CN105396476A - Ultrahigh-purity gas dilution system - Google Patents
Ultrahigh-purity gas dilution system Download PDFInfo
- Publication number
- CN105396476A CN105396476A CN201510695362.1A CN201510695362A CN105396476A CN 105396476 A CN105396476 A CN 105396476A CN 201510695362 A CN201510695362 A CN 201510695362A CN 105396476 A CN105396476 A CN 105396476A
- Authority
- CN
- China
- Prior art keywords
- diluent gas
- gas
- gas pipeline
- pipeline
- diluted
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F23/00—Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
- B01F23/10—Mixing gases with gases
- B01F23/19—Mixing systems, i.e. flow charts or diagrams; Arrangements, e.g. comprising controlling means
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F35/00—Accessories for mixers; Auxiliary operations or auxiliary devices; Parts or details of general application
- B01F35/80—Forming a predetermined ratio of the substances to be mixed
- B01F35/83—Forming a predetermined ratio of the substances to be mixed by controlling the ratio of two or more flows, e.g. using flow sensing or flow controlling devices
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Sampling And Sample Adjustment (AREA)
- Accessories For Mixers (AREA)
Abstract
The invention discloses an ultrahigh-purity gas dilution system. The ultrahigh-purity gas dilution system comprises a diluting gas source and a gas-to-be-diluted source, the diluting gas source is connected with a first diluting gas pipeline and a second diluting gas pipeline, the second diluting gas pipeline is connected with an outlet, the first diluting gas pipeline and the second diluting gas pipeline are respectively provided with a sonic nozzle, the gas-to-be-diluted source is connected with the first diluting gas pipeline through a gas-to-be-diluted pipeline, the gas-to-be-diluted pipeline is provided with a mass flow controller, and the first diluting gas pipeline is connected with at least one shunting dilution device connected with the second diluting gas pipeline. The mass flow controller, the sonic nozzles and the at least one diluting pipelines are arranged to continuously change the dilution concentration of a gas and improve the outlet pressure. Shunting and multi-time dilution are carried out through the at least one shunting dilution device, so the diluting proportion range is enlarged under a constant flow, the consumption of the diluting gas is saved, and large scale dilution is also reached.
Description
Technical field
The present invention relates to gas dilution correlative technology field, particularly relate to a kind of ultra-pure gases dilution system.
Background technology
In electron trades such as electronic semi-conductors, high to the quality requirements of the ultra-pure gases that it uses.Such as, require that its impurity content is 1 × 10 for the protection of the nitrogen of gas, argon gas and helium etc.
-9below mol/mol, therefore needs before use to be detected the impurity content of above-mentioned gas, meets the requirements to make it.Because the detectability of the gas analysis instrument of routine is generally 10 × 10
-9more than mol/mol, its impurity content that can not meet ultra-pure gases detects, therefore, detect the Atmospheric Pressure Ionization Mass Spectrometer instrument that ultra-pure gases impurity content need use sensitivity higher, but Atmospheric Pressure Ionization Mass Spectrometer instrument can only provide detection signal when detecting, as needed to carry out quantitatively, then needing corresponding gas standard to the impurity content in high-purity gas.The concentration of gas reference material prepared by conventional static method is generally 1 × 10
-6more than mol/mol, the gas reference material of lower concentration then needs, by dynamic method, dilution occurs and just can obtain.
Modal dynamic method air mix facilities is made up of two or more mass flow controller, because its principle is simply widely used.The advantage of above-mentioned air mix facilities is the gas that can recur dilution variable concentrations, and shortcoming is that its outlet pressure is low, is not suitable for the situation to import requirement elevated pressures.And Atmospheric Pressure Ionization Mass Spectrometer instrument, the pressure of general entrance is at (3-5) bar, so above-mentioned air mix facilities cannot meet its requirement.Another comparatively common air mix facilities is combined by one group of different bore sonic nozzle, reached the object of dilution by different flow mixing.Its advantage is that good stability, outlet pressure are higher, and shortcoming is the gas that can not produce variable concentrations continuously.
