CN105044967A - Color filter substrate, manufacturing method of color filter substrate and liquid crystal display panel with color filter substrate - Google Patents
Color filter substrate, manufacturing method of color filter substrate and liquid crystal display panel with color filter substrate Download PDFInfo
- Publication number
- CN105044967A CN105044967A CN201510491548.5A CN201510491548A CN105044967A CN 105044967 A CN105044967 A CN 105044967A CN 201510491548 A CN201510491548 A CN 201510491548A CN 105044967 A CN105044967 A CN 105044967A
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- CN
- China
- Prior art keywords
- chromatic photoresist
- substrate
- filter substrate
- black matrix
- color filter
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133514—Colour filters
Abstract
The invention discloses a color filter substrate. The color filter substrate comprises a substrate body (11), black matrixes (12) and color resists (13). The black matrixes (12) are arranged on the substrate body (11). The color resists (13) are arranged on the substrate body (11), and the color resists (13) and the black matrixes (12) are arranged at intervals. The edges of the top surfaces (131) of the color resists (13) are recessed downwards. The invention further discloses a manufacturing method of the color filter substrate and a liquid crystal display panel with the color filter substrate. The thickness of the color resists is increased, the display color gamut is increased, and meanwhile the phenomena of light leaking and color mixing caused by large-view-angle watching are avoided.
Description
Technical field
The invention belongs to technical field of liquid crystal display, specifically, relate to a kind of colored filter substrate and preparation method thereof, liquid crystal panel.
Background technology
Colored filter (ColorFilter is called for short CF) is a kind of optical filter of apparent color.Colored filter accurately can select the light of wave band among a small circle for passing through, and filters out other wave band light not wishing to pass through.The Main Function of colored filter in liquid crystal panel allows after light therethrough R/G/B chromatic photoresist wherein provide color, forms colored display frame.Colored filter in liquid crystal panel is made up of black matrix" (BlackMatrix), R/G/B chromatic photoresist and conducting film ITO and the interval holder (PhotoSpacer) etc. on conducting film ITO usually.Black matrix" blocks the gap between different chromatic photoresist, in case leak-stopping light, R/G/B chromatic photoresist gives liquid crystal panel with display color.
In the processing procedure of existing colored filter, black matrix" arranges wide, can affect the aperture opening ratio of liquid crystal panel; Black matrix" arranges narrow, there will be again the light leak or colour mixture watched with great visual angle.In addition, if the coating of R/G/B chromatic photoresist is thicker, although suitably colour gamut can be improved, black matrix" produces adjacent color photoresistance mixed color phenomenon to the blocking difficulty of light leak is increased.
Summary of the invention
In order to solve above-mentioned problems of the prior art, the object of the invention is to provide a kind of colored filter substrate, and it comprises: substrate; Black matrix", is arranged on the substrate; Chromatic photoresist, arrange on the substrate and and described black matrix" interval arrange; Wherein, the edge of the top surface of described chromatic photoresist is recessed.
Further, described colored filter substrate also comprises: conductive film layer, covers described chromatic photoresist and described black matrix".
Further, described colored filter substrate also comprises: interval holder, to be arranged on described conductive film layer and to be positioned at the top of described black matrix".
Another object of the present invention is also the method for making providing a kind of colored filter, and it comprises: provide a substrate; Form black matrix" on the substrate; Formed and the spaced chromatic photoresist of described black matrix" on the substrate; Wherein, the edge of the top surface of described chromatic photoresist is recessed.
Further, gray-level mask is utilized to form described chromatic photoresist on the substrate.
Further, described gray-level mask comprises: first exposure region relative with the edge of the top surface of described chromatic photoresist and second exposure region relative with the non-edge of the top surface of described chromatic photoresist; Wherein, when described chromatic photoresist adopts negativity photoresistance to make, the exposure of described first exposure region is less than the exposure of described second exposure region.
Further, described gray-level mask comprises: first exposure region relative with the edge of the top surface of described chromatic photoresist and second exposure region relative with the non-edge of the top surface of described chromatic photoresist; Wherein, when described chromatic photoresist adopts positivity photoresistance to make, the exposure of described first exposure region is greater than the exposure of described second exposure region.
Further, described method for making also comprises: form the conductive film layer covering described chromatic photoresist and described black matrix".
Further, described method for making also comprises: on described conductive film layer, form the interval holder be positioned at above described black matrix".
Another object of the present invention is again to provide a kind of liquid crystal panel, and it comprises above-mentioned colored filter substrate.
The present invention can, while improving display colour gamut by increase chromatic photoresist thickness, avoid watching with great visual angle the light leak of appearance and the phenomenon of colour mixture.
