CN105426014B - A kind of GF single layer multiple spot Rimless touch screen and its preparation process - Google Patents
A kind of GF single layer multiple spot Rimless touch screen and its preparation process Download PDFInfo
- Publication number
- CN105426014B CN105426014B CN201511014788.2A CN201511014788A CN105426014B CN 105426014 B CN105426014 B CN 105426014B CN 201511014788 A CN201511014788 A CN 201511014788A CN 105426014 B CN105426014 B CN 105426014B
- Authority
- CN
- China
- Prior art keywords
- touch screen
- fpc
- conductive film
- ito conductive
- silver paste
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Classifications
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
- G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
- G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
- G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
- G06F3/0412—Digitisers structurally integrated in a display
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
- G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
- G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
- G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
- G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
- G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
- G06F2203/04103—Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices
Abstract
The present invention relates to touch screen technology field more particularly to a kind of GF single layer multiple spot Rimless touch screen and its preparation processes.Touch screen includes tempered glass cover plate, transparent optical glue-line and ITO conductive film, the cabling area of ITO conductive film frame includes set on the lateral cabling area of touch screen one end, ITO conductive film is equipped with the single layer multipoint electrode pattern of single-ended outlet, lateral cabling area pressing has FPC, the lead-out wire of ITO conductive film is connected with an IC chip by FPC, and tempered glass cover plate is provided with explosion-proof layer and anti-reflective layer.The present invention presses FPC by the lateral cabling area in touch screen one end, makes the longitudinal edge of touch screen without wiring, to build Rimless visual effect；The present invention has good photoelectric properties, stability and explosion-proof capabilities, and preparation process only needs a FPC pressing, simple process, product yield height, it is ensured that the excellent performance and production stability of touch screen.
Description
Technical field
The present invention relates to touch screen technology field more particularly to a kind of GF single layer multiple spot Rimless touch screen and its preparation works
Skill.
Background technique
Touch screen is a kind of input equipment for significantly improving man machine operation interface, is had the advantages that intuitive, simple, quick.
Touch screen has been obtained for being widely applied in many electronic products.But current capacitive touch screen uses multilayer ITO mostly
Structure, manufacturing process are complicated.Therefore, single layer ITO touch screen is especially that by the touch screen of multiple point touching, it has also become electricity
One developing direction of appearance formula touch screen.
In general, touch screen includes the signal conductor for connecting touch control electrode and external processor, to transmit
Electric signal between touch control electrode and processor.In order to cover signal conductor, the deck portion of touch screen must increase by one not
Transparent frame, to be used to cover cabling area.The presence of frame reduces the screen viewing area range of portable electronic device.
Requirement with consumer to electronic equipment appearance and usage experience is higher and higher, need to reduce frame face occupied by signal conductor
Product, increases the range of screen viewing area as much as possible in the limited size of portable electronic device, effectively solves big display screen
With the contradiction of fuselage size, the display effect of no visual field is strongly built.Rimless touch screen proposes its preparation process higher
Requirement, therefore preparation process need to be improved, guarantee the photoelectric properties and production stability of touch screen, while having good shockproof
More stringent requirements are proposed for the capability of antidetonance, and to improve the competitiveness of product in market, while the Rimless of touch screen is also right.
Summary of the invention
In view of the above-mentioned deficiencies in the prior art, it is an object of the present invention to provide a kind of GF single layer multiple spot Rimless touch screen and its
Preparation process.To achieve the above object, the technical solution adopted by the present invention is as follows.
A kind of GF single layer multiple spot Rimless touch screen, including set gradually from top to bottom tempered glass cover plate, transparent light
Glue-line and ITO conductive film are learned, the frame of the ITO conductive film is cabling area, and the cabling area includes being set to touch screen one end
Lateral cabling area, the ITO conductive film be equipped with single-ended outlet single layer multipoint electrode pattern, the lead-out wire pair of ITO conductive film
It should be set to lateral cabling area, the transverse direction cabling area presses FPC, and the lead-out wire of ITO conductive film is connected with an IC by FPC
Chip.
Further, single layer multipoint electrode pattern include induction channels and driving channel, induction channels and driving channel that
This separation, does not generate staggeredly.
Further, the upper surface of tempered glass cover plate is upward arc-shaped curved surface。Tempered glass cover plate uses arc
Shape curved design is more in line with base of principle of human engineering, can not only alleviate face of making a phone call for a long time and be close to generation when screen
DOMS feeling of fatigue, can also increase the visible angle of touch screen, improve the reflecting effect of touch screen.
Further, the anti-reflective layer is nano-titanium dioxide and Nanoparticles CdSe mixed layer.It Nanoparticles CdSe and receives
Rice titanium dioxide can be used for absorbing visible light, meanwhile, nano-titanium dioxide can also carry out light-catalyzed reaction and remove on touch screen
Fingerprint promotes the anti-fingerprint ability of touch screen.Further, the partial size of nano-titanium dioxide is 10-20nm, Nanoparticles CdSe
Partial size be 5-10nm.Within this range, good to the assimilation effect of visible light.
Further, the anti-reflective layer is nano-titanium oxide silicon layer, and nano-titanium oxide silicon layer can reduce the anti-of touch screen
It penetrates phenomenon and increases the light transmission capacity of tempered glass cover plate.
Further, the IC chip is fixed on a reinforcing chip, and the FPC is connected to the reinforcing chip.
Further, the reinforcing chip is equipped with Fixing clamp-seat, and the end of the FPC is arranged in the Fixing clamp-seat.
Further, the FPC includes the body region FPC and the region of elongation FPC for being connected to the body region FPC end, FPC main body
Offset is 3-8mm with a distance from FPC.Within this range, there is a certain distance at the body region FPC and the edge of FPC, can preferably prevent
Only the route of the body region FPC is compromised and is not take up biggish space.
