CN105668500B - High-sensitivity wide-range force sensor and manufacturing method thereof - Google Patents
High-sensitivity wide-range force sensor and manufacturing method thereof Download PDFInfo
- Publication number
- CN105668500B CN105668500B CN201610034473.2A CN201610034473A CN105668500B CN 105668500 B CN105668500 B CN 105668500B CN 201610034473 A CN201610034473 A CN 201610034473A CN 105668500 B CN105668500 B CN 105668500B
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- CN
- China
- Prior art keywords
- silicon
- lower floor
- substrate
- pressure drag
- thin film
- Prior art date
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- Expired - Fee Related
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Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
- B81B3/00—Devices comprising flexible or deformable elements, e.g. comprising elastic tongues or membranes
- B81B3/0018—Structures acting upon the moving or flexible element for transforming energy into mechanical movement or vice versa, i.e. actuators, sensors, generators
- B81B3/0021—Transducers for transforming electrical into mechanical energy or vice versa
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
- B81B3/00—Devices comprising flexible or deformable elements, e.g. comprising elastic tongues or membranes
- B81B3/0035—Constitution or structural means for controlling the movement of the flexible or deformable elements
- B81B3/0037—For increasing stroke, i.e. achieve large displacement of actuated parts
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
- B81B3/00—Devices comprising flexible or deformable elements, e.g. comprising elastic tongues or membranes
- B81B3/0064—Constitution or structural means for improving or controlling the physical properties of a device
- B81B3/0067—Mechanical properties
- B81B3/007—For controlling stiffness, e.g. ribs
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
- B81C1/00015—Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems
- B81C1/00134—Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems comprising flexible or deformable structures
- B81C1/0015—Cantilevers
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
- B81C1/00642—Manufacture or treatment of devices or systems in or on a substrate for improving the physical properties of a device
- B81C1/0065—Mechanical properties
- B81C1/00658—Treatments for improving the stiffness of a vibrating element
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
- G01L1/00—Measuring force or stress, in general
- G01L1/18—Measuring force or stress, in general using properties of piezo-resistive materials, i.e. materials of which the ohmic resistance varies according to changes in magnitude or direction of force applied to the material
Abstract
Description
Claims (4)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201610034473.2A CN105668500B (en) | 2016-01-19 | 2016-01-19 | High-sensitivity wide-range force sensor and manufacturing method thereof |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201610034473.2A CN105668500B (en) | 2016-01-19 | 2016-01-19 | High-sensitivity wide-range force sensor and manufacturing method thereof |
Publications (2)
Publication Number | Publication Date |
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CN105668500A CN105668500A (en) | 2016-06-15 |
CN105668500B true CN105668500B (en) | 2017-03-22 |
Family
ID=56301517
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201610034473.2A Expired - Fee Related CN105668500B (en) | 2016-01-19 | 2016-01-19 | High-sensitivity wide-range force sensor and manufacturing method thereof |
Country Status (1)
Country | Link |
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CN (1) | CN105668500B (en) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN107892268B (en) * | 2017-11-13 | 2023-07-14 | 苏州敏芯微电子技术股份有限公司 | Pressure sensor and method for manufacturing the same |
CN108426658B (en) * | 2018-03-26 | 2020-05-19 | 温州大学 | Ring contact high-range capacitance type micro-pressure sensor |
CN110307919B (en) * | 2019-07-31 | 2024-01-19 | 中国电子科技集团公司第五十八研究所 | High-sensitivity wide-range capacitive force sensor and preparation method thereof |
CN114354024B (en) * | 2022-03-17 | 2022-06-07 | 成都凯天电子股份有限公司 | High-sensitivity modal coupling type silicon resonance pressure sensor and pressure calculation method thereof |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6797631B2 (en) * | 2001-08-07 | 2004-09-28 | Korea Institute Of Science And Technology | High sensitive micro-cantilever sensor and fabricating method thereof |
CN1279362C (en) * | 2002-12-13 | 2006-10-11 | 中国科学院上海微系统与信息技术研究所 | Single chip integrated acceleration transducer of piezoresistance for micro girder construction in straight pull and vertical compression as well as its preparation method |
CN1240994C (en) * | 2003-04-10 | 2006-02-08 | 北京大学 | Microcantilever sensor and its making method |
CN100506686C (en) * | 2006-12-13 | 2009-07-01 | 清华大学 | Method for manufacturing piezoresistance type micro-cantilever beam sensor on SOI silicon sheet |
CN103921171B (en) * | 2014-04-17 | 2016-04-06 | 西安交通大学 | A kind of wide range piezoresistance type high-frequency rings fixed four component Milling Force sensors |
CN104237652B (en) * | 2014-09-03 | 2016-08-24 | 西安交通大学 | A kind of beam diaphragm structure high-voltage electrostatic field based on pressure-sensitive principle sensor chip |
CN104536063B (en) * | 2015-01-16 | 2017-01-18 | 东南大学 | Piezoresistance sensitivity and capacitance sensitivity combined rain sensor structure |
-
2016
- 2016-01-19 CN CN201610034473.2A patent/CN105668500B/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
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CN105668500A (en) | 2016-06-15 |
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Legal Events
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C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
CB03 | Change of inventor or designer information |
Inventor after: Qin Ming Inventor after: Ye Yizhou Inventor after: Wang Fang Inventor after: Gao Xinya Inventor before: Qin Ming Inventor before: Ye Yizhou Inventor before: Wang Fang Inventor before: Gao Qingya |
|
CB03 | Change of inventor or designer information | ||
CP02 | Change in the address of a patent holder |
Address after: 210093 Nanjing University Science Park, 22 Hankou Road, Gulou District, Nanjing City, Jiangsu Province Patentee after: Southeast University Address before: 210033 Xigang office, Qixia District, Nanjing, Jiangsu, No. 8, Qi Min Dong Road, Xingshan City, Patentee before: Southeast University |
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CP02 | Change in the address of a patent holder | ||
CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20170322 Termination date: 20200119 |
|
CF01 | Termination of patent right due to non-payment of annual fee |