Summary of the invention
The object of the present invention is to provide a kind of ultra-pure gases dilution system, the problems referred to above of generation when carrying out gas dilution to solve by dynamic method.
For reaching this object, the present invention is by the following technical solutions: a kind of ultra-pure gases dilution system, comprise source of diluent gas and gas source to be diluted, described source of diluent gas is communicated with the first diluent gas pipeline and the second diluent gas pipeline, described second diluent gas pipeline is connected with outlet, first diluent gas pipeline and the second diluent gas pipeline are equipped with sonic nozzle, described gas source to be diluted is communicated in the first diluent gas pipeline by gas piping to be diluted, described gas piping to be diluted is provided with mass flow controller, described first diluent gas pipeline connection has the Partial flow dilution device of at least one and the second diluent gas pipeline connection, Partial flow dilution device is flowed into after gas and vapor permeation in gas in described gas piping to be diluted and the first diluent gas pipeline, and by the gas and vapor permeation in Partial flow dilution device and the second diluent gas pipeline.
As preferably, described Partial flow dilution device comprises the mass flow controller being communicated in the first diluent gas pipeline, and the triple valve be communicated with described mass flow controller, and an outlet of described triple valve is in the second diluent gas pipeline.
As preferably, described first diluent gas pipeline is provided with the first branch line, and the connectivity points of described gas piping to be diluted and the first diluent gas pipeline is between the first branch line and two connectivity points of the first diluent gas pipeline.
As preferably, described second diluent gas pipeline is provided with at least one second branch line, for by the gas distribution in the second diluent gas pipeline, and with the gas and vapor permeation in described Partial flow dilution device.
As preferably, the connectivity points of described Partial flow dilution device and the second diluent gas pipeline is between the second branch line and two connectivity points of the second diluent gas pipeline.
As preferably, the connectivity points of described gas piping to be diluted and the first diluent gas pipeline is positioned at the side of sonic nozzle injection direction.
As preferably, described source of diluent gas in the first diluent gas pipeline and the second diluent gas pipeline, described pipeline is disposed with two stage pressure reducing valves, purifier and particulate filter along gas flow by pipeline connection; Single-stage pressure reducing valve is provided with between described gas source to be diluted and mass flow controller.
As preferably, described first diluent gas pipeline and the second diluent gas pipeline are positioned at the contrary side of sonic nozzle injection direction and are provided with pressure maintaining valve and pressure sensor.
As preferably, between the connectivity points of described first branch line outlet and the first diluent gas pipeline and the connectivity points of described Partial flow dilution device and the first diluent gas pipeline, be provided with counterbalance valve.
As preferably, described source of diluent gas comprises the diluent gas air accumulator that at least one is equipped with diluent gas, and described diluent gas air accumulator is all communicated in pipeline; Described gas source to be diluted comprises the gas storage tank to be diluted that gas to be diluted is housed, and described gas storage tank to be diluted is communicated in gas piping to be diluted.
Beneficial effect of the present invention: by arranging mass flow controller and sonic nozzle, and multiple dilution pipeline is set, not only can continuously change the diluted concentration of gas but also can outlet pressure be improved.Being undertaken shunting and repeatedly diluting by being separated air mix facilities, reducing the risk that gas and vapor permeation is uneven, achieving under certain flow, expanding dilution ratio scope, both saved the consumption of diluent gas, the object of vast scale dilution can be reached again.Thinner ratio scope of the present invention is (50-10
5) doubly, output flow range (0.5-3.5) L/min.Utilize the present invention can be 10 × 10 by concentration
-6the gas standard of mol/mol, dilution is 0.1 × 10
-9the gas standard of mol/mol.
Accompanying drawing explanation
Fig. 1 is the structural representation of the embodiment of the present invention 1;
Fig. 2 is the structural representation of the embodiment of the present invention 2.
