CN105319738A - Polarization imaging system and method adopting same - Google Patents
Polarization imaging system and method adopting same Download PDFInfo
- Publication number
- CN105319738A CN105319738A CN201510801683.5A CN201510801683A CN105319738A CN 105319738 A CN105319738 A CN 105319738A CN 201510801683 A CN201510801683 A CN 201510801683A CN 105319738 A CN105319738 A CN 105319738A
- Authority
- CN
- China
- Prior art keywords
- light
- polarized
- polarization
- refractive index
- regulation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000010287 polarization Effects 0.000 title claims abstract description 147
- 238000003384 imaging method Methods 0.000 title claims abstract description 112
- 238000000034 method Methods 0.000 title claims abstract description 22
- 230000003287 optical effect Effects 0.000 claims abstract description 76
- 239000000758 substrate Substances 0.000 claims abstract description 50
- 239000000463 material Substances 0.000 claims abstract description 36
- 230000001105 regulatory effect Effects 0.000 claims abstract description 26
- 229910052751 metal Inorganic materials 0.000 claims abstract description 14
- 239000002184 metal Substances 0.000 claims abstract description 14
- 238000005286 illumination Methods 0.000 claims abstract description 7
- 230000033228 biological regulation Effects 0.000 claims description 77
- 230000001276 controlling effect Effects 0.000 claims description 71
- 238000009413 insulation Methods 0.000 claims description 47
- HBRCDTRQDHMTDA-UHFFFAOYSA-N 2-[[4-(diethylamino)phenyl]diazenyl]benzoic acid Chemical compound C1=CC(N(CC)CC)=CC=C1N=NC1=CC=CC=C1C(O)=O HBRCDTRQDHMTDA-UHFFFAOYSA-N 0.000 claims description 13
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical group O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 9
- 229920003229 poly(methyl methacrylate) Polymers 0.000 claims description 9
- 239000000126 substance Substances 0.000 claims description 9
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 6
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 6
- 235000012239 silicon dioxide Nutrition 0.000 claims description 5
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 4
- 229910052737 gold Inorganic materials 0.000 claims description 4
- 239000010931 gold Substances 0.000 claims description 4
- 239000000377 silicon dioxide Substances 0.000 claims description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 3
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims description 3
- 239000000956 alloy Substances 0.000 claims description 3
- 229910045601 alloy Inorganic materials 0.000 claims description 3
- 239000004411 aluminium Substances 0.000 claims description 3
- 229910052782 aluminium Inorganic materials 0.000 claims description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 3
- 230000015572 biosynthetic process Effects 0.000 claims description 3
- 238000010276 construction Methods 0.000 claims description 3
- 229910052802 copper Inorganic materials 0.000 claims description 3
- 239000010949 copper Substances 0.000 claims description 3
- 229910052742 iron Inorganic materials 0.000 claims description 3
- 229910052759 nickel Inorganic materials 0.000 claims description 3
- 239000004065 semiconductor Substances 0.000 claims description 3
- 229910052709 silver Inorganic materials 0.000 claims description 3
- 239000004332 silver Substances 0.000 claims description 3
- 239000002178 crystalline material Substances 0.000 claims description 2
- 239000010409 thin film Substances 0.000 abstract 3
- 230000008033 biological extinction Effects 0.000 abstract 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 5
- 238000009826 distribution Methods 0.000 description 4
- 239000013078 crystal Substances 0.000 description 3
- 238000001914 filtration Methods 0.000 description 3
- 238000002360 preparation method Methods 0.000 description 3
- 230000003595 spectral effect Effects 0.000 description 3
- 239000004642 Polyimide Substances 0.000 description 2
- UMIVXZPTRXBADB-UHFFFAOYSA-N benzocyclobutene Chemical compound C1=CC=C2CCC2=C1 UMIVXZPTRXBADB-UHFFFAOYSA-N 0.000 description 2
- 238000004891 communication Methods 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 230000005684 electric field Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000002164 ion-beam lithography Methods 0.000 description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- -1 polyethylene terephthalate Polymers 0.000 description 2
- 229920000139 polyethylene terephthalate Polymers 0.000 description 2
- 239000005020 polyethylene terephthalate Substances 0.000 description 2
- 229920001721 polyimide Polymers 0.000 description 2
- 238000007639 printing Methods 0.000 description 2
- 230000005855 radiation Effects 0.000 description 2
- 238000001228 spectrum Methods 0.000 description 2
- 238000004528 spin coating Methods 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- 241000662429 Fenerbahce Species 0.000 description 1
- 229920012266 Poly(ether sulfone) PES Polymers 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 229920002678 cellulose Polymers 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- HGAZMNJKRQFZKS-UHFFFAOYSA-N chloroethene;ethenyl acetate Chemical compound ClC=C.CC(=O)OC=C HGAZMNJKRQFZKS-UHFFFAOYSA-N 0.000 description 1
- 239000000084 colloidal system Substances 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 230000009022 nonlinear effect Effects 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 229910052594 sapphire Inorganic materials 0.000 description 1
- 239000010980 sapphire Substances 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 239000012780 transparent material Substances 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/0126—Opto-optical modulation, i.e. control of one light beam by another light beam, not otherwise provided for in this subclass
Landscapes
- Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Optical Modulation, Optical Deflection, Nonlinear Optics, Optical Demodulation, Optical Logic Elements (AREA)
Abstract
The invention relates to a polarization imaging system which comprises a polarization light source, a regulating light source, an extinction filter, an imaging device and an optical non-linearity polarization regulating element. The optical non-linearity polarization regulating element comprises an insulating transparent substrate, a metal plasmon polariton layer arranged on the surface of the insulating transparent substrate and a refractive index regulatable thin film. The metal plasmon polariton layer comprises multiple tiny structures which are arranged periodically and provided with chirality. The refractive index regulatable thin film is arranged on the surface, away from the insulating transparent substrate, of the metal plasmon polariton layer and covers the metal plasmon polariton layer. The refractive index regulatable thin film comprises a material allowing the refractive index to be regulated under illumination. The invention further relates to a method for utilizing the polarization imaging system for imaging. By means of the polarization imaging system, all-optical regulating imaging of polarized light can be achieved. The imaging method has the advantages of being simple and high in response speed.