Further, the tempered glass cover plate is divided into black surround area and viewfinder area, and the black surround area includes longitudinal black surround area
With lateral black surround area, the transverse direction black surround area corresponds to lateral cabling area setting, and the ITO conductive film exceeds the transverse direction of viewfinder area
Boundary 0.5mm-0.8mm can improve the visual effect on boundary.
Further, the width in longitudinal black surround area is 0-0.8mm.Due to the not set longitudinal cabling area of the present invention, institute
It can be set very narrow with the width in longitudinal black surround area or setting can be completely dispensed with.
A kind of preparation process of GF single layer multiple spot Rimless touch screen, comprising the following steps:
Front-end-of-line
(A1) it ITO plated film: on the front deposition barrier layer SiO2 of PET base material layer, is being deposited using magnetron sputtering method
ITO film is plated in the PET base material layer front on the barrier layer SiO2, and ultraviolet light is used while magnetron sputtering；Then vacuum is moved back
Fire obtains ITO conductive film crude product；
(A2) it cleans: ITO conductive film crude product is cleaned；
(A3) ITO conductive film crude product etching removal: is located to the ITO film preset except viewfinder area using laser-induced thermal etching
It removes；
(A4) it prints conductive silver paste: printing conductive silver paste in the laser-induced thermal etching region of ITO conductive film crude product, formed conductive
Silver slurry layer carries out laser-induced thermal etching silver paste line to conductive silver paste, forms lateral cabling area；
(A5) it toasts: the ITO conductive film crude product for being etched with silver paste line is toasted；
(A6) laser-induced thermal etching etched electrodes figure etched electrodes pattern: is carried out to the default viewfinder area of ITO conductive film crude product
Case；
(A7) overlay film: the ITO conductive film crude product after printing conductive silver paste is covered with protective film；
(A8) it cuts: cutting to form FILM functional sheet；
Rear end process
(B1) ACF is bound: FILM functional sheet ready-made to front-end-of-line binds ACF conducting resinl；
(B2) FPC hot pressing: to the lateral cabling area hot pressing FPC of the FILM functional sheet of the ACF conducting resinl posted；
(B3) transparent optical glue-line is bonded: being bonded transparent optical glue-line to the FILM functional sheet for having pressed FPC；
(B4) it combines: the FILM functional sheet and tempered glass cover plate that post transparent optical glue-line being combined, tempering glass
Glass cover board is provided with explosion-proof layer and anti-reflective layer, obtains a kind of GF single layer multiple spot Rimless touch screen.
In the front plating ITO film using magnetically controlled sputter method in PET base material layer, low-temperature sputter deposition is generallyd use
Mode, so indium tin oxide of the ITO conductive film containing many low price, ultraviolet source irradiation by the oxygen ionization prepared in environment at
Ozone, the ozone of generation again can further aoxidize ITO composition, and formation resistance is more stable, and resistivity is lower, thoroughly
The better high oxide ITO of photosensitiveness, to improve the photoelectric properties of ITO conductive film.The sheet resistance of ITO conductive film is smaller, thoroughly
Photosensitiveness is more preferable, and the performance of touch screen is better.Meanwhile ultraviolet light also acts on removal using the photosensitized oxidation of organic compound
Stick the organic pollutant on the surface of the material, light cleaning is carried out to material surface.Preferably, the present invention is splashed using radio frequency magnetron
Penetrate method.Radio frequency sputtering method have can effect target range it is wide, the features such as film growth rates are fast.
On the front deposition barrier layer SiO2 of PET base material layer, the binding force of PET base material layer and ito thin film can be reinforced, both may be used
Using as diffusion barrier layer, and the partial coherence color in magnetron sputtering process can be eliminated.
The present invention uses laser-induced thermal etching conductive silver paste and electrode pattern, and process stabilizing, etching precision is high, environmentally friendly.
Further, sputtering power is 50W-300W in the step A1.Within this range, the sheet resistance of ito thin film with
The increase of sputtering power and reduce.In the processing of low sputtering power, migration velocity of the low energy sputtering particle on substrate sheets surface
Small, the crystallization particle diameter of film is small；As power increases, sputtering particle migration velocity and recrystallization degree increase, target material surface electricity
Pressure increases, and argon particle obtains higher energy through electric field acceleration, and target atom is escaped under high energy particle shock from target material surface
It escapes and becomes sputtering particle, then fall to substrate sheets reaction and generate ito thin film, the ito thin film of formation has preferably fine and close
Property and adhesion strength, crystal structure also significantly improve, therefore the electric conductivity of ito thin film.But it is sputtered under excessively high sputtering power
High energy particle meeting constant bombardment out causes structure to lack to the ito thin film surface deposited to the crystal state of ito thin film
It falls into, sputtering power is bigger, and voltage is higher, and generation crystal structure defects are also more serious, increases so as to cause the sheet resistance of ito thin film.
Preferably, sputtering power is 100W-250W in the step A1.
Further, the step B2 hot pressing temperature be 160-180 DEG C, hot pressing time 10-20s, can reach good
Hot pressing effect.
Further, silver paste comprises the following raw materials by weight percent in the step A4:
Silver powder 60-70%
Bisphenol A type epoxy resin 4-10%
Chlorine vinegar vinyl 2-6%
Polypropylene glycol diglycidyl ether 1-3%
Powdered graphite 1-2%
SiO 2 powder 1-2%
1,6 hexanediol diacrylate 15-25%
Sagging inhibitor 0.2-1.0%,
The sum of above weight percent be 100%, the silver powder by mass ratio be 1:20-1:30 micro-silver powder end and
Nano silver powder constituent, the partial size at the micro-silver powder end are 30-50 μm, and the partial size of the nano silver powder is 20-50nm；Institute
It states powdered graphite to be made of the micron graphite powder and nano-graphite powder that mass ratio is 1:20-1:30, the micron graphite powder
The partial size at end is 30-50 μm, and the partial size of the nano-graphite powder is 20-40nm；The partial size of the SiO 2 powder is 10-
30 nm；The sagging inhibitor is polyamide wax or amide modifications rilanit special.
