CN105568289A - Modified metal polishing solution - Google Patents
Modified metal polishing solution Download PDFInfo
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- CN105568289A CN105568289A CN201610069537.2A CN201610069537A CN105568289A CN 105568289 A CN105568289 A CN 105568289A CN 201610069537 A CN201610069537 A CN 201610069537A CN 105568289 A CN105568289 A CN 105568289A
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- polyethylene wax
- citric acid
- metal polishing
- diethanolamine
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F3/00—Brightening metals by chemical means
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Lubricants (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
Abstract
The invention discloses a modified metal polishing solution. The modified metal polishing solution is prepared from modified polyethylene wax, sodium oleate, citric acid, sodium tripolyphosphate, diethanol amine, ethanol amine, lauryl diethanolamine, hydroxy propyl cellulose, diethylene glycol monomethyl ether, polypropylene oxide polyoxyethylene propylene propylene glycol ether, quartz sand, nanometer aluminum oxide, gelatin, methionine, trialkylamine, sodium alkyl benzene sulfonate, glucose, sodium silicate, citrate and deionized water. The modified metal polishing solution is high in polishing efficiency, good in stability and good in corrosion resisting and wear resisting performance.
Description
Technical field
The present invention relates to a kind of metal-polishing liquid, particularly relate to a kind of modified metal polishing fluid.
Background technology
At present, metal products often with jagged or be coated with the oxide film of one deck grey, affects its attractive in appearance and corrosion resistance nature in machine-shaping rear surface.After its surface being carried out to finish (polishing) process, can greatly improve surface smoothness and erosion resistance.At present, conventional polished finish method has mechanical polishing, chemical rightenning, electrochemical etching three kinds.The Surface flat of mechanical polishing is better, but its labour intensity is large and the gloss hold-time is not long, is only applicable to the simple metal works of structure; Although electrochemical etching effect is better, high cost; Existing chemical brightening solution can be divided into chloroazotic acid type, sulfuric acid type and phosphatic type etc., adopt chemical rightenning to have cost and drop into the advantage low, polished part geometrical shape is unrestricted and production efficiency is high, but its luminance brightness is poor, environmental pollution is comparatively large and safety precaution requires high.Therefore the metal-polishing liquid that a kind of polishing effect of market in urgent need is good.
Summary of the invention
For solving the technical problem existed in background technology, the present invention proposes a kind of modified metal polishing fluid, and its polishing efficiency is high, good stability, and anticorrosion good with wear resisting property.
A kind of modified metal polishing fluid that the present invention proposes, its raw material comprises by weight: modified polyethylene wax 80-120 part, sodium oleate 20-60 part, citric acid 15-35 part, tripoly phosphate sodium STPP 5-15 part, diethanolamine 2-8 part, thanomin 1-6 part, lauroyl diethanolamine 2-6 part, hydroxypropylcellulose 1-4 part, diethylene glycol monomethyl ether 3-9 part, polyoxyethylene polyoxypropylene propylene glycol 4-8 part, quartz sand 1-8 part, nano aluminium oxide 2-7 part, gelatin 1-5 part, methionine(Met) 2-6 part, citric acid 3-8 part, trialkylamine 1-4 part, sodium alkyl benzene sulfonate 1-4 part, glucose 2-6 part, water glass 1-5 part, Citrate trianion 4-8 part, deionized water 20-40 part.
Preferably, modified polyethylene wax is prepared by following technique: maleic anhydride, initiator B PO and acetone are mixed and obtain material a; Paraffin and polyethylene wax are mixed, be warming up to 95-125 DEG C, insulation 1-3h, in the process of insulation, drips material a, is then warming up to 105-115 DEG C, obtain modified polyethylene wax after stirring under the protection of nitrogen.
Preferably, the weight ratio of maleic anhydride, initiator B PO, acetone, paraffin and polyethylene wax is 5-15:2-6:3-9:1-5:2-6.
Preferably, the weight ratio of modified polyethylene wax, sodium oleate, citric acid, tripoly phosphate sodium STPP is 85-115:25-55:18-32:8-12.