In figure:
1, source of diluent gas; 2, gas source to be diluted; 3, the first diluent gas pipeline; 4, the second diluent gas pipeline; 5, sonic nozzle; 6, gas piping to be diluted; 7, mass flow controller; 8, triple valve; 9, the first branch line; 10, the second branch line; 11, pipeline; 12, two stage pressure reducing valves; 13, purifier; 14, particulate filter; 15, single-stage pressure reducing valve; 16, pressure maintaining valve; 17, pressure sensor; 18, counterbalance valve; 19, diluent gas air accumulator; 20, gas storage tank to be diluted; 21, export.
Detailed description of the invention
Technical scheme of the present invention is further illustrated by detailed description of the invention below in conjunction with accompanying drawing.
Embodiment 1:
A kind of ultra-pure gases dilution system is provided in the present embodiment, for gas standard higher for existing concentration being diluted for the lower gas standard of concentration, as shown in Figure 1, it comprises source of diluent gas 1 and gas source to be diluted 2, wherein source of diluent gas 1 is built with diluent gas, and gas source 2 to be diluted is built with gas to be diluted.The present embodiment, by the repeatedly mixed diluting of above-mentioned two kinds of gases, finally obtains satisfactory gas standard.
Source of diluent gas 1 is communicated with the first diluent gas pipeline 3 and the second diluent gas pipeline 4, is divided into two-way to carry the diluent gas in source of diluent gas 1, for follow-up dilution; Particularly in source of diluent gas 1 and arrange pipeline 11 between the first diluent gas pipeline 3 and the second diluent gas pipeline 4, the diluent gas in source of diluent gas 1 is delivered in the first diluent gas pipeline 3 and the second diluent gas pipeline 4 respectively by pipeline 11.In the present embodiment, the second diluent gas pipeline 4 is connected with outlet 21, for discharging the gas reaching dilution and require.
First diluent gas pipeline 3 and the second diluent gas pipeline 4 are equipped with sonic nozzle 5, by this sonic nozzle 5, the gas in the first diluent gas pipeline 3 and the second diluent gas pipeline 4 can be made to have enough discharge pressures, and then make the pressure at outlet 21 place enough high, to meet the inlet pressure of other devices (such as Atmospheric Pressure Ionization Mass Spectrometer instrument etc.) suitable with outlet 21.The flow of sonic nozzle 5 can be set to identical, also can be different, and in the present embodiment, be preferably 1L/min by the flow set of the sonic nozzle 5 on the first diluent gas pipeline 3, the flow set of the sonic nozzle 5 on the second diluent gas pipeline 4 is 3L/min.
Gas source 2 to be diluted is communicated in the first diluent gas pipeline 3 by gas piping 6 to be diluted, namely the gas to be diluted in gas source 2 to be diluted flows into the first diluent gas pipeline 3 by gas piping 6 to be diluted, mix mutually with the diluent gas in the first diluent gas pipeline 3, and then gas to be diluted is diluted.
Gas piping 6 to be diluted is provided with mass flow controller 7, and the full scale of this mass flow controller 7 is 10ml/min.Controlled the flow of the gas to be diluted of inflow first diluent gas pipeline 3 by this mass flow controller 7, and then the mixed proportion of gas to be diluted and diluent gas can be regulated, to meet the adjustment of the gas of variable concentrations.
First diluent gas pipeline 3 is communicated with at least one Partial flow dilution device, this Partial flow dilution device is connected with the second diluent gas pipeline 4, when only arranging a Partial flow dilution device, first be the gas in gas piping 6 to be diluted and the mixed gases in the first diluent gas pipeline 3, form elementary mist, gas to be diluted is diluted, complete primary dilution process, this elementary mist flows into Partial flow dilution device through the first diluent gas pipeline 3 subsequently, gas and vapor permeation in this Partial flow dilution device and the second diluent gas pipeline 4, form second level mist, complete secondary dilution process, the satisfactory gas of final formation, flow out from outlet 21.When Partial flow dilution device is set to multiple, first gas in second diluent gas pipeline 4 be mixed to form second level mist mutually with the elementary mist in first Partial flow dilution device, complete secondary dilution process, second level mist mixes mutually with the elementary mist in second Partial flow dilution device subsequently, form third level mist, complete three dilution, by that analogy, be provided with how many Partial flow dilution devices, then carry out the secondary dilution process of how many times, the satisfactory gas of final formation, flows out from outlet 21.In the present embodiment, preferably Partial flow dilution device is set to two.
