CN105220215B - A kind of obstacles in quit of ultraprecise Al and Al-alloy electroless nickel-phosphorus alloy plating layer on surface - Google Patents

A kind of obstacles in quit of ultraprecise Al and Al-alloy electroless nickel-phosphorus alloy plating layer on surface Download PDF

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CN105220215B
CN105220215B CN201510741737.3A CN201510741737A CN105220215B CN 105220215 B CN105220215 B CN 105220215B CN 201510741737 A CN201510741737 A CN 201510741737A CN 105220215 B CN105220215 B CN 105220215B
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ultraprecise
plating layer
alloy
electroless nickel
alloy plating
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CN105220215A (en
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王殿龙
赵永蓬
徐强
王骐
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Harbin Institute of Technology
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Abstract

A kind of obstacles in quit of ultraprecise Al and Al-alloy electroless nickel-phosphorus alloy plating layer on surface, it is related to the obstacles in quit of piece surface Ni-P Chemical Plating Layer.The invention solves the problems that existing stripping Ni-P Chemical Plating Layer method can reduce the problem of ultraprecise aluminium and aluminium alloy matrix surface precision and dimensional accuracy.Preparation method:First, non-aqueous solution is configured;2nd, step is stripped.The present invention is used for a kind of stripping of ultraprecise Al and Al-alloy electroless nickel-phosphorus alloy plating layer on surface.

Description

A kind of stripping of ultraprecise Al and Al-alloy electroless nickel-phosphorus alloy plating layer on surface Method
Technical field
The present invention relates to the obstacles in quit of piece surface Ni-P Chemical Plating Layer.
Background technology
The obstacles in quit of electroless nickel-phosphorus alloy plating layer on surface has range of application higher.Such as, in current microelectronics Photoetching technique, using develop into by the use of 13.5nm even shorter wavelengths of extreme ultraviolet as light source great scale integrated circuit Photoetching technique.The extreme ultraviolet that light source is produced need to collect focusing by collecting mirror, and the extreme ultraviolet for focusing on is obtained in focal point For exposing, 13.5nm even shorter extreme ultraviolet is collected, is typically only capable to using the reflection technology of aspherical mirror glancing incidence, A kind of wherein conventional speculum be by hyperboloid and the double aspherical face types of ellipsoid be connected combination double aspherical glancing incidence it is anti- Mirror structure is penetrated, and it is descending by bore yardstick, if the grazing incidence mirror piece composition of dried layer shell structure.At present, shell knot The grazing incidence mirror piece of structure is machined with two kinds of technology paths, and one kind is referred to as mandrel ejection technique, and it is made by aluminum alloy materials It is mandrel, its Surface Finishing is that hyperboloid is connected the double aspherical face type of combination with ellipsoid into face type, and Surface Machining is coarse Degree requirement reaches nanometer scale, and one layer of nickel-phosphorus alloy film is plated above, and roughness is further improved up to 1~2nm after polishing, thereon Face plates golden film again, and the nickel shell of golden film outside electroforming 2mm is then different using thermal coefficient of expansion, by the golden film demoulding to nickel shell Surface, the inner surface for obtaining shell structure is plunder reflecting optics of double aspherical face type roughness up to 1~2nm, then by size chi Very little different eyeglass is integrated, and composition collects mirror.
Another technology is referred to as direct turning technology, and its processing technology is:First by 2mm shell structurre aluminum alloy parts The face type of surface roughing aspherical composition in pairs, inner surface accuracy diamond lathe processing reaches 5nm, then uses chemical plating The nickel-phosphorus alloy film of 200 microns is plated in inner surface, then below inner surface accuracy 5nm is worked into diamond lathe, then The surface accuracy of 1-2nm is reached by finishing polish.
Both the above technology is directed to that aluminum alloy substrate material machining accuracy is very high, and its face type and surface accuracy are required It is very high, nickel-phosphorus alloy film layer is plated, often due to film layer has some or uses surface accuracy after certain hour Decline, it is necessary to plated after film layer is stripped again, at this moment require that moving back membrane process will necessarily ensure that matrix material is not suffered a loss, face type and Surface accuracy is not destroyed.It is, thus, sought for a kind of new technology, new technology, it is ensured that during stripping nickel-phosphorus alloy film layer, keep substrate Face type and surface accuracy are constant, and the present invention is proposed according to this needs.
