CN105524592A - Grinding material - Google Patents
Grinding material Download PDFInfo
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- CN105524592A CN105524592A CN201510417886.4A CN201510417886A CN105524592A CN 105524592 A CN105524592 A CN 105524592A CN 201510417886 A CN201510417886 A CN 201510417886A CN 105524592 A CN105524592 A CN 105524592A
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- zirconia particles
- cerium salt
- abrasive substance
- portfolio ratio
- grinding
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Abstract
The invention relates to a grinding material. The grinding material comprises zirconia particles and a cerium salt. A weight ratio of the zirconia particles to the cerium salt is 7-5: 3-5. The zirconia particle has a specific surface area of 1-10m<2>/g. The zirconia particle has the average primary particle size of 0.2 microns or less. In 1mL of the aqueous dispersion containing 1% by mass of zirconia particles, the number of the zirconia particles with the secondary particle sizes of 4 microns or more is 20000000 or less. The grinding material is suitable for grinding of hard and brittle materials such as sapphire, silicon nitride, silicon carbide, silicon oxide, glass, gallium nitride, gallium arsenide, indium arsenide and indium phosphide.
Description
Technical field
The present invention relates to metal grinding technical field, more particularly, relate to a kind of abrasive substance.
Background technology
In the process of the hard and fragile material such as grinding sapphire, silicon nitride, silicon carbide, silicon oxide, glass, gan, gallium arsenide, indium arsenide, indium phosphide, generally can use abrasive substance and composition for polishing.For the composition for polishing used in the purposes of the substrate such as glass substrate, photomask synthetic quartz substrate of grinding hard disk glass substrate, display panels, in order to improve the quality of the substrate after grinding, be strongly required the few surface defects as cut on the substrate after the little and grinding of the surfaceness of substrate after grinding.In addition, in order to shorten the time spent by grinding operation, also require that the grinding rate (removal speed) of substrate is high.
Summary of the invention
The technical problem to be solved in the present invention is, for the above-mentioned defect of prior art, provides a kind of abrasive substance.
The technical solution adopted for the present invention to solve the technical problems is:
Construct a kind of abrasive substance, comprise zirconia particles and cerium salt; Wherein, by weight, the portfolio ratio of described zirconia particles and described cerium salt is 7-5:3-5; Described zirconia particles has 1 ~ 10m
2the specific surface area of/g, described zirconia particles has the average primary particle diameter of less than 0.2 μm; Contain in the aqueous dispersions of the zirconia particles of 1% quality at every 1mL, the number among described zirconia particles with the particle of the aggregate particle size of more than 4 μm is less than 20000000.
Abrasive substance of the present invention, wherein, described abrasive substance also comprises zirconates.
Abrasive substance of the present invention, wherein, the portfolio ratio of described zirconia particles, described cerium salt and described zirconates is 7-5:2-4:1.
Abrasive substance of the present invention, wherein, the portfolio ratio of described zirconia particles and described cerium salt is 7:3.
Abrasive substance of the present invention, wherein, the portfolio ratio of described zirconia particles, described cerium salt and described zirconates is 7:2:1.
Abrasive substance of the present invention, wherein, the portfolio ratio of described zirconia particles and described cerium salt is 6:4.
Abrasive substance of the present invention, wherein, the portfolio ratio of described zirconia particles, described cerium salt and described zirconates is 6:3:1.
Beneficial effect of the present invention is: abrasive substance of the present invention is suitable in the grinding of the hard and fragile material such as sapphire, silicon nitride, silicon carbide, silicon oxide, glass, gan, gallium arsenide, indium arsenide, indium phosphide more.
Embodiment
In order to make the object of the embodiment of the present invention, technical scheme and advantage clearly, clear, complete description is carried out below in conjunction with the technical scheme in the embodiment of the present invention, obviously, described embodiment is section Example of the present invention, instead of whole embodiment.Based on embodiments of the invention, the every other embodiment that those of ordinary skill in the art obtain under the prerequisite not paying creative work, all belongs to protection scope of the present invention.
The abrasive substance of present pre-ferred embodiments, comprises zirconia particles and cerium salt; Wherein, by weight, the portfolio ratio of zirconia particles and cerium salt is 7-5:3-5; Zirconia particles has 1 ~ 10m
2the specific surface area of/g, zirconia particles has the average primary particle diameter of less than 0.2 μm; Contain in the aqueous dispersions of the zirconia particles of 1% quality at every 1mL, the number among zirconia particles with the particle of the aggregate particle size of more than 4 μm is less than 20000000.The abrasive substance of the present embodiment is suitable in the grinding of the hard and fragile material such as sapphire, silicon nitride, silicon carbide, silicon oxide, glass, gan, gallium arsenide, indium arsenide, indium phosphide more.
Zirconia particles can be both the particle formed by crystalline zirconium whites such as isometric system, tetragonal spheroidal, oblique systems, also can be the particle formed by amorphousness zirconium white.As abrasive substance preferably tetragonal spheroidal, monoclinic zirconium white.Zirconia particles also can comprise calcium, magnesium, hafnium, yttrium, silicon etc.Wherein, the purity of zirconia particles is preferably as far as possible high, specifically, is preferably more than 99%, is more preferably more than 99.5%, and more preferably more than 99.8%.Uprise along with in scope more than 99% of the purity of zirconia particles, the grinding rate based on the hard and fragile material of composition for polishing improves.In this, if the purity of zirconia particles is more than 99%, being more than 99.5% furthermore, is further more than 99.8%, then become and easily make the grinding rate based on the hard and fragile material of composition for polishing bring up to level suitable especially in practical.
In above-mentioned abrasive substance, abrasive substance also comprises zirconates.Preferably, the portfolio ratio of zirconia particles, cerium salt and zirconates is 7-5:2-4:1.
In above-mentioned abrasive substance, preferably, the portfolio ratio of zirconia particles and cerium salt is 7:3.
In above-mentioned abrasive substance, preferably, the portfolio ratio of zirconia particles, cerium salt and zirconates is 7:2:1.
In above-mentioned abrasive substance, preferably, the portfolio ratio of zirconia particles and cerium salt is 6:4.
In above-mentioned abrasive substance, preferably, the portfolio ratio of zirconia particles, cerium salt and zirconates is 6:3:1.
Impurity in zirconia particles can be measured by powder X-ray diffractometry.2 θ of the powder x-ray diffraction device mensuration such as the MiniFlex using such as RigakuCorporation to manufacture are that the intensity of the diffraction peak near 26.5 ° is preferably below 200cps.More preferably there is not diffraction peak near 26.5 ° in 2 θ, and this represents zirconia particles in fact not containing the quartz silica as impurity.In addition, if use powder x-ray diffraction device, then zirconic crystallite dimension can be measured.Preferably based on 2 θ be crystallite dimension that the diffracted intensity near diffracted intensity near 28.0 ° and 31.0 ° calculates be above, this represents that zirconic crystallographic system is oblique system, and this crystallite dimension is large.
The specific surface area of zirconia particles is preferably more than 1m2/g, is more preferably 2m
2/ more than g.In addition, the specific surface area of zirconia particles is preferably 15m
2/ below g, is more preferably 13m
2/ below g, more preferably 9m
2/ below g.If the specific surface area of zirconia particles is 1 ~ 15m
2the scope of/g, then become and easily make the grinding rate based on the hard and fragile material substrate of composition for polishing bring up to level suitable in practical.
Should be understood that, for those of ordinary skills, can be improved according to the above description or convert, and all these improve and convert the protection domain that all should belong to claims of the present invention.
Claims (7)
1. an abrasive substance, comprises zirconia particles and cerium salt; It is characterized in that, by weight, the portfolio ratio of described zirconia particles and described cerium salt is 7-5:3-5; Described zirconia particles has 1 ~ 10m
2the specific surface area of/g, described zirconia particles has the average primary particle diameter of less than 0.2 μm; Contain in the aqueous dispersions of the zirconia particles of 1% quality at every 1mL, the number among described zirconia particles with the particle of the aggregate particle size of more than 4 μm is less than 20000000.
2. abrasive substance according to claim 1, is characterized in that, described abrasive substance also comprises zirconates.
3. abrasive substance according to claim 2, is characterized in that, the portfolio ratio of described zirconia particles, described cerium salt and described zirconates is 7-5:2-4:1.
4. abrasive substance according to claim 1, is characterized in that, the portfolio ratio of described zirconia particles and described cerium salt is 7:3.
5. abrasive substance according to claim 3, is characterized in that, the portfolio ratio of described zirconia particles, described cerium salt and described zirconates is 7:2:1.
6. abrasive substance according to claim 1, is characterized in that, the portfolio ratio of described zirconia particles and described cerium salt is 6:4.
7. abrasive substance according to claim 3, is characterized in that, the portfolio ratio of described zirconia particles, described cerium salt and described zirconates is 6:3:1.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510417886.4A CN105524592A (en) | 2015-07-16 | 2015-07-16 | Grinding material |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510417886.4A CN105524592A (en) | 2015-07-16 | 2015-07-16 | Grinding material |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN105524592A true CN105524592A (en) | 2016-04-27 |
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ID=55767127
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201510417886.4A Pending CN105524592A (en) | 2015-07-16 | 2015-07-16 | Grinding material |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106625198A (en) * | 2016-12-26 | 2017-05-10 | 银川市恒益达机械有限公司 | Compound superhard honing oilstone containing zirconium oxide and preparation method of compound superhard honing oilstone |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1263868A (en) * | 1999-02-15 | 2000-08-23 | 上海跃龙有色金属有限公司 | Nm-class compound Ce-Zr oxide and its preparing process and application |
| CN102559064A (en) * | 2011-12-15 | 2012-07-11 | 上海华明高纳稀土新材料有限公司 | Cerium-zirconium praseodymium sosoloid and preparation method thereof |
| CN103402705A (en) * | 2011-01-27 | 2013-11-20 | 福吉米株式会社 | Polishing material and polishing composition |
-
2015
- 2015-07-16 CN CN201510417886.4A patent/CN105524592A/en active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1263868A (en) * | 1999-02-15 | 2000-08-23 | 上海跃龙有色金属有限公司 | Nm-class compound Ce-Zr oxide and its preparing process and application |
| CN103402705A (en) * | 2011-01-27 | 2013-11-20 | 福吉米株式会社 | Polishing material and polishing composition |
| CN102559064A (en) * | 2011-12-15 | 2012-07-11 | 上海华明高纳稀土新材料有限公司 | Cerium-zirconium praseodymium sosoloid and preparation method thereof |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106625198A (en) * | 2016-12-26 | 2017-05-10 | 银川市恒益达机械有限公司 | Compound superhard honing oilstone containing zirconium oxide and preparation method of compound superhard honing oilstone |
| CN106625198B (en) * | 2016-12-26 | 2019-04-09 | 银川市恒益达机械有限公司 | Compound superhard honing stone containing zirconium oxide and preparation method thereof |
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Application publication date: 20160427 |
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| RJ01 | Rejection of invention patent application after publication |