CN105911624B - Rectangular linear variable optical filter manufacturing method and device - Google Patents
Rectangular linear variable optical filter manufacturing method and device Download PDFInfo
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- CN105911624B CN105911624B CN201610450260.8A CN201610450260A CN105911624B CN 105911624 B CN105911624 B CN 105911624B CN 201610450260 A CN201610450260 A CN 201610450260A CN 105911624 B CN105911624 B CN 105911624B
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- glass baseplate
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- evaporation source
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
Abstract
The invention relates to a rectangular linear variable optical filter manufacturing method and device. According to the rectangular linear variable optical filter manufacturing method and device, a glass base material used for making an optical filter is fixed on a lower surface of a round plate-shaped work piece disc that can rotate around a central shaft of the work piece disc, a plating face of the glass base material faces downwards, an evaporation source base plate and an evaporation source positioned on an upper surface of the evaporation source base plate are arranged below the work piece disc, and the plating face of the glass base material is subjected to plating operation with a membrane material evaporated via the evaporation source when the work piece disc drives the glass base material to rotate. The rectangular linear variable optical filter manufacturing method and device can help overcome defects of complicated production processes and low precision and poor quality of manufactured rectangular linear variable optical filters in conventional rectangular linear variable optical filter manufacturing processes because a corrected piece which is adjusted via manual work for many times is adopted. The rectangular linear variable optical filter manufacturing method and device are advantaged by greatly reduction of membrane thickness correcting processes, saved trial-plating time, and improved precision and quality stability of the rectangular linear variable optical filter.
Description
Technical field
The present invention relates to a kind of method and its process units for producing rectangle linear variable filter.
Background technology
At present, to be applied to spectral measurement, remote sensing technology, fluorescence analysis, laser countermeasure (s) etc. more for optical film filter
Individual field.With the development of optics industry, the also more and more higher of the requirement to optical filter occurs in that some special optical filters, and
Linear variable filter is exactly one of them new developing direction.
Linear variable filter is a kind of special optical filter, and the centre wavelength or light intensity of diverse location is on the optical filter
It is different.Its effect is that the transmitance for making light meets specific function relation, for improving image quality, correction aberration, carrying
For illuminance compensation etc..As the device of optical film that a kind of spectral characteristic changes with optical filter surface location, the gradual filter
There is small volume, lightweight, good stability, therefore, it is in portable quick light splitting, spectrometer linearity correction, light
The aspects such as two grades of grid time light separation/cut-off have a wide range of applications, and have been successfully applied to miniature spectrometer and imaging spectral
Instrument.Wherein, it is that its transmitance linearly changes along the direction of rectangle substrate length the characteristics of rectangle linear variable filter.
Various coating materials are coated with the manufacturing process of traditional linear variable filter, same trim tab is used to film
Thickness is once corrected, and the trim tab needs empirically repeatedly to manually adjust its size by operator.Cause
This, it is high, raw that the evaporation angle difference of different coating materials, repeatedly artificial operating error, once amendment step result in production cost
Product efficiency is low, produce the problem that linear variable filter precision is not high, linear dispersion rate is difficult to ensure that and quality is unstable.Separately
Outward, existing linear variable filter using it is mostly be metal film such as silver, chromium, nickel preparing, and metal film has itself
The shortcomings of absorption and poor adhesive force, oxidizable, service life are short, the process thickness of being coated with is difficult to control to, brings to batch production
Very big frustration.
Therefore, the invention provides a kind of flow process is succinct, low production cost and efficiency high, to be greatly improved rectangle linear gradually
Become optical filter precision and quality stability production rectangle linear variable filter method and its process units oneself become work as
Business urgently.
The content of the invention
Due to using many artificial experience adjustment of Jing in order to overcome existing rectangle linear variable filter preparation process
One piece of trim tab and caused production process is numerous and diverse, made rectangle linear variable filter precision is not good, quality is unstable lacks
Point, the present invention provides a kind of method and its process units for producing rectangle linear variable filter, and it has can greatly simplify
Thickness amendment operation, the advantage for saving examination plating time, the precision of raising rectangle linear variable filter and quality stability.
