CN105483634A - Substrate platform device - Google Patents
Substrate platform device Download PDFInfo
- Publication number
- CN105483634A CN105483634A CN201510912851.8A CN201510912851A CN105483634A CN 105483634 A CN105483634 A CN 105483634A CN 201510912851 A CN201510912851 A CN 201510912851A CN 105483634 A CN105483634 A CN 105483634A
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- CN
- China
- Prior art keywords
- gear
- eccentric
- pedestal
- support bar
- slide glass
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/50—Substrate holders
- C23C14/505—Substrate holders for rotation of the substrates
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
The invention discloses a substrate platform device. The substrate platform device comprises a driving part, a base, a driven gear, a substrate carrying tray and a supporting rod, wherein the driving part is used for driving the base to rotate; an eccentric gear is arranged on a supporting shaft of the substrate carrying tray in a sleeved manner; a center hole and an eccentric supported hole are formed in the middle of the base; the supporting rod is nested in the supporting rod; the supporting shaft of the substrate carrying tray is nested in the eccentric supported hole; the lower end of the supporting rod is a fixed end; the driven gear is fixed on the top of the supporting rod; and the eccentric gear is meshed with the driven gear. The substrate platform device has the advantages of simple and compact structure, capability of improving the uniformity of film formation and the like.
Description
Technical field
The present invention is mainly concerned with vacuum sputtering coating equipment field, refers in particular to a kind of chip bench device for improving into film uniformity.
Background technology
In vacuum sputtering coating equipment field, one-tenth film uniformity is the key technical index of equipment.The principle of sputter coating utilizes high-energy ion bombardment material target, goes out particle and deposit to form film over the substrate surface from its surface sputtering.Generally, the uniformity of film of substrate surface is decided by two aspects, and one is the distribution situation from material target surface sputtering particle out, and two is situations that substrate surface receives material target particle.Improving into film uniformity is also from the viewpoint of these two.If material target position does not change, the regularity of distribution going out particle from its surface sputtering is general also constant, therefore wants to improve into film uniformity, can be realized by the position changing the relative sputtering particle of substrate, and modal method is that substrate bearing platform rotates.But when substrate is larger (as 6 inches, 8 inches etc.), chip bench only can load monolithic, and now chip bench is only around central rotation, then radially the distribution of the relative sputtering particle of substrate does not change, therefore substrate radially lack of homogeneity.
Summary of the invention
The technical problem to be solved in the present invention is just: the technical problem existed for prior art, the invention provides a kind of simple and compact for structure, chip bench device that can improve into film uniformity.
For solving the problems of the technologies described above, the present invention by the following technical solutions:
A kind of chip bench device, comprises actuator, pedestal, follower gear, slide glass dish and support bar; Described actuator is used for driving pedestal to rotate, and the back shaft of described slide glass dish is arranged with eccentric gear; The centre of described pedestal has centre hole and eccentric supported hole, is inserted in support bar in described centre hole, and the back shaft of described slide glass dish is inserted in eccentric supported hole; The lower end of described support bar is inboardend, and the top of described support bar is fixed with follower gear, and described eccentric gear engages with follower gear.
As a further improvement on the present invention: the lower end of described pedestal is provided with gear part, described actuator drives pedestal to rotate by driving toothed gear.
As a further improvement on the present invention: described actuator adopts motor, and the output shaft of described motor is connected with the back shaft of magnetic current sealing.
As a further improvement on the present invention: back shaft and the driving toothed gear of described magnetic current sealing are connected as a single entity, and described driving toothed gear engages with the gear part of pedestal lower end.
As a further improvement on the present invention: the lower end of described support bar is screwed on large flange.
As a further improvement on the present invention: between described support bar and centre hole, in the back shaft of described slide glass dish and eccentric supported hole, be provided with bearing.
As a further improvement on the present invention: connected as one by key between the back shaft of described eccentric gear and slide glass dish.
Compared with prior art, the invention has the advantages that: chip bench dress of the present invention, simple and compact for structure, it, by the eccentric movement of single slide glass dish, allows the track of the sputtering particle of substrate relative material target constantly change, thus improve into film uniformity.
Accompanying drawing explanation
Fig. 1 is the structural principle schematic diagram of the present invention in embody rule example.
Marginal data:
1, actuator; 2, magnetic current sealing; 3, large flange; 4, driving toothed gear; 5, pedestal; 6, follower gear; 7, eccentric gear; 8, slide glass dish; 9, support bar; 10, bearing.
Embodiment
Below with reference to Figure of description and specific embodiment, the present invention is described in further details.
As shown in Figure 1, chip bench device of the present invention, comprises actuator 1, pedestal 5, follower gear 6, eccentric gear 7, slide glass dish 8 and support bar 9.Actuator 1 is used for driving pedestal 5 to rotate; The centre of pedestal 5 has centre hole, and the certain position place in decentering hole offers supported hole, and namely this supported hole is eccentric shape.Be inserted in support bar 9 in the centre hole of pedestal 5, bearing 10 is installed between them.Eccentric gear 7 is inserted in the back shaft of slide glass dish 8, to be inserted on pedestal 5 in eccentric supported hole between them with key after connecting as one, and between bearing 10 is installed.The lower end of support bar 9 is inboardend, and the top of support bar 9 has been screwed follower gear 6, and eccentric gear 7 engages with follower gear 6.
