CN105695944A - Sputter coating mechanism - Google Patents
Sputter coating mechanism Download PDFInfo
- Publication number
- CN105695944A CN105695944A CN201610266406.3A CN201610266406A CN105695944A CN 105695944 A CN105695944 A CN 105695944A CN 201610266406 A CN201610266406 A CN 201610266406A CN 105695944 A CN105695944 A CN 105695944A
- Authority
- CN
- China
- Prior art keywords
- cabin
- sputter coating
- baffle
- coating mechanism
- target
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/50—Substrate holders
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/542—Controlling the film thickness or evaporation rate
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Surface Treatment Of Glass (AREA)
Abstract
The invention discloses a sputter coating mechanism which comprises a cabin.A target mechanism is fixed to the top in the cabin.Baffle mechanisms are arranged on the opposite inner side walls of the cabin respectively.The target mechanism is located above the baffle mechanisms.Each baffle mechanism comprises a rotary shaft, a baffle and a collecting plate.One end of each baffle is connected with the corresponding inner side wall of the cabin through the corresponding rotary shaft, and therefore the baffles can vertically turn over with the rotary shafts as pivots.The collecting plates are detachably arranged on the faces, close to a target, in the baffles.A transporting mechanism is arranged below the cabin and at least comprises a bottom bin, a plurality of rollers arranged in sequence are arranged on the upper surface of the bottom bin, a plurality of air cylinders are arranged in the bottom bin, and at least part of the upper ends of the air cylinders are located outside the bottom bin.The problem that due to the fact that the distance between a glass plate and a target mechanism cannot be adjusted through a traditional sputter coating mechanism, the thickness of a film is hard to adjust in the coating process is solved.
Description
Technical field
The present invention relates to glass coating equipment, in particular it relates to sputter coating mechanism。
Background technology
Sputtering equipment is that design for being coated with low-radiation film, Low emissivity solar film and solar control film on flat board building glass, glass plate is sent to coating chamber by horizontal feed system and processes, coating chamber top is provided with target mechanism, traditional plated film is to utilize target mechanism to be directly sputtered onto on glass plate by target particle, distance between glass plate and target mechanism cannot adjust, and therefore cannot adjust the thickness of plated film by changing the distance between glass plate and target mechanism。
Therefore it provides a kind of distance that can adjust between glass plate and target mechanism, it is the problem that the present invention needs solution badly to facilitate the sputter coating mechanism regulating coating film thickness。
Summary of the invention
It is an object of the invention to provide a kind of sputter coating mechanism, solve traditional sputter coating mechanism and cannot adjust the distance between glass plate and target mechanism, the problem causing not easily regulating film thickness during plated film。
To achieve these goals, the invention provides a kind of sputter coating mechanism, wherein, described sputter coating mechanism includes described cabin, the top of described cabin interior is fixed with target mechanism, the medial wall that described cabin is relative is respectively arranged with baffle mechanism, and described target mechanism is positioned at the top of described baffle mechanism, described baffle mechanism includes rotating shaft, baffle plate and collecting board, one end of described baffle plate connects medial wall, described cabin by rotating shaft, described baffle plate can be spun upside down with described rotating shaft for fulcrum, described baffle plate is detachably provided with collecting board in the one side of described target, described cabin is connected with transport establishment, described transport establishment at least includes Lower Hold, the upper surface of described Lower Hold is provided with multiple roller being sequentially arranged, multiple cylinder it is provided with in described Lower Hold, the upper end of described cylinder is at least partially disposed at outside described Lower Hold, when described Telescopic-cylinder, the glass substrate jack-up that can will be placed on described roller。
Preferably, the surface of described roller is sequentially socketed with multiple rubber ring along its axial direction。
Preferably, the quantity of described rubber ring is 4-8。
Preferably, the upper end of described cylinder is connected to spongy body。
Preferably, described glass substrate can slide in the first direction on multiple described rollers, and multiple described cylinders, in described Lower Hold, are equally spaced along described first direction。
Preferably, the quantity of described cylinder is 4-6
According to technique scheme, the invention provides a kind of sputter coating mechanism, wherein, described sputter coating mechanism includes described cabin, the top of described cabin interior is fixed with target mechanism, the medial wall that described cabin is relative is respectively arranged with baffle mechanism, and described target mechanism is positioned at the top of described baffle mechanism, described baffle mechanism includes rotating shaft, baffle plate and collecting board, one end of described baffle plate connects medial wall, described cabin by rotating shaft, described baffle plate can be spun upside down with described rotating shaft for fulcrum, described baffle plate is detachably provided with collecting board in the one side of described target, during work, the angle adjusting 2 pieces of baffle plates with medial wall, cabin can be passed through, control the target as sputter scope to glass pane surface, the particle being in sputtering volume edges drops down onto on collecting board, owing to collecting board is to be removably disposed on baffle plate, conveniently the particle collected on collecting board can be reclaimed, described cabin is connected with transport establishment, described transport establishment at least includes Lower Hold, the upper surface of described Lower Hold is provided with multiple roller being sequentially arranged, multiple cylinder it is provided with in described Lower Hold, the upper end of described cylinder is at least partially disposed at outside described Lower Hold, when described Telescopic-cylinder, the glass substrate jack-up that can will be placed on described roller, by changing the distance between glass substrate and target mechanism, regulate coating film thickness。