The solution of existing stripping Ni-P Chemical Plating Layer is molten because the polarity of hydrone is strong with water as solvent at present Oxidant (such as NO in liquid3 -Deng) in the presence of hydrone, the corrosivity to aluminum substrate is strong, can all reduce ultraprecise aluminium and aluminium The surface accuracy and dimensional accuracy of alloy substrate, cause Al and Al-alloy to be scrapped.Therefore, exploitation is directed to high Precision Aluminium and aluminium The non-aqueous solution decoating liquid of alloy surface ni-p alloy coating, reduces the corrosivity of polarity and oxidant to aluminum substrate of solvent, protects Hold the surface accuracy and dimensional accuracy of aluminium and aluminium alloy, creative and practical significance.
The content of the invention
The invention solves the problems that existing stripping Ni-P Chemical Plating Layer method can reduce ultraprecise aluminium and alloy matrix aluminum table The problem of face precision and dimensional accuracy, and a kind of moving back for ultraprecise Al and Al-alloy electroless nickel-phosphorus alloy plating layer on surface is provided Except method.
A kind of obstacles in quit of ultraprecise Al and Al-alloy electroless nickel-phosphorus alloy plating layer on surface, specifically according to following What step was carried out:
First, non-aqueous solution is configured:By NaNO3, caustic alcohol, absolute ethyl alcohol and glycerine mixing, obtain non-aqueous solution;
Described absolute ethyl alcohol is 100 with the volume ratio of glycerine:(1~10);NaNO in described non-aqueous solution3Concentration It is 1g/L~5g/L;The concentration of caustic alcohol is 10g/L~50g/L in described non-aqueous solution;
2nd, step is stripped:1. it is negative electrode with the titanium net for scribbling ruthenium-oxide, to be anode by strip part, will be by strip zero Part anode is put into non-aqueous solution with the titanium net negative electrode for scribbling ruthenium-oxide, then applies constant current constant voltage in negative electrode and anode both sides Dc source, first the dc source electric current in constant current is 1A/m2~10A/m2Under carry out constant-current electrolysis stripping, in the direct current of constant current Source current is 1A/m2~10A/m2When lower, the voltage corresponding to the dc source of constant current is U V, until the dc source of constant current Voltage is increased to (U+0.2) V, and then carrying out electrolysis in the case where the direct current power source voltage of constant pressure is for (U+0.2) V exits, until constant pressure Dc source electric current be down to 0A/m2Untill, that is, complete ultraprecise Al and Al-alloy electroless nickel-phosphorus alloy plating layer on surface Obstacles in quit;
Described is ultraprecise aluminum substrate zero of the electroless nickel-phosphorus alloy plating layer on surface thickness more than 100 microns by strip part The ultraprecise alloy matrix aluminum part of part or electroless nickel-phosphorus alloy plating layer on surface thickness more than 100 microns.
The beneficial effects of the invention are as follows:Ultraprecise aluminum substrate part or ultraprecise alloy matrix aluminum are protected in non-aqueous solution Piece surface is not corroded, and protects the dimensional accuracy and surface accuracy of part not to be destroyed.Reflected for double aspherical glancing incidences The direct turnery processing of mirror, shell aluminum alloy substrate inside surface roughness is 5 nanometers, and 200 microns of chemical nickel phosphorus plating thicknesses of layers is moved back Constant with diamond lathe check surface type after film, surface roughness still keeps 5 rans, again chemical plating nickel-phosphorus alloy film, It is less than 5 nanometers with diamond lathe smart car and artificial surface of polished roughness again again, it was demonstrated that what patent of the present invention was proposed moves back Membrane technology is successful.Therefore, the invention is applied to moving back for ultraprecise Al and Al-alloy electroless nickel-phosphorus alloy plating layer on surface Remove.
The present invention is used for a kind of obstacles in quit of ultraprecise Al and Al-alloy electroless nickel-phosphorus alloy plating layer on surface.
Brief description of the drawings
Fig. 1 is that the LY12 aluminium alloys shell of the ultraprecise reflecting optics before embodiment stripping inner surface ni-p alloy coating shines Piece;
Fig. 2 is that the LY12 aluminium alloys shell of the ultraprecise reflecting optics after embodiment stripping inner surface ni-p alloy coating shines Piece;
Fig. 3 be embodiment ultraprecise reflecting optics LY12 aluminium alloys shell stripping inner surface ni-p alloy coating after change again Learn plating nickel-phosphorus alloy film and with diamond lathe smart car and the preliminary ultraprecise reflecting optics photo for manually polishing.