Technical scheme is as follows：
A kind of method for producing rectangle linear variable filter, it is will to be fixed on for the glass baseplate for making optical filter
On the lower surface of circular plate and the workpiece plate that can be rotated around its central axis, the plated film for making glass baseplate faces down, in work
Part disk lower section arranges evaporation source base plate and the evaporation source positioned at evaporation source plate upper surface, and workpiece plate drives glass baseplate to rotate through
Cheng Zhong, plated film is carried out by the coating materials of evaporation source evaporation to the coated surface of glass baseplate；
1. described glass baseplate is rectangular glass base material；
2. Film Design was first carried out before plated film：Centre wavelength, transmitance according to required optical filter and along glass
The transmitance abbe number of glass base material long side direction carries out Film Design using plated film software, determines coating layers, needed for per layer
The film thickness distribution situation of Coating Materials, per layer of institute's film plating layer along glass baseplate length direction；
3. in coating process, the diametric(al) for making the long edge workpiece plate of glass baseplate coated surface is placed；According to being plated
Film layer selects one group of corresponding trim tab a and trim tab b, and the trim tab a and trim tab b is symmetrically placed in workpiece plate
Heart Axial and radial both sides are simultaneously located between glass baseplate and evaporation source；When workpiece plate drives glass baseplate to rotate, as glass baseplate Jing
When crossing trim tab a positions, the coating materials on this layer of coated surface is adjusted to the partial occlusion of evaporation source evaporation coating materials by trim tab a
Distribution, realizes first time thicknesses of layers amendment, makes coated surface plate the consistent film layer of a layer thickness, then when glass baseplate is passed through
During trim tab b positions, the coating materials on this layer of coated surface point is adjusted to the partial occlusion of evaporation source evaporation coating materials by trim tab b
Cloth, realizes second thicknesses of layers amendment, and thickness distribution situation of institute's film plating layer along glass baseplate length direction is modified,
So circulation is repeatedly to completing being coated with for equivalent layer film layer；Select that new one group is corresponding to be repaiied according to next layer of institute film plating layer afterwards
Positive a and trim tab b repeats above-mentioned coating process, until the rectangle linear variable filter needed for obtaining；
The inner terminal of glass baseplate coated surface is corresponded on trim tab a, outermost end position place workpiece plate lower surface is just being neutralized
The circular arc arc length of circumferential position uses respectively aM、ao、amRepresent, the inner terminal of correspondence glass baseplate coated surface, center on trim tab b
B is used respectively with the circular arc arc length of outermost end position place workpiece plate lower surface circumferential positionM、bo、bmRepresent；
The trim tab a and trim tab b are prepared from accordance with the following methods：
Ith, the dimensional parameters of theoretical trim tab a are first calculated and theoretical correction piece a is produced：
Setting amTheoretical value, amIt is worth for the 5-10% of workpiece plate radius size, theoretical correction is calculated by below equation
The a of piece aMAnd aoTheoretical value, and theoretical correction piece a is produced according to the size of above-mentioned theory trim tab a：
tsm×(2πrm-am)=tso×(2πro-ao)=tsM×(2πrM-aM)；
Wherein, h is vertical height of the workpiece plate center of circle to evaporation source base plate, and L is that evaporation source is evaporating with the workpiece plate center of circle
Vertical range between the upright projection point of source base plate, r is the deposition test that the workpiece plate center of circle is deposited on workpiece plate to coating materials
The radius of point A, tsThe thickness of deposition test point A being deposited on for coating materials on workpiece plate, tosRepresent that coating materials is deposited in workpiece plate
The thickness of the heart, ts/tosRepresent deposition test point A and central point thickness ratio, tsM、tso、tsmRespectively coating materials is deposited on glass base
The inner terminal of material coated surface, the thickness for just neutralizing this 3 points of outermost end position；rM、ro、rmRepresent the workpiece plate center of circle to film respectively
Material is deposited on the inner terminal of glass baseplate coated surface, is just neutralizing the radius of outermost end position；
IIth, the size for trying plated film and revised theory trim tab a obtains trim tab a：
Along workpiece plate diametric(al) on workpiece plate lower surface fixed placement glass baseplate, first theoretical correction piece a is consolidated
The lower section of workpiece plate is scheduled on, glass baseplate is blocked with theoretical correction piece a, on the coated surface of glass baseplate one is plated
Thickness degree is the corresponding film plating layer material requested film layer of 250-300nm, determines each plated film along workpiece plate diametric(al) afterwards and sinks
The transmitance of product test point is modified to the size of theoretical correction piece a, obtains a of trim tab am、aMAnd aoActual value, make
After the completion of plated film on glass baseplate coated surface along diametric each the plating film spot of workpiece plate transmission rate score it is consistent so that
The coating film thickness for obtaining the film plating layer is consistent, that is, complete the making of the trim tab a for this kind of Coating Materials；
IIIth, the making of trim tab b：By formulaWithCalculate bM、bm、boValue and produce amendment for this kind of Coating Materials
Piece b；Wherein, aM、am、aoThe actual value of the trim tab a obtained using step II, λM、λo、λmWhat respectively Film Design was required is right
Answer glass baseplate inner terminal, just neutralize the corresponding wavelength of transmitance of outermost end position.
The conventionally employed way for manually adjusting trim tab is different from, the application is used to produce rectangle linear variable filter
Trim tab calculates the size to trim tab and has carried out accurate restriction using accurate formula, first obtains size accurately theoretical correction
Piece a sizes, then (plated film transmitance is tested i.e. along work according to the glass baseplate plated film transmitance measuring for plating medium membrane material
The diametric(al) of part disk on workpiece plate lower surface fixed placement glass baseplate (when the coated surface length and trim tab of glass baseplate
A piece of glass baseplate is can select when length is similar, and when the coated surface length of glass baseplate is shorter, multiple pieces of glass can be adopted
Base material is end to end to be arranged in a row.), first using theoretical correction piece a in certain dielectric material membrane process is coated with to glass base
Material carries out blocking amendment coating film thickness, determines transmitance of each plating film spot along workpiece plate diametric(al) afterwards) result is to theory
Size (the i.e. a of trim tab aM、amAnd aoSize) be finely adjusted, it is ensured that the transmission rate score of each plating film spot is consistent, so as to
To the trim tab a corresponding to this kind of medium membrane material.The process substantially reduces the examination plating time, improves the steady quality of product
Property.And first time thickness amendment carried out by using trim tab a so that thickness is consistent, then trim tab b carries out second thickness
Amendment, realizes being passed through along glass baseplate direction by plating the film of linear change thickness along glass baseplate coated surface length direction
The linear gradient of rate, substantially increases the linear dispersion of gradual filter.Wherein, amSetting and glass baseplate width
Relation less, mainly carefully can not otherwise be easily deformed very much, while can not arrange too big, otherwise block coating materials too much, can lead
Cause coating materials to waste and plated film time is lengthened.
