CN105319738B - Polarized imaging system and the method using polarized imaging system imaging - Google Patents
Polarized imaging system and the method using polarized imaging system imaging Download PDFInfo
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- CN105319738B CN105319738B CN201510801683.5A CN201510801683A CN105319738B CN 105319738 B CN105319738 B CN 105319738B CN 201510801683 A CN201510801683 A CN 201510801683A CN 105319738 B CN105319738 B CN 105319738B
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- 238000003384 imaging method Methods 0.000 title claims abstract description 99
- 238000000034 method Methods 0.000 title claims abstract description 24
- 230000010287 polarization Effects 0.000 claims abstract description 122
- 230000033228 biological regulation Effects 0.000 claims abstract description 77
- 230000003287 optical effect Effects 0.000 claims abstract description 67
- 239000000758 substrate Substances 0.000 claims abstract description 50
- 238000009413 insulation Methods 0.000 claims abstract description 47
- 239000000463 material Substances 0.000 claims abstract description 35
- 229910052751 metal Inorganic materials 0.000 claims abstract description 12
- 239000002184 metal Substances 0.000 claims abstract description 12
- 238000005286 illumination Methods 0.000 claims abstract description 6
- 230000001276 controlling effect Effects 0.000 claims description 64
- 230000001105 regulatory effect Effects 0.000 claims description 16
- HBRCDTRQDHMTDA-UHFFFAOYSA-N 2-[[4-(diethylamino)phenyl]diazenyl]benzoic acid Chemical compound C1=CC(N(CC)CC)=CC=C1N=NC1=CC=CC=C1C(O)=O HBRCDTRQDHMTDA-UHFFFAOYSA-N 0.000 claims description 12
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical group O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 9
- 229920003229 poly(methyl methacrylate) Polymers 0.000 claims description 8
- 229920000642 polymer Polymers 0.000 claims description 8
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 6
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 6
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 5
- 229910052737 gold Inorganic materials 0.000 claims description 5
- 239000010931 gold Substances 0.000 claims description 5
- 239000000377 silicon dioxide Substances 0.000 claims description 4
- 235000012239 silicon dioxide Nutrition 0.000 claims description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 3
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims description 3
- 239000000956 alloy Substances 0.000 claims description 3
- 229910045601 alloy Inorganic materials 0.000 claims description 3
- 239000004411 aluminium Substances 0.000 claims description 3
- 229910052782 aluminium Inorganic materials 0.000 claims description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 3
- 229910052802 copper Inorganic materials 0.000 claims description 3
- 239000010949 copper Substances 0.000 claims description 3
- 229910052742 iron Inorganic materials 0.000 claims description 3
- 229910052759 nickel Inorganic materials 0.000 claims description 3
- 229910052709 silver Inorganic materials 0.000 claims description 3
- 239000004332 silver Substances 0.000 claims description 3
- 239000002178 crystalline material Substances 0.000 claims description 2
- 239000004065 semiconductor Substances 0.000 claims description 2
- BAPJBEWLBFYGME-UHFFFAOYSA-N Methyl acrylate Chemical compound COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 claims 2
- 230000003760 hair shine Effects 0.000 claims 1
- 229920000058 polyacrylate Polymers 0.000 claims 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 5
- 239000013078 crystal Substances 0.000 description 3
- 230000009021 linear effect Effects 0.000 description 3
- 230000003595 spectral effect Effects 0.000 description 3
- 239000004698 Polyethylene Substances 0.000 description 2
- KKEYFWRCBNTPAC-UHFFFAOYSA-N Terephthalic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-N 0.000 description 2
- UMIVXZPTRXBADB-UHFFFAOYSA-N benzocyclobutene Chemical compound C1=CC=C2CCC2=C1 UMIVXZPTRXBADB-UHFFFAOYSA-N 0.000 description 2
- 238000004891 communication Methods 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000005684 electric field Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000001914 filtration Methods 0.000 description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 238000007639 printing Methods 0.000 description 2
- 230000005855 radiation Effects 0.000 description 2
- 238000009738 saturating Methods 0.000 description 2
- 238000001228 spectrum Methods 0.000 description 2
- 238000004528 spin coating Methods 0.000 description 2
- 241000790917 Dioxys <bee> Species 0.000 description 1
- 101100117236 Drosophila melanogaster speck gene Proteins 0.000 description 1
- 239000004425 Makrolon Substances 0.000 description 1
- 229920012266 Poly(ether sulfone) PES Polymers 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- 229910003978 SiClx Inorganic materials 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- -1 alcohol ester Chemical class 0.000 description 1
- 150000001336 alkenes Chemical class 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 229920002678 cellulose Polymers 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000000084 colloidal system Substances 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 235000013399 edible fruits Nutrition 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000002164 ion-beam lithography Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 230000009022 nonlinear effect Effects 0.000 description 1
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 229910052594 sapphire Inorganic materials 0.000 description 1
- 239000010980 sapphire Substances 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 239000012780 transparent material Substances 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/0126—Opto-optical modulation, i.e. control of one light beam by another light beam, not otherwise provided for in this subclass
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- Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Optical Modulation, Optical Deflection, Nonlinear Optics, Optical Demodulation, Optical Logic Elements (AREA)
Abstract
The present invention relates to a kind of polarized imaging system, and it includes:One polarized light source, a regulation and control light source, a delustring filter, an imaging device and optical nonlinearity polarization controlling element;Optical nonlinearity polarization controlling element includes:One insulation transparent substrate;One is arranged at the metal plasma excimer layer on a surface of the insulation transparent substrate, and the plasmon layer includes the micro-structural with chirality set in multiple cycles;And one be arranged at the surface of the metal plasma excimer layer away from the insulation transparent substrate and by the metal plasma excimer layer cover the controllable film of refractive index;The controllable film of refractive index includes refractive index regulatable material under light illumination.The invention further relates to a kind of method being imaged using the polarized imaging system.Polarized imaging system provided by the invention can be realized regulates and controls imaging to the full light formula of polarised light.The imaging method, there is the advantages of method is simple, fast response time.