Specific embodiment
Specific embodiment one:A kind of ultraprecise Al and Al-alloy surface chemical Ni-P-plating described in present embodiment The obstacles in quit of alloy-layer, specifically follows the steps below:
First, non-aqueous solution is configured:By NaNO3, caustic alcohol, absolute ethyl alcohol and glycerine mixing, obtain non-aqueous solution;
Described absolute ethyl alcohol is 100 with the volume ratio of glycerine:(1~10);NaNO in described non-aqueous solution3Concentration It is 1g/L~5g/L;The concentration of caustic alcohol is 10g/L~50g/L in described non-aqueous solution;
2nd, step is stripped:1. it is negative electrode with the titanium net for scribbling ruthenium-oxide, to be anode by strip part, will be by strip zero Part anode is put into non-aqueous solution with the titanium net negative electrode for scribbling ruthenium-oxide, then applies constant current constant voltage in negative electrode and anode both sides Dc source, first the dc source electric current in constant current is 1A/m2~10A/m2Under carry out constant-current electrolysis stripping, in the direct current of constant current Source current is 1A/m2~10A/m2When lower, the voltage corresponding to the dc source of constant current is U V, until the dc source of constant current Voltage is increased to (U+0.2) V, and then carrying out electrolysis in the case where the direct current power source voltage of constant pressure is for (U+0.2) V exits, until constant pressure Dc source electric current be down to 0A/m2Untill, that is, complete ultraprecise Al and Al-alloy electroless nickel-phosphorus alloy plating layer on surface Obstacles in quit;
Described is ultraprecise aluminum substrate zero of the electroless nickel-phosphorus alloy plating layer on surface thickness more than 100 microns by strip part The ultraprecise alloy matrix aluminum part of part or electroless nickel-phosphorus alloy plating layer on surface thickness more than 100 microns.
The beneficial effect of present embodiment is:Ultraprecise aluminum substrate part or ultraprecise aluminium alloy are protected in non-aqueous solution Base part surface is not corroded, and protects the dimensional accuracy and surface accuracy of part not to be destroyed.For double aspherical glancing incidences The direct turnery processing of speculum, shell aluminum alloy substrate inside surface roughness is 5 nanometers, and chemical nickel phosphorus plating thicknesses of layers 200 is micro- Rice, moves back constant with diamond lathe check surface type after film, and surface roughness still keeps 5 rans, and chemical nickel phosphorus plating is closed again Golden film, then again with diamond lathe smart car and artificial surface of polished roughness less than 5 nanometers, it was demonstrated that patent of the present invention is proposed To move back membrane technology formula successful.Therefore, the invention is applied to ultraprecise Al and Al-alloy electroless nickel-phosphorus alloy plating layer on surface Stripping.
Nickel-phosphorus alloy coating is stripped in non-aqueous solution of the invention can keep ultraprecise aluminum or aluminum alloy part substrate The principle of dimensional accuracy and surface accuracy is that absolute ethyl alcohol is weak with the mixed solvent molecular polarity of glycerine, will not destroy oxidant (NO3 -) in the passivating film of aluminium surface formation, so as to keep the surface accuracy and dimensional accuracy of aluminium and aluminium alloy.
Specific embodiment two:Present embodiment from unlike specific embodiment one:It is anhydrous described in step one Ethanol is 100 with the volume ratio of glycerine:(2~5).Other are identical with specific embodiment one.
Specific embodiment three:Unlike one of present embodiment and specific embodiment one or two:Institute in step one The absolute ethyl alcohol stated is 100 with the volume ratio of glycerine:2.Other are identical with specific embodiment one or two.
Specific embodiment four:Unlike one of present embodiment and specific embodiment one to three:Institute in step one The absolute ethyl alcohol stated is 100 with the volume ratio of glycerine:5.Other are identical with specific embodiment one to three.
Specific embodiment five:Unlike one of present embodiment and specific embodiment one to four:Institute in step one NaNO in the non-aqueous solution stated3Concentration be 2g/L.Other are identical with specific embodiment one to four.
Specific embodiment six:Unlike one of present embodiment and specific embodiment one to five:Institute in step one The concentration of caustic alcohol is 20g/L in the non-aqueous solution stated.Other are identical with specific embodiment one to five.