Description
Technical field
The present invention relates to polarization optics field, particularly relate to a kind of optical nonlinearity polarization controlling element, the method for regulation and control incident light wave polarization and its application.
Background technology
Polarized light is widely used by people, and current people have had multiple method and apparatus to realize the regulation and control to optical polarization, such as, adopt electrooptic modulator, liquid crystal modulator, magneto-optic modulator etc.Their principle utilizes electric field or magnetic field that the birefringent characteristic of electro-optic crystal, liquid crystal molecule, magneto-optical crystal or optically-active characteristic are changed, and then the polarization state of transmitted light is changed.
But the regulation and control electric field loaded in above method or field signal all depend on electronic circuit generation, its switching speed is limited to the response speed of circuit.In addition, if similar element is used in modern optical information communication system, generates at message code and regulate and control the stage along with the conversion between electric signal-light signal, causing time waste, limit transfer rate and the bandwidth of information in communication system.And utilize optics control measures can realize response speed faster.
Summary of the invention
In view of this, necessaryly utilizing the polarized imaging system of the polarization controlling element of optical non-linear effect and adopting the method for this polarized imaging system imaging of a kind of full light formula is provided.
A kind of polarized imaging system, it is characterized in that, it comprises: an optical nonlinearity polarization controlling element, and this optical nonlinearity polarization controlling element comprises: an insulation transparent substrate; The one metal plasma excimer layer being arranged at a surface of this insulation transparent substrate, described plasmon layer comprises the microstructure with chirality that multiple cycle arranges; And one is arranged at this metal plasma excimer layer away from the surface of this insulation transparent substrate and by the refractive index controllable film of this metal plasma excimer layer covering; Described refractive index controllable film comprises refractive index regulatable material under light illumination; One polarized light source, described polarized light source, for launching polarized incident light, makes this polarized incident light incident from the refractive index controllable film side of described optical nonlinearity polarization controlling element, and forms the first Polarization Modulation emergent light from insulation transparent substrate side outgoing; One regulation and control light source, described regulation and control light source is for launching regulation and control light, and make this regulation and control light incident from the refractive index controllable film side of described optical nonlinearity polarization controlling element, thus change the refractive index of described refractive index controllable film, make to change into the second Polarization Modulation emergent light from the first Polarization Modulation emergent light of insulation transparent substrate side outgoing; One delustring filter, described delustring filter is used for the regulation and control light that above-mentioned first Polarization Modulation emergent light is carried out to delustring and filters from insulation transparent substrate side outgoing; And an imaging device, described imaging device is used for carrying out imaging to the light received.
As above-mentioned polarized imaging system, preferably, described refractive index controllable film portion to extend in the opening of described plasmon layer and with the surface contact of described insulation transparent substrate; Described refractive index under light illumination regulatable material is semiconductor material, nonlinear crystalline material, photorefractive material, one or more in photochromic material and photo-isomerisable material.
As above-mentioned polarized imaging system, preferably, described refractive index controllable film comprises a poly methyl methacrylate polymer and multiple ethyl red photo-isomerisable material be scattered in this polymkeric substance; Described metal is gold, silver, copper, iron, aluminium, nickel etc. or its alloy; The thickness of described microstructure is 30 nanometer ~ 100 nanometers, and the cycle is 300 nanometer ~ 1000 nanometers, is of a size of 100 nanometer ~ 500 nanometers.
As above-mentioned polarized imaging system, preferably, described multiple microstructure interval arranges formation an array; Described microstructure comprises the most advanced and sophisticated projection of rectangle that a rectangular body and is extended out by this rectangular body; Described rectangular body and the most advanced and sophisticated projection of described rectangle are an one-piece construction; Described rectangle tip is protruding to be arranged near one jiao of place, and the most advanced and sophisticated long limit of projection of described rectangle and the concordant of this rectangular body.
As above-mentioned polarized imaging system, preferably, dichroic mirror is comprised further; Described polarized light source, optical nonlinearity polarization controlling element, delustring filter and imaging device are disposed on straight line successively; Described dichroic mirror is arranged between described polarized light source and described optical nonlinearity polarization controlling element, thus the polarized incident light that described polarized light source is launched can by arriving described imaging device after described dichroic mirror, described optical nonlinearity polarization controlling element and described delustring filter; Described regulation and control light source is arranged at described dichroic mirror side, and its regulation and control light launched can overlap with described polarized incident light after described dichroic mirror reflects.
As above-mentioned polarized imaging system, preferably, the angle of described dichroic mirror is 45 degree, thus is consistent when guaranteeing that the light spot shape of described regulation and control light is radiated on described optical nonlinearity polarization controlling element after described dichroic mirror reflects and before described dichroic mirror reflects.
As above-mentioned polarized imaging system, preferably, comprise first light path regulating device and be arranged between described polarized light source and described dichroic mirror further and be arranged at the second light path regulating device between described regulation and control light source and described dichroic mirror; Described first light path regulating device comprises one first convex lens, one first pin hole, one second convex lens and one the 3rd convex lens that are set in turn in described polarized light source light-emitting area side; Described second light path regulating device comprises the 4th convex lens being set in turn in side, described regulation and control light source luminescent face, one second pin hole, one the 5th convex lens, an imaging masks and the 6th convex lens.
As above-mentioned polarized imaging system, preferably, comprise one further and be arranged at the first microcobjective between described dichroic mirror and described optical nonlinearity polarization controlling element; One is arranged at the second microcobjective between described delustring filter and described optical nonlinearity polarization controlling element; And one is arranged at imaging len between described delustring filter and imaging device.
