CN105425471B - A kind of array substrate and preparation method thereof, display device - Google Patents
A kind of array substrate and preparation method thereof, display device Download PDFInfo
- Publication number
- CN105425471B CN105425471B CN201610052350.1A CN201610052350A CN105425471B CN 105425471 B CN105425471 B CN 105425471B CN 201610052350 A CN201610052350 A CN 201610052350A CN 105425471 B CN105425471 B CN 105425471B
- Authority
- CN
- China
- Prior art keywords
- substrate
- transparent microstructures
- array substrate
- transparent
- microstructures
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/1336—Illuminating devices
- G02F1/133602—Direct backlight
- G02F1/133605—Direct backlight including specially adapted reflectors
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/1336—Illuminating devices
- G02F1/133602—Direct backlight
- G02F1/133606—Direct backlight including a specially adapted diffusing, scattering or light controlling members
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/1336—Illuminating devices
- G02F1/133602—Direct backlight
- G02F1/133606—Direct backlight including a specially adapted diffusing, scattering or light controlling members
- G02F1/133607—Direct backlight including a specially adapted diffusing, scattering or light controlling members the light controlling member including light directing or refracting elements, e.g. prisms or lenses
Abstract
A kind of array substrate of present invention offer and preparation method thereof, display device, it is related to display technology field, the display device can utilize the light for the opaque pattern for being mapped to array substrate, to improve the utilization rate of backlight, and then improve the problem for causing backlight source utilization rate low because aperture opening ratio is low.A kind of array substrate, including：Substrate and opaque pattern in the substrate light emission side is set, further includes：Corresponding with the opaque pattern and transparent microstructures in the substrate incident side are arranged, the transparent microstructures are used to change the path for impinging upon the light on its backlight side surface by reflecting.The present invention is suitable for the making that array substrate includes the display device of the array substrate.
Description
Technical field
The present invention relates to display technology field more particularly to a kind of array substrate and preparation method thereof, display devices.
Background technology
LCD (Liquid Crystal Display, liquid crystal display) has been widely used in display field.LCD mono-
As include display panel and backlight, wherein display panel includes：Color membrane substrates and array substrate to box and it is located at battle array
Liquid crystal between row substrate and color membrane substrates.Since liquid crystal itself does not shine, it is aobvious to realize that LCD needs backlight to provide light
Show.
As LCD industries constantly advance, High Resolution LCD rush of demand.In High Resolution LCD, in array substrate
Signal wire (such as：Data line and grid line) arrangement it is very intensive.Signal wire is generally made of metal material, and metal material has
There is extremely strong reflecting power, then, when the vertical directive display panel of the light that backlight is sent out, the light meeting that is mapped on signal wire
It is round-trip back and forth between the reflector plate and signal wire of backlight, in this way, some light cannot be used for showing, lead to backlight
Utilization rate is relatively low.And the resolution ratio for working as LCD is higher, if data line and the arrangement of grid line equisignal line are more intensive, then cannot in LCD
The region of transmitted light is bigger, i.e. the aperture opening ratio of LCD is lower, can further decrease the utilization rate of backlight in this way.
Invention content
A kind of array substrate of the embodiment of the present invention offer and preparation method thereof, display device, the display device can profits
With the light for the opaque pattern for being mapped to array substrate, to improve the utilization rate of backlight, and then improves and led because aperture opening ratio is low
The problem for causing backlight source utilization rate low.
In order to achieve the above objectives, the embodiment of the present invention adopts the following technical scheme that：
On the one hand, a kind of array substrate is provided, including：Substrate and it is arranged in the opaque of the substrate light emission side
Pattern further includes：It is corresponding with the opaque pattern and transparent microstructures in the substrate incident side are set, it is described transparent
Micro-structure is used to change the path for impinging upon the light on its backlight side surface by reflecting.
Optionally, the array substrate further includes：The reflecting layer being arranged between the substrate and the transparent microstructures.
Optionally, the transparent microstructures are microprism or lenticule.
