CN105590821A - Electron beam generator of double-layer anode - Google Patents
Electron beam generator of double-layer anode Download PDFInfo
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- CN105590821A CN105590821A CN201410640073.7A CN201410640073A CN105590821A CN 105590821 A CN105590821 A CN 105590821A CN 201410640073 A CN201410640073 A CN 201410640073A CN 105590821 A CN105590821 A CN 105590821A
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- electron beam
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Abstract
The invention discloses an electron beam generator of a double-layer anode. The electron beam generator comprises a cathode, an anode, a buncher, an outer shield and an insulation layer, wherein the cathode is disposed at the top of the electron beam generator, the anode is disposed at the bottom of the electron beam generator, the cathode and the anode are respectively connected with an external power supply, the buncher is disposed at the central portion of the electron beam generator for adjusting the deflection direction of an electron beam, the anode and the buncher form the double-layer anode, the outer shield is used for providing a vacuum environment, and the insulation layer electrically isolates the cathode from the anode and the buncher from the outer shield.
Description
Technical field
The present invention relates to Metal Melting technology, relate to especially a kind of electron beam generator of bilayer anode.
Background technology
Vacuum electronic melting technique is in recent years emerging Metal Melting technology, has for refractory metalGood Smelting Effect. Electron beam generator is its energy source, traditional electron beam generator complex structure,Volume is large, and radiating condition is poor, and high to vacuum requirement, service life is short.
Summary of the invention
The present invention realizes by following technical proposals:
An electron beam generator for bilayer anode, comprising: negative electrode, anode, bunching electrode, outer shield,Insulating barrier, described negative electrode is positioned at electron beam generator top, and described anode is positioned at electron beam generatorBottom, negative electrode and positive electrode is connected with external power source respectively, and described bunching electrode is arranged in electron beam generatorPortion, adjusts the offset direction of electron beam, and described anode and bunching electrode form bilayer anode, described outsideGuard shield is for providing the environment of vacuum, and described insulating barrier enters negative electrode and anode, bunching electrode and outer shieldRow electrical isolation.
Further, the shape of bunching electrode can be tubular, cone tubular, curved surface tubular.
Further, the shape of negative electrode can be boss shape, fall infundibulate, quadratic surface shape, improves electricitySon passes through area.
Further, the shape of anode can be bulk, infundibulate, quadratic surface shape, column, carriesHigh electronics passes through area.
Compared with prior art, the present invention can realize a kind of electron beam generator simple in structure, passes throughThe form fit of electrode, improves electronics percent of pass, has improved smelting efficiency, has reduced electrode material simultaneouslyConsumption.
Brief description of the drawings
Fig. 1 is the structural representation of infundibulate electrode electron beam generator in embodiment 1 in the present invention.
Fig. 2 is the structural representation of quadratic surface shape electrode electron beam generator in embodiment 2 in the present invention.
Fig. 3 is the structural representation of the electron beam generator of combined shaped in embodiment 3 in the present invention.
Fig. 4 is the structural representation of the electron beam generator of another kind of combined shaped in embodiment 4 in the present inventionFigure.
Detailed description of the invention
Below in conjunction with the drawings and specific embodiments, the present invention is done to introduce further, but not as to thisBright restriction.
Embodiment 1
As shown in Figure 1, for a kind of structural representation of infundibulate electrode electron beam generator, from this signalFigure can find out, this electron beam generator comprises: negative electrode 1, anode 2, bunching electrode 3, outer shield 4,Insulating barrier 5 forms, wherein: negative electrode 1 is positioned at electron beam generator top, by insulating barrier 5 with protect outwardCover 4 is isolated and fixes, and bunching electrode 3 is positioned at electron beam generator middle part, is vertebra tubular, adjusts electron beamOffset direction, anode 2 is positioned at electron beam generator bottom, and anode 2 and bunching electrode 3 form bilayer anode,Outer shield 4 provides enclosure space and electromagnetic protection for electronic oven, and negative electrode 1 and anode 2 connect with outer electrodeConnect.
Negative electrode 1 is for falling infundibulate, and anode 2 is infundibulate, and bunching electrode 3 is cone tubular, anode 2 and poly-The bundle utmost point 3 forms bilayer anode. By extra electric field, electronics moves from negative electrode 1 anode 2, by poly-The bundle utmost point 3 is adjusted electronics moving direction, regulates electronics translational speed by extra electric field.
Embodiment 2
As shown in Figure 2, be a kind of structural representation of quadratic surface shape electrode electron beam generator, its knotStructure is similar to embodiment 1, and difference is the special shape electrode that negative electrode 1 is quadratic surface shape, anode2 is quadratic surface shape concave station, and bunching electrode 3 is cone tubular, and anode 2 and bunching electrode 3 form bilayer anode.
