CN105117059A - Transparent conducting layer and touch screen - Google Patents
Transparent conducting layer and touch screen Download PDFInfo
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- CN105117059A CN105117059A CN201510533256.3A CN201510533256A CN105117059A CN 105117059 A CN105117059 A CN 105117059A CN 201510533256 A CN201510533256 A CN 201510533256A CN 105117059 A CN105117059 A CN 105117059A
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- touch
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- 239000011248 coating agent Substances 0.000 claims description 13
- 238000000576 coating method Methods 0.000 claims description 13
- 238000009413 insulation Methods 0.000 claims description 10
- 239000000463 material Substances 0.000 claims description 8
- 239000000758 substrate Substances 0.000 claims description 8
- JUGMVQZJYQVQJS-UHFFFAOYSA-N [B+3].[O-2].[Zn+2] Chemical compound [B+3].[O-2].[Zn+2] JUGMVQZJYQVQJS-UHFFFAOYSA-N 0.000 claims description 3
- JYMITAMFTJDTAE-UHFFFAOYSA-N aluminum zinc oxygen(2-) Chemical compound [O-2].[Al+3].[Zn+2] JYMITAMFTJDTAE-UHFFFAOYSA-N 0.000 claims description 3
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical group [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 claims description 3
- 230000001939 inductive effect Effects 0.000 claims description 3
- 238000002310 reflectometry Methods 0.000 abstract description 32
- 238000013459 approach Methods 0.000 abstract 1
- 238000000034 method Methods 0.000 description 10
- 238000013461 design Methods 0.000 description 6
- 238000005516 engineering process Methods 0.000 description 5
- 201000003373 familial cold autoinflammatory syndrome 3 Diseases 0.000 description 5
- 238000012545 processing Methods 0.000 description 5
- 230000006698 induction Effects 0.000 description 4
- 230000000694 effects Effects 0.000 description 3
- 238000000059 patterning Methods 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- 230000009467 reduction Effects 0.000 description 3
- 230000005540 biological transmission Effects 0.000 description 2
- 239000004020 conductor Substances 0.000 description 2
- 229910003460 diamond Inorganic materials 0.000 description 2
- 239000010432 diamond Substances 0.000 description 2
- 239000012528 membrane Substances 0.000 description 2
- 230000008859 change Effects 0.000 description 1
- 238000003486 chemical etching Methods 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000000265 homogenisation Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- MRNHPUHPBOKKQT-UHFFFAOYSA-N indium;tin;hydrate Chemical compound O.[In].[Sn] MRNHPUHPBOKKQT-UHFFFAOYSA-N 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- 230000013011 mating Effects 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- 238000005070 sampling Methods 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 230000008719 thickening Effects 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- 239000012780 transparent material Substances 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
- 239000011800 void material Substances 0.000 description 1
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Abstract
The invention discloses a transparent conducting layer and a touch screen. Firstly, a space between the patterns of the transparent conducting layer is not completely removed, instead, a nominal pattern is constructed, the pattern is hollowed on an electrode part, and therefore, a reflectivity difference between the electrode part and a non-circuit area is reduced and approaches to be similar even the same so as to achieve a vanishing purpose.
Description
Technical field
The present invention relates to a kind of transparency conducting layer being applied to touch-screen, and there is the capacitive touch screen of this transparency conducting layer.
Background technology
Capacitive touch screen at least has a transparency conducting layer, and transparency conducting layer is the foundation structure producing mutual capacitance.To the induction touched, need two dimensions based on plane to carry out the sampling of touch location, thus determine touch location, obviously, the nesa coating (TransparentConductiveFilm is called for short TCF) of whole does not obviously possess such function.Therefore, need electrically conducting transparent film patterning (generation circuit pattern), such as the touch-screen with two transparency conducting layers, an one pattern for transparent conductive layer turns to the electrode tandem had on the first dimension direction, another one pattern for transparent conductive layer turns to the electrode series connection had on the second dimension direction, first dimension is orthogonal with the second dimension, thus realizes the determination of touch location in plane.
Touching in aobvious module, the outside at display screen put by touch-screen note, in other words towards the side of user, therefore, the transparency of its window (be also the funtion part of touch-screen, be commonly referred to as sensor part, also can be called induction zone, viewfinder area, functional sheet etc.) is more high better.But nesa coating just must have certain reflectivity as transparent material, thus for transparency conducting layer, the reflectivity with the part of electrode tandem is greater than the part between electrode tandem, the reflectivity of transparency conducting layer various piece is not identical in other words, produces the shadow of transparency conducting layer and affects display effect.
In some implementations, stacked one deck disappears shadow rete (often for SiO over transparent conductive layer
2and Nb
2o
5film group) and region outside outer electrically conducting transparent line pattern increase absentee layer (figure that the transparency conducting layer for logicalnot circuit district is etched into is designated as dummy structure) etc.But there is following shortcoming in these ways: (1) membrane equipment is expensive, and cost is high; (2) along with the change of supplied materials has larger fluctuation, process window is narrow; (3) the dummy structure increased, the improvement offseting shadow is limited.
Chinese patent literature CN103745766A discloses a kind of flexibility and to disappear shadow nesa coating, the document employs the combination of nano level non-fully oxide film layer, advantageously in the broadening scope through spectrum, total light transmittance increases, the document eliminates the impact of circuit lines from new material angle in other words, complex process, cost is higher.
Chinese patent literature CN103677410A discloses a kind of touch-control structure, and it adopts and forms at metallic conductor the transparency that the mode arranging multiple transmission region in drive electrode and induction electrode improves transparency conducting layer.Wherein transmission region comprises multiple opening be evenly opened in metallic conductor, and opening reticulates distribution, improves the homogeneity of penetrability.This structure needs the part of the nesa coating removed many, and technology difficulty is relatively large, and two-layer up and down between still there is overhanging portion, there is layer difference, can affect overall structural strength on the one hand, the homogeneity of transparency is not good on the other hand.
Chinese patent literature CN203480458U then discloses a kind of induction electrode structure of contact panel, and its electrode pattern has some rectangular opening be parallel to each other, so as to improving light penetration amount.This structure is as CN103677410A, and the space between electrode is unsettled.
Summary of the invention
In view of this, the object of the present invention is to provide a kind of transparency high, and the uniform structure of transparent conductive layer of printing opacity, and use the touch-screen of this structure of transparent conductive layer.
The present invention is by the following technical solutions:
According to one aspect of the present invention, a kind of transparency conducting layer, comprising:
Pattern, has a plurality of, is separated from each other; Each pattern is formed by connecting portion tandem by plurality of electrodes portion, and the tandem direction of each pattern is parallel to each other; Wherein electrode section is evenly equipped with pierced pattern;
Logicalnot circuit district, is the region between pattern, has the dummy pattern insulated with pattern in this areal distribution.
Above-mentioned transparency conducting layer, in certain embodiments, described pierced pattern is the little pattern of the hollow out of crossbar array in electrode section.
Alternatively, the little pattern of described hollow out is the hole of circle, rectangle, rhombus, star or bar shaped.
Preferably, the pierced pattern area sum in an electrode section accounts for 1/1 to two/10th of electrode section area.
Alternatively, described dummy pattern is the illusory little pattern of crossbar array, and is separated from each other.
Alternatively, described illusory little pattern is the column of circle, rectangle, rhombus, star or bar shaped.
Preferably, described pattern and dummy pattern are made up of the same face nesa coating.
According to a kind of touch-screen of another aspect of the present invention, there is the described transparency conducting layer of first aspect.
Above-mentioned touch-screen, preferably, described touch-screen is the touch-screen with two transparency conducting layers, thus comprises:
Substrate;
First transparency conducting layer, is stacked on substrate;
Insulation course, is arranged on the first transparency conducting layer; And
Second transparency conducting layer, is arranged on insulation course, thus with the first transparency conducting layer and insulating layer conformation inductive layer;
Wherein, the second transparency conducting layer is the transparency conducting layer as described in the present invention first aspect.
Above-mentioned touch-screen, the material of described transparency conducting layer is indium tin oxide, aluminium zinc oxide or boron zinc oxide.
According to the present invention, the space between the pattern of first transparency conducting layer is not exclusively removed, but is configured to dummy pattern, and in electrode section also hollow out have pattern, thus the difference in reflectivity between electrode section and logicalnot circuit district diminishes, and is tending towards close, even identical, reach the shadow object that disappears.
Accompanying drawing explanation
Fig. 1 is according to a kind of transparency conducting layer partial enlargement structural representation of the present invention.
Fig. 2 is the partial enlarged drawing of connecting portion unit and electrode unit.
Fig. 3 is according to a kind of touch screen function cross-section structural representation of the present invention.
In figure: 1. connecting portion, the 2. little pattern of hollow out, 3. electrode section, 4. logicalnot circuit district, 5. illusory little pattern, 6. the second transparency conducting layer, 7. insulation course, 8. the first transparency conducting layer, 9. substrate.
Embodiment
Generally speaking, touch-screen is positioned at the side towards user, and especially form when touching aobvious module, such as Mobile phone screen, its side towards user is touch-screen, and the side of user is display screen dorsad, by mating of touch-screen and display screen, may be used for operating handset.
As described in the background section, the funtion part realizing touch-screen touch controllable function is realized by transparency conducting layer, and transparency conducting layer is the nesa coating of patterning.
About transparency conducting layer, usual patterning is parallel to the stitching of a dimension, and stitching (also referred to as circuit) is namely called pattern, is separated from each other between pattern, the electric signal sensed on this pattern thus the part at pattern place can be sampled.
Pattern is more, and the visual effect of screen is better, and therefore, along with the development of process technique, present display screen significantly can find out the shape of pattern unlike such as resistive touch screen comparatively early.
Therefore, described pattern has a plurality of, thus on a dimension direction arrayed, be separated from each other, formed electrical isolation, need each other in other words insulation.
Pattern form entirety comparatively is early a long rectangle, strip in other words, and it is poor to the susceptibility touched, little by little, the shape of pattern no longer adopts the structure of homogeneous, but is provided with the structure division in electrode section 3 and connecting electrode portion, be called connecting portion 1, as shown in Figure 1.
The more at present use of electrode section 3 has the electrode section 3 of diamond structure, and to make sheet resistance minimum, in addition, alternatively, the electrode section of such as rectangular configuration or square structure is also more conventional.
Generally speaking, pattern in other words stitching, circuit extends according to predetermined dimension, and the length of extension often depends on the size of form.
Therefore, electrode section 3 forms a pattern by connecting portion 1 successively tandem.With tandem direction for benchmark, the pattern on same transparency conducting layer is parallel to each other.
Fig. 2 reflects the structure in partial electrode portion 3 and part logicalnot circuit district 4, in figure, visible, and electrode section 3 is gone into battle and shown the little pattern 2 of hollow out.
The one of just little pattern illustrated in figure, visible, the patent documentation that the appearance of the little pattern 2 of hollow out can describe in background technology part with reference to the application, can increase the transparency in electrode section 3 region, decrease reflectivity in other words.
Comparatively speaking, the making of pattern for transparent conductive layer generally adopts such as chemical etching to produce, the surface also out-of-flatness of not removed electrically conducting transparent membrane portions, therefore, be not mirror-reflection to the reflection of light, but based on diffuse reflection, therefore, the reflection of its entirety is relative also more even.
About the adjustment of reflection, be the reflectivity reducing pattern part on the one hand, the object of the invention is the reflective homogeneous making whole transparency conducting layer, thus have employed the reflectivity homogenization scheme of the entirety being different from prior art.
For this reason, in the logicalnot circuit district 4 of transparency conducting layer, be the region between pattern, have the dummy pattern insulated with pattern in this areal distribution, as the logicalnot circuit district figure be made up of the illusory little pattern 5 of array in Fig. 1.
Dummy pattern can reduce the transparency in logicalnot circuit district, improves its reflectivity in other words, thus makes the transparency conducting layer reflective homogeneous of whole.
It is evident that, pierced pattern homogenising should could obtain the reflectivity of relatively good homogenising as far as possible, patent documentation described in background technology part generally have employed the structure of the relatively simple strip of processing procedure, the electrode section 3 of this kind of structure removal is relatively also many, makes the overall electrical resistance of line areas larger, thus, in some implementations, often need the mode thickening pattern to reduce resistance, but this certainly will to consume more material (such as ITO, resource is fewer).
In preferred embodiment of the present invention, described pierced pattern is the little pattern 2 of the hollow out of crossbar array in electrode section 3, and the little pattern 2 of hollow out of array arrangement is while reduction reflectivity, relatively little on the impact of electrode section 2 resistance variations.
In addition, from technology difficulty, currently can carry out the processing of finer nesa coating, thus, it is relatively little that the little pattern of hollow out 2 can do.
Preferably, the little pattern 2 of described hollow out is circular port, and circular port is best hollow out little pattern 2 structure, under the condition of nesa coating removing identical amount, the most obvious to the reduction of reflectivity.The electrode section 3 that array circular port produces is analogous to porous plate, improves the transparency of himself, on the contrary, reduces reflectivity.
In addition, the hole of rectangle, rhombus, star or bar shaped alternatively, wherein comparatively speaking, rectangle and diamond hole processibility also relatively good.
In view of this, electrode section 3 is had certain relation by the shape of the area of hollow out and the little pattern of hollow out 2, and in other words, under the condition reaching required transparency, the required total area removed of the little pattern of different hollow outs 2 can be variant.
Through checking, when adopting circular port, when hollow out falls the area of electrode section 3 about 20% ~ 25%, just preferably reflectivity can be obtained.When adopting the illusory little pattern 5 of other shapes, the total area of the electrode section 3 that hollow out is fallen suitably can be increased.
The pierced pattern area sum producing illusory little pattern 5 accounts for respective electrode portion 3 area and is not less than 1/10th, otherwise not only difficulty of processing is large, and too little on the impact of reflectivity.Also be not easily greater than 1/2nd, otherwise the overall electrical resistance of electrode section 3 can be larger.
Adopt line areas, i.e. the region at pattern place, and logicalnot circuit district 4 is processed, be the color in two regions and reflection differences are reduced, strengthen the shadow effect that disappears.Be different from prior art, the present embodiment is to carry out associated treatment to this region, does not cause cost when processing merely a region too large.
Further, while the transparency improving line areas area of the pattern in other words, reduce the transparency in logicalnot circuit district, improve reflectivity in other words, in a preferred embodiment, described dummy pattern is the illusory little pattern 5 of crossbar array, and is separated from each other.
Be separated from each other between the illusory little pattern 5 of array, can infer, illusory little pattern should also be separated with between pattern.
The dummy pattern object that array produces is the reflectivity improving logicalnot circuit district 4, and the reflectivity of whole transparency conducting layer is homogenized.
Described illusory little pattern 5 is preferably the column structure of rhombus or rectangle, and manufacturability is relatively good, and has reasonable effect to the reduction of reflectivity.Alternatively, illusory little pattern 5 can also adopt the column of circle, star or bar shaped.
Preferably, described pattern and dummy pattern are made up of the same face nesa coating, and pattern is identical with dummy pattern material, and thickness is identical, and manufacturability is relatively good.
About above-mentioned structure of transparent conductive layer, can directly apply in touch-screen, along with the progress of technique, the transparency of nesa coating self strengthens, and along with the progress of technique, the thickness of transparency conducting layer is thinning, adapt, also can improve the transparency of transparency conducting layer.
Thus, preferably, described touch-screen is the touch-screen with two transparency conducting layers, see Figure of description 3, thus comprises:
Substrate 9 is generally glass substrate.
First transparency conducting layer 8, is stacked on substrate 9, and the first transparency conducting layer 8 is positioned at side, display screen place, through checking, relatively little on reflectivity impact, can adopt traditional structure of transparent conductive layer, to reduce overall cost.
Insulation course 7, is arranged on the first transparency conducting layer 8.
Second transparency conducting layer 6, is arranged on insulation course 7, thus constructs inductive layer with the first transparency conducting layer 8 and insulation course 7.
Wherein, the second transparency conducting layer 6 adopts the transparency conducting layer of example of the present invention, and the second transparency conducting layer 6 is positioned at user side, and reflectivity impact is larger.
The preferred indium tin oxide of material (ITO) of described transparency conducting layer, alternatively, transparency conducting layer can also use aluminium zinc oxide or boron zinc oxide.
Illusory little pattern 5 forms combination pattern, i.e. the pattern in logicalnot circuit district, and during design, the method for estimation combination pattern reflectivity is: set base course reflection rate without nesa coating as R
0, have the reflectivity of nesa coating basic unit to be R
1, in line pattern, void region accounts for the area ratio of whole line pattern is α, then the reflectivity of line pattern is about: R=R
0× α+R
1× (1-α).The method is suitable for the estimation of dummy reflectivity equally, dummy district reflectivity about: R=R
0× (1-α)+R
1× α.
In one embodiment, can be realized on tin indium oxide (ITO) film by serigraphy and gold-tinted processing procedure.As shown in Fig. 1, between the line areas that electrode section 3 and connecting portion 1 are formed and line areas the 4(dummy district of logicalnot circuit district at illusory little pattern 5 place).Fig. 2 is the combination assumption diagrams of two electrically conducting transparent circuits together with 2 place's dummy structures.
Be applied in ITO
2line pattern design in, as Fig. 2.Be located at the R of dummy district and line areas
0and R
1value as shown in following table, data unit is %.
The illusory little pattern 5 in Dummy district adopts cylindrical structure, and cylinder radius is 0.08mm, arranges in the mode of 17 × 17, and it is 0.2946 that the long small column for 4.44mm, ITO material of diamond-plaid accounts for whole dummy district area ratio; Line areas also adopts the small circular holes of hollow out, i.e. the little pattern 2 of hollow out, and radius is 0.08mm, arrange in 16 × 16 modes, electrode section 3 adopts diamond-plaid structure, is configured to circuit diamond-plaid, the diamond-plaid length of side is 4.28mm, and the line is busy that road diamond-plaid area ratio is 0.2808 for the total area of the little pattern 2 of hollow out.
According to the above-mentioned evaluation method to composite figure line reflection rate, can calculate the reflectivity about 10.24% in dummy district, the reflectivity about 10.56% of line areas, difference in reflectivity is 0.32 percentage point.And only having dummy to design, during without ITO line combination design, the reflectivity about 10.23% in actual measurement dummy district, the reflectivity about 10.95% of line areas, difference in reflectivity is 0.72 percentage point.
As above, the combination pattern design of electrically conducting transparent line areas designs with the dummy in logicalnot circuit district together applies, and can reduce the optical difference in electrically conducting transparent line areas and logicalnot circuit district preferably.
Claims (10)
1. a transparency conducting layer, is characterized in that, comprising:
Pattern, has a plurality of, is separated from each other; Each pattern is formed by connecting portion (1) tandem by plurality of electrodes portion (3), and the tandem direction of each pattern is parallel to each other; Wherein electrode section (3) is evenly equipped with pierced pattern;
Logicalnot circuit district (4), is the region between pattern, has the dummy pattern insulated with pattern in this areal distribution.
2. transparency conducting layer according to claim 1, is characterized in that, described pierced pattern is the hollow out little pattern (2) of crossbar array in electrode section (3).
3. transparency conducting layer according to claim 2, is characterized in that, the little pattern of described hollow out (2) is the hole of circle, rectangle, rhombus, star or bar shaped.
4., according to the arbitrary described transparency conducting layer of claims 1 to 3, it is characterized in that, the pierced pattern area sum in an electrode section (3) accounts for 1/1 to two/10th of electrode section area.
5., according to the arbitrary described transparency conducting layer of claims 1 to 3, it is characterized in that, described dummy pattern is the illusory little pattern (5) of crossbar array, and is separated from each other.
6. transparency conducting layer according to claim 5, is characterized in that, described illusory little pattern (5) is the column of circle, rectangle, rhombus, star or bar shaped.
7., according to the arbitrary described transparency conducting layer of claims 1 to 3, it is characterized in that, described pattern and dummy pattern are made up of the same face nesa coating.
8. a touch-screen, is characterized in that, have as arbitrary in claim 1-7 as described in transparency conducting layer.
9. touch-screen according to claim 8, is characterized in that, described touch-screen is the touch-screen with two transparency conducting layers, thus comprises:
Substrate (9);
First transparency conducting layer (8), is stacked on substrate (9);
Insulation course (7), is arranged on the first transparency conducting layer (8); And
Second transparency conducting layer (6), is arranged on insulation course (7), thus constructs inductive layer with the first transparency conducting layer (8) and insulation course (7);
Wherein, the second transparency conducting layer (6) be as arbitrary in claim 1-7 as described in transparency conducting layer.
10. touch-screen according to claim 8, is characterized in that, the material of described transparency conducting layer is indium tin oxide, aluminium zinc oxide or boron zinc oxide.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510533256.3A CN105117059B (en) | 2015-08-27 | 2015-08-27 | Transparency conducting layer and touch screen |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510533256.3A CN105117059B (en) | 2015-08-27 | 2015-08-27 | Transparency conducting layer and touch screen |
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| Publication Number | Publication Date |
|---|---|
| CN105117059A true CN105117059A (en) | 2015-12-02 |
| CN105117059B CN105117059B (en) | 2019-04-05 |
Family
ID=54665070
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201510533256.3A Expired - Fee Related CN105117059B (en) | 2015-08-27 | 2015-08-27 | Transparency conducting layer and touch screen |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN105117059B (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105677096A (en) * | 2016-01-04 | 2016-06-15 | 京东方科技集团股份有限公司 | Touch substrate, manufacturing method of touch substrate and display panel |
| CN109753193A (en) * | 2017-11-07 | 2019-05-14 | 南昌欧菲显示科技有限公司 | Touch screen and touch screen terminal |
| CN110794983A (en) * | 2018-08-02 | 2020-02-14 | 东友精细化工有限公司 | Touch sensor |
| CN112885252A (en) * | 2021-04-13 | 2021-06-01 | 深圳市蝉翼科技有限公司 | Manufacturing process of flexible transparent LED display screen |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102955593A (en) * | 2011-08-22 | 2013-03-06 | 富创得科技股份有限公司 | Touch-control panel structure with dummy patterns |
| CN203502946U (en) * | 2013-09-05 | 2014-03-26 | 胜华科技股份有限公司 | Touch control panel |
| CN103677410A (en) * | 2013-12-02 | 2014-03-26 | 合肥京东方光电科技有限公司 | Touch base plate, touch screen and display device |
| CN204883653U (en) * | 2015-08-27 | 2015-12-16 | 山东华芯富创电子科技有限公司 | Transparent conducting film and touch -sensitive screen |
-
2015
- 2015-08-27 CN CN201510533256.3A patent/CN105117059B/en not_active Expired - Fee Related
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102955593A (en) * | 2011-08-22 | 2013-03-06 | 富创得科技股份有限公司 | Touch-control panel structure with dummy patterns |
| CN203502946U (en) * | 2013-09-05 | 2014-03-26 | 胜华科技股份有限公司 | Touch control panel |
| CN103677410A (en) * | 2013-12-02 | 2014-03-26 | 合肥京东方光电科技有限公司 | Touch base plate, touch screen and display device |
| CN204883653U (en) * | 2015-08-27 | 2015-12-16 | 山东华芯富创电子科技有限公司 | Transparent conducting film and touch -sensitive screen |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105677096A (en) * | 2016-01-04 | 2016-06-15 | 京东方科技集团股份有限公司 | Touch substrate, manufacturing method of touch substrate and display panel |
| CN105677096B (en) * | 2016-01-04 | 2018-09-11 | 京东方科技集团股份有限公司 | A kind of touch base plate and preparation method thereof and display panel |
| CN109753193A (en) * | 2017-11-07 | 2019-05-14 | 南昌欧菲显示科技有限公司 | Touch screen and touch screen terminal |
| CN110794983A (en) * | 2018-08-02 | 2020-02-14 | 东友精细化工有限公司 | Touch sensor |
| CN110794983B (en) * | 2018-08-02 | 2023-05-16 | 东友精细化工有限公司 | Touch sensor |
| CN112885252A (en) * | 2021-04-13 | 2021-06-01 | 深圳市蝉翼科技有限公司 | Manufacturing process of flexible transparent LED display screen |
Also Published As
| Publication number | Publication date |
|---|---|
| CN105117059B (en) | 2019-04-05 |
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Granted publication date: 20190405 |