Accompanying drawing explanation
The following description carried out in conjunction with the drawings, the above-mentioned and other side of embodiments of the invention, feature and advantage will become clearly, in accompanying drawing:
Fig. 1 is the structural representation of colored filter substrate according to an embodiment of the invention;
Fig. 2 A to Fig. 2 E is the Making programme figure according to colored filter substrate of the present invention;
Fig. 3 is the structural representation of gray-level mask according to an embodiment of the invention;
Fig. 4 is the structural representation of liquid crystal panel according to an embodiment of the invention.
Embodiment
Below, embodiments of the invention are described in detail with reference to the accompanying drawings.But, the present invention can be implemented in many different forms, and the present invention should not be interpreted as being limited to the specific embodiment of setting forth here.On the contrary, provide these embodiments to be to explain principle of the present invention and practical application thereof, thus enable others skilled in the art understand various embodiment of the present invention and be suitable for the various amendments of certain expected application.
In the accompanying drawings, in order to know device, exaggerate the thickness in layer and region, identical label can be used to represent identical element in whole instructions with accompanying drawing.
Also will be appreciated that one deck or element be called as or be formed in another layer or substrate " on " time, it can directly or be formed on this another layer or substrate, or also can there is middle layer.
Fig. 1 is the structural representation of colored filter substrate according to an embodiment of the invention.
With reference to Fig. 1, colored filter substrate 1 comprises according to an embodiment of the invention: substrate 11; Black matrix" 12, is arranged on the substrate 11; Chromatic photoresist 13, arrange on the substrate 11 and and black matrix" 12 interval arrange; Wherein, the edge of the top surface 131 of chromatic photoresist 13 is recessed.Further, in the present embodiment, the both sides of the edge of the top surface 131 of chromatic photoresist 13 are recessed respectively, thus make the top surface 131 of chromatic photoresist 13 present center section protrusion, and the form that both sides of the edge are recessed.
In the present embodiment, substrate 11 can be transparent glass substrate, but the present invention is not restricted to this, and such as substrate 11 also can be transparent resin substrate.
In the present embodiment, black matrix" 12 can be formed by ferrous metal such as chromium, but the present invention is not restricted to this, and such as, black matrix" 12 also can be formed by black resin.
Chromatic photoresist 13 can be red color photoresistance (representing with R in Fig. 1) or green chromatic photoresist (representing with G in Fig. 1) or blue chromatic photoresist (representing with B in Fig. 1), but the present invention is not restricted to this.In the present embodiment, red color photoresistance, green chromatic photoresist, blue chromatic photoresist and black matrix" 12 interval are arranged.Further, in the present embodiment, chromatic photoresist 13 covers the part of the top surface 121 of black matrix" 12.
In addition, colored filter substrate 1 also comprises according to an embodiment of the invention: conductive film layer 14, covers chromatic photoresist 13 and black matrix" 12.Particularly, conductive film layer 14 cover the top surface 131 of chromatic photoresist 13 and black matrix" 12 not by top surface 121 that chromatic photoresist 13 covers.In the present embodiment, conductive film layer 14 is formed by tin indium oxide ITO, but the present invention is not restricted to this.
Further, colored filter substrate 1 also comprises according to an embodiment of the invention: interval holder (PhotoSpacer) 15, to be arranged on conductive film layer 14 and to be positioned at the top of the top surface 121 do not covered by chromatic photoresist 13 of black matrix" 12.
In the present invention, the quantity of black matrix" 12, chromatic photoresist 13, interval holder 15 is not limited with shown in Fig. 1, and their quantity can be any amount.
Fig. 2 A to Fig. 2 E is the Making programme figure according to colored filter substrate of the present invention.Fig. 3 is the structural representation of gray-level mask according to an embodiment of the invention.
With reference to Fig. 2 A, provide a substrate 11; In the present embodiment, substrate 11 can be transparent glass substrate, but the present invention is not restricted to this, and such as substrate 11 also can be transparent resin substrate.
With reference to Fig. 2 B, form black matrix" 12 on the substrate 11; In the present embodiment, black matrix" 12 can be formed by ferrous metal such as chromium, but the present invention is not restricted to this, and such as, black matrix" 12 also can be formed by black resin.
With reference to Fig. 2 C, formed and the spaced chromatic photoresist 13 of black matrix" 12 on the substrate 11; Wherein, the edge of the top surface 131 of chromatic photoresist 13 is recessed.In the present embodiment, further, the both sides of the edge of the top surface 131 of chromatic photoresist 13 are recessed respectively, thus make the top surface 131 of chromatic photoresist 13 present center section protrusion, and the form that both sides of the edge are recessed.