Sagging inhibitor can prevent from settling in silver powder in conductive silver paste preparation process it is too fast keep conductive silver paste print unevenness even, into
And influence its performance.
1,6- hexanediyl ester is a kind of low-viscosity, and the liquid functional compound of low volatility is ultraviolet in UV
There is rapid curing reaction in optical free radical polymerization, while also there is water repellent main chain and fantabulous dissolving power, can adjust conductive silver
Slurry viscosity.
Chlorine vinegar vinyl is the copolymer of vinyl chloride and vinyl acetate, by vinyl chloride monomer with vinyl acetate in initiator
Under the action of be copolymerized and obtain, chlorine vinegar vinyl sheet resistance is smaller, good with silver powder matching degree, and it is larger to dry post-shrinkage ratio, can
Silver powder is closely overlapped.
Polypropylene glycol diglycidyl ether is colourless to light yellow transparent liquid, can be miscible with bisphenol A type epoxy resin,
Viscosity is low under room temperature, is boiling point height, non-volatile, nontoxic nonirritant, operates with safety, participates in epoxy resin cure reaction,
There is flexible fatty long-chain in molecular structure, can rotate freely and high resilience, making an addition in epoxy-resin systems can be very big
Ground improves its impact strength and cold-and-heat resistent impact property, improves the embrittlement defect of epoxy curing compound, and flexibility is good, assigns bis-phenol
A type epoxy resin flexibility, elongation and raising impact strength.
Bisphenol A type epoxy resin and chlorine vinegar vinyl can shrink with 1,6 hexanediol diacrylate, polypropylene glycol two
Glycerin ether is miscible, forms organic carrier, the silver powder of conductive energy, powdered graphite can be evenly dispersed after being added, and raising is led
The electric conductivity of electric silver paste can satisfy etching so that the sintered pulp strength of conductive silver paste is high, good with the adhesive force of substrate layer
The requirement of the thinner silver paste cabling of line width.
By the selection to partial size and proportion, micro-silver powder end and nano silver powder can preferably cooperate, nano silver powder
The surface at micro-silver powder end is attached to as micro-silver powder end moves together, effectively prevents the agglomeration of nano silver powder；
On the other hand due to nano silver powder have high surface can, micro-silver powder end can be by being attached to the nano silver powder on its surface
In conjunction with bisphenol A type epoxy resin and chlorine vinegar vinyl, the nano silver powder for being not attached to micro-silver powder end surface will be filled
To in the gap of bisphenol A type epoxy resin and chlorine vinegar vinyl, keep all micro-silver powder ends and nano silver powder evenly dispersed,
Improve electric conductivity.Similarly, the selection of micron graphite powder, nano-graphite powder and SiO 2 powder partial size and proportion,
Conductive silver paste is set to be more evenly distributed, electric conductivity is more preferable.
Amide modifications rilanit special is a kind of castor oil derivative, have excellent storage stability, not with conductive silver
Other components reaction in slurry, has good thixotropy and anti-settling, can be used for adjusting the rheological behavior of solvent-based system,
Prevent from settling in silver powder in conductive silver paste preparation process it is too fast keep conductive silver paste print unevenness even, and then influence its performance.
A kind of thixotropy additive of polyamide wax, has passed through solvent and has effectively activated, and has excellent thixotropic property, prevents
Sagging ability, anti-settling ability.
By the proportion of said components, make prepared conductive silver paste have high conductivity, good oxidation resistance and
Adhesive force, anti-crawl agentdefiection roll over excellent performance.
Further, in the step A8 conductive silver slurry layer with a thickness of 5-9um, edge silver paste line and conductive silver paste edge
Distance be 150-400um, the brings error such as deviation caused by film harmomegathus and printing can be prevented, etch edge silver paste line
Silver paste edge out.
Further, to the 1500-2500mm/s of laser-induced thermal etching speed of conductive silver paste, etching power in the step A8
For 10-30W, etching frequency is 100-200kHz.Through above-mentioned technique etching after silver paste lines it is straight and smooth, line width compared with
Carefully, edge heat-affected zone is small, and PET base material layer does not receive damage, guarantees product yield.
The beneficial effects of the present invention are: touch screen of the invention is more in the single layer that ITO conductive film is provided with single-ended outlet
Point electrode pattern eliminates original left longitudinal cabling area and right longitudinal cabling in such a way that lateral cabling area presses FPC
Area makes the longitudinal edge of touch screen no longer need to be routed, and signal can pass to IC chip from lateral cabling area by FPC, to build
Rimless visual effect；By setting explosion-proof layer and anti-reflective layer, the antiknock ability of touch screen is improved, it is existing to reduce reflection
As.
The present invention magnetron sputtering carry out ITO coating process in use ultraviolet light, by the oxygen prepared in environment from
It is melted into ozone, improves the photoelectric properties of ITO conductive film, using laser-induced thermal etching silver paste cabling and electrode pattern, preparation process is only
Need a FPC pressing, simple process, product yield height, it is ensured that the excellent performance and production stability of touch screen are realized and touched
The multiple point touching of screen reaches the visual effect of Rimless.
Detailed description of the invention
The present invention will be further described with reference to the accompanying drawings, but the embodiment in attached drawing is not constituted to any limit of the invention
System, for those of ordinary skill in the art, without creative efforts, can also obtain according to the following drawings
Other attached drawings.
Fig. 1 is structural schematic diagram of the invention.
Fig. 2 is diagrammatic cross-section of the invention.
Appended drawing reference includes:
1-2-FPC of ITO conductive film
3-4-Fixing clamp-seats of IC chip
5-6-tempered glass cover plates of reinforcing chip
7-transparent optical glue-lines.
Specific embodiment
The present invention will be further described below with reference to the drawings, sees attached drawing 1-2.