Optionally, the array substrate further includes：Incident side and the covering transparent microstructures in the substrate is set
Hyaline layer, wherein the refractive index of the refractive index of the hyaline layer and the transparent microstructures is different.
Optionally, in the case where the transparent microstructures are convex lens, the refractive index of the transparent microstructures is less than institute
State the refractive index of hyaline layer；In the case where the transparent microstructures are concavees lens, the refractive index of the transparent microstructures is more than
The refractive index of the hyaline layer.
Optionally, the opaque pattern is grid line and data line, the transparent microstructures and the grid line and/or described
Data line corresponds to.
Optionally, the material in the reflecting layer is metal, and the material of the transparent microstructures and the hyaline layer is light
Resistance.
The embodiment provides a kind of array substrates, including：Substrate and it is arranged in the impermeable of substrate light emission side
Bright pattern, the array substrate further include：It is corresponding with opaque pattern and transparent microstructures in substrate incident side are set, it is transparent
Micro-structure is used to change the path for impinging upon the light on its backlight side surface by reflecting.In this way, the array substrate be applied to it is aobvious
When showing device, the transparent microstructures of the array substrate can change the road for impinging upon the light on its backlight side surface by reflecting
Diameter, then, the angle which is mapped to opaque pattern also changes correspondingly, and then in the reflection by opaque pattern
Afterwards, some light can be re-used so that some light is for showing, to improve the utilization rate of backlight, in turn
Improve the problem for causing backlight source utilization rate low because aperture opening ratio is low.
On the other hand, a kind of display device is provided, including：Backlight and display panel, the backlight include：It shines
Component and reflector plate, wherein the reflector plate is located at the side far from the display panel, the display in the luminescence component
Panel includes：Array substrate described in any one of the above embodiments.The display device can utilize the opaque pattern for being mapped to array substrate
Light, to improve the utilization rate of backlight, and then improve the problem for causing backlight source utilization rate low because aperture opening ratio is low.
In another aspect, a kind of forming method of array substrate is provided, the method includes：
Form transparent microstructures on substrate, the transparent microstructures it is corresponding with the opaque pattern on the substrate and
In the substrate incident side, the transparent microstructures are used to change the light impinged upon on its backlight side surface by reflecting for setting
Path.
Optionally, it is formed after transparent microstructures on substrate, the method further includes：
The hyaline layer for covering the transparent microstructures is formed in the incident side of the substrate, wherein the folding of the hyaline layer
It is different with the refractive index of the transparent microstructures to penetrate rate.
The embodiment provides a kind of forming method of array substrate, the array substrate formed by this method is set
Transparent microstructures are equipped with, when which is applied to display device, the transparent microstructures of the array substrate can pass through refraction
Change the path for impinging upon light on its backlight side surface, then, which is mapped to the angle of opaque pattern also therewith
Change, and then after the reflection of opaque pattern, some light can be re-used so that some light is for showing
Show, to improve the utilization rate of backlight, and then improves the problem for causing backlight source utilization rate low because aperture opening ratio is low.
Description of the drawings
In order to more clearly explain the embodiment of the invention or the technical proposal in the existing technology, to embodiment or will show below
There is attached drawing needed in technology description to be briefly described, it should be apparent that, the accompanying drawings in the following description is only this
Some embodiments of invention for those of ordinary skill in the art without creative efforts, can be with
Obtain other attached drawings according to these attached drawings.
Fig. 1 is a kind of structural schematic diagram one of array substrate provided in an embodiment of the present invention；
Fig. 2 a are a kind of structural schematic diagram two of array substrate provided in an embodiment of the present invention；
Fig. 2 b are the sectional view along the directions C-D of Fig. 2 a；
Fig. 3 is a kind of structural schematic diagram three of array substrate provided in an embodiment of the present invention；
Fig. 4 is a kind of structural schematic diagram four of array substrate provided in an embodiment of the present invention；
Fig. 5 is a kind of structural schematic diagram five of array substrate provided in an embodiment of the present invention；
Fig. 6 is a kind of structural schematic diagram six of array substrate provided in an embodiment of the present invention；
Fig. 7 is the sectional view along the directions A-B of Fig. 6；
Fig. 8 is a kind of structural schematic diagram of display device provided in an embodiment of the present invention；
Fig. 9 is a kind of flow diagram of the forming method of array substrate provided in an embodiment of the present invention.
