CN105573057A - Photoresist and preparation method and application thereof - Google Patents

Photoresist and preparation method and application thereof Download PDF

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Publication number
CN105573057A
CN105573057A CN201610096136.6A CN201610096136A CN105573057A CN 105573057 A CN105573057 A CN 105573057A CN 201610096136 A CN201610096136 A CN 201610096136A CN 105573057 A CN105573057 A CN 105573057A
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Prior art keywords
photoresist
parts
phenyl
weight
methyl
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Inventor
周徐
徐国强
黄耀鹏
徐海生
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Kunshan Hisense Electronics Co Ltd
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Kunshan Hisense Electronics Co Ltd
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Priority to CN201610096136.6A priority Critical patent/CN105573057A/en
Publication of CN105573057A publication Critical patent/CN105573057A/en
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    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41MPRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M5/00Duplicating or marking methods; Sheet materials for use therein
    • B41M5/0011Pre-treatment or treatment during printing of the recording material, e.g. heating, irradiating
    • B41M5/0017Application of ink-fixing material, e.g. mordant, precipitating agent, on the substrate prior to printing, e.g. by ink-jet printing, coating or spraying
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)

Abstract

The invention provides a photoresist and a preparation method and application thereof. The photoresist is prepared from, by weight, 40-80 parts of polyester acrylic resin, 2-10 parts of pigment, 6-12 parts of dye, 8-25 parts of reactive diluent, 2-8 parts of photoinitiator and 1-5 parts of dispersing agent. The photoresist has the advantages that the defects that an existing photoresist can not be used for printing and is extremely large in viscosity and the drying speed can not be precisely controlled are overcome, the photoresist has the advantages of being bright in color and luster, high in transparency, firm in adhesion force, high in curing speed, stable in performance, high in storage performance, excellent in weather resistance and corrosion resistance and the like, and the photoresist is suitable for the emerging industry of printing photoresists.