With reference to Fig. 1, Partial flow dilution device comprises the mass flow controller 7 being communicated in the first diluent gas pipeline 3, and the triple valve 8 to be communicated with this mass flow controller 7, an outlet of above-mentioned triple valve 8 is in the second diluent gas pipeline 4, and another outlet is in emptying state (namely this outlet is blocked closedown by spool).Namely when the elementary mist in the first diluent gas pipeline 3 enters Partial flow dilution device, first mass flow controller 7 is entered, by the flow-control of its control realization to elementary mist, enter the second diluent gas pipeline 4 by triple valve 8 subsequently, mix mutually with the diluent gas in it.In the present embodiment, control elementary mist by triple valve 8 and whether enter the second diluent gas pipeline 4, namely the elementary mist formed when the mixed gases in the gas in gas piping 6 to be diluted and the first diluent gas pipeline 3 satisfied the demand gas concentration time, by the port closing that triple valve 8 is communicated with the second diluent gas pipeline 4, directly flow out from the another one outlet of triple valve 8.
When the present embodiment Partial flow dilution device is set to multiple, also can selects between the triple valve 8 of each Partial flow dilution device and the second diluent gas pipeline 4 whether conducting as required, specifically need to select according to the concentration of final diluent gas.
In the present embodiment, when Partial flow dilution device is set to multiple, its mass flow controller 7 can select different full scales, to realize regulating the dilution of the gas of variable concentrations requirement.Such as, in the present embodiment, Partial flow dilution device is set to two, the full scale of the mass flow controller 7 of one of them is 50ml/min, and the full scale of the mass flow controller 7 of another one is 500ml/min.
As a preferred technical scheme, the connectivity points a of gas piping 6 to be diluted and the first diluent gas pipeline 3 is positioned at the side of sonic nozzle 5 injection direction, namely after source of diluent gas 1 diluent gas entered in the first diluent gas pipeline 3 is sprayed by sonic nozzle 5, just mix with the band diluent gas in gas piping 6 to be diluted, be conducive to the more abundant of two kinds of gas and vapor permeation like this.
Pipeline 11 is disposed with two stage pressure reducing valves 12, purifier 13 and particulate filter 14 along gas flow, wherein two stage pressure reducing valves 12 is for the diluent gas decompression to conveying in source of diluent gas 1, purifier 13 is for the removal to the impurity in diluent gas, particulate filter 14 for removing the particulate matter in diluent gas, to reduce the concentration of impurity in diluent gas.
Be provided with single-stage pressure reducing valve 15 between mass flow controller 7 in gas source 2 to be diluted and gas piping to be diluted 6, it is for treating the gas decompression to be diluted of conveying in source of diluent gas 2.
First diluent gas pipeline 3 and the second diluent gas pipeline 4 are positioned at the contrary side of sonic nozzle 5 injection direction and are provided with pressure maintaining valve 16 and pressure sensor 17.Make diluent gas in the first diluent gas pipeline 3 and the second diluent gas pipeline 4 after pressure maintaining valve 16 by pressure maintaining valve 16, pressure keeps within the specific limits; Pressure sensor 17 is for detecting the pressure of the diluent gas in the first diluent gas pipeline 3 and the second diluent gas pipeline 4.
Preferably, gas piping 6 to be diluted and the first diluent gas pipeline 3 connectivity points a and be also provided with counterbalance valve 18 between Partial flow dilution device and the first diluent gas pipeline 3, for controlling the flow of the mist entering Partial flow dilution device.
