%, 35%-40%, 20%-30%, the particle size values of micron flakes argentum powder is 1 m-3 m, and the particle size values of the spherical argentum powder of micron is 1 m-3
M, the particle size values of nanometer silver powder is 10 nm-50 nm;
C, prepare organic carrier: by organic solvent, macromolecule thickener, high temperature resistant organic resin, surfactant, plasticizer,
Dispersant, defoamer, thixotropic agent dissolve to obtain organic carrier in 80 DEG C of water-baths, and by adjusting containing of macromolecule thickener
Amount, so that the viscosity of organic carrier controls in the range of 200 mPa s-300 mPa s, wherein, organic molten in organic carrier
Agent, macromolecule thickener, high temperature resistant organic resin, surfactant, plasticizer, dispersant, defoamer, eight kinds of materials of thixotropic agent
Weight portion be followed successively by 30%-65%, 15%-20%, 15%-25%, 1%-5%, 1%-5%, 1%-5%, 1%-5%, 1%-5%;
Prepared by d, resistance slurry: inorganic adhesive phase, complex function phase, TCR regulator, organic carrier are stirred in container and divide
Dissipating, and be placed in three-roll grinder and repeatedly grind, to obtain range of viscosities be 80-150Pa s, fineness is less than the thick film of 5 μm
Resistance slurry, wherein, inorganic adhesive phase, complex function phase, TCR regulator, the weight of four kinds of materials of organic carrier in resistance slurry
Amount part is followed successively by 10%-30%, 49%-60%, 1%-5%, 20%-25%.
The invention have the benefit that intermediate sintering temperature thick-film resistor based on high-temperature flexible base material of the present invention is starched
Expecting, it has the following advantages, particularly as follows:
1, SiO is used2、Bi2O3、B2O3、P2O5、Al2O3、Li2O、CaF2Prepare lead-free glass powder with low melting point, thick as intermediate sintering temperature
The inorganic adhesive phase of membrane resistance slurry, can make resistive layer sinter between 420 DEG C-450 DEG C, it is to avoid lead research and development, use and
The injury after Fei Qi caused environment, human body, can solve high-power resistance or heating manufacturing is badly in need of asking of solution
Topic, meets RoHS Directive (2002/95/EC) requirement;
2, different-shape and the micron flakes argentum powder of different-grain diameter, the spherical argentum powder of micron, the mixed powder work of nanometer silver powder are used
For complex function phase, it is used for preparing intermediate sintering temperature thick-film resistor paste, not only can effectively regulate the sheet resistance of resistive layer, simultaneously
Make again the sheet resistance reheating rate of change of resistive layer less than 5%;
3, use macromolecule thickener, high temperature resistant organic resin and other additive compound to prepare organic carrier, improve resistance
While adhesion of slurry, the viscosity of Effective Regulation slurry and printing, make resistive layer flawless and the pin pore etc. of preparation lack
Fall into, make the resistive layer of preparation have adhesive force advantages of higher strong, ageing-resistant, flexible simultaneously;
4, printing characteristic and burn till characteristic good, sheet resistance is adjustable, and the reheating rate of change of sheet resistance is less than 5% simultaneously, temperature-coefficient of electrical resistance
Less than 200 × 10-6/ DEG C, and can be well matched with flexible parent metal;
5, this thick-film resistor paste can prepare high power flexible electrothermal membrane, and its power density can control at 10-30W/cm2It
Between, can be widely applied to high power field of electric heating, be greatly enhanced efficiency of energy utilization.
Another of the present invention has: intermediate sintering temperature thick film based on high-temperature flexible base material of the present invention electricity
The preparation method of resistance paste, this preparation method can produce effectively prepares above-mentioned intermediate sintering temperature based on high-temperature flexible base material
Thick-film resistor paste.
Detailed description of the invention
Below in conjunction with specific embodiment, the present invention will be described.
Embodiment 1
A kind of intermediate sintering temperature thick-film resistor paste based on high-temperature flexible base material, it includes the material of following weight portion, particularly as follows:
Inorganic adhesive phase 30%
Complex function phase 49%
Manganese dioxide 1%
Organic carrier 20%;
Wherein, inorganic adhesive includes the material of following weight portion mutually, particularly as follows:
SiO2 40%
Bi2O3 15%
B2O3 25%
P2O5 7.5%
Al2O3 7.5%
Li2O 2.5%
CaF22.5%;
Wherein, complex function includes the material of following weight portion mutually, particularly as follows:
Micron flakes argentum powder 45%
The spherical argentum powder 35% of micron
Nanometer silver powder 20%;
Wherein, organic carrier includes the material of following weight portion, particularly as follows:
N-Methyl pyrrolidone 60%
Polyvinyl acetate 20%
Polyester modified organic silicon resin 10%
Span-85 2%
Dioctyl phthalate 2%
Polymethyl acid amide 2%
Organic silicon modified by polyether 2%
Castor oil hydrogenated 2%.
