CN105738996A - Detector filtering window - Google Patents

Detector filtering window Download PDF

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Publication number
CN105738996A
CN105738996A CN201610315953.6A CN201610315953A CN105738996A CN 105738996 A CN105738996 A CN 105738996A CN 201610315953 A CN201610315953 A CN 201610315953A CN 105738996 A CN105738996 A CN 105738996A
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CN
China
Prior art keywords
film
refractive index
filter window
dioxide film
silicon dioxide
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201610315953.6A
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Chinese (zh)
Inventor
李上宾
刘倍源
徐正元
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
University of Science and Technology of China USTC
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University of Science and Technology of China USTC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by University of Science and Technology of China USTC filed Critical University of Science and Technology of China USTC
Priority to CN201610315953.6A priority Critical patent/CN105738996A/en
Publication of CN105738996A publication Critical patent/CN105738996A/en
Pending legal-status Critical Current

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    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/20Filters
    • G02B5/201Filters in the form of arrays
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/20Filters
    • G02B5/207Filters comprising semiconducting materials

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Optical Filters (AREA)

Abstract

The invention discloses a detector filtering window. The detector filtering window comprises a filtering window formed by a plurality of film structures and having a band-pass characteristic. The a plurality of film structures successively comprises a single silica film, a first film group, a single high-refractive-index medium, a second film group and a silicon substrate from top to bottom, wherein the first film group and the second film group are respectively formed in such a manner that a plurality of silica films and titanium dioxide films are overlapped. According to the scheme, an added filtering sheet is omitted, in the growth preparation of the silicon substrate, the films different in refractive index are plated on the surface of the silicon substrate, and the effect of the filtering sheet is achieved; in addition, the cost is substantially saved, and the complexity of the system is further lowered.

Description

Detector filter window
Technical field
The present invention relates to communication technical field, particularly relate to a kind of detector filter window.
Background technology
Anti-reflection film, or antireflective coating, it is possible to increase the transmitance of the light of particular demands wavelength period.In optics in extensive use and life.
But, the Si-based photodetectors of present stage is substantially before receiving terminal and increases independent optical filter reaches to receive the purpose of the light of particular range of wavelengths, thus causing the relatively costly defect with system complex.
Summary of the invention
It is an object of the invention to provide a kind of detector filter window, be not only greatly saved cost, also reduce the complexity of system.
It is an object of the invention to be achieved through the following technical solutions:
A kind of detector filter window, including: the filter window with bandpass characteristics being made up of multi-layer film structure, described multi-layer film structure order from top to bottom is according to this: monolayer silicon dioxide film, ground floor thin film group, monolayer high refractive index medium, second layer thin film group and silicon base;Wherein, described ground floor thin film group and second layer thin film group are multi-layer silica dioxide film and the overlapping composition of titanium dioxide film.
Silicon dioxide film and titanium dioxide film in described ground floor thin film group are 10 layers;
The thickness of silicon dioxide film is 160nm, and each silicon dioxide film refractive index is 1.52;
Titanium deoxid film thickness is 55nm, and the refractive index of each titanium dioxide is 2.52.
Silicon dioxide film and titanium dioxide film in described second layer thin film group are 10 layers;
The thickness of silica membrane is 140nm, and each silicon dioxide film refractive index is 1.52;
Titanium deoxid film thickness is 26nm, and the refractive index of each titanium dioxide is 2.52.
The thickness of described monolayer silicon dioxide film is 80nm.
The thickness of described monolayer high refractive index medium is 51nm, and refractive index is 2.61.
The refractive index of described silicon base is 3.42.
Described multi-layer film structure passband in visible-range is 430nm to 470nm.
As seen from the above technical solution provided by the invention, eliminate the optical filter needing to increase, in silica-based growth preparation, the thin film of several different refractivities on its plated surface, reach the effect of optical filter;Such design is not only greatly saved cost, also reduces the complexity of system.
Accompanying drawing explanation
In order to be illustrated more clearly that the technical scheme of the embodiment of the present invention, below the accompanying drawing used required during embodiment is described is briefly described, apparently, accompanying drawing in the following describes is only some embodiments of the present invention, for those of ordinary skill in the art, under the premise not paying creative work, it is also possible to obtain other accompanying drawings according to these accompanying drawings.
The structural representation of the detector filter window that Fig. 1 provides for the embodiment of the present invention;
The detector filter window that Fig. 2 provides for the embodiment of the present invention is absorbance analogous diagram when 0 ° at angle of incidence;
The detector filter window that Fig. 3 provides for the embodiment of the present invention is absorbance analogous diagram when 10 ° at angle of incidence;
The detector filter window that Fig. 4 provides for the embodiment of the present invention is absorbance analogous diagram when 15 ° at angle of incidence.
Detailed description of the invention
Below in conjunction with the accompanying drawing in the embodiment of the present invention, the technical scheme in the embodiment of the present invention is clearly and completely described, it is clear that described embodiment is only a part of embodiment of the present invention, rather than whole embodiments.Based on embodiments of the invention, the every other embodiment that those of ordinary skill in the art obtain under not making creative work premise, broadly fall into protection scope of the present invention.
The embodiment of the present invention provides a kind of detector filter window, is specially the filter window with bandpass characteristics being made up of multi-layer film structure.As it is shown in figure 1, the order that described multi-layer film structure is from top to bottom is according to this: monolayer silicon dioxide film, ground floor thin film group, monolayer high refractive index medium, second layer thin film group and silicon base;Wherein, described ground floor thin film group and second layer thin film group are multi-layer silica dioxide film and the overlapping composition of titanium dioxide film.
Preferably, the silicon dioxide film in described ground floor thin film group and titanium dioxide film are 10 layers;
The thickness of silicon dioxide film is 160nm, and each silicon dioxide film refractive index is 1.52;
Titanium deoxid film thickness is 55nm, and the refractive index of each titanium dioxide is 2.52.
Preferably, the silicon dioxide film in described second layer thin film group and titanium dioxide film are 10 layers;
The thickness of silica membrane is 140nm, and each silicon dioxide film refractive index is 1.52;
Titanium deoxid film thickness is 26nm, and the refractive index of each titanium dioxide is 2.52.
Preferably, the thickness of described monolayer silicon dioxide film is 80nm.
Preferably, the thickness of described monolayer high refractive index medium is 51nm, and refractive index is 2.61.
Preferably, the refractive index of described silicon base is 3.42.
Preferably, described multi-layer film structure passband in visible-range is 430nm to 470nm.
The angle of incidence of the filter window incident illumination that the embodiment of the present invention provides requires within 15 °;Between 430nm to 470nm, absorbance is more than 80% in designing requirement, and the absorbance outside passband is less than 10%.
It is illustrated in figure 2 absorbance analogous diagram during vertical incidence;Although it can be seen that very big in the shock range of passband absorbance image, but overall meet 80% absorbance demand;Very low in the absorbance of stopband, much smaller than 10%;In visible-range, (380nm-780nm) only has passband absorbance high, and near the ultraviolet of about 300nm and more than 1000nm infrared have the wave band of the high absorbance of comparison.
Being illustrated in figure 3 angle of incidence is absorbance analogous diagram when 10 °;Fig. 4 is angle of incidence is absorbance analogous diagram when 15 °;It can be seen that along with the change of angle of incidence, transmittance graph is on the whole to left, and curve shape change is little.
The above; being only the present invention preferably detailed description of the invention, but protection scope of the present invention is not limited thereto, any those familiar with the art is in the technical scope of present disclosure; the change that can readily occur in or replacement, all should be encompassed within protection scope of the present invention.Therefore, protection scope of the present invention should be as the criterion with the protection domain of claims.

Claims (7)

1. a detector filter window, it is characterized in that, including: the filter window with bandpass characteristics being made up of multi-layer film structure, described multi-layer film structure order from top to bottom is according to this: monolayer silicon dioxide film, ground floor thin film group, monolayer high refractive index medium, second layer thin film group and silicon base;Wherein, described ground floor thin film group and second layer thin film group are multi-layer silica dioxide film and the overlapping composition of titanium dioxide film.
2. a kind of detector filter window according to claim 1, it is characterised in that silicon dioxide film and titanium dioxide film in described ground floor thin film group are 10 layers;
The thickness of silicon dioxide film is 160nm, and each silicon dioxide film refractive index is 1.52;
Titanium deoxid film thickness is 55nm, and the refractive index of each titanium dioxide is 2.52.
3. a kind of detector filter window according to claim 1, it is characterised in that silicon dioxide film and titanium dioxide film in described second layer thin film group are 10 layers;
The thickness of silica membrane is 140nm, and each silicon dioxide film refractive index is 1.52;
Titanium deoxid film thickness is 26nm, and the refractive index of each titanium dioxide is 2.52.
4. a kind of detector filter window according to claim 1, it is characterised in that the thickness of described monolayer silicon dioxide film is 80nm.
5. a kind of detector filter window according to claim 1, it is characterised in that the thickness of described monolayer high refractive index medium is 51nm, and refractive index is 2.61.
6. a kind of detector filter window according to claim 1, it is characterised in that the refractive index of described silicon base is 3.42.
7. a kind of detector filter window according to any one of claim 1-6, it is characterised in that described multi-layer film structure passband in visible-range is 430nm to 470nm.
CN201610315953.6A 2016-05-11 2016-05-11 Detector filtering window Pending CN105738996A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201610315953.6A CN105738996A (en) 2016-05-11 2016-05-11 Detector filtering window

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201610315953.6A CN105738996A (en) 2016-05-11 2016-05-11 Detector filtering window

Publications (1)

Publication Number Publication Date
CN105738996A true CN105738996A (en) 2016-07-06

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Country Status (1)

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CN (1) CN105738996A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109164527A (en) * 2018-11-05 2019-01-08 无锡泓瑞航天科技有限公司 Five-channel multi-color filter

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101269917A (en) * 2007-03-21 2008-09-24 鸿富锦精密工业(深圳)有限公司 Glass with low radiation
CN101435888A (en) * 2007-11-16 2009-05-20 爱普生拓优科梦株式会社 Optical multilayer filter, method of manufacturing the same, and electronic apparatus
CN101630050A (en) * 2008-07-17 2010-01-20 鸿富锦精密工业(深圳)有限公司 Color wheel and digital light processing projector having same
CN202583499U (en) * 2011-12-06 2012-12-05 凤凰光学(广东)有限公司 Ultra wide band infrared filter
CN202720347U (en) * 2012-05-31 2013-02-06 时吉峰 Light transmission multilayer film structure
CN203164460U (en) * 2013-02-19 2013-08-28 东莞五方光电科技有限公司 Anti-reflection optical filter having diamond film
CN103681898A (en) * 2013-12-12 2014-03-26 南京大学 Ultraviolet band-pass filter based on SiO2/Si3N4 distributed Bragg reflectors and preparing method
CN204188829U (en) * 2014-11-18 2015-03-04 南京顺泰科技有限公司 The logical ultraviolet filter of a kind of band

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101269917A (en) * 2007-03-21 2008-09-24 鸿富锦精密工业(深圳)有限公司 Glass with low radiation
CN101435888A (en) * 2007-11-16 2009-05-20 爱普生拓优科梦株式会社 Optical multilayer filter, method of manufacturing the same, and electronic apparatus
CN101630050A (en) * 2008-07-17 2010-01-20 鸿富锦精密工业(深圳)有限公司 Color wheel and digital light processing projector having same
CN202583499U (en) * 2011-12-06 2012-12-05 凤凰光学(广东)有限公司 Ultra wide band infrared filter
CN202720347U (en) * 2012-05-31 2013-02-06 时吉峰 Light transmission multilayer film structure
CN203164460U (en) * 2013-02-19 2013-08-28 东莞五方光电科技有限公司 Anti-reflection optical filter having diamond film
CN103681898A (en) * 2013-12-12 2014-03-26 南京大学 Ultraviolet band-pass filter based on SiO2/Si3N4 distributed Bragg reflectors and preparing method
CN204188829U (en) * 2014-11-18 2015-03-04 南京顺泰科技有限公司 The logical ultraviolet filter of a kind of band

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109164527A (en) * 2018-11-05 2019-01-08 无锡泓瑞航天科技有限公司 Five-channel multi-color filter
CN109164527B (en) * 2018-11-05 2021-07-30 无锡泓瑞航天科技有限公司 Five-channel multicolor optical filter

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Application publication date: 20160706