A kind of method adopting above-mentioned polarized imaging system imaging, it comprises: open described polarized light source and make it launch polarized incident light, make this polarized incident light incident from the refractive index controllable film side of described optical nonlinearity polarization controlling element, and form the first Polarization Modulation emergent light from insulation transparent substrate side outgoing, and this first Polarization Modulation emergent light is radiated on described imaging device; Regulate described delustring filter, make described first Polarization Modulation emergent light delustring, described imaging device cannot receive signal; And open described regulation and control light source transmitting regulation and control light, and make this regulation and control light incident from the refractive index controllable film side of described optical nonlinearity polarization controlling element, thus change the refractive index of described refractive index controllable film, make to change into the second Polarization Modulation emergent light from the first Polarization Modulation emergent light of insulation transparent substrate side outgoing, and described second Polarization Modulation emergent light is radiated on described imaging device and carries out imaging.
As the method for above-mentioned imaging, preferably, described insulation transparent substrate is silicon dioxide layer, and described plasmon layer is golden micro structure array, and described refractive index controllable film comprises poly methyl methacrylate polymer and multiple ethyl red photo-isomerisable material be scattered in this polymkeric substance; Described polarized incident light is x-polarisation ruddiness, and described first Polarization Modulation emergent light and the second Polarization Modulation emergent light are elliptically polarized light, and described regulation and control light is polarized green light; The ellipse drift angle χ of described second Polarization Modulation emergent light and major axes orientation rotationangleφ move relative to the ellipse drift angle χ of described first Polarization Modulation emergent light and major axes orientation rotationangleφ generation wavelength; The pattern of described second Polarization Modulation emergent light imaging on described imaging device is identical with the pattern of described imaging masks.
Compared with prior art, polarized imaging system provided by the invention can realize the full light formula regulation and control imaging to polarized light.This formation method, has method simple, the advantage that corresponding speed is fast.
Accompanying drawing explanation
The structural representation of the optical nonlinearity polarization controlling element that Fig. 1 provides for the embodiment of the present invention.
The structural representation of the microstructure of the plasmon layer of the optical nonlinearity polarization controlling element that Fig. 2 provides for the embodiment of the present invention.
The stereoscan photograph of the micro structure array of the plasmon layer of the optical nonlinearity polarization controlling element that Fig. 3 provides for the embodiment of the present invention.
The method flow diagram of the employing optical nonlinearity polarization of the present invention controlling element regulation and control incident light polarization that Fig. 4 provides for the embodiment of the present invention.
Fig. 5 is in the embodiment of the present invention, adopts regulation and control light pre-irradiation, is converted into ellipse drift angle χ and pole axis (plane of polarization) rotationangleφ of oval thickness after different wave length x-polarisation light transmission optical nonlinearity of the present invention polarization controlling element.
Fig. 6 is in the embodiment of the present invention, and the transmitted light ellipse drift angle χ of optical nonlinearity polarization controlling element of the present invention and pole axis rotationangleφ are adopting light pre-irradiation and postradiation contrast.
Fig. 7 is in the embodiment of the present invention, after adopting regulation and control light pre-irradiation and irradiation, and the ellipse drift angle χ of the transmitted light of optical nonlinearity polarization the controlling element of the present invention and poor Δ χ of pole axis rotationangleφ and Δ φ.
Fig. 8 is in the embodiment of the present invention, after adopting green glow regulation and control light pre-irradiation and irradiation, and the photo-isomerisable change of the ethyl red molecular structure of optical nonlinearity polarization controlling element of the present invention.
Fig. 9 is in the embodiment of the present invention, when adopting regulation and control illumination to penetrate, and the time resolution characteristics of optical nonlinearity polarization regulation and control.
The polarized imaging system of the employing optical nonlinearity polarization of the present invention controlling element that Figure 10 provides for the embodiment of the present invention.
The structural representation of the mask to be imaged of the polarized imaging system that Figure 11 provides for the embodiment of the present invention.
Figure 12 adopts the imaging results of the imaging masks of Figure 11 for polarized imaging system that the embodiment of the present invention provides.
Main element symbol description
| Polarized imaging system | 10 |
| Optical nonlinearity polarization controlling element | 100 |
| Insulation transparent substrate | 101 |
| Plasmon layer | 102 |
| Microstructure | 1022 |
| Rectangular body | 1024 |
| Rectangle is most advanced and sophisticated protruding | 1026 |
| Refractive index controllable film | 103 |
| Ethyl red photo-isomerisable material | 1032 |
| Polymkeric substance | 1034 |
| Dichroic mirror | 11 |
| Polarized light source | 12 |
| Polarized incident light | 120 |
| First Polarization Modulation emergent light | 122 |
| Second Polarization Modulation emergent light | 124 |
| First light path regulating device | 13 |
| First convex lens | 132 |
| First pin hole | 134 |
| Second convex lens | 136 |
| 3rd convex lens | 138 |
| Regulation and control light source | 14 |
| Regulation and control light | 140 |
| Second light path regulating device | 15 |
| 4th convex lens | 152 |
| Second pin hole | 154 |
| 5th convex lens | 156 |
| Imaging masks | 157 |
| 6th convex lens | 158 |
| Delustring filter | 16 |
| Long pass filter sheet | 162 |
| Quarter wave plate | 164 |
| Polaroid | 166 |
| First microcobjective | 17 |
| Imaging device | 18 |
| Imaging len | 182 |
| Second microcobjective | 19 |
Following embodiment will further illustrate the present invention in conjunction with above-mentioned accompanying drawing.
Embodiment
Below in conjunction with the accompanying drawings and the specific embodiments, to optical nonlinearity polarization controlling element provided by the invention, method and its application of regulation and control incident light wave polarization are described in further detail.
Refer to Fig. 1, the embodiment of the present invention provides a kind of optical nonlinearity polarization controlling element 100, and this optical nonlinearity polarization controlling element 100 comprises insulation transparent substrate 101, plasmon layer 102 and a refractive index controllable film 103.Described insulation transparent substrate 101, plasmon layer 102 and refractive index controllable film 103 are cascading.