During calculating, first according to point source film thickness distribution formulaCalculate
Workpiece plate correspondence glass baseplate both ends and center position film thickness distribution ts；Reset am, by formula tsm×(2πrm-am)=tso
×(2πro-ao)=tsM×(2πrM-aM), calculate to obtain aoAnd aMTheoretical value (the i.e. a of theoretical correction piece aoAnd aMValue).By glass
Size (i.e. a of the base material plated film transmitance determination experiment to theoretical correction piece am、aoAnd aMValue) it is modified.Again will be revised
am、aoAnd aMThe actual value of value substitutes into formulaWithIt is calculated bM、bm、bo, obtain the size of trim tab b.When Coating Materials is many
Kind when, repeat step 3) trim tab a and trim tab b for the multiple coating films material can be produced.To various different platings
Membrane material design special trim tab a and trim tab b, overcomes the difference that different Coating Materials evaporate angle, improves made
The precision of standby rectangle linear variable filter.Examination film plating layer thickness using 250-300nm the reasons why be：Generally this
The transmitance tested under thickness has the interference peaks more than comparison, calculation error very little；The too thin then interference peaks of film layer are few, bad analysis,
And it is too thick then inaccurate.In addition, this thickness is to compare many (thickness of conventional plated film is in 100-300nm) used in industry.
The coated surface institute film plating layer of the glass baseplate is media coating.Original metal film is substituted using deielectric-coating, not only
Performance is lifted, and service life also can extend.
The media coating is the film layer overlapped by high refractive index layer and low-index film.Can be according to different need
Ask and design the overlapping film layer structure of multilayer, every kind of coating materials adopts corresponding one group of trim tab a, b, and in the mistake of alternate plating
Trim tab a, b are replaced in journey are used.
The high index film material is Ta2O5、Nb2O5、ZrO2Or TiO2, the low-refraction coating materials is SiO2Or MgF2。
The glass baseplate is K9 glass, BK7 glass or fused quartz FS.
The process units that a kind of method of the production rectangle linear variable filter is adopted, including workpiece plate, glass
Base material, evaporation source and evaporation source base plate；The workpiece plate is circular plate and can rotate around its central axis；During plated film, glass
Glass base material is fixed on the lower surface of the workpiece plate, and the plated film of glass baseplate faces down, and evaporation source base plate is located at workpiece plate lower section,
Evaporation source is located on the upper surface of the evaporation source base plate.
1. described glass baseplate is rectangular glass base material；
2. the process units also includes least one set trim tab a and trim tab b, according to the different choice pair of institute's film plating layer
The symmetrically placed center Axial and radial two in workpiece plate of the trim tab a that should be organized and trim tab b, every group of trim tab a and trim tab b
Side is simultaneously located between glass baseplate and evaporation source；When workpiece plate drives glass baseplate to rotate, when glass baseplate is respectively through amendment
When piece a and trim tab b positions, trim tab a and trim tab b can be existed to evaporation source evaporation coating materials partial occlusion with adjusting the film plating layer
Coating materials distribution on coated surface；
The trim tab a is to be corrected by theoretical correction piece a and obtained；
The inner terminal of glass baseplate coated surface is corresponded on trim tab a, outermost end position place workpiece plate lower surface is just being neutralized
The circular arc arc length of circumferential position uses respectively aM、ao、amRepresent；Setting amValue, amIt is worth for the 5-10% of workpiece plate radius size, institute
State a of theoretical correction piece aMAnd aoTheoretical value is calculated by below equation and obtained：
tsm×(2πrm-am)=tso×(2πro-ao)=tsM×(2πrM-aM)；
Wherein, h is vertical height of the workpiece plate center of circle to evaporation source base plate, and L is that evaporation source is evaporating with the workpiece plate center of circle
Vertical range between the upright projection point of source base plate, r is the deposition test that the workpiece plate center of circle is deposited on workpiece plate to coating materials
The radius of point A, tsThe thickness of deposition test point A being deposited on for coating materials on workpiece plate, tosRepresent that coating materials is deposited in workpiece plate
The thickness of the heart, ts/tosRepresent deposition test point A and central point thickness ratio, tsM、tso、tsmRespectively coating materials is deposited on glass base
The inner terminal of material coated surface, the thickness for just neutralizing this 3 points of outermost end position；rM、ro、rmRepresent the workpiece plate center of circle to film respectively
Material is deposited on the inner terminal of glass baseplate coated surface, is just neutralizing the radius of outermost end position；
The a of trim tab aM、aoAnd amActual value be that a layer thickness is being plated for 250- by examination on glass baseplate coated surface
300nm's plates material membrane and comes to theory according to the transmitance for determining each coated film deposition test point along workpiece plate diametric(al)
The a of trim tab aM、aoAnd amTheoretical value is modified and obtains, and correcting the trim tab a of gained can cause the thickness one of institute's film plating layer
Cause；
The inner terminal of glass baseplate coated surface is corresponded on the trim tab b, is just being neutralized under the workpiece plate of outermost end position place
The circular arc arc length of surface perimeter position is respectively bM、bo、bm, the bM、bm、boBy formulaWithIt is calculated；Wherein, aM、am、
aoUsing the actual value of trim tab a, λM、λo、λmRespectively Film Design require corresponding glass baseplate inner terminal, just neutralizing most
The corresponding wavelength of transmitance of outer end position.
The coated surface institute film plating layer of the glass baseplate is media coating.
The media coating is for high refractive index layer, low-index film or by high refractive index layer and low-index film
Film layer alternately.
The high index film material is Ta2O5、Nb2O5、ZrO2Or TiO2, the low-refraction coating materials is SiO2Or MgF2。
The glass baseplate is K9 glass, BK7 glass or fused quartz FS.
Compared with prior art, the present patent application has advantages below：
1) rectangle that the method and its process units for producing rectangle linear variable filter using the application is produced is linear
Gradual filter, the direction transmitance along rectangle substrate length linearly changes, and the transmitance at its fade rates and two ends is most
Big value and minimum of a value can be obtained by the shape of the design of membrane system and second-order correction piece, greatly improve the stability and device of preparation
The precision of part；
2) the clear transmitance gradual change by membrane system for wavelength is converted into by substrate of glass length direction by formula
Transmitance linear gradient, theoretically carried out the calculating of thicknesses of layers, change production mould simply in the past based on experience
Formula, reduces examination plating stove number, reduces production cost；
3) by from trim tab a, b of inverted triangle, can effectively change film thickness distribution, coating materials is improved as far as possible and is utilized
Rate.By secondary thickness amendment, the linear rate of dispersion of gradual change piece is improved；
4) replace original metal film to greatly improve the service life of film layer using deielectric-coating, reduce stress in thin film and improve
Adhesive force, media coating thickness control accuracy is high, and repeatability and stability are improved；
5) filter of different glass size of foundation base, different transmitances, different linear dispersions can be designed according to customer demand
Light film.
