CN105117059B - Transparency conducting layer and touch screen - Google Patents
Transparency conducting layer and touch screen Download PDFInfo
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- CN105117059B CN105117059B CN201510533256.3A CN201510533256A CN105117059B CN 105117059 B CN105117059 B CN 105117059B CN 201510533256 A CN201510533256 A CN 201510533256A CN 105117059 B CN105117059 B CN 105117059B
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Abstract
The invention discloses a kind of transparency conducting layer and touch screens, space first between the pattern of transparency conducting layer not exclusively removes, and it is constructed to dummy pattern, and also hollow out has pattern in electrode portion, to which the difference in reflectivity between electrode portion and logicalnot circuit area becomes smaller, tend to be close or even identical, reaches the shadow purpose that disappears.
Description
Technical field
The present invention relates to a kind of transparency conducting layers applied to touch screen, and the capacitive touch with the transparency conducting layer
Touch screen.
Background technique
Capacitive touch screen at least has a transparency conducting layer, and transparency conducting layer is the foundation structure for generating mutual capacitance.
Induction to touch needs two dimensions based on plane to carry out the sampling of touch location, so that it is determined that touch location, it is clear that
Entire transparent conductive film (Transparent Conductive Film, abbreviation TCF) does not obviously have such function.Cause
This, needs to pattern transparent conductive film and (generate line pattern), such as having the touch screen there are two transparency conducting layer,
One pattern for transparent conductive layer is turned to the electrode tandem on the first dimension direction, another pattern for transparent conductive layer turns to
With the electrode series connection on the second dimension direction, the first dimension is orthogonal with the second dimension, to realize touch location in plane
It determines.
In touching aobvious mould group, touch screen note is set in the outside of display screen, in other words towards the side of user, therefore, depending on
(and the funtion part of touch screen, the commonly referred to as part sensor, can also be called induction zone, viewfinder area, functional sheet to window segment
Deng) transparency the higher the better.But transparent conductive film just necessarily has certain reflectivity as transparent material, hence for saturating
For bright conductive layer, the reflectivity of the part with electrode tandem is greater than the part between electrode tandem, transparent in other words to lead
The reflectivity of electric layer various pieces is not identical, generates the shadow of transparency conducting layer and influences display effect.
In some implementations, being stacked the one layer of shadow film layer that disappears over transparent conductive layer (is often SiO2And Nb2O5Film group) and
Region outside outer layer electrically conducting transparent line pattern increases absentee layer (for the figure that is etched into of transparency conducting layer in logicalnot circuit area, note
For dummy structure) etc..But these ways have the following disadvantages: (1) membrane equipment valuableness, at high cost；(2) changing with supplied materials
Change has larger fluctuation, and process window is narrow；(3) increased dummy structure, the improvement for offseting shadow are limited.
Chinese patent literature CN103745766A discloses a kind of flexibility and disappears shadow transparent conductive film, and the document has used nanometer
The non-fully oxide film layer combination of grade, is more conducive to the broadening range through spectrum, and total light transmittance increases, or
Say that the document eliminates the influence of circuit lines, complex process, higher cost from new material angle.
Chinese patent literature CN103677410A discloses a kind of touch-control structure, uses and forms driving electricity in metallic conductor
The mode that multiple transmission regions are arranged in pole and induction electrode improves the transparency of transparency conducting layer.Wherein transmission region includes more
A opening being uniformly provided in metallic conductor, opening reticulate distribution, improve the uniformity of light transmittance.The structure needs to remove
Transparent conductive film part it is relatively more, technology difficulty is relatively large, and between upper layer and lower layer still have overhanging portion, exist
Layer is poor, on the one hand will affect whole structural strength, the uniformity of another aspect transparency is simultaneously bad.
Chinese patent literature CN203480458U then discloses a kind of induction electrode structure of touch panel, electrode pattern
Several rectangular openings being parallel to each other are provided with, so as to improving light penetration.The structure is as CN103677410A, between electrode
Space be hanging.
Summary of the invention
In view of this, the purpose of the present invention is to provide a kind of transparency height, and the uniform structure of transparent conductive layer of light transmission,
And the touch screen using the structure of transparent conductive layer.
The invention adopts the following technical scheme:
According to one aspect of the present invention, a kind of transparency conducting layer, comprising:
Pattern, have it is a plurality of, be separated from each other；Each pattern is formed by plurality of electrodes portion by interconnecting piece tandem, and
The tandem direction of each pattern is parallel to each other；Wherein electrode portion is evenly equipped with pierced pattern；
There is the dummy pattern with pattern insulation in logicalnot circuit area, the region between pattern in the area distribution.
Above-mentioned transparency conducting layer, in some embodiments, the pierced pattern are hollow out of the crossbar array in electrode portion
Small pattern.
Optionally, the small pattern of the hollow out is circle, rectangle, diamond shape, star or the hole of bar shaped.
Preferably, the sum of the pierced pattern area in an electrode portion accounts for 1/10th of electrode portion area to half.
Optionally, the dummy pattern is the illusory small pattern of crossbar array, and is separated from each other.
Optionally, the illusory small pattern is circle, rectangle, diamond shape, star or the column of bar shaped.
Preferably, the pattern and dummy pattern are made of the same face transparent conductive film.
A kind of touch screen according to another aspect of the invention, the transparency conducting layer with first aspect.
Above-mentioned touch screen, it is preferable that the touch screen is that there are two the touch screens of transparency conducting layer for tool, to include:
Substrate；
First transparency conducting layer, is stacked on substrate；
Insulating layer is arranged in the first transparency conducting layer；And
Second transparency conducting layer is arranged above the insulating layer, to incude with the first transparency conducting layer and insulating layer conformation
Layer；
Wherein, the second transparency conducting layer is the transparency conducting layer as described in first aspect of the present invention.
Above-mentioned touch screen, the material of the transparency conducting layer are indium tin oxide, aluminium zinc oxide or boron zinc oxide.
According to the present invention, the space first between the pattern of transparency conducting layer not exclusively removes, and is constructed to illusory figure
Case, and also hollow out has pattern in electrode portion, so that the difference in reflectivity between electrode portion and logicalnot circuit area becomes smaller, tends to be close,
It is even identical, reach the shadow purpose that disappears.
Detailed description of the invention
Fig. 1 is a kind of transparency conducting layer partial enlargement structural representation according to the present invention.
Fig. 2 is the partial enlarged view of interconnecting piece unit and electrode unit.
Fig. 3 is a kind of touch screen function cross-section structural schematic diagram according to the present invention.
In figure: 1. interconnecting pieces, the small pattern of 2. hollow outs, 3. electrode portions, 4. logicalnot circuit areas, 5. illusory small patterns, 6. second thoroughly
Bright conductive layer, 7. insulating layers, 8. first transparency conducting layers, 9. substrates.
Specific embodiment
In general, touch screen is located towards the side of user, when especially composition touches aobvious mould group, such as Mobile phone screen,
It is touch screen towards the side of user, is display screen backwards to the side of user, passes through the matching of touch screen and display screen, Ke Yiyong
In operating handset.
As described in the background section, the funtion part for realizing touch screen touch function is realized by transparency conducting layer,
Transparency conducting layer is patterned transparent conductive film.
About transparency conducting layer, the stitching for being parallel to dimension is usually patterned, stitching (also referred to as route) is known as scheming
Case is separated from each other between pattern, to can sample the electric signal sensed on this pattern in the part where pattern.
Pattern is more, and the visual effect of screen is better, and therefore, with the development of process technique, present display screen is
The shape of pattern can be significantly found out unlike such as resistive touch screen earlier.
Therefore, the pattern has a plurality of, so that array arranges on a dimension direction, is separated from each other, and forms electricity
Air bound from needing to insulate in other words between each other.
A pattern form generally long rectangle earlier, strip in other words, to the sensibility ratio of touch
Poor, gradually, the shape of pattern no longer uses the structure of homogeneous, and is provided with the structural portion of electrode portion 3 and connection electrode portion
Divide, referred to as interconnecting piece 1, as shown in Figure 1.
The use more at present of electrode portion 3 has the electrode portion 3 of diamond structure, so that sheet resistance is minimum, optionally, in addition,
Such as rectangular configuration or the electrode portion of square structure it is also more common.
In general, stitching, route are extended according to scheduled dimension to pattern in other words, the length of extension often depends on
In the size of form.
Therefore, by interconnecting piece 1, successively tandem forms a pattern to electrode portion 3.It is same transparent on the basis of tandem direction
Pattern on conductive layer is parallel to each other.
Fig. 2 reflects the structure in partial electrode portion 3 and part logicalnot circuit area 4, in figure, it is seen that, electrode portion 3, which is gone into battle, to be shown
The small pattern 2 of hollow out.
One kind of illustrated only small pattern in figure, it is seen that, the appearance of the small pattern 2 of hollow out is referred to the application and exists
The patent document of background technology part description, will increase the transparency in 3 region of electrode portion, reduces reflectivity in other words.
In contrast, the production of pattern for transparent conductive layer is generally generated using such as chemical etching, and what is be not removed is transparent
The simultaneously out-of-flatness of the surface of conductor film sections, therefore, the reflection to light is not mirror-reflection, but based on diffusing reflection, because
This, whole reflection is relatively also relatively uniform.
It is on the one hand the reflectivity for reducing pattern part, the purpose of the present invention is keep whole face transparent about the adjustment of reflection
The reflective homogeneous of conductive layer, thus use the whole reflectivity homogenization scheme being different from the prior art.
For this purpose, in the logicalnot circuit area 4 of transparency conducting layer, region between pattern has exhausted with pattern in the area distribution
The dummy pattern of edge, the logicalnot circuit area figure being made of as shown in figure 1 the illusory small pattern 5 of array.
Dummy pattern can reduce the transparency in logicalnot circuit area, improve its reflectivity in other words, to make entire transparent
Conductive layer reflective homogeneous.
It is readily apparent that pierced pattern should homogenize the reflectivity that could obtain relatively good homogenization as far as possible,
Patent document described in background technology part has generallyd use the structure of the relatively simple strip of processing procedure, this kind of structure is gone
The electrode portion 3 removed is relatively also relatively more, keeps the overall electrical resistance of line areas bigger, thus, in some implementations, generally require to add
The mode of thick pattern reduces resistance, however this is bound to consume more materials (such as ITO, resource are fewer).
In preferred embodiments of the present invention, the pierced pattern is the small pattern of hollow out of the crossbar array in electrode portion 3
2, for the small pattern 2 of the hollow out of array arrangement while reducing reflectivity, the influence to 2 resistance variations of electrode portion is relatively small.
In addition, currently have been able to carry out finer transparent conductive film processing from technology difficulty, thus, it engraves
Empty small pattern 2 can do relatively small.
Preferably, the small pattern 2 of the hollow out is round hole, and round hole is small 2 structure of pattern of optimal hollow out, in removal phase
It is most obvious to the reduction of reflectivity under conditions of the transparent conductive film of same amount.Electrode portion 3 caused by array round hole is analogous to
Porous plate, improves the transparency of its own, on the contrary, reducing reflectivity.
Optionally, in addition rectangle, diamond shape, star or the hole of bar shaped, wherein in contrast, rectangle and diamond hole are processable
Property is also relatively good.
In view of this, electrode portion 3 has certain relationship by the shape of the area of hollow out and the small pattern 2 of hollow out, in other words,
Under conditions of transparency required for reaching, the gross area removed required for the small pattern 2 of different hollow outs can be variant.
By verifying, when using round hole, hollow out is obtained with preferably when falling the area of electrode portion 3 about 20% ~ 25%
Reflectivity.When using the illusory small pattern 5 of other shapes, it can suitably increase the gross area for the electrode portion 3 that hollow out is fallen.
Not less than 1/10th, otherwise the sum of the pierced pattern area for generating illusory small pattern 5 accounts for 3 area of respective electrode portion
Not only difficulty of processing is big, but also the influence to reflectivity is too small.Also it is not easy to be greater than half, otherwise the whole electricity of electrode portion 3
Resistance can be bigger.
It is handled using to line areas, i.e. region where pattern, and to logicalnot circuit area 4, is to make two regions
Color and reflection differences reduce, enhancing disappears shadow effect.It is different from the prior art, the present embodiment is to assist this region
With processing, cost is too big when not causing to handle a region merely.
Further, while improving the line areas transparency of area of the pattern in other words, the transparent of logicalnot circuit area is reduced
Degree, improves reflectivity in other words, and in a preferred embodiment, the dummy pattern is the illusory small pattern 5 of crossbar array, and phase
Mutually separation.
It is separated from each other between the illusory small pattern 5 of array, can infer, should be also between illusory small pattern and pattern
Separation.
The dummy pattern purpose that array generates is the reflectivity in raising logicalnot circuit area 4, makes the anti-of whole face transparency conducting layer
The rate of penetrating homogenizes.
The illusory small pattern 5 is preferably the column structure of diamond shape or rectangle, and craftsmanship is relatively good, and to reflection
The reduction of rate has the effect of relatively good.Optionally, illusory small pattern 5 can also be using round, star or the column of bar shaped
Body.
Preferably, the pattern and dummy pattern are made of the same face transparent conductive film, pattern and dummy pattern material phase
Together, thickness is identical, and craftsmanship is relatively good.
It about above-mentioned structure of transparent conductive layer, may be directly applied in touch screen, with the progress of technique, electrically conducting transparent
The transparency of film itself enhances, and with the progress of technique, the thickness of transparency conducting layer is thinned, adaptable, also can be improved
The transparency of transparency conducting layer.
It is thus preferable that the touch screen is that there are two the touch screens of transparency conducting layer for tool, referring to Figure of description 3, from
And include:
Substrate 9, usually glass substrate.
First transparency conducting layer 8, is stacked on substrate 9, and the first transparency conducting layer 8 is located at side where display screen, by testing
Card, it is relatively small on reflectivity influence, traditional structure of transparent conductive layer can be used, to reduce whole cost.
Insulating layer 7 is arranged in the first transparency conducting layer 8.
Second transparency conducting layer 6 is arranged on insulating layer 7, to construct with the first transparency conducting layer 8 and insulating layer 7
Inductive layer.
Wherein, using the exemplary transparency conducting layer of the present invention, the second transparency conducting layer 6 is located to be used the second transparency conducting layer 6
Family side, reflectivity are affected.
The preferred indium tin oxide of the material of the transparency conducting layer (ITO), optionally, transparency conducting layer can also use aluminium
Zinc oxide or boron zinc oxide.
Illusory small pattern 5 forms combination pattern, the i.e. pattern in logicalnot circuit area, when design, estimation combination pattern reflectivity
Method are as follows: set the base course reflection rate of no transparent conductive film as R0, the reflectivity for having transparent conductive film base is R1, in line pattern
The area ratio that hollowed out area accounts for entire line pattern is α, then the reflectivity of line pattern is about are as follows: R=R0×α + R1×(1-
α) .The estimation of the equally applicable dummy reflectivity of this method, the area dummy reflectivity about: R=R0×(1-α) + R1×α 。
In one embodiment, it can be realized on tin indium oxide (ITO) film by silk-screen printing and yellow light process.
Show as shown in figure 1, the logicalnot circuit area 4 between electrode portion 3 and the line areas and line areas of the composition of interconnecting piece 1 where illusory small pattern 5
(area dummy).Fig. 2 is combination assumption diagram of two electrically conducting transparent routes together with dummy structures at 2.
It applies in ITO2Line pattern design in, such as Fig. 2.It is located at the R of the area dummy and line areas0And R1Value such as following table
Shown in, data unit %.
The illusory small pattern 5 in the area Dummy uses cylindrical structure, and cylinder radius 0.08mm is arranged in a manner of 17 × 17
Column, a length of 4.44mm of diamond-plaid, it is 0.2946 that the small column of ITO material, which accounts for the entire area dummy area ratio,；Line areas also uses and engraves
Empty small circular holes, the i.e. small pattern 2 of hollow out, radius 0.08mm are arranged in a manner of 16 × 16, and electrode portion 3 uses diamond-plaid knot
Structure, is configured to route diamond-plaid, and diamond-plaid side length is 4.28mm, the gross area of the small pattern 2 of hollow out the line is busy road diamond-plaid area ratio
It is 0.2808.
According to the above-mentioned evaluation method to composite figure line reflection rate, the reflectivity about 10.24% in the area dummy can be calculated,
The reflectivity of line areas about 10.56%, difference in reflectivity are 0.32 percentage point.And only dummy is designed, no ITO line combination
When design, the reflectivity about 10.23% in the area dummy, the reflectivity of line areas about 10.95% are surveyed, difference in reflectivity is
0.72 percentage point.
As above, the combination pattern design of electrically conducting transparent line areas is applied together with the dummy design in logicalnot circuit area, can be preferably
The optical difference of ground reduction electrically conducting transparent line areas and logicalnot circuit area.
Claims (9)
1. a kind of transparency conducting layer characterized by comprising
Pattern, have it is a plurality of, be separated from each other；Each pattern is formed by plurality of electrodes portion (3) by interconnecting piece (1) tandem,
And the tandem direction of each pattern is parallel to each other；Wherein electrode portion (3) is evenly equipped with pierced pattern, and electrode portion (3) is diamond shape；
There is the dummy pattern with pattern insulation in logicalnot circuit area (4), the region between pattern in the area distribution；
The sum of pierced pattern area in electrode portion (3) accounts for 1/10th of electrode portion area to half.
2. transparency conducting layer according to claim 1, which is characterized in that the pierced pattern is crossbar array in electrode portion
(3) the small pattern of hollow out (2) on.
3. transparency conducting layer according to claim 2, which is characterized in that the small pattern of hollow out (2) be circle, rectangle,
Diamond shape, star or the hole of bar shaped.
4. transparency conducting layer according to any one of claims 1 to 3, which is characterized in that the dummy pattern is crossbar array
Illusory small pattern (5), and be separated from each other.
5. transparency conducting layer according to claim 4, which is characterized in that the illusory small pattern (5) be circle, rectangle,
Diamond shape, star or the column of bar shaped.
6. transparency conducting layer according to any one of claims 1 to 3, which is characterized in that the pattern and dummy pattern are by same
Transparent conductive film is made on one side.
7. a kind of touch screen, which is characterized in that have the transparency conducting layer as described in claim 1-6 is any.
8. touch screen according to claim 7, which is characterized in that the touch screen is that there are two the touchings of transparency conducting layer for tool
Screen is touched, to include:
Substrate (9)；
First transparency conducting layer (8) is stacked on substrate (9)；
Insulating layer (7) is arranged in the first transparency conducting layer (8)；And
Second transparency conducting layer (6) is arranged on insulating layer (7), thus with the first transparency conducting layer (8) and insulating layer (7)
Construct inductive layer；
Wherein, the second transparency conducting layer (6) is the transparency conducting layer as described in claim 1-6 is any.
9. touch screen according to claim 7, which is characterized in that the material of the transparency conducting layer be indium tin oxide,
Aluminium zinc oxide or boron zinc oxide.
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| Application Number | Priority Date | Filing Date | Title |
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| CN201510533256.3A CN105117059B (en) | 2015-08-27 | 2015-08-27 | Transparency conducting layer and touch screen |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510533256.3A CN105117059B (en) | 2015-08-27 | 2015-08-27 | Transparency conducting layer and touch screen |
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| CN105117059A CN105117059A (en) | 2015-12-02 |
| CN105117059B true CN105117059B (en) | 2019-04-05 |
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| CN201510533256.3A Active CN105117059B (en) | 2015-08-27 | 2015-08-27 | Transparency conducting layer and touch screen |
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Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105677096B (en) * | 2016-01-04 | 2018-09-11 | 京东方科技集团股份有限公司 | A kind of touch base plate and preparation method thereof and display panel |
| KR101952770B1 (en) * | 2018-08-02 | 2019-02-27 | 동우 화인켐 주식회사 | Touch sensor |
| CN112885252B (en) * | 2021-04-13 | 2024-03-29 | 珠海华萃科技有限公司 | Manufacturing process of flexible transparent LED display screen |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102955593A (en) * | 2011-08-22 | 2013-03-06 | 富创得科技股份有限公司 | Touch-control panel structure with dummy patterns |
| CN203502946U (en) * | 2013-09-05 | 2014-03-26 | 胜华科技股份有限公司 | Touch control panel |
| CN103677410A (en) * | 2013-12-02 | 2014-03-26 | 合肥京东方光电科技有限公司 | Touch base plate, touch screen and display device |
| CN204883653U (en) * | 2015-08-27 | 2015-12-16 | 山东华芯富创电子科技有限公司 | Transparent conducting film and touch -sensitive screen |
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2015
- 2015-08-27 CN CN201510533256.3A patent/CN105117059B/en active Active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102955593A (en) * | 2011-08-22 | 2013-03-06 | 富创得科技股份有限公司 | Touch-control panel structure with dummy patterns |
| CN203502946U (en) * | 2013-09-05 | 2014-03-26 | 胜华科技股份有限公司 | Touch control panel |
| CN103677410A (en) * | 2013-12-02 | 2014-03-26 | 合肥京东方光电科技有限公司 | Touch base plate, touch screen and display device |
| CN204883653U (en) * | 2015-08-27 | 2015-12-16 | 山东华芯富创电子科技有限公司 | Transparent conducting film and touch -sensitive screen |
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