Reference numeral：
1- array substrates；The opaque patterns of 100-；10- transparent microstructures；11- substrates；The reflecting layer 12-；14- convex lenses；
15- concavees lens；16- hyaline layers；17- grid lines；18- data lines；2- backlights；21- luminescence components；22- reflector plates；3- display surfaces
Plate；4- color membrane substrates；5- liquid crystal；300- light.
Specific implementation mode
Following will be combined with the drawings in the embodiments of the present invention, and technical solution in the embodiment of the present invention carries out clear, complete
Site preparation describes, it is clear that described embodiments are only a part of the embodiments of the present invention, instead of all the embodiments.It is based on
Embodiment in the present invention, it is obtained by those of ordinary skill in the art without making creative efforts every other
Embodiment shall fall within the protection scope of the present invention.
It should be noted that in the description of the present invention, " backlight side " refers to close to the side of backlight, for example, impermeable
Bright pattern backlight side refers to opaque pattern close to the side of backlight.
Embodiment one
An embodiment of the present invention provides a kind of array substrates, refering to what is shown in Fig. 1, the array substrate includes：Substrate 11 and
Opaque pattern 100 in 11 light emission side of substrate is set, which further includes：And setting corresponding with opaque pattern 100
In the transparent microstructures 10 of 11 incident side of substrate, transparent microstructures 10 are used to impinge upon on its backlight side surface by reflecting to change
The path of light.
The opaque pattern of above-mentioned array substrate refers to the impervious film of light or layer structure, certainly, above-mentioned battle array
Row substrate further includes transparent pattern (film or layer structure that i.e. light can penetrate).Those skilled in the art are according to known normal
Knowledge and the prior art can know, array substrate may include grid line, data line, public electrode wire equisignal line, further
, can also include thin film transistor (TFT) and pixel electrode etc., since grid line, data line, public electrode wire and thin film transistor (TFT) are equal
It is made of light-proof material, therefore, grid line, data line, public electrode wire and thin film transistor (TFT) may each be above-mentioned impermeable
Bright pattern；And pixel electrode generally uses transparent ITO (Indium Tin Oxide, tin indium oxide) to make, can be on
The transparent pattern stated.The embodiment of the present invention does not limit the structure of opaque pattern and transparent pattern, with specific reference to reality
Depending on situation.
In above-mentioned array substrate, transparent microstructures are corresponding with opaque pattern to refer to：The throwing of transparent microstructures on substrate
The boundary of projection of the boundary of shadow without departing from opaque pattern on substrate.Specifically, the projection of transparent microstructures on substrate
Boundary can be with opaque pattern on substrate projection overlapping margins, alternatively, the projection of transparent microstructures on substrate
Boundary can be located at the projection of opaque pattern on substrate boundary within.In order to which more directives can be utilized opaque
The light of pattern can select the former to further improve the utilization rate of backlight, the embodiment of the present invention and attached drawing with
It is illustrated for this.
In above-mentioned array substrate, opaque pattern is for example：Grid line, data line, the line width of public electrode wire equisignal line are non-
It is often thin, then the size for the transparent configuration being correspondingly arranged is also very small, because of referred to herein as transparent microstructures.
Since grid line, data line, thin film transistor (TFT) and pixel electrode etc. can be arranged in the light emission side of substrate, in order to reduce for
The incident side in substrate is arranged in above-mentioned transparent microstructures by the influence of above-mentioned film layer.