Particularly, described plasmon layer 102 is arranged at a surface of this insulation transparent substrate 101.Described refractive index controllable film 103 is arranged at this plasmon layer 102 away from the surface of this insulation transparent substrate 101 and is covered by this plasmon layer 102.Be appreciated that this optical nonlinearity polarization controlling element 100 also can comprise a protective clear layer (not shown) and be covered in the surface of this refractive index controllable film 103 away from this plasmon layer 102.
Described insulation transparent substrate 101 is the structure of a curved face type or plane.This insulation transparent substrate 101 mainly plays a part to support.This insulation transparent substrate 101 can be formed by hard material or flexible material.Particularly, described hard material may be selected to be monox, silicon nitride, sapphire, pottery, glass, quartz, adamas or plastics etc.Described flexible material may be selected to be the polyester materials such as polycarbonate (PC), polymethylmethacrylate (PMMA), tygon (PE), polyimide (PI) or polyethylene terephthalate (PET), or the material such as polyethersulfone (PES), cellulose esters, Polyvinylchloride (PVC), benzocyclobutene (BCB) or acryl resin.The material forming described insulation transparent substrate 101 is not limited to the above-mentioned material enumerated, as long as insulation transparent substrate 101 can be made to play a supporting role and transparent material.The shape of described insulation transparent substrate 101, size and thickness can be selected according to actual needs.In the present embodiment, described insulation transparent substrate 101 to be a thickness the be silicon dioxide layer of 500 microns.
The material of described plasmon layer 102 be metal to produce surface plasma excimer, as gold, silver, copper, iron, aluminium, nickel etc. or its alloy.Described plasmon layer 102 comprises the microstructure 1022 with chirality of setting of multiple cycle.The microstructure 1022 that the described cycle is arranged is by the preparation of the technology such as focused-ion-beam lithography or electron beam exposure processing layer gold.Described multiple microstructure 1022 interval is arranged so that this plasmon layer 102 can printing opacity.The figure of this microstructure 1022 is not limit, as long as have chirality.The thickness h of described microstructure 1022 is 30 nanometer ~ 100 nanometers, and the cycle is 300 nanometer ~ 1000 nanometers, is of a size of 100 nanometer ~ 500 nanometers.Be appreciated that described microstructure 1022 also can for being formed at the opening on a continuous metal layer.In the present embodiment, first at the golden film of described insulation transparent substrate 101 surface deposition one deck 100 nanometer thickness, then prepare by focused-ion-beam lithography the microstructure 1022 that multiple cycle is the periodic distribution of 300 nanometers.With further reference to Fig. 2-3, described microstructure 1022 comprises a rectangular body 1024 and a rectangle extended out by this rectangular body 1024 most advanced and sophisticated protruding 1026.Described rectangular body 1024 is an one-piece construction with described rectangle most advanced and sophisticated protruding 1026.Described rectangle most advanced and sophisticated protruding 1026 is arranged near one jiao of place.The most advanced and sophisticated long limit of protruding 1026 of described rectangle is concordant with one side of this rectangular body 1024.The length of side of described rectangular body 1024 is 200 nanometers, and the most advanced and sophisticated length of protruding 1026 of described rectangle is 45 nanometers, and wide is 28 nanometers.
Described refractive index controllable film 103 is arranged at the surface of described plasmon layer 102 away from described insulation transparent substrate 101, and part to extend in the opening of described plasmon layer 102 and with the surface contact of described insulation transparent substrate 101.Namely described refractive index controllable film 103 part is arranged at the surface of described plasmon layer 102, and part is arranged at the surface that this insulation transparent substrate 101 is exposed by the plurality of opening.Described refractive index controllable film 103 can be a plane or curved surface away from the surface of described insulation transparent substrate 101.The thickness H of described refractive index controllable film 103 is 100 nanometer ~ 800 nanometers, is preferably 200 nanometer ~ 500 nanometers.Described refractive index controllable film 103 comprises refractive index regulatable material, such as semiconductor under light illumination, nonlinear crystal, photorefractive material, photochromic material, or photo-isomerisable material etc.Described refractive index controllable film 103 can pass through the method preparations such as spin coating, spraying, printing, deposition.In the present embodiment, described refractive index controllable film 103 comprises a PMMA polymkeric substance 1034 and multiple ethyl red photo-isomerisable material 1032 be scattered in this polymkeric substance 1034.Described refractive index controllable film 103 thickness is 300 nanometers.The preparation method of described refractive index controllable film 103 forms a mixed liquor for being first dispersed in PMMA colloid by ethyl red photo-isomerisable material 1032, then this mixed liquor is coated on the surface of described plasmon layer 102 by the method for spin coating.
Refer to Fig. 4, the embodiment of the present invention provides a kind of and adopts optical nonlinearity polarization controlling element 100 of the present invention to regulate and control the method for incident light wave polarization, specifically comprises the following steps:
Step S10, adopts a polarized incident light 120 to irradiate this optical nonlinearity polarization controlling element 100 from described refractive index controllable film 103 side, and obtains the first Polarization Modulation emergent light 122 from this insulation transparent substrate 101 side; And
Step S20, a regulation and control light 140 is adopted to irradiate this optical nonlinearity polarization controlling element 100 from described refractive index controllable film 103 side, keep above-mentioned polarized incident light 120 to continue to irradiate simultaneously, and obtain the second Polarization Modulation emergent light 124 from this insulation transparent substrate 101 side.
In step S10, described insulation transparent substrate 101 to be a thickness the be silicon dioxide layer of 500 microns.Described plasmon layer 102 is golden microstructure 1022 array as described in Fig. 2-3.Described refractive index controllable film 103 comprises PMMA polymkeric substance 1034 and multiple ethyl red photo-isomerisable material 1032 be scattered in this polymkeric substance 1034.Described polarized incident light 120 is x-polarisation light, and the first Polarization Modulation emergent light 122 obtained after the modulation of this optical nonlinearity polarization controlling element 100 is elliptically polarized light, and its major axes orientation rotationangleφ, ellipse drift angle is χ.See Fig. 5, the embodiment of the present invention tests ellipse drift angle χ and the major axes orientation rotationangleφ of the first Polarization Modulation emergent light 122 of this optical nonlinearity polarization controlling element 100 pairs of different wave lengths obtained.The structure and material that the embodiment of the present invention adopts, has better polarization regulating effect to x-polarisation light.
