CN105185923A - Water vapor blocking film, manufacturing method therefor, flexible display device, and manufacturing method for flexible display device - Google Patents
Water vapor blocking film, manufacturing method therefor, flexible display device, and manufacturing method for flexible display device Download PDFInfo
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- CN105185923A CN105185923A CN201510527089.1A CN201510527089A CN105185923A CN 105185923 A CN105185923 A CN 105185923A CN 201510527089 A CN201510527089 A CN 201510527089A CN 105185923 A CN105185923 A CN 105185923A
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/84—Passivation; Containers; Encapsulations
- H10K50/844—Encapsulations
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K77/00—Constructional details of devices covered by this subclass and not covered by groups H10K10/80, H10K30/80, H10K50/80 or H10K59/80
- H10K77/10—Substrates, e.g. flexible substrates
- H10K77/111—Flexible substrates
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/549—Organic PV cells
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
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Abstract
The invention discloses a water vapor blocking film, a manufacturing method therefor, a flexible display device, and a manufacturing method for the flexible display device. The water vapor blocking film comprises a flexible transparent substrate, a first optical coating and a second optical coating, wherein the flexible transparent substrate, the first optical coating and the second optical coating are stacked from the bottom to the top. The first optical coating is a dielectric film with high index of refraction, and the second optical coating is a dielectric film with lower high index of refraction. The water vapor blocking film is higher in water vapor blocking rate, and can be attached to a flexible substrate of the display device, so as to prevent water vapor from entering into the display device. Moreover, the water vapor blocking film provided by the invention is an externally-hung structure, does not affect the manufacturing technology of a flexible display assembly, is convenient to use, and is wide in application range.
Description
Technical field
The present invention relates to Display Technique field, in particular to a kind of water vapor rejection film and preparation method thereof, flexible display device and preparation method thereof.
Background technology
The application of Organic Light Emitting Diode (OLED) display is more and more general, the most remarkable in the products such as mobile phone, media player and small-sized entry level TV.OLED is self-luminescent material, does not need to use backlight, simultaneously visual angle is wide, image quality is even, reaction speed soon, easier colorize, with simple drive circuit can reach luminous, processing procedure is simple, can be made into flexure formula panel, meets compact principle.And there is following features: active illuminating, angular field of view are large, fast response time, image stabilization, brightness is high, rich color, resolution are high, driving voltage is low, energy consumption is low, can match with solar cell, integrated circuit etc.
At present, flexible OLED devices all has larger progress in material lifetime, driving, brightness, colorize and flexibility etc., but its industrialization process is low, and its reason mainly life problems and high efficiency problem does not also thoroughly solve.And will address these problems, also need design with processing, drive and many-sided joint efforts such as encapsulation technology in the design of device architecture and materials synthesis, experiment condition.And the basic research of OLED mainly concentrated on to the performances such as the efficiency that improves device and life-span and find on material that is new, that improve.
The OLED with excellent properties such as self-luminous, wide viewing angle, bending resistance are strong is the comparatively ideal selection realizing Flexible Displays, but flexible resin substrate is one of its bottleneck realizing Flexible Displays to water, oxygen obstructing capacity difference.The major issue of OLED display reduces the infiltration to device inside of steam and oxygen.Major part plastic does not all have enough abilities fully to stop the intrusion of introduced contaminants liquids and gases, and when being exposed in water and oxygen, the photoelectric characteristic of device will sharply fail.Its decline agine mechaism relates to the stripping between metallic cathode and luminescent layer and the chemical change in organic film.Compared with the character of glass, commercially available plastic substrate materials, to the isolation of steam and oxygen and not ideal enough to the age inhibiting protective effect of device, cannot meet the life requirements of display.
Summary of the invention
Main purpose of the present invention is to provide a kind of water vapor rejection film and preparation method thereof, flexible display device and preparation method thereof, inner to stop steam to invade display device.
