CN105441883B - 一种ito靶材布局方法 - Google Patents
一种ito靶材布局方法 Download PDFInfo
- Publication number
- CN105441883B CN105441883B CN201510815761.7A CN201510815761A CN105441883B CN 105441883 B CN105441883 B CN 105441883B CN 201510815761 A CN201510815761 A CN 201510815761A CN 105441883 B CN105441883 B CN 105441883B
- Authority
- CN
- China
- Prior art keywords
- target
- processed
- endless track
- backboard
- prismatoid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
- C23C14/086—Oxides of zinc, germanium, cadmium, indium, tin, thallium or bismuth
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
Description
Claims (1)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201510815761.7A CN105441883B (zh) | 2015-11-23 | 2015-11-23 | 一种ito靶材布局方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201510815761.7A CN105441883B (zh) | 2015-11-23 | 2015-11-23 | 一种ito靶材布局方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN105441883A CN105441883A (zh) | 2016-03-30 |
CN105441883B true CN105441883B (zh) | 2017-11-07 |
Family
ID=55552506
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201510815761.7A Active CN105441883B (zh) | 2015-11-23 | 2015-11-23 | 一种ito靶材布局方法 |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN105441883B (zh) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN106676485A (zh) * | 2017-01-04 | 2017-05-17 | 青岛蓝光晶科新材料有限公司 | 一种跑道型硅靶材的生产方法 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5066381A (en) * | 1988-04-15 | 1991-11-19 | Sharp Kabushiki Kaisha | Target unit |
CN103422067A (zh) * | 2007-06-18 | 2013-12-04 | 应用材料公司 | 具有提高的寿命和溅射均匀度的溅射靶材 |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62243762A (ja) * | 1986-04-16 | 1987-10-24 | Seiko Epson Corp | スパツタリングタ−ゲツト用バツキングプレ−ト |
JPH05230642A (ja) * | 1992-02-21 | 1993-09-07 | Nissin High Voltage Co Ltd | スパッタ・ターゲット |
US20100178525A1 (en) * | 2009-01-12 | 2010-07-15 | Scott Campbell | Method for making composite sputtering targets and the tartets made in accordance with the method |
-
2015
- 2015-11-23 CN CN201510815761.7A patent/CN105441883B/zh active Active
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5066381A (en) * | 1988-04-15 | 1991-11-19 | Sharp Kabushiki Kaisha | Target unit |
CN103422067A (zh) * | 2007-06-18 | 2013-12-04 | 应用材料公司 | 具有提高的寿命和溅射均匀度的溅射靶材 |
Also Published As
Publication number | Publication date |
---|---|
CN105441883A (zh) | 2016-03-30 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN105449010B (zh) | 不锈钢衬底柔性铜铟镓硒薄膜太阳电池阻挡层制备方法 | |
CN100550434C (zh) | 柔性铜铟镓硒薄膜太阳电池制备方法 | |
CN105355676A (zh) | 一种柔性cigs薄膜太阳电池的背电极结构 | |
CN102174689A (zh) | Fzo/金属/fzo透明导电薄膜及其制备方法 | |
CN103572236A (zh) | 一种高性能氧化铌靶材及其制备方法 | |
CN105441883B (zh) | 一种ito靶材布局方法 | |
CN204966512U (zh) | 一种双层tco的cigs太阳能电池 | |
CN102134702B (zh) | 一种以喷雾干燥工艺制备azo粉末及平面和旋转靶材的方法 | |
CN102168246B (zh) | 柔性基体上沉积大面积高均匀透明导电膜及其制备方法 | |
CN101350366B (zh) | 防静电tft基板及其加工工艺 | |
CN109461518A (zh) | 一种透明导电膜及其制备方法 | |
CN105353930A (zh) | 一种ogs电容式触摸屏及其制备方法和触控显示装置 | |
CN103151394A (zh) | 薄膜太阳能电池及其制作方法 | |
CN103137717A (zh) | 铜掺杂氧化锡透明导电薄膜及其制备方法 | |
CN209281907U (zh) | 一种透明导电膜 | |
CN105845752A (zh) | 一种应用于柔性光电器件的透明导电薄膜及其制备方法 | |
CN105489270A (zh) | 一种夹层结构透明导电薄膜及其制备方法 | |
CN202749383U (zh) | 彩色半透明分光非晶硅薄膜太阳能电池 | |
CN201713564U (zh) | Izao透明导电膜 | |
CN202145304U (zh) | 高透触摸屏玻璃及投射式电容触摸屏 | |
CN202977434U (zh) | 薄膜太阳能电池 | |
CN203503665U (zh) | 一种太阳电池玻璃盖片 | |
CN205016537U (zh) | 一种可挠性高效率cigs太阳能电池结构 | |
CN207651195U (zh) | 触摸面板用透明导电膜 | |
CN102560390B (zh) | 一种透明导电薄膜的制备方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
CB03 | Change of inventor or designer information |
Inventor after: Zhang Lijiao Inventor after: Ma Liang Inventor before: Zhang Lijiao Inventor before: Hao Junhai Inventor before: Wang Lifeng |
|
COR | Change of bibliographic data | ||
GR01 | Patent grant | ||
GR01 | Patent grant | ||
CP03 | Change of name, title or address |
Address after: 100191 room 1113, 11th floor, Xueyuan international building, No.1, Zhichun Road, Haidian District, Beijing Patentee after: Iridium gasman Aviation Technology Group Co.,Ltd. Address before: 100191 room 1, No. 1101, Haidian District, Beijing, Zhichun Road Patentee before: EAGLES MEN AERONAUTIC SCIENCE AND TECHNOLOGY GROUP Co.,Ltd. |
|
CP03 | Change of name, title or address |