Preferably, the weight ratio of diethanolamine, thanomin, lauroyl diethanolamine, hydroxypropylcellulose, diethylene glycol monomethyl ether and polyoxyethylene polyoxypropylene propylene glycol is 3-7:2-5:3-5:2-3:4-8:5-7.
Preferably, its raw material comprises by weight: modified polyethylene wax 85-115 part, sodium oleate 25-55 part, citric acid 18-32 part, tripoly phosphate sodium STPP 8-12 part, diethanolamine 3-7 part, thanomin 2-5 part, lauroyl diethanolamine 3-5 part, hydroxypropylcellulose 2-3 part, diethylene glycol monomethyl ether 4-8 part, polyoxyethylene polyoxypropylene propylene glycol 5-7 part, quartz sand 2-7 part, nano aluminium oxide 3-6 part, gelatin 2-4 part, methionine(Met) 3-5 part, citric acid 4-7 part, trialkylamine 2-3 part, sodium alkyl benzene sulfonate 2-3 part, glucose 3-5 part, water glass 2-4 part, Citrate trianion 5-7 part, deionized water 25-35 part.
Preferably, its raw material comprises by weight: modified polyethylene wax 100 parts, sodium oleate 40 parts, citric acid 25 parts, tripoly phosphate sodium STPP 10 parts, diethanolamine 5 parts, thanomin 3.5 parts, lauroyl diethanolamine 4 parts, hydroxypropylcellulose 2.5 parts, diethylene glycol monomethyl ether 6 parts, polyoxyethylene polyoxypropylene propylene glycol 6 parts, quartz sand 4.5 parts, nano aluminium oxide 4.5 parts, 3 parts, gelatin, methionine(Met) 4 parts, citric acid 5.5 parts, trialkylamine 2.5 parts, sodium alkyl benzene sulfonate 2.5 parts, glucose 4 parts, water glass 3 parts, Citrate trianion 6 parts, deionized water 30 parts.
A kind of modified metal polishing fluid of the present invention, its raw material comprises modified polyethylene wax, sodium oleate, citric acid, tripoly phosphate sodium STPP, diethanolamine, thanomin, lauroyl diethanolamine, hydroxypropylcellulose, diethylene glycol monomethyl ether, polyoxyethylene polyoxypropylene propylene glycol, quartz sand, nano aluminium oxide, gelatin, methionine(Met), citric acid, trialkylamine, sodium alkyl benzene sulfonate, glucose, water glass, Citrate trianion and deionized water, by the major ingredient of modified polyethylene wax as metal-polishing liquid of the present invention, auxiliary interpolation sodium oleate, citric acid, tripoly phosphate sodium STPP, diethanolamine, thanomin and lauroyl diethanolamine are as the supporting material of major ingredient, further increase the polishing performance of metal-polishing liquid of the present invention, the hydroxypropylcellulose added, diethylene glycol monomethyl ether, polyoxyethylene polyoxypropylene propylene glycol, quartz sand, nano aluminium oxide, gelatin, methionine(Met), citric acid, trialkylamine, sodium alkyl benzene sulfonate, glucose, water glass, Citrate trianion and deionized water further increase the polishing performance of metal-polishing liquid of the present invention as auxiliary agent, make metal-polishing liquid of the present invention institute polishing metallic surface out have excellent wear resisting property and corrosion resistance nature.
Embodiment
Below in conjunction with specific embodiment, the present invention is described in detail; should understand; embodiment is only for illustration of the present invention, instead of for limiting the present invention, any amendment, equivalent replacement etc. made on basis of the present invention is all in protection scope of the present invention.
Embodiment 1
A kind of modified metal polishing fluid that the present invention proposes, its raw material comprises by weight: modified polyethylene wax 100 parts, sodium oleate 40 parts, citric acid 25 parts, tripoly phosphate sodium STPP 10 parts, diethanolamine 5 parts, thanomin 3.5 parts, lauroyl diethanolamine 4 parts, hydroxypropylcellulose 2.5 parts, diethylene glycol monomethyl ether 6 parts, polyoxyethylene polyoxypropylene propylene glycol 6 parts, quartz sand 4.5 parts, nano aluminium oxide 4.5 parts, 3 parts, gelatin, methionine(Met) 4 parts, citric acid 5.5 parts, trialkylamine 2.5 parts, sodium alkyl benzene sulfonate 2.5 parts, glucose 4 parts, water glass 3 parts, Citrate trianion 6 parts, deionized water 30 parts.