Need to be explained further, the high-temperature flexible base material that the present embodiment 1 is based on is PI thin film.
For above-mentioned intermediate sintering temperature thick-film resistor paste based on high-temperature flexible base material, it can use following preparation method to prepare
Forming, concrete, the preparation method being somebody's turn to do intermediate sintering temperature thick-film resistor paste based on high-temperature flexible base material comprises the following steps that:
A, prepare inorganic adhesive phase: by SiO2、Bi2O3、B2O3、P2O5、Al2O3、Li2O、CaF2Mix homogeneously in three-dimensional material mixer
After then at smelting furnace melting, smelting temperature is 1100 DEG C, and temperature retention time is i.e. to obtain glass melts, then by glass melts in 6 hours
Carrying out shrend and obtain glass, finally with distilled water for medium to glass ball milling 6 hours, i.e. obtaining particle size values is 1 μm-3 μm
Lead-free low-temperature sintered glass powder;
B, preparation complex function phase: by micron flakes argentum powder, the spherical argentum powder of micron, nanometer silver powder mix homogeneously with the compound merit of preparation
Can phase;
C, prepare organic carrier: by N-Methyl pyrrolidone, polyvinyl acetate, polyester modified organic silicon resin, Span-85,
Dioctyl phthalate, polymethyl acid amide, organic silicon modified by polyether, castor oil hydrogenated dissolve to obtain in 80 DEG C of water-baths
To organic carrier, the viscosity of organic carrier is 200 ± 20 mPa s;
D, prepare resistance slurry: by inorganic adhesive phase, complex function phase, TCR regulator manganese dioxide, organic carrier in container
Dispersed with stirring, and be placed in three-roll grinder and repeatedly grind, to obtain range of viscosities be 110 ± 20Pa s, fineness is less than 5 μ
The thick-film resistor paste of m.
For the intermediate sintering temperature thick-film resistor paste based on high-temperature flexible base material of the present embodiment 1, work as resistive layer
When thickness is 12 ± 2 μm, its sheet resistance value is 600 ± 5 m Ω/, and sheet resistance reheating rate of change is 3.5%, and temperature-coefficient of electrical resistance is
100±10×10-6/℃。
Embodiment 2
A kind of intermediate sintering temperature thick-film resistor paste based on high-temperature flexible base material, it includes the material of following weight portion, particularly as follows:
Inorganic adhesive phase 20%
Complex function phase 50%
Red copper oxide 2.5%
Organic carrier 27.5%;
Wherein, inorganic adhesive includes the material of following weight portion mutually, particularly as follows:
SiO2 20%
Bi2O3 20%
B2O3 30%
P2O5 10%
Al2O3 10%
Li2O 5%
CaF25%;
Wherein, complex function includes the material of following weight portion mutually, particularly as follows:
Micron flakes argentum powder 35%
The spherical argentum powder 40% of micron
Nanometer silver powder 25%;
Wherein, organic carrier includes the material of following weight portion, particularly as follows:
N,N-dimethylformamide 65%
Polyvinyl formal-acetal 15%
Polyimide resin 10%
Lecithin 2%
Dibutyl phthalate 2%
Polymethyl acid amide 2%
Organic silicon modified by polyether 2%
Polyamide wax 2%.
Need to be explained further, the high-temperature flexible base material that the present embodiment 2 is based on is PI thin film.
For above-mentioned intermediate sintering temperature thick-film resistor paste based on high-temperature flexible base material, it can use following preparation method
Being prepared from, concrete, the preparation method being somebody's turn to do intermediate sintering temperature thick-film resistor paste based on high-temperature flexible base material includes following
Processing step:
A, prepare inorganic adhesive phase: by SiO2、Bi2O3、B2O3、P2O5、Al2O3、Li2O、CaF2Mix homogeneously in three-dimensional material mixer
After then at smelting furnace melting, smelting temperature be 1200 DEG C of temperature retention times be i.e. to obtain glass melts in 5 hours, then glass melts is entered
Row shrend also obtains glass, finally with distilled water for medium to glass ball milling 5 hours, i.e. obtains the nothing that particle size values is 1 μm-3 μm
Lead low-temperature sintering glass dust;
B, preparation complex function phase: micron flakes argentum powder, the spherical argentum powder of micron, nanometer silver powder mix homogeneously is compound with preparation
Function phase;
C, prepare organic carrier: by N,N-dimethylformamide, polyvinyl formal-acetal polyimide resin, lecithin, neighbour
Phthalic acid dibutyl ester, polymethyl acid amide, organic silicon modified by polyether, polyamide wax dissolve to be had in 80 DEG C of water-baths
Airborne body, the viscosity of organic carrier is 220 ± 20 mPa s;
D, prepare resistance slurry: by inorganic adhesive phase, complex function phase, TCR regulator Red copper oxide, organic carrier in container
Dispersed with stirring, and be placed in three-roll grinder and repeatedly grind, to obtain range of viscosities be 100 ± 20Pa s, fineness is less than 5 μ
The thick-film resistor paste of m.