Embodiment 1
As shown in Figures 1 and 2, a kind of GF single layer multiple spot Rimless touch screen, including the tempering set gradually from top to bottom
Glass cover-plate 6, transparent optical glue-line 7 and ITO conductive film 1, the frame of the ITO conductive film 1 are cabling area, the cabling area packet
The lateral cabling area for being set to touch screen one end is included, the ITO conductive film 1 is equipped with the single layer multipoint electrode pattern of single-ended outlet,
The lead-out wire of ITO conductive film 1 is correspondingly arranged in lateral cabling area, and the transverse direction cabling area presses FPC 2, ITO conductive film 1
Lead-out wire is connected with an IC chip 3 by FPC 2.
In the present embodiment, lateral cabling area is set to the upper end of touch screen.
Further, single layer multipoint electrode pattern include induction channels and driving channel, induction channels and driving channel that
This separation, does not generate staggeredly.
The present invention is provided with the single layer multipoint electrode pattern of single-ended outlet, single layer multipoint electrode pattern packet in ITO conductive film 1
Induction channels and driving channel are included, induction channels and driving channel are separated from each other, do not generate staggeredly, therefore do not need not collinear
The intersection on road makes insulating layer, simplifies manufacture craft；In such a way that lateral cabling area presses FPC 2, eliminate original
Left longitudinal cabling area and right longitudinal cabling area, make the longitudinal edge of touch screen no longer need to be routed, signal can be from lateral cabling area
IC chip 3 is passed to by FPC2, to build Rimless visual effect.
Further, the IC chip 3 is fixed on a reinforcing chip 5, and the FPC2 is connected to the reinforcing chip 5.Preferably,
The reinforcing chip 5 is equipped with Fixing clamp-seat 4, and the end of the FPC2 is arranged in the Fixing clamp-seat 4.Due to setting for above structure
It sets, the mechanical strength of FPC2 can be reinforced, keep connecting portion more durable, facilitate the overall package of product.
Further, the FPC2 includes the body region FPC and the region of elongation FPC for being connected to the body region FPC end, FPC master
Body area includes golden finger, and the distance at the edge golden finger distance FPC2 is 3mm.
Further, the upper surface of tempered glass cover plate is upward arc-shaped curved surface。
Further, the anti-reflective layer is nano zine oxide and Nanoparticles CdSe mixed layer.Further, nano-silica
The partial size for changing titanium is 10nm, the partial size of Nanoparticles CdSe is 10nm.
Further, the tempered glass cover plate 6 is divided for black surround area and viewfinder area, and the black surround area includes longitudinal black surround area
With lateral black surround area, the transverse direction black surround area corresponds to lateral cabling area setting, and the ITO conductive film 1 exceeds the cross of viewfinder area
To boundary 0.5mm, the visual effect on boundary can be improved.
Further, the width in longitudinal black surround area is 0-0.8mm.Due to the not set longitudinal cabling area of the present invention, institute
It can be set very narrow with the width in longitudinal black surround area or setting can be completely dispensed with, to build the visual effect of Rimless.
A kind of preparation process of GF single layer multiple spot Rimless touch screen, comprising the following steps:
Front-end-of-line:
(A1) it ITO plated film: on the front deposition barrier layer SiO2 of PET base material layer, is being deposited using magnetron sputtering method
ITO film is plated in the PET base material layer front on the barrier layer SiO2, and ultraviolet light is used while magnetron sputtering；Then vacuum is moved back
Fire obtains ITO conductive film crude product；
(A2) it cleans: ITO conductive film crude product is cleaned；
(A3) ITO conductive film crude product etching removal: is located to the ITO film preset except viewfinder area using laser-induced thermal etching
It removes；
(A4) it prints conductive silver paste: printing conductive silver paste in the laser-induced thermal etching region of ITO conductive film crude product, formed conductive
Silver slurry layer carries out laser-induced thermal etching silver paste line to conductive silver paste, forms lateral cabling area；
(A5) it toasts: the ITO conductive film crude product for being etched with silver paste line is toasted；
(A6) laser-induced thermal etching etched electrodes figure etched electrodes pattern: is carried out to the default viewfinder area of ITO conductive film crude product
Case；
(A7) overlay film: the ITO conductive film crude product after printing conductive silver paste is covered with protective film；
(A8) it cuts: cutting to form FILM functional sheet；
Rear end process
(B1) ACF is bound: FILM functional sheet ready-made to front-end-of-line binds ACF conducting resinl；
(B2) FPC hot pressing: to the lateral cabling area hot pressing FPC of the FILM functional sheet of the ACF conducting resinl posted；
(B3) transparent optical glue-line is bonded: being bonded transparent optical glue-line to the FILM functional sheet for having pressed FPC；
(B4) it combines: the FILM functional sheet and tempered glass cover plate that post transparent optical glue-line being combined, tempering glass
Glass cover board is provided with explosion-proof layer and anti-reflective layer, obtains a kind of GF single layer multiple spot Rimless touch screen.
Preferably, the present embodiment plates ITO film in the front of PET base material layer using the method for rf magnetron sputtering.Radio frequency
There is electron accumulation on sputtering target, target surface voltage automatic bias is negative value, so as to attract cation.In the effect of rf electric field
Under, space of the electronics between anode and cathode is shaken back and forth, has more chances and gas molecule collision to ionize, and has film growth
Fireballing feature.
Preferably, the present embodiment uses wavelength to carry out laser-induced thermal etching silver paste cabling and electrode for the optical fiber laser of 1064nm
Pattern.
The present invention carries out using ultraviolet light in ITO coating process in magnetron sputtering, can mention by oxygen ionization at ozone
The high photoelectric properties of ITO conductive film 1, manufacturing process only need a FPC2 pressing, simple process, and product yield is high, it is ensured that
The excellent performance and production stability of touch screen, realize the multiple point touching of touch screen, reach the visual effect of Rimless.