In the present embodiment, when chromatic photoresist 13 adopts negativity photoresistance to make, the gray-level mask 4 shown in Fig. 3 is utilized to form chromatic photoresist 13 on the substrate 11 further.Here, gray-level mask 4 shown in Fig. 3 comprises: first exposure region 41 relative with the edge of the top surface 131 of chromatic photoresist 13, and the second exposure region 42 that the non-edge of top surface 131 with chromatic photoresist 13 (that is, the position except edge of the top surface 131 of chromatic photoresist 13) is relative; Wherein, the exposure of the first exposure region 41 is less than the exposure of the second exposure region 42.In the present embodiment, gray-level mask 4 uses optical grating construction in the first exposure region 41, i.e. hole or slit, makes the first exposure region 41 by part UV light, is less than the exposure of the second exposure region 42 with the exposure realizing the first exposure region 41.Be understandable that, the mode of above-mentioned change exposure is not limited to this, semi-permeable diaphragm can also be adopted to adjust light transmission rate and realize, not do concrete restriction at this.
As another embodiment of the present invention, when chromatic photoresist 13 adopts positivity photoresistance to make, the exposure of the first exposure region 41 is greater than the exposure of the second exposure region 42.
In addition, chromatic photoresist 13 can be red color photoresistance (representing with R in Fig. 2 C) or green chromatic photoresist (representing with G in Fig. 2 C) or blue chromatic photoresist (representing with B in Fig. 2 C), but the present invention is not restricted to this.In the present embodiment, red color photoresistance, green chromatic photoresist, blue chromatic photoresist and black matrix" 12 interval are arranged.Further, in the present embodiment, chromatic photoresist 13 covers the part of the top surface 121 of black matrix" 12.
With reference to Fig. 2 D, form the conductive film layer 14 covering chromatic photoresist 13 and black matrix" 12; In the present embodiment, conductive film layer 14 is formed by tin indium oxide ITO, but the present invention is not restricted to this.Further, conductive film layer 14 cover the top surface 131 of chromatic photoresist 13 and black matrix" 12 not by top surface 121 that chromatic photoresist 13 covers.
With reference to Fig. 2 E, conductive film layer 14 forms the interval holder (PhotoSpacer) 15 be positioned at above black matrix" 12.Further, interval holder 15 is positioned at the top of the top surface 121 do not covered by chromatic photoresist 13.
Fig. 4 is the structural representation of liquid crystal panel according to an embodiment of the invention.
With reference to Fig. 4, liquid crystal panel comprises according to an embodiment of the invention: the colored filter substrate 1 shown in the Fig. 1 arrange box and array base palte 2, and is located in liquid crystal layer 3 therebetween.In the present embodiment, in order to avoid repeating, array substrate 2 is described in detail no longer in detail, and those skilled in the art can refer to the existing technology about array base palte to know the concrete structure of array base palte 2.
In sum, according to embodiments of the invention, can, while improving display colour gamut by increase chromatic photoresist thickness, avoid watching with great visual angle the light leak of appearance and the phenomenon of colour mixture.
Although illustrate and describe the present invention with reference to specific embodiment, but it should be appreciated by those skilled in the art that: when not departing from the spirit and scope of the present invention by claim and equivalents thereof, the various changes in form and details can be carried out at this.
Claims (10)
1. a colored filter substrate, is characterized in that, comprising:
Substrate (11);
Black matrix" (12), is arranged on described substrate (11);
Chromatic photoresist (13), be arranged on described substrate (11) upper and and described black matrix" (12) interval arrange;
Wherein, the edge of the top surface (131) of described chromatic photoresist (13) is recessed.
2. colored filter substrate according to claim 1, is characterized in that, described colored filter substrate also comprises: conductive film layer (14), covers described chromatic photoresist (13) and described black matrix" (12).
3. colored filter substrate according to claim 2, it is characterized in that, described colored filter substrate also comprises: interval holder (15), is arranged on described conductive film layer (14) and goes up and be positioned at the top of described black matrix" (12).
4. a method for making for colored filter, is characterized in that, comprising:
One substrate (11) is provided;
Described substrate (11) is formed black matrix" (12);
At the upper formation of described substrate (11) and described black matrix" (12) spaced chromatic photoresist (13);
Wherein, the edge of the top surface (131) of described chromatic photoresist (13) is recessed.
5. method for making according to claim 4, is characterized in that, utilizes gray-level mask (4) at described substrate (11) the described chromatic photoresist of upper formation (13).
6. method for making according to claim 5, it is characterized in that, described gray-level mask (4) comprising: first exposure region (41) relative with the edge of the top surface (131) of described chromatic photoresist (13) and second exposure region (42) relative with the non-edge of the top surface (131) of described chromatic photoresist (13); Wherein, when described chromatic photoresist (13) adopts negativity photoresistance to make, the exposure of described first exposure region (41) is less than the exposure of described second exposure region (42).