The embodiment provides a kind of array substrates, including：Substrate and it is arranged in the impermeable of substrate light emission side
Bright pattern, the array substrate further include：It is corresponding with opaque pattern and transparent microstructures in substrate incident side are set, it is transparent
Micro-structure is used to change the path for impinging upon the light on its backlight side surface by reflecting.In this way, the array substrate be applied to it is aobvious
When showing device, the transparent microstructures of the array substrate can change the road for impinging upon the light on its backlight side surface by reflecting
Diameter, then, the angle which is mapped to opaque pattern also changes correspondingly, and then in the reflection by opaque pattern
Afterwards, some light can be re-used so that some light is for showing, to improve the utilization rate of backlight, in turn
Improve the problem for causing backlight source utilization rate low because aperture opening ratio is low.
Optionally, in order to enhance the albedo of the light for being mapped to opaque pattern, array substrate further includes：Setting
Reflecting layer between substrate and transparent microstructures, by taking transparent microstructures are concavees lens as an example, with reference to shown in figure 2b, array substrate
Further include：The reflecting layer 12 being arranged between substrate 11 and concavees lens 15.
Optionally, above-mentioned transparent microstructures can be microprism or lenticule.It is exemplary, microprism can be prism,
Four prisms etc..Lenticule can be concavees lens 15 shown in Fig. 2 b, can also be convex lens 14 shown in Fig. 3.In order to reduce system
Make difficulty, lenticule may be used.The embodiment of the present invention and attached drawing illustrate so that transparent microstructures are lenticule as an example.
Further, if opaque pattern is a plurality of grid line, every grid line can be correspondingly arranged such as Fig. 2 b and Fig. 2 a institutes
The row's transparent microstructures shown, can also be correspondingly arranged multiple rows of transparent microstructures certainly, since the line width of grid line is thinner, in order to drop
Row's transparent microstructures are arranged in low manufacture difficulty.Transparent microstructures can be that continuously distributed shape as shown in Figure 2 a is in a row,
It is, of course, also possible to be Disjunct distribution, it is contemplated that using the light of the opaque pattern of more directives, select the former.
Illustrate transparent microstructures are how to change to impinge upon it by refraction by taking transparent microstructures shown in Fig. 2 b as an example below
The path of light on backlight side surface.
With reference to shown in figure 2b, light 300 across air be mapped to concavees lens 15 after through superrefraction directive reflecting layer 12, after pass through again
Reflecting layer 12 is reflected, and is finally projected concavees lens 15 and re-entered into air.Certainly, light 300 can also be across
Other media are mapped to concavees lens 15, are only illustrated so that light 300 is mapped to concavees lens 15 across air as an example here.In Fig. 2 b
It is illustrated so that the refractive index of air is less than the refractive index of concavees lens as an example.In this way, concavees lens impinge upon its back of the body by reflecting to change
The path of light on light side surface, then, the angle which is mapped to reflecting layer also changes correspondingly, and then by anti-
After penetrating the reflection of layer, some light can be re-used so that some light is for showing, to improve the profit of backlight
With rate.Structure is simple and easy to implement for this, low manufacture cost.
Optionally, with reference to shown in figure 4 and Fig. 5, array substrate further includes：Incident side in substrate 11 is set and is covered transparent
The hyaline layer 16 of micro-structure, wherein the refractive index of opaque layer is different with the refractive index of transparent microstructures.In this way, hyaline layer can
To play the role of protecting transparent microstructures and reflecting layer, while planarization can be played, in favor of subsequent technique.
Optionally, refering to what is shown in Fig. 4, in the case where transparent microstructures are convex lens 14, the refractive index of transparent microstructures
Less than the refractive index of opaque layer, when the light that such reflecting layer reflects is mapped on hyaline layer, be conducive to further change light
The shooting angle of line；Refering to what is shown in Fig. 5, in the case where transparent microstructures are concavees lens 15, the refractive index of transparent microstructures is big
In the refractive index of opaque layer, when the light that such reflecting layer reflects is mapped on hyaline layer, be conducive to further change light
Shooting angle.
Optionally, with reference to shown in figure 6 and Fig. 7, above-mentioned opaque pattern is grid line 17 and data line 18, transparent microstructures
10 is corresponding with grid line 17 and/or data line 18.