To achieve these goals, according to an aspect of the present invention, provide a kind of water vapor rejection film, this water vapor rejection film comprises the flexible and transparent base material of stacked setting from lower to upper, the first optical coating and the second optical coating, first optical coating is high index of refraction thin dielectric film, and the second optical coating is low-refraction thin dielectric film.
Further, the refractive index of the first optical coating is the refractive index of the 2.2 ~ 2.3, second optical coating is 1.45 ~ 1.65.
Further, the material of the first optical coating is Si
3n
4, the material of the second optical coating is SiO
x, X scope is 1.5 ~ 2.
Further, the thickness of the first optical coating is 10 ~ 20nm, and the thickness of the second optical coating is 50 ~ 100nm.
Further, the material of flexible and transparent base material is PET (PETG) or PC (Merlon); The thickness of flexible and transparent base material is 0.025 ~ 0.125mm.
According to a further aspect in the invention, provide a kind of manufacture method of above-mentioned water vapor rejection film, this manufacture method comprises the following steps: form the first optical coating at flexible and transparent base material deposited high index of refraction thin dielectric film; First optical coating deposits low-refraction thin dielectric film and forms the second optical coating, the first optical coating and the second optical coating form water vapor rejection film.
Further, before the step of formation first optical coating, the single or double of flexible and transparent base material is hardened and corona treatment.
Further, the first optical coating and the second optical coating all adopt volume to volume magnetron sputtering deposition method to be prepared from.
According to another aspect of the invention, provide a kind of flexible display device, this flexible display device comprises the water vapor rejection film of stacked setting from lower to upper, optical cement layer, flexible substrate and luminescence component, and water vapor rejection film is above-mentioned water vapor rejection film provided by the invention.
Further, optical cement is OCA optical cement, and the thickness of optical cement is 25 ~ 100 μm.
Further, the material of flexible substrate is flexible resin, and luminescence component is Organic Light Emitting Diode.
In accordance with a further aspect of the present invention, provide a kind of manufacture method of above-mentioned flexible display device provided by the invention, this manufacture method comprises the following steps: utilize optical cement layer that water vapor rejection film is fitted in one of flexible substrate on the surface; Luminescence component is formed on the surface, water vapor rejection film, optical cement layer, flexible substrate and luminescence component composition flexible display device at another of flexible substrate.
Apply technical scheme of the present invention, water vapor rejection film provided by the invention has higher water vapor rejection rate, can fit in the flexible substrate of display device, so that it is inner to stop steam to invade display device.And water vapor rejection film provided by the invention is external hanging type structure, does not affect the preparation technology of Flexible Displays assembly, easy-to-use, tool broad applicability.
Accompanying drawing explanation
The Figure of description forming a application's part is used to provide a further understanding of the present invention, and schematic description and description of the present invention, for explaining the present invention, does not form inappropriate limitation of the present invention.In the accompanying drawings:
Fig. 1 shows the cross-sectional view of the water vapor rejection film provided according to embodiment of the present invention;
Fig. 2 shows the cross-sectional view of the flexible display device provided according to embodiment of the present invention; And
Fig. 3 shows the spectrogram of the water vapor rejection film that embodiment 1 obtains.
Embodiment
It should be noted that, when not conflicting, the embodiment in the application and the feature in embodiment can combine mutually.Below with reference to the accompanying drawings and describe the application in detail in conjunction with the embodiments.
It should be noted that used term is only to describe embodiment here, and be not intended to the illustrative embodiments of restricted root according to the application.As used herein, unless the context clearly indicates otherwise, otherwise singulative is also intended to comprise plural form, in addition, it is to be further understood that, " comprise " when using term in this manual and/or " comprising " time, it indicates existing characteristics, step, operation, device, assembly and/or their combination.
For convenience of description, here can usage space relative terms, as " ... on ", " in ... top ", " at ... upper surface ", " above " etc., be used for the spatial relation described as a device shown in the figure or feature and other devices or feature.Should be understood that, space relative terms is intended to comprise the different azimuth in use or operation except the described in the drawings orientation of device.Such as, " in other devices or structure below " or " under other devices or structure " will be positioned as after if the device in accompanying drawing is squeezed, being then described as the device of " above other devices or structure " or " on other devices or structure ".Thus, exemplary term " in ... top " can comprise " in ... top " and " in ... below " two kinds of orientation.This device also can other different modes location (90-degree rotation or be in other orientation), and relatively describe space used here and make respective explanations.