For the intermediate sintering temperature thick-film resistor paste based on high-temperature flexible base material of the present embodiment 2, work as resistive layer
When thickness is 11 ± 2 μm, its sheet resistance value is 760 ± 5 m Ω/, and sheet resistance reheating rate of change is 3.1%, and temperature-coefficient of electrical resistance is
150±10×10-6/℃。
Embodiment 3
A kind of intermediate sintering temperature thick-film resistor paste based on high-temperature flexible base material, it includes the material of following weight portion, particularly as follows:
Inorganic adhesive phase 15%
Complex function phase 60%
Iron sesquioxide 3%
Organic carrier 22%;
Wherein, inorganic adhesive includes the material of following weight portion mutually, particularly as follows:
SiO2 30%
Bi2O3 20%
B2O3 25%
P2O5 7.5%
Al2O3 7.5%
Li2O 5%
CaF25%;
Wherein, complex function includes the material of following weight portion mutually, particularly as follows:
Micron flakes argentum powder 40%
The spherical argentum powder 40% of micron
Nanometer silver powder 20%;
Wherein, organic carrier includes the material of following weight portion, particularly as follows:
N-Methyl pyrrolidone 60%
Polyvinyl alcohol 20%
Polybenzimidazole resin 10%
Span-85 2%
Dioctyl phthalate 2%
Polymethyl acid amide 2%
Organic silicon modified by polyether 2%
Castor oil hydrogenated 2%.
Need to be explained further, the high-temperature flexible base material that the present embodiment 3 is based on is PA thin film.
For above-mentioned intermediate sintering temperature thick-film resistor paste based on high-temperature flexible base material, it can use following preparation method to prepare
Forming, concrete, the preparation method being somebody's turn to do intermediate sintering temperature thick-film resistor paste based on high-temperature flexible base material comprises the following steps that:
A, prepare inorganic adhesive phase: by SiO2、Bi2O3、B2O3、P2O5、Al2O3、Li2O、CaF2Mix homogeneously in three-dimensional material mixer
After then at smelting furnace melting, smelting temperature is 1200 DEG C, and temperature retention time is i.e. to obtain glass melts, then by glass melts in 6 hours
Carrying out shrend and obtain glass, finally with distilled water for medium to glass ball milling 6 hours, i.e. obtaining particle size values is 1 μm-3 μm
Lead-free low-temperature sintered glass powder;
B, preparation complex function phase: by micron flakes argentum powder, the spherical argentum powder of micron, nanometer silver powder mix homogeneously with the compound merit of preparation
Can phase;
C, prepare organic carrier: by N-Methyl pyrrolidone, polyvinyl alcohol, polybenzimidazole resin, Span-85, O-phthalic
Dioctyl phthalate, polymethyl acid amide, organic silicon modified by polyether, castor oil hydrogenated dissolve to obtain to have airborne in 80 DEG C of water-baths
Body, the viscosity of organic carrier is 250 ± 20 mPa s;
D, prepare resistance slurry: by inorganic adhesive phase, complex function phase, TCR regulator iron sesquioxide, organic carrier in container
Middle dispersed with stirring, and be placed in three-roll grinder and repeatedly grind, to obtain range of viscosities be 105 ± 20Pa s, fineness is less than
The thick-film resistor paste of 5 μm.
For the intermediate sintering temperature thick-film resistor paste based on high-temperature flexible base material of the present embodiment 3, work as resistive layer
When thickness is 12 ± 2 μm, its sheet resistance value is 840 ± 5 m Ω/, and sheet resistance reheating rate of change is 4.5%, and temperature-coefficient of electrical resistance is
170±10×10-6/℃。
Embodiment 4
A kind of intermediate sintering temperature thick-film resistor paste based on high-temperature flexible base material, it includes the material of following weight portion, particularly as follows:
Inorganic adhesive phase 20%
Complex function phase 50%
Vanadic anhydride 2.5%
Organic carrier 27.5%;
Wherein, inorganic adhesive includes the material of following weight portion mutually, particularly as follows:
SiO2 20%
Bi2O3 20%
B2O3 30%
P2O5 10%
Al2O3 10%
Li2O 5%
CaF25%;
Wherein, complex function includes the material of following weight portion mutually, particularly as follows:
Micron flakes argentum powder 30%
The spherical argentum powder 40% of micron
Nanometer silver powder 30%;
Wherein, organic carrier includes the material of following weight portion, particularly as follows:
N,N-dimethylformamide 60%
Polyvinylpyrrolidone 20%
Polyphenylene quinoxaline 10%
Tween 80 2%
Dibutyl phthalate 2%
Polymethyl acid amide 2%
Organic silicon modified by polyether 2%
Thixotropy alkyd resin 2%;
Need to be explained further, the high-temperature flexible base material that the present embodiment 4 is based on is PI thin film.