Description of the drawings
Fig. 1 is the section components position view of the process units of rectangle linear variable filter；
Fig. 2 is workpiece plate, trim tab and the glass baseplate of rectangle linear variable filter process units of the present invention
Position view；
Fig. 3 is the design curve and substrate of glass transmitance distribution map of rectangle linear variable filter of the present invention；
Fig. 4 is the filter coating spectrogram using the rectangle linear variable filter design described in the embodiment of the present invention.
Label declaration：Workpiece plate 1, trim tab a 21, trim tab b 22, glass baseplate 3, evaporation source base plate 4, evaporation source 5.
Specific embodiment
Technical scheme is described in detail with reference to Figure of description 1-4.
As Figure 1-4, a kind of method for producing rectangle linear variable filter of the present invention, it is by for making
The glass baseplate 3 for making optical filter is fixed on the lower surface of circular plate and the workpiece plate 1 that can be rotated around its central axis, is made
The plated film of glass baseplate 3 faces down, and evaporation source base plate 4 is arranged below workpiece plate 1 and positioned at the steaming of the upper surface of evaporation source base plate 4
Rise 5, workpiece plate 1 is driven in the rotary course of glass baseplate 3, the coating materials evaporated by evaporation source is come the plated film to glass baseplate 3
Face carries out plated film；
1. described glass baseplate 3 is rectangular glass base material；
2. Film Design was first carried out before plated film：Centre wavelength, transmitance according to required optical filter and along glass
The transmitance abbe number of the long side direction of glass base material 3 carries out Film Design using plated film software, determines coating layers, needed for per layer
The film thickness distribution situation of Coating Materials, per layer of institute's film plating layer along glass baseplate length direction；
3. in coating process, the diametric(al) for making the long edge workpiece plate 1 of the coated surface of glass baseplate 3 is placed；According to institute
Film plating layer select one group of corresponding trim tab a21 and trim tab b22, by the trim tab a21 and trim tab b22 it is symmetrically placed in
The central shaft radially opposite sides of workpiece plate 1 are simultaneously located between glass baseplate 3 and evaporation source 5；Workpiece plate 1 drives glass baseplate 3 to rotate
When, when glass baseplate 3 is through trim tab a21 positions, by trim tab a21 to evaporation source 5 evaporate coating materials partial occlusion come
The coating materials distribution on this layer of coated surface is adjusted, first time thicknesses of layers amendment is realized, makes coated surface plate a layer thickness consistent
Film layer, then when glass baseplate 3 is through trim tab b22 positions, by trim tab b22 the part of coating materials is evaporated to evaporation source 5
Block to adjust the distribution of the coating materials on this layer of coated surface, second thicknesses of layers amendment is realized, to institute's film plating layer along glass baseplate
The thickness distribution situation of length direction is modified, and so circulation is repeatedly to completing being coated with for equivalent layer film layer；Afterwards according under
One layer of institute's film plating layer selects new one group of corresponding trim tab a21 and the above-mentioned coating process of trim tab b22 repetitions, until obtaining institute
The rectangle linear variable filter for needing；
The inner terminal of the coated surface of glass baseplate 3 is corresponded on trim tab a21, is just being neutralized under outermost end position place workpiece plate 1
The circular arc arc length of surface perimeter position uses respectively aM、ao、amRepresent, the correspondence coated surface of glass baseplate 3 is most interior on trim tab b22
Hold, just neutralizing the circular arc arc length of the lower surface circumferential position of outermost end position place workpiece plate 1 to use b respectivelyM、bo、bmRepresent；
The trim tab a21 and trim tab b22 are prepared from accordance with the following methods：
Ith, the dimensional parameters of theoretical trim tab a are first calculated and theoretical correction piece a is produced：
Setting amTheoretical value, amIt is worth for the 5-10% of the radius size of workpiece plate 1, theory is calculated by below equation and is repaiied
The a of positive aMAnd aoTheoretical value, and theoretical correction piece a is produced according to the size of above-mentioned theory trim tab a：
tsm×(2πrm-am)=tso×(2πro-ao)=tsM×(2πrM-aM)；
Wherein, h is vertical height of the center of circle of workpiece plate 1 to evaporation source base plate 4, and L is that evaporation source 5 exists with the center of circle of workpiece plate 1
Vertical range between the upright projection point of evaporation source base plate 4, r is that the center of circle of workpiece plate 1 is deposited on sinking on workpiece plate 1 to coating materials
The radius of product test point A, tsThe thickness of deposition test point A being deposited on for coating materials on workpiece plate 1, tosRepresent that coating materials is deposited on work
The thickness at the center of part disk 1, ts/tosRepresent deposition test point A and central point thickness ratio, tsM、tso、tsmRespectively coating materials is deposited
Inner terminal in the coated surface of glass baseplate 3, the thickness for just neutralizing this 3 points of outermost end position；rM、ro、rmWorkpiece plate is represented respectively
1 center of circle is deposited on the inner terminal of the coated surface of glass baseplate 3 to coating materials, is just neutralizing the radius of outermost end position；
IIth, the size for trying plated film and revised theory trim tab a obtains trim tab a21：
Along workpiece plate 1 diametric(al) on workpiece plate lower surface fixed placement glass baseplate 3, first by theoretical correction piece a
The lower section of workpiece plate 1 is fixed on, glass baseplate 3 is blocked with the theoretical correction piece a, on the coated surface of glass baseplate 3
The corresponding film plating layer material requested film layer that a layer thickness is 250-300nm is plated, each is determined along the diametric(al) of workpiece plate 1 afterwards
The transmitance of coated film deposition test point is modified to the size of theoretical correction piece a, obtains a of trim tab a21m、aMAnd aoReality
Actual value so that along the transmission rate score of diametric each the plating film spot of workpiece plate on the coated surface of glass baseplate 3 after the completion of plated film
Unanimously so that the coating film thickness of the film plating layer is consistent, that is, complete the making of the trim tab a21 for this kind of Coating Materials；
IIIth, the making of trim tab b：By formulaWithCalculate bM、bm、boValue and produce amendment for this kind of Coating Materials
Piece b；Wherein, aM、am、aoThe actual value of the trim tab a21 obtained using step II, λM、λo、λmRespectively Film Design is required
The correspondence inner terminal of glass baseplate 3, the corresponding wavelength of transmitance for just neutralizing outermost end position.