Further, silver paste comprises the following raw materials by weight percent in the step A4:
Silver powder 60%
Bisphenol A type epoxy resin 4%
Chlorine vinegar vinyl 6%
Polypropylene glycol diglycidyl ether 1%
Powdered graphite 1%
SiO 2 powder 2%
1,6 hexanediol diacrylate 15%
Amide modifications rilanit special 1%,
The sum of above weight percent is 100%, and the silver powder is by the micro-silver powder end that mass ratio is 1:20 and nano silver
Powder constituent, the partial size at the micro-silver powder end are 30 μm, and the partial size of the nano silver powder is 20nm, the powdered graphite by
The micron graphite powder and nano-graphite powder composition that mass ratio is 1:20, the partial size of the micron graphite powder is 30 μm, institute
The partial size for stating nano-graphite powder is 20nm, and the partial size of SiO 2 powder is 20nm.
Further, the laser-induced thermal etching speed of the step A8 conductive silver paste be 1500 mm/s, etching power 10W,
Etching frequency is 150kHz.Preferably, etching number of repetition of the invention is 2-5 times.The setting of above-mentioned technological parameter can be effective
It solves the problems, such as silver paste cabling difficult processing, guarantees product yield, conductive silver paste adhesive force is good, and it is complete that laser-induced thermal etching svelteness is straight
It is whole, line width, and do not damage PET base material layer.
Further, sputtering power is 100W in the step A1.
Further, the step B2 hot pressing temperature be 160 DEG C, hot pressing time 20s, can reach good hot pressing effect
Fruit.
Further, in the step A4 conductive silver slurry layer with a thickness of 5-9um, edge silver paste line and conductive silver paste edge
Distance be 150-400um.
In this example, the light transmittance of GF single layer multiple spot Rimless touch screen is 87%, and mist degree 2.1, product appearance is not damaged
And wear, without deformation, non-discolouring, bubble-free and removing, the sheet resistance of ITO conductive film 1 is in 140 Ω hereinafter, good product performance, product
Yield (with 500 for statistical unit) is 96%.
Embodiment 2
The present embodiment and embodiment 1 the difference is that:
In the present embodiment, lateral cabling area is set to the lower end of touch screen.
Further, the anti-reflective layer is nano-titanium oxide silicon layer.
Further, the FPC2 includes the body region FPC and the region of elongation FPC for being connected to the body region FPC end, FPC master
Body area includes golden finger, and the distance at the edge golden finger distance FPC2 is 8mm.Further, it is black that the tempered glass cover plate 6, which is divided,
Frame area and viewfinder area, the black surround area include longitudinal black surround area and lateral black surround area, and the transverse direction black surround area corresponds to laterally to walk
The setting of line area, the ITO conductive film 1 exceed the horizontal boundary 0.8mm of viewfinder area, can improve the visual effect on boundary.
In the present embodiment, silver paste is comprised the following raw materials by weight percent:
Silver powder 70%
Bisphenol-A type epoxy resin 4%
Chlorine vinegar vinyl 2%
Polypropylene glycol diglycidyl ether 2%
Powdered graphite 2%
SiO 2 powder 1.5%
1,6 hexanediol diacrylate 18%
Amide hydrogenation modified castor oil 0.5%,
The sum of above weight percent is 100%, and the silver powder is by the micro-silver powder end that mass ratio is 1:20 and nano silver
Powder constituent, the partial size at the micro-silver powder end are 50 μm, and the partial size of the nano silver powder is 50nm, the powdered graphite by
The micron graphite powder and nano-graphite powder composition that mass ratio is 1:30, the partial size of the micron graphite powder is 40 μm, institute
The partial size for stating nano-graphite powder is 30nm, and the partial size of SiO 2 powder is 10nm.Such combination and partial size make silver paste
Electric conductivity is more preferable, and adhesive force is more preferable.
Further, sputtering power is 250W in the step A1.
Further, the step B2 hot pressing temperature be 165 DEG C, hot pressing time 18s, can reach good hot pressing effect
Fruit.
Further, the laser-induced thermal etching speed of the step A8 conductive silver paste be 2000 mm/s, etching power 15W,
Etching frequency is 100kHz times.
In this example, the light transmittance of GF single layer multiple spot Rimless touch screen is 87%, and mist degree 2.1, product appearance is not damaged
And wear, without deformation, non-discolouring, bubble-free and removing, the sheet resistance of ITO conductive film 1 is in 120 Ω hereinafter, good product performance, product
Yield (with 500 for statistical unit) is 96%.
Remaining content of the present embodiment is same as Example 1, and which is not described herein again.
Embodiment 3
The present embodiment and embodiment 1 the difference is that:
In the present embodiment, the FPC2 includes the body region FPC and the region of elongation FPC for being connected to the body region FPC end, FPC
Body region includes golden finger, and the distance at the edge golden finger distance FPC is 5mm.
Further, the anti-reflective layer is nano-titanium oxide silicon layer
Further, the tempered glass cover plate 6 is divided for black surround area and viewfinder area, and the black surround area includes longitudinal black surround area
With lateral black surround area, the transverse direction black surround area corresponds to lateral cabling area setting, and the ITO conductive film 1 exceeds the cross of viewfinder area
To boundary 0.5mm, the visual effect on boundary can be improved.
In the present embodiment, silver paste is comprised the following raw materials by weight percent:
Silver powder 65%
Bisphenol-A type epoxy resin 5%
Chlorine vinegar vinyl 4%
Polypropylene glycol diglycidyl ether 3%
Powdered graphite 1.8%
SiO 2 powder 1%
1,6 hexanediol diacrylate 20%
Polyamide wax 0.2%,
The sum of above weight percent is 100%, and the silver powder is by the micro-silver powder end that mass ratio is 1:15 and nano silver
Powder constituent, the partial size at the micro-silver powder end are 40 μm, and the partial size of the nano silver powder is 40nm, the powdered graphite by
The micron graphite powder and nano-graphite powder composition that mass ratio is 1:25, the partial size of the micron graphite powder is 40 μm, institute
The partial size for stating nano-graphite powder is 40nm, and the partial size of SiO 2 powder is 30nm.Such combination and partial size make silver paste
Electric conductivity is more preferable, and adhesive force is more preferable.