For above-mentioned intermediate sintering temperature thick-film resistor paste based on high-temperature flexible base material, it can use following preparation method to prepare
Forming, concrete, the preparation method being somebody's turn to do intermediate sintering temperature thick-film resistor paste based on high-temperature flexible base material comprises the following steps that:
A, prepare inorganic adhesive phase: by SiO2、Bi2O3、B2O3、P2O5、Al2O3、Li2O、CaF2Mix homogeneously in three-dimensional material mixer
After then at smelting furnace melting, smelting temperature be 1100 DEG C of temperature retention times be i.e. to obtain glass melts in 3 hours, then glass melts is entered
Row shrend also obtains glass, finally with distilled water for medium to glass ball milling 4 hours, i.e. obtains the nothing that particle size values is 1 μm-3 μm
Lead low-temperature sintering glass dust;
B, preparation complex function phase: by micron flakes argentum powder, the spherical argentum powder of micron, nanometer silver powder mix homogeneously to prepare complex function phase;
C, prepare organic carrier: by N,N-dimethylformamide, polyvinylpyrrolidone, polyphenylene quinoxaline, tween 80, neighbour
Phthalic acid dibutyl ester, polymethyl acid amide, organic silicon modified by polyether, thixotropy alkyd resin dissolve in 80 DEG C of water-baths with
Obtaining organic carrier, the viscosity of organic carrier is 240 ± 20 mPa s;
D, prepare resistance slurry: by inorganic adhesive phase, complex function phase, TCR regulator vanadic anhydride, organic carrier in container
Middle dispersed with stirring, and be placed in three-roll grinder and repeatedly grind, to obtain range of viscosities be 80 ± 20Pa s, fineness is less than 5
The thick-film resistor paste of μm.
For the intermediate sintering temperature thick-film resistor paste based on high-temperature flexible base material of the present embodiment 4, work as resistive layer
When thickness is 13 ± 2 μm, its sheet resistance value is 950 ± 5 m Ω/, and sheet resistance reheating rate of change is 3.5%, and temperature-coefficient of electrical resistance is
130±10×10-6/℃。
Embodiment 5
A kind of intermediate sintering temperature thick-film resistor paste based on high-temperature flexible base material, it includes the material of following weight portion, particularly as follows:
Inorganic adhesive phase 10%
Complex function phase 60%
Nickel oxide 5%
Organic carrier 25%;
Wherein, inorganic adhesive includes the material of following weight portion mutually, particularly as follows:
SiO2 30%
Bi2O3 15%
B2O3 25%
P2O5 10%
Al2O3 10%
Li2O 5%
CaF25%;
Wherein, complex function includes the material of following weight portion mutually, particularly as follows:
Micron flakes argentum powder 45%
The spherical argentum powder 35% of micron
Nanometer silver powder 20%;
Wherein, organic carrier includes the material of following weight portion, particularly as follows:
DMAC N,N' dimethyl acetamide 65%
Polyvinyl acetate 20%
Fluorinated polyimide resin 10%
Tween 80 1%
Dioctyl phthalate 1%
Triammonium citrate 1%
Polyglyceryl fatty acid ester 1%
Castor oil hydrogenated 1%;
Need to be explained further, the high-temperature flexible base material that the present embodiment 5 is based on is PI thin film.
For above-mentioned intermediate sintering temperature thick-film resistor paste based on high-temperature flexible base material, it can use following preparation method
Being prepared from, concrete, the preparation method being somebody's turn to do intermediate sintering temperature thick-film resistor paste based on high-temperature flexible base material includes following
Processing step:
A, prepare inorganic adhesive phase: by SiO2、Bi2O3、B2O3、P2O5、Al2O3、Li2O、CaF2Mix homogeneously in three-dimensional material mixer
After then at smelting furnace melting, smelting temperature is 1100 DEG C, and temperature retention time is i.e. to obtain glass melts, then by glass melts in 6 hours
Carrying out shrend and obtain glass, finally with distilled water for medium to glass ball milling 4 hours, i.e. obtaining particle size values is 1 μm-3 μm
Lead-free low-temperature sintered glass powder;
B, preparation complex function phase: by micron flakes argentum powder, the spherical argentum powder of micron, nanometer silver powder mix homogeneously with the compound merit of preparation
Can phase;
C, prepare organic carrier: by DMAC N,N' dimethyl acetamide, polyvinyl acetate, fluorinated polyimide resin, tween 80,
Dioctyl phthalate, triammonium citrate, organic silicon modified by polyether, castor oil hydrogenated dissolve to be had in 80 DEG C of water-baths
Airborne body, the viscosity of organic carrier is 220 ± 20 mPa s;
D, prepare resistance slurry: inorganic adhesive phase, complex function phase, TCR regulator nickel oxide, organic carrier are stirred in container
Mixing dispersion, and be placed in three-roll grinder and repeatedly grind, to obtain range of viscosities be 110 ± 20Pa s, fineness is less than 5 μm
Thick-film resistor paste.
