CN105205582B - A kind of management method and system for EDM - Google Patents

A kind of management method and system for EDM Download PDF

Info

Publication number
CN105205582B
CN105205582B CN201410309094.0A CN201410309094A CN105205582B CN 105205582 B CN105205582 B CN 105205582B CN 201410309094 A CN201410309094 A CN 201410309094A CN 105205582 B CN105205582 B CN 105205582B
Authority
CN
China
Prior art keywords
wafer
batch
batches
sub
data
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN201410309094.0A
Other languages
Chinese (zh)
Other versions
CN105205582A (en
Inventor
方利
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Semiconductor Manufacturing International Shanghai Corp
Original Assignee
Semiconductor Manufacturing International Shanghai Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Semiconductor Manufacturing International Shanghai Corp filed Critical Semiconductor Manufacturing International Shanghai Corp
Priority to CN201410309094.0A priority Critical patent/CN105205582B/en
Publication of CN105205582A publication Critical patent/CN105205582A/en
Application granted granted Critical
Publication of CN105205582B publication Critical patent/CN105205582B/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P90/00Enabling technologies with a potential contribution to greenhouse gas [GHG] emissions mitigation
    • Y02P90/30Computing systems specially adapted for manufacturing

Abstract

The present invention discloses a kind of management method for EDM, comprising: when board is abnormal, by BS system according to the original process conditions information recorded on board, is grouped to original batch wafer, and packet data is sent to MES system;The packet data received is converted to batch wafer data in batches by MES system;After EAP system is transferred and carried out in batches according to batch wafer data in batches to original wafer batch, it is transported on normal board and carries out corresponding manufacturing process;After the completion of manufacturing process, the wafer data of batch in batches is merged into original batch wafer data by MES system, and the wafer after in batches is merged into original batch wafer according to the original batch wafer data after merging by EAP system.The invention also discloses a kind of EDM management system, by entire method and system fully achieve automation in batches with merges wafer, thus reduction bring wafer loss due to manual operation.