The coated surface of the glass baseplate 3 plates each film layer for media coating.The media coating is by high refractive index film
The film layer that layer is overlapped with low-index film.The high index film material is Ta2O5、Nb2O5、ZrO2Or TiO2, it is described low
Refractive index coating materials is SiO2Or MgF2.The glass baseplate 3 is K9 glass, BK7 glass or fused quartz FS.
The process units that the method for the production rectangle linear variable filter is adopted, including workpiece plate 1, glass baseplate
3rd, evaporation source 5 and evaporation source base plate 4；The workpiece plate 1 is circular plate and can rotate around its central axis；During plated film, glass
Glass base material 3 is fixed on the lower surface of the workpiece plate 1, and the plated film of glass baseplate 3 faces down, and evaporation source base plate 4 is located at workpiece plate 1
Lower section, evaporation source 5 is located on the upper surface of the evaporation source base plate 4；
1. described glass baseplate 3 is rectangular glass base material；
2. the process units also includes least one set trim tab a21 and trim tab b22, according to the difference choosing of institute's film plating layer
The trim tab a21 and trim tab b22, every group of trim tab a21 and trim tab b22 for selecting correspondence group is symmetrically placed in workpiece plate 1
Central shaft radially opposite sides and be located between glass baseplate 3 and evaporation source 5；When workpiece plate 1 drives glass baseplate 3 to rotate, work as glass
When glass base material 3 is respectively through trim tab a21 and trim tab b22 positions, trim tab a21 and trim tab b22 can evaporate to evaporation source 5
Coating materials partial occlusion is distributed with adjusting coating materials of the film plating layer on coated surface；
The trim tab a21 is to be corrected by theoretical correction piece a and obtained；
The inner terminal of the coated surface of glass baseplate 3 is corresponded on trim tab a21, is just being neutralized under outermost end position place workpiece plate 1
The circular arc arc length of surface perimeter position uses respectively aM、ao、amRepresent；Setting amValue, amIt is worth for the 5- of the radius size of workpiece plate 1
10%, a of the theoretical correction piece aMAnd aoTheoretical value is calculated by below equation and obtained：
tsm×(2πrm-am)=tso×(2πro-ao)=tsM×(2πrM-aM)；
Wherein, h is vertical height of the center of circle of workpiece plate 1 to evaporation source base plate 4, and L is that evaporation source 5 exists with the center of circle of workpiece plate 1
Vertical range between the upright projection point of evaporation source base plate 4, r is that the center of circle of workpiece plate 1 is deposited on sinking on workpiece plate 1 to coating materials
The radius of product test point A, tsThe thickness of deposition test point A being deposited on for coating materials on workpiece plate 1, tosRepresent that coating materials is deposited on work
The thickness at the center of part disk 1, ts/tosRepresent deposition test point A and central point thickness ratio, tsM、tso、tsmRespectively coating materials is deposited
Inner terminal in the coated surface of glass baseplate 3, the thickness for just neutralizing this 3 points of outermost end position；rM、ro、rmWorkpiece plate is represented respectively
1 center of circle is deposited on the inner terminal of the coated surface of glass baseplate 3 to coating materials, is just neutralizing the radius of outermost end position；
The a of trim tab a21M、aoAnd amActual value be to be plating a layer thickness by examination on the coated surface of glass baseplate 3
250-300nm's plates material membrane and comes right according to the transmitance for determining each coated film deposition test point along workpiece plate diametric(al)
The a of theoretical correction piece aM、aoAnd amTheoretical value is modified and obtains, and corrected the trim tab a21 of gained and can cause institute's film plating layer
Consistency of thickness；
The inner terminal of the coated surface of glass baseplate 3 is corresponded on the trim tab b, outermost end position place workpiece plate 1 is just being neutralized
The circular arc arc length of lower surface circumferential position is respectively bM、bo、bm, the bM、bm、boBy formulaWithIt is calculated；Wherein, aM、am、
aoUsing the actual value of trim tab a21, λM、λo、λmRespectively Film Design require the inner terminal of corresponding glass baseplate 3, just neutralizing
The corresponding wavelength of transmitance of outermost end position.
The media coating that the coated surface institute film plating layer of the glass baseplate 3 is.The media coating be high refractive index layer,
Low-index film or the film layer replaced with low-index film by high refractive index layer.The high index film material is
Ta2O5、Nb2O5、ZrO2Or TiO2, the low-refraction coating materials is SiO2Or MgF2.The glass baseplate 3 is K9 glass, BK7 glass
Glass or fused quartz FS.
Embodiment 1
Target rectangle linear variable filter basic parameter：Gradual change leaf length L=50mm, incidence angle AOI=0 degree, center
Wavelength is 550nm, and 80% is incremented to from 20% along gradual change leaf length direction transmitance, linear change.