For the intermediate sintering temperature thick-film resistor paste based on high-temperature flexible base material of the present embodiment 5, work as resistive layer
When thickness is 11 ± 2 μm, its sheet resistance value is 720 ± 5 m Ω/, and sheet resistance reheating rate of change is 3.8%, and temperature-coefficient of electrical resistance is
140±10×10-6/℃。
Embodiment 6
A kind of intermediate sintering temperature thick-film resistor paste based on high-temperature flexible base material, it includes the material of following weight portion, particularly as follows:
Inorganic adhesive phase 20%
Complex function phase 50%
Cobalt sesquioxide 2.5%
Organic carrier 27.5%;
Wherein, inorganic adhesive includes the material of following weight portion mutually, particularly as follows:
SiO2 20%
Bi2O3 20%
B2O3 30%
P2O5 10%
Al2O3 10%
Li2O 5%
CaF25%;
Wherein, complex function includes the material of following weight portion mutually, particularly as follows:
Micron flakes argentum powder 30%
The spherical argentum powder 40% of micron
Nanometer silver powder 30%;
Wherein, organic carrier includes the material of following weight portion, particularly as follows:
N,N-dimethylformamide 75%
Polyvinyl formal-acetal 20%
Polyester modified organic silicon resin 10%
Lecithin 2%
Dibutyl phthalate 2%
Polymethyl acid amide 2%
Organic silicon modified by polyether 2%
Polyamide wax 1%;
Need to be explained further, the high-temperature flexible base material that the present embodiment 6 is based on is PI thin film.
For above-mentioned intermediate sintering temperature thick-film resistor paste based on high-temperature flexible base material, it can use following preparation method
Being prepared from, concrete, the preparation method being somebody's turn to do intermediate sintering temperature thick-film resistor paste based on high-temperature flexible base material includes following
Processing step:
A, prepare inorganic adhesive phase: by SiO2、Bi2O3、B2O3、P2O5、Al2O3、Li2O、CaF2Mix homogeneously in three-dimensional material mixer
After then at smelting furnace melting, smelting temperature be 1200 DEG C of temperature retention times be i.e. to obtain glass melts in 5 hours, then glass melts is entered
Row shrend also obtains glass, finally with distilled water for medium to glass ball milling 4 hours, i.e. obtains the nothing that particle size values is 1 μm-3 μm
Lead low-temperature sintering glass dust;
B, preparation complex function phase: by micron flakes argentum powder, the spherical argentum powder of micron, nanometer silver powder mix homogeneously with the compound merit of preparation
Can phase;
C, prepare organic carrier: by N,N-dimethylformamide, polyvinyl formal-acetal, polyester modified organic silicon resin, ovum
Phospholipid, dibutyl phthalate, polymethyl acid amide, organic silicon modified by polyether, polyamide wax dissolve in 80 DEG C of water-baths
To obtain organic carrier, the viscosity of organic carrier is 200 ± 20 mPa s;
D, prepare resistance slurry: by inorganic adhesive phase, complex function phase, TCR regulator cobalt sesquioxide, organic carrier in container
Middle dispersed with stirring, and be placed in three-roll grinder and repeatedly grind, to obtain range of viscosities be 85 ± 20Pa s, fineness is less than 5
The thick-film resistor paste of μm.
For the intermediate sintering temperature thick-film resistor paste based on high-temperature flexible base material of the present embodiment 6, work as resistive layer
When thickness is 11 ± 2 μm, its sheet resistance value is 800 ± 5 m Ω/, and sheet resistance reheating rate of change is 4.2%, and temperature-coefficient of electrical resistance is
145±10×10-6/℃。
Embodiment 7
A kind of intermediate sintering temperature thick-film resistor paste based on high-temperature flexible base material, it includes the material of following weight portion, specifically
For:
Inorganic adhesive phase 25%
Complex function phase 50%
Manganese dioxide 2%
Organic carrier 23%;
Wherein, inorganic adhesive includes the material of following weight portion mutually, particularly as follows:
SiO2 40%
Bi2O3 15%
B2O3 25%
P2O5 7.5%
Al2O3 7.5%
Li2O 2.5%
CaF22.5%;
Wherein, complex function includes the material of following weight portion mutually, particularly as follows:
Micron flakes argentum powder 45%
The spherical argentum powder 35% of micron
Nanometer silver powder 20%;
Wherein, organic carrier includes the material of following weight portion, particularly as follows:
DMAC N,N' dimethyl acetamide 60%
Polyvinyl acetate 20%
Polybenzimidazole resin 10%
Span-85 2%
Dioctyl phthalate 2%
Polymethyl acid amide 2%
Organic silicon modified by polyether 2%
Castor oil hydrogenated 2%;
Need to be explained further, the high-temperature flexible base material that the present embodiment 7 is based on is PA thin film.