Can regulate the area that passes through of electronics by adjusting the shape of negative electrode 1 and anode 2, want according to differenceAsk to regulate extra electric field.
Embodiment 3
As shown in Figure 3, be a kind of structural representation of electron beam generator of combined shaped, its structure withEmbodiment 1 is similar, and difference is that negative electrode 1 is boss shape, and anode 2 is infundibulate, and bunching electrode 3 isCone tubular, anode 2 and bunching electrode 3 form bilayer anode.
Can combine according to actual needs by the shape of adjusting negative electrode 1 and anode 2, be applicable to differentPower requirement.
Embodiment 4
As shown in Figure 4, be the structural representation of the electron beam generator of another kind of combined shaped, its structureSimilar to embodiment 1, difference is that negative electrode 1 is boss shape, and anode 2 is column, and bunching electrode 3 isCone tubular, anode 2 and bunching electrode 3 form bilayer anode.
Can combine according to actual needs by the shape of adjusting negative electrode 1 and anode 2, be applicable to differentPower requirement.
Claims (4)
1. an electron beam generator for bilayer anode, comprising: negative electrode, anode, bunching electrode, outer shield,Insulating barrier, described negative electrode is positioned at electron beam generator top, and described anode is positioned at electron beam generatorBottom, negative electrode and positive electrode is connected with external power source respectively, and described bunching electrode is arranged in electron beam generatorPortion, adjusts the offset direction of electron beam, and described anode and bunching electrode form bilayer anode, described outsideGuard shield is for providing the environment of vacuum, and described insulating barrier enters negative electrode and anode, bunching electrode and outer shieldRow electrical isolation.
2. electron beam generator as claimed in claim 1, is characterized in that, the shape of described bunching electrodeShape can be tubular, cone tubular, curved surface tubular.
3. electron beam generator as claimed in claim 1, is characterized in that, the shape of described negative electrodeCan be boss shape, fall infundibulate, quadratic surface shape.
4. electron beam generator as claimed in claim 1, is characterized in that, the shape of described anodeCan be bulk, infundibulate, quadratic surface shape, column.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410640073.7A CN105590821A (en) | 2014-11-13 | 2014-11-13 | Electron beam generator of double-layer anode |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410640073.7A CN105590821A (en) | 2014-11-13 | 2014-11-13 | Electron beam generator of double-layer anode |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN105590821A true CN105590821A (en) | 2016-05-18 |
Family
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201410640073.7A Pending CN105590821A (en) | 2014-11-13 | 2014-11-13 | Electron beam generator of double-layer anode |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN105590821A (en) |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20100277053A1 (en) * | 2009-04-29 | 2010-11-04 | Atti International Services Company, Inc | Multiple Device Shaping Uniform Distribution of Current Density in Electro-Static Focusing Systems |
| CN102792782A (en) * | 2010-02-23 | 2012-11-21 | 佳能株式会社 | Radioactive ray generating apparatus and radioactive ray imaging system |
| CN104064433A (en) * | 2013-03-22 | 2014-09-24 | 海洋王照明科技股份有限公司 | Field emission plane light source and preparing method thereof |
-
2014
- 2014-11-13 CN CN201410640073.7A patent/CN105590821A/en active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20100277053A1 (en) * | 2009-04-29 | 2010-11-04 | Atti International Services Company, Inc | Multiple Device Shaping Uniform Distribution of Current Density in Electro-Static Focusing Systems |
| CN102792782A (en) * | 2010-02-23 | 2012-11-21 | 佳能株式会社 | Radioactive ray generating apparatus and radioactive ray imaging system |
| CN104064433A (en) * | 2013-03-22 | 2014-09-24 | 海洋王照明科技股份有限公司 | Field emission plane light source and preparing method thereof |
Non-Patent Citations (3)
| Title |
|---|
| 张国智，王中营: "《精密与特种加工技术》", 30 June 2013 * |
| 王德武: "《激光分离同位素理论及其应用》", 30 September 1999 * |
| 赵玉清: "《电子束离子束技术》", 31 March 2002 * |
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| C06 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| DD01 | Delivery of document by public notice | ||
| DD01 | Delivery of document by public notice |
Addressee: BEIJING XIAODIAN TECHNOLOGY CO., LTD. Document name: Decision of Rejection |
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| RJ01 | Rejection of invention patent application after publication | ||
| RJ01 | Rejection of invention patent application after publication |
Application publication date: 20160518 |