Further, sputtering power is 50W in the step A1.
Further, the step B2 hot pressing temperature be 170 DEG C, hot pressing time 15s, can reach good hot pressing effect
Fruit.
Further, the laser-induced thermal etching speed of the step A4 conductive silver paste be 2500 mm/s, etching power 20W,
Etching frequency is 200kHz.
In this example, the light transmittance of GF single layer multiple spot Rimless touch screen is 88%, and mist degree 2.0, product appearance is not damaged
And wear, without deformation, non-discolouring, bubble-free and removing, the sheet resistance of ITO conductive film 1 is in 140 Ω hereinafter, good product performance, product
Yield (with 500 for statistical unit) is 95%.
Remaining content of the present embodiment is same as Example 1, and which is not described herein again.
Embodiment 4
The present embodiment and embodiment 1 the difference is that:
In the present embodiment, the FPC2 includes the body region FPC and the region of elongation FPC for being connected to the body region FPC end, FPC
Body region includes golden finger, and the distance at the edge golden finger distance FPC is 4mm.
Further, the anti-reflective layer is nano zine oxide and Nanoparticles CdSe mixed layer.Further, nano-silica
The partial size for changing titanium is 5nm, the partial size of Nanoparticles CdSe is 20nm.
Further, the tempered glass cover plate 6 is divided for black surround area and viewfinder area, and the black surround area includes longitudinal black surround area
With lateral black surround area, the transverse direction black surround area corresponds to lateral cabling area setting, and the ITO conductive film 1 exceeds the cross of viewfinder area
To boundary 0.6mm, the visual effect on boundary can be improved.
In the present embodiment, silver paste is comprised the following raw materials by weight percent:
Silver powder 60%
Bisphenol-A type epoxy resin 10%
Chlorine vinegar vinyl 2.2%
Polypropylene glycol diglycidyl ether 1%
Powdered graphite 1%
SiO 2 powder 1%
1,6 hexanediol diacrylate 24%
Polyamide wax 0.8%,
The sum of above weight percent is 100%, and the silver powder is by the micro-silver powder end that mass ratio is 1:25 and nano silver
Powder constituent, the partial size at the micro-silver powder end are 50 μm, and the partial size of the nano silver powder is 30nm, the powdered graphite by
The micron graphite powder and nano-graphite powder composition that mass ratio is 1:25, the partial size of the micron graphite powder is 30 μm, institute
The partial size for stating nano-graphite powder is 40nm, and the partial size of SiO 2 powder is 20nm.Such combination and partial size make silver paste
Electric conductivity is more preferable, and adhesive force is more preferable.
Further, sputtering power is 300W in the step A1.
Further, the step B2 hot pressing temperature be 175 DEG C, hot pressing time 12s, can reach good hot pressing effect
Fruit.
Further, the laser-induced thermal etching speed of the step A4 conductive silver paste be 2500 mm/s, etching power 25W,
Etching frequency is 200kHz.
In this example, the light transmittance of GF single layer multiple spot Rimless touch screen is 86%, and mist degree 2.0, product appearance is not damaged
And wear, without deformation, non-discolouring, bubble-free and removing, the sheet resistance of ITO conductive film 1 is in 120 Ω hereinafter, good product performance, product
Yield (with 500 for statistical unit) is 94%.
Embodiment 5
The present embodiment and embodiment 1 the difference is that:
In the present embodiment, the FPC2 includes the body region FPC and the region of elongation FPC for being connected to the body region FPC end, FPC
Body region includes golden finger, and the distance at the edge golden finger distance FPC is 6mm.
Further, the tempered glass cover plate 6 is divided for black surround area and viewfinder area, and the black surround area includes longitudinal black surround area
With lateral black surround area, the transverse direction black surround area corresponds to lateral cabling area setting, and the ITO conductive film 1 exceeds the cross of viewfinder area
To boundary 0.6mm, the visual effect on boundary can be improved.
In the present embodiment, silver paste is comprised the following raw materials by weight percent:
Silver powder 61%
Bisphenol-A type epoxy resin 6.3%
Chlorine vinegar vinyl 2%
Polypropylene glycol diglycidyl ether 2%
Powdered graphite 1.5%
SiO 2 powder 1.5%
1,6 hexanediol diacrylate 25%
Polyamide wax 0.7%,
The sum of above weight percent is 100%, and the silver powder is by the micro-silver powder end that mass ratio is 1:25 and nano silver
Powder constituent, the partial size at the micro-silver powder end are 50 μm, and the partial size of the nano silver powder is 30nm, the powdered graphite by
The micron graphite powder and nano-graphite powder composition that mass ratio is 1:30, the partial size of the micron graphite powder is 30 μm, institute
The partial size for stating nano-graphite powder is 30nm, and the partial size of SiO 2 powder is 20nm.Such combination and partial size make silver paste
Electric conductivity is more preferable, and adhesive force is more preferable.
Further, sputtering power is 200W in the step A1.
Further, the step B2 hot pressing temperature be 180 DEG C, hot pressing time 10s, can reach good hot pressing effect
Fruit.
Further, the laser-induced thermal etching speed of the step A4 conductive silver paste be 2500 mm/s, etching power 30W,
Etching frequency is 200kHz.
In the present embodiment, the light transmittance of GF single layer multiple spot Rimless touch screen is 88%, and mist degree 2.1, product appearance is lossless
Injure abrasion, without deformation, non-discolouring, bubble-free and removing, the sheet resistance of ITO conductive film 1 is in 120 Ω hereinafter, good product performance, produces
Product yield (with 500 for statistical unit) is 96%.