For above-mentioned intermediate sintering temperature thick-film resistor paste based on high-temperature flexible base material, it can use following preparation method
Being prepared from, concrete, the preparation method being somebody's turn to do intermediate sintering temperature thick-film resistor paste based on high-temperature flexible base material includes following
Processing step:
A, prepare inorganic adhesive phase: by SiO2、Bi2O3、B2O3、P2O5、Al2O3、Li2O、CaF2Mix homogeneously in three-dimensional material mixer
After then at smelting furnace melting, smelting temperature is 1150 DEG C, and temperature retention time is i.e. to obtain glass melts, then by glass melts in 6 hours
Carrying out shrend and obtain glass, finally with distilled water for medium to glass ball milling 4-6 hour, i.e. obtaining particle size values is 1 μm-3 μm
Lead-free low-temperature sintered glass powder;
B, preparation complex function phase: by micron flakes argentum powder, the spherical argentum powder of micron, nanometer silver powder mix homogeneously with the compound merit of preparation
Can phase;
C, prepare organic carrier: by DMAC N,N' dimethyl acetamide, polyvinyl acetate, polybenzimidazole resin, Span-85, adjacent
Dioctyl phthalate, polymethyl acid amide, organic silicon modified by polyether, castor oil hydrogenated dissolve to obtain in 80 DEG C of water-baths
Organic carrier, the viscosity of organic carrier is 200 ± 20 mPa s;
D, prepare resistance slurry: by inorganic adhesive phase, complex function phase, TCR regulator manganese dioxide, organic carrier in container
Dispersed with stirring, and be placed in three-roll grinder and repeatedly grind, to obtain range of viscosities be 100 ± 20Pa s, fineness is less than 5 μ
The thick-film resistor paste of m.
For the intermediate sintering temperature thick-film resistor paste based on high-temperature flexible base material of the present embodiment 7, work as resistive layer
When thickness is 10 ± 2 μm, its sheet resistance value is 750 ± 5 m Ω/, and sheet resistance reheating rate of change is 3.0%, and temperature-coefficient of electrical resistance is
130±10×10-6/℃。
Embodiment 8
A kind of intermediate sintering temperature thick-film resistor paste based on high-temperature flexible base material, it includes the material of following weight portion, specifically
For:
Inorganic adhesive phase 20%
Complex function phase 50%
Cobalt sesquioxide 2.5%
Organic carrier 27.5%;
Wherein, inorganic adhesive includes the material of following weight portion mutually, particularly as follows:
SiO2 20%
Bi2O3 20%
B2O3 30%
P2O5 10%
Al2O3 10%
Li2O 5%
CaF25%;
Wherein, complex function includes the material of following weight portion mutually, particularly as follows:
Micron flakes argentum powder 38%
The spherical argentum powder 38% of micron
Nanometer silver powder 24%;
Wherein, organic carrier includes the material of following weight portion, particularly as follows:
N,N-dimethylformamide 65%
Polyvinyl formal-acetal 20%
Heteroaromatic poly methylene imine resin 10%
Lecithin 1%
Dibutyl phthalate 1%
Polymethyl acid amide 1%
Organic silicon modified by polyether 1%
Organobentonite 1%;
Need to be explained further, the high-temperature flexible base material that the present embodiment 8 is based on is PI thin film.
For above-mentioned intermediate sintering temperature thick-film resistor paste based on high-temperature flexible base material, it can use following preparation method
Being prepared from, concrete, the preparation method being somebody's turn to do intermediate sintering temperature thick-film resistor paste based on high-temperature flexible base material includes following
Processing step:
A, prepare inorganic adhesive phase: by SiO2、Bi2O3、B2O3、P2O5、Al2O3、Li2O、CaF2Mix homogeneously in three-dimensional material mixer
After then at smelting furnace melting, smelting temperature be 1200 DEG C of temperature retention times be i.e. to obtain glass melts in 6 hours, then glass melts is entered
Row shrend also obtains glass, finally with distilled water for medium to glass ball milling 4 hours, i.e. obtains the nothing that particle size values is 1 μm-3 μm
Lead low-temperature sintering glass dust;
B, preparation complex function phase: by micron flakes argentum powder, the spherical argentum powder of micron, nanometer silver powder mix homogeneously with the compound merit of preparation
Can phase;
C, prepare organic carrier: by N,N-dimethylformamide, polyvinyl formal-acetal, heteroaromatic poly methylene imine resin, ovum
Phospholipid, dibutyl phthalate, polymethyl acid amide, organic silicon modified by polyether, organobentonite are molten in 80 DEG C of water-baths
Solution is to obtain organic carrier, and the viscosity of organic carrier is 260 ± 20 mPa s;
D, prepare resistance slurry: by inorganic adhesive phase, complex function phase, TCR regulator cobalt sesquioxide, organic carrier in container
Middle dispersed with stirring, and be placed in three-roll grinder and repeatedly grind, to obtain range of viscosities be 90 ± 20Pa s, fineness is less than 5
The thick-film resistor paste of μm.