Description
Technical field
The present invention relates to polarization optics field, more particularly to a kind of optical nonlinearity polarization controlling element, regulate and control incident light
The method of wave polarization and its application.
Background technology
Polarised light is widely used by people, and current people have possessed a variety of method and apparatus and light wave is polarized with realizing
The regulation and control of state, for example with electrooptic modulator, liquid crystal modulator, magneto-optic modulator etc..Their principle is to utilize electric field or magnetic
Field makes electro-optic crystal, liquid crystal molecule, the birefringent characteristic of magneto-optical crystal or optically-active characteristic change, and then causes transmitted light
Polarization state changes.
But the regulation and control electric field or magnetic field signal loaded in above method all relies on electronic circuit generation, its switching speed
It is limited to the response speed of circuit.In addition, if similar element is used in modern optical information communication system, in message code
Generation and regulation and control stage along with the conversion between electric signal-optical signal, cause the time to waste, limit information in communication system
Transmission rate and bandwidth.And faster response speed can be realized using optics control measures.
The content of the invention
In view of this, it is necessory to provide a kind of full light formula the polarization controlling element using optical non-linear effect it is inclined
Imaging system of shaking and the method using polarized imaging system imaging.
A kind of polarized imaging system, it is characterised in that it includes:One optical nonlinearity polarizes controlling element, and the optics is non-
Linear polarization controlling element includes:One insulation transparent substrate;One be arranged at metal on a surface of the insulation transparent substrate etc. from
Sub- excimer layer, the plasmon layer include the micro-structural with chirality set in multiple cycles;And one be arranged at the gold
The refractive index for belonging to surface of the plasmon layer away from the insulation transparent substrate and covering the metal plasma excimer layer is adjustable
Control film;The controllable film of refractive index includes refractive index regulatable material under light illumination;One polarized light source, the polarization
Light source is used to launch polarized incident light, makes the refractive index of the polarized incident light from optical nonlinearity polarization controlling element adjustable
It is incident to control film side, and is emitted to form the first Polarization Modulation emergent light from insulation transparent substrate side;One regulation and control light source, it is described
Regulate and control light source to be used to launch regulation and control light, and make the refractive index of the regulation and control light from optical nonlinearity polarization controlling element controllable
Film side is incident, so as to change the refractive index of the controllable film of the refractive index, makes from the outgoing of insulation transparent substrate side
First Polarization Modulation emergent light changes into the second Polarization Modulation emergent light;One delustring filter, the delustring filter are used
In the regulation and control light being emitted to the progress delustring of above-mentioned first Polarization Modulation emergent light and filtering from insulation transparent substrate side;And
One imaging device, the imaging device are used to be imaged the light received.
Such as above-mentioned polarized imaging system, it is preferable that the controllable film portion of refractive index extends to the plasma and swashed
Contacted in the opening of first layer and with the surface of the insulation transparent substrate;Regulatable material is half to the refractive index under light illumination
Conductor material, nonlinear crystalline material, photorefractive material, photochromic material and one kind or several in photo-isomerisable material
Kind.
Such as above-mentioned polarized imaging system, it is preferable that the controllable film of refractive index includes a polymethyl methacrylate
Polymer and multiple ethyl red photo-isomerisable materials being scattered in the polymer;The metal be gold, silver, copper, iron, aluminium,
Nickel etc. or its alloy;The thickness of the micro-structural is 30 nanometers ~ 100 nanometers, and the cycle is 300 nanometers ~ 1000 nanometers, and size is
100 nanometers ~ 500 nanometers.
Such as above-mentioned polarized imaging system, it is preferable that the multiple micro-structural is arranged at intervals to form an array;The micro-structural
It is raised including a rectangular body and a rectangle tip to be extended out by the rectangular body;The rectangular body and the rectangle
Sophisticated projection is integral structure;The rectangle tip is raised to be set at one jiao, and the length that rectangle tip is raised
Side is concordant with one side of the rectangular body.
Such as above-mentioned polarized imaging system, it is preferable that further comprise dichroscope;The polarized light source, optical nonlinearity
Polarization controlling element, delustring filter and imaging device are arranged at intervals point-blank successively;The dichroscope is set
It is placed between the polarized light source and optical nonlinearity polarization controlling element, so that the polarization of polarized light source transmitting
Incident light arrives after can polarizing controlling element and the delustring filter by the dichroscope, the optical nonlinearity
Up to the imaging device;The regulation and control light source is arranged at the dichroscope side, and the regulation and control light of its transmitting can be through described
Overlapped after dichroscope reflection with the polarized incident light.