(1) K9 glass or fused quartz FS are selected as glass baseplate, coated surface length is 50mm, coated surface and its relative
Face is polishing；
(2) from Beijing instrument plant production DMD-450 coating machines, as shown in figure 1, workpiece plate be planar rondure in
Heart rolling clamp, its a diameter of 400mm.Evaporation source to vertical range L in the workpiece plate center of circle is 150mm, and the workpiece plate center of circle is to steaming
Vertical height h of base plate of rising is 380mm, and workpiece plate is rotated with edge bearing, and rotating speed is 20r/min；
(3) Film Design：Design linear filter coating using plated film software TFCalc, the number of plies of graded films by transmitance with
The steepness of wavelength change is confirming, bigger the used film layer number of steepness is more.High-index material is selected in the present embodiment design
TiO2With low-index material SiO2Alternating is coated on the coated surface of rectangular glass base material, as shown in Figure 3,4, is taken during design
550nm falls in the middle of substrate of glass as centre wavelength, 50% point of transmitance；Maximum of TMFall the one of substrate of glass
End, its corresponding design wavelength is 600nm, and transmitance is 80%；Minimum of a value TmFall in the other end of substrate of glass, its is corresponding
Design wavelength is 500nm, and transmitance is 20%；Linear dispersion is 2nm/mm.Designed graded films are by 14 layers of film layer group
Into, each film layer according to apart from glass baseplate coated surface from being closely followed successively by remote order：1st layer-thickness is the TiO of 119.7nm2
Film layer；2nd layer-thickness is the SiO of 83.3nm2Film layer；3rd layer-thickness is the TiO of 50.6nm2Film layer；4th layer-thickness is
94.2nm SiO2Film layer；5th layer-thickness is the TiO of 22.7nm2Film layer；6th layer-thickness is the SiO of 94.2nm2Film layer；7th
Layer-thickness is the TiO of 51.4nm2Film layer；8th layer-thickness is the SiO of 87.5nm2Film layer；9th layer-thickness is 59.8nm's
TiO2Film layer；10th layer-thickness is the SiO of 28.9nm2Film layer；11th layer-thickness is the TiO of 34.8nm2Film layer；12nd layer-thick
Spend the SiO for 90.6nm2Film layer；13rd layer-thickness is the TiO of 22.7nm2Film layer；14th layer-thickness is the SiO of 127.9nm2
Film layer；
(4) dimensional parameters of theoretical trim tab a are calculated：Glass baseplate is placed in its both ends and center institute on workpiece
Corresponding inside and outside radius is respectively 100mm, 125mm, 150mm.By point source film thickness distribution formulaAbove formula calculate the workpiece plate correspondence inside and outside film thickness distribution of glass baseplate is
0.929tos、0.892tos、0.845tos.Outer arc length a of setting trim tab amFor 30mm, according to 0.845tos×(2πrm-am)=
0.892tos×(2πro-ao)=0.929tos×(2πrM-aM), calculate interior middle arc length a of theoretical correction piece aMAnd ao(i.e. aM
And aoTheoretical value) be respectively 76mm and 65mm；
(5) examination plating：It is specific as follows to adjust the size of trim tab a after the size examination plating of theoretical correction piece a：Using glass
Base material plating monofilm test thickness distribution experiments, i.e., along workpiece plate diametric(al) on workpiece plate lower surface the row of fixed placement one
Glass baseplate, theoretical correction piece a is first fixed on the underface of workpiece plate, and being coated with thickness in monolayer on glass baseplate coated surface is
The TiO of 250-300nm2Film, determines the transmitance of each plating film spot to theoretical correction piece a sizes along workpiece plate diametric(al) afterwards
(i.e. to aM、aoAnd amTheoretical value be modified) be modified so that it is diametric along workpiece plate on glass baseplate coated surface
The thicknesses of layers of each plating film spot is consistent, that is, complete the making of trim tab a.Can obtain suitable for every kind of different institutes according to the method
The trim tab a of plating medium membrane material, for low-index material SiO2Trim tab a preparation method ibid.The present embodiment institute
Using high-index material TiO2Corresponding trim tab a 3 points of the arc length is respectively 68mm, 60mm, 30mm, low-refraction
Material SiO2Corresponding trim tab a 3 points of the arc length is respectively 81mm, 67mm, 30mm.Trim tab a be del, such as Fig. 2
It is shown；
(6) making of trim tab b：By gained high-index material TiO2With low-index material SiO2Corresponding trim tab
The a of aM、am、aoSubstitute into formulaWith
TiO is calculated to obtain respectively2The inside and outside 3 points b of trim tab correspondence substrate of glassM、bo、bmArc length is respectively 104mm, 75mm, 20mm, SiO2
The arc length that inside and outside 3 points of trim tab is respectively 87mm, 74mm, 20mm；
(7) it is coated with using trim tab a, b：Trim tab a, b are fixed on into the underface of workpiece plate, trim tab a, b's
Block and face down, and trim tab a and trim tab b opposite piece disks is substantially symmetrical about its central axis.During being coated with, the placement of glass baseplate
There is strict demand, its plated film faces down, coated surface long side direction need to be along the diametric(al) of flat board round piece disk, its glass
The two-end-point of base material is a with arc length on the trim tab a corresponding to itm、aMCircular arc and trim tab b on arc length be bm、bMCircle
Arc is on same circumference.Start evaporation source, workpiece plate drives glass baseplate with the rotational speed of 20r/min, as the Jing of glass baseplate 3
Crossing trim tab a21 positions and being corrected piece a21 and block carries out first time thickness amendment, is repaiied through trim tab b22 positions afterwards
Positive b22 is blocked carries out second thickness amendment, so thickness is modified repeatedly, that is, required rectangle is obtained linear gradually
Become optical filter.