For the intermediate sintering temperature thick-film resistor paste based on high-temperature flexible base material of the present embodiment 8, work as resistive layer
When thickness is 12 ± 2 μm, its sheet resistance value is 845 ± 5 m Ω/, and sheet resistance reheating rate of change is 4.7%, and temperature-coefficient of electrical resistance is
160±10×10-6/℃。
Above content is only presently preferred embodiments of the present invention, for those of ordinary skill in the art, according to the present invention's
Thought, the most all will change, and this specification content should not be construed as the present invention
Restriction.
Claims (10)
1. intermediate sintering temperature thick-film resistor paste based on high-temperature flexible base material, it is characterised in that include following weight portion
Material, particularly as follows:
Inorganic adhesive phase 10%-30%
Complex function phase 49%-60%
TCR regulator 1%-5%
Organic carrier 20%-25%;
Wherein, inorganic bond is by SiO mutually2、Bi2O3、B2O3、P2O5、Al2O3、Li2O、CaF2It is unleaded that seven kinds of materials are formed
Low-temperature sintering glass dust, SiO in lead-free low-temperature sintered glass powder2、Bi2O3、B2O3、P2O5、Al2O3、Li2O、CaF2Seven kinds of materials
Weight portion is followed successively by 20%-40%, 15%-20%, 25%-30%, 7.5%-10%, 7.5%-10%, 2.5%-5%, 2.5%-5%;
The combined silver that complex function is made up of micron flakes argentum powder, the spherical argentum powder of micron and three kinds of materials of nanometer silver powder mutually
Powder, micron flakes argentum powder in mixing argentum powder, the spherical argentum powder of micron, the weight portion of three kinds of materials of nanometer silver powder be followed successively by 30%-45%,
35%-40%、20%-30%;
TCR regulator is in manganese dioxide, Red copper oxide, cobalt sesquioxide, nickel oxide, vanadic anhydride, iron sesquioxide
The mixture that a kind of or at least two is formed;
Organic carrier be organic solvent, macromolecule thickener, high temperature resistant organic resin, surfactant, plasticizer, dispersant,
The mixture that defoamer, eight kinds of materials of thixotropic agent are formed, organic solvent in organic carrier, macromolecule thickener, high temperature resistant has
Machine resin, surfactant, plasticizer, dispersant, defoamer, the weight portion of eight kinds of materials of thixotropic agent be followed successively by 30%-65%,
15%-20%、15%-25%、1%-5%、1%-5%、1%-5%、1%-5%、1%-5%。
Intermediate sintering temperature thick-film resistor paste based on high-temperature flexible base material the most according to claim 1, it is characterised in that:
The particle size values of described lead-free low-temperature sintered glass powder is 1 μm-3 μm, and softening point is 300 DEG C-400 DEG C, and average coefficient of linear expansion is
3-9×10-6/℃。
Intermediate sintering temperature thick-film resistor paste based on high-temperature flexible base material the most according to claim 1, it is characterised in that:
The particle size values of described complex function middle micron flakes argentum powder mutually is 1 m-3 m, and apparent density is 2.0-3.0 g/cm3, vibration density
Degree is 3.0-4.0 g/cm3;The particle size values of the spherical argentum powder of micron is 1 m-3 m, and apparent density is 2.5-3.0 g/cm3, vibration density
Degree is 3.0-4.0 g/cm3;The particle size values of nanometer silver powder is 10nm-50nm, and apparent density is 2.0-2.5 g/cm3, tap density
For 3.5-4.0 g/cm3。
Intermediate sintering temperature thick-film resistor paste based on high-temperature flexible base material the most according to claim 1, it is characterised in that:
Described organic solvent is Oleum Terebinthinae, terpineol, hexadecanol, butyl carbitol, butyl carbitol acetate, diethylene glycol list first
Ether, dibutyl ethylene glycol ether, ethylene glycol ether acetate, tributyl citrate, tributyl phosphate, GBL, mixing two
Unit acid esters, N-Methyl pyrrolidone, DMF, N,N-dimethylacetamide, dimethyl sulfoxide in one or
The mixture that at least two is formed.
Intermediate sintering temperature thick-film resistor paste based on high-temperature flexible base material the most according to claim 1, it is characterised in that:
Described macromolecule thickener is ethyl cellulose, hydroxyethyl cellulose, carboxymethyl cellulose, NC Nitroncellulose, polyvinyl alcohol, gathers
One in vinyl butyral, polyvinyl formal-acetal, polyvinyl acetate, polyvinylpyrrolidone or at least two
The mixture formed.