Such as above-mentioned polarized imaging system, it is preferable that the angle of the dichroscope is 45 degree, so that it is guaranteed that the regulation and control light
Light spot shape when being radiated at after dichroscope reflection on optical nonlinearity polarization controlling element with described two to
It is consistent before Look mirror reflection.
Such as above-mentioned polarized imaging system, it is preferable that further comprise that one is arranged at the polarized light source and the dichroic
The first light path regulating device and one between mirror are arranged at the second light path between the regulation and control light source and the dichroscope
Adjusting means;First light path regulating device includes being set in turn in one first convex lens of the polarized light source light-emitting area side
Mirror, one first pin hole, one second convex lens and one the 3rd convex lens;Second light path regulating device is set gradually including one
In regulation and control the 4th convex lens of light source luminescent face side, one second pin hole, one the 5th convex lens, an imaging masks and the
Six convex lens.
Such as above-mentioned polarized imaging system, it is preferable that further comprise that one is arranged at the dichroscope and the optics is non-
First microcobjective between linear polarization controlling element;One is arranged at the delustring filter and optical nonlinearity polarization
The second microcobjective between controlling element;And one the imaging being arranged between the delustring filter and imaging device it is saturating
Mirror.
A kind of method being imaged using above-mentioned polarized imaging system, it includes:Opening the polarized light source makes its transmitting inclined
Shake incident light, enters the controllable film side of refractive index of the polarized incident light from optical nonlinearity polarization controlling element
Penetrate, and be emitted to form the first Polarization Modulation emergent light from insulation transparent substrate side, and the first Polarization Modulation emergent light is shone
Penetrate on the imaging device;The delustring filter is adjusted, makes the first Polarization Modulation emergent light delustring, the imaging
Device can not receive signal;And the regulation and control light source transmitting regulation and control light is opened, and make the regulation and control light non-thread from the optics
Property polarization controlling element the controllable film side of refractive index it is incident, so as to change the refraction of the controllable film of the refractive index
Rate, the first Polarization Modulation emergent light from the outgoing of insulation transparent substrate side is set to change into the second Polarization Modulation emergent light, and institute
State the second Polarization Modulation emergent light and be radiated on the imaging device and be imaged.
The method being imaged as described above, it is preferable that the insulation transparent substrate is silicon dioxide layer, the plasmon layer
For golden micro structure array, the controllable film of refractive index includes poly methyl methacrylate polymer and multiple is scattered in this
Ethyl red photo-isomerisable material in polymer;The polarized incident light is x-polarisation feux rouges, the first Polarization Modulation emergent light
It is elliptically polarized light with the second Polarization Modulation emergent light, the regulation and control light is polarized green light;The second Polarization Modulation emergent light
Ellipse drift angle χ and major axes orientation rotationangleφ revolved relative to the ellipse drift angle χ of the first Polarization Modulation emergent light with major axes orientation
Wavelength movement occurs for corner φ;The pattern that the second Polarization Modulation emergent light is imaged on the imaging device and the imaging
The pattern of mask is identical.
Compared with prior art, polarized imaging system provided by the invention can realize the full light formula regulation and control to polarised light
Imaging.The imaging method, there is the advantages of method is simple, and corresponding speed is fast.
Brief description of the drawings
Fig. 1 is the structural representation that optical nonlinearity provided in an embodiment of the present invention polarizes controlling element.
Fig. 2 is the micro-structural for the plasmon layer that optical nonlinearity provided in an embodiment of the present invention polarizes controlling element
Structural representation.
Fig. 3 is the micro-structural battle array for the plasmon layer that optical nonlinearity provided in an embodiment of the present invention polarizes controlling element
The stereoscan photograph of row.
Fig. 4 is provided in an embodiment of the present invention inclined using the optical nonlinearity polarization controlling element regulation and control incident light of the present invention
The method flow diagram to shake.
Fig. 5 is in the embodiment of the present invention, and before regulation and control light irradiation, different wave length x-polarisation light is through optics of the invention
Ellipse the drift angle χ and pole axis of oval thickness are converted into after nonlinear polarization controlling element(Plane of polarization)Rotationangleφ.
Fig. 6 is the ellipse drift angle χ of transmitted light of optical nonlinearity of the invention polarization controlling element and pole in the embodiment of the present invention
Contrast of the axle rotationangleφ before using regulation and control light irradiation and after irradiation.
Fig. 7 is in the embodiment of the present invention, and using before regulation and control light irradiation and after irradiation, optical nonlinearity of the invention polarization is adjusted
Control the ellipse drift angle χ of the transmitted light of element and poor the Δ χ and Δ φ of pole axis rotationangleφ.
Fig. 8 is in the embodiment of the present invention, and using before green glow regulation and control light irradiation and after irradiation, optical nonlinearity of the invention is inclined
Shake controlling element ethyl red molecular structure photo-isomerisable change.
Fig. 9 is in the embodiment of the present invention, and during using regulation and control light irradiation, the time response of optical nonlinearity polarization regulation and control is special
Property.
Figure 10 is the polarization imaging that the optical nonlinearity provided in an embodiment of the present invention using the present invention polarizes controlling element
System.
Figure 11 is the structural representation of the mask to be imaged of polarized imaging system provided in an embodiment of the present invention.
Figure 12 is imaging results of the polarized imaging system provided in an embodiment of the present invention using Figure 11 imaging masks.