Specific embodiment seven:Unlike one of present embodiment and specific embodiment one to six:In step 2 The electric current of the dc source of constant current is 2A/m2~5A/m2Under carry out constant-current electrolysis stripping.Other and specific embodiment one to six It is identical.
Specific embodiment eight:Unlike one of present embodiment and specific embodiment one to seven:In step 2 The electric current of the dc source of constant current is 2A/m2Under carry out constant-current electrolysis stripping.Other are identical with specific embodiment one to seven.
Specific embodiment nine:Unlike one of present embodiment and specific embodiment one to eight:In step 2 The electric current of the dc source of constant current is 5A/m2Under carry out constant-current electrolysis stripping.Other are identical with specific embodiment one to eight.
Specific embodiment ten:Unlike one of present embodiment and specific embodiment one to nine:Institute in step 2 Ultraprecise alloy matrix aluminum part of the electroless nickel-phosphorus alloy plating layer on surface thickness stated more than 100 microns is surface chemical Ni-P-plating The LY12 aluminium alloy shells of ultraprecise reflecting optics of the alloy layer thickness more than 100 microns.Other with specific embodiment one to Nine is identical.
Beneficial effects of the present invention are verified using following examples:
Embodiment:
A kind of obstacles in quit of the ultraprecise Al and Al-alloy electroless nickel-phosphorus alloy plating layer on surface described in the present embodiment, Specifically follow the steps below:
First, non-aqueous solution is configured:By NaNO3, caustic alcohol, absolute ethyl alcohol and glycerine mixing, obtain non-aqueous solution;
Described absolute ethyl alcohol is 100 with the volume ratio of glycerine:2;NaNO in described non-aqueous solution3Concentration be 2g/ L;The concentration of caustic alcohol is 20g/L in described non-aqueous solution;
2nd, step is stripped:1. it is negative electrode with the titanium net for scribbling ruthenium-oxide, to be anode by strip part, will be by strip zero Part anode is put into non-aqueous solution with the titanium net negative electrode for scribbling ruthenium-oxide, then applies constant current constant voltage in negative electrode and anode both sides Dc source, first the dc source electric current in constant current is 2A/m2Under carry out constant-current electrolysis stripping, in the dc source electric current of constant current It is 2A/m2When lower, the voltage corresponding to the dc source of constant current is U V, until the direct current power source voltage of constant current is increased to (U+ 0.2) V, then carries out electrolysis and exits in the case where the voltage of the dc source of constant pressure is for (U+0.2) V, until the dc source electricity of constant pressure Stream is down to 0A/m2Untill, obtain stripping the LY12 aluminium alloy shells of the ultraprecise reflecting optics after inner surface ni-p alloy coating, i.e., Complete the obstacles in quit of ultraprecise Al and Al-alloy electroless nickel-phosphorus alloy plating layer on surface;
Described in step 2 is ultraprecise of the electroless nickel-phosphorus alloy plating layer on surface thickness more than 100 microns by strip part The LY12 aluminium alloy shells of reflecting optics.
Fig. 1 is that the LY12 aluminium alloys shell of the ultraprecise reflecting optics before embodiment stripping inner surface ni-p alloy coating shines Piece;Fig. 2 is the LY12 aluminium alloy shell photos of the ultraprecise reflecting optics after embodiment stripping inner surface ni-p alloy coating;Fig. 3 Be embodiment ultraprecise reflecting optics LY12 aluminium alloys shell stripping inner surface ni-p alloy coating after again chemical nickel phosphorus plating close Golden film and with diamond lathe smart car and the ultraprecise reflecting optics photo of artificial polishing.Through diamond lathe inspection, for double The aspherical direct turnery processing of grazing incidence mirror, shell aluminum alloy substrate inside surface roughness is 5 nanometers, chemical nickel phosphorus plating film 200 microns of thickness degree, after the stripping of nickel-phosphorus alloy film layer, LY12 aluminium closes matrix and maintains good finish, uses diamond lathe Check surface type is constant, and surface roughness still keeps 5 rans;Again chemical plating nickel-phosphorus alloy film, then diamond car is used again Bed smart car and artificial surface of polished roughness are less than 5 nanometers.