Modified polyethylene wax is prepared by following technique: 10 parts of maleic anhydrides, 4 parts of initiator B PO and 6 part acetone are mixed and obtain material a by weight; 3 parts of paraffin and 4 parts of polyethylene waxs are mixed, be warming up to 110 DEG C, insulation 2h, in the process of insulation, drips material a, is then warming up to 110 DEG C, obtains modified polyethylene wax after stirring under the protection of nitrogen.
Embodiment 2
A kind of modified metal polishing fluid that the present invention proposes, its raw material comprises by weight: modified polyethylene wax 80 parts, sodium oleate 60 parts, citric acid 15 parts, tripoly phosphate sodium STPP 15 parts, diethanolamine 2 parts, thanomin 6 parts, lauroyl diethanolamine 2 parts, hydroxypropylcellulose 4 parts, diethylene glycol monomethyl ether 3 parts, polyoxyethylene polyoxypropylene propylene glycol 8 parts, quartz sand 1 part, nano aluminium oxide 7 parts, 1 part, gelatin, methionine(Met) 6 parts, citric acid 3 parts, trialkylamine 4 parts, sodium alkyl benzene sulfonate 1 part, glucose 6 parts, water glass 1 part, Citrate trianion 8 parts, deionized water 20 parts.
Modified polyethylene wax is prepared by following technique: 5 parts of maleic anhydrides, 6 parts of initiator B PO and 3 part acetone are mixed and obtain material a by weight; 5 parts of paraffin and 2 parts of polyethylene waxs are mixed, be warming up to 125 DEG C, insulation 1h, in the process of insulation, drips material a, is then warming up to 115 DEG C, obtains modified polyethylene wax after stirring under the protection of nitrogen.
Embodiment 3
A kind of modified metal polishing fluid that the present invention proposes, its raw material comprises by weight: modified polyethylene wax 120 parts, sodium oleate 20 parts, citric acid 35 parts, tripoly phosphate sodium STPP 5 parts, diethanolamine 8 parts, thanomin 1 part, lauroyl diethanolamine 6 parts, hydroxypropylcellulose 1 part, diethylene glycol monomethyl ether 9 parts, polyoxyethylene polyoxypropylene propylene glycol 4 parts, quartz sand 8 parts, nano aluminium oxide 2 parts, 5 parts, gelatin, methionine(Met) 2 parts, citric acid 8 parts, trialkylamine 1 part, sodium alkyl benzene sulfonate 4 parts, glucose 2 parts, water glass 5 parts, Citrate trianion 4 parts, deionized water 40 parts.
Modified polyethylene wax is prepared by following technique: 15 parts of maleic anhydrides, 2 parts of initiator B PO and 9 part acetone are mixed and obtain material a by weight; 1 part of paraffin and 6 parts of polyethylene waxs are mixed, be warming up to 95 DEG C, insulation 3h, in the process of insulation, drips material a, is then warming up to 105 DEG C, obtains modified polyethylene wax after stirring under the protection of nitrogen.
Embodiment 4
A kind of modified metal polishing fluid that the present invention proposes, its raw material comprises by weight: modified polyethylene wax 85 parts, sodium oleate 55 parts, citric acid 18 parts, tripoly phosphate sodium STPP 12 parts, diethanolamine 3 parts, thanomin 5 parts, lauroyl diethanolamine 3 parts, hydroxypropylcellulose 3 parts, diethylene glycol monomethyl ether 4 parts, polyoxyethylene polyoxypropylene propylene glycol 7 parts, quartz sand 2 parts, nano aluminium oxide 6 parts, 2 parts, gelatin, methionine(Met) 5 parts, citric acid 4 parts, trialkylamine 3 parts, sodium alkyl benzene sulfonate 2 parts, glucose 5 parts, water glass 2 parts, Citrate trianion 7 parts, deionized water 25 parts.