Main element symbol description
Polarized imaging system | 10 |
Optical nonlinearity polarizes controlling element | 100 |
Insulation transparent substrate | 101 |
Plasmon layer | 102 |
Micro-structural | 1022 |
Rectangular body | 1024 |
Rectangle tip is raised | 1026 |
The controllable film of refractive index | 103 |
Ethyl red photo-isomerisable material | 1032 |
Polymer | 1034 |
Dichroscope | 11 |
Polarized light source | 12 |
Polarized incident light | 120 |
First Polarization Modulation emergent light | 122 |
Second Polarization Modulation emergent light | 124 |
First light path regulating device | 13 |
First convex lens | 132 |
First pin hole | 134 |
Second convex lens | 136 |
3rd convex lens | 138 |
Regulate and control light source | 14 |
Regulate and control light | 140 |
Second light path regulating device | 15 |
4th convex lens | 152 |
Second pin hole | 154 |
5th convex lens | 156 |
Imaging masks | 157 |
6th convex lens | 158 |
Delustring filter | 16 |
Long pass filter piece | 162 |
Quarter wave plate | 164 |
Polarizer | 166 |
First microcobjective | 17 |
Imaging device | 18 |
Imaging len | 182 |
Second microcobjective | 19 |
Following embodiment will combine above-mentioned accompanying drawing and further illustrate the present invention.
Embodiment
Below in conjunction with the accompanying drawings and the specific embodiments, controlling element, regulation and control are polarized to optical nonlinearity provided by the invention
The method of incident light wave polarization and its application are described in further detail.
Referring to Fig. 1, the embodiment of the present invention provides a kind of optical nonlinearity polarization controlling element 100, the optical nonlinearity
Polarization controlling element 100 includes an insulation transparent substrate 101, a plasmon layer 102 and the controllable film of a refractive index
103.The insulation transparent substrate 101, plasmon layer 102 and the controllable film 103 of refractive index are cascading.
Specifically, the plasmon layer 102 is arranged at a surface of the insulation transparent substrate 101.The refractive index
Controllable film 103 is arranged at the surface of the plasmon layer 102 away from the insulation transparent substrate 101 and swashs the plasma
First layer 102 covers.It is appreciated that optical nonlinearity polarization controlling element 100 may also include a protective clear layer (not shown)
It is covered in controllable surface of the film 103 away from the plasmon layer 102 of the refractive index.
The insulation transparent substrate 101 is the structure of a curved face type or plane.The insulation transparent substrate 101 mainly plays branch
The effect of support.The insulation transparent substrate 101 can be formed by hard material or flexible material.Specifically, the hard material can
Select as silica, silicon nitride, sapphire, ceramics, glass, quartz, diamond or plastics etc..The flexible material may be selected to be
Makrolon (PC), polymethyl methacrylate (PMMA), polyethylene(PE), polyimides(PI)Or poly terephthalic acid second two
The polyester materials such as alcohol ester (PET), or polyether sulfone (PES), cellulose esters, polyvinyl chloride (PVC), benzocyclobutene (BCB) or third
The materials such as olefin(e) acid resin.The material for forming the insulation transparent substrate 101 is not limited to the above-mentioned material enumerated, as long as can make absolutely
Edge transparent substrates 101 are played a supporting role and transparent material.Shape, size and the thickness of the insulation transparent substrate 101
Degree can select according to being actually needed.In the present embodiment, the insulation transparent substrate 101 is the dioxy that a thickness is 500 microns
SiClx layer.
The material of the plasmon layer 102 be metal to produce surface plasma excimer, as gold, silver, copper, iron,
Aluminium, nickel etc. or its alloy.The plasmon layer 102 includes the micro-structural 1022 with chirality set in multiple cycles.Institute
The micro-structural 1022 for stating cycle setting processes layer gold preparation by technologies such as focused-ion-beam lithography or electron beam exposures.It is described more
Individual micro-structural 1022, which is arranged at intervals, make it that the plasmon layer 102 can be with printing opacity.The figure of the micro-structural 1022 is unlimited, as long as
With chirality.The thickness h of the micro-structural 1022 is 30 nanometers ~ 100 nanometers, and the cycle is 300 nanometers ~ 1000 nanometers, chi
Very little is 100 nanometers ~ 500 nanometers.It is appreciated that the micro-structural 1022 can also be to be formed at opening on a continuous metal layer
Mouthful.In the present embodiment, first the surface of insulation transparent substrate 101 deposit one layer of 100 nanometer thickness golden film, then by focus on from
Beamlet etching prepares the micro-structural 1022 for the periodic distribution that multiple cycles are 300 nanometers.It is described micro- with further reference to Fig. 2-3
Structure 1022 includes a rectangular body 1024 and a rectangle tip projection 1026 to be extended out by the rectangular body 1024.Institute
State rectangular body 1024 and be integral structure with rectangle tip projection 1026.Rectangle tip projection 1026 is close to one jiao
Place is set.One long side of rectangle tip projection 1026 is concordant with one side of the rectangular body 1024.The rectangular body
1024 length of side is 200 nanometers, a length of 45 nanometers, a width of 28 nanometers of rectangle tip projection 1026.