From background technology, existing flexible resin substrate is one of its bottleneck realizing Flexible Displays to water, oxygen obstructing capacity difference.The present inventor studies for the problems referred to above, proposes a kind of water vapor rejection film.As shown in Figure 1, this water vapor rejection film 10 comprises flexible and transparent base material 11, first optical coating 12 and second optical coating 13 of stacked setting from lower to upper, first optical coating 12 is high index of refraction thin dielectric film, and the second optical coating 13 is low-refraction thin dielectric film.
Wherein, " the first optical coating 12 is high index of refraction thin dielectric film; the second optical coating 13 is low-refraction thin dielectric film " refers to that the first optical coating 12 and the second optical coating 13 are thin dielectric film, and the refractive index of the first optical coating 12 is greater than the second optical coating 13.
Water vapor rejection film 10 provided by the invention has higher water vapor rejection rate, can fit in the flexible substrate 30 of display device, so that it is inner to stop steam to invade display device.And water vapor rejection film 10 provided by the invention is external hanging type structures, does not affect the preparation technology of Flexible Displays assembly, easy-to-use, tool broad applicability.
Illustrative embodiments according to water vapor rejection film provided by the invention will be described in more detail below.But these illustrative embodiments can be implemented by multiple different form, and should not be interpreted as being only limited to execution mode set forth herein.Should be understood that, provide these execution modes be in order to make the application open thorough and complete, and the design of these illustrative embodiments is fully conveyed to those of ordinary skill in the art.
In water vapor rejection film 10 provided by the invention, the first optical coating 12 is high index of refraction thin dielectric film, and the second optical coating 13 is low-refraction thin dielectric film, and that is, the refractive index of the first optical coating 12 is greater than the refractive index of the second optical coating 13.The refractive index that those skilled in the art can arrange the first optical coating 12 and the second optical coating 13 under the teachings of the present invention and the material adopted thereof.In a preferred embodiment, the refractive index of the first optical coating 12 is the refractive index of the 2.2 ~ 2.3, second optical coating 13 is 1.45 ~ 1.65.Wherein, the material of the first optical coating 12 can be Si
3n
4, the material of the second optical coating 13 can be SiO
x, X scope is 1.5 ~ 2.Certainly, the refractive index of the first optical coating 12 and the second optical coating 13 and the material that adopts thereof.Be not limited to above-described embodiment.
In addition, the thickness of the first optical coating 12 and the second optical coating 13 also can have an impact to the barrier property of water vapor rejection film 10.The present invention is finding after great many of experiments and theoretical research, when, the thickness of the first optical coating 12 is 10 ~ 20nm, when the thickness of the second optical coating 13 is 50 ~ 100nm, good coordinated effect can be produced between first optical coating 12 and the second optical coating 13, thus improve the barrier property of water vapor rejection film 10 further.
In above-mentioned water vapor rejection film 10, the material of flexible and transparent base material 11 and thickness can set according to the actual requirements.In a preferred embodiment, the material of flexible and transparent base material 11 is PET (PETG) or PC (Merlon); The thickness of flexible and transparent base material 11 is 0.025 ~ 0.125mm.Certainly, material and the thickness of flexible and transparent base material 11 are not limited to above-described embodiment, and those skilled in the art can set in instruction according to the present invention.
According to a further aspect in the invention, provide a kind of manufacture method of above-mentioned water vapor rejection film 10, this manufacture method comprises the following steps: form the first optical coating 12 at flexible and transparent base material 11 deposit high refractive index thin dielectric film; First optical coating 12 deposits low-refraction thin dielectric film and forms the second optical coating 13, first optical coating 12 and the second optical coating 13 forms water vapor rejection film 10.