Other features and advantages of the present invention will be described in detail in detailed description of the invention part subsequently。
Accompanying drawing explanation
Accompanying drawing is used to provide a further understanding of the present invention, and constitutes the part of description, is used for explaining the present invention, but is not intended that limitation of the present invention together with detailed description below。In the accompanying drawings:
Fig. 1 is the structural representation of a kind of sputter coating mechanism provided by the invention；
Fig. 2 is the structural representation of roller in a kind of sputter coating mechanism provided by the invention。
Description of reference numerals
1-cabin 2-target mechanism
3-collecting board 4-baffle plate
5-rotating shaft 8-spongy body
9-roller 11-rubber ring
12-cylinder 13-Lower Hold
Detailed description of the invention
Below in conjunction with accompanying drawing, the specific embodiment of the present invention is described in detail。It should be appreciated that detailed description of the invention described herein is merely to illustrate and explains the present invention, it is not limited to the present invention。
As shown in Figure 1: the invention provides a kind of sputter coating mechanism, wherein, described sputter coating mechanism includes described cabin 1, top within described cabin 1 is fixed with target mechanism 2, the medial wall that described cabin 1 is relative is respectively arranged with baffle mechanism, and described target mechanism 2 is positioned at the top of described baffle mechanism, described baffle mechanism includes rotating shaft 5, baffle plate 4 and collecting board 3, one end of described baffle plate 4 connects medial wall, described cabin 1 by rotating shaft 5, described baffle plate 4 can be spun upside down with described rotating shaft 5 for fulcrum, described baffle plate 4 is detachably provided with collecting board 3 in the one side of described target, described cabin 1 is connected with transport establishment 9, described transport establishment 9 at least includes Lower Hold 13, the upper surface of described Lower Hold 13 is provided with multiple roller 9 being sequentially arranged, multiple cylinder 12 it is provided with in described Lower Hold 13, it is outside that the upper end of described cylinder 12 is at least partially disposed at described Lower Hold 13, when described cylinder 12 stretches, glass substrate 8 jack-up that can will be placed on described roller 9。During work, the angle adjusting 2 pieces of baffle plates 4 with medial wall, cabin 1 can be passed through, control the target as sputter scope to glass pane surface, the particle being in sputtering volume edges drops down onto on collecting board 3, owing to collecting board 3 is to be removably disposed on baffle plate 4, it is possible to the convenient particle to collecting on collecting board 3 reclaims。The glass substrate placed on roller 9 can cylinder 12 jack-up, by changing the distance between glass substrate and target mechanism, regulate coating film thickness。
The present invention one preferred embodiment in, so that contact softer with roller 9 of glass substrate, cut is produced when preventing glass substrate from sliding on roller 9, the surface of described roller 9 is sequentially socketed with multiple rubber ring 11 along its axial direction, preferably, the quantity of described rubber ring 11 is 4-8, and certainly, the quantity of rubber ring 11 can be adjusted according to the demand of those skilled in the art here。
In a kind of embodiment being more highly preferred to of the present invention, the upper end of described cylinder 12 is connected to spongy body 8, it is prevented that during cylinder 12 jack-up glass, glass back is produced cut。
The present invention one preferred embodiment in, described glass substrate can slide in the first direction on multiple described rollers 9, multiple described cylinders 12 are in described Lower Hold 13, it is equally spaced along described first direction, make multiple cylinder 12 can by stable for glass substrate jack-up, deviational survey phenomenon will not be there is, it is preferred that the quantity of cylinder 12 is 4-6。
The preferred embodiment of the present invention is described in detail above in association with accompanying drawing; but; the present invention is not limited to the detail in above-mentioned embodiment; in the technology concept of the present invention; technical scheme can being carried out multiple simple variant, these simple variant belong to protection scope of the present invention。
It is further to note that, each concrete technical characteristic described in above-mentioned detailed description of the invention, in reconcilable situation, it is possible to be combined by any suitable mode, in order to avoid unnecessary repetition, various possible compound modes are no longer illustrated by the present invention separately。
Additionally, can also carry out combination in any between the various different embodiment of the present invention, as long as it is without prejudice to the thought of the present invention, it should be considered as content disclosed in this invention equally。