Above-mentioned sonic nozzle 5, mass flow controller 7, two stage pressure reducing valves 12, purifier 13, particulate filter 14, single-stage pressure reducing valve 15, pressure maintaining valve 16, pressure sensor 17 and counterbalance valve 18 are all connected to control system, are controlled to open and close by control system.
In the present embodiment, source of diluent gas 1 comprises at least one diluent gas air accumulator 19, and this diluent gas air accumulator 19 is all communicated in pipeline 11, in pipeline 11, carry diluent gas; Same, gas source 2 to be diluted comprises the gas storage tank to be diluted 20 that gas to be diluted is housed, and this gas storage tank 20 to be diluted is communicated in gas piping 6 to be diluted, in gas piping 6 to be diluted, carry gas to be diluted.
In the present embodiment, by said structure, not only can continuously change the diluted concentration of gas but also can outlet pressure be improved.Concrete, thinner ratio scope of the present invention is (50-10
5) doubly, output flow range (0.5-3.5) L/min.
Be illustrated below by the calculating of concrete example to the dilution ratio of said structure of the present invention (to be set with premised on two Partial flow dilution devices):
The calculating of dilution ratio of the present invention is by following formulae discovery:
in formula:
N-by the extension rate of diluent gas;
C
0-diluted by diluent gas before concentration, unit is mol/mol;
C
1-diluted by diluent gas after concentration, unit is mol/mol;
F
1-being positioned at the flow of the mass flow controller 7 on gas piping 6 to be diluted, unit is mL/min;
F
2the flow of the mass flow controller 7 of-one of them Partial flow dilution device, unit is mL/min;
F
3the flow of the mass flow controller 7 of-another one Partial flow dilution device, unit is mL/min;
F
1the flow of the sonic nozzle 5 on the-the first diluent gas pipeline 3, unit is L/min;
F
2the flux unit of the sonic nozzle 5 on the-the second diluent gas pipeline 4 is L/min;
Optimum configurations is as follows:
Citing 1:f
1=5mL/min, f
2=5mL/min, f
3=0mL/min (namely Partial flow dilution device is not led with the second diluent gas pipeline 4 and is communicated with, and the flow of mass flow controller 7 is 0), F
1=1L/min, F
2=3L/min, C
0=10 × 10
-6mol/mol, as calculated:
Citing 2:f
1=10mL/min, f
2=50mL/min, f
3=500mL/min, F
1=1L/min, F
2=3L/min, C
0=10 × 10
-6mol/mol, as calculated:
Citing 3:f
1=10mL/min, f
2=50mL/min, f
3=500mL/min, F
1=0.5L/min, F
2=0L/min, C
0=10 × 10
-6mol/mol, as calculated:
Can be drawn by above-mentioned citing, by high-purity gas dilution system of the present invention, can be 10 by concentration
-6the gas dilution to be diluted of magnitude is concentration is 10
-9-10
-11the gas of magnitude, and then achieve and not only can continuously change the diluted concentration of gas but also the object of outlet pressure can be improved.
Embodiment 2:
The present embodiment is improved on the basis of embodiment 1, concrete:
As shown in Figure 2, the present embodiment is provided with at least one first branch line 9 on the first diluent gas pipeline 3, the connectivity points a of gas piping 6 to be diluted and the first diluent gas pipeline 3 is at the first branch line 9 and between two connectivity points b, c of the first diluent gas pipeline 3, in the present embodiment, the connectivity points of the entrance of the first branch line 9 and the first diluent gas pipeline 3 is set to connectivity points b, the connectivity points of the outlet of the first branch line 9 and the first diluent gas pipeline 3 is set to connectivity points c, and connectivity points a is between connectivity points b and connectivity points c.When being set to multiple first branch line 9, first branch line 9 in outside wraps up the first branch line 9 of inner side, and connectivity points a is specifically arranged on and is positioned at the first branch line 9 of inner side and two connectivity points b of the first diluent gas pipeline 3, between c, when carrying out gas dilution, first the gas to be diluted in pipeline 6 to be diluted mixes mutually with the diluent gas in the first branch line 9 of inner side, the gas mixed subsequently mixes again with the diluent gas in the first branch line 9 outside the first branch line 9 of inner side, by that analogy, until after mixing with the diluent gas in outermost first branch line 9, flow to Partial flow dilution device.In the present embodiment, the first branch line 9 is set to one.