Preferably, before the step of formation first optical coating 12, can harden and corona treatment to the single or double of flexible and transparent base material 11, to improve the adhesion between flexible and transparent base material 11 and the first optical coating 12, thus improve the barrier property of water vapor rejection film 10 further.The processing step of sclerosis and corona treatment with reference to prior art, can not repeat them here.Above-mentioned first optical coating 12 and the second optical coating 13 all can adopt volume to volume magnetron sputtering deposition method to be prepared from.
According to another aspect of the invention, a kind of flexible display device is provided.As shown in Figure 2, this flexible display device comprises the water vapor rejection film 10 of stacked setting from lower to upper, optical cement layer 20, flexible substrate 30 and luminescence component 40, and water vapor rejection film 10 is above-mentioned water vapor rejection film 10 provided by the invention.
Existing flexible resin substrate is one of its bottleneck realizing Flexible Displays to water, oxygen obstructing capacity difference, and those skilled in the art never expect the method solving this problem.And the present invention successfully develops a kind of water vapor rejection film 10, and successfully this water vapor rejection film 10 is fitted in one of flexible substrate 30 on the surface by optical cement layer 20, thus it is inner to stop steam to invade display device.
Wherein, optical cement can be OCA optical cement, and the thickness of optical cement can be 25 ~ 100 μm.The material of flexible substrate 30 can be flexible resin (such as PET etc.), and luminescence component 40 can be Organic Light Emitting Diode.
In accordance with a further aspect of the present invention, provide a kind of manufacture method of above-mentioned flexible display device provided by the invention, this manufacture method comprises the following steps: utilize optical cement layer 20 that water vapor rejection film 10 is fitted in one of flexible substrate 30 on the surface; Form luminescence component 40 on the surface at another of flexible substrate 30, water vapor rejection film 10, optical cement layer 20, flexible substrate 30 and luminescence component 40 form flexible display device.
Water vapor rejection film provided by the invention is further illustrated below in conjunction with embodiment.
Embodiment 1
The water vapor rejection film that the present embodiment provides comprises the flexible and transparent base material of stacked setting from lower to upper, the first optical coating and the second optical coating, and wherein, the material of the first optical coating is Si
3n
4, the refractive index of the first optical coating is the thickness of the 2.2, first optical coating is 10nm; The material of the second optical coating is SiO
2, the refractive index of the second optical coating is the thickness of the 1.48, second optical coating is 50nm; The material of flexible and transparent base material is PETG, and the thickness of flexible and transparent base material is 0.05mm.
Embodiment 2
The water vapor rejection film that the present embodiment provides comprises the flexible and transparent base material of stacked setting from lower to upper, the first optical coating and the second optical coating, and wherein, the material of the first optical coating is Si
3n
4, the refractive index of the first optical coating is the thickness of the 2.2, first optical coating is 15nm; The material of the second optical coating is SiO
1.7, the refractive index of the second optical coating is the thickness of the 1.5, second optical coating is 80nm; The material of flexible and transparent base material is PETG, and the thickness of flexible and transparent base material is 0.125mm.
Embodiment 3
The water vapor rejection film that the present embodiment provides comprises the flexible and transparent base material of stacked setting from lower to upper, the first optical coating and the second optical coating, and wherein, the material of the first optical coating is Si
3n
4, the refractive index of the first optical coating is the thickness of the 2.2, first optical coating is 20nm; The material of the second optical coating is SiO
1.5, the refractive index of the second optical coating is the thickness of the 1.55, second optical coating is 100nm; The material of flexible and transparent base material is PETG, and the thickness of flexible and transparent base material is 0.025mm.
Test: the present invention tests the water vapor rejection film that embodiment 1 to 3 obtains, and obtains the data of visible-range average transmittance and water vapor rejection rate, and its result is as shown in table 1.Exemplarily, the present invention gives the water vapor rejection film that embodiment 1 obtains and carries out testing the spectrogram obtained, as shown in Figure 3.It should be noted that, the spectrogram shown in the spectrogram that embodiment 2 to 3 obtains and Fig. 3 is similar, in order to the present invention that saves space does not provide the spectrogram that embodiment 2 to 3 obtains.