The controllable film 103 of refractive index is arranged at the plasmon layer 102 away from the insulation transparent substrate
101 surface, and extend partially into the opening of the plasmon layer 102 and with the table of the insulation transparent substrate 101
Face contacts.The i.e. described controllable part of film 103 of refractive index is arranged at the surface of the plasmon layer 102, and part is set
Surface in the insulation transparent substrate 101 by the plurality of opening exposure.The controllable film 103 of refractive index is away from described exhausted
The surface of edge transparent substrates 101 can be a plane or curved surface.The thickness H of the controllable film 103 of refractive index is 100 nanometers
~ 800 nanometers, preferably 200 nanometers ~ 500 nanometers.It is adjustable under light illumination that the controllable film 103 of refractive index includes refractive index
The material of control, such as semiconductor, nonlinear crystal, photorefractive material, photochromic material, or photo-isomerisable material etc..It is described
The controllable film 103 of refractive index can be prepared by the methods of spin coating, spraying, printing, deposition.In the present embodiment, the refraction
The controllable film 103 of rate includes a PMMA polymer 1034 and multiple ethyl reds for being scattered in the polymer 1034 are photic different
Structure material 1032.The controllable thickness of film 103 of refractive index is 300 nanometers.The preparation of the controllable film 103 of refractive index
Method forms a mixed liquor for first ethyl red photo-isomerisable material 1032 is dispersed in PMMA colloids, then mixes this
Liquid is coated on the surface of the plasmon layer 102 by the method for spin coating.
Fig. 4 is referred to, the embodiment of the present invention provides a kind of optical nonlinearity polarization controlling element 100 for using the present invention and adjusted
The method for controlling incident light wave polarization, specifically includes following steps:
Step S10, it is non-that the optics from the controllable side of film 103 of the refractive index is irradiated using a polarized incident light 120
Linear polarization controlling element 100, and obtain the first Polarization Modulation emergent light 122 from the side of insulation transparent substrate 101;And
Step S20, the optical nonlinearity is irradiated from the controllable side of film 103 of the refractive index using a regulation and control light 140
Controlling element 100 is polarized, while keeps above-mentioned polarized incident light 120 to continue to irradiate, and is obtained from the side of insulation transparent substrate 101
To the second Polarization Modulation emergent light 124.
In step S10, the insulation transparent substrate 101 is the silicon dioxide layer that a thickness is 500 microns.The plasma
Excimer layer 102 is the array of golden micro-structural 1022 as described in Fig. 2-3.The controllable film 103 of refractive index polymerize including PMMA
Thing 1034 and multiple ethyl red photo-isomerisable materials 1032 being scattered in the polymer 1034.The polarized incident light 120
For x-polarisation light, the first Polarization Modulation emergent light 122 obtained after optical nonlinearity polarization controlling element 100 is modulated is
Elliptically polarized light, its major axes orientation rotationangleφ, ellipse drift angle are χ.Referring to Fig. 5, the embodiment of the present invention tests the obtained optics
Nonlinear polarization controlling element 100 rotates to the ellipse drift angle χ of the first Polarization Modulation emergent light 122 of different wave length with major axes orientation
Angle φ.The structure and material that the embodiment of the present invention uses, there is preferably polarization regulating effect to x-polarisation light.
In step S20, the regulation and control light 140 is that can become the refractive index of the controllable film 103 of the refractive index
The light of change.In the present embodiment, the regulation and control light 140 is polarized green light, and it can change the refraction of ethyl red photo-isomerisable material
Rate.After the regulation and control light 140 irradiates, the second Polarization Modulation emergent light 124 is detected.Referring to Fig. 6, the embodiment of the present invention
Obtained optical nonlinearity polarization controlling element 100 will be tested to the ellipse of the first Polarization Modulation emergent light 122 of different wave length
The drift angle χ and ellipse drift angle χ of major axes orientation rotationangleφ and the second Polarization Modulation emergent light 124 is carried out with major axes orientation rotationangleφ
Contrast.It will be appreciated from fig. 6 that after the regulation and control light 140 irradiates, the spectral characteristic phase of the second obtained Polarization Modulation emergent light 124
Wavelength movement occurs for the spectral characteristic of the first Polarization Modulation emergent light 122.Referring to Fig. 7, different wave length is respectively illustrated
The ellipse drift angle χ of first Polarization Modulation emergent light 122 and major axes orientation rotationangleφ and the second Polarization Modulation emergent light 124 it is ellipse partially
Angle χ and major axes orientation rotationangleφ difference.
Referring to Fig. 8 (a)-(b), respectively molecule structure change of the ethyl red after green glow pre-irradiation.Because green glow irradiates
So that bond angle rotation occurs for ethyl red, the refractive index of the controllable film 103 of refractive index using ethyl red is caused to change, from
And cause the optical rotational activity spectrum characteristic of optical nonlinearity polarization controlling element 100 that wavelength movement as shown in Figure 6 occurs.
Referring to Fig. 9, be in the embodiment of the present invention, when being irradiated using regulation and control light 140, regulation and control light 140 and after being adjusted the
The time response figure of two Polarization Modulation emergent lights 124.As seen from Figure 9, the regulation process has faster time response, about 300
In microsecond, the intensity of the second Polarization Modulation emergent light 124 after being adjusted can be to rise or drop to maximum.