Description

A kind of management method and system for EDM
Technical field
The present invention relates to factory's wafer sort fields in semiconductor devices preparation, and in particular to one kind is used for equipment downtime Manage the management method and system of (Equipment Down Management, EDM).
Background technique
Board occurs abnormal being frequent thing in field of semiconductor manufacture, factory, for example, artificial maloperation or carelessness Caused by various maloperations.Now, when board has situation, the product to defects different on board is needed to carry out at manual sort Reason, but finally scrapping for product is being easily caused to the human error in faulty goods manual sort's treatment process.
Summary of the invention
In view of the above-mentioned problems, the present invention provides a kind of management methods for equipment downtime management, wherein be applied to just On the board for executing original batch wafer manufacturing process, which comprises S1: when the board is abnormal, pass through (Batch Split, the BS) system of grouping is brilliant to the original batch according to the original process conditions information recorded on the board Circle is grouped, and packet data is sent to MES system;S2: the production executes (Manufacturing Execution System, MES) packet data received is converted to batch wafer data in batches by system;S3: equipment automatization scheme (Equipment Automation Project, EAP) system is transferred and according to the wafer data of batch in batches to the original After beginning batch wafer carries out in batches, it is transported on normal board and carries out corresponding manufacturing process;S4: Yu Suoshu manufacturing process is completed Afterwards, the wafer data of batch in batches is merged into the original batch wafer data, the equipment by the production executive system It is brilliant that wafer after in batches according to the original batch wafer data after merging is merged into original batch by automation scheme system Circle.
The above-mentioned management method for equipment downtime management, wherein the equipment automatization scheme system is by batches Board carries out in batches the original batch wafer, and also by this, the wafer after in batches is merged into original batch crystalline substance by board in batches Circle.
The above-mentioned management method for equipment downtime management, wherein the original batch wafer includes at least one batch Secondary wafer, it is described in batches after wafer include at least two sub- batches wafer.
The above-mentioned management method for equipment downtime management, wherein it is described in batches after wafer include: completely processing Sub- batch wafer, undressed sub- batch wafer and processes sub- batch wafer completely.
The above-mentioned management method for equipment downtime management, wherein the wafer data of batch in batches includes: incomplete It processes sub- batch wafer data, undressed sub- batch wafer data and processes sub- batch wafer data completely.
The above-mentioned management method for equipment downtime management, wherein the equipment automatization scheme system is transferred and root After being carried out in batches according to the wafer data of batch in batches to the original batch wafer:
Undressed sub- batch wafer is transported on the normal board of current process step and continues to execute the processing step;
Sub- batch wafer being processed completely and being transported on the normal board of next processing step continue to execute next work Skill step;
Sub- batch wafer will not be processed completely and be transported on the normal board of new definition process step and executes the new definition Processing step;
Wherein, the new definition work is arranged according to the data information for not processing sub- batch wafer completely and process conditions Skill step.
A kind of management system for equipment downtime management, applied to being carrying out original batch wafer manufacturing process On board, to be automatically processed to the extremely caused abnormal semiconductor crystal wafer of board, wherein include: BS system, production executes System and equipment automatization scheme system are remembered by the BS system according on the board when the board is abnormal The original process conditions information carried, is grouped the original batch wafer, and packet data is sent to production and executes system System;The packet data received is converted to batch wafer data in batches by the production executive system;Equipment automatization side After case system is transferred and carried out in batches according to the wafer data of batch in batches to the original batch wafer, it is transported to normal machine Corresponding manufacturing process is carried out on platform;After the completion of the manufacturing process, the production executive system will the crystalline substance of batch in batches Circle data merge into the original batch wafer data, and the equipment automatization scheme system is according to described original batch after merging Wafer after in batches is merged into original batch wafer by secondary wafer data.
The above-mentioned management system for equipment downtime management, wherein the equipment automatization scheme system is by batches Board carries out in batches the original batch wafer, and also by this, the wafer after in batches is merged into original batch crystalline substance by board in batches Circle.
The above-mentioned management system for equipment downtime management, wherein the original batch wafer includes at least one batch Secondary wafer, it is described in batches after wafer include at least two sub- batches wafer.
The above-mentioned management system for equipment downtime management, wherein it is described in batches after wafer include: completely processing Sub- batch wafer, undressed sub- batch wafer and processes sub- batch wafer completely.
The above-mentioned management system for equipment downtime management, wherein the wafer data of batch in batches includes: incomplete It processes sub- batch wafer data, undressed sub- batch wafer data and processes sub- batch wafer data completely.
The above-mentioned management system for equipment downtime management, wherein the equipment automatization scheme system is transferred and root After being carried out in batches according to the wafer data of batch in batches to the original batch wafer:
Undressed sub- batch wafer is transported on the normal board of current process step and continues to execute the processing step;
Sub- batch wafer being processed completely and being transported on the normal board of next processing step continue to execute next work Skill step;
Sub- batch wafer will not be processed completely and be transported on the normal board of new definition process step and executes the new definition Processing step;
Wherein, the new definition work is arranged according to the data information for not processing sub- batch wafer completely and process conditions Skill step.
In conclusion being fully achieved automatically since present invention employs above technical schemes by entire method and system Chemical combination and with wafer in batches, reduce due to manual operation bring wafer loss.
Detailed description of the invention
Upon reading the detailed description of non-limiting embodiments with reference to the following drawings, the present invention and its feature, outer Shape and advantage will become more apparent upon.Identical label indicates identical part in all the attached drawings.Not deliberately proportionally Draw attached drawing, it is preferred that emphasis is show the gist of the present invention.
Fig. 1 is the flow diagram of method of the invention;
Fig. 2 is the structural schematic diagram of system of the invention.
Specific embodiment
A specific embodiment of the invention is further described with reference to the accompanying drawing:
As shown in Figure 1, the present invention relates to a kind of management method for equipment downtime management, it is applied to executing original On the board of beginning batch wafer manufacturing process, to be automatically processed to the extremely caused abnormal semiconductor crystal wafer of board, wherein The described method includes:
S1: when the board is abnormal, believed by BS system according to the original process conditions recorded on the board Breath, is grouped the original batch wafer, and packet data is sent to production executive system, grouping information such as the following table 1 It is shown, wherein the quantity of the wafer is at least 25, and the wafer is influenced by different quality when machine failure. Specifically, as the Lotxx01 in table 1 by production executive system can by batches at Lotxx01.01, Lotxx01.02, Lotxx01.03 respectively corresponds to process sub- batch completely, and undressed sub- batch processes sub- batch completely.Wherein, for Lotxx01.01, that is, complete the batch (processing sub- batch completely) of the processing, the equipment automatization scheme system executes next Process is walked, that is, needs not continue to carry out making technology on same board.It is incomplete for Lotxx01.02, that is, processing Batch (does not process sub- batch) completely, and the equipment automatization scheme system executes the procedure technology step newly defined, that is, continues Making technology is executed in same board.For Lotxx01.03, that is, undressed sub- batch, the production executes process of doing over again, Re-work.The packet data received is converted to batch wafer data in batches by the production executive system;Equipment Automation scheme system receives and according to the batch wafer data in batches, is divided the original batch wafer by board in batches It criticizes into several sub- batch wafers;The equipment automatization scheme system divides according to the classification of several sub- batch wafers Several sub- batch wafers are not transported on corresponding normal board and carry out manufacturing process, go to machine in batches after the completion Platform;Or several sub- batch wafers are directly transported to board in batches;The production executive system receives the equipment The implementing result of automation scheme system, and order the equipment automatization scheme system will be described by the board in batches Several sub- batch wafers reconsolidate as an original batch wafer.
Table 1
Preferably, the equipment automatization scheme system carries out in batches the original batch wafer by board in batches, Also by this, the wafer after in batches is merged into original batch wafer by board in batches.
Preferably, the original batch wafer includes the wafer of at least one batch, it is described in batches after wafer include extremely The wafer of few two sub- batches.
Preferably, it is described in batches after wafer include: not process sub- batch wafer completely, undressed sub- batch wafer and Sub- batch wafer is processed completely.
Preferably, the wafer data of batch in batches includes: not process sub- batch wafer data completely, undressed sub- batch Wafer data and process sub- batch wafer data completely.
Preferably, the equipment automatization scheme system is transferred and according to the wafer data of batch in batches to described original After batch wafer carries out in batches: undressed sub- batch wafer being transported on the normal board of current process step and continues to execute this Processing step;Sub- batch wafer being processed completely and being transported on the normal board of next processing step continue to execute next work Skill step;It sub- batch wafer will not be processed completely is transported to and execute the work of the new definition on the normal board of new definition process step Skill step;Wherein, the new definition work is arranged according to the data information for not processing sub- batch wafer completely and process conditions Skill step.
In addition, as shown in Fig. 2, it is right to be applied to the present invention relates to a kind of management system for equipment downtime management On the board for executing original batch wafer manufacturing process, to be located automatically to the extremely caused abnormal semiconductor crystal wafer of board Reason, wherein include: BS system, production executive system and equipment automatization scheme system, when the board is abnormal, lead to The BS system is crossed according to the original process conditions information recorded on the board, the original batch wafer is grouped, And packet data is sent to production executive system;The production executive system is converted to the packet data received point Criticize batch wafer data;Equipment automatization scheme system is transferred and according to the wafer data of batch in batches to the original batch After wafer carries out in batches, it is transported on normal board and carries out corresponding manufacturing process;After the completion of the manufacturing process, the life It produces execution system and the wafer data of batch in batches is merged into the original batch wafer data, the equipment automatization scheme Wafer after in batches is merged into original batch wafer according to the original batch wafer data after merging by system.
It is not difficult to find that the present embodiment is with above-mentioned for the corresponding system of the embodiment of management method of equipment downtime management It unites embodiment, the present embodiment can work in coordination implementation with the embodiment of the above-mentioned management method for equipment downtime management.It is above-mentioned The relevant technical details mentioned in the embodiment of management method for equipment downtime management are still effective in the present embodiment, are It reduces and repeats, which is not described herein again.Correspondingly, the relevant technical details mentioned in the present embodiment are also applicable in above-mentioned be used for In the embodiment of the management method of equipment downtime management.
In conclusion fully achieving automatic chemical combination by entire method and system present invention employs above technical scheme And with wafer in batches, reduce due to manual operation bring wafer loss.
Presently preferred embodiments of the present invention is described above.It is to be appreciated that the invention is not limited to above-mentioned Particular implementation, devices and structures not described in detail herein should be understood as gives reality with the common mode in this field It applies;Anyone skilled in the art, without departing from the scope of the technical proposal of the invention, all using the disclosure above Methods and technical content many possible changes and modifications are made to technical solution of the present invention, or be revised as equivalent variations etc. Embodiment is imitated, this is not affected the essence of the present invention.Therefore, anything that does not depart from the technical scheme of the invention, foundation Technical spirit of the invention any simple modifications, equivalents, and modifications made to the above embodiment, still fall within the present invention In the range of technical solution protection.

Claims (12)

1. a kind of management method for equipment downtime management, which is characterized in that applied to being carrying out original batch wafer system It makes on the board of technique, which comprises
S1: when the board is abnormal, by grouping system according to the original process conditions information recorded on the board, The original batch wafer is grouped, and packet data is sent to production executive system;
S2: the packet data received is converted to batch wafer data in batches by the production executive system;
S3: equipment automatization scheme system is transferred and is carried out according to the wafer data of batch in batches to the original batch wafer After in batches, it is transported on normal board and carries out corresponding manufacturing process;
After the completion of S4: Yu Suoshu manufacturing process, the production executive system merges into the wafer data of batch in batches described Original batch wafer data, the equipment automatization scheme system will in batches according to the original batch wafer data after merging Wafer afterwards merges into original batch wafer.
2. the management method according to claim 1 for equipment downtime management, which is characterized in that the equipment automatization Scheme system carries out in batches the original batch wafer by board in batches, also by this in batches board by the wafer after in batches Merge into original batch wafer.
3. the management method according to claim 2 for equipment downtime management, which is characterized in that the original batch is brilliant Circle include at least one batch wafer, it is described in batches after wafer include at least two sub- batches wafer.
4. the management method according to claim 3 for equipment downtime management, which is characterized in that it is described in batches after crystalline substance Circle includes: not process sub- batch wafer completely, undressed sub- batch wafer and processes sub- batch wafer completely.
5. the management method according to claim 4 for equipment downtime management, which is characterized in that the batch in batches is brilliant Circle data include: not process sub- batch wafer data completely, undressed sub- batch wafer data and process sub- batch crystalline substance completely Circle data.
6. the management method according to claim 5 for equipment downtime management, which is characterized in that the equipment automatization After scheme system is transferred and is carried out in batches according to the wafer data of batch in batches to the original batch wafer:
Undressed sub- batch wafer is transported on the normal board of current process step and continues to execute the processing step;
Sub- batch wafer being processed completely and being transported on the normal board of next processing step continue to execute next technique step Suddenly;
The technique that the new definition is executed on the normal board of new definition process step is transported to by sub- batch wafer is not processed completely Step;
Wherein, it is walked according to the data information for not processing sub- batch wafer completely and the process conditions setting new definition process Suddenly.
7. a kind of management system for equipment downtime management, applied to the machine for executing manufacturing process to original batch wafer On platform, to be automatically processed to the extremely caused abnormal semiconductor crystal wafer of board characterized by comprising grouping system, it is raw Produce execution system and equipment automatization scheme system;
When the board is abnormal, believed by the grouping system according to the original process conditions recorded on the board Breath, is grouped the original batch wafer, and packet data is sent to production executive system;
The packet data received is converted to batch wafer data in batches by the production executive system;
The equipment automatization scheme system transfer and according to the wafer data of batch in batches to the original batch wafer into After going in batches, it is transported on normal board and carries out corresponding manufacturing process, and after the completion of the manufacturing process, the production is held The wafer data of batch in batches is merged into the original batch wafer data, the equipment automatization scheme system by row system The wafer after in batches is merged into original batch wafer according to the original batch wafer data after merging.
8. the management system according to claim 7 for equipment downtime management, which is characterized in that the equipment automatization Scheme system carries out in batches the original batch wafer by board in batches, also by this in batches board by the wafer after in batches Merge into original batch wafer.
9. the management system according to claim 8 for equipment downtime management, which is characterized in that the original batch is brilliant Circle include at least one batch wafer, it is described in batches after wafer include at least two sub- batches wafer.
10. the management system according to claim 9 for equipment downtime management, which is characterized in that it is described in batches after Wafer includes: not process sub- batch wafer completely, undressed sub- batch wafer and processes sub- batch wafer completely.
11. the management system according to claim 10 for equipment downtime management, which is characterized in that the batch in batches Wafer data includes: not process sub- batch wafer data completely, undressed sub- batch wafer data and processes sub- batch completely Wafer data.
12. the management system according to claim 11 for equipment downtime management, which is characterized in that the equipment is automatic Change scheme system to transfer and carry out the original batch wafer according to the wafer data of batch in batches in batches rear:
Undressed sub- batch wafer is transported on the normal board of current process step and continues to execute the processing step;
Sub- batch wafer being processed completely and being transported on the normal board of next processing step continue to execute next technique step Suddenly;
The technique that the new definition is executed on the normal board of new definition process step is transported to by sub- batch wafer is not processed completely Step;
Wherein, it is walked according to the data information for not processing sub- batch wafer completely and the process conditions setting new definition process Suddenly.
CN201410309094.0A 2014-06-30 2014-06-30 A kind of management method and system for EDM Active CN105205582B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201410309094.0A CN105205582B (en) 2014-06-30 2014-06-30 A kind of management method and system for EDM

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201410309094.0A CN105205582B (en) 2014-06-30 2014-06-30 A kind of management method and system for EDM

Publications (2)

Publication Number Publication Date
CN105205582A CN105205582A (en) 2015-12-30
CN105205582B true CN105205582B (en) 2019-04-26

Family

ID=54953250

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201410309094.0A Active CN105205582B (en) 2014-06-30 2014-06-30 A kind of management method and system for EDM

Country Status (1)

Country Link
CN (1) CN105205582B (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110676191B (en) * 2019-10-08 2022-05-24 东莞长城开发科技有限公司 LED wafer test disassembly group combining and collecting method based on MES system
CN116207012A (en) * 2023-03-09 2023-06-02 上海赛美特软件科技有限公司 Wafer carrier replacement control method and device, electronic equipment and storage medium

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003195922A (en) * 2001-12-25 2003-07-11 Mitsubishi Electric Corp Standard information data managing method and system
CN1603066A (en) * 2003-10-02 2005-04-06 台湾积体电路制造股份有限公司 Manufacturing system, delivery system and delivery method
CN1804746A (en) * 2004-12-23 2006-07-19 台湾积体电路制造股份有限公司 Systems and methods for managing lot aggregation
CN101303597A (en) * 2008-05-30 2008-11-12 合肥工业大学 Right changing type accidental scheduling method based on real time condition
CN103473653A (en) * 2013-09-22 2013-12-25 浙江三维橡胶制品股份有限公司 Method for producing triangular belts in computer informatization mode

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003195922A (en) * 2001-12-25 2003-07-11 Mitsubishi Electric Corp Standard information data managing method and system
CN1603066A (en) * 2003-10-02 2005-04-06 台湾积体电路制造股份有限公司 Manufacturing system, delivery system and delivery method
CN1804746A (en) * 2004-12-23 2006-07-19 台湾积体电路制造股份有限公司 Systems and methods for managing lot aggregation
CN101303597A (en) * 2008-05-30 2008-11-12 合肥工业大学 Right changing type accidental scheduling method based on real time condition
CN103473653A (en) * 2013-09-22 2013-12-25 浙江三维橡胶制品股份有限公司 Method for producing triangular belts in computer informatization mode

Also Published As

Publication number Publication date
CN105205582A (en) 2015-12-30

Similar Documents

Publication Publication Date Title
WO2021042900A1 (en) Creation method and creation apparatus for component library, and electronic device and storage medium
CN109494178B (en) Dispatching method of detection machine
CN103885423A (en) Statistical process control system and method for wafer acceptance test
CN105205582B (en) A kind of management method and system for EDM
EP2239640A2 (en) A method and system for using membrane calculus to model dynamic coordination logics for automation systems
CN105700490B (en) A kind of method and system improving product yield
CN102412168A (en) Wafer defect defection method and system
CN103412775A (en) Method for refreshing BMC firmware intelligently and automatically
CN104751258B (en) Product mix processing system and method
CN104134620B (en) The monitoring method and semiconductor manufacturing process of semiconductor fabrication
CN102881619A (en) Yield monitoring system and monitoring method thereof
CN105955229A (en) Output-based self-adaptive intelligent production method
CN105182916B (en) Semiconductor production constrains management-control method
CN103439893B (en) The reservation of equipment load port uses control method
US20150236901A1 (en) Control system management apparatus
CN104699025B (en) Process control method and process control system
CN105094069A (en) Process control method and system in manufacturing process of semiconductor device
CN104752150A (en) Method for establishing technological process
CN102222599B (en) Method and device for optimizing technological process
CN104699019B (en) Board restores checking system and board restores the method for inspection
CN106529753A (en) Identification control method and device of semiconductor technical segment
CN104201093B (en) Particle monitoring method of wet cleaning process apparatus
CN103579058A (en) Method for achieving multi-batch continuous operation
CN116382182A (en) Battery module offline pairing method, system, equipment and medium
US10126351B2 (en) Systems and methods for placement of singulated semiconductor devices for multi-site testing

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
GR01 Patent grant
GR01 Patent grant