Table 1
| Visible-range average transmittance | Water vapor rejection rate g/ (m 2·day) | |
| Embodiment 1 | 87.4％ | 0.82 |
| Embodiment 2 | 87％ | 0.75 |
| Embodiment 3 | 86.5％ | 0.68 |
As can be seen from the above embodiments, the above-mentioned example of the present invention achieves following technique effect: water vapor rejection film provided by the invention has higher water vapor rejection rate, can fit in the flexible substrate of display device, so that it is inner to stop steam to invade display device.And water vapor rejection film provided by the invention is external hanging type structure, does not affect the preparation technology of Flexible Displays assembly, easy-to-use, tool broad applicability.
These are only the preferred embodiments of the present invention, be not limited to the present invention, for a person skilled in the art, the present invention can have various modifications and variations.Within the spirit and principles in the present invention all, any amendment done, equivalent replacement, improvement etc., all should be included within protection scope of the present invention.
Claims (12)
1. a water vapor rejection film, it is characterized in that, described water vapor rejection film (10) comprises the flexible and transparent base material (11) of stacked setting from lower to upper, the first optical coating (12) and the second optical coating (13), described first optical coating (12) is high index of refraction thin dielectric film, and described second optical coating (13) is low-refraction thin dielectric film.
2. water vapor rejection film according to claim 1, is characterized in that, the refractive index of described first optical coating (12) is 2.2 ~ 2.3, and the refractive index of described second optical coating (13) is 1.45 ~ 1.65.
3. water vapor rejection film according to claim 1, is characterized in that, the material of described first optical coating (12) is Si
3n
4, the material of described second optical coating (13) is SiO
x, X scope is 1.5 ~ 2.
4. water vapor rejection film according to claim 1, is characterized in that, the thickness of described first optical coating (12) is 10 ~ 20nm, and the thickness of described second optical coating (13) is 50 ~ 100nm.
5. water vapor rejection film according to any one of claim 1 to 4, is characterized in that, the material of described flexible and transparent base material (11) is PETG or Merlon; The thickness of described flexible and transparent base material (11) is 0.025 ~ 0.125mm.
6. a manufacture method for the water vapor rejection film according to any one of claim 1 to 5, is characterized in that, described manufacture method comprises the following steps:
The first optical coating (12) is formed at flexible and transparent base material (11) deposit high refractive index thin dielectric film;
Form the second optical coating (13) at described first optical coating (12) upper deposition low-refraction thin dielectric film, described first optical coating (12) and described second optical coating (13) form described water vapor rejection film (10).
7. manufacture method according to claim 6, is characterized in that, before the step forming described first optical coating (12), hardens and corona treatment to the single or double of described flexible and transparent base material (11).
8. manufacture method according to claim 6, is characterized in that, described first optical coating (12) and described second optical coating (13) all adopt volume to volume magnetron sputtering deposition method to be prepared from.
9. a flexible display device, it is characterized in that, described flexible display device comprises the water vapor rejection film (10) of stacked setting from lower to upper, optical cement layer (20), flexible substrate (30) and luminescence component (40), the water vapor rejection film (10) of described water vapor rejection film (10) according to any one of claim 1 to 5.
10. flexible display device according to claim 9, is characterized in that, described optical cement is OCA optical cement, and the thickness of described optical cement is 25 ~ 100 μm.
11. flexible display devices according to claim 9, is characterized in that, the material of described flexible substrate (30) is flexible resin, and described luminescence component (40) is Organic Light Emitting Diode.
The manufacture method of the flexible display device according to any one of 12. 1 kinds of claims 9 to 11, is characterized in that, described manufacture method comprises the following steps:
Utilize optical cement layer (20) that water vapor rejection film (10) is fitted in one of flexible substrate (30) on the surface;
Form luminescence component (40) on the surface at another of described flexible substrate (30), described water vapor rejection film (10), described optical cement layer (20), described flexible substrate (30) and described luminescence component (40) form described flexible display device.
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