It is appreciated that in this method, the order that the polarized incident light 120 and regulation and control light 140 irradiate is unlimited, as long as ensuring
Sometime interior, the polarized incident light 120 and regulation and control light 140 irradiate optical nonlinearity polarization controlling element 100 simultaneously
.For example, first can be irradiated using regulation and control light 140, then irradiated using polarized incident light 120, while keep above-mentioned regulation and control light
140 continue to irradiate, so as to directly obtain the second Polarization Modulation emergent light 124.
Optical nonlinearity polarization controlling element 100 has advantages below:Should by using corresponding regulation and control light 140 irradiation
Optical nonlinearity polarizes controlling element 100, causes the refractive index of the controllable film 103 of its refractive index to change, so that
Wavelength movement occurs for the polarization regulation and control spectral characteristic of optical nonlinearity polarization controlling element 100, and this method is simple.
Referring to Fig. 10, the embodiment of the present invention provides a kind of polarized imaging system 10, it includes:One polarized light source 12, one
Regulate and control light source 14, a delustring filter 16, an imaging device 18 and above-mentioned optical nonlinearity polarization controlling element 100.
The polarized light source 12 is used to launch polarized incident light 120, makes the polarized incident light 120 from the optical nonlinearity
It is incident to polarize the controllable side of film 103 of refractive index of controlling element 100, and is emitted to be formed from the side of insulation transparent substrate 101
First Polarization Modulation emergent light 122.In the present embodiment, the polarized light source 12 is a super continuous spectrums laser, and it can launch
Wavelength is the x-polarisation light between 650 nanometers -1000 nanometers, as polarized incident light 120.
The regulation and control light source 14 is used to launch regulation and control light 140, and the regulation and control light 140 is polarized from the optical nonlinearity and adjust
It is incident to control the controllable side of film 103 of refractive index of element 100, so as to change the refraction of the controllable film 103 of the refractive index
Rate, the first Polarization Modulation emergent light 122 from the outgoing of the side of insulation transparent substrate 101 is set to change into the second Polarization Modulation emergent light
124.The second Polarization Modulation emergent light 124 is radiated on the imaging device 18 and is imaged.In the present embodiment, the tune
Control light source 14 is a laser, and it can be using launch wavelength as 532 nanometers of green glow y-polarisation light, as regulation and control light 140.
The delustring filter 16 is used to carry out delustring to above-mentioned first Polarization Modulation emergent light 122 and filtered from exhausted
The regulation and control light 140 of the side of edge transparent substrates 101 outgoing, so that it is guaranteed that only described second Polarization Modulation emergent light 124 is radiated at
It is imaged on the imaging device 18.Specifically, in the present embodiment, the delustring filter 16 includes a long pass filter piece
162nd, a quarter wave plate 164 and a polarizer 166.The long pass filter piece 162 is used for from the side of insulation transparent substrate 101
The green glow regulation and control light 140 of outgoing is filtered.The quarter wave plate 164 and polarizer 166 are used for from insulation transparent substrate 101
First Polarization Modulation emergent light 122 of side outgoing carries out delustring.The polarizer 166 is Glan Taylor prisms.
The imaging device 18 can be any device that can be imaged.In the present embodiment, the imaging device 18 is one
The device of imaging including charge coupled cell (CCD).
The polarized light source 12, regulation and control light source 14, delustring filter 16, optical nonlinearity polarization controlling element 100 with
And the position relationship of imaging device 18 is unlimited, as long as above-mentioned optical path requirements can be met.Specifically, it is described in the present embodiment
Polarized light source 12, optical nonlinearity polarization controlling element 100, delustring filter 16 and imaging device 18 are arranged at intervals successively
Point-blank.The polarized light source 12 and the optical nonlinearity polarization controlling element 100 between set one 45 degree two to
Look mirror 11, so that the polarized incident light 120 that the polarized light source 12 is launched can pass through the dichroscope 11, the optics
The imaging device 18 is reached after nonlinear polarization controlling element 100 and the delustring filter 16.The regulation and control light source
14 are arranged at the side of dichroscope 11, and the regulation and control light 140 of its transmitting can after the dichroscope 11 reflection with institute
Polarized incident light 120 is stated to overlap.It is appreciated that the angle of the dichroscope 11 is not limited to 45 degree, as long as the regulation and control light source
The regulation and control light 140 of 14 transmittings can be radiated at the optical nonlinearity polarization controlling element after the dichroscope 11 reflection
On 100.The angle of the dichroscope 11 is preferably 45 degree, it can be ensured that the light spot shape of the regulation and control light 140 is through institute
State and reflected when being radiated at after dichroscope 11 reflects on the optical nonlinearity polarization controlling element 100 with the dichroscope 11
Before be consistent.
Further, the polarized imaging system 10 also includes one first light path regulating device 13, for adjusting the polarization
The light path of incident light 120, and incident light quality is improved by space filtering.First light path regulating device 13 is optional knot
Structure.Specifically, first light path regulating device 13 includes be set in turn in the light-emitting area side of polarized light source 12 one the
One convex lens 132, one first pin hole 134, one second convex lens 136 and one the 3rd convex lens 138.First convex lens
132 polarized incident lights 120 for being used to send the polarized light source 12 converge.First pin hole 134 is used to filter out partially
The spatial high-frequency composition for the polarized incident light 120 that the light source 12 that shakes is sent, improve the quality of laser facula pattern.It is appreciated that such as
Polarized incident light 120 described in fruit is preferable for the Gaussian Profile of laser and facular model, then can omit first pin hole 134.
