CN105732963A - Phenol-free resin for offset printing ink - Google Patents

Phenol-free resin for offset printing ink Download PDF

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Publication number
CN105732963A
CN105732963A CN201610271893.2A CN201610271893A CN105732963A CN 105732963 A CN105732963 A CN 105732963A CN 201610271893 A CN201610271893 A CN 201610271893A CN 105732963 A CN105732963 A CN 105732963A
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CN
China
Prior art keywords
phenol
phenol resin
offset ink
microwave power
insulation reaction
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201610271893.2A
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Chinese (zh)
Inventor
范辂
范业鹏
肖师飞
胡晓明
董林鑫
兰永新
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
GUILIN XINGSONG FOREST CHEMICAL CO Ltd
Original Assignee
GUILIN XINGSONG FOREST CHEMICAL CO Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by GUILIN XINGSONG FOREST CHEMICAL CO Ltd filed Critical GUILIN XINGSONG FOREST CHEMICAL CO Ltd
Priority to CN201610271893.2A priority Critical patent/CN105732963A/en
Publication of CN105732963A publication Critical patent/CN105732963A/en
Pending legal-status Critical Current

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    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G63/00Macromolecular compounds obtained by reactions forming a carboxylic ester link in the main chain of the macromolecule
    • C08G63/02Polyesters derived from hydroxycarboxylic acids or from polycarboxylic acids and polyhydroxy compounds
    • C08G63/12Polyesters derived from hydroxycarboxylic acids or from polycarboxylic acids and polyhydroxy compounds derived from polycarboxylic acids and polyhydroxy compounds
    • C08G63/52Polycarboxylic acids or polyhydroxy compounds in which at least one of the two components contains aliphatic unsaturation
    • C08G63/54Polycarboxylic acids or polyhydroxy compounds in which at least one of the two components contains aliphatic unsaturation the acids or hydroxy compounds containing carbocyclic rings
    • C08G63/553Acids or hydroxy compounds containing cycloaliphatic rings, e.g. Diels-Alder adducts
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G63/00Macromolecular compounds obtained by reactions forming a carboxylic ester link in the main chain of the macromolecule
    • C08G63/78Preparation processes
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00Use of inorganic substances as compounding ingredients
    • C08K3/02Elements
    • C08K3/04Carbon
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00Inks
    • C09D11/02Printing inks
    • C09D11/10Printing inks based on artificial resins
    • C09D11/102Printing inks based on artificial resins containing macromolecular compounds obtained by reactions other than those only involving unsaturated carbon-to-carbon bonds
    • C09D11/104Polyesters
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09FNATURAL RESINS; FRENCH POLISH; DRYING-OILS; OIL DRYING AGENTS, i.e. SICCATIVES; TURPENTINE
    • C09F1/00Obtaining purification, or chemical modification of natural resins, e.g. oleo-resins
    • C09F1/04Chemical modification, e.g. esterification

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)

Abstract

The invention relates to the technical field of resin for printing ink, in particular to phenol-free resin for offset printing ink.The phenol-free resin is prepared from, by weight, 70-90 parts of rosin, 2-8 parts of fumaric acid, 1-6 parts of phthalic anhydride, 1-5 parts of itaconic acid, 10-20 parts of pentaerythritol and 5-15 parts of neopentyl glycol.All performance items of the phenol-free resin for offset printing ink meet the use requirement of the offset printing ink, no phenolic substance or formaldehyde is used in the synthesis process, and the phenol-free resin is environmentally friendly and does not cause harm to human bodies and the environment; according to a preparing method, the preparing cycle is greatly shortened, the yield is increased, and cost is reduced.