Description

Photoresist and preparation method thereof and application
Technical field
The present invention relates to photoresist field, particularly relate to a kind of UV and solidify printing photoresist and preparation method thereof and application.
Background technology
It is under certain Ultraviolet radiation that UV solidification prints photoresist, the liquid photoresist that can change from liquid to solid, it is made up of pigment, pre-(together) polymers, reactive diluent, light trigger and auxiliary agent usually, have not containing volatile solvent, odorless, non-stimulated, levelling good, the advantage such as stifled spray orifice, water tolerance are strong, solvent resistant scouring, be applicable to the industries such as PCB industry wiring board printing.
Generally, UV solidification prints photoresist is in existing system, add a certain amount of dyestuff thus make glue present transparent feel.But after adding dyestuff in existing photoresist system, can become cannot be dry, and viscosity is difficult to control, and the manufacturer producing this kind of product is at present little, and cannot promote.In addition, low in glossiness is printed when adopting two or more resin to do prepolymer, easy variable color, have that rate of drying is low, product viscosity is difficult to control, product is easy to the shortcomings such as gel, and existing photoresist cannot use owing to absorbing too high at 193nm and 157nm.
Therefore, need a kind of ink-jet UV that can be used for badly and solidify the photoresist printed.
Summary of the invention
Technical matters to be solved by this invention is, there is provided a kind of photoresist and preparation method thereof and application, described photoresist has bright in color, and transparency is high, adhesion is firm, curing rate is fast, stable performance, storage characteristics are strong, the advantage such as weatherability and excellent corrosion resistance.
In order to solve the problem, the invention provides a kind of photoresist, comprise following component:
Preferably, the functionality of described polyester acrylate resin is 3 ~ 9.
Preferably, the functionality of described reactive diluent is 3 ~ 5.
Preferably, described reactive diluent is acrylate monomer.
Preferably, described reactive diluent is the one in 2-phenoxyethyl acrylate, 1,6-hexanediol double methacrylate, two contracting propylene glycol double methacrylates, tripropylene glycol double methacrylate, pentaerythritol triacrylate, double pentaerythritol C5 methacrylate, ethoxylation trihydroxy methyl propane triacrylate, propoxylation trihydroxy methyl propane triacrylate.
Preferably, described dyestuff is oil-soluble dyes.
Preferably; described light trigger is α, the one in alpha-alpha-dimethyl benzil ketals, 2-hydroxy-2-methyl-1-phenyl-1-acetone, 1-hydroxyl-cyclohexyl benzophenone, 2-methyl isophthalic acid-[4-methyl mercapto phenyl]-2-morpholinyl-1-acetone, 2-phenyl-2-dimethylamino-1-(4-morpholinyl phenyl)-1-butanone, two benzoylphenyl phosphine oxide.
Preferably, described light trigger is the one in the potpourri that forms with benzophenone respectively of 2-hydroxy-2-methyl-1-phenyl-1-acetone, 1-hydroxy-cyciohexyl benzophenone and 2-methyl isophthalic acid-[4-methyl mercapto phenyl]-2-morpholinyl-1-acetone.
Preferably, described spreading agent is high molecular weight wetting dispersing agent.
The invention provides a kind of preparation method of photoresist, comprise the steps:
1) by 2-10 weight portion pigment, the mixing of 6-12 weight portion dyestuff, be mixed together dispersion with 20-30 weight of polyester acrylate resin and roll to particle diameter less than 1 micron, obtain the carrier of slurry;
2) described carrier and the parts by weight of activated mixing diluents of 2-7 are rolled, obtain screened stock;
3) in described screened stock, add 20-50 parts by weight of polypropylene acid ester resin, the parts by weight of activated thinning agent of 6-18,2-8 part light trigger and 1-5 part spreading agent, and filter after stirring the some time, obtain photoresist.
Preferably, in step 3) in, stirring rate is 800-2500 rev/min, and mixing time is 15 ~ 90 minutes.
Preferably, in step 3) in, can photoresist be obtained after adopting the butterfly metre filter of 1 micron.
The present invention also provides a kind of above-mentioned photoresist to solidify the application in printing at ink-jet UV.
The invention has the advantages that, overcome existing photoresist cannot be used for printing, viscosity is excessive, the defects such as rate of drying cannot accurately control, have bright in color, transparency is high, adhesion is firm, and curing rate is fast, stable performance, storage characteristics are strong, the advantage such as weatherability and excellent corrosion resistance, is applicable to print this emerging industry of photoresist.
Embodiment
Below the embodiment of photoresist provided by the invention and preparation method thereof with application is elaborated.
A kind of photoresist of the present invention, comprises following component:
Polyester acrylate class material, at 193nm highly transparent, therefore, is the preferred material of 193nm photoresist.Described polyester acrylate resin is the polyester acrylate of high functionality, and its functionality is 3 ~ 9.The polyester acrylate light reaction of high functionality significantly improves, and cured film cross-linking density is high, form fine and close curing cross-linked network, thus impel photoresist dry rapidly, but the too high stickiness that can cause again of functionality increases, flexible decline.Therefore get the polyester acrylate of functionality between 3 ~ 7, it has the physical and mechanical properties such as good wilfulness, pulling strengrth, and fine to the wetting effect of pigment, has suitable oleophylic-hydrophil balance.The weight portion of described polyester acrylate resin can be such as 40,41,42,43,44,45,46,47,48,49,50,51,52,53,54,55,56,57,58,59,60,61,62,63,64,65,66,67,68,69,70,71,72,73,74,75,76,77,78,79,80.
The demand for development photoresist of ultraviolet photolithographic technology is to high-performance, multifunction future development, and high-performance refers to that light-cured resin has high identification precision to ultraviolet light, solidification rate is fast; Multi-functionally refer to that the solid product of light is by further chemistry or physical treatment form function element.Existing photoresist is because viscosity is comparatively large or dilute for a large amount of reactive diluent of solid-state needs or solvent, and polyester acrylate carries numerous functional group because the molecular structure of its uniqueness makes it have and viscosity is lower etc., and thus feature is suitable as light-cured resin matrix very much; In addition, polyester acrylate easily achieves rapid photocuring by modification and has higher identification precision; Therefore the polyester acrylate of uV curable meets high performance requirement.
Described reactive diluent is the reactive diluent of high functionality, and its functionality is 3 ~ 7.Described reactive diluent is mainly acrylate monomer, being applicable to acrylic monomers of the present invention can be 2-phenoxyethyl acrylate, 1, 6-hexanediol double methacrylate, two contracting propylene glycol double methacrylates, tripropylene glycol double methacrylate, pentaerythritol triacrylate, double pentaerythritol C5 methacrylate, double pentaerythritol methacrylate, ethoxylated trimethylolpropane triacrylate, one in propoxylation trimethylolpropane triacrylate, preferred bipentaerythrite five propylene or double pentaerythritol methacrylate or ethoxylated trimethylolpropane triacrylate.The feature of described reactive diluent is that reflection is active high, and dilution effect is good, cured film is dry rapidly, pliability is good.The weight portion of described reactive diluent can be such as 8,9,10,11,12,13,14,15,16,17,18,19,20,21,22,23,24,25.
Reactive diluent makes the concentration of reactive double bond in system significantly improve, thus augmenting response speed, impels photoresist dry rapidly, but the high reactive diluent viscosity of functionality is higher, and dilution effect is poor.For ensureing dilution effect while high curing degree, get the reactive diluent of functionality between 3 ~ 5.
The present invention makes the dry problem of photoresist be solved by the polyacrylate and reactive diluent selecting suitable high functionality, and the rate of drying of photoresist can reach 30m/min (40w/cm mercury lamp, 2 ~ 5cm lamp distance), and stickiness can be controlled in 6 ~ 15.When curing system is comparatively stablized, the stickiness of photoresist can be reduced by the consumption strengthening reactive diluent, thus control photoresist within the scope of rational stickiness.
The pigment of photoresist of the present invention is organic pigment or inorganic pigment.Organic pigment tone is bright-coloured, strong coloring force, applies comparatively wide in ink, as azo system, the blue or green series pigments of phthalein; Inorganic pigment photostability, thermotolerance, solvent resistance, hidden power are all better, as titanium white, cadmium red, chrome green, ultramarine etc.Wherein, in the present invention, described organic pigment can be the one in azo lake pigment, azoic coupling component AS serial pigment, phthalocyanine color, and described inorganic pigment can be the one in barba hispanica, iron oxide red, titanium white, ultramarine, according to the color of photoresist, applicable pigment can be chosen.The weight portion of described pigment can be such as 2,3,4,5,6,7,8,9,10.
The dyestuff of photoresist of the present invention is oil-soluble dyes, oil-soluble dyes divide organic pigment and inorganic pigment, organic pigment is the one in azo lake pigment, azoic coupling component AS serial pigment, phthalocyanine color, described inorganic pigment is the one in barba hispanica, iron oxide red, titanium white, ultramarine, and the weight portion of described dyestuff can be such as 6,7,8,9,10,11,12.
Pigment is painted with particulate, does not dissolve, and be colorant the most frequently used in ink, and dyestuff is mixed with solution in use, painted in molecular state, and effect is not as pigment.Pigment can give ink with different colors and colour saturation, and makes ink have certain viscosity and drying property.Photoresist of the present invention adds a certain amount of particular dye in photoresist solvent, is namely formed the colour system of photoresist with the potpourri of pigment and dyestuff.Generally speaking, dyestuff can be molten, and pigment is insoluble.Dyestuff is for strengthening the transparency of coloring system, and make system distincter, visual effect is strong.Pigment in order to strengthen the stability of coloring system, light fastness and antiseptic property, and guarantees that product rapid solidification is cross-linked.With suitable component proportion pigment and dyestuff, the catalytic activity that dyestuff itself has effectively can be suppressed, strong at acquisition transparent feel, while the optic-solidified adhesive that color and luster is gorgeous, ensure that product stability is strong, weather resistance and excellent corrosion resistance.
Further, preferably, described spreading agent is macromolecule wetting dispersing agent, such as, polymer blocks polymeric quality wetting dispersing agent (as: HSMRHydispex7320 etc.) containing pigment affinity groups, can obtain more preferably color effects.The weight portion of described spreading agent can be such as 1,2,3,4,5.
Further; described light trigger can be α, the one in alpha-alpha-dimethyl benzil ketals, 2-hydroxy-2-methyl-1-phenyl-1-acetone, 1-hydroxyl-cyclohexyl benzophenone, 2-methyl isophthalic acid-[4-methyl mercapto phenyl]-2-morpholinyl-1-acetone, 2-phenyl-2-dimethylamino-1-(4-morpholinyl phenyl)-1-butanone, two benzoylphenyl phosphine oxide.Preferably, described light trigger can be the one in the potpourri that forms with benzophenone respectively of 2-hydroxy-2-methyl-1-phenyl-1-acetone, 1-hydroxy-cyciohexyl benzophenone and 2-methyl isophthalic acid-[4-methyl mercapto phenyl]-2-morpholinyl-1-acetone.Its common feature is that initiating activity is strong, and thermal stability is excellent, and wherein benzophenone is conducive to the solidification on photoresist surface.The weight portion of described light trigger can be such as 2,3,4,5,6,7,8.
Photoresist of the present invention has following effect:
Using the potpourri of pigment and dyestuff as the colour system of photoresist, make photoresist of the present invention transparent, color and luster is bright and beautiful.