7. method for making according to claim 5, it is characterized in that, described gray-level mask (4) comprising: first exposure region (41) relative with the edge of the top surface (131) of described chromatic photoresist (13) and second exposure region (42) relative with the non-edge of the top surface (131) of described chromatic photoresist (13); Wherein, when described chromatic photoresist (13) adopts positivity photoresistance to make, the exposure of described first exposure region (41) is greater than the exposure of described second exposure region (42).
8. the method for making according to any one of claim 4 to 7, is characterized in that, also comprises: form the conductive film layer (14) covering described chromatic photoresist (13) and described black matrix" (12).
9. method for making according to claim 8, is characterized in that, also comprises: the interval holder (15) being positioned at described black matrix" (12) top in the upper formation of described conductive film layer (14).
10. a liquid crystal panel, is characterized in that, comprises the colored filter substrate described in any one of claims 1 to 3.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510491548.5A CN105044967A (en) | 2015-08-11 | 2015-08-11 | Color filter substrate, manufacturing method of color filter substrate and liquid crystal display panel with color filter substrate |
| PCT/CN2015/089414 WO2017024655A1 (en) | 2015-08-11 | 2015-09-11 | Colour filter substrate and manufacturing method therefor, and liquid crystal panel |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510491548.5A CN105044967A (en) | 2015-08-11 | 2015-08-11 | Color filter substrate, manufacturing method of color filter substrate and liquid crystal display panel with color filter substrate |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN105044967A true CN105044967A (en) | 2015-11-11 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201510491548.5A Pending CN105044967A (en) | 2015-08-11 | 2015-08-11 | Color filter substrate, manufacturing method of color filter substrate and liquid crystal display panel with color filter substrate |
Country Status (2)
| Country | Link |
|---|---|
| CN (1) | CN105044967A (en) |
| WO (1) | WO2017024655A1 (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107479246A (en) * | 2017-09-15 | 2017-12-15 | 深圳市华星光电半导体显示技术有限公司 | The preparation method of color membrane substrates |
| US10503064B2 (en) | 2017-09-15 | 2019-12-10 | Shenzhen China Star Optoelectronics Semiconductor Display Technology Co., Ltd. | Method for manufacturing color filter substrate |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003161825A (en) * | 2001-11-29 | 2003-06-06 | Matsushita Electric Ind Co Ltd | Color filter |
| CN102866532A (en) * | 2012-09-29 | 2013-01-09 | 深圳市华星光电技术有限公司 | Color filter substrate and relevant manufacturing method thereof |
| CN103901659A (en) * | 2012-12-27 | 2014-07-02 | 上海仪电显示材料有限公司 | Light filter plate for liquid crystal display panel in IPS (in-plane switching) mode and liquid crystal display device |
| CN104345493A (en) * | 2014-11-25 | 2015-02-11 | 合肥鑫晟光电科技有限公司 | Color filter substrate and production method thereof, display panel and mask |
| CN104597656A (en) * | 2015-02-13 | 2015-05-06 | 深圳市华星光电技术有限公司 | Colored film substrate, manufacturing method and liquid crystal panel |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006215192A (en) * | 2005-02-02 | 2006-08-17 | Sharp Corp | Element mounting substrate, its manufacturing method, color filter substrate, wiring board, and liquid crystal display apparatus |
| CN101982803B (en) * | 2010-09-08 | 2012-03-28 | 深圳市华星光电技术有限公司 | Liquid crystal display panel and colour filter substrate thereof |
-
2015
- 2015-08-11 CN CN201510491548.5A patent/CN105044967A/en active Pending
- 2015-09-11 WO PCT/CN2015/089414 patent/WO2017024655A1/en active Application Filing
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003161825A (en) * | 2001-11-29 | 2003-06-06 | Matsushita Electric Ind Co Ltd | Color filter |
| CN102866532A (en) * | 2012-09-29 | 2013-01-09 | 深圳市华星光电技术有限公司 | Color filter substrate and relevant manufacturing method thereof |
| CN103901659A (en) * | 2012-12-27 | 2014-07-02 | 上海仪电显示材料有限公司 | Light filter plate for liquid crystal display panel in IPS (in-plane switching) mode and liquid crystal display device |
| CN104345493A (en) * | 2014-11-25 | 2015-02-11 | 合肥鑫晟光电科技有限公司 | Color filter substrate and production method thereof, display panel and mask |
| CN104597656A (en) * | 2015-02-13 | 2015-05-06 | 深圳市华星光电技术有限公司 | Colored film substrate, manufacturing method and liquid crystal panel |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107479246A (en) * | 2017-09-15 | 2017-12-15 | 深圳市华星光电半导体显示技术有限公司 | The preparation method of color membrane substrates |
| US10503064B2 (en) | 2017-09-15 | 2019-12-10 | Shenzhen China Star Optoelectronics Semiconductor Display Technology Co., Ltd. | Method for manufacturing color filter substrate |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2017024655A1 (en) | 2017-02-16 |
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