Preparation process of the invention need to only carry out a FPC2 pressing, simple process, product yield height, it is ensured that touch screen
Excellent performance and production stability, realize the multiple point touching of touch screen, reach the visual effect of Rimless.
Finally it should be noted that the above embodiments are merely illustrative of the technical solutions of the present invention, rather than the present invention is protected
The limitation of range is protected, although explaining in detail referring to preferred embodiment to the present invention, those skilled in the art are answered
Work as understanding, it can be with modification or equivalent replacement of the technical solution of the present invention are made, without departing from the reality of technical solution of the present invention
Matter and range.
Claims (6)
1. a kind of GF single layer multiple spot Rimless touch screen, it is characterised in that: including the tempering glass lid set gradually from top to bottom
Plate, transparent optical glue-line and ITO conductive film, the frame of the ITO conductive film are cabling area, and the cabling area includes being set to touching
The lateral cabling area of screen one end is touched, the ITO conductive film is equipped with the single layer multipoint electrode pattern of single-ended outlet, ITO conductive film
Lead-out wire is correspondingly arranged in lateral cabling area, and the transverse direction cabling area presses FPC, and the lead-out wire of ITO conductive film passes through FPC connection
There is an IC chip, the lower surface of tempered glass cover plate is provided with explosion-proof layer, and anti-reflective layer is arranged in the upper surface of tempered glass cover plate,
The FPC includes the body region FPC and the region of elongation FPC for being connected to the body region FPC end, and the body region FPC includes golden finger, golden hand
Span is 3-8mm with a distance from the edge FPC；
The preparation process of the GF single layer multiple spot Rimless touch screen, comprising the following steps:
Front-end-of-line
(A1) ITO plated film: in the front deposition SiO of PET base material layer2Barrier layer is depositing SiO using magnetron sputtering method2Stop
Ito thin film is plated in the PET base material layer front of layer, and ultraviolet light is used while magnetron sputtering；Then vacuum annealing obtains
ITO conductive film crude product；
(A2) it cleans: ITO conductive film crude product is cleaned；
(A3) etching removal: the ito thin film that ITO conductive film crude product is located at except default viewfinder area is removed using laser-induced thermal etching；
(A4) it prints conductive silver paste: printing conductive silver paste in the laser-induced thermal etching region of ITO conductive film crude product, form conductive silver paste
Layer carries out laser-induced thermal etching silver paste line to conductive silver paste, forms lateral cabling area；
(A5) it toasts: the ITO conductive film crude product for being etched with silver paste line is toasted；
(A6) laser-induced thermal etching etched electrodes pattern etched electrodes pattern: is carried out to the default viewfinder area of ITO conductive film crude product；
(A7) overlay film: the ITO conductive film crude product after printing conductive silver paste is covered with protective film；
(A8) it cuts: cutting to form FILM functional sheet；
Rear end process
(B1) ACF is bound: FILM functional sheet ready-made to front-end-of-line binds ACF conducting resinl；
(B2) FPC hot pressing: to the lateral cabling area hot pressing FPC of the FILM functional sheet of the ACF conducting resinl posted；
(B3) transparent optical glue-line is bonded: being bonded transparent optical glue-line to the FILM functional sheet for having pressed FPC；
(B4) it combines: the FILM functional sheet and tempered glass cover plate that post transparent optical glue-line being combined, tempering glass lid
Plate is provided with explosion-proof layer and anti-reflective layer, obtains a kind of GF single layer multiple spot Rimless touch screen；
Wherein, silver paste comprises the following raw materials by weight percent in the step A4:
The sum of above weight percent is 100%, and the silver powder is by the micro-silver powder end that mass ratio is 1:20-1:30 and nanometer
Silver powder composition, the partial size at the micro-silver powder end are 30-50 μm, and the partial size of the nano silver powder is 20-50nm；The stone
Ink powder end is made of the micron graphite powder that mass ratio is 1:20-1:30 and nano-graphite powder, the micron graphite powder
Partial size is 30-50 μm, and the partial size of the nano-graphite powder is 20-40nm；The partial size of the SiO 2 powder is 10-
30nm；The sagging inhibitor is polyamide wax or amide modifications rilanit special；
Wherein, in the step A4 conductive silver paste laser-induced thermal etching speed be 1500-2500mm/s, etching power 10-30W,
Etching frequency is 100-200kHz.
2. a kind of GF single layer multiple spot Rimless touch screen according to claim 1, it is characterised in that: the tempering glass lid
The upper surface of plate is upward arc-shaped curved surface.
3. a kind of GF single layer multiple spot Rimless touch screen according to claim 1, it is characterised in that: the anti-reflective layer is
Nano-titanium oxide silicon layer.
4. a kind of GF single layer multiple spot Rimless touch screen according to claim 1, it is characterised in that: the anti-reflective layer is
Nano zine oxide and Nanoparticles CdSe mixed layer.
5. a kind of preparation process of GF single layer multiple spot Rimless touch screen according to claim 1, it is characterised in that: described
Sputtering power is 50-300W in step A1.