In step S20, described regulation and control light 140 is the light that the refractive index of described refractive index controllable film 103 can be made to change.In the present embodiment, described regulation and control light 140 is polarized green light, and it can change the refractive index of ethyl red photo-isomerisable material.After described regulation and control light 140 irradiates, described second Polarization Modulation emergent light 124 detected.See Fig. 6, the ellipse drift angle χ of the first Polarization Modulation emergent light 122 of this optical nonlinearity polarization controlling element 100 pairs of different wave lengths that test obtains by the embodiment of the present invention and the ellipse drift angle χ of major axes orientation rotationangleφ and the second Polarization Modulation emergent light 124 and major axes orientation rotationangleφ contrast.As shown in Figure 6, after described regulation and control light 140 irradiates, the spectral characteristic of the second Polarization Modulation emergent light 124 obtained moves relative to the spectral characteristic generation wavelength of the first Polarization Modulation emergent light 122.See Fig. 7, respectively illustrate the ellipse drift angle χ of the first Polarization Modulation emergent light 122 of different wave length and the ellipse drift angle χ of major axes orientation rotationangleφ and the second Polarization Modulation emergent light 124 and major axes orientation rotationangleφ difference.
See Fig. 8 (a)-(b), be respectively the molecule structure change of ethyl red after green glow pre-irradiation.Because green glow irradiates, ethyl red generation bond angle is rotated, cause adopting the refractive index of the refractive index controllable film 103 of ethyl red to change, thus the wavelength that the optical rotational activity spectrum characteristic of this optical nonlinearity polarization controlling element 100 is occurred as shown in Figure 6 moves.
See Fig. 9, in the embodiment of the present invention, adopt regulation and control light 140 when irradiating, regulation and control light 140 and the time response by the second Polarization Modulation emergent light 124 after regulating and controlling scheme.As seen from Figure 9, this regulation process has time response faster, in about 300 microseconds, just can be risen by the intensity of the second Polarization Modulation emergent light 124 after regulating and controlling or drop to maximal value.
Be appreciated that in the method, the order that described polarized incident light 120 and regulation and control light 140 irradiate is not limit, as long as guarantee in sometime, described polarized incident light 120 and regulation and control light 140 irradiate this optical nonlinearity polarization controlling element 100 simultaneously.Such as, regulation and control light 140 first can be adopted to irradiate, then adopt polarized incident light 120 to irradiate, keep above-mentioned regulation and control light 140 to continue to irradiate simultaneously, thus directly obtain the second Polarization Modulation emergent light 124.
This optical nonlinearity polarization controlling element 100 has the following advantages: irradiate this optical nonlinearity polarization controlling element 100 by adopting corresponding regulation and control light 140, the refractive index of its refractive index controllable film 103 is caused to change, thus the polarization of this optical nonlinearity polarization controlling element 100 regulation and control spectral characteristic generation wavelength is moved, the method is simple.
Refer to Figure 10, the embodiment of the present invention provides a kind of polarized imaging system 10, and it comprises: a polarized light source 12, regulates and controls light source 14, delustring filter 16, imaging device 18 and above-mentioned optical nonlinearity polarization controlling element 100.
Described polarized light source 12 is for launching polarized incident light 120, make this polarized incident light 120 incident from refractive index controllable film 103 side of described optical nonlinearity polarization controlling element 100, and form the first Polarization Modulation emergent light 122 from insulation transparent substrate 101 side outgoing.In the present embodiment, described polarized light source 12 is a super continuous spectrums laser instrument, and it can emission wavelength be x-polarisation light between 650 nanometer-1000 nanometers, as polarized incident light 120.
Described regulation and control light source 14 is for launching regulation and control light 140, and make this regulation and control light 140 incident from refractive index controllable film 103 side of described optical nonlinearity polarization controlling element 100, thus change the refractive index of described refractive index controllable film 103, make to change into the second Polarization Modulation emergent light 124 from the first Polarization Modulation emergent light 122 of insulation transparent substrate 101 side outgoing.Described second Polarization Modulation emergent light 124 is radiated on described imaging device 18 and carries out imaging.In the present embodiment, described regulation and control light source 14 is a laser instrument, and it can emission wavelength be the green glow y-polarisation light of 532 nanometers, as regulation and control light 140.
Described delustring filter 16 for the regulation and control light 140 above-mentioned first Polarization Modulation emergent light 122 being carried out to delustring and filter from insulation transparent substrate 101 side outgoing, thus guarantees that only having described second Polarization Modulation emergent light 124 to be radiated on described imaging device 18 carries out imaging.Particularly, in the present embodiment, described delustring filter 16 comprises long pass filter sheet 162, quarter wave plate 164 and a polaroid 166.Described long pass filter sheet 162 is for filtering the green glow regulation and control light 140 from insulation transparent substrate 101 side outgoing.Described quarter wave plate 164 and polaroid 166 are for carrying out delustring to the first Polarization Modulation emergent light 122 from insulation transparent substrate 101 side outgoing.Described polaroid 166 is GlanTaylor prism.
Described imaging device 18 can be any can the device of imaging.In the present embodiment, described imaging device 18 is a device comprising the imaging of charge coupled cell (CCD).