Second convex lens 136 are used to collimate the light beam of first pin hole 134.3rd convex lens 138 and first
Microcobjective 17 is used to incident light 120 carrying out shrink beam, and parallel radiation polarizes the table of controlling element 100 in the optical nonlinearity
Face.
Further, the polarized imaging system 10 also includes one second light path regulating device 15, for adjusting the regulation and control
The light path of light 140, so as to improve incident light quality.Second light path regulating device 15 is alternative construction.Specifically, described
Two light path regulating devices 15 include the 4th convex lens 152,1 for being set in turn in the regulation and control light source 14 light-emitting area side
Two pin holes 154, one the 5th convex lens 156, an imaging masks 157 and the 6th convex lens 158.Second pin hole 154 is used for
Improve the Gaussian Profile of laser facula pattern.If, can be with it is appreciated that the regulation and control light 140 facular model distribution is preferable
Omit second pin hole 154.
Further, the polarized imaging system 10 also includes being respectively arranged at the optical nonlinearity polarization controlling element
The first microcobjective 17 and the second microcobjective 19 of 100 both sides.First microcobjective 17 be one be arranged at described two to
Look mirror 11 and the optical nonlinearity polarization controlling element 100 between 10 ×(N.A.=0.25)Microcobjective.Described second is aobvious
Speck mirror 19 be one be arranged at the delustring filter 16 and the optical nonlinearity polarize between controlling element 100 10 ×
(N.A.=0.26)Microcobjective.First microcobjective 17 and the 6th convex lens 158 coordinate, can be by the imaging
Mask 157 is imaged on optical nonlinearity polarization controlling element 100 surface.First microcobjective 17 and described 3rd convex
Lens 138 can reduce the light beam of the polarized incident light 120 and parallel radiation polarizes regulation and control member in the optical nonlinearity
The surface of part 100.Second microcobjective 19 is used to collecting and collimating the saturating of the optical nonlinearity polarization controlling element 100
Penetrate light.
Further, the polarized imaging system 10 is also arranged at the delustring filter 16 and imaging device 18 including one
Between imaging len 182.The imaging len 182 is used to the second Polarization Modulation by the delustring filter 16
Penetrate light 124 and can converge and image on the imaging device 18.The imaging len 182 is a convex lens.
The embodiment of the present invention carries out imaging experiment using above-mentioned polarized imaging system 10, comprises the following steps that.First, open
The polarized light source 12 makes it launch feux rouges polarized incident light 120, the polarized incident light 120 is polarized from the optical nonlinearity
The controllable side of film 103 of refractive index of controlling element 100 is incident, and is emitted to form first from the side of insulation transparent substrate 101
Polarization Modulation emergent light 122, and the first Polarization Modulation emergent light 122 is radiated on the imaging device 18.Secondly, regulation
The delustring filter 16, makes the delustring of the first Polarization Modulation emergent light 122, and the imaging device 18 can not receive letter
Number.Finally, open the regulation and control light source 14 and launch green glow regulation and control light 140, and make the regulation and control light 140 inclined from the optical nonlinearity
Shake controlling element 100 the controllable side of film 103 of refractive index it is incident, so as to change the controllable film 103 of the refractive index
Refractive index, the first Polarization Modulation emergent light 122 made from the outgoing of the side of insulation transparent substrate 101 are changed into the second Polarization Modulation and gone out
Penetrate light 124.The second Polarization Modulation emergent light 124 is radiated on the imaging device 18 and is imaged.It is described referring to Figure 11
Imaging masks 157 have a cross perforate, therefore, the regulation and control light 140 being radiated on the controllable film 103 of the refractive index
Light spot shape is also cross.Referring to Figure 12, after regulation and control light source 14 are opened, the imaging on the imaging device 18
Shape is also cross.
Polarized imaging system 10 provided by the invention can control the imaging device 18 by the regulation and control light source 14
On imaging, method is simple.
In addition, those skilled in the art can also do other changes in spirit of the invention, these are according to present invention spirit
The change done, it should all be included in scope of the present invention.
Claims (10)
1. a kind of polarized imaging system, it is characterised in that it includes:
One optical nonlinearity polarizes controlling element, and optical nonlinearity polarization controlling element includes:One insulation transparent substrate;One sets
The metal plasma excimer layer on a surface of the insulation transparent substrate is placed in, the plasmon layer is set including multiple cycles
There is chiral micro-structural;And one be arranged at the surface of the metal plasma excimer layer away from the insulation transparent substrate and will
The controllable film of refractive index of metal plasma excimer layer covering;The controllable film of refractive index includes refractive index in illumination
Under regulatable material;
One polarized light source, the polarized light source are used to launch polarized incident light, make the polarized incident light from the optical nonlinearity
It is incident to polarize the controllable film side of refractive index of controlling element, and is emitted to form the first polarization tune from insulation transparent substrate side
Emergent light processed;
One regulation and control light source, the regulation and control light source is used to launch regulation and control light, and the regulation and control light is polarized from the optical nonlinearity and adjust
It is incident to control the controllable film side of refractive index of element, so as to change the refractive index of the controllable film of the refractive index, makes from this
First Polarization Modulation emergent light of insulation transparent substrate side outgoing changes into the second Polarization Modulation emergent light, and the refractive index
The variations in refractive index of controllable film is used to the second Polarization Modulation emergent light is emitted relative to first Polarization Modulation
Wavelength movement occurs for light;
One delustring filter, the delustring filter are used to carry out delustring and mistake to above-mentioned first Polarization Modulation emergent light
Filter the regulation and control light from the outgoing of insulation transparent substrate side;And
One imaging device, the imaging device are used to be imaged the light received.