6. a kind of preparation process of GF single layer multiple spot Rimless touch screen according to claim 1, it is characterised in that: described
In step A4 conductive silver slurry layer with a thickness of 5-9um, edge silver paste line at a distance from conductive silver paste edge be 150-400um.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201511014788.2A CN105426014B (en) | 2015-12-31 | 2015-12-31 | A kind of GF single layer multiple spot Rimless touch screen and its preparation process |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201511014788.2A CN105426014B (en) | 2015-12-31 | 2015-12-31 | A kind of GF single layer multiple spot Rimless touch screen and its preparation process |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN105426014A CN105426014A (en) | 2016-03-23 |
| CN105426014B true CN105426014B (en) | 2019-03-08 |
Family
ID=55504262
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201511014788.2A Active CN105426014B (en) | 2015-12-31 | 2015-12-31 | A kind of GF single layer multiple spot Rimless touch screen and its preparation process |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN105426014B (en) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106775073A (en) * | 2016-12-02 | 2017-05-31 | 东莞市平波电子有限公司 | A kind of sensor glass adds safety glass structure touch-screen and preparation method thereof |
| CN106753046B (en) * | 2016-12-02 | 2019-03-08 | 东莞市平波电子有限公司 | A kind of full applying method of GF touch screen |
| CN107118380A (en) * | 2017-06-28 | 2017-09-01 | 昆山特酷信息科技有限公司 | A kind of preparation method of the hard plastics display screen of tablet personal computer |
| CN107151387A (en) * | 2017-06-28 | 2017-09-12 | 昆山特酷信息科技有限公司 | A kind of hard plastics display screen of tablet personal computer |
| CN111511099B (en) * | 2020-03-25 | 2021-06-08 | 上海玖银电子科技有限公司 | Quick-drying silver paste for large keyboard conductive film circuit and preparation method thereof |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102855046A (en) * | 2012-10-08 | 2013-01-02 | 江西联创电子有限公司 | Pattern structure of monolayer multipoint capacitive screen sensor |
| CN203276242U (en) * | 2013-05-16 | 2013-11-06 | 福建省辉锐材料科技有限公司 | Capacitive touch screen |
| CN103713772A (en) * | 2013-12-31 | 2014-04-09 | 东莞市平波电子有限公司 | Technology for manufacturing GF single-layer multi-point structure touch screen |
| CN104133604A (en) * | 2014-08-15 | 2014-11-05 | 无锡宇宁光电科技有限公司 | Frameless touch screen of G+F structure |
| CN104850262A (en) * | 2015-05-29 | 2015-08-19 | 东莞市平波电子有限公司 | GF frameless touch screen and production process thereof |
| CN205353985U (en) * | 2015-12-31 | 2016-06-29 | 东莞市平波电子有限公司 | GF individual layer multiple spot does not have frame touch -sensitive screen |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102033650B (en) * | 2010-09-29 | 2012-12-19 | 南京点面光电有限公司 | Method for performing laser etching on silver paste indium tin oxide film |
| CN103914194A (en) * | 2013-01-09 | 2014-07-09 | 苏州市健邦触摸屏技术有限公司 | Circuit manufacturing process of capacitive touch screen |
-
2015
- 2015-12-31 CN CN201511014788.2A patent/CN105426014B/en active Active
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102855046A (en) * | 2012-10-08 | 2013-01-02 | 江西联创电子有限公司 | Pattern structure of monolayer multipoint capacitive screen sensor |
| CN203276242U (en) * | 2013-05-16 | 2013-11-06 | 福建省辉锐材料科技有限公司 | Capacitive touch screen |
| CN103713772A (en) * | 2013-12-31 | 2014-04-09 | 东莞市平波电子有限公司 | Technology for manufacturing GF single-layer multi-point structure touch screen |
| CN104133604A (en) * | 2014-08-15 | 2014-11-05 | 无锡宇宁光电科技有限公司 | Frameless touch screen of G+F structure |
| CN104850262A (en) * | 2015-05-29 | 2015-08-19 | 东莞市平波电子有限公司 | GF frameless touch screen and production process thereof |
| CN205353985U (en) * | 2015-12-31 | 2016-06-29 | 东莞市平波电子有限公司 | GF individual layer multiple spot does not have frame touch -sensitive screen |
Also Published As
| Publication number | Publication date |
|---|---|
| CN105426014A (en) | 2016-03-23 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN105426014B (en) | A kind of GF single layer multiple spot Rimless touch screen and its preparation process | |
| CN105511681B (en) | A kind of GG single layer multiple spot Rimless touch screen and its preparation process | |
| JP5745190B2 (en) | Conductive structure and manufacturing method thereof | |
| JP4754273B2 (en) | Ink-jet conductive ink, conductive pattern, and conductor | |
| CN104516577B (en) | Contact panel | |
| JP4419146B2 (en) | Transparent conductive laminate | |
| KR102154562B1 (en) | Nanostructure-based transparent conductors having increased haze and devices comprising the same | |
| CN104991671B (en) | A kind of flexible touch screen sense film and preparation method thereof | |
| JP5245112B2 (en) | Transparent conductive film, transparent conductive film, and flexible transparent electrode | |
| WO2014030647A1 (en) | Parallel line pattern containing conductive material, parallel line pattern formation method, substrate with transparent conductive film, device and electronic apparatus | |
| KR101305705B1 (en) | Touch panel and method for electrode | |
| WO2015005457A1 (en) | Coating film formation method, base material with transparent conducting film, device and electronic apparatus | |
| JP2014120353A (en) | Parallel line pattern forming method, substrate with transparent conductive film attached thereto, device and electronic apparatus | |
| KR101550481B1 (en) | Touch panel having a improved visibility, method for manufacturing the same and display device comprising the same | |
| CN107750354A (en) | Touch sensor and its manufacture method | |
| JP2011210148A (en) | Method for manufacturing conductive member for touch panel and touch panel using the conductive member | |
| WO2018193686A1 (en) | Conductive film and touch panel | |
| CN107122074A (en) | The preparation method of contact panel | |
| JP6647399B2 (en) | Conductive film, electronic paper, touch panel, and flat panel display | |
| JP6070675B2 (en) | Method for producing transparent conductive substrate and touch panel sensor | |
| WO2015111731A1 (en) | Pattern formation method, substrate provided with transparent electroconductive film, device, and electronic instrument | |
| CN108093651A (en) | touch sensor and its manufacturing method | |
| JP2011138711A (en) | Transparent conductive adhesive and photoelectric conversion element having transparent conductive adhesive layer formed of the same | |
| JP2016107229A (en) | Transparent conductive base material manufacturing method, coating liquid for forming transparent conductive layer, and transparent conductive base material | |
| CN105492655A (en) | Method for producing transparent electrically-conductive film |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant |