CN105821372B - A kind of evaporated device and alignment method - Google Patents
A kind of evaporated device and alignment method Download PDFInfo
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- CN105821372B CN105821372B CN201610177514.3A CN201610177514A CN105821372B CN 105821372 B CN105821372 B CN 105821372B CN 201610177514 A CN201610177514 A CN 201610177514A CN 105821372 B CN105821372 B CN 105821372B
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- 238000000034 method Methods 0.000 title claims abstract description 25
- 239000000758 substrate Substances 0.000 claims abstract description 78
- 238000001704 evaporation Methods 0.000 claims description 49
- 230000008020 evaporation Effects 0.000 claims description 49
- 230000005540 biological transmission Effects 0.000 claims description 22
- 238000007747 plating Methods 0.000 claims description 12
- 230000008569 process Effects 0.000 claims description 10
- 230000009471 action Effects 0.000 claims description 2
- 238000007740 vapor deposition Methods 0.000 claims 4
- 239000011248 coating agent Substances 0.000 description 20
- 238000000576 coating method Methods 0.000 description 20
- 238000009834 vaporization Methods 0.000 description 20
- 230000008016 vaporization Effects 0.000 description 20
- 238000010586 diagram Methods 0.000 description 3
- 238000001816 cooling Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000005484 gravity Effects 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 238000005019 vapor deposition process Methods 0.000 description 1
Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
- C23C14/042—Coating on selected surface areas, e.g. using masks using masks
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/50—Substrate holders
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
The present invention provides a kind of evaporated device and alignment methods, are related to display technology field, the aligning accuracy for improving substrate and mask plate to be deposited.The evaporated device includes：Vacuum chamber, it is installed on the indoor holding members of the vacuum chamber and base station, the holding members are located at the top of base station and can base station liftings relatively, the evaporated device further includes being installed in the vacuum chamber and liftable supporting member, during contraposition, the supporting member supports the intermediate region of the substrate to be deposited between the holding members and the mask plate.The evaporated device on substrate to be deposited for preparing required film.
Description
Technical Field
The invention relates to the technical field of display, in particular to evaporation equipment and an alignment method.
Background
An OLED (Organic Light-Emitting Diode) display device is a mainstream display device at present, and has many advantages of low power consumption, fast response speed, wide working range, easy implementation of flexible display, outstanding Light-dark ratio, high-quality color, and the like.
The OLED display device comprises a color resistance layer, wherein the color resistance layer comprises three color resistances of R (red), G (green) and B (blue), and the formation of RGB color resistance generally adopts a bottom-to-top evaporation process. The process of the bottom-up evaporation process is approximately as follows: place the mask plate on the base station in the coating by vaporization equipment, utilize the bearing member bearing of coating by vaporization equipment to treat the coating by vaporization base plate, descend the bearing member, make and treat that the coating by vaporization base plate descends to the position nearer apart from the mask plate, treat coating by vaporization base plate and mask plate and counterpoint, accomplish the back of counterpointing, will treat that the coating by vaporization base plate is placed on the mask plate, begin the coating by vaporization.
However, the above vapor deposition process has the following problems: because the edge of treating the coating by vaporization base plate is only supported to the bearing component, and treat that the coating by vaporization base plate itself is thinner, the ability of resisting the deformation is relatively poor, consequently treat under the effect of self gravity that the middle zone of coating by vaporization base plate can sink, the counterpoint precision between coating by vaporization base plate and the mask plate is treated in the influence, leads to the RGB look that finally obtains to hinder the skew of position, arouses the colour mixture.
Disclosure of Invention
The invention aims to provide evaporation equipment and an alignment method so as to improve the alignment precision between a substrate to be evaporated and a mask plate.
In order to achieve the purpose, the invention adopts the following technical scheme:
a first aspect of the present invention provides an evaporation apparatus, including: the vacuum chamber, install in bearing member and base station in the vacuum chamber, the bearing member is located the top of base station and can be relative the base station goes up and down, evaporation plating equipment is still including installing in the vacuum chamber and liftable's supporting member is waiting to evaporate the position in-process of substrate and mask plate, the supporting member is located the bearing member with between the mask plate, and support treat the middle zone of evaporation plating base plate.
According to the evaporation equipment provided by the invention, the supporting member is arranged between the mask plate and the bearing member for supporting the substrate to be evaporated, and when the substrate to be evaporated is aligned with the mask plate, the middle area of the substrate to be evaporated is supported by the supporting member so as to reduce the sinking amount of the middle area of the substrate to be evaporated.
The second aspect of the present invention provides a method for aligning, which is suitable for the evaporation apparatus provided in the first aspect of the present invention, and the method for aligning includes:
placing a mask plate on a base station of the evaporation equipment, placing a substrate to be evaporated on a bearing member of the evaporation equipment, wherein a support member of the evaporation equipment supports a middle area of the substrate to be evaporated;
synchronously lowering the holding member and the support member to a predetermined position;
and aligning the substrate to be evaporated with the mask plate.
The beneficial effects of the counterpoint method provided by the invention are the same as those of the evaporation equipment provided by the invention, and the details are not repeated here.
Drawings
In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings used in the description of the embodiments or the prior art will be briefly described below, it is obvious that the drawings in the following description are only some embodiments of the present invention, and for those skilled in the art, other drawings can be obtained according to the drawings without creative efforts.
Fig. 1 is a schematic structural diagram of an evaporation apparatus according to a first embodiment of the present invention;
fig. 2 is a schematic structural diagram of a supporting member in an evaporation apparatus according to a first embodiment of the present invention;
fig. 3a is a first front view of a support column in an evaporation apparatus according to a first embodiment of the present invention;
fig. 3b is a second front view of a support column in an evaporation apparatus according to the first embodiment of the present invention;
fig. 3c is a third front view of a support column in an evaporation apparatus according to a first embodiment of the present invention;
fig. 3d is a front view of a support column in the evaporation apparatus according to the first embodiment of the present invention;
fig. 4 is a schematic structural diagram of a supporting member in an evaporation apparatus according to a second embodiment of the present invention.
Description of reference numerals:
1-a vacuum chamber; 2-a cooling plate moving member;
3-cooling the plate; 4-a substrate to be evaporated;
5-a holding member; 6-substrate pallet;
7-a substrate pallet moving member; 8-a support member;
81-support column; 81A-support post body;
81B-support block; 82A-first folding bar;
82B-second folding bar; 82C-third folding bar;
9-a transmission member; 91-a rotating shaft;
91A-first shaft; 91B-a second shaft;
92-a mandrel; 93-a chain;
93A-a first chain; 93B-a second chain;
94A, 94B-gear; 94C — first gear;
94D-second gear; 94E-third gear;
94F-fourth gear; 10-a mask plate;
11-a base station; 12-a mask frame;
13-a mask plate frame fixing member; 14-lifting rod.
Detailed Description
In order to make the aforementioned objects, features and advantages of the present invention comprehensible, embodiments accompanied with figures are described in detail below. It is to be understood that the described embodiments are merely exemplary of the invention, and not restrictive of the full scope of the invention. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
Example one
As shown in fig. 1, the present embodiment provides an evaporation apparatus including a vacuum chamber 1, a holding member 5, a base 11, and a support member 8, wherein the holding member 5 and the base 11 are installed in the vacuum chamber 1, and the holding member 5 is located above the base 11 and can be lifted and lowered with respect to the base 11; the supporting member 5 is used for supporting the edge of the substrate 4 to be evaporated during evaporation; the base station 11 is used for supporting a mask plate 10 used in evaporation; the supporting member 8 is installed on the side wall of the vacuum chamber 1 and has a liftable characteristic; in the alignment process of the substrate 4 to be evaporated and the mask plate 10, the supporting member 8 is located between the supporting member 5 and the mask plate 10 and is used for supporting the middle area of the substrate 4 to be evaporated, and preferably, when the supporting member 8 supports the middle area of the substrate 4 to be evaporated, the supporting surface of the supporting member 8 and the supporting surface of the supporting member 5 supporting the edge of the substrate 4 to be evaporated are located in the same horizontal plane.
During the use, bearing member 5 supports the edge of treating coating by vaporization base plate 4, and supporting member 8 supports the middle zone of treating coating by vaporization base plate 4, and bearing member 5 and supporting member 8 descend to predetermined position in step, because the holding surface of supporting member 8 and the holding surface that bearing member 5 supported the edge of treating coating by vaporization base plate 4 are in same horizontal plane for treat that coating by vaporization base plate 4 and mask plate 10 carry out the counterpoint in-process, can keep the middle zone of treating coating by vaporization base plate 4 level. Therefore, compared with the prior art that the middle area of the substrate to be vapor-deposited has a large sinking amount for alignment, in the alignment process, the sinking amount of the middle area of the substrate 4 to be vapor-deposited is small according to the technical scheme provided by the embodiment, so that the alignment accuracy of the substrate 4 to be vapor-deposited and the mask plate 10 is remarkably improved.
In addition, since the sinking amount of the middle region of the substrate to be vapor-deposited is large in the prior art, in order to keep the substrate to be vapor-deposited and the mask plate from contacting each other during alignment, the distance between the substrate to be vapor-deposited and the mask plate has to be increased, which undoubtedly causes further reduction in alignment accuracy. In this embodiment, since the support member 8 can support the middle region of the substrate 4 to be vapor-deposited, and the amount of sinking of the middle region of the substrate 4 to be vapor-deposited is small, the substrate 4 to be vapor-deposited can be lowered to a position very close to the mask plate 10 to perform alignment, thereby further improving the alignment accuracy.
In order to support the middle region of the substrate 4 to be vapor-deposited, the supporting member 8 may have a plurality of specific structures, in this embodiment, the supporting member 8 adopts a matching structure of a supporting column 81 and a mechanical arm, wherein the supporting column 81 is installed at one end of the mechanical arm, and in the alignment process of the substrate 4 to be vapor-deposited and the mask plate 10, the upper end of the supporting column 81 supports the middle region of the substrate 4 to be vapor-deposited. The other end of the robot arm is mounted on the side wall of the vacuum chamber 1 for supporting and fixing the supporting column 81. Preferably, a mechanical arm may be horizontally located between the supporting member 5 and the mask plate 10, and the supporting column 81 is vertically installed at an end of the mechanical arm, so that the supporting column 81 supports a middle region of the substrate 4 to be evaporated. In the present embodiment, the phrase "one end of the robot arm is attached to the side wall of the vacuum chamber 1" may mean that one end of the robot arm is directly attached to the side wall of the vacuum chamber 1, or that one end of the robot arm is indirectly attached to the side wall of the vacuum chamber 1 through some members.
As shown in fig. 1 to 2, after the substrate 4 to be evaporated is aligned with the mask plate 10, the substrate 4 to be evaporated needs to be placed on the mask plate 10 to complete the evaporation of the substrate 4 to be evaporated, and it can be seen that before the substrate 4 to be evaporated is placed on the mask plate 10, the support member 8 needs to be withdrawn to prevent the support member 8 from blocking the substrate 4 to be evaporated. In order to facilitate the retraction of the support member 8, the robot arm may preferably adopt a foldable structure, which not only increases the length of the robot arm to facilitate the support columns 81 to support a large area of the substrate 4 to be evaporated, but also saves the space occupied by the support member 8.
For the above solution in which the robot arm is of a foldable structure, the robot arm may preferably be of a two-stage foldable structure. Specifically, the robot arm includes a first folding bar 82A, a second folding bar 82B, and a transmission member 9, wherein one end of the second folding bar 82B is mounted on the sidewall of the vacuum chamber 1, and the other end of the second folding bar is hinged to one end of the first folding bar 82A; the other end of the first folding rod 82A is provided with a support column 81; the driving member 9 is connected to the first folding lever 82A and drives the first folding lever 82A to rotate.
Further, in order to save the occupied space of the supporting member 8 to the maximum, the length of the second folding bar 82B may be no less than that of the first folding bar 82A, so that the first folding bar 82A can be completely overlapped with the second folding bar 82B after folding, and the shape of the folded mechanical arm can be seen in the dotted line in fig. 2 for such a completely overlapped situation.
Referring again to fig. 2, for the solution described above in which the robot arm is of a two-stage folding structure, the transmission member 9 may include: a mandrel 92, one end of the mandrel 92 is installed on the side wall of the vacuum chamber 1, the other end of the mandrel 92 is connected with the second folding rod 82B, the mandrel 92 can rotate around the axis of the mandrel 92, and a gear 94B is arranged on the mandrel 92; the rotating shaft 91, the first folding rod 82A is hinged with the second folding rod 82B through the rotating shaft 91, the rotating shaft 91 is fixedly connected with the first folding rod 82A, and the rotating shaft 91 is provided with a gear 94A; and a chain 93 engaged with the gear 94A of the rotating shaft 91 and the gear 94B of the spindle 92.
Based on the structure of above-mentioned drive member 9, when needing to treat that evaporation plating base plate 4 supports, dabber 92 rotates, it sets up gear 94B on self to drive and rotates, thereby drive the chain 93 transmission of meshing on gear 94B, the chain 93 transmission drives the gear 94A who sets up on pivot 91 and rotates, and then drive pivot 91 and rotate, pivot 91 rotates and drives first folding rod 82A and expand, make the support column 81 of first folding rod 82A tip move to the below of treating evaporation plating base plate 4, and act on the middle zone of treating evaporation plating base plate 4, the realization is treated the support of evaporation plating base plate 4.
As can be imagined from the above-mentioned transmission process of the transmission member 9 when the substrate 4 to be vapor-deposited needs to be supported, when the support member 8 needs to be withdrawn after the alignment is completed, the core shaft 92 rotates in the opposite direction (relative to the rotation direction when the substrate 4 to be vapor-deposited needs to be supported), and in turn drives the gear 94B to rotate, the chain 93 to transmit, the gear 94A to rotate, and the rotating shaft 91 to rotate, so that the first folding rod 82A is folded, and the withdrawal of the support member 8 is realized.
For the above-mentioned structure that the robot arm is folded in two stages, the second folding rod 82B may preferably be a hollow structure, so as to conveniently install the chain 93 inside the second folding rod 82B, thereby saving the occupied space of the chain 93 inside the vacuum chamber 1 and simplifying the internal structure of the vacuum chamber 1.
For the solution that the second folding bar 82B has a hollow structure, the gear 94A on the rotating shaft 91 and the gear 94B on the mandrel 92 can be disposed inside the second folding bar 82B, so as to save the occupied space of the transmission member 9 inside the vacuum chamber 1 and simplify the internal structure of the vacuum chamber 1.
In this embodiment, the supporting member 8 is capable of being lifted, and in order to realize the lifting function of the supporting member 8, it is preferable that a robot arm of the supporting member 8 is installed on the sidewall of the vacuum chamber 1 through the lifting rod 14, that is, one end of the lifting rod 14 is connected to one end of the robot arm 82 away from the supporting column 81, the other end of the lifting rod 14 is installed on the sidewall of the vacuum chamber 1, and the lifting rod 14 can drive the supporting member 8 to be lifted. Further, the lifting rod 14 may be designed as a hollow structure, and the axis of the mandrel 92 is disposed inside the lifting rod 14, so as to save the occupied space of the mandrel 92 inside the vacuum chamber 1 and simplify the internal structure of the vacuum chamber 1.
In order to better support the middle area of the substrate 4 to be evaporated and to make the substrate 4 to be evaporated more flat in the alignment process, the number of the support members 8 may be multiple, and during the alignment, the support posts 81 of each support member 8 are supported in the middle area of the substrate 4 to be evaporated, and the acting positions are preferably distributed symmetrically with respect to the center of the substrate 4 to be evaporated, so that the support range of the middle area of the substrate 4 to be evaporated is enlarged, and the sinking amount of the middle area of the substrate 4 to be evaporated is reduced.
In the alignment process of the substrate 4 to be vapor-deposited and the mask plate 10, the closer the distance between the substrate 4 to be vapor-deposited and the mask plate 10 is, the higher the alignment accuracy is, so that on the premise that the supporting columns 81 have sufficient supporting strength to the substrate 4 to be vapor-deposited, the smaller the length of the supporting columns 81 is, the more the alignment accuracy can be increased to the maximum extent. Preferably, the length of the supporting column 81 may be 1mm to 30 mm.
The specific structure of the supporting column 81 can be various. For example, as shown in fig. 3a, the support column 81 may include a support column main body 81A and a support block 81B disposed at an upper end of the support column main body 81A, wherein the support column main body 81A may have a cylindrical structure, and the support block 81B has a hemispherical structure, such a structure may reduce a contact area between the support column 81 and the substrate 4 to be evaporated, and reduce damage to the substrate 4 to be evaporated.
Alternatively, as shown in fig. 3B, the supporting column 81 may include a supporting column main body 81A and a supporting block 81B, wherein the supporting column main body 81A is a cylindrical structure, the supporting block 81B is a cylindrical structure disposed at an upper end of the supporting column main body 81A, and a diameter of the supporting block 81B is smaller than a diameter of the supporting column main body 81A, so as to reduce a contact area between the supporting column 81 and the substrate 4 to be evaporated, and reduce damage to the substrate 4 to be evaporated.
Alternatively, as shown in fig. 3c, the support column 81 may include a support column main body 81A and a support block 81B, wherein the support column main body 81A is a cylindrical structure, the support block 81B is a truncated cone-shaped structure disposed at an upper end of the support column main body 81A, a surface of the support block 81B far away from the support column main body 81A is an upper surface, and a diameter of the upper surface of the support block 81B is larger than that of the support column main body 81A, such a structure can increase a contact area between the support column 81 and the substrate 4 to be evaporated, thereby providing a larger support force for the substrate 4 to be evaporated.
Alternatively, as shown in fig. 3d, the supporting column 81 has a cylindrical structure, so as to simplify the structure of the supporting column 81 and reduce the production cost.
Example two
In order to further reduce the occupied space of the supporting member 8 and increase the supporting strength of the supporting member 8 on the substrate 4 to be evaporated, the preferred robot arm may also adopt a three-stage folding structure.
As shown in fig. 4, the robot arm 82 includes a first folding bar 82A, a second folding bar 82B, a third folding bar 82C, and a transmission member 9, wherein one end of the third folding bar 82C is fixedly mounted on the sidewall of the vacuum chamber 1, and the other end is hinged to one end of the second folding bar 82B; the other end of the second folding rod 82B is hinged to one end of the first folding rod 82A, and the other end of the first folding rod 82A is provided with a support column 81; the driving member 9 is connected to the first folding lever 82A and serves to drive the rotation of the first folding lever 82A.
Further, in order to save the occupied space of the supporting member 8 to the maximum, the length of the second folding bar 82B may be no less than that of the first folding bar 82A, and the length of the third folding bar 82C may be no less than that of the second folding bar 82B, so that the first folding bar 82A can be completely overlapped with the second folding bar 82B after being folded; alternatively, the second folding bar 82B can completely overlap with the third folding bar 82C, and for this completely overlapping situation, the folded shape of the robot arm 82 can be seen in fig. 4 with a dashed line.
Referring again to fig. 4, for a three-segment folding solution of the robot arm, the transmission member 9 may include: a mandrel 92, one end of the mandrel 92 is installed on the side wall of the vacuum chamber 1, the other end of the mandrel 92 is connected with the third folding rod 82C, the mandrel 92 can rotate around the axis of the mandrel 92, and a fourth gear 94F is arranged on the mandrel 92; the second rotating shaft 91B, the second folding rod 82B is hinged to the third folding rod 82C through the second rotating shaft 91B, the second rotating shaft 91B is fixedly connected with the second folding rod 82B, and the second rotating shaft 91B is provided with a second gear 94D and a third gear 94E; the first rotating shaft 91A is hinged with the second folding rod 82B through the first rotating shaft 91A, the first rotating shaft 91A is fixedly connected with the first folding rod 82A, and the first rotating shaft 91A is provided with a first gear 94C; a first chain 93A, the first chain 93A meshing with the first gear 91C and the second gear 94D; and a second chain 93B engaged with the third gear 94E and the fourth gear 94F.
Based on the structure of the above-mentioned transmission member 9, when the substrate 4 to be vapor-deposited is to be supported, the mandrel 92 rotates, the fourth gear 94F disposed on the mandrel 92 is driven to rotate, so as to drive the second chain 93B engaged with the fourth gear 94F to rotate, the second chain 93B drives the third gear 94E disposed on the second rotating shaft 91B to rotate, so as to drive the first chain 93A engaged with the third gear 94E to rotate, the first chain 93A drives the second gear 94D disposed on the second rotating shaft 91B to rotate, and further drives the first rotating shaft 91A to rotate, the first rotating shaft 91A drives the first folding rod 82A to unfold, so that the supporting column 81 at the end of the first folding rod 82A moves to the middle region below the substrate 4 to be vapor-deposited to support the substrate 4 to be vapor-deposited.
It can be imagined from the above-mentioned transmission process of transmission member 9 when needing to support evaporation plating base plate 4, when need withdraw support member 8 after the counterpoint is accomplished, spindle 92 rotates in the opposite direction (for the rotation direction when needing to treat evaporation plating base plate 4 to support), drive fourth gear 94F in proper order and rotate, second chain 93B transmission, third gear 94E rotates, second pivot 91B rotates, second gear 94C rotates, first chain 93A transmission, first gear 94C, first pivot 91A rotates to first folding rod 82A is folded, realizes withdrawing to support member 8.
In the three-stage folding structure of the present embodiment, the second folding rod 82B and the third folding rod 82C are preferably hollow structures, so as to conveniently install the first chain 93A inside the second folding rod 82B, and the second chain 93B inside the third folding rod 82C, thereby saving the occupied space of the transmission member 9 and simplifying the internal structure of the vacuum chamber 1.
In this embodiment, the supporting member 8 is capable of being lifted, and in order to realize the lifting function of the supporting member 8, it is preferable that a robot arm of the supporting member 8 is installed on the sidewall of the vacuum chamber 1 through the lifting rod 14, that is, one end of the lifting rod 14 is connected to one end of the robot arm 82 away from the supporting column 81, the other end of the lifting rod 14 is installed on the sidewall of the vacuum chamber 1, and the lifting rod 14 can drive the supporting member 8 to be lifted. Further, the lifting rod 14 may be designed as a hollow structure, and the axis of the mandrel 92 is disposed inside the lifting rod 14, so as to save the occupied space of the mandrel 92 inside the vacuum chamber 1 and simplify the internal structure of the vacuum chamber 1.
In this embodiment, the design of the number and distribution of the supporting members 8, the length and the specific structure of the supporting columns 81, and the like can be referred to the design of the corresponding parts in the first embodiment, and the details are not repeated herein.
EXAMPLE III
The embodiment provides a contraposition method, which is suitable for the evaporation equipment of the first embodiment and the second embodiment, and referring to fig. 1, the contraposition method includes the following steps:
step S1: placing a mask plate 10 on a base platform 11 of an evaporation device, placing a substrate 4 to be evaporated on a bearing member 5 of the evaporation device, and supporting a middle area of the substrate 4 to be evaporated by using a supporting member 8 of the evaporation device;
step S2: synchronously lowering the supporting member 5 and the supporting member 8 to a predetermined position;
step S3: and aligning the substrate 4 to be evaporated and the mask plate 10.
