CN105842929B - Display device - Google Patents

Display device Download PDF

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Publication number
CN105842929B
CN105842929B CN201510013971.4A CN201510013971A CN105842929B CN 105842929 B CN105842929 B CN 105842929B CN 201510013971 A CN201510013971 A CN 201510013971A CN 105842929 B CN105842929 B CN 105842929B
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layer
substrate
display device
spacers
pixel electrode
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CN105842929A (en
Inventor
刘侑宗
李淂裕
黄建达
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Innolux Corp
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Innolux Corp
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Abstract

The invention discloses a display device, which comprises a first substrate, a second substrate and a plurality of spacers. The first substrate includes a first substrate, a device structure, an insulating layer, a pixel electrode layer and a filling layer. The element structure is formed on the first substrate. An insulating layer is formed on the device structure. The insulating layer has at least one through hole. The pixel electrode layer is formed on the insulating layer, and a part of the pixel electrode layer extends into the through hole and is electrically connected with the element structure. The pixel electrode layer forms a groove portion corresponding to the perforation position. The filling layer is formed on the pixel electrode layer and fills the groove portion. The second substrate is arranged on the opposite side of the first substrate. The spacing pieces are positioned between the first substrate and the second substrate and are correspondingly arranged on the filling and leveling layer.

Description

Display device
Technical Field
The present invention relates to a display device, and more particularly, to a display device having a spacer disposed between two opposing substrates.
Background
Display devices play an important role in modern life. The application fields of the system are extended to televisions, desktop computers, notebook computers, flat panels, mobile devices, biomedical fields, industrial fields, traffic fields and the like. Display devices have been developed to date and include various categories such as CRT display devices, liquid crystal display devices, OLED display devices, plasma display devices, and the like. Among them, currently, the most common is the liquid crystal display device. Compared with the conventional CRT display device, the liquid crystal display device has the advantages of small volume, light weight, low radiation, power saving and the like. Improvements to various display devices have been continuously made.
Disclosure of Invention
The invention relates to an improvement of a display device.
According to some embodiments, a display device includes a first substrate, a second substrate, and a plurality of spacers. The first substrate includes a first substrate, a device structure, an insulating layer, a pixel electrode layer and a filling layer. The element structure is formed on the first substrate. An insulating layer is formed on the device structure. The insulating layer has at least one through hole. The pixel electrode layer is formed on the insulating layer, and a part of the pixel electrode layer extends into the through hole and is electrically connected with the element structure. The pixel electrode layer forms a groove portion corresponding to the perforation position. The filling layer is formed on the pixel electrode layer and fills the groove portion. The second substrate is arranged on the opposite side of the first substrate. The spacing pieces are positioned between the first substrate and the second substrate and are correspondingly arranged on the filling and leveling layer.
In order that the manner in which the above recited and other aspects of the present invention are obtained can be understood in detail, a more particular description of the invention, briefly summarized above, may be had by reference to the appended drawings, in which:
drawings
FIGS. 1-3 are schematic diagrams of a display device according to an embodiment;
FIG. 4 is a schematic view of a display device according to another embodiment;
fig. 5 and 6 are schematic diagrams of display devices according to different embodiments.
Description of the symbols
100: first substrate
102: a first substrate
104: component structure
106: insulating layer
108: perforation
110: pixel electrode layer
112: filling and leveling layer
114: alignment layer
116: scanning line
118: data line
120: thin film transistor
122: first interlayer insulating layer
124: second interlayer insulating layer
126: guide hole
128: buffer layer
130: bottom electrode
132: top electrode
134: passivation layer
200: second substrate
202: second base material
204: color filter layer
204B: blue region
204G: green color region
204R: red color region
206: black matrix layer
208: an upper cladding layer
210: alignment layer
300: liquid crystal layer
302: spacer member
1100: groove part
N: non-penetration region
T: penetration zone
Detailed Description
Referring to fig. 1 to 3, a display device according to an embodiment is shown. Fig. 3 is a sectional view taken along line a-a' in fig. 1 and 2. The display device includes a first substrate 100, a second substrate 200, and a plurality of spacers 302. The first substrate 100 includes a first substrate 102, an element structure 104, an insulating layer 106, a pixel electrode layer 110, and a filling layer 112. The device structure 104 is formed on the first substrate 102. An insulating layer 106 is formed over the device structure 104. The insulating layer 106 has at least one through hole 108. The pixel electrode layer 110 is formed on the insulating layer 106, and a portion of the pixel electrode layer 110 extends into the through hole 108 and is electrically connected to the element structure 104. The pixel electrode layer 110 forms a groove 1100 corresponding to the through hole 108. The filling-up layer 112 is formed on the pixel electrode layer 110 and fills up the groove portion 1100. The second substrate 200 is disposed at an opposite side of the first substrate 100. The spacers 302 are disposed between the first substrate 100 and the second substrate 200 and are correspondingly disposed on the filling layer 112.
Specifically, the device structure 104 of the first substrate 100 may include a plurality of scan lines 116, a plurality of data lines 118, and a plurality of thin film transistors 120. The spacers 302 are arranged along the scan lines 116. The device structure 104 of the first substrate 100 may further include a first interlayer insulating layer 122, a second interlayer insulating layer 124, a via 126, a buffer layer 128, and the like. The first interlayer insulating layer 122 and the second interlayer insulating layer 124 may be made of silicon nitride (SiN)x) And silicon oxide (SiO)x) And (4) forming. The pixel electrode layer 110 may be coupled to a via 126 penetrating the first interlayer insulating layer 122 and the second interlayer insulating layer 124 at the bottom of the through hole 108, and may be further coupled to the scan line 116, the data line 118 and the thin film transistor 120 through the via 126. In this embodiment, the thin film transistor 120 is exemplified by Low Temperature Polysilicon (LTPS), and may be applied to other active layer materials such as an oxide semiconductor layer in practical applications. The pixel electrode layer 110 may include a bottom electrode 130, a top electrode 132, and a passivation layer 134 isolating the two. The bottom electrode 130 and the top electrode 132 may be formed of Indium Tin Oxide (ITO), and the passivation layer 134 may be formed of silicon nitride (SiN)x) And (4) forming. Insulation boardThe insulating layer 106 and the fill-up layer 112 may be formed of a photosensitive material, such as acrylic or silicon-based material. By using photosensitive materials, the fill-up layer 112 can be formed over the entire structure and then the unwanted portions removed. In one embodiment, the insulating layer 106 and the fill layer 112 are formed of the same material. The upper surface of the filling layer 112 is located higher than the upper surface of the pixel electrode layer 110. In one embodiment, the filling layer 112 covers the pixel electrode layer 110 to a thickness of 0.5um to 2 um. The first substrate 100 may further include an alignment layer 114 formed on the pixel electrode layer 110 and the leveling layer 112, wherein the spacer 302 is disposed on the alignment layer 114. The alignment layer 114 may be formed of Polyimide (PI).
The second substrate 200 may include a second substrate 202, a color filter layer 204, and a black matrix layer 206. The black matrix layer is formed on the second substrate 202, and then the color filter layer 204 is formed. The color filter layer 204 includes, for example, a blue region 204B, a red region 204R, and a green region 204G. The black matrix layer 206 defines a transmissive region T and a non-transmissive region N of the display device, wherein the area not covered by the black matrix layer 206 is the transmissive region T, and the area covered by the black matrix layer 206 is the non-transmissive region N. The through holes 108 and the spacers 302 are disposed within the range shielded by the black matrix layer 206. The second substrate 200 may further include an upper cladding layer 208 covering the color filter layer 204 and the black matrix layer 206. The second substrate 200 may further include an alignment layer 210 formed on the upper cladding layer 208.
The display device may further include a liquid crystal layer 300 disposed between the first substrate 100 and the second substrate 200. The spacers 302 are located in the liquid crystal layer 300. The spacers may be photoresist type spacers.
In the display device according to the present invention, the area of surface flatness can be increased by adding the leveling layer. As a result, as shown in fig. 4, even if the position of the spacer is slightly shifted above the through hole, the spacer is not affected by the through hole and does not change in height, and the distance between the two substrates separated by the spacer is prevented from varying, thereby improving the uniformity of the substrate pitch. As the resolution of the display device is improved, the pixel area and the pitch are gradually reduced, and if the filling layer is not disposed, the spacer is likely to fall into the through hole due to the alignment error, thereby causing a local change in the distance between the two substrates. The distance between the two substrates has a great influence on the transmittance and chromaticity of light, and if the spacer falls into the through hole, the optical characteristics of the display device are not good. Therefore, the design of adding the leveling layer can improve the optical characteristics of the display device, such as contrast (contrast ratio) and the like.
Furthermore, since the filling layer is higher than the pixel electrode layer by a certain height, the spacer can be reduced in size as a whole while maintaining the same substrate spacing. Therefore, the range required to be shielded by the black matrix layer can be reduced, and the aperture ratio (aperture ratio) of the display device can be improved.
Here, for convenience, a liquid crystal display device will be described as an example. However, the present invention is not limited thereto, and any display device having a spacer disposed between two opposite substrates may be applicable.
Referring now to fig. 5 and 6, shown are display devices according to various embodiments. As shown in these two figures, the spacer 302 may be located between two vias 108. In one embodiment, as shown in FIG. 5, the leveling layer 112 may be in a band pattern. In another embodiment, as shown in FIG. 6, the leveling layer 112 may be an island pattern.
In summary, although the present invention has been disclosed in connection with the above preferred embodiments, it is not intended to limit the present invention. Those skilled in the art can make various changes and modifications without departing from the spirit and scope of the present invention. Therefore, the protection scope of the present invention should be subject to the definition of the appended claims.