2. polarized imaging system as claimed in claim 1, it is characterised in that the controllable film portion of refractive index extends to
Contacted in the opening of the plasmon layer and with the surface of the insulation transparent substrate;The refractive index is adjustable under light illumination
The material of control is semi-conducting material, nonlinear crystalline material, photorefractive material, in photochromic material and photo-isomerisable material
One or more.
3. polarized imaging system as claimed in claim 2, it is characterised in that the controllable film of refractive index includes a poly- first
Base methyl acrylate polymer and multiple ethyl red photo-isomerisable materials being scattered in the polymer;The metal for gold,
Silver, copper, iron, aluminium, nickel or its alloy;The thickness of the micro-structural is 30 nanometers~100 nanometers, and the cycle is 300 nanometers~1000
Nanometer, size are 100 nanometers~500 nanometers.
4. polarized imaging system as claimed in claim 3, it is characterised in that the multiple micro-structural is arranged at intervals to be formed for a moment
Row;The micro-structural includes a rectangular body and a rectangle tip to be extended out by the rectangular body is raised;The rectangle
Body is integral structure with rectangle tip projection;The rectangle tip is raised to be set at one jiao, and the rectangle
A sophisticated raised long side is concordant with one side of the rectangular body.
5. polarized imaging system as claimed in claim 1, it is characterised in that further comprise dichroscope;The polarised light
Source, optical nonlinearity polarization controlling element, delustring filter and imaging device are arranged at intervals point-blank successively;Institute
State dichroscope to be arranged between the polarized light source and optical nonlinearity polarization controlling element, so that the polarised light
The polarized incident light of source transmitting can polarize controlling element and the delustring by the dichroscope, the optical nonlinearity
The imaging device is reached after filter;The regulation and control light source is arranged at the dichroscope side, and the regulation and control of its transmitting
Light can overlap after dichroscope reflection with the polarized incident light.
6. polarized imaging system as claimed in claim 5, it is characterised in that the angle of the dichroscope and the straight line is 45
Degree, adjusted so that it is guaranteed that the light spot shape of the regulation and control light is radiated at the optical nonlinearity polarization after dichroscope reflection
It is consistent before being reflected when on control element with the dichroscope.
7. polarized imaging system as claimed in claim 6, it is characterised in that further comprise that one is arranged at the polarized light source
The first light path regulating device and one between the dichroscope be arranged at it is described regulation and control light source and the dichroscope it
Between the second light path regulating device;First light path regulating device includes being set in turn in the polarized light source light-emitting area side
One first convex lens, one first pin hole, one second convex lens and one the 3rd convex lens;The second light path regulating device bag
Include one be set in turn in regulation and control the 4th convex lens of light source luminescent face side, one second pin hole, one the 5th convex lens, one one-tenth
As mask and the 6th convex lens.
8. polarized imaging system as claimed in claim 7, it is characterised in that further comprise that one is arranged at the dichroscope
The first microcobjective between the optical nonlinearity polarization controlling element;One is arranged at the delustring filter and the light
Learn the second microcobjective between nonlinear polarization controlling element;And one be arranged at the delustring filter and imaging device
Between imaging len.
9. a kind of method of polarized imaging system imaging using as described in claim 1 to 8 any one, it includes:
Opening the polarized light source makes it launch polarized incident light, makes the polarized incident light polarize from the optical nonlinearity
The controllable film side of refractive index of element is incident, and is emitted to form the outgoing of the first Polarization Modulation from insulation transparent substrate side
Light, and the first Polarization Modulation emergent light is radiated on the imaging device;
The delustring filter is adjusted, makes the first Polarization Modulation emergent light delustring, the imaging device can not receive
Signal;And
The regulation and control light source transmitting regulation and control light is opened, and makes refraction of the regulation and control light from optical nonlinearity polarization controlling element
The controllable film side of rate is incident, so as to change the refractive index of the controllable film of the refractive index, makes from insulation transparent substrate one
First Polarization Modulation emergent light of side outgoing changes into the second Polarization Modulation emergent light, and the second Polarization Modulation emergent light shines
Penetrate on the imaging device and be imaged.
10. the method being imaged as claimed in claim 9, it is characterised in that the insulation transparent substrate is silicon dioxide layer, institute
It is golden micro structure array to state plasmon layer, the controllable film of refractive index include poly methyl methacrylate polymer with
And multiple ethyl red photo-isomerisable materials being scattered in the polymer;The polarized incident light is x-polarisation feux rouges, described first
Polarization Modulation emergent light and the second Polarization Modulation emergent light are elliptically polarized light, and the regulation and control light is polarized green light;Described second
The ellipse drift angle of Polarization Modulation emergent light and the major axes orientation anglec of rotation relative to the first Polarization Modulation emergent light ellipse drift angle with
Wavelength movement occurs for the major axes orientation anglec of rotation.
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