Description

Used for offset ink without phenol resin
Technical field
The present invention relates to resin for printing ink technical field, particularly to used for offset ink without phenol resin.
Background technology
General resin used for offset ink mainly with phenol, bisphenol-A, alkyl phenol and formaldehyde condensation, condensation produce thing again with Colophonium additive reaction, generate phenolic-modified abietic resin with polyhydric alcohol again after reaction.Introduce aldehydes matter and the formaldehyde such as phenol, bisphenol-A, alkyl phenol in the process.
Phenolic compound is a kind of prototype matter poisonous substance, and all living individuals are had toxic action.Protein coagulating can be made, so there being strong bactericidal action.Its aqueous solution easily causes systemic toxicity profiles by skin very;Its steam is sucked by respiratory tract, and nervous system damage is bigger.The long-term water polluted for concentration phenol steam or phenol that sucks can cause chronic accumulation poisoning;Suck high-concentration phenol steaming or phenol liquid or a large amount of phenol liquid splashes and can cause acute poisoning on skin.Chronic carbdism is common vomiting, diarrhoea, inappetence, dizziness, anemia and various nerveous system disease.
Another kind of reactant formaldehyde is more highly toxic material, and on China's toxic chemical priority acccess control list, formaldehyde is in second.Formaldehyde has been defined as carcinogenic and cause deformed material by World Health Organization (WHO), the allergen being well recognized as, and is also one of potential strong mutagen.Lot of documents is recorded, and formaldehyde has strong carcinogenic and promotion canceration effect.The impact of health is mainly manifested in the aspects such as heterosmia, stimulation, allergy, abnormal pulmonary function, abnormal liver function by formaldehyde.So operator and later stage ink manufacture and ink user are had certain harm by tradition ink resin process, do not meet the requirement of environmental protection development.
And the Chinese invention patent that notification number is CN102226059B discloses used for offset ink without phenol resin and preparation method,, this resin formula by mass weight part is: Colophonium: 60-80, fumaric acid: 1-10, maleic anhydride: 1-10, fatty acid 1-10, polyhydric alcohol: 10-20, catalyst: 0.1-1;Described performance indications without phenol resin used for offset ink: viscosity mPa.s/25 DEG C: 15000-25000, release property ml/2g: >=5, acid value mgKOH/g :≤25, softening point DEG C: 160-175.A kind of preparation method without phenol resin used for offset ink is provided simultaneously.
Summary of the invention
The technical problem to be solved is to provide used for offset ink without phenol resin, and this resin properties meets offset ink and uses, and does not use aldehydes matter and formaldehyde, environmental protection, will not human body and environment be worked the mischief in building-up process.
For achieving the above object, the present invention adopts the following technical scheme that
Used for offset ink without phenol resin, it is made up of the raw material of following weight portion:
Preferably, bortz powder particle diameter of the present invention is 50~100nm.The resin that the bortz powder that the present invention adds the is made ink for preparing, has notable anti-wear performance and resistance to elevated temperatures.
It is highly preferred that bortz powder particle diameter of the present invention is 75nm.
Of the present invention used for offset ink it is made up of following preparation method without phenol resin:
1) being added in microwave reaction kettle by the Colophonium of proportional quantity, adjustment microwave power is 450~480W, and insulation reaction 10~20min is to melting completely;
2) tetramethylolmethane and neopentyl glycol are added, with step 1) the Colophonium mixing and stirring melted, adjustment microwave power is 530~560W, insulation reaction 15~25min;
3) continuously adding itaconic acid, adjustment microwave power is 530~560W, insulation reaction 5~10min;
4) being further continued for adding fumaric acid and phthalic anhydride, adjustment microwave power is 455~475W, insulation reaction 8~15min;
5) it is eventually adding bortz powder, stirs 20~30min, take out product, with hot wash 3~5 times, vacuum drying,.
Preferably, step 5 of the present invention) stirring 25min.
Preferably, of the present invention used for offset ink without phenol resin, it is made up of the raw material of following weight portion:
Beneficial effects of the present invention:
1, the properties without phenol resin used for offset ink of the present invention meets offset ink use, does not use aldehydes matter and formaldehyde, environmental protection in building-up process, human body and environment will not be worked the mischief, and its preparation method, greatly reduce manufacturing cycle, improve yield, reduce cost.Test shows, the performance indications of resin of the present invention are: softening point: 170~185 DEG C, acid number: 20mgKOH/g, viscosity: 17000~26000mPa.s/25 DEG C.
2, the used for offset ink of the present invention passes through reasonable compatibility without phenol resin, has good stability, does not have too big change, and do not have the phenomenon of precipitation within this time at least 40 months in color, concentration, viscosity.
3, the product tool obtained for preparing ink without phenol resin used for offset ink of the present invention has good wearability, after tested, without phenol resin, the present invention used for offset ink is prepared into ink be used for printing the leaflet obtained, use the power of 500G, with 100 frictions back and forth of 98% ethanol, observing printed matter surface, layer of ink dropping situations do not occur, printed matter surface is also without destroyed.
4, using the ink heat resisting temperature made without phenol resin used for offset ink up to 190~220 DEG C, moment heat resisting temperature is up to 300 DEG C.
Detailed description of the invention
Below in conjunction with embodiment, the invention will be further described, but the invention is not limited in these embodiments.
Embodiment 1
1) following raw material is weighed by weight:
2) adding in microwave reaction kettle by the Colophonium of proportional quantity, adjustment microwave power is that 450W, insulation reaction 20min are to melting completely;
3) tetramethylolmethane and neopentyl glycol are added, with step 1) the Colophonium mixing and stirring melted, adjustment microwave power is 530W, insulation reaction 25min;
4) continuously adding itaconic acid, adjustment microwave power is 530W, insulation reaction 10min;
5) being further continued for adding fumaric acid and phthalic anhydride, adjustment microwave power is 475W, insulation reaction 15min;
6) it is eventually adding the bortz powder that particle diameter is 50nm, stirs 20min, take out product, with hot wash 5 times, vacuum drying,.
Embodiment 2
1) following raw material is weighed by weight:
2) adding in microwave reaction kettle by the Colophonium of proportional quantity, adjustment microwave power is that 455W, insulation reaction 18min are to melting completely;
3) tetramethylolmethane and neopentyl glycol are added, with step 1) the Colophonium mixing and stirring melted, adjustment microwave power is 535W, insulation reaction 22min;
4) continuously adding itaconic acid, adjustment microwave power is 540W, insulation reaction 9min;
5) being further continued for adding fumaric acid and phthalic anhydride, adjustment microwave power is 470W, insulation reaction 13min;
6) it is eventually adding the bortz powder that particle diameter is 60nm, stirs 22min, take out product, with hot wash 4 times, vacuum drying,.
Embodiment 3
1) following raw material is weighed by weight:
2) adding in microwave reaction kettle by the Colophonium of proportional quantity, adjustment microwave power is that 465W, insulation reaction 15min are to melting completely;
3) tetramethylolmethane and neopentyl glycol are added, with step 1) the Colophonium mixing and stirring melted, adjustment microwave power is 545W, insulation reaction 20min;
4) continuously adding itaconic acid, adjustment microwave power is 545W, insulation reaction 8min;
5) being further continued for adding fumaric acid and phthalic anhydride, adjustment microwave power is 465W, insulation reaction 12min;
6) it is eventually adding the bortz powder that particle diameter is 75nm, stirs 25min, take out product, with hot wash 4 times, vacuum drying,.
Embodiment 4
1) following raw material is weighed by weight:
2) adding in microwave reaction kettle by the Colophonium of proportional quantity, adjustment microwave power is that 475W, insulation reaction 12min are to melting completely;
3) tetramethylolmethane and neopentyl glycol are added, with step 1) the Colophonium mixing and stirring melted, adjustment microwave power is 555W, insulation reaction 18min;
4) continuously adding itaconic acid, adjustment microwave power is 555W, insulation reaction 6min;
5) being further continued for adding fumaric acid and phthalic anhydride, adjustment microwave power is 460W, insulation reaction 10min;
6) it is eventually adding the bortz powder that particle diameter is 80nm, stirs 27min, take out product, with hot wash 3 times, vacuum drying,.
Embodiment 5
1) following raw material is weighed by weight:
2) adding in microwave reaction kettle by the Colophonium of proportional quantity, adjustment microwave power is that 480W, insulation reaction 10min are to melting completely;
3) tetramethylolmethane and neopentyl glycol are added, with step 1) the Colophonium mixing and stirring melted, adjustment microwave power is 560W, insulation reaction 15min;
4) continuously adding itaconic acid, adjustment microwave power is 560W, insulation reaction 5min;
5) being further continued for adding fumaric acid and phthalic anhydride, adjustment microwave power is 455W, insulation reaction 8min;
6) it is eventually adding the bortz powder that particle diameter is 100nm, stirs 30min, take out product, with hot wash 3 times, vacuum drying,.

Claims (5)

1. used for offset ink without phenol resin, it is characterised in that to be made up of the raw material of following weight portion:
The described preparation method without phenol resin used for offset ink, comprises the following steps:
1) being added in microwave reaction kettle by the Colophonium of proportional quantity, adjustment microwave power is 450~480W, and insulation reaction 10~20min is to melting completely;
2) tetramethylolmethane and neopentyl glycol are added, with step 1) the Colophonium mixing and stirring melted, adjustment microwave power is 530~560W, insulation reaction 15~25min;
3) continuously adding itaconic acid, adjustment microwave power is 530~560W, insulation reaction 5~10min;
4) being further continued for adding fumaric acid and phthalic anhydride, adjustment microwave power is 455~475w, insulation reaction 8~15min;
5) it is eventually adding bortz powder, stirs 20~30min, take out product, with hot wash 3~5 times, vacuum drying,.
2. according to claim 1 used for offset ink without phenol resin, it is characterised in that to be made up of the raw material of following weight portion:
3. according to claim 1 and 2 used for offset ink without phenol resin, it is characterised in that: described bortz powder particle diameter is 50~100nm.
4. according to claim 1 and 2 used for offset ink without phenol resin, it is characterised in that: described bortz powder particle diameter is 75nm.
5. according to claim 1 and 2 used for offset ink without phenol resin, it is characterised in that: described step 5) stirring 25min.
CN201610271893.2A 2016-04-27 2016-04-27 Phenol-free resin for offset printing ink Pending CN105732963A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201610271893.2A CN105732963A (en) 2016-04-27 2016-04-27 Phenol-free resin for offset printing ink

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201610271893.2A CN105732963A (en) 2016-04-27 2016-04-27 Phenol-free resin for offset printing ink

Publications (1)

Publication Number Publication Date
CN105732963A true CN105732963A (en) 2016-07-06

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Country Status (1)

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Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102226059A (en) * 2011-05-10 2011-10-26 天津市天宁树脂有限公司 Phenol-free resin for offset printing ink and preparation method thereof
CN104650648A (en) * 2015-02-26 2015-05-27 韦棋 Wear-resistant and high-temperature-resistant printing ink
CN105038393A (en) * 2015-07-30 2015-11-11 安徽省中彩印务有限公司 High-temperature-resistant ink and preparation method thereof

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102226059A (en) * 2011-05-10 2011-10-26 天津市天宁树脂有限公司 Phenol-free resin for offset printing ink and preparation method thereof
CN104650648A (en) * 2015-02-26 2015-05-27 韦棋 Wear-resistant and high-temperature-resistant printing ink
CN105038393A (en) * 2015-07-30 2015-11-11 安徽省中彩印务有限公司 High-temperature-resistant ink and preparation method thereof

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Application publication date: 20160706

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