Claims (10)

1. A display device, comprising:
a first substrate comprising:
a first substrate;
an element structure formed on the first substrate;
an insulating layer formed on the device structure, the insulating layer having at least one through hole;
a pixel electrode layer comprising:
a bottom electrode formed on the insulating layer;
a top electrode formed on the bottom electrode;
a passivation layer isolating the bottom electrode from the top electrode,
wherein, a part of the pixel electrode layer extends into the at least one through hole and is electrically connected with the element structure, and one of the bottom electrode and the top electrode forms a groove part corresponding to the at least one through hole; and
a filling layer formed on the top electrode and filling the groove;
the second substrate is arranged on the opposite side of the first substrate, wherein the second substrate comprises a black matrix layer; and
and a plurality of spacers located between the first substrate and the second substrate and correspondingly disposed on the filling layer, wherein one of the spacers, the through hole and the black matrix layer are overlapped in a normal direction of the first substrate.
2. The display device of claim 1, wherein the fill-level layer is in a stripe or island pattern.
3. The display device of claim 1, wherein the fill layer is coated on the top electrode to a thickness of 0.5um to 2 um.
4. The display device of claim 1, wherein the fill-up layer is formed of a light sensitive material.
5. The display device of claim 4, wherein the leveling layer is formed of acryl or silicon-based material.
6. The display device of claim 1, wherein the device structure of the first substrate comprises a plurality of scan lines, a plurality of data lines, and a plurality of thin film transistors, the plurality of spacers being arranged along the scan lines.
7. The display device of claim 1, further comprising:
and a liquid crystal layer disposed between the first substrate and the second substrate, wherein the spacers are disposed in the liquid crystal layer.
8. The display device of claim 1, wherein the first substrate further comprises:
an alignment layer formed on the top electrode and the leveling layer, wherein the plurality of spacers are disposed on the alignment layer.
9. The display device of claim 1, wherein the second substrate comprises:
a second substrate;
the black matrix layer is formed on the second substrate; and
and the color filter layer is formed on the second substrate.
10. The display device of claim 9, wherein the plurality of spacers are disposed within a range shielded by the black matrix layer.
CN201510013971.4A 2015-01-12 2015-01-12 Display device Active CN105842929B (en)

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CN105842929B true CN105842929B (en) 2020-12-29

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Publication number Priority date Publication date Assignee Title
CN106896610A (en) * 2017-02-24 2017-06-27 厦门天马微电子有限公司 Array base palte, display panel and display device
CN108333845A (en) * 2018-02-26 2018-07-27 武汉华星光电技术有限公司 The production method of array substrate, display panel and array substrate
CN112017534B (en) * 2019-05-31 2022-06-10 瀚宇彩晶股份有限公司 Flexible display device and manufacturing method thereof

Citations (4)

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Publication number Priority date Publication date Assignee Title
CN102508376A (en) * 2011-12-15 2012-06-20 深圳市华星光电技术有限公司 Liquid crystal display panel and manufacturing method thereof
CN103926747A (en) * 2013-01-11 2014-07-16 瀚宇彩晶股份有限公司 Liquid crystal display panel
CN104035231A (en) * 2013-03-07 2014-09-10 群创光电股份有限公司 Liquid crystal display panel and liquid crystal display device comprising same
CN104157612A (en) * 2014-08-21 2014-11-19 深圳市华星光电技术有限公司 Manufacture method of TFT array substrate, and structure of the TFT array substrate

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Publication number Priority date Publication date Assignee Title
KR101003829B1 (en) * 2004-04-30 2010-12-23 엘지디스플레이 주식회사 LCD with color-filter on TFT and method of fabricating of the same
CN102681276B (en) * 2012-02-28 2014-07-09 京东方科技集团股份有限公司 Array substrate, method for manufacturing same and display device comprising same

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102508376A (en) * 2011-12-15 2012-06-20 深圳市华星光电技术有限公司 Liquid crystal display panel and manufacturing method thereof
CN103926747A (en) * 2013-01-11 2014-07-16 瀚宇彩晶股份有限公司 Liquid crystal display panel
CN104035231A (en) * 2013-03-07 2014-09-10 群创光电股份有限公司 Liquid crystal display panel and liquid crystal display device comprising same
CN104157612A (en) * 2014-08-21 2014-11-19 深圳市华星光电技术有限公司 Manufacture method of TFT array substrate, and structure of the TFT array substrate

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