CN105908123A - Mask plate for vapor deposition coating of thin film solar cell - Google Patents
Mask plate for vapor deposition coating of thin film solar cell Download PDFInfo
- Publication number
- CN105908123A CN105908123A CN201610429347.7A CN201610429347A CN105908123A CN 105908123 A CN105908123 A CN 105908123A CN 201610429347 A CN201610429347 A CN 201610429347A CN 105908123 A CN105908123 A CN 105908123A
- Authority
- CN
- China
- Prior art keywords
- mask plate
- grid
- demarcation strip
- film solar
- thin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
- C23C14/042—Coating on selected surface areas, e.g. using masks using masks
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/04—Coating on selected surface areas, e.g. using masks
- C23C16/042—Coating on selected surface areas, e.g. using masks using masks
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Photovoltaic Devices (AREA)
- Physical Vapour Deposition (AREA)
Abstract
The invention discloses a mask plate for vapor deposition coating of a thin film solar cell. The mask plate comprises an outer frame and a plurality of partition boards in the outer frame; the mask plate is divided into a plurality of grids by the outer frame and the partition boards; each grid comprises four sides; a plurality of coating films with strip structures are formed in each grid; each of the partition boards is of a dispersed structure to enable at least one side of four sides of each grid to be provided with a gap; four apexes of each grid are all or partially open, so that the grid can accommodate a substrate with a convex angle at the apex angle. According to the mask plate disclosed by the invention, a gap for accommodating a tweezer and other tools exists around the grid, so that the substrate can be put into, taken out or adjusted steadily.
Description
Technical field
The present invention relates to the mask plate of a kind of plated film, particularly to one for thin-film solar cells gas
The mask plate of phase deposition plating.
Background technology
The material film that thin-film solar cells is generally had difference in functionality by multilamellar forms.Current thin film
Solaode is of a great variety, and common includes organic solar batteries, inorganic solar cell (amorphous
Silicon, cadmium telluride, CIS, GaAs etc.) and hybrid inorganic-organic solaode (perovskite
Etc.).The preparation of thin film can use solwution method (such as spin coating) or vapour deposition process (the trueest
Empty evaporation, magnetron sputtering etc.).
In general, metal material (such as the aluminum of electrode, silver and the calcium as electron transfer layer)
Many employing vapour deposition process plated films.Typically requiring use mask plate in vapour deposition process, mask plate is by multiple
The grid composition separated.One piece of glass substrate can be placed in each grid.Coating film area in grid is
Several strips side by side.The corresponding electrode of each strip.One of them electrode (edge
One) polarity several contrary with other.Other parts are then blocked by mask plate base.The thin film sun
Can the grid size of mask plate of battery be fixing, and match with the size of certain particular size substrate.
But there is many uncertain factors in the making of glass substrate and cutting technique, needs the most sometimes
By being accomplished manually last cutting step.The most manually break and be also possible to produce the point protruded during breaking
Angle, thus cause substrate cannot put in grid.If therefore causing the base crossed through multi-section PROCESS FOR TREATMENT
Sheet cannot be continuing with, and will cause the waste of substrate and material.
The grid size of mask plate is that fixing and with substrate size matches.But the size of substrate
Occasionally there are error, therefore may be stuck in bad adjustment in grid taking-up put into by substrate when.By
Surrounding in grid is closed cincture, is now difficult to adjust the position of substrate by instruments such as tweezers
Put.
Summary of the invention
In order to overcome the shortcoming of above-mentioned prior art, it is an object of the invention to provide one for thin film too
The mask plate of sun energy battery gas-phase deposition coating, can be easy to substrate adjustment in grid.
To achieve these goals, the technical solution used in the present invention is:
A kind of mask plate for thin-film solar cells gas-phase deposition coating, including housing 1 with outside being positioned at
Mask plate is separated into several grid 3 by the some demarcation strips 2 in frame 1, housing 1 and demarcation strip 2, often
Individual grid 3 has four edges 4, has the coating film area 5 of several elongate configuration in each grid 3, described point
Dividing plate 2 is discrete type structure, so that in the four edges 4 of described each grid 3, an at least tool
Jagged.
Described demarcation strip 2 is single segment structure, i.e. only have one section of demarcation strip 2 on a limit 4.
One section of described demarcation strip 2 is positioned at the centre position on corresponding limit 4.
Described demarcation strip 2 is two-stage structure, i.e. have two sections of demarcation strips 2 on a limit 4.
Space between described two sections of demarcation strips 2, is positioned at the position, middle on corresponding limit 4.
Described demarcation strip 2 is multi-segment structure, i.e. have multistage demarcation strip 2 on a limit 4.
Described demarcation strip 2 is single hop and multistage composite construction, i.e. a part of demarcation strip 2 is single segment structure,
A limit 4 has one section of demarcation strip 2；Another part demarcation strip 2 is multi-segment structure, on a limit 4
On have multistage demarcation strip 2.
Described demarcation strip 2 is not connected to mutually, and is also not connected to housing 1.
At least one vertex position of described each grid 3 is jagged, has the substrate of salient angle accommodating drift angle.
In described grid 3 in addition to coating film area 5, the masked plate of other parts blocks.
Compared with prior art, the four edges of grid is fixed by demarcation strip and housing, thus without affecting lattice
Son and the coupling of substrate, the four edges of grid also be enough to fix substrate simultaneously.The summit of grid is open,
Drift angle can be accommodated and have the substrate of salient angle.There is the space that can accommodate the instruments such as tweezers in the surrounding of grid,
It is easy to smoothly put into, takes out or adjust substrate.
Accompanying drawing explanation
Fig. 1 is traditional mask plate structure schematic diagram.
Fig. 2 is the schematic diagram that of mask plate of the present invention has 6 × 6 examples of totally 36 grid.
Fig. 3 is the schematic diagram of another example of mask plate of the present invention.
Detailed description of the invention
Embodiments of the present invention are described in detail below in conjunction with the accompanying drawings with embodiment.
Traditional mask plate is as it is shown in figure 1, be connected with each other between demarcation strip 2, and housing 1 and demarcation strip
2 is also to connect, and the grid 3 being consequently formed is all round closure, and substrate is limited in grid 3 completely
System, is not easy to adjust.
A kind of structure of the mask plate for thin-film solar cells plated film of the present invention as in figure 2 it is shown,
Including housing 1 and demarcation strip 2.Housing 1 and 2 mask plates of demarcation strip are divided into 6 × 6 36 altogether
Foursquare grid 3, each grid 3 can place one piece of substrate.Each quadrille four edges 4, limit 4
Position determined by housing 1 or demarcation strip 2.The demarcation strip 2 of grid each edge 4 is one section, length
It is about the 30% of the length of side.Demarcation strip 2 is positioned near the midpoint of grid each edge 4.Square lattice 3
Four summits open, can accommodate corner has the substrate of salient angle.Between demarcation strip 2 or demarcation strip 2
And the summit between housing 1 exists space, the instruments such as tweezers can be accommodated, it is simple to smoothly put into, take
Go out or adjust substrate.
Another kind of structure such as Fig. 3 institute of the mask plate for thin-film solar cells plated film of the present invention
Show, including housing 1 and demarcation strip 2.Housing 1 and 2 mask plates of demarcation strip are divided into 6 × 6 altogether 36
Individual square lattice 3, each grid 3 can place one piece of substrate.The demarcation strip 2 on the every limit 4 of grid 3 is
Two sections, every segment length is about the 30% of the length of side.Two sections of demarcation strips 2 lay respectively at each edge 4 midpoint
The right and left.Two sections of demarcation strips 2 the most do not contact the summit of square lattice 3.The four of square lattice 3
Individual summit is open, and can accommodate corner has the substrate of salient angle.Space is there is between two sections of demarcation strips 2, can
To accommodate the instruments such as tweezers.Tweezers put on the stress point of substrate and are positioned at the midpoint of two opposite side 4 of substrate,
Therefore stress balance, conveniently smoothly puts into, takes out or adjust substrate.
Other version of mask plate of the present invention, in a mask plate, demarcation strip 2 can have multiple
Form, can carry out the combination of single hop and multistage, by the apex portion of grid 3 or all can open,
To adapt to different substrate forms.
The foregoing is only an enforcement example of the present invention, be not limited to the present invention.For
For those skilled in the art, the present invention can have various modifications and variations.All the present invention's
Within spirit and principle, any modification, equivalent substitution and improvement etc. made, should be included in the present invention
Protection domain within.
Claims (10)
1. for the mask plate of thin-film solar cells gas-phase deposition coating, including housing (1) and
Mask plate is divided by the some demarcation strips (2) being positioned in housing (1), housing (1) and demarcation strip (2)
Being divided into several grid (3), each grid (3) has four edges (4), each grid to have in (3)
The coating film area (5) of several elongate configuration, it is characterised in that described demarcation strip (2) is discrete type
Structure, so that in the four edges (4) of described each grid (3), at least one has breach.
The most according to claim 1 for the mask plate of thin-film solar cells gas-phase deposition coating, its
Being characterised by, described demarcation strip (2) is single segment structure, i.e. upper only one section point a limit (4)
Dividing plate (2).
The most according to claim 2 for the mask plate of thin-film solar cells gas-phase deposition coating, its
Being characterised by, one section of described demarcation strip (2) is positioned at the centre position of corresponding limit (4).