It should be noted that above-mentioned transparent microstructures are corresponding with grid line and/or data line refers to：Transparent microstructures can be only
It is corresponding with grid line, the boundary of the projection of the boundary of the projection of transparent microstructures on substrate without departing from grid line on substrate；Alternatively,
Transparent microstructures can also be only corresponding with data line, and the boundary of the projection of transparent microstructures on substrate is being served as a contrast without departing from data line
The boundary of projection on bottom；Alternatively, transparent microstructures can be corresponding with grid line and data line, transparent microstructures are on substrate
The boundary of projection of the boundary of projection without departing from grid line and data line on substrate.Here " correspondence " and above-mentioned transparent microstructures
Meaning corresponding with opaque pattern is identical, specifically repeats no more.Grid line and data line occupied area are larger, directive grid line sum number
It is more according to the light of line, transparent microstructures are corresponding with grid line and/or data line, the opaque pattern of more directives can be utilized
Light, further improve backlight utilization rate.
Optionally, the material in reflecting layer is metal, and exemplary, the material in reflecting layer can be the metals such as aluminium, copper, silver；For
The material of reduction manufacture difficulty, transparent microstructures and opaque layer is photoresist.
Embodiment two
An embodiment of the present invention provides a kind of display devices, refering to what is shown in Fig. 8, display device includes：Backlight 2 and display
Panel 3, backlight 2 include：Luminescence component 21 and reflector plate 22, wherein reflector plate 22 is located in luminescence component 21 far from display
The side of panel 3, display panel 3 include：The array substrate 1 for any one that embodiment one provides.
It should be noted that the embodiment of the present invention is only introduced and the relevant structure of inventive point, can be obtained according to the prior art
Know：It is shown refering to what is shown in Fig. 8, above-mentioned display panel 3 can also include color membrane substrates 4 if display device is liquid crystal display device
Show that panel 3 can also include the liquid crystal 5 etc. between array substrate 1 and color membrane substrates 4.Above-mentioned display device can be liquid crystal
Display device can also be other display devices, is not construed as limiting here certainly.It, can will be above-mentioned according to the position of luminescence component
It is divided into side entering type and straight-down negative in display device.If above-mentioned display device be straight-down negative, luminescence component may include light source and
Diffuser plate；If above-mentioned display device is side entering type, luminescence component may include light source and light guide plate.Luminescence component directive is impermeable
The light of bright pattern by transparent microstructures refraction directive reflecting layer, after reflected again through reflecting layer, be then passed through hyaline layer
Refraction after be mapped on reflector plate, eventually pass through reflector plate reflection directive may be implemented display region.The display device can
Using the light for the opaque pattern for being mapped to array substrate, to improve the utilization rate of backlight, and then to improve because of aperture opening ratio
The low problem for causing backlight source utilization rate low.
Embodiment three
An embodiment of the present invention provides a kind of forming method of array substrate, the structure of the array substrate can be such as Fig. 1 institutes
Show, this method includes：
S01, transparent microstructures 10, transparent microstructures 10 and the opaque pattern 100 on substrate 11 are formed on substrate 11
Corresponding and setting is used in 11 incident side of substrate, transparent microstructures 10 by reflecting the light for changing and impinging upon on its backlight side surface
The path of line.
The embodiment provides a kind of forming method of array substrate, the array substrate formed by this method is set
Transparent microstructures are equipped with, when which is applied to display device, the transparent microstructures of the array substrate can pass through refraction
Change the path for impinging upon light on its backlight side surface, then, which is mapped to the angle of opaque pattern also therewith
Change, and then after the reflection of opaque pattern, some light can be re-used so that some light is for showing
Show, to improve the utilization rate of backlight, and then improves the problem for causing backlight source utilization rate low because aperture opening ratio is low.