The lower end of pedestal 5 is provided with gear part, and actuator 1 drives pedestal 5 to rotate by driving toothed gear 4.In embody rule example, actuator 1 adopts motor, and the output shaft of this motor is connected with the back shaft of magnetic current sealing 2.Back shaft and the driving toothed gear 4 of magnetic current sealing 2 are connected as a single entity.This driving toothed gear 4 and pedestal 5 lower end gears meshing.
In embody rule example, the lower end of support bar 9 is screwed on large flange 3.
During work, motor is rotated by magnetic current sealing 2 belt wheel driving toothed gear 4, and driving toothed gear 4 by rotating with pedestal 5 lower end gears meshing zone of action moving base 5, and then drives the slide glass dish 8 be arranged on pedestal 5 to rotate around centre post 9.Meanwhile, make the accentric support hole central rotation of slide glass dish 8 on pedestal 5 by eccentric gear 7 and the engagement of follower gear 6, its net effect is that eccentric movement occurs slide glass dish 8.The present invention, by the eccentric movement of single slide glass dish 8, allows the track of the sputtering particle of substrate relative material target constantly change, thus improves into film uniformity.
Below be only the preferred embodiment of the present invention, protection scope of the present invention be not only confined to above-described embodiment, all technical schemes belonged under thinking of the present invention all belong to protection scope of the present invention.It should be pointed out that for those skilled in the art, some improvements and modifications without departing from the principles of the present invention, should be considered as protection scope of the present invention.
Claims (7)
1. a chip bench device, is characterized in that, comprises actuator (1), pedestal (5), follower gear (6), slide glass dish (8) and support bar (9); Described actuator (1) is used for driving pedestal (5) to rotate, and the back shaft of described slide glass dish (8) is arranged with eccentric gear (7); The centre of described pedestal (5) has centre hole and eccentric supported hole, is inserted in support bar (9) in described centre hole, and the back shaft of described slide glass dish (8) is inserted in eccentric supported hole; The lower end of described support bar (9) is inboardend, and the top of described support bar (9) is fixed with follower gear (6), and described eccentric gear (7) engages with follower gear (6).
2. chip bench device according to claim 1, is characterized in that, the lower end of described pedestal (5) is provided with gear part, and described actuator (1) drives pedestal (5) to rotate by driving toothed gear (4).
3. chip bench device according to claim 2, is characterized in that, described actuator (1) adopts motor, and the output shaft of described motor is connected with the back shaft of magnetic current sealing (2).
4. chip bench device according to claim 3, is characterized in that, back shaft and the driving toothed gear (4) of described magnetic current sealing (2) are connected as a single entity, and described driving toothed gear (4) engages with the gear part of pedestal (5) lower end.
5. according to the chip bench device in Claims 1 to 4 described in any one, it is characterized in that, the lower end of described support bar (9) is screwed on large flange (3).
6. according to the chip bench device in Claims 1 to 4 described in any one, it is characterized in that, between described support bar (9) and centre hole, in the back shaft of described slide glass dish (8) and eccentric supported hole, be provided with bearing (10).
7. according to the chip bench device in Claims 1 to 4 described in any one, it is characterized in that, connected as one by key between the back shaft of described eccentric gear (7) and slide glass dish (8).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510912851.8A CN105483634B (en) | 2015-12-11 | 2015-12-11 | A kind of substrate table apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510912851.8A CN105483634B (en) | 2015-12-11 | 2015-12-11 | A kind of substrate table apparatus |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN105483634A true CN105483634A (en) | 2016-04-13 |
| CN105483634B CN105483634B (en) | 2018-07-24 |
Family
ID=55670897
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201510912851.8A Active CN105483634B (en) | 2015-12-11 | 2015-12-11 | A kind of substrate table apparatus |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN105483634B (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107881480A (en) * | 2017-12-25 | 2018-04-06 | 苏州浩联光电科技有限公司 | A kind of plated film flight balance device and coating system |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH07138757A (en) * | 1993-11-10 | 1995-05-30 | Nissin Electric Co Ltd | Substrate holder |
| CN103806095A (en) * | 2014-02-18 | 2014-05-21 | 中国科学院半导体研究所 | Planetary rotary tray device |
| CN104818468A (en) * | 2015-04-15 | 2015-08-05 | 中国科学院宁波材料技术与工程研究所 | Three-shaft rotation base frame device in vacuum film plating cavity |
-
2015
- 2015-12-11 CN CN201510912851.8A patent/CN105483634B/en active Active
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH07138757A (en) * | 1993-11-10 | 1995-05-30 | Nissin Electric Co Ltd | Substrate holder |
| CN103806095A (en) * | 2014-02-18 | 2014-05-21 | 中国科学院半导体研究所 | Planetary rotary tray device |
| CN104818468A (en) * | 2015-04-15 | 2015-08-05 | 中国科学院宁波材料技术与工程研究所 | Three-shaft rotation base frame device in vacuum film plating cavity |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107881480A (en) * | 2017-12-25 | 2018-04-06 | 苏州浩联光电科技有限公司 | A kind of plated film flight balance device and coating system |
Also Published As
| Publication number | Publication date |
|---|---|
| CN105483634B (en) | 2018-07-24 |
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