Among the prior art, when will treating coating by vaporization base plate and mask plate counterpoint, make the middle zone of treating the coating by vaporization base plate sink easily because of the action of gravity to cause to treat that the counterpoint precision between coating by vaporization base plate and the mask plate is not high, influence the coating by vaporization effect. According to the technical scheme provided by the embodiment, the supporting member 8 can support the middle area of the substrate 4 to be evaporated, so that the middle area of the substrate 4 to be evaporated does not sink in the whole alignment process, and therefore the alignment accuracy of the substrate 4 to be evaporated and the mask plate 10 can be remarkably improved.
Moreover, the supporting member 8 supports the middle region of the substrate 4 to be vapor-deposited, so that the substrate 4 to be vapor-deposited is kept flat, and therefore, on the premise that the substrate 4 to be vapor-deposited is not in contact with the mask plate 10, the substrate 4 to be vapor-deposited can be lowered to a position very close to the mask plate, and therefore the alignment precision is further improved.
The above description is only for the specific embodiments of the present invention, but the scope of the present invention is not limited thereto, and any changes or substitutions that can be easily conceived by those skilled in the art within the technical scope of the present invention are included in the scope of the present invention. Therefore, the protection scope of the present invention shall be subject to the protection scope of the appended claims.
Claims (12)
1. An evaporation apparatus comprising: the vacuum chamber, install in bearing member and base station in the vacuum chamber, the bearing member is located the top of base station and can be relative the base station goes up and down, its characterized in that, evaporation plating equipment still including install in the vacuum chamber and liftable supporting member, at the counterpoint in-process of treating evaporation plating base plate and mask plate, supporting member is located the bearing member with between the mask plate, and support treat the middle zone of evaporation plating base plate.
2. The evaporation apparatus according to claim 1, wherein the support member comprises a robot arm having one end mounted on the sidewall of the vacuum chamber, and the other end of the robot arm is provided with a support column, and during alignment of the substrate to be evaporated and the mask plate, an upper end of the support column abuts against a middle region of the substrate to be evaporated.
3. The evaporation apparatus according to claim 2, wherein the robot arm is foldable, and comprises a first folding rod, a second folding rod and a transmission member; wherein,
one end of the second folding rod is fixedly arranged on the side wall of the vacuum chamber;
one end of the first folding rod is hinged with the other end of the second folding rod, and the other end of the first folding rod is provided with the supporting column;
the transmission member is connected with the first folding rod and used for driving the first folding rod to rotate.
4. The vapor deposition apparatus according to claim 3, wherein the transmission member comprises:
one end of the mandrel is installed on the side wall of the vacuum chamber, the other end of the mandrel is connected with the second folding rod, and the mandrel can rotate around the axis of the mandrel;
the first folding rod is hinged with the second folding rod through the rotating shaft, and the rotating shaft is fixedly connected with the first folding rod;
and the chain is respectively connected with the gear on the rotating shaft and the gear on the mandrel.
5. The evaporation apparatus according to claim 4, wherein the second folding bar is a hollow structure, and the chain is disposed inside the second folding bar.
6. The evaporation apparatus according to claim 2, wherein the robot arm is foldable, and comprises a first folding rod, a second folding rod, a third folding rod and a transmission member; wherein,
one end of the third folding rod is fixedly arranged on the side wall of the vacuum chamber;
one end of the second folding rod is hinged with the other end of the third folding rod;
one end of the first folding rod is hinged with the other end of the second folding rod, and the other end of the first folding rod is provided with the supporting column;
the transmission member is connected with the first folding rod and used for driving the first folding rod to rotate.
7. The vapor deposition apparatus according to claim 6, wherein the transmission member comprises:
the mandrel is provided with a fourth gear, one end of the mandrel is installed on the side wall of the vacuum chamber, the other end of the mandrel is connected with the third folding rod, and the mandrel can rotate around the axis of the mandrel;
the second rotating shaft is provided with a second gear and a third gear, the second folding rod is hinged with the third folding rod through the second rotating shaft, and the second rotating shaft is fixedly connected with the second folding rod;
the first folding rod is hinged with the second folding rod through the first rotating shaft, and the first rotating shaft is fixedly connected with the first folding rod;
a first chain respectively connecting the first gear and the second gear;
and the second chain is respectively connected with the third gear and the fourth gear.
8. The evaporation apparatus according to claim 7, wherein the second folding bar and the third folding bar are both hollow structures, the first chain is disposed inside the second folding bar, and the second chain is disposed inside the third folding bar.
9. The evaporation apparatus according to any one of claims 4, 5, 7 or 8, further comprising a lifting rod, wherein the lifting rod is connected to an end of the robot arm away from the support column, the robot arm is mounted on the side wall of the vacuum chamber through the lifting rod, and the lifting rod is used for driving the support member to lift and lower;
the lifter is hollow structure, the dabber set up in the inside of lifter.
10. The evaporation apparatus according to claim 1, wherein the number of the support members is plural, and in the alignment process between the substrate to be evaporated and the mask plate, the action positions of the support columns of each support member supported on the substrate to be evaporated are symmetrically distributed with respect to the center of the substrate to be evaporated, and the length of each support column is 1mm to 30 mm.
11. The vapor deposition apparatus according to claim 1, wherein an end surface of an upper end of the support column is a hemispherical surface; or,
the support column includes: the support column comprises a cylindrical support column main body and a cylindrical support block arranged at the upper end of the support column main body, wherein the diameter of the support block is smaller than that of the support column main body; or,
the support column includes: the supporting column comprises a cylindrical supporting column body and a supporting block arranged at the upper end of the supporting column body in a round platform shape, the surface of the supporting block, which is far away from the supporting column body, is a top surface, and the diameter of the top surface of the supporting block is larger than that of the supporting column body.
12. An alignment method applied to the vapor deposition apparatus according to any one of claims 1 to 11, the alignment method comprising:
placing a mask plate on a base station of the evaporation equipment, placing a substrate to be evaporated on a bearing member of the evaporation equipment, wherein a support member of the evaporation equipment supports a middle area of the substrate to be evaporated;
synchronously lowering the holding member and the support member to a predetermined position;
and aligning the substrate to be evaporated with the mask plate.
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| CN201610177514.3A CN105821372B (en) | 2016-03-23 | 2016-03-23 | A kind of evaporated device and alignment method |
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| CN107937881B (en) * | 2017-11-20 | 2019-07-05 | 深圳市华星光电半导体显示技术有限公司 | Substrate clamping device |
| CN108130519A (en) * | 2018-01-31 | 2018-06-08 | 鄂尔多斯市源盛光电有限责任公司 | A kind of substrate support structure and evaporated device |
| CN109055898B (en) * | 2018-09-29 | 2020-09-22 | 浙江环迪工贸有限公司 | Film evaporation device |
| CN109445142A (en) * | 2018-12-28 | 2019-03-08 | 深圳市华星光电半导体显示技术有限公司 | A kind of orientation ultraviolet optics irradiating machine |
| CN112981329B (en) * | 2021-02-07 | 2022-10-28 | 京东方科技集团股份有限公司 | Adjusting device, evaporator and adjusting method |
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| US6265324B1 (en) * | 1998-05-21 | 2001-07-24 | Rohm Co., Ltd. | Method of manufacturing semiconductor device and mask for forming thin film pattern |
| CN1511690A (en) * | 2002-12-02 | 2004-07-14 | 爱德牌工程有限公司 | Substrate support member for use in FPP manufacturing apparatus |
| CN101910448A (en) * | 2008-01-16 | 2010-12-08 | 特机株式会社 | Film-forming apparatus |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007119893A (en) * | 2005-10-31 | 2007-05-17 | Toshiba Matsushita Display Technology Co Ltd | Vapor deposition apparatus |
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| US6265324B1 (en) * | 1998-05-21 | 2001-07-24 | Rohm Co., Ltd. | Method of manufacturing semiconductor device and mask for forming thin film pattern |
| CN1511690A (en) * | 2002-12-02 | 2004-07-14 | 爱德牌工程有限公司 | Substrate support member for use in FPP manufacturing apparatus |
| CN101910448A (en) * | 2008-01-16 | 2010-12-08 | 特机株式会社 | Film-forming apparatus |
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