Optionally, S01, on substrate 11 formed transparent microstructures 10 specifically include：By a patterning processes in substrate
Upper formation transparent microstructures.An above-mentioned patterning processes include the techniques such as mask, exposure, development, etching and stripping.Transparent micro- knot
Structure may be used HTM (Half Tone Mask, intermediate tone mask), SSM (Single Slit Mask, single slit mask) or
GTM (Grey Tone Mask, gray tone mask) is formed by a patterning processes.The method is simple and easy to implement.
Optionally, it with reference to shown in figure 2b, S01, is formed before transparent microstructures 10 on substrate 11, refering to what is shown in Fig. 9, side
Method further includes：
S02, form reflecting layer 12 in the incident side of substrate 11, reflecting layer 12 be located at substrate 11 and transparent microstructures 10 it
Between.
Optionally, it with reference to shown in figure 4 and Fig. 5, S01, is formed after transparent microstructures 10 on substrate 11, with reference to 9 institute of figure
Show, method further includes：
S03, substrate 11 incident side formed covering transparent microstructures 10 hyaline layer 16, wherein the refraction of hyaline layer
Rate is different with the refractive index of transparent microstructures.Hyaline layer can play the role of protecting transparent microstructures and reflecting layer, while can
To play the role of planarization, in favor of subsequent technique.
More than, specific implementation mode only of the invention, but scope of protection of the present invention is not limited thereto, and it is any to be familiar with
Those skilled in the art in the technical scope disclosed by the present invention, can easily think of the change or the replacement, and should all cover
Within protection scope of the present invention.Therefore, protection scope of the present invention should be subject to the protection scope in claims.
Claims (9)
1. a kind of array substrate, including：Substrate and opaque pattern in the substrate light emission side is set, which is characterized in that
Further include：It is corresponding with the opaque pattern and transparent microstructures in the substrate incident side are set, the transparent microstructures
For changing the path for impinging upon the light on its backlight side surface by reflecting；
The array substrate further includes：The reflecting layer being arranged between the substrate and the transparent microstructures.
2. array substrate according to claim 1, which is characterized in that the transparent microstructures are microprism or lenticule.
3. array substrate according to claim 1, which is characterized in that the array substrate further includes：It is arranged in the lining
The incident side at bottom and the hyaline layer of the covering transparent microstructures, wherein the refractive index of the hyaline layer and transparent micro- knot
The refractive index of structure is different.
4. array substrate according to claim 3, which is characterized in that the case where the transparent microstructures are convex lens
Under, the refractive index of the transparent microstructures is less than the refractive index of the hyaline layer；In the feelings that the transparent microstructures are concavees lens
Under condition, the refractive index of the transparent microstructures is more than the refractive index of the hyaline layer.
5. array substrate according to claim 1, which is characterized in that the opaque pattern is grid line and data line, institute
It is corresponding with the grid line and/or the data line to state transparent microstructures.
6. array substrate according to claim 3, which is characterized in that the material in the reflecting layer is metal, described transparent
The material of micro-structure and the hyaline layer is photoresist.
7. a kind of display device, including：Backlight and display panel, the backlight include：Luminescence component and reflector plate,
In, the reflector plate is located at the side far from the display panel in the luminescence component, which is characterized in that the display panel
Including：Claim 1-6 any one of them array substrates.
8. a kind of forming method of array substrate, which is characterized in that the method includes：
Transparent microstructures are formed on substrate, and the transparent microstructures are corresponding with the opaque pattern on the substrate and are arranged
In the substrate incident side, the transparent microstructures are used to change the road for impinging upon the light on its backlight side surface by reflecting
Diameter；
Reflecting layer is formed between the substrate and the transparent microstructures.