The position relationship of described polarized light source 12, regulation and control light source 14, delustring filter 16, optical nonlinearity polarization controlling element 100 and imaging device 18 is not limit, as long as can meet above-mentioned optical path requirements.Particularly, in the present embodiment, described polarized light source 12, optical nonlinearity polarization controlling element 100, delustring filter 16 and imaging device 18 are disposed on straight line successively.Between described polarized light source 12 and described optical nonlinearity polarization controlling element 100, one 45 degree of dichroic mirrors 11 are set, thus the polarized incident light 120 that described polarized light source 12 is launched can by arriving described imaging device 18 after described dichroic mirror 11, described optical nonlinearity polarization controlling element 100 and described delustring filter 16.Described regulation and control light source 14 is arranged at described dichroic mirror 11 side, and its regulation and control light 140 launched can overlap with described polarized incident light 120 after described dichroic mirror 11 reflects.The regulation and control light 140 that described regulation and control light source 14 is launched is appreciated that the angle of described dichroic mirror 11 is not limited to 45 degree, as long as can be radiated on described optical nonlinearity polarization controlling element 100 after described dichroic mirror 11 reflects.The angle of described dichroic mirror 11 is preferably 45 degree, when can guarantee that the light spot shape of described regulation and control light 140 is radiated on described optical nonlinearity polarization controlling element 100 after described dichroic mirror 11 reflects and described dichroic mirror 11 reflect before be consistent.
Further, described polarized imaging system 10 also comprises one first light path regulating device 13, for regulating the light path of described polarized incident light 120, and improves incident light quality by spatial filtering.Described first light path regulating device 13 is alternate configurations.Particularly, described first light path regulating device 13 comprises one first convex lens 132,1 first pin hole 134,1 second convex lens 136 and one the 3rd convex lens 138 being set in turn in described polarized light source 12 light-emitting area side.Described first convex lens 132 converge for the polarized incident light 120 sent described polarized light source 12.The spatial high-frequency composition of the polarized incident light 120 that described first pin hole 134 sends for filtering polarized light source 12, improves the quality of laser facula pattern.Be appreciated that if described polarized incident light 120 is laser and the Gaussian distribution of facular model is better, then can omit described first pin hole 134.Described second convex lens 136 are for collimating the light beam of described first pin hole 134.Described 3rd convex lens 138 and the first microcobjective 17 are restrainted for incident light 120 is carried out contracting, and parallel radiation is in described optical nonlinearity polarization controlling element 100 surface.
Further, described polarized imaging system 10 also comprises one second light path regulating device 15, for regulating the light path of described regulation and control light 140, thus improves incident light quality.Described second light path regulating device 15 is alternate configurations.Particularly, described second light path regulating device 15 comprises the 4th convex lens 152,1 second pin hole 154, the 5th convex lens 156, imaging masks 157 and the 6th convex lens 158 that is set in turn in described regulation and control light source 14 light-emitting area side.Described second pin hole 154 is for improving the Gaussian distribution of laser facula pattern.The distribution of described regulation and control light 140 facular model is appreciated that if better, then can omit described second pin hole 154.
Further, described polarized imaging system 10 also comprises the first microcobjective 17 and the second microcobjective 19 being arranged at described optical nonlinearity polarization controlling element 100 both sides respectively.Described first microcobjective 17 is 10 × (N.A.=0.25) microcobjectives being arranged between described dichroic mirror 11 and described optical nonlinearity polarization controlling element 100.Described second microcobjective 19 is 10 × (N.A.=0.26) microcobjectives being arranged between described delustring filter 16 and described optical nonlinearity polarization controlling element 100.Described first microcobjective 17 and described 6th convex lens 158 coordinate, and described imaging masks 157 can be imaged on described optical nonlinearity polarization controlling element 100 surface.Described first microcobjective 17 and described 3rd convex lens 138 light beam of described polarized incident light 120 can be reduced and parallel radiation in the surface of described optical nonlinearity polarization controlling element 100.Described second microcobjective 19 is for collecting and collimate the transmitted light of described optical nonlinearity polarization controlling element 100.
Further, described polarized imaging system 10 also comprises one and is arranged at imaging len 182 between described delustring filter 16 and imaging device 18.Described imaging len 182 images in described imaging device 18 for making the second Polarization Modulation emergent light 124 through described delustring filter 16 converge.Described imaging len 182 is convex lens.
The embodiment of the present invention adopts above-mentioned polarized imaging system 10 to carry out imaging experiment, and concrete steps are as follows.First, open described polarized light source 12 and make its red-emitting polarized incident light 120, make this polarized incident light 120 incident from refractive index controllable film 103 side of described optical nonlinearity polarization controlling element 100, and form the first Polarization Modulation emergent light 122 from insulation transparent substrate 101 side outgoing, and this first Polarization Modulation emergent light 122 is radiated on described imaging device 18.Secondly, regulate described delustring filter 16, make described first Polarization Modulation emergent light 122 delustring, described imaging device 18 cannot receive signal.Finally, open described regulation and control light source 14 transmitting green light regulation and control light 140, and make this regulation and control light 140 incident from refractive index controllable film 103 side of described optical nonlinearity polarization controlling element 100, thus change the refractive index of described refractive index controllable film 103, make to change into the second Polarization Modulation emergent light 124 from the first Polarization Modulation emergent light 122 of insulation transparent substrate 101 side outgoing.Described second Polarization Modulation emergent light 124 is radiated on described imaging device 18 and carries out imaging.See Figure 11, described imaging masks 157 has a cruciform perforate, and therefore, the light spot shape being radiated at the regulation and control light 140 on described refractive index controllable film 103 is also cruciform.See Figure 12, after opening described regulation and control light source 14, the imaged shape on described imaging device 18 is also cruciform.
Polarized imaging system 10 provided by the invention can control the imaging on described imaging device 18 by described regulation and control light source 14, method is simple.
In addition, those skilled in the art can also do other changes in spirit of the present invention, and these changes done according to the present invention's spirit all should be included in the present invention's scope required for protection.