Second diluent gas pipeline 4 is provided with at least one second branch line 10, for by the gas distribution in the second diluent gas pipeline 4, and with the gas and vapor permeation in Partial flow dilution device.Concrete, the connectivity points e of Partial flow dilution device and the second diluent gas pipeline 4 is at the second branch line 10 and between two connectivity points f, g of the second diluent gas pipeline 4.In the present embodiment, the connectivity points of the entrance of the second branch line 10 and the second diluent gas pipeline 4 is set to connectivity points f, the connectivity points of the outlet of the second branch line 10 and the second diluent gas pipeline 4 is set to connectivity points g.When arranging multiple second branch line 10, first branch line 9 in outside wraps up the first branch line 9 of inner side, and the connectivity points e of all Partial flow dilution devices and the second diluent gas pipeline 4 is all at the second branch line 10 and between two connectivity points f, the g of the second diluent gas pipeline 4 of inner side, to form the repeatedly dilution to the mist entering Partial flow dilution device, similar when concrete principle and above-mentioned first branch line 9 dilute, repeat no more.
In the present embodiment, counterbalance valve 18 is preferably between the connectivity points c and the connectivity points d of Partial flow dilution device and the first diluent gas pipeline 3 of outermost first branch line 9 and the first diluent gas pipeline 3.
All the other structures of the present embodiment are all identical with embodiment 1, again repeat no more.
The present embodiment, by arranging the first branch line 9 and the second branch line 10, can be treated diluent gas further and repeatedly dilute, and then under the prerequisite keeping certain flow, can improve dilution ratio to a great extent.
Obviously, the above embodiment of the present invention is only used to clearly demonstrate example of the present invention, and is not the restriction to embodiments of the present invention.For those of ordinary skill in the field, can also make other changes in different forms on the basis of the above description.Here exhaustive without the need to also giving all embodiments.All any amendments done within the spirit and principles in the present invention, equivalent to replace and improvement etc., within the protection domain that all should be included in the claims in the present invention.
Claims (10)
1. a ultra-pure gases dilution system, it is characterized in that, comprise source of diluent gas (1) and gas source to be diluted (2), described source of diluent gas (1) is communicated with the first diluent gas pipeline (3) and the second diluent gas pipeline (4), described second diluent gas pipeline (4) is connected with outlet (21), first diluent gas pipeline (3) and the second diluent gas pipeline (4) are equipped with sonic nozzle (5), described gas source to be diluted (2) is communicated in the first diluent gas pipeline (3) by gas piping to be diluted (6), described gas piping to be diluted (6) is provided with mass flow controller (7), described first diluent gas pipeline (3) is communicated with at least one Partial flow dilution device be communicated with the second diluent gas pipeline (4), Partial flow dilution device is flowed into after gas and vapor permeation in gas in described gas piping to be diluted (6) and the first diluent gas pipeline (3), and by the gas and vapor permeation in Partial flow dilution device and the second diluent gas pipeline (4).
2. ultra-pure gases dilution system according to claim 1, it is characterized in that, described Partial flow dilution device comprises the mass flow controller (7) being communicated in the first diluent gas pipeline (3), and the triple valve (8) to be communicated with described mass flow controller (7), an outlet of described triple valve (8) is in the second diluent gas pipeline (4).
3. ultra-pure gases dilution system according to claim 2, it is characterized in that, described first diluent gas pipeline (3) is provided with at least one first branch line (9), and the connectivity points of described gas piping to be diluted (6) and the first diluent gas pipeline (3) is positioned between two connectivity points of the first branch line (9) and the first diluent gas pipeline (3).