9. according to the method described in claim 8, it is characterized in that, being formed after transparent microstructures on substrate, the method
Further include：
The hyaline layer for covering the transparent microstructures is formed in the incident side of the substrate, wherein the refractive index of the hyaline layer
It is different with the refractive index of the transparent microstructures.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610052350.1A CN105425471B (en) | 2016-01-26 | 2016-01-26 | A kind of array substrate and preparation method thereof, display device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610052350.1A CN105425471B (en) | 2016-01-26 | 2016-01-26 | A kind of array substrate and preparation method thereof, display device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN105425471A CN105425471A (en) | 2016-03-23 |
| CN105425471B true CN105425471B (en) | 2018-10-23 |
Family
ID=55503778
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201610052350.1A Active CN105425471B (en) | 2016-01-26 | 2016-01-26 | A kind of array substrate and preparation method thereof, display device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN105425471B (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106249463B (en) * | 2016-08-10 | 2020-01-31 | 京东方科技集团股份有限公司 | Display panel, manufacturing method thereof and display device |
| CN109212665B (en) * | 2017-07-07 | 2019-09-17 | 京东方科技集团股份有限公司 | Transparent display |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60165621A (en) * | 1984-02-08 | 1985-08-28 | Nec Corp | Transmission type display element |
| JP4096546B2 (en) * | 2001-10-31 | 2008-06-04 | セイコーエプソン株式会社 | ELECTRO-OPTICAL DEVICE, MANUFACTURING METHOD THEREOF, AND ELECTRONIC DEVICE |
| JP2005275142A (en) * | 2004-03-25 | 2005-10-06 | Sharp Corp | Display panel and its manufacturing method |
| US20080094716A1 (en) * | 2004-09-10 | 2008-04-24 | Toshihiko Ushiro | Transmission-Type Display Panel and Method of Manufacturing the Same |
| JP2009222797A (en) * | 2008-03-13 | 2009-10-01 | Sharp Corp | Liquid crystal display panel and liquid crystal display device |
| CN102621608A (en) * | 2012-03-30 | 2012-08-01 | 北京康得新复合材料股份有限公司 | Brightness enhancement film and manufacturing mold and manufacturing method thereof |
-
2016
- 2016-01-26 CN CN201610052350.1A patent/CN105425471B/en active Active
Also Published As
| Publication number | Publication date |
|---|---|
| CN105425471A (en) | 2016-03-23 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN107817629B (en) | Liquid crystal display device | |
| WO2018141154A1 (en) | Display panel, display device, and control method therefor | |
| KR100921483B1 (en) | Optical element, and illuminating optical device, display device and electronic device using the same | |
| CN108873350A (en) | A kind of waveguide display device | |
| US20140036529A1 (en) | Light source device, display unit, and electronic apparatus | |
| WO2020228395A1 (en) | Display device | |
| CN109920936A (en) | A kind of display panel, its production method and display device | |
| CN105929602B (en) | A kind of backlight module and preparation method thereof, display panel and display device | |
| CN102608768A (en) | LED-based two-sided-grating three-dimensional display device and manufacturing method thereof | |
| JP2007286089A (en) | Rear projection system and game machine | |
| US11508945B2 (en) | 3-D display panel including heat dissipation structure between light emitting units, and manufacturing method thereof | |
| WO2014166211A1 (en) | Light guide plate and manufacturing method therefor, and display device comprising same | |
| CN107003599A (en) | Rear projection screen with pinhole-like concentrator array | |
| JP2019530885A (en) | 3D display panel, 3D display device including the same, and manufacturing method thereof | |
| TW575785B (en) | Mask, substrate with light reflecting film, method for manufacturing light reflecting film, optical display device, and electronic apparatus | |
| CN105929591B (en) | Quantum dot display base plate and its manufacturing method and quantum dot display device | |
| CN105425471B (en) | A kind of array substrate and preparation method thereof, display device | |
| CN101561584A (en) | Backlight module and liquid crystal display device using same | |
| WO2018129918A1 (en) | Light guide plate, manufacturing method thereof, backlight source and display device | |
| USRE45229E1 (en) | Backlight for color liquid crystal display apparatus | |
| WO2023088274A1 (en) | Display grating, 3d display device, and 3d display method | |
| TW444135B (en) | Apparatus for displaying a real image in space | |
| KR20120083196A (en) | Optical film with partially coated structure array and manufacturing method thereof | |
| KR102580860B1 (en) | Display device and manufacturing method thereof | |
| CN110579900A (en) | Substrate, preparation method thereof, display panel and display device |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant |