CN105772305A - Thin film deposition apparatus - Google Patents
Thin film deposition apparatus Download PDFInfo
- Publication number
- CN105772305A CN105772305A CN201510944230.8A CN201510944230A CN105772305A CN 105772305 A CN105772305 A CN 105772305A CN 201510944230 A CN201510944230 A CN 201510944230A CN 105772305 A CN105772305 A CN 105772305A
- Authority
- CN
- China
- Prior art keywords
- raw material
- grabber
- supply portion
- material supply
- chamber
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
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Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
- B05B14/00—Arrangements for collecting, re-using or eliminating excess spraying material
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
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- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physical Vapour Deposition (AREA)
- Electroluminescent Light Sources (AREA)
Abstract
The invention relates to a thin film deposition apparatus, characterized by comprising a chamber having an internal space, wherein an opening portion used for assembling a deposition object substrate is formed in an area of an interruption film forming an upper surface; a raw material supply portion moving in the internal space of the chamber and meanwhile providing deposition raw materials for the interruption film; and a raw material collection portion which is arranged between the raw material supply portion and the interruption film on at least one side of the opening portion, and used for collecting deposition raw materials ejected to the interruption film. Accordingly, the apparatus can prevent unnecessary deposited materials from being supplied to the internal space, and meanwhile collect deposited materials by the raw material collection portion.
Description
Technical field
The present invention relates to a kind of film deposition apparatus, in more detail, relate to a kind of be prevented from that deposited material is unnecessarily fed to chamber interior volume meanwhile, it is capable to the film deposition apparatus of deposited material collected by material collection portion of recycling.
Background technology
Generally, organic electroluminescent component (OLED:OrganicLightEmittingDiodes) can be driven in the voltage lower than conventional liquid crystal indicator (LCD:liquidcrystaldisplay), and can solve the shortcoming that slimming, wide viewing angle, rapid answer speed etc. are pointed out in an lcd as problem.
Organic electroluminescent component can be divided into the passive matrix organic electroluminescent component (PassiveMatrixOLED) that each pixel does not arrange switch element and the active array type organic electroluminescent component (ActiveMatrixOLED) each pixel utilizing thin film transistor (TFT) form switch element and using.Wherein, the structure of active array type organic electroluminescent component forms organic illuminating part on substrate, and encapsulates (Encapsulation) organic light emission portion and prevent the organic light emission portion formed by Organic substance contact oxygen and moisture from aoxidizing or deteriorating.
Conventional method for packing utilizes the lid formed by metal or glass material to seal organic illuminating part.But, this method is not only difficult to slimming, due also to use metal or glass, it is difficult to realize the display of bending.Recently, it is proposed to have the method being formed with protecting film on the surface in organic light emission portion, this protecting film is formed by polymeric layer (Polymerlayer) and inorganic layer (Inorganiclayer) lamination repeatedly.Ultraviolet (UV) is utilized to solidify after this method plane SH wave inorganic matter and monomer (Monomer), so that monomer becomes polymer.
For forming the conventional monomer deposition device of this protecting film, make monomer gasify from the container equipped with aqueous monomer, and it is stored in the sedimentation unit being formed with inner space after a period of time, spray gaseous monomer to substrate.After depositing certain thickness monomer on substrate, substrate is solidified and makes monomer become polymer.
In the deposition process of monomer as above, partial monosomy vapor deposition is to substrate, and residual monomer steam moves to substrate periphery and deposits on the parts of substrate periphery.It addition, by transfer unit to one direction transfer substrate, to one direction transfer substrate time, can in the one side of substrate deposited monomer steam.In the process, it does not have the monomer vapor deposited on substrate deposits on transfer unit.Due to this monomer, it is possible to cause the action of transfer unit to become instability or transfer unit suffers breakage.Now, stop the operation of monomer deposition device and removing deposits to the monomer of transfer unit.And, transfer unit is changed when being difficult to remove monomer.During carrying out this upkeep operation, operation is stopped, and causes the decline of production efficiency.And, the replacement cycle of transfer unit and substrate periphery parts is more short, and maintenance cost more increases, and more causes that manufacturing expense rises.
And, there is the problem that deposition efficiency is low in deposition process as above.Now, deposition efficiency means in sedimentary origin the ratio of the actual deposition material being deposited on substrate in the deposition material of gasification, deposition efficiency substantially 32%.Particularly, utilize in the deposition process of conventional FMM, be unused in the deposition material about substantially the 68% of deposition and be deposited on the undesirable region within film deposition apparatus, cause not easily recycling.