The method and its device of production rectangle linear variable filter of the present invention is not only limited only to above-mentioned
Embodiment, every any improvement or replacement according to the principle of the invention, all should be within protection scope of the present invention.
Claims (10)
1. a kind of method for producing rectangle linear variable filter, it is will be fixed for making the glass baseplate (3) of optical filter
In circular plate and on the lower surface of workpiece plate (1) that can rotate around its central axis, the coated surface court of glass baseplate (3) is made
Under, in workpiece plate (1) lower section, evaporation source base plate (4) and the evaporation source (5) positioned at evaporation source base plate (4) upper surface, workpiece are set
Disk (1) is driven in glass baseplate (3) rotary course, and the coated surface of glass baseplate (3) is entered by the coating materials of evaporation source evaporation
Row plated film；It is characterized in that：
1. described glass baseplate (3) is rectangular glass base material；
2. Film Design was first carried out before plated film：Centre wavelength, transmitance according to required optical filter and along glass base
The transmitance abbe number of material (3) long side direction carries out Film Design using plated film software, determines coating layers, plating needed for per layer
The film thickness distribution situation of membrane material, per layer of institute's film plating layer along glass baseplate length direction；
3. in coating process, the diametric(al) for making the long edge workpiece plate (1) of glass baseplate (3) coated surface is placed；According to institute
Film plating layer selects one group of corresponding trim tab a (21) and trim tab b (22), and the trim tab a (21) and trim tab b (22) is right
Title is positioned over the central shaft radially opposite sides of workpiece plate (1) and is located between glass baseplate (3) and evaporation source (5)；Workpiece plate (1) band
When dynamic glass baseplate (3) rotates, when glass baseplate (3) is through trim tab a (21) position, by trim tab a (21) to evaporation
Source (5) evaporation coating materials partial occlusion come adjust the coating materials on this layer of coated surface distribution, realize first time thicknesses of layers amendment, make
Coated surface plates the consistent film layer of a layer thickness, then when glass baseplate (3) is through trim tab b (22) position, by amendment
Piece b (22) adjusts the distribution of the coating materials on this layer of coated surface to the partial occlusion of evaporation source (5) evaporation coating materials, realizes second film
Thickness degree amendment, is modified to thickness distribution situation of institute's film plating layer along glass baseplate length direction, so circulates repeatedly extremely
Complete being coated with for equivalent layer film layer；Afterwards new one group of corresponding trim tab a (21) is selected according to next layer of institute film plating layer and repaiied
Positive b (22) repeats above-mentioned coating process, until the rectangle linear variable filter needed for obtaining；
The inner terminal of glass baseplate (3) coated surface is corresponded on trim tab a (21), outermost end position place workpiece plate (1) is just being neutralized
The circular arc arc length of lower surface circumferential position uses respectively aM、ao、amRepresent, correspondence glass baseplate (3) coated surface on trim tab b (22)
Inner terminal, the circular arc arc length that just neutralizing outermost end position place workpiece plate (1) lower surface circumferential position use b respectivelyM、bo、bmGeneration
Table；
The trim tab a (21) and trim tab b (22) are prepared from accordance with the following methods：
Ith, the dimensional parameters of theoretical trim tab a are first calculated and theoretical correction piece a is produced：
Setting amTheoretical value, amIt is worth for the 5-10% of workpiece plate (1) radius size, theoretical correction is calculated by below equation
The a of piece aMAnd aoTheoretical value, and theoretical correction piece a is produced according to the size of above-mentioned theory trim tab a：
tsm×(2πrm-am)=tso×(2πro-ao)=tsM×(2πrM-aM)；
Wherein, h is vertical height of workpiece plate (1) center of circle to evaporation source base plate (4), and L is evaporation source (5) and workpiece plate (1) circle
Vertical range of the heart between the upright projection point of evaporation source base plate (4), r is deposited on workpiece for workpiece plate (1) center of circle to coating materials
The radius of deposition test point A on disk (1), tsFor the thickness that coating materials is deposited on deposition test point A on workpiece plate (1), tosTable
Show that coating materials is deposited on the thickness at workpiece plate (1) center, ts/tosRepresent deposition test point A and central point thickness ratio, tsM、tso、
tsmRespectively coating materials is deposited on the inner terminal of glass baseplate (3) coated surface, is just neutralizing the thickness of this 3 points of outermost end position；rM、
ro、rmRepresent that workpiece plate (1) center of circle is deposited on the inner terminal of glass baseplate (3) coated surface, is just neutralizing outermost end position to coating materials respectively
The radius put；
IIth, the size for trying plated film and revised theory trim tab a obtains trim tab a (21)：
Along workpiece plate (1) diametric(al) on workpiece plate lower surface fixed placement glass baseplate (3), first by theoretical correction piece a
The lower section of workpiece plate (1) is fixed on, glass baseplate (3) is blocked with the theoretical correction piece a, in the plating of glass baseplate (3)
The corresponding film plating layer material requested film layer that a layer thickness is 250-300nm is plated on face, afterwards along workpiece plate (1) diametric(al)
The transmitance for determining each coated film deposition test point is modified to the size of theoretical correction piece a, obtains trim tab a's (21)
am、aMAnd aoActual value so that along diametric each plated film of workpiece plate on glass baseplate (3) coated surface after the completion of plated film
The transmission rate score of point is consistent so that the coating film thickness of the film plating layer unanimously, that is, completes the trim tab for this kind of Coating Materials
The making of a (21)；
IIIth, the making of trim tab b：By formulaWithCalculate bM、bm、boValue and produce amendment for this kind of Coating Materials
Piece b；Wherein, aM、am、aoThe actual value of the trim tab a (21) obtained using step II, λM、λo、λmRespectively Film Design is required
Corresponding glass baseplate (3) inner terminal, just neutralizing the corresponding wavelength of transmitance of outermost end position.
