CN105116571A - Substrate alignment detection and calibration device and method - Google Patents
Substrate alignment detection and calibration device and method Download PDFInfo
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- CN105116571A CN105116571A CN201510594023.4A CN201510594023A CN105116571A CN 105116571 A CN105116571 A CN 105116571A CN 201510594023 A CN201510594023 A CN 201510594023A CN 105116571 A CN105116571 A CN 105116571A
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- substrate
- bit cell
- baseplate carrier
- play amount
- testing calibration
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/1306—Details
- G02F1/1309—Repairing; Testing
Abstract
The invention discloses a substrate alignment detection and calibration device and method. The device comprises alignment units arranged on a substrate stage, a control device and a substrate position detection unit. The multiple alignment units and the substrate position detection unit are in communication connection with the control device. The substrate position detection unit scans the edge of a substrate, detects the distance between the edge of the substrate and the edge of the substrate stage and transmits the distance value to the control device so that the offset of the substrate can be calculated, and the control device transmits a control command to the alignment units according to the offset of the substrate so that the alignment units can act correspondingly to adjust the position of the substrate. Whether the substrate offset exits is confirmed before an undesirable phenomenon occurs, and the calibration accuracy of the substrate offset is greatly improved.
Description
Technical field
The present invention relates to a kind of substrate contraposition testing calibration apparatus and method, belong to liquid crystal manufacturing technology field.
Background technology
Liquid crystal indicator, because having the advantages such as low in energy consumption, radiationless, has now occupied the leading position in plane display field.In existing liquid crystal indicator, liquid crystal panel generally includes the array base palte and color membrane substrates that are oppositely arranged, and the liquid crystal layer be filled between array base palte and color membrane substrates, wherein, array base palte is provided with multiple thin film transistor (TFT) and multiple pixel electrode, pixel electrode is connected with the drain electrode of thin film transistor (TFT), and color membrane substrates is provided with the public electrode corresponding with pixel electrode.When by thin film transistor (TFT) being pixel electrode charging, between pixel electrode and public electrode, form electric field, thus the liquid crystal deflecting element in the controllable pixels electrode pair liquid crystal region of answering, and then realize crystal display.
In flat pannel display and semiconductor manufacturing industry, coating technique forms the very crucial technology of array base palte in liquid crystal manufacture.Coating technique applies one deck photoresist at substrate surface to be processed exactly in device fabrication processes, is then produced electrode or the layer pattern of demand by operations such as post-exposure, development, etching, demouldings.During photoresist coating, the position accuracy demand of substrate 1 in coating (Coater) board (Stage) 2 is very high, equipment has carried substrate alignment apparatus, as shown in Figure 1 for this reason.This alignment device is made up of the multiple bit cell 3 be distributed in around coating machine platform, and each bit cell 3 comprises a columniform contraposition guiding device 31 and a connecting link 32.Before substrate is put into coating machine platform, connecting link 32 fell, and contraposition guiding device 31 does not contact with substrate 1; As shown in Figure 2, after substrate 1 is put on coating machine platform 2, connecting link 32 is holded up, and contraposition guiding device 31 and substrate 1 edge contact, adjust substrate position.
Require that substrate position can not have large deviation after contraposition guiding device 31 pairs of substrates 1 carry out contraposition, otherwise just there will be the bad problems of quality such as dislocation (Uncoating) and fragmentation.But existing equipment lacks the device detected substrate 1 position offset, only have when the bad problem of the quality such as dislocation and fragmentation occurs by the time and just know that skew has appearred in substrate position; After skew appears in substrate position, existing equipment lacks device substrate position being carried out to automatic calibration, can only go to confirm substrate position side-play amount by manual ruler, and substrate position skew side-play amount being less than to 1mm cannot effectively confirm and adjust at all; The effect of manual adjustment lacks Data support, just adjusts correct when it is generally acknowledged the bad disappearances of quality such as dislocation and fragmentation.
Summary of the invention
The technical problem to be solved in the present invention is: how automatically to detect the side-play amount of substrate on baseplate carrier, and the skew of real time calibration substrate.
For realizing above-mentioned goal of the invention, the invention provides a kind of substrate contraposition testing calibration apparatus and method.
On the one hand, the invention provides a kind of substrate contraposition testing calibration device, comprising:
Be arranged on the bit cell on baseplate carrier, control device and substrate position detecting unit;
Described multiple bit cell and described substrate position detecting unit communicate to connect with described control device respectively;
Described substrate position detecting unit scanning substrate edge, detect the distance of substrate edges to baseplate carrier edge, and transfer to the side-play amount that control device calculates substrate, control device sends control command according to the side-play amount of substrate to bit cell, makes bit cell produce the position of corresponding action adjustment substrate.
Wherein more preferably, described bit cell is multiple, and described multiple bit cell is arranged on the pre-position at baseplate carrier edge.
Wherein more preferably, described bit cell comprises liftable conical nose.
Wherein more preferably, described bit cell also comprises jacking gear,
Described jacking gear connects the bottom surface of described conical nose;
Described jacking gear comprises rotating screw mandrel.
Wherein more preferably, described substrate position detecting unit is laser detector.
On the other hand, the invention provides a kind of substrate contraposition testing calibration method, be applied to above-mentioned device, comprise the steps:
Substrate position detecting unit detects the position of substrate on baseplate carrier,
Control device goes out the side-play amount of substrate according to the position calculation of substrate on baseplate carrier and calibrates control command according to the side-play amount of substrate accordingly to generation;
Bit cell produces the position of corresponding action adjustment substrate according to calibration control command.
Wherein more preferably, described substrate position detecting unit is that timing detects.
Wherein more preferably, the described substrate position detecting unit detection position of substrate on baseplate carrier comprises:
Scanning substrate edge in X direction;
Along Y-direction scanning substrate edge;
According to position detection unit to the Distance geometry position detection unit of substrate to the position of distance determination substrate on baseplate carrier of baseplate carrier.
Wherein more preferably, the position of described substrate on baseplate carrier is that position detection unit is determined to the Distance geometry position detection unit of substrate to the saltus step of the distance of baseplate carrier.
Wherein more preferably, the described side-play amount according to substrate comprises to generation corresponding calibration control command:
The actuating quantity of bit cell is calculated according to the side-play amount of substrate.
Wherein more preferably, the actuating quantity of described bit cell is calculated as follows:
△X＝k×△H1
△Y＝k×△H2
Wherein, △ X is the transversal displacement of substrate position, and △ Y is the vertical misalignment amount of substrate position, k be side-play amount to potential coefficient, △ H1 is the actuating quantity of the bit cell controlling substrate transverse shifting, and △ H2 is the actuating quantity controlling the bit cell that substrate vertically moves.
Wherein more preferably, described side-play amount contraposition coefficient k is determined according to the slope of the liftable conical nose of described bit cell.
Substrate contraposition testing calibration apparatus and method provided by the invention, the gap of coating machine head is arrived on substrate surface and board surface to utilize laser detector to confirm, confirm the distance of substrate edges to board edge by the saltus step of measurement clearance, automatically calculate side-play amount according to this distance; The conical nose can extrapolating corresponding bit cell according to the side-play amount calculated rises or dropping distance, and the conical nose realizing bit cell finally by screw mandrel motion rises or declines.The present invention is confirmed whether to there is substrate offset problem before bad generation; Greatly improve the calibration accuracy of substrate skew.
Accompanying drawing explanation
Fig. 1 is substrate alignment apparatus structural representation in prior art;
Fig. 2 is the substrate contraposition calibration schematic diagram shown in Fig. 1;
Fig. 3 is substrate contraposition testing calibration apparatus structure schematic diagram of the present invention;
Fig. 4 is bit cell structural representation of the present invention;
Fig. 5 is that laser detector scanning substrate of the present invention produces saltus step schematic diagram in X-direction;
Fig. 6 is that laser detector scanning substrate of the present invention produces saltus step schematic diagram in the Y direction;
Fig. 7 is substrate contraposition testing calibration method flow schematic diagram of the present invention.
Embodiment
Below in conjunction with drawings and Examples, the specific embodiment of the present invention is described in further detail.Following examples for illustration of the present invention, but are not used for limiting the scope of the invention.
As shown in Figure 3, the invention provides a kind of substrate contraposition testing calibration device, comprising: be arranged on the bit cell 30 on baseplate carrier, control device 4 and substrate position detecting unit 5; Multiple bit cell 30 and substrate position detecting unit 5 communicate to connect with control device 4 respectively; The edge of substrate position detecting unit 5 scanning substrate 1, detect the distance of edge to the edge of baseplate carrier 2 of substrate 1, and transfer to the side-play amount that control device 4 calculates substrate 1, control device 1 sends control command according to the side-play amount of substrate to bit cell 30, makes bit cell 30 produce the position of corresponding action adjustment substrate.Detailed description is launched to substrate contraposition testing calibration device provided by the invention below.
As shown in Figure 3, in the present invention, bit cell 30 is multiple, and multiple bit cell 30 are arranged on the pre-position at baseplate carrier 2 edge.Bit cell 30 is preferably 6, and every two relative limits arrange three bit cell 30, and two bit cell 30 on the limit that the bit cell 30 on one of them limit is relative with another form triangle, make the substrate between three bit cell 30 more stable.As shown in Figure 3, Figure 4, bit cell 30 comprises liftable conical nose 35.Bit cell 30 also comprises jacking gear 36, and jacking gear 36 connects the bottom surface of conical nose 35; Jacking gear 36 comprises rotating screw mandrel 37.The screw mandrel 37 of bit cell 30 rotates the height change that can regulate jacking gear 36, and the lifting of jacking gear 36 drives the conical nose 35 of bit cell 30 to be elevated, and conical nose 35 is elevated the substrate 1 promoting to rest on conical nose 35 and moves.
As shown in Figure 3, substrate position detecting unit 5 is preferably laser detector (LaserSensor).The gap (Gap) of photoresist dispense tip (Nozzle) most advanced and sophisticated (fixing with LaserSensor relative position) to baseplate carrier 2 surface and substrate surface measured by laser detector on the present invention's profit baseplate carrier 2.Laser detector can carry out continuous coverage to photoresist dispense tip tip to the gap of baseplate carrier 2 and substrate surface along plane X direction, substrate place and Y-direction, and measurement result as shown in Figure 5, Figure 6.As shown in Figure 5, the transverse axis in figure is X-direction distance, and the longitudinal axis is X-direction scanning Gap.When laser detector scans the edge of substrate 1 as can be seen from Figure, can saltus step be there is in gap width, during gap width saltus step, the X-direction distance of transverse axis display is exactly the distance of edge to the edge of substrate 1 of baseplate carrier 2, laser detector just can obtain (X-direction) before and after substrate in X direction after the end of scan, to the distance at baseplate carrier edge, just can calculate substrate position side-play amount (Δ X) according to this distance.As shown in Figure 6, the transverse axis in figure is Y-direction distance, and the longitudinal axis is Y-direction scanning gap.When laser detector scans substrate edges as can be seen from Figure, can saltus step be there is in gap width, during gap width saltus step, the Y-direction distance of transverse axis display is exactly the distance of edge to substrate edges of baseplate carrier 2, about laser detector just can obtain substrate after the Y-direction end of scan, (Y-direction) is to the distance at the edge of baseplate carrier 2, just can calculate substrate position side-play amount (Δ Y) according to this distance.In liquid crystal panel process, detection can be carried out according to the frequency preset to substrate position and confirm, if substrate position side-play amount has exceeded the distance preset, then need to use alignment device provided by the invention to calibrate substrate position.
For embodying the superiority of substrate contraposition testing calibration device provided by the invention further, the present invention also provides a kind of substrate contraposition testing calibration method, the method is applied to above-mentioned device, comprise the steps: that substrate position detecting unit detects the position of substrate on baseplate carrier, control device goes out the side-play amount of substrate according to the position calculation of substrate on baseplate carrier and calibrates control command according to the side-play amount of substrate accordingly to generation; Bit cell produces the position of corresponding action adjustment substrate according to calibration control command.Detailed description is launched to the present invention and the substrate contraposition testing calibration method that provides below.
First, the step that substrate position detecting unit detects the position of substrate on baseplate carrier is introduced.
Substrate is placed on after on baseplate carrier, and laser detector carries out continuous coverage to photoresist dispense tip tip to the gap on baseplate carrier 2 and substrate 1 surface with X-direction and Y-direction along substrate place plane.To the edge of substrate 1 to baseplate carrier 2 edge between gap time, preferably timing detects.The step detecting the position of substrate on baseplate carrier at substrate position detecting unit comprises: scanning substrate edge in X direction; Along Y-direction scanning substrate edge; According to position detection unit to the Distance geometry position detection unit of substrate to the position of distance determination substrate on baseplate carrier of baseplate carrier.As shown in Figure 5, the position of substrate on baseplate carrier is that position detection unit is determined to the Distance geometry position detection unit of substrate to the saltus step of the distance of baseplate carrier.When substrate position detecting unit detects substrate edges and baseplate carrier edge along substrate X-direction, if the distance generation saltus step that substrate position detecting unit detects, then think that substrate has skew in X-direction, and the size of side-play amount △ X is the saltus step size that saltus step occurs.When substrate position detecting unit detects substrate edges and baseplate carrier edge along substrate Y-direction, if the distance generation saltus step that substrate position detecting unit detects, then think that substrate has skew in the Y direction, and the size of side-play amount △ Y is the saltus step size that saltus step occurs.
Secondly, introduce device processed according to the position calculation of substrate on baseplate carrier go out substrate side-play amount and according to the side-play amount of substrate to generating the step of calibrating control command accordingly.
The substrate edges that control device goes out according to detection place of substrate position detecting unit to the position at baseplate carrier edge, the substrate position side-play amount calculated (△ X and △ Y).Control device calculates the actuating quantity of bit cell corresponding to position that skew occurs according to substrate position side-play amount (△ X and △ Y), and the actuating quantity of corresponding bit cell is generated corresponding control command and send to corresponding bit cell.Particularly, control device calculates the lifting amount of the bit cell 30 be arranged on around baseplate carrier according to substrate position side-play amount (△ X and △ Y).The conical nose of each bit cell needs the distance (△ H) rising or decline.The conical nose of bit cell rises or decline △ H, and corresponding change in radius is △ R.The actuating quantity controlling the bit cell of the horizontal adjustment of substrate and longitudinally adjustment respectively calculates by following formula (1), (2):
△X＝k×△H1(1)
△Y＝k×△H2(2)
Wherein, △ X is the transversal displacement of substrate position, and △ Y is the vertical misalignment amount of substrate position, k be side-play amount to potential coefficient, △ H1 is the actuating quantity of the bit cell controlling substrate transverse shifting, and △ H2 is the actuating quantity controlling the bit cell that substrate vertically moves.
Side-play amount contraposition coefficient k determines the slope of the conical nose (determine) by the conical nose kind of bit cell.
Such as, it is inclined forward in X-direction that computing machine calculates substrate, substrate needs along the X direction toward pusher a bit, the conical nose of the bit cell at this moment before X-direction needs toward rising, the conical nose of X-direction bit cell below then needs toward declining, and the screw mandrel 37 finally by bit cell 30 rotates the lifting realizing the conical nose of bit cell.
Finally, bit cell produces the position of corresponding action adjustment substrate step according to calibration control command is introduced.
The bit cell be arranged on around baseplate carrier performs corresponding control command after receiving the control command of control device transmission, the offset distance of adjustment substrate on baseplate carrier.Again detect the position of substrate after order is finished, so circulation is until by substrate contraposition to accurate location.
In sum, substrate contraposition testing calibration apparatus and method provided by the invention, the gap of coating machine head is arrived on substrate surface and board surface to utilize laser detector to confirm, confirm the distance of substrate edges to board edge by the saltus step of measurement clearance, automatically calculate side-play amount according to this distance; The conical nose can extrapolating corresponding bit cell according to the side-play amount calculated rises or dropping distance, and the conical nose realizing bit cell finally by screw mandrel motion rises or declines.The present invention is confirmed whether to there is substrate offset problem before bad generation; Greatly improve the calibration accuracy of substrate skew.
Above embodiment is only for illustration of the present invention; and be not limitation of the present invention; the those of ordinary skill of relevant technical field; without departing from the spirit and scope of the present invention; can also make a variety of changes and modification; therefore all equivalent technical schemes also belong to category of the present invention, and scope of patent protection of the present invention should be defined by the claims.
Claims (12)
1. a substrate contraposition testing calibration device, is characterized in that, comprising:
Be arranged on the bit cell on baseplate carrier, control device and substrate position detecting unit;
Described multiple bit cell and described substrate position detecting unit communicate to connect with described control device respectively;
Described substrate position detecting unit scanning substrate edge, detect the distance of substrate edges to baseplate carrier edge, and transfer to the side-play amount that control device calculates substrate, control device sends control command according to the side-play amount of substrate to bit cell, makes bit cell produce the position of corresponding action adjustment substrate.
2. substrate contraposition testing calibration device as claimed in claim 1, it is characterized in that, described bit cell is multiple, and described multiple bit cell is arranged on the pre-position at baseplate carrier edge.
3. substrate contraposition testing calibration device as claimed in claim 1, it is characterized in that, described bit cell comprises liftable conical nose.
4. substrate contraposition testing calibration device as claimed in claim 3, it is characterized in that, described bit cell also comprises jacking gear,
Described jacking gear connects the bottom surface of described conical nose;
Described jacking gear comprises rotating screw mandrel.
5. substrate contraposition testing calibration device as claimed in claim 1, it is characterized in that, described substrate position detecting unit is laser detector.
6. a substrate contraposition testing calibration method, is characterized in that, is applied to the device described in claim 1-5 any one, comprises the steps:
Substrate position detecting unit detects the position of substrate on baseplate carrier,
Control device goes out the side-play amount of substrate according to the position calculation of substrate on baseplate carrier and calibrates control command according to the side-play amount of substrate accordingly to generation;
Bit cell produces the position of corresponding action adjustment substrate according to calibration control command.
7. substrate contraposition testing calibration method as claimed in claim 6, is characterized in that, described substrate position detecting unit is that timing detects.
8. substrate contraposition testing calibration method as claimed in claim 6, is characterized in that, described substrate position detecting unit detects the position of substrate on baseplate carrier and comprises:
Scanning substrate edge in X direction;
Along Y-direction scanning substrate edge;
According to position detection unit to the Distance geometry position detection unit of substrate to the position of distance determination substrate on baseplate carrier of baseplate carrier.
9. substrate contraposition testing calibration method as claimed in claim 8, it is characterized in that, the position of described substrate on baseplate carrier is that position detection unit is determined to the Distance geometry position detection unit of substrate to the saltus step of the distance of baseplate carrier.
10. substrate contraposition testing calibration method as claimed in claim 6, is characterized in that, the described side-play amount according to substrate comprises to generation corresponding calibration control command:
The actuating quantity of bit cell is calculated according to the side-play amount of substrate.
11. substrate contraposition testing calibration methods as claimed in claim 10, it is characterized in that, the actuating quantity of described bit cell is calculated as follows:
△X＝k×△H1
△Y＝k×△H2
Wherein, △ X is the transversal displacement of substrate position, and △ Y is the vertical misalignment amount of substrate position, k be side-play amount to potential coefficient, △ H1 is the actuating quantity of the bit cell controlling substrate transverse shifting, and △ H2 is the actuating quantity controlling the bit cell that substrate vertically moves.
12. substrate contraposition testing calibration methods as claimed in claim 10, it is characterized in that, described side-play amount contraposition coefficient k is determined according to the slope of the liftable conical nose of described bit cell.
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| CN201510594023.4A CN105116571B (en) | 2015-09-17 | 2015-09-17 | A kind of substrate contraposition testing calibration device and method |
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| CN201510594023.4A CN105116571B (en) | 2015-09-17 | 2015-09-17 | A kind of substrate contraposition testing calibration device and method |
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| CN105116571B CN105116571B (en) | 2018-09-28 |
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Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN106064880A (en) * | 2016-06-27 | 2016-11-02 | 昆山国显光电有限公司 | Positioner and localization method thereof |
| CN107192333A (en) * | 2017-07-10 | 2017-09-22 | 刘灏 | A kind of concrete prefabricated board assembly line die station offset detector and method |
| CN109143629A (en) * | 2018-09-28 | 2019-01-04 | 张家港康得新光电材料有限公司 | The detection method of alignment film position precision in a kind of display panel mother matrix |
| CN109375472A (en) * | 2018-10-23 | 2019-02-22 | 武汉华星光电技术有限公司 | Expose the method when machine and substrate expose |
| CN110026804A (en) * | 2019-04-04 | 2019-07-19 | 惠科股份有限公司 | A kind of cutting machine, cutting machine and cutting method for substrate |
| CN110091591A (en) * | 2018-04-18 | 2019-08-06 | 广东聚华印刷显示技术有限公司 | The offset correction method of glass fixture, device and system |
| CN111021894B (en) * | 2019-11-13 | 2021-09-07 | 陕西迈拓克能源科技有限公司 | A calibrating device for kitchen door plant |
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| US20040263769A1 (en) * | 2003-06-28 | 2004-12-30 | Lg.Philips Lcd Co., Ltd. | Method for fabricating liquid crystal display device |
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Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN106064880A (en) * | 2016-06-27 | 2016-11-02 | 昆山国显光电有限公司 | Positioner and localization method thereof |
| CN107192333A (en) * | 2017-07-10 | 2017-09-22 | 刘灏 | A kind of concrete prefabricated board assembly line die station offset detector and method |
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| CN109143629A (en) * | 2018-09-28 | 2019-01-04 | 张家港康得新光电材料有限公司 | The detection method of alignment film position precision in a kind of display panel mother matrix |
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| CN109375472A (en) * | 2018-10-23 | 2019-02-22 | 武汉华星光电技术有限公司 | Expose the method when machine and substrate expose |
| CN110026804A (en) * | 2019-04-04 | 2019-07-19 | 惠科股份有限公司 | A kind of cutting machine, cutting machine and cutting method for substrate |
| CN111021894B (en) * | 2019-11-13 | 2021-09-07 | 陕西迈拓克能源科技有限公司 | A calibrating device for kitchen door plant |
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