Summary of the invention
Therefore, the present invention proposes in view of the above problems, its object is to provide a kind of film deposition apparatus, this device is prevented from that deposited material is unnecessarily fed to chamber interior volume meanwhile, it is capable to the deposited material collected by material collection portion of recycling.
And, it is an object of the invention to provide a kind of film deposition apparatus, this device is configured to grabber and moves together with raw material supply portion and reclaim the deposited material from the discharge of raw material supply portion, to prevent the deposited material discharged from raw material supply portion to be diffused into the unnecessary space of chamber.
In order to achieve the above object, the film deposition apparatus of the present invention includes: chamber, and it is formed with inner space, is formed for, in forming a region of blocking film of upper surface, the peristome that deposition object substrate arranges；Raw material supply portion, it provides deposition raw material to described blocking film while movement in the inner space of described chamber；And material collection portion, it is arranged between described raw material supply portion and described blocking film at least side of described peristome, for collecting the deposition raw material to blocking film injection.
Wherein, it is preferable that described material collection portion includes: grabber, it is formed with inflow entrance in the one side relative with raw material supply portion, and is arranged on the upside in described raw material supply portion；Drive division, its for make described grabber with direction side by side, raw material supply portion on reciprocate；And discharge portion, its one end is connected to the inflow entrance of described grabber, and the other end is connected to the outside of chamber, for discharging the deposition raw material collected in grabber.
And, described drive division preferably includes: drive rod, and its one end can be rotationally connected with chamber, and the other end is connected to grabber, for make grabber with direction side by side, raw material supply portion on reciprocate；And driving motor, for providing driving force to described drive rod.
Also, it is preferred that by the linear steering device being arranged side by side at the moving direction of the internal face of chamber Yu raw material supply portion, guide reciprocating of described grabber.
And, described discharge portion preferably includes: connecting rod, and its one end can be rotationally connected with chamber, and the other end is connected to grabber；Passing away, is formed along its length in the inside of described connecting rod, for connecting the space outerpace of grabber and chamber.
Thering is provided a kind of film deposition apparatus according to the present invention, this device is prevented from that deposited material is unnecessarily fed to chamber interior volume meanwhile, it is capable to the deposited material collected by material collection portion of recycling.
And, a kind of film deposition apparatus is provided, this device is configured to reclaim the deposited material discharged from raw material supply portion while grabber moves together with raw material supply portion, to prevent the deposited material discharged from raw material supply portion to be diffused into the unnecessary space of chamber.
Accompanying drawing explanation
Fig. 1 is the axonometric chart of the film deposition apparatus of the present invention.
Fig. 2 and Fig. 3 indicates that the axonometric chart of the film deposition apparatus effect of the present invention.
Fig. 4 to Fig. 6 indicates that the positive view of the film deposition apparatus effect of the present invention.
Fig. 7 indicates that the sectional view of the material collection portion structure of the film deposition apparatus of the present invention.
<description of reference numerals>
110: chamber 111: inner space 112: blocking film
113: peristome 120: raw material supply portion 121: guide rail
130: material collection portion 131: grabber 131a: suction inlet
132: drive division 132a: drive rod 132b: drive motor
133: linear steering device 134: discharge portion 134a: connecting rod
134b: passing away A1: the interval A2 of deposition: blocking interval
Detailed description of the invention
It should be noted that before the present invention will be described, accompanying drawing labelling identical for having the use of mutually isostructural structural element in many embodiment, and carry out representational explanation in the first embodiment, and only illustrate to be different from the structure of first embodiment in other embodiments.
Below, the film deposition apparatus of the first embodiment that present invention will be described in detail with reference to the accompanying.
In accompanying drawing, Fig. 1 is the axonometric chart of the film deposition apparatus of the present invention.Fig. 2 and Fig. 3 indicates that the axonometric chart of the film deposition apparatus effect of the present invention.
The film deposition apparatus of the present invention as above includes: chamber 110, the raw material supply portion 120 moved in the inside of chamber 110 and the material collection portion 130 moved together with raw material supply portion 120 in the subregion within chamber 110.
Described chamber 110 is formed with inner space 111, is formed for the peristome 113 that deposition object substrate arranges in the region formed the blocking face 112 of upper surface of chamber 110.
Described raw material supply portion 120 provides deposition raw material to blocking film 112 while movement in the inner space 111 of described chamber 110.
Additionally, described raw material supply portion 120 is when being disposed in 111 side, inner space of chamber 110, reciprocate between opposite side, and the raw material being arranged in the moving section in raw material supply portion 120 corresponding to substrate deposition being provided from raw material supply portion 120 in the region of peristome 113, and deposit uniformly for thin film, also provide certain raw material to the region being formed without peristome 113.This raw material supply portion 120 can include container, is used for housing deposited material；Heater block, is used for heating described deposited material；And nozzle, for providing the described deposited material heated by described heater block to deposition object side.
Wherein, in the moving section in described raw material supply portion 120, will be formed with the region of peristome 113 and be called the interval A1 of deposition, the interval A2 of blocking will be called from the initial position in raw material supply portion 120 region to peristome 113.
And, the bottom surface connected with the inner space 111 of chamber 110 is provided with guide rail 121, it is for guiding the movement in raw material supply portion 120, and described raw material supply portion 120 is configured to be reciprocated on guide rail 121 by not shown driving device.
Described material collection portion 130 is disposed between described raw material supply portion 120 and blocking film 112 at least side of described peristome 113, for collecting the deposition raw material of injection in the interval A2 of the blocking being formed without peristome 113 in the medial surface of blocking film 112.This material collection portion 130 includes: grabber 131, and it is formed with inflow entrance 131a in the one side relative with described raw material supply portion 120, and is disposed in the upside in described raw material supply portion 120；Linear steering device 133, it is arranged side by side with the moving direction in raw material supply portion 120 on the internal face of chamber 110, for guiding the movement of described grabber 131；Drive division 132, for make described grabber 131 with direction side by side, raw material supply portion 120 on reciprocate；And discharge portion 134, its one end is connected to the inflow entrance 131a of described grabber 131, and the other end is connected to the outside of chamber 110, for discharging the deposition raw material collecting grabber 131.
Wherein, described drive division 132 includes: drive rod 132a, its one end can be rotationally connected with chamber 110, the other end can be rotationally connected with the one end of grabber 131, for make grabber 131 with direction side by side, raw material supply portion 120 on reciprocate, and possess at least one joint；Driving motor 132b, it provides rotary driving force to the one end of described drive rod 132a, so that drive rod 132a folds.
Described discharge portion 134 includes: connecting rod 134a, and its one end can be rotationally connected with chamber 110, and the other end can be rotationally connected with the other end of grabber 131, and possesses at least one joint；Passing away 134b, it is formed along its length in the inside of described connecting rod 134a, for connecting grabber 131 and the space outerpace of chamber 110.Although it addition, not shown in the drawings, another collection device for collecting deposited material can be provided with in the other end of the described passing away 134b of the outside being positioned at chamber 110.
The following describes the operation of the first embodiment of above-mentioned film deposition apparatus.
In accompanying drawing, Fig. 4 to Fig. 6 indicates that the positive view of the thin film deposition effect of the film deposition apparatus of the present invention, and Fig. 7 indicates that the sectional view of material collection portion 130 structure of the film deposition apparatus of the present invention.
As shown in Figure 4 and Figure 2, raw material supply portion 120 does not form the side of peristome 113 in the inner space 111 of chamber 110, can arrange movably in the horizontal direction along guide rail 121, the grabber 131 in material collection portion 130 raw material supply portion 120 upside can along linear guider 133 with direction side by side, raw material supply portion 120 on arrange movably.
Wherein, raw material supply portion 120 reciprocates in the inner space 111 of chamber 110 on the interval interval including interdicting interval A2 and the interval A1 of deposition, and material collection portion 130 is formed without in the blocking interval A2 of peristome 113 to move together with raw material supply portion 120 in the inner space 111 of chamber 110.
Raw material supply portion 120, in order to form the thin film of uniform thickness on the substrate on the peristome 113 being arranged at the interval A1 of deposition, starts to provide deposited material to deposition object side from the interval A2 of blocking.Now, the deposited material provided to the medial surface of blocking film 112 in the interval A2 of blocking is collected and is recovered in described material collection portion 130 from raw material supply portion 120, to prevent deposited material from unnecessarily depositing or to be diffused in the inside of chamber 110.
Namely, as shown in Fig. 5 and Fig. 3, move to the period of position shown in Fig. 5 from position shown in Fig. 4 when raw material supply portion 120 starts to provide deposited material, namely from interdicting in interval A2 to the interval A1 of the deposition period moved, it is disposed in and the deposited material provided from raw material supply portion 120 is provided while the grabber 131 in the material collection portion 130 of the upside in raw material supply portion 120 moves together with raw material supply portion 120, and discharge to chamber 110 is outside.
Namely, driving device by not shown raw material supply portion 120, while raw material supply portion 120 shifts in the horizontal direction on guide rail 121, when the drive rod 132a in material collection portion 130 is by driving motor 132b to release grabber 131 to arrow " A " direction while rotating, linear steering device 133 grabber 131 of movement is guided to suck the deposited material discharged from raw material supply portion 120 with side side by side of raw material supply portion 120 while moving up.
Specifically, as it is shown in fig. 7, the grabber 131 in material collection portion 130 is set to the linear steering device 133 being arranged on the blocking film 112 of the upper surface forming chamber 110, moving up with side side by side of raw material supply portion 120；Side for connecting grabber 131 then rotates along with the driving direction driving motor 132b with the collapsible drive rod 132a driving motor 132b and folds.Therefore, grabber 131 is along with the driving direction driving motor 132b, reciprocate along linear steering device 133 in the upside in raw material supply portion 120, therefore, it is possible to control to drive motor 132b, so that grabber 131 moves together with raw material supply portion 120 in the upside in raw material supply portion 120.
And, the opposite side of described grabber 131 possesses discharge portion 134, and it is made up of the Collapsible connecting rod 134a being internally formed passing away 134b, for being inhaled into the deposited material of the inflow entrance 131a of grabber 131 to the outside discharge of chamber 110.
As mentioned above, in blocking interval A2 substrate not being deposited, the grabber 131 in material collection portion 130 reclaims, while moving together with raw material supply portion 120, the deposited material discharged from raw material supply portion 120, therefore, it is possible to prevent deposited material to be unnecessarily discharged to the inside of chamber 110.And, it is possible to reduce after converting chamber 110 to normal pressure to greatest extent, remove the deposited material being accumulated within chamber 110, be then re-converted into the maintenance procedures of vacuum, therefore, it is possible to improve the productivity of equipment.
Further, grabber 131 reclaims, while being arranged to move together with raw material supply portion 120, the deposited material discharged from raw material supply portion 120 such that it is able to prevent the deposited material got rid of from raw material supply portion 120 to be diffused into the unnecessary space of chamber 110.
Additionally, as shown in Figure 6, raw material supply portion 120 is by after interdicting interval A2, deposited material is supplied to peristome 113 in the process of the interval A1 of deposition, so that deposited material is deposited on the substrate of the upside being disposed in peristome 113, material collection portion 130 was parked in the terminal part of the interval A2 of blocking before arriving peristome 113.
Additionally, although it is not shown in the drawings, when the process that raw material supply portion 120 moves round about enters blocking interval A2, the grabber 131 in material collection portion 130 reclaims, while moving together with raw material supply portion 120, the deposited material discharged from raw material supply portion 120, to prevent deposited material in the process moved to initial position in raw material supply portion 120 to be unnecessarily discharged to the inside of chamber 110.
The present invention is not limited to above-described embodiment, but can be implemented as the embodiment of various ways in the scope of claims.Therefore, in the scope without departing from claims the present invention for required protection spirit, various changes and modification that those skilled in the art can carry out belong within protection scope of the present invention.
Claims (5)
1. a film deposition apparatus, it is characterised in that including:
Chamber, it is formed with inner space, is formed for, in forming a region of blocking film of upper surface, the peristome that deposition object substrate arranges；
Raw material supply portion, it provides deposition raw material to described blocking film while movement in the inner space of described chamber；And
Material collection portion, is arranged between described raw material supply portion and described blocking film at least side of described peristome, for collecting the deposition raw material to blocking film injection.
2. film deposition apparatus according to claim 1, it is characterised in that
Described material collection portion includes: grabber, and it is formed with inflow entrance in the one side relative with raw material supply portion, and is arranged on the upside in described raw material supply portion；Drive division, for make described grabber with direction side by side, raw material supply portion on reciprocate；And discharge portion, its one end is connected to the inflow entrance of described grabber, and the other end is connected to the outside of chamber, for discharging the deposition raw material collected on grabber.
3. film deposition apparatus according to claim 2, it is characterised in that
Described drive division includes: drive rod, and its one end can be rotationally connected with chamber, and the other end is connected to grabber, for make grabber with direction side by side, raw material supply portion on reciprocate；And driving motor, for providing driving force to described drive rod.
4. film deposition apparatus according to claim 3, it is characterised in that
By the linear steering device being arranged side by side at the moving direction of the internal face of chamber Yu raw material supply portion, guide reciprocating of described grabber.
5. film deposition apparatus according to claim 2, it is characterised in that
Described discharge portion includes: connecting rod, and its one end can be rotationally connected with chamber, and the other end is connected to grabber；And passing away, it is formed along its length in the inside of described connecting rod, for connecting the space outerpace of grabber and chamber.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1020150006865A KR101641453B1 (en) | 2015-01-14 | 2015-01-14 | Thin film deposition apparatus |
| KR10-2015-0006865 | 2015-01-14 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN105772305A true CN105772305A (en) | 2016-07-20 |
Family
ID=56390180
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201510944230.8A Pending CN105772305A (en) | 2015-01-14 | 2015-12-16 | Thin film deposition apparatus |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP6162830B2 (en) |
| KR (1) | KR101641453B1 (en) |
| CN (1) | CN105772305A (en) |
| TW (1) | TWI575089B (en) |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20040013244A (en) * | 2002-08-05 | 2004-02-14 | 신민석 | Parking management system using a PDA |
| KR20060080103A (en) * | 2005-01-04 | 2006-07-07 | 샬롬엔지니어링 주식회사 | System for managing parking area on street |
| JP2008223102A (en) * | 2007-03-14 | 2008-09-25 | Seiko Epson Corp | Vapor deposition apparatus and vapor deposition method |
| KR101400765B1 (en) * | 2013-08-08 | 2014-05-29 | 에이제이파크 주식회사 | Parking management system using voice recognition |
| US20140314955A1 (en) * | 2013-04-18 | 2014-10-23 | Samsung Display Co., Ltd. | Deposition apparatus |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH11229123A (en) * | 1998-02-12 | 1999-08-24 | Casio Comput Co Ltd | Vapor deposition device |
| JP2005353466A (en) * | 2004-06-11 | 2005-12-22 | Toshiba Matsushita Display Technology Co Ltd | Manufacturing device of display device |
| JP2006274398A (en) * | 2005-03-30 | 2006-10-12 | Sanyo Electric Co Ltd | Organic film forming apparatus |
| US7638168B2 (en) * | 2005-11-10 | 2009-12-29 | Eastman Kodak Company | Deposition system using sealed replenishment container |
| US20070283884A1 (en) * | 2006-05-30 | 2007-12-13 | Applied Materials, Inc. | Ring assembly for substrate processing chamber |
| US20090258143A1 (en) * | 2008-04-11 | 2009-10-15 | Peck John D | Reagent dispensing apparatus and delivery method |
| JP2014055342A (en) * | 2012-09-14 | 2014-03-27 | Hitachi High-Technologies Corp | Film deposition apparatus |
| KR20140077625A (en) * | 2012-12-14 | 2014-06-24 | 삼성디스플레이 주식회사 | Apparatus for depositing organic material |
-
2015
- 2015-01-14 KR KR1020150006865A patent/KR101641453B1/en active IP Right Grant
- 2015-12-16 CN CN201510944230.8A patent/CN105772305A/en active Pending
- 2015-12-18 TW TW104142644A patent/TWI575089B/en not_active IP Right Cessation
-
2016
- 2016-01-06 JP JP2016001261A patent/JP6162830B2/en not_active Expired - Fee Related
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20040013244A (en) * | 2002-08-05 | 2004-02-14 | 신민석 | Parking management system using a PDA |
| KR20060080103A (en) * | 2005-01-04 | 2006-07-07 | 샬롬엔지니어링 주식회사 | System for managing parking area on street |
| JP2008223102A (en) * | 2007-03-14 | 2008-09-25 | Seiko Epson Corp | Vapor deposition apparatus and vapor deposition method |
| US20140314955A1 (en) * | 2013-04-18 | 2014-10-23 | Samsung Display Co., Ltd. | Deposition apparatus |
| KR101400765B1 (en) * | 2013-08-08 | 2014-05-29 | 에이제이파크 주식회사 | Parking management system using voice recognition |
Also Published As
| Publication number | Publication date |
|---|---|
| KR101641453B1 (en) | 2016-07-21 |
| TW201631186A (en) | 2016-09-01 |
| JP6162830B2 (en) | 2017-07-12 |
| TWI575089B (en) | 2017-03-21 |
| JP2016130366A (en) | 2016-07-21 |
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