The proportioning of photoresist pigment and dyestuff can regulate arbitrarily, the catalytic activity that can effectively suppress dyestuff itself to have, make properties of product more stable, not easily occur that gel, storage stability are strong, weather resistance and excellent corrosion resistance.
With the polyester acrylate of suitable high functionality and reactive diluent for raw material, make photoresist rapidly dry, strong adhesion; Regulate the consumption of reactive diluent can control photoresist stickiness within comparatively ideal scope, thus the stickiness realizing photoresist is adjustable.
The present invention also provides a kind of preparation method of photoresist, comprises the steps:
1) by 2-10 weight portion pigment, the mixing of 6-12 weight portion dyestuff, be mixed together dispersion with 20-30 weight of polyester acrylate resin and roll to particle diameter less than 1 micron, obtain the carrier of slurry.
2) described carrier and the parts by weight of activated mixing diluents of 2-7 are rolled, obtain screened stock.
3) in described screened stock, add 20-50 parts by weight of polypropylene acid ester resin, the parts by weight of activated thinning agent of 6-18,2-8 part light trigger and 1-5 part spreading agent, and filter after stirring the some time, obtain photoresist.Stirring rate is 800-2500 rev/min, and mixing time is 15 ~ 90 minutes, can obtain photoresist after adopting the butterfly metre filter of 1 micron.
In step 3) in, ensure that the pigment particle size more than 95% of grinding is less than 1 micron, fineness gauge tracking and monitoring can be used after three-roller grinds repeatedly.Avoid direct sunlight in whole production layoutprocedure, common daylight and lighting source do not have appreciable impact.
The present invention also provides a kind of above-mentioned photoresist to solidify the application in printing at ink-jet UV.
In order to obtain the photoresist being suitable for inkjet printing, need to eject photoresist from ink gun continuously, the viscosity 45 DEG C time of the photoresist in the present invention is between 18 ~ 22CP, and surface tension is 25 ~ 35 dynes per centimeter.Use the IJDAS3000UV ink-jet printer of this electronics of sea, Kunshan, nozzle temperature is controlled at 45 ± 1 DEG C, adopt continuous ink feeding mode that printing photoresist is injected black groove, the equipment of adjustment starts to print, when namely photoresist spray printing was solidified completely by the UV lamp opened instantaneously within base material upper 0.5 second, gained patterned surface is uniform and smooth, with hundred lattice methods test its adhesion be 100% can't harm.
Enumerate several embodiments of photoresist of the present invention and preparation method thereof below, to further illustrate photoresist of the present invention and preparation method thereof.
Embodiment 1
The preparation of the blue photoresist printed is solidified for ink-jet UV.
6 parts of phthalocyanine blues and the potpourri of 7 parts of oil-soluble dyes and the polyacrylate resin of 15 parts are dispersed on three-roller fine ground, then 6 parts of acrylic ester mixed synthetic pulps of bipentaerythrite are added complete, add 45 parts of polyester acrylate resin and 30 parts of double pentaerythritol C5 methacrylates and 3 parts of 1-hydroxy-cyciohexyl benzophenones, 1 part of spreading agent again, control stirring rate at 1800 revs/min, stir after 90 minutes and can obtain the blue photoresist of UV, and with the butterfly filtrator of 1 micron, blue photoresist is all filtered and can obtain finished product.Direct sunlight is avoided in whole process.
Embodiment 2
The preparation of the blue-tinted transparent photoresist printed is solidified for ink-jet UV.
10 parts of phthalocyanine blues and the potpourri of 8 parts of oil-soluble dyes and the polyacrylate resin of 10 parts are dispersed on three-roller fine ground, then 4 parts of tripropylene glycol double methacrylate mixing pulpings are added complete, add 40 parts of polyester acrylate resin and 16 parts of tripropylene glycol double methacrylates and 3 parts of 2-hydroxy-2-methyl-1-phenyl-1-acetone again, 3 parts of benzophenone, 3 parts of spreading agents, control stirring rate at 1800 revs/min, stir and can obtain UV blue-tinted transparent photoresist after 90 minutes, and with the butterfly filtrator of 1 micron, blue-tinted transparent photoresist is all filtered and can obtain finished product.Whole process is carried out in indoor.
Embodiment 3
The preparation of the black transparent photoresist printed is solidified for ink-jet UV.
13 parts of carbon blacks and the potpourri of 8 parts of oil-soluble dyes and the polyacrylate resin of 10 parts are dispersed on three-roller fine ground, then 5 parts of pentaerythritol triacrylate mixing pulpings are added complete, add 36 parts of polyester acrylate resin and 18 parts of pentaerythritol triacrylates and 3 parts of α again, alpha-alpha-dimethyl benzil ketals, 1 part of spreading agent, control stirring rate at 2200 revs/min, stir and can obtain UV black transparent photoresist after 45 minutes, and with the butterfly filtrator of 1 micron, black transparent photoresist is all filtered and can obtain finished product.Direct sunlight is avoided in whole process.
Embodiment 4
The preparation of the red, transparent photoresist printed is solidified for ink-jet UV.
12 parts of permanent bordeauxs and the potpourri of 10 parts of oil-soluble dyes and the polyacrylate resin of 16 parts are dispersed on three-roller fine ground, then 4 parts of ethoxylated trimethylolpropane triacrylate mixing pulpings are added complete, add 46 parts of polyester acrylate resin and 8 parts of ethoxylated trimethylolpropane triacrylates and 2 parts of two benzoylphenyl phosphine oxide again, 1 part of spreading agent, control stirring rate at 1900 revs/min, stir and can obtain UV red, transparent photoresist after 60 minutes, and with the butterfly filtrator of 1 micron, red, transparent photoresist is all filtered and can obtain finished product.Direct sunlight is avoided in whole process.
The above is only the preferred embodiment of the present invention; it should be pointed out that for those skilled in the art, under the premise without departing from the principles of the invention; can also make some improvements and modifications, these improvements and modifications also should be considered as protection scope of the present invention.