Modified polyethylene wax is prepared by following technique: 8 parts of maleic anhydrides, 5 parts of initiator B PO and 4 part acetone are mixed and obtain material a by weight; 4 parts of paraffin and 3 parts of polyethylene waxs are mixed, be warming up to 122 DEG C, insulation 1.5h, in the process of insulation, drips material a, is then warming up to 112 DEG C, obtains modified polyethylene wax after stirring under the protection of nitrogen.
Embodiment 5
A kind of modified metal polishing fluid that the present invention proposes, its raw material comprises by weight: modified polyethylene wax 115 parts, sodium oleate 25 parts, citric acid 32 parts, tripoly phosphate sodium STPP 8 parts, diethanolamine 7 parts, thanomin 2 parts, lauroyl diethanolamine 5 parts, hydroxypropylcellulose 2 parts, diethylene glycol monomethyl ether 8 parts, polyoxyethylene polyoxypropylene propylene glycol 5 parts, quartz sand 7 parts, nano aluminium oxide 3 parts, 4 parts, gelatin, methionine(Met) 3 parts, citric acid 7 parts, trialkylamine 2 parts, sodium alkyl benzene sulfonate 3 parts, glucose 3 parts, water glass 2 parts, Citrate trianion 7 parts, deionized water 25 parts.
Modified polyethylene wax is prepared by following technique: 12 parts of maleic anhydrides, 3 parts of initiator B PO and 8 part acetone are mixed and obtain material a by weight; 2 parts of paraffin and 5 parts of polyethylene waxs are mixed, be warming up to 98 DEG C, insulation 2.5h, in the process of insulation, drips material a, is then warming up to 108 DEG C, obtains modified polyethylene wax after stirring under the protection of nitrogen.
The above; be only the present invention's preferably embodiment; but protection scope of the present invention is not limited thereto; anyly be familiar with those skilled in the art in the technical scope that the present invention discloses; be equal to according to technical scheme of the present invention and inventive concept thereof and replace or change, all should be encompassed within protection scope of the present invention.
Claims (7)
1. a modified metal polishing fluid, it is characterized in that, its raw material comprises by weight: modified polyethylene wax 80-120 part, sodium oleate 20-60 part, citric acid 15-35 part, tripoly phosphate sodium STPP 5-15 part, diethanolamine 2-8 part, thanomin 1-6 part, lauroyl diethanolamine 2-6 part, hydroxypropylcellulose 1-4 part, diethylene glycol monomethyl ether 3-9 part, polyoxyethylene polyoxypropylene propylene glycol 4-8 part, quartz sand 1-8 part, nano aluminium oxide 2-7 part, gelatin 1-5 part, methionine(Met) 2-6 part, citric acid 3-8 part, trialkylamine 1-4 part, sodium alkyl benzene sulfonate 1-4 part, glucose 2-6 part, water glass 1-5 part, Citrate trianion 4-8 part, deionized water 20-40 part.
2. modified metal polishing fluid according to claim 1, is characterized in that, modified polyethylene wax is prepared by following technique: maleic anhydride, initiator B PO and acetone are mixed and obtain material a; Paraffin and polyethylene wax are mixed, be warming up to 95-125 DEG C, insulation 1-3h, in the process of insulation, drips material a, is then warming up to 105-115 DEG C, obtain modified polyethylene wax after stirring under the protection of nitrogen.
3. modified metal polishing fluid according to claim 1 and 2, is characterized in that, the weight ratio of maleic anhydride, initiator B PO, acetone, paraffin and polyethylene wax is 5-15:2-6:3-9:1-5:2-6.
4. the modified metal polishing fluid according to any one of claim 1-3, is characterized in that, the weight ratio of modified polyethylene wax, sodium oleate, citric acid, tripoly phosphate sodium STPP is 85-115:25-55:18-32:8-12.
5. the modified metal polishing fluid according to any one of claim 1-4, it is characterized in that, the weight ratio of diethanolamine, thanomin, lauroyl diethanolamine, hydroxypropylcellulose, diethylene glycol monomethyl ether and polyoxyethylene polyoxypropylene propylene glycol is 3-7:2-5:3-5:2-3:4-8:5-7.