Claims (10)
1. a polarized imaging system, is characterized in that, it comprises:
One optical nonlinearity polarization controlling element, this optical nonlinearity polarization controlling element comprises: an insulation transparent substrate; The one metal plasma excimer layer being arranged at a surface of this insulation transparent substrate, described plasmon layer comprises the microstructure with chirality that multiple cycle arranges; And one is arranged at this metal plasma excimer layer away from the surface of this insulation transparent substrate and by the refractive index controllable film of this metal plasma excimer layer covering; Described refractive index controllable film comprises refractive index regulatable material under light illumination;
One polarized light source, described polarized light source, for launching polarized incident light, makes this polarized incident light incident from the refractive index controllable film side of described optical nonlinearity polarization controlling element, and forms the first Polarization Modulation emergent light from insulation transparent substrate side outgoing;
One regulation and control light source, described regulation and control light source is for launching regulation and control light, and make this regulation and control light incident from the refractive index controllable film side of described optical nonlinearity polarization controlling element, thus change the refractive index of described refractive index controllable film, make to change into the second Polarization Modulation emergent light from the first Polarization Modulation emergent light of this insulation transparent substrate side outgoing;
One delustring filter, described delustring filter is used for the regulation and control light that above-mentioned first Polarization Modulation emergent light is carried out to delustring and filters from insulation transparent substrate side outgoing; And
One imaging device, described imaging device is used for carrying out imaging to the light received.
2. polarized imaging system as claimed in claim 1, is characterized in that, described refractive index controllable film portion to extend in the opening of described plasmon layer and with the surface contact of described insulation transparent substrate; Described refractive index under light illumination regulatable material is semiconductor material, nonlinear crystalline material, photorefractive material, one or more in photochromic material and photo-isomerisable material.
3. polarized imaging system as claimed in claim 2, it is characterized in that, described refractive index controllable film comprises a poly methyl methacrylate polymer and multiple ethyl red photo-isomerisable material be scattered in this polymkeric substance; Described metal is gold, silver, copper, iron, aluminium, nickel etc. or its alloy; The thickness of described microstructure is 30 nanometer ~ 100 nanometers, and the cycle is 300 nanometer ~ 1000 nanometers, is of a size of 100 nanometer ~ 500 nanometers.
4. polarized imaging system as claimed in claim 3, it is characterized in that, described multiple microstructure interval arranges formation an array; Described microstructure comprises the most advanced and sophisticated projection of rectangle that a rectangular body and is extended out by this rectangular body; Described rectangular body and the most advanced and sophisticated projection of described rectangle are an one-piece construction; Described rectangle tip is protruding to be arranged near one jiao of place, and the most advanced and sophisticated long limit of projection of described rectangle and the concordant of this rectangular body.
5. polarized imaging system as claimed in claim 1, is characterized in that, comprise dichroic mirror further; Described polarized light source, optical nonlinearity polarization controlling element, delustring filter and imaging device are disposed on straight line successively; Described dichroic mirror is arranged between described polarized light source and described optical nonlinearity polarization controlling element, thus the polarized incident light that described polarized light source is launched can by arriving described imaging device after described dichroic mirror, described optical nonlinearity polarization controlling element and described delustring filter; Described regulation and control light source is arranged at described dichroic mirror side, and its regulation and control light launched can overlap with described polarized incident light after described dichroic mirror reflects.
6. polarized imaging system as claimed in claim 5, it is characterized in that, the angle of described dichroic mirror and this straight line is 45 degree, thus is consistent when guaranteeing that the light spot shape of described regulation and control light is radiated on described optical nonlinearity polarization controlling element after described dichroic mirror reflects and before described dichroic mirror reflects.
7. polarized imaging system as claimed in claim 6, it is characterized in that, comprise first light path regulating device and be arranged between described polarized light source and described dichroic mirror further and be arranged at the second light path regulating device between described regulation and control light source and described dichroic mirror; Described first light path regulating device comprises one first convex lens, one first pin hole, one second convex lens and one the 3rd convex lens that are set in turn in described polarized light source light-emitting area side; Described second light path regulating device comprises the 4th convex lens being set in turn in side, described regulation and control light source luminescent face, one second pin hole, one the 5th convex lens, an imaging masks and the 6th convex lens.
8. polarized imaging system as claimed in claim 7, is characterized in that, comprise one further and be arranged at the first microcobjective between described dichroic mirror and described optical nonlinearity polarization controlling element; One is arranged at the second microcobjective between described delustring filter and described optical nonlinearity polarization controlling element; And one is arranged at imaging len between described delustring filter and imaging device.
9. adopt a method for the polarized imaging system imaging as described in claim 1 to 8 any one, it comprises:
Opening described polarized light source makes it launch polarized incident light, make this polarized incident light incident from the refractive index controllable film side of described optical nonlinearity polarization controlling element, and form the first Polarization Modulation emergent light from insulation transparent substrate side outgoing, and this first Polarization Modulation emergent light is radiated on described imaging device;
Regulate described delustring filter, make described first Polarization Modulation emergent light delustring, described imaging device cannot receive signal; And
Open described regulation and control light source and launch regulation and control light, and make this regulation and control light incident from the refractive index controllable film side of described optical nonlinearity polarization controlling element, thus change the refractive index of described refractive index controllable film, make to change into the second Polarization Modulation emergent light from the first Polarization Modulation emergent light of insulation transparent substrate side outgoing, and described second Polarization Modulation emergent light is radiated on described imaging device and carries out imaging.