Claims (13)

1. a photoresist, is characterized in that, comprises following component:
2. photoresist according to claim 1, is characterized in that, the functionality of described polyester acrylate resin is 3 ~ 9.
3. photoresist according to claim 1, is characterized in that, the functionality of described reactive diluent is 3 ~ 5.
4. photoresist according to claim 1, is characterized in that, described reactive diluent is acrylate monomer.
5. photoresist according to claim 1, it is characterized in that, described reactive diluent is the one in 2-phenoxyethyl acrylate, 1,6-hexanediol double methacrylate, two contracting propylene glycol double methacrylates, tripropylene glycol double methacrylate, pentaerythritol triacrylate, double pentaerythritol C5 methacrylate, ethoxylation trihydroxy methyl propane triacrylate, propoxylation trihydroxy methyl propane triacrylate.
6. photoresist according to claim 1, is characterized in that, described dyestuff is oil-soluble dyes.
7. photoresist according to claim 1; it is characterized in that; described light trigger is α, the one in alpha-alpha-dimethyl benzil ketals, 2-hydroxy-2-methyl-1-phenyl-1-acetone, 1-hydroxyl-cyclohexyl benzophenone, 2-methyl isophthalic acid-[4-methyl mercapto phenyl]-2-morpholinyl-1-acetone, 2-phenyl-2-dimethylamino-1-(4-morpholinyl phenyl)-1-butanone, two benzoylphenyl phosphine oxide.
8. photoresist according to claim 1, it is characterized in that, described light trigger is the one in the potpourri that forms with benzophenone respectively of 2-hydroxy-2-methyl-1-phenyl-1-acetone, 1-hydroxy-cyciohexyl benzophenone and 2-methyl isophthalic acid-[4-methyl mercapto phenyl]-2-morpholinyl-1-acetone.
9. photoresist according to claim 1, is characterized in that, described spreading agent is high molecular weight wetting dispersing agent.
10. a preparation method for photoresist, is characterized in that, comprises the steps:
1) by 2-10 weight portion pigment, the mixing of 6-12 weight portion dyestuff, be mixed together dispersion with 20-30 weight of polyester acrylate resin and roll to particle diameter less than 1 micron, obtain the carrier of slurry;
2) described carrier and the parts by weight of activated mixing diluents of 2-7 are rolled, obtain screened stock;
3) in described screened stock, add 20-50 parts by weight of polypropylene acid ester resin, the parts by weight of activated thinning agent of 6-18,2-8 part light trigger and 1-5 part spreading agent, and filter after stirring the some time, obtain photoresist.
The preparation method of 11. photoresists according to claim 10, is characterized in that, in step 3) in, stirring rate is 800-2500 rev/min, and mixing time is 15 ~ 90 minutes.
The preparation method of 12. photoresists according to claim 10, is characterized in that, in step 3) in, can photoresist be obtained after adopting the butterfly metre filter of 1 micron.
Photoresist described in 13. 1 kinds of claims 1 ~ 9 solidifies the application in printing at ink-jet UV.
CN201610096136.6A 2016-02-22 2016-02-22 Photoresist and preparation method and application thereof Pending CN105573057A (en)

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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109897225A (en) * 2019-01-29 2019-06-18 东莞职业技术学院 A kind of pigment derivative, colour UV Photocurable composition and preparation method thereof
CN111142336A (en) * 2020-01-17 2020-05-12 天津瑞宏汽车配件制造有限公司 Flexible photoresist composition
WO2023216939A1 (en) * 2022-05-07 2023-11-16 浙江鑫柔科技有限公司 Colored photoresist material and preparation method therefor and use thereof

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101003705A (en) * 2007-01-05 2007-07-25 深圳市深赛尔实业有限公司 UV offset transparent printing ink, and preparation method

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101003705A (en) * 2007-01-05 2007-07-25 深圳市深赛尔实业有限公司 UV offset transparent printing ink, and preparation method

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109897225A (en) * 2019-01-29 2019-06-18 东莞职业技术学院 A kind of pigment derivative, colour UV Photocurable composition and preparation method thereof
CN109897225B (en) * 2019-01-29 2022-04-12 东莞职业技术学院 Pigment derivative, colored UV (ultraviolet) photocuring composition and preparation method thereof
CN111142336A (en) * 2020-01-17 2020-05-12 天津瑞宏汽车配件制造有限公司 Flexible photoresist composition
WO2023216939A1 (en) * 2022-05-07 2023-11-16 浙江鑫柔科技有限公司 Colored photoresist material and preparation method therefor and use thereof

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Application publication date: 20160511