6. the modified metal polishing fluid according to any one of claim 1-5, it is characterized in that, its raw material comprises by weight: modified polyethylene wax 85-115 part, sodium oleate 25-55 part, citric acid 18-32 part, tripoly phosphate sodium STPP 8-12 part, diethanolamine 3-7 part, thanomin 2-5 part, lauroyl diethanolamine 3-5 part, hydroxypropylcellulose 2-3 part, diethylene glycol monomethyl ether 4-8 part, polyoxyethylene polyoxypropylene propylene glycol 5-7 part, quartz sand 2-7 part, nano aluminium oxide 3-6 part, gelatin 2-4 part, methionine(Met) 3-5 part, citric acid 4-7 part, trialkylamine 2-3 part, sodium alkyl benzene sulfonate 2-3 part, glucose 3-5 part, water glass 2-4 part, Citrate trianion 5-7 part, deionized water 25-35 part.
7. the modified metal polishing fluid according to any one of claim 1-6, it is characterized in that, its raw material comprises by weight: modified polyethylene wax 100 parts, sodium oleate 40 parts, citric acid 25 parts, tripoly phosphate sodium STPP 10 parts, diethanolamine 5 parts, thanomin 3.5 parts, lauroyl diethanolamine 4 parts, hydroxypropylcellulose 2.5 parts, diethylene glycol monomethyl ether 6 parts, polyoxyethylene polyoxypropylene propylene glycol 6 parts, quartz sand 4.5 parts, nano aluminium oxide 4.5 parts, 3 parts, gelatin, methionine(Met) 4 parts, citric acid 5.5 parts, trialkylamine 2.5 parts, sodium alkyl benzene sulfonate 2.5 parts, glucose 4 parts, water glass 3 parts, Citrate trianion 6 parts, deionized water 30 parts.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610069537.2A CN105568289A (en) | 2016-01-28 | 2016-01-28 | Modified metal polishing solution |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610069537.2A CN105568289A (en) | 2016-01-28 | 2016-01-28 | Modified metal polishing solution |
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| CN105568289A true CN105568289A (en) | 2016-05-11 |
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| CN201610069537.2A Pending CN105568289A (en) | 2016-01-28 | 2016-01-28 | Modified metal polishing solution |
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Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105970230A (en) * | 2016-07-10 | 2016-09-28 | 李金平 | Environment-friendly chemical polishing solution |
| CN108048844A (en) * | 2017-12-11 | 2018-05-18 | 浙江三瑞铜业有限公司 | A kind of metal polishing procedure |
| CN108754499A (en) * | 2018-07-03 | 2018-11-06 | 贵州大学 | A kind of technique of relieving haperacidity coproduction metal-polishing liquid |
| CN110735026A (en) * | 2019-09-28 | 2020-01-31 | 福建省精新科技制针有限公司 | knitting needle heat treatment method |
| CN112247491A (en) * | 2020-10-23 | 2021-01-22 | 苏州航菱微精密组件有限公司 | Chip packaging detection equipment rack processing and welding method |
-
2016
- 2016-01-28 CN CN201610069537.2A patent/CN105568289A/en active Pending
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105970230A (en) * | 2016-07-10 | 2016-09-28 | 李金平 | Environment-friendly chemical polishing solution |
| CN108048844A (en) * | 2017-12-11 | 2018-05-18 | 浙江三瑞铜业有限公司 | A kind of metal polishing procedure |
| CN108754499A (en) * | 2018-07-03 | 2018-11-06 | 贵州大学 | A kind of technique of relieving haperacidity coproduction metal-polishing liquid |
| CN110735026A (en) * | 2019-09-28 | 2020-01-31 | 福建省精新科技制针有限公司 | knitting needle heat treatment method |
| CN112247491A (en) * | 2020-10-23 | 2021-01-22 | 苏州航菱微精密组件有限公司 | Chip packaging detection equipment rack processing and welding method |
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Application publication date: 20160511 |
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| WD01 | Invention patent application deemed withdrawn after publication |