4. ultra-pure gases dilution system according to claim 3, it is characterized in that, described second diluent gas pipeline (4) is provided with at least one second branch line (10), for by the gas distribution in the second diluent gas pipeline (4), and with the gas and vapor permeation in described Partial flow dilution device.
5. ultra-pure gases dilution system according to claim 4, it is characterized in that, the connectivity points of described Partial flow dilution device and the second diluent gas pipeline (4) is positioned between two connectivity points of the second branch line (10) and the second diluent gas pipeline (4).
6. ultra-pure gases dilution system according to claim 1, is characterized in that, described gas piping to be diluted (6) is positioned at the side of sonic nozzle (5) injection direction with the connectivity points of the first diluent gas pipeline (3).
7. ultra-pure gases dilution system according to claim 1, it is characterized in that, described source of diluent gas (1) is communicated in the first diluent gas pipeline (3) and the second diluent gas pipeline (4) by pipeline (11), and described pipeline (11) is disposed with two stage pressure reducing valves (12), purifier (13) and particulate filter (14) along gas flow; Single-stage pressure reducing valve (15) is provided with between described gas source to be diluted (2) and mass flow controller (7).
8. ultra-pure gases dilution system according to claim 7, it is characterized in that, described first diluent gas pipeline (3) and the second diluent gas pipeline (4) are positioned at the contrary side of sonic nozzle (5) injection direction and are provided with pressure maintaining valve (16) and pressure sensor (17).
9. ultra-pure gases dilution system according to claim 5, it is characterized in that, between the connectivity points of described first branch line (9) outlet and the first diluent gas pipeline (3) and the connectivity points of described Partial flow dilution device and the first diluent gas pipeline (3), be provided with counterbalance valve (18).
10. according to the arbitrary described ultra-pure gases dilution system of claim 1-9, it is characterized in that, described source of diluent gas (1) comprises the diluent gas air accumulator (19) that at least one is equipped with diluent gas, and described diluent gas air accumulator (19) is all communicated in pipeline (11); Described gas source to be diluted (2) comprises the gas storage tank to be diluted (20) that gas to be diluted is housed, and described gas storage tank to be diluted (20) is communicated in gas piping to be diluted (6).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510695362.1A CN105396476B (en) | 2015-10-22 | 2015-10-22 | A kind of ultra-pure gases dilution system |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510695362.1A CN105396476B (en) | 2015-10-22 | 2015-10-22 | A kind of ultra-pure gases dilution system |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN105396476A true CN105396476A (en) | 2016-03-16 |
| CN105396476B CN105396476B (en) | 2018-01-05 |
Family
ID=55462429
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201510695362.1A Expired - Fee Related CN105396476B (en) | 2015-10-22 | 2015-10-22 | A kind of ultra-pure gases dilution system |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN105396476B (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106908306A (en) * | 2017-01-19 | 2017-06-30 | 常州磐诺仪器有限公司 | A kind of intelligent on-line dilution prover |
| CN107607676A (en) * | 2017-09-07 | 2018-01-19 | 中国计量科学研究院 | System occurs for traces of moisture standard in gas |
| CN109925900A (en) * | 2016-10-17 | 2019-06-25 | 平高集团有限公司 | A kind of gas mixer |
| CN114326841A (en) * | 2021-12-20 | 2022-04-12 | 杭州谱育科技发展有限公司 | Device and method for controlling water vapor concentration |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2011011154A (en) * | 2009-07-02 | 2011-01-20 | Gijutsu Kaihatsu Sogo Kenkyusho:Kk | Gas-liquid mixture force-feed system |
| CN102240519A (en) * | 2011-05-27 | 2011-11-16 | 中国计量科学研究院 | Dynamic gas distribution system for standard gas |
| CN202478880U (en) * | 2012-03-09 | 2012-10-10 | 江苏海立普电力科技有限公司 | Dynamic gas distribution instrument |
| CN202649015U (en) * | 2012-06-11 | 2013-01-02 | 重庆瑞信气体有限公司 | Dynamic standard gas generator |
-
2015
- 2015-10-22 CN CN201510695362.1A patent/CN105396476B/en not_active Expired - Fee Related
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2011011154A (en) * | 2009-07-02 | 2011-01-20 | Gijutsu Kaihatsu Sogo Kenkyusho:Kk | Gas-liquid mixture force-feed system |
| CN102240519A (en) * | 2011-05-27 | 2011-11-16 | 中国计量科学研究院 | Dynamic gas distribution system for standard gas |
| CN202478880U (en) * | 2012-03-09 | 2012-10-10 | 江苏海立普电力科技有限公司 | Dynamic gas distribution instrument |
| CN202649015U (en) * | 2012-06-11 | 2013-01-02 | 重庆瑞信气体有限公司 | Dynamic standard gas generator |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109925900A (en) * | 2016-10-17 | 2019-06-25 | 平高集团有限公司 | A kind of gas mixer |
| CN109925900B (en) * | 2016-10-17 | 2021-10-08 | 平高集团有限公司 | Gas mixing device |
| CN106908306A (en) * | 2017-01-19 | 2017-06-30 | 常州磐诺仪器有限公司 | A kind of intelligent on-line dilution prover |
| CN107607676A (en) * | 2017-09-07 | 2018-01-19 | 中国计量科学研究院 | System occurs for traces of moisture standard in gas |
| CN114326841A (en) * | 2021-12-20 | 2022-04-12 | 杭州谱育科技发展有限公司 | Device and method for controlling water vapor concentration |
Also Published As
| Publication number | Publication date |
|---|---|
| CN105396476B (en) | 2018-01-05 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN105396476A (en) | Ultrahigh-purity gas dilution system | |
| US5470390A (en) | Mixed gas supply system with a backup supply system | |
| US20130025718A1 (en) | Mixed gas supply apparatus | |
| CN103674510B (en) | Ultrahigh pressure relief valve property test platform | |
| CN103063259B (en) | Pipeline pressure inspection and control system | |
| CN204346803U (en) | For the controllable pressure of gaseous sample and the dynamic dilution device of humidity | |
| KR102446032B1 (en) | Purification method and purification system for helium gas | |
| WO2017056135A1 (en) | Nonhydrocarbon gas separation device and nonhydrocarbon gas separation method | |
| CN204346804U (en) | For the dynamic dilution device of the controllable pressure of gaseous sample | |
| CN104465297A (en) | Gas control method of parallel double-ion migration tube | |
| CN107607676B (en) | Standard generation system for trace moisture in gas | |
| CN212236773U (en) | Gas proportion distribution device based on multistage dilution | |
| CN206723000U (en) | Vacuum Pumps Station | |
| CN210625939U (en) | Calibration device of barometer | |
| CN207336479U (en) | Mobile gas tester calibrating apparatus | |
| CN218917383U (en) | Chromatographic pretreatment gas circuit | |
| CN207958410U (en) | A kind of continous way film device for xylose concentration | |
| CN208860744U (en) | One kind being used for ICP emission spectrometer gas control equipment | |
| CN203209173U (en) | Magnetic filter for liquid ammonia | |
| CN114191982A (en) | Intelligent ammonia spraying system for dispersing ammonia-air mixer and ammonia-nitrogen integrated zoning alternate measurement | |
| CN103757610B (en) | A kind of process environments pressure dispatching method based on material suppling system model | |
| CN202854018U (en) | Device for testing gas separating performance of membrane | |
| CN202358933U (en) | Apparatus for removing hydrogen-containing impurities contained in germanium tetrachloride | |
| CN213834566U (en) | Novel ammonia purification device | |
| CN206351006U (en) | A kind of portable multicomponent gas dilution device |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20180105 Termination date: 20181022 |