Claims (6)
1. a sputter coating mechanism, it is characterized in that, described sputter coating mechanism includes described cabin (1), the top of inside, described cabin (1) is fixed with target mechanism (2), the medial wall that described cabin (1) is relative is respectively arranged with baffle mechanism, and described target mechanism (2) is positioned at the top of described baffle mechanism, described baffle mechanism includes rotating shaft (5), baffle plate (4) and collecting board (3), one end of described baffle plate (4) connects described cabin (1) medial wall by rotating shaft (5), described baffle plate (4) can be spun upside down with described rotating shaft (5) for fulcrum, described baffle plate (4) is detachably provided with collecting board (3) in the one side of described target, described cabin (1) is connected with transport establishment (9), described transport establishment (9) at least includes Lower Hold (13), the upper surface of described Lower Hold (13) is provided with multiple roller (9) being sequentially arranged, multiple cylinder (12) it is provided with in described Lower Hold (13), it is outside that the upper end of described cylinder (12) is at least partially disposed at described Lower Hold (13), when described cylinder (12) is flexible, glass substrate (8) jack-up that can will be placed on described roller (9)。
2. sputter coating mechanism according to claim 1, it is characterised in that be sequentially socketed with multiple rubber ring (11) along its axial direction on the surface of described roller (9)。
3. sputter coating mechanism according to claim 2, it is characterised in that the quantity of described rubber ring (11) is 4-8。
4. sputter coating mechanism according to claim 1, it is characterised in that the upper end of described cylinder (12) is connected to spongy body (8)。
5. sputter coating mechanism according to claim 4, it is characterized in that, described glass substrate can slide in the first direction on multiple described rollers (9), and multiple described cylinders (12), in described Lower Hold (13), are equally spaced along described first direction。
6. sputter coating mechanism according to claim 5, it is characterised in that the quantity of described cylinder (12) is 4-6。
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610266406.3A CN105695944A (en) | 2016-04-27 | 2016-04-27 | Sputter coating mechanism |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610266406.3A CN105695944A (en) | 2016-04-27 | 2016-04-27 | Sputter coating mechanism |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN105695944A true CN105695944A (en) | 2016-06-22 |
Family
ID=56217591
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201610266406.3A Pending CN105695944A (en) | 2016-04-27 | 2016-04-27 | Sputter coating mechanism |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN105695944A (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107190236A (en) * | 2017-07-27 | 2017-09-22 | 京东方科技集团股份有限公司 | Crucible, evaporation coating device and evaporation coating method |
| CN107345292A (en) * | 2017-07-26 | 2017-11-14 | 北京芯微诺达科技有限公司 | A kind of film-forming apparatus |
| CN109536900A (en) * | 2018-12-20 | 2019-03-29 | 兰州空间技术物理研究所 | A kind of extensible shrinkage type vacuum coating equipment cathode protection device |
| CN110684953A (en) * | 2018-07-05 | 2020-01-14 | 北京铂阳顶荣光伏科技有限公司 | Sputtering deposition device with shielding and method |
| CN114455852A (en) * | 2021-12-28 | 2022-05-10 | 凯盛信息显示材料(黄山)有限公司 | Magnetron sputtering glass coating device with adjustable sputtering range |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH11350126A (en) * | 1998-06-05 | 1999-12-21 | Hitachi Ltd | Sputtering apparatus |
| CN101665913A (en) * | 2009-09-30 | 2010-03-10 | 东莞宏威数码机械有限公司 | Processing device used for vacuum coating |
| CN202401123U (en) * | 2011-12-15 | 2012-08-29 | 佛山市中南罗森玻璃有限公司 | Target sputtering chamber provided with baffles |
| CN202989277U (en) * | 2012-11-26 | 2013-06-12 | 深圳市创益科技发展有限公司 | Substrate conveying device of continuous horizontal magnetron sputtering equipment |
-
2016
- 2016-04-27 CN CN201610266406.3A patent/CN105695944A/en active Pending
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH11350126A (en) * | 1998-06-05 | 1999-12-21 | Hitachi Ltd | Sputtering apparatus |
| CN101665913A (en) * | 2009-09-30 | 2010-03-10 | 东莞宏威数码机械有限公司 | Processing device used for vacuum coating |
| CN202401123U (en) * | 2011-12-15 | 2012-08-29 | 佛山市中南罗森玻璃有限公司 | Target sputtering chamber provided with baffles |
| CN202989277U (en) * | 2012-11-26 | 2013-06-12 | 深圳市创益科技发展有限公司 | Substrate conveying device of continuous horizontal magnetron sputtering equipment |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107345292A (en) * | 2017-07-26 | 2017-11-14 | 北京芯微诺达科技有限公司 | A kind of film-forming apparatus |
| CN107190236A (en) * | 2017-07-27 | 2017-09-22 | 京东方科技集团股份有限公司 | Crucible, evaporation coating device and evaporation coating method |
| CN110684953A (en) * | 2018-07-05 | 2020-01-14 | 北京铂阳顶荣光伏科技有限公司 | Sputtering deposition device with shielding and method |
| CN109536900A (en) * | 2018-12-20 | 2019-03-29 | 兰州空间技术物理研究所 | A kind of extensible shrinkage type vacuum coating equipment cathode protection device |
| CN109536900B (en) * | 2018-12-20 | 2021-02-05 | 兰州空间技术物理研究所 | Cathode protection device for extensible and retractable vacuum coating machine |
| CN114455852A (en) * | 2021-12-28 | 2022-05-10 | 凯盛信息显示材料(黄山)有限公司 | Magnetron sputtering glass coating device with adjustable sputtering range |
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| SE01 | Entry into force of request for substantive examination | ||
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| WD01 | Invention patent application deemed withdrawn after publication | ||
| WD01 | Invention patent application deemed withdrawn after publication |
Application publication date: 20160622 |