Intermediate sintering temperature thick-film resistor paste based on high-temperature flexible base material the most according to claim 1, it is characterised in that:
Described high temperature resistant organic resin is polyester modified organic silicon resin, polyimide resin, fluorinated polyimide resin, polyphenyl miaow
The mixture that a kind of or at least two in azoles resin, polyphenylene quinoxaline, heteroaromatic poly methylene imine resin is formed.
Intermediate sintering temperature thick-film resistor paste based on high-temperature flexible base material the most according to claim 1, it is characterised in that:
The mixture that described surfactant is lecithin, a kind of or at least two in Span-85, tween 80 is formed;Described
Dispersant is triammonium citrate, one in polymethyl acid amide, 1,4-dihydroxy sulfanilic acid or at least two are formed
Mixture;Described plasticizer is dimethyl phthalate, diethyl phthalate, dibutyl phthalate, adjacent benzene
The mixture that a kind of or at least two in dioctyl phthalate dioctyl ester is formed.
Intermediate sintering temperature thick-film resistor paste based on high-temperature flexible base material the most according to claim 1, it is characterised in that:
Described defoamer is organosiloxane, polyethers, Polyethylene Glycol, ethylene-acrylic acid copolymer, polyglyceryl fatty acid ester, poly-diformazan
The mixture that a kind of or at least two in radical siloxane, organic silicon modified by polyether is formed.
Intermediate sintering temperature thick-film resistor paste based on high-temperature flexible base material the most according to claim 1, it is characterised in that:
Described thixotropic agent is hexadecanol, polyamide wax, castor oil hydrogenated, thixotropy alkyd resin, organobentonite or gas phase titanium dioxide
The mixture that a kind of or at least two in silicon is formed.
10. the preparation method of intermediate sintering temperature thick-film resistor paste based on high-temperature flexible base material, it is characterised in that include with
Lower processing step, particularly as follows:
A, prepare inorganic adhesive phase: by SiO2、Bi2O3、B2O3、P2O5、Al2O3、Li2O、CaF2In three-dimensional material mixer, mixing is all
Even, SiO in mixture2、Bi2O3、B2O3、P2O5、Al2O3、Li2O、CaF2In the weight portion of seven kinds of materials be followed successively by 20%-40%,
15%-20%, 25%-30%, 7.5%-10%, 7.5%-10%, 2.5%-5%, 2.5%-5%, then at smelting furnace melting, melting after mix homogeneously
Temperature is 1100 DEG C-1200 DEG C, and temperature retention time is within 3-6 hour, i.e. to obtain glass melts, then glass melts is carried out shrend also
Obtain glass, finally with distilled water for medium to glass ball milling 4-6 hour, i.e. obtain the lead-free low-temperature that particle size values is 1 μm-3 μm
Sintered glass powder;
B, preparation complex function phase: by micron flakes argentum powder, the spherical argentum powder of micron, nanometer silver powder mix homogeneously with the compound merit of preparation
Energy phase, complex function middle micron flakes argentum powder, the spherical argentum powder of micron, the weight portion of three kinds of materials of nanometer silver powder mutually are followed successively by 30%-
45%, 35%-40%, 20%-30%, the particle size values of micron flakes argentum powder is 1 m-3 m, and the particle size values of the spherical argentum powder of micron is 1 m-3
M, the particle size values of nanometer silver powder is 10 nm-50 nm;
C, prepare organic carrier: by organic solvent, macromolecule thickener, high temperature resistant organic resin, surfactant, plasticizer,
Dispersant, defoamer, thixotropic agent dissolve to obtain organic carrier in 80 DEG C of water-baths, and by adjusting containing of macromolecule thickener
Amount, so that the viscosity of organic carrier controls in the range of 200 mPa s-300 mPa s, wherein, organic molten in organic carrier
Agent, macromolecule thickener, high temperature resistant organic resin, surfactant, plasticizer, dispersant, defoamer, eight kinds of materials of thixotropic agent
Weight portion be followed successively by 30%-65%, 15%-20%, 15%-25%, 1%-5%, 1%-5%, 1%-5%, 1%-5%, 1%-5%;
Prepared by d, resistance slurry: inorganic adhesive phase, complex function phase, TCR regulator, organic carrier are stirred in container and divide
Dissipating, and be placed in three-roll grinder and repeatedly grind, to obtain range of viscosities be 80-150Pa s, fineness is less than the thick film of 5 μm
Resistance slurry, wherein, inorganic adhesive phase, complex function phase, TCR regulator, the weight of four kinds of materials of organic carrier in resistance slurry
Amount part is followed successively by 10%-30%, 49%-60%, 1%-5%, 20%-25%.
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