The most according to claim 1 for the mask plate of thin-film solar cells gas-phase deposition coating, its
Being characterised by, described demarcation strip (2) is two-stage structure, i.e. have two sections of separations on a limit (4)
Plate (2).
The most according to claim 4 for the mask plate of thin-film solar cells gas-phase deposition coating, its
It is characterised by that the space between described two sections of demarcation strips (2) is positioned at the middle of corresponding limit (4)
Position.
The most according to claim 1 for the mask plate of thin-film solar cells gas-phase deposition coating, its
Being characterised by, described demarcation strip (2) is multi-segment structure, i.e. have multistage to separate on a limit (4)
Plate (2).
The most according to claim 1 for the mask plate of thin-film solar cells gas-phase deposition coating, its
Being characterised by, described demarcation strip (2) is single hop and multistage composite construction, i.e. a part of demarcation strip (2)
For single segment structure, a limit (4) has one section of demarcation strip (2)；Another part demarcation strip (2) is
Multi-segment structure, has multistage demarcation strip (2) on a limit (4).
The most according to claim 1 for the mask plate of thin-film solar cells gas-phase deposition coating, its
Being characterised by, described demarcation strip (2) is not connected to mutually, and is also not connected to housing (1).
The most according to claim 1 for the mask plate of thin-film solar cells gas-phase deposition coating, its
Being characterised by, at least one vertex position of described each grid (3) is jagged, has convex accommodating drift angle
The substrate at angle.
The most according to claim 1 for the mask plate of thin-film solar cells gas-phase deposition coating,
It is characterized in that, in described grid (3) in addition to coating film area (5), the masked plate of other parts blocks.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610429347.7A CN105908123B (en) | 2016-06-16 | 2016-06-16 | For the mask plate of thin-film solar cells gas-phase deposition coating |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610429347.7A CN105908123B (en) | 2016-06-16 | 2016-06-16 | For the mask plate of thin-film solar cells gas-phase deposition coating |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN105908123A true CN105908123A (en) | 2016-08-31 |
| CN105908123B CN105908123B (en) | 2018-07-06 |
Family
ID=56750275
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201610429347.7A Active CN105908123B (en) | 2016-06-16 | 2016-06-16 | For the mask plate of thin-film solar cells gas-phase deposition coating |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN105908123B (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109549460A (en) * | 2017-09-27 | 2019-04-02 | 佛山市顺德区美的电热电器制造有限公司 | Panel assembly and cooking apparatus with it |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101250685A (en) * | 2008-02-25 | 2008-08-27 | 信利半导体有限公司 | Method for preparing organic electroluminescent display mask plate |
| CN101752407A (en) * | 2009-12-31 | 2010-06-23 | 四川虹视显示技术有限公司 | OLED display, mask and mask alignment method thereof |
| CN201864769U (en) * | 2010-04-19 | 2011-06-15 | 潘宇强 | Metal mask plate structure for evaporating color of organic light emitting diode (OLED) display panel |
| CN102251212A (en) * | 2011-06-13 | 2011-11-23 | 中国科学院长春光学精密机械与物理研究所 | High-power semiconductor laser array mask device |
| CN202530150U (en) * | 2012-01-16 | 2012-11-14 | 昆山允升吉光电科技有限公司 | Evaporation mask plate |
-
2016
- 2016-06-16 CN CN201610429347.7A patent/CN105908123B/en active Active
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101250685A (en) * | 2008-02-25 | 2008-08-27 | 信利半导体有限公司 | Method for preparing organic electroluminescent display mask plate |
| CN101752407A (en) * | 2009-12-31 | 2010-06-23 | 四川虹视显示技术有限公司 | OLED display, mask and mask alignment method thereof |
| CN201864769U (en) * | 2010-04-19 | 2011-06-15 | 潘宇强 | Metal mask plate structure for evaporating color of organic light emitting diode (OLED) display panel |
| CN102251212A (en) * | 2011-06-13 | 2011-11-23 | 中国科学院长春光学精密机械与物理研究所 | High-power semiconductor laser array mask device |
| CN202530150U (en) * | 2012-01-16 | 2012-11-14 | 昆山允升吉光电科技有限公司 | Evaporation mask plate |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109549460A (en) * | 2017-09-27 | 2019-04-02 | 佛山市顺德区美的电热电器制造有限公司 | Panel assembly and cooking apparatus with it |
| CN109549460B (en) * | 2017-09-27 | 2021-10-26 | 佛山市顺德区美的电热电器制造有限公司 | Panel assembly and cooking utensil with same |
Also Published As
| Publication number | Publication date |
|---|---|
| CN105908123B (en) | 2018-07-06 |
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