Claims (10)

1. a kind of obstacles in quit of ultraprecise Al and Al-alloy electroless nickel-phosphorus alloy plating layer on surface, it is characterised in that Yi Zhongchao The obstacles in quit of accurate Al and Al-alloy electroless nickel-phosphorus alloy plating layer on surface is followed the steps below:
First, non-aqueous solution is configured:By NaNO3, caustic alcohol, absolute ethyl alcohol and glycerine mixing, obtain non-aqueous solution;
Described absolute ethyl alcohol is 100 with the volume ratio of glycerine:(1~10);NaNO in described non-aqueous solution3Concentration be 1g/ L~5g/L;The concentration of caustic alcohol is 10g/L~50g/L in described non-aqueous solution;
2nd, step is stripped:1. it is negative electrode with the titanium net for scribbling ruthenium-oxide, to be anode by strip part, will be by strip part sun Pole is put into non-aqueous solution with the titanium net negative electrode for scribbling ruthenium-oxide, and the direct current of constant current constant voltage is then applied in negative electrode and anode both sides Power supply, first the dc source current density in constant current is 1A/m2~10A/m2Under carry out constant-current electrolysis stripping, in the direct current of constant current Source current density is 1A/m2~10A/m2When lower, the voltage corresponding to the dc source of constant current is U V, until the direct current of constant current Supply voltage is increased to (U+0.2) V, then carries out electrolytic removal in the case where the direct current power source voltage of constant pressure is for (U+0.2) V, until The dc source current density of constant pressure is down to 0A/m2Untill, that is, complete ultraprecise Al and Al-alloy surface chemical Ni-P-plating The obstacles in quit of alloy-layer;
It is described by strip part be ultraprecise aluminum substrate part of the electroless nickel-phosphorus alloy plating layer on surface thickness more than 100 microns or Ultraprecise alloy matrix aluminum part of the electroless nickel-phosphorus alloy plating layer on surface thickness more than 100 microns.
2. the stripping side of a kind of ultraprecise Al and Al-alloy electroless nickel-phosphorus alloy plating layer on surface according to claim 1 Method, it is characterised in that absolute ethyl alcohol and the volume ratio of glycerine described in step one are 100:(2~5).
3. the stripping side of a kind of ultraprecise Al and Al-alloy electroless nickel-phosphorus alloy plating layer on surface according to claim 1 Method, it is characterised in that absolute ethyl alcohol and the volume ratio of glycerine described in step one are 100:2.
4. the stripping side of a kind of ultraprecise Al and Al-alloy electroless nickel-phosphorus alloy plating layer on surface according to claim 1 Method, it is characterised in that absolute ethyl alcohol and the volume ratio of glycerine described in step one are 100:5.
5. the stripping side of a kind of ultraprecise Al and Al-alloy electroless nickel-phosphorus alloy plating layer on surface according to claim 1 Method, it is characterised in that NaNO in the non-aqueous solution described in step one3Concentration be 2g/L.
6. the stripping side of a kind of ultraprecise Al and Al-alloy electroless nickel-phosphorus alloy plating layer on surface according to claim 1 Method, it is characterised in that the concentration of caustic alcohol is 20g/L in the non-aqueous solution described in step one.
7. the stripping side of a kind of ultraprecise Al and Al-alloy electroless nickel-phosphorus alloy plating layer on surface according to claim 1 Method, it is characterised in that the dc source current density in step 2 in constant current is 2A/m2~5A/m2Under carry out constant-current electrolysis stripping.
8. the stripping side of a kind of ultraprecise Al and Al-alloy electroless nickel-phosphorus alloy plating layer on surface according to claim 1 Method, it is characterised in that the dc source current density in step 2 in constant current is 2A/m2Under carry out constant-current electrolysis stripping.
9. the stripping side of a kind of ultraprecise Al and Al-alloy electroless nickel-phosphorus alloy plating layer on surface according to claim 1 Method, it is characterised in that the dc source current density in step 2 in constant current is 5A/m2Under carry out constant-current electrolysis stripping.
10. the stripping of a kind of ultraprecise Al and Al-alloy electroless nickel-phosphorus alloy plating layer on surface according to claim 1 Method, it is characterised in that ultraprecise aluminium of the electroless nickel-phosphorus alloy plating layer on surface thickness more than 100 microns described in step 2 is closed Golden base part is the LY12 aluminum alloy thins of ultraprecise reflecting optics of the electroless nickel-phosphorus alloy plating layer on surface thickness more than 100 microns Shell.
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