2. it is according to claim 1 production rectangle linear variable filter method, it is characterised in that：The glass baseplate
(3) coated surface plates each film layer for media coating.
3. it is according to claim 2 production rectangle linear variable filter method, it is characterised in that：The media coating
It is the film layer overlapped by high refractive index layer and low-index film.
4. it is according to claim 3 production rectangle linear variable filter method, it is characterised in that：The high index of refraction
Coating materials is Ta2O5、Nb2O5、ZrO2Or TiO2, the low-refraction coating materials is SiO2Or MgF2。
5. it is according to claim 1 production rectangle linear variable filter method, it is characterised in that：The glass baseplate
(3) be K9 glass, BK7 glass or fused quartz FS.
6. the production dress that a kind of method that rectangle linear variable filter is produced according to any one of claim 1-5 is adopted
Put, including workpiece plate (1), glass baseplate (3), evaporation source (5) and evaporation source base plate (4)；The workpiece plate (1) is circular flat board
Shape and can rotate around its central axis；During plated film, glass baseplate (3) is fixed on the lower surface of the workpiece plate (1), glass baseplate
(3) plated film faces down, and, located at workpiece plate (1) lower section, evaporation source (5) is positioned at the evaporation source base plate (4) for evaporation source base plate (4)
On upper surface；It is characterized in that：
1. described glass baseplate (3) is rectangular glass base material；
2. the process units also includes least one set trim tab a (21) and trim tab b (22), according to the difference choosing of institute's film plating layer
Select correspondence group trim tab a (21) and trim tab b (22), every group of trim tab a (21) and trim tab b (22) it is symmetrically placed in
The central shaft radially opposite sides of workpiece plate (1) are simultaneously located between glass baseplate (3) and evaporation source (5)；Workpiece plate (1) drives glass base
Material (3) rotate when, when glass baseplate (3) is respectively through trim tab a (21) and trim tab b (22) position, trim tab a (21) and
Trim tab b (22) can evaporate coating materials partial occlusion to adjust coating materials distribution of the film plating layer on coated surface to evaporation source (5)；
The trim tab a (21) is to be corrected by theoretical correction piece a and obtained；
The inner terminal of glass baseplate (3) coated surface is corresponded on trim tab a (21), outermost end position place workpiece plate (1) is just being neutralized
The circular arc arc length of lower surface circumferential position uses respectively aM、ao、amRepresent；Setting amValue, amIt is worth for workpiece plate (1) radius size
5-10%, a of the theoretical correction piece aMAnd aoTheoretical value is calculated by below equation and obtained：
tsm×(2πrm-am)=tso×(2πro-ao)=tsM×(2πrM-aM)；
Wherein, h is vertical height of workpiece plate (1) center of circle to evaporation source base plate (4), and L is evaporation source (5) and workpiece plate (1) circle
Vertical range of the heart between the upright projection point of evaporation source base plate (4), r is deposited on workpiece for workpiece plate (1) center of circle to coating materials
The radius of deposition test point A on disk (1), tsFor the thickness that coating materials is deposited on deposition test point A on workpiece plate (1), tosTable
Show that coating materials is deposited on the thickness at workpiece plate (1) center, ts/tosRepresent deposition test point A and central point thickness ratio, tsM、tso、
tsmRespectively coating materials is deposited on the inner terminal of glass baseplate (3) coated surface, is just neutralizing the thickness of this 3 points of outermost end position；rM、
ro、rmRepresent that workpiece plate (1) center of circle is deposited on the inner terminal of glass baseplate (3) coated surface, is just neutralizing outermost end position to coating materials respectively
The radius put；
The a of trim tab a (21)M、aoAnd amActual value be to be plating a layer thickness by examination on glass baseplate (3) coated surface
250-300nm's plates material membrane and comes right according to the transmitance for determining each coated film deposition test point along workpiece plate diametric(al)
The a of theoretical correction piece aM、aoAnd amTheoretical value is modified and obtains, and corrected the trim tab a (21) of gained and can cause institute's film plating layer
Consistency of thickness；
The inner terminal of glass baseplate (3) coated surface is corresponded on the trim tab b, outermost end position place workpiece plate (1) is just being neutralized
The circular arc arc length of lower surface circumferential position is respectively bM、bo、bm, the bM、bm、boBy formulaWithIt is calculated；Wherein, aM、am、
aoUsing the actual value of trim tab a (21), λM、λo、λmCorresponding glass baseplate (3) inner terminal, just that respectively Film Design is required
The corresponding wavelength of transmitance of neutralization outermost end position.
7. process units according to claim 6, it is characterised in that：The coated surface institute film plating layer of the glass baseplate (3)
For media coating.
8. process units according to claim 7, it is characterised in that：The media coating is high refractive index layer, low folding
The film layer penetrated rate film layer or replaced with low-index film by high refractive index layer.
9. process units according to claim 8, it is characterised in that：The high index film material is Ta2O5、Nb2O5、ZrO2
Or TiO2, the low-refraction coating materials is SiO2Or MgF2。
10. process units according to claim 6, it is characterised in that：The glass baseplate (3) is K9 glass, BK7 glass
Or fused quartz FS.
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| CN109023280B (en) * | 2018-09-17 | 2020-12-01 | 深圳市三海科技有限公司 | Method for preparing color-gradient film by magnetron sputtering machine |
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| CN113249699B (en) * | 2021-05-13 | 2022-11-04 | 沈阳仪表科学研究院有限公司 | Method for preparing high-precision wavelength gradient optical filter based on magnetron sputtering technology and device adopted by method |
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| CN101692132A (en) * | 2008-12-22 | 2010-04-07 | 中国航天科技集团公司第五研究院第五一○研究所 | Linear gradient optical filter of 0.4 to 1.1 micrometers and preparation method thereof |
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