10. the method for imaging as claimed in claim 9, it is characterized in that, described insulation transparent substrate is silicon dioxide layer, described plasmon layer is golden micro structure array, and described refractive index controllable film comprises poly methyl methacrylate polymer and multiple ethyl red photo-isomerisable material be scattered in this polymkeric substance; Described polarized incident light is x-polarisation ruddiness, and described first Polarization Modulation emergent light and the second Polarization Modulation emergent light are elliptically polarized light, and described regulation and control light is polarized green light; The ellipse drift angle χ of described second Polarization Modulation emergent light and major axes orientation rotationangleφ move relative to the ellipse drift angle χ of described first Polarization Modulation emergent light and major axes orientation rotationangleφ generation wavelength; The pattern of described second Polarization Modulation emergent light imaging on described imaging device is identical with the pattern of described imaging masks.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510801683.5A CN105319738B (en) | 2015-11-19 | 2015-11-19 | Polarized imaging system and the method using polarized imaging system imaging |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510801683.5A CN105319738B (en) | 2015-11-19 | 2015-11-19 | Polarized imaging system and the method using polarized imaging system imaging |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN105319738A true CN105319738A (en) | 2016-02-10 |
| CN105319738B CN105319738B (en) | 2018-03-20 |
Family
ID=55247482
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201510801683.5A Active CN105319738B (en) | 2015-11-19 | 2015-11-19 | Polarized imaging system and the method using polarized imaging system imaging |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN105319738B (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107024452A (en) * | 2017-04-27 | 2017-08-08 | 河北工业大学 | A kind of real-time monitoring device and method of photorefractive material microcell refractive index |
| CN111953423A (en) * | 2020-08-17 | 2020-11-17 | 桂林电子科技大学 | Method for determining incident light bandwidth for avoiding aliasing in broadband polarization imaging based on spatial modulation polarization imaging |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101788726A (en) * | 2010-03-30 | 2010-07-28 | 华中科技大学 | Semiconductor full gloss polarization switch |
| CN102681215A (en) * | 2012-06-08 | 2012-09-19 | 中国科学技术大学 | Wide-spectrum all-optical switch |
| CN103616774A (en) * | 2013-12-12 | 2014-03-05 | 山西大学 | Control method of all-optical switch |
| CN103996966A (en) * | 2014-05-26 | 2014-08-20 | 浙江大学城市学院 | All-optical switch based on rubidium-atom optical filter and method thereof |
-
2015
- 2015-11-19 CN CN201510801683.5A patent/CN105319738B/en active Active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101788726A (en) * | 2010-03-30 | 2010-07-28 | 华中科技大学 | Semiconductor full gloss polarization switch |
| CN102681215A (en) * | 2012-06-08 | 2012-09-19 | 中国科学技术大学 | Wide-spectrum all-optical switch |
| CN103616774A (en) * | 2013-12-12 | 2014-03-05 | 山西大学 | Control method of all-optical switch |
| CN103996966A (en) * | 2014-05-26 | 2014-08-20 | 浙江大学城市学院 | All-optical switch based on rubidium-atom optical filter and method thereof |
Non-Patent Citations (1)
| Title |
|---|
| LU WEN-QIANG 等: "Enhancement of modulation depth of an all-optical switch using an azo dye-ethyl red film", 《CHIN. PHYS. B》 * |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107024452A (en) * | 2017-04-27 | 2017-08-08 | 河北工业大学 | A kind of real-time monitoring device and method of photorefractive material microcell refractive index |
| CN107024452B (en) * | 2017-04-27 | 2019-11-12 | 河北工业大学 | A kind of real-time monitoring device and method of photorefractive material microcell refractive index |
| CN111953423A (en) * | 2020-08-17 | 2020-11-17 | 桂林电子科技大学 | Method for determining incident light bandwidth for avoiding aliasing in broadband polarization imaging based on spatial modulation polarization imaging |
| CN111953423B (en) * | 2020-08-17 | 2023-07-21 | 桂林电子科技大学 | Method for determining limit bandwidth based on space modulation polarization imaging |
Also Published As
| Publication number | Publication date |
|---|---|
| CN105319738B (en) | 2018-03-20 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN101512422B (en) | Method of forming electrochromic layer pattern, method of manufacturing electrochromic device using the same, and electrochromic device including electrochromic layer pattern | |
| JPH05502950A (en) | Method for manufacturing optically active waveguides | |
| JP2021529981A (en) | Optical fiber meta-surface and related methods | |
| JP2004109892A (en) | Optical path switching apparatus and method for switching optical path | |
| CN103792605A (en) | Forked liquid crystal grating preparation method and application of forked liquid crystal grating in vortex beam | |
| US11069544B2 (en) | Rapid thermal processing method and apparatus for programming the pinned layer of spintronic devices | |
| CN105319738A (en) | Polarization imaging system and method adopting same | |
| CN106918932A (en) | A kind of optically controlled liquid crystal spatial light modulator and its application | |
| CN105319737A (en) | Optical non-linear polarization controlling element and method for controlling incident light wave polarization | |
| Gorkunov et al. | Superperiodic liquid-crystal metasurfaces for electrically controlled anomalous refraction | |
| CN108227063B (en) | Integrated polarization grating preparation system and method | |
| Yu et al. | Photo-reconfigurable and electrically switchable spatial terahertz wave modulator | |
| EP1020739A3 (en) | Irradiation device for producing polarized light to optically align a liquid crystal cell element | |
| CN103345121B (en) | A kind of multi-function membrane lens based on nano-photon structure are prepared and application | |
| CN101975976B (en) | Photonic crystal micro-nano structure direct-writing method based on metal nanoparticles | |
| CN115202088B (en) | Phase-tunable spin terahertz source device and preparation method and application thereof | |
| CN109613764A (en) | Single-chip integration electrically-controlled liquid crystal bimodulus micro mirror, preparation method and optical microscopy | |
| CN206331228U (en) | A kind of micro-nano structure Written Device interfered based on rotary sample and double laser beams | |
| CN108535881A (en) | Perovskite antenna and preparation method thereof with super surface | |
| JP2003114624A (en) | Flat panel display device, method for manufacturing the same and device for formation of spacer | |
| CN103197366A (en) | Polarizing filter based on heterojunction grating and preparation method | |
| CN113504598A (en) | Liquid crystal film depolarizer based on one-time exposure and preparation method thereof | |
| Wang et al. | Flexible generation of structured terahertz fields via programmable exchange-biased spintronic emitters | |
| CN109814203A (en) | A method of lithium niobate fiber waveguide is prepared using laser direct-writing crystallizing titanium dioxide sol pellicle | |
| Tam et al. | Nanoscopic patterned photo-alignment for electrically switchable liquid crystal Pancharatnam-Berry phase diffractive lens |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| OL01 | Intention to license declared |