CN105036174A - Production method for submicron electronic-grade copper oxide powder - Google Patents

Production method for submicron electronic-grade copper oxide powder Download PDF

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Publication number
CN105036174A
CN105036174A CN201510404441.2A CN201510404441A CN105036174A CN 105036174 A CN105036174 A CN 105036174A CN 201510404441 A CN201510404441 A CN 201510404441A CN 105036174 A CN105036174 A CN 105036174A
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oxide powder
copper oxide
production method
solution
atomization
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安鹏九
田维荣
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Jinchang Zhengxu Industry And Trade Co Ltd
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Abstract

The invention discloses a production method for submicron electronic-grade copper oxide powder. The production method comprises the following steps of: (1) firstly, preparing a copper chloride precursor solution; (2) adding the precursor solution prepared in the step (1) into an ultrasonic atomizing device, and atomizing the solution into a mist gas state by virtue of cavitation effect of ultrasonic waves, thereby forming droplets of the submicron solution; (3) pumping the droplets generated in the step (2) by use of a fan into a high-temperature atmosphere to carry out spray pyrolysis, thereby generating high-purity and submicron copper oxide copper; (4) recycling the copper oxide powder generated in the step (3) by an ultrafine powder recycling device, thereby obtaining a finished product; and (5) absorbing a hydrogen chloride gas by an absorbing tower, thereby obtaining a hydrochloric acid solution for preparing the copper chloride precursor in the step (1). The copper oxide produced by the method disclosed by the invention is high in purity and good in particle dimension, and product fineness reaches submicron requirements.

Description

A kind of production method of submicroscale electronic grade copper oxide powder
Technical field
The present invention relates to non-ferrous metal powder technology field, particularly relate to a kind of production method of submicroscale electronic grade copper oxide powder.
Background technology
Cupric oxide (CuO) is a kind of black oxide of copper, shows slightly both sexes, slightly water absorbability.Relative molecular mass is 79.545, and density is 6.3 ~ 6.9g/cm 3, fusing point 1326 DEG C.Water insoluble and ethanol, is dissolved in acid, ammonium chloride and potassium cyanide solution, slowly dissolves in ammonia solution, can react with highly basic.Cupric oxide is mainly used in artificial silk processed, pottery, glaze and enamel, battery, petroleum sweetening agent, sterilant, also for hydrogen manufacturing, catalyzer, green glass etc.
Current domestic production cupric oxide powder mainly utilizes spray pyrolysis technologies, and the metal chlorination copper solutions of configuration is sent into pressure jet apparatus under the conveying of high-pressure pump, and formation jet enters oxidized still and carries out spray pyrolysis production cupric oxide powder.Mainly adopt Mechanical nozzle, the formation jet that pumps up enters oxidized still and carries out spray pyrolysis production cupric oxide.The cupric oxide purity not high (more than 100 microns) that domestic prior art produces at solution presoma spray pyrolysis, fineness does not reach the requirement of submicron order.I.e. 1-5 micron.
Summary of the invention
The invention provides a kind of production method of submicroscale electronic grade copper oxide powder, ultrasonic oscillation sheet is utilized to assemble ultrasonic atomizer, configuring certain density metallic solution utilizes hyperacoustic cavitation effect metallic solution to be atomized into the smog gaseous state of submicron order, through oxidized still atomization pyrolysis, production high purity electronic grade super-fine cupric oxide powder.
The present invention adopts following technical scheme:
The concrete steps of the production method of submicroscale electronic grade copper oxide powder of the present invention are as follows:
(1) first cupric chloride precursor solution is prepared;
(2) precursor solution that step (1) prepares is joined in ultrasonic atomizing device, utilize hyperacoustic cavitation effect, make solution mist change into smog gaseous state, form the droplet of submicron order solution;
(3) with blower fan the droplet that step (2) produces pumped in high-temperature atmosphere and carry out spray pyrolysis, produce cupric oxide powder that is high-purity, submicron order;
(4) cupric oxide powder utilizing ultrafine powder retrieving arrangement step (3) to be produced, obtains finished product;
(5) utilize absorption tower absorbing hydrogen chloride gas, obtain hydrochloric acid soln, for step (1) preparation cupric oxide presoma.
In step (2), distribution and atomizing generator is provided with bottom described ultrasonic atomizing device, the ultrasonic wave that the vibrational frequency higher than 20KHz utilizing direct current to produce produces, atomization transducer is provided with above distribution and atomizing generator, be provided with atomization transducing liquid above atomization transducer, the ultrasonic wave that distribution and atomizing generator produce passes to precursor solution by atomization transducer and atomization transducing liquid successively.
The composition of described atomization transducing liquid is deionized water (industrial pure water).
In step (2), the particle diameter of described submicron order solution is 1-5 μm.
Ultrasonic wave has following characteristic:
1) ultrasonic wave can have effect spread in the media such as gas, liquid, solid, Solid solution.
2) ultrasonic wave can transmit very strong energy.
3) ultrasonic wave can produce reflection, interference, superposition and resonance effect.
4), when ultrasonic wave is propagated in liquid medium, strong impact and cavitation phenomenon can be produced on interface.
The present invention compared with prior art, has following notable feature and beneficial effect:
The requirement that cupric oxide purity is high, particle dispersion good, product fineness reaches submicron order of the production method production of submicroscale electronic grade copper oxide powder of the present invention.Solvent evaporation and the pyrolysis of metal fused salt are occurred simultaneously, operational path section, One-step production cupric oxide.
Accompanying drawing explanation
Fig. 1 is the structural representation of the ultrasonic atomizing device in the present invention;
1 distribution and atomizing generator, 2 atomization transducing liquid, 3 spray chambers, 4 cupric chloride precursor solutions, 5 atomization transducers.
Fig. 2 is the process flow sheet of the production method of submicroscale electronic grade copper oxide powder of the present invention.
Embodiment
Below by embodiment, the present invention is specifically described; what be necessary to herein means out is that the present embodiment is only used to further illustrate the present invention; can not be interpreted as limiting the scope of the invention, the person skilled in the art in this field must belong to protection scope of the present invention according to the nonessential improvement more made for the present invention of the invention described above content and adjustment.
Embodiment 1
The concrete steps of the production method of submicroscale electronic grade copper oxide powder of the present invention are as follows:
(1) first cupric chloride precursor solution is prepared;
(2) precursor solution that step (1) prepares is joined in ultrasonic atomizing device, utilize hyperacoustic cavitation effect, make solution mist change into smog gaseous state, form the droplet of submicron order solution;
(3) with blower fan the droplet that step (2) produces pumped in high-temperature atmosphere and carry out spray pyrolysis, produce cupric oxide powder that is high-purity, submicron order;
(4) cupric oxide powder utilizing ultrafine powder retrieving arrangement step (3) to be produced, obtains finished product;
(5) utilize absorption tower absorbing hydrogen chloride gas, obtain hydrochloric acid soln, for step (1) preparation cupric oxide presoma.
In step (2), distribution and atomizing generator is provided with bottom described ultrasonic atomizing device, the ultrasonic wave that the vibrational frequency higher than 20KHz utilizing direct current to produce produces, atomization transducer is provided with above distribution and atomizing generator, be provided with atomization transducing liquid above atomization transducer, the ultrasonic wave that distribution and atomizing generator produce passes to precursor solution by atomization transducer and atomization transducing liquid successively.
Described atomization transducing liquid is deionized water (industrial pure water).
Although illustrate and describe embodiments of the invention, for the ordinary skill in the art, be appreciated that and can carry out multiple change, amendment, replacement and modification to these embodiments without departing from the principles and spirit of the present invention, scope of the present invention is by claims and equivalents thereof.

Claims (4)

1. a production method for submicroscale electronic grade copper oxide powder, is characterized in that: the concrete steps of described method are as follows:
(1) first cupric chloride precursor solution is prepared;
(2) precursor solution that step (1) prepares is joined in ultrasonic atomizing device, utilize hyperacoustic cavitation effect, make solution mist change into smog gaseous state, form the droplet of submicron order solution;
(3) with blower fan the droplet that step (2) produces pumped in high-temperature atmosphere and carry out spray pyrolysis, produce cupric oxide powder that is high-purity, submicron order;
(4) cupric oxide powder utilizing ultrafine powder retrieving arrangement step (3) to be produced, obtains finished product;
(5) utilize absorption tower absorbing hydrogen chloride gas, obtain hydrochloric acid soln, for step (1) preparation cupric oxide presoma.
2. the production method of submicroscale electronic grade copper oxide powder as claimed in claim 1, it is characterized in that: in step (2), distribution and atomizing generator is provided with bottom described ultrasonic atomizing device, the ultrasonic wave that the vibrational frequency higher than 20KHz utilizing direct current to produce produces, atomization transducer is provided with above distribution and atomizing generator, be provided with atomization transducing liquid above atomization transducer, the ultrasonic wave that distribution and atomizing generator produce passes to precursor solution by atomization transducer and atomization transducing liquid successively.
3. the production method of submicroscale electronic grade copper oxide powder as claimed in claim 2, is characterized in that: the composition of described atomization transducing liquid is deionized water (industrial pure water).
4. the production method of submicroscale electronic grade copper oxide powder as claimed in claim 1, it is characterized in that: in step (2), the particle diameter of described submicron order solution is 1-5 μm.
CN201510404441.2A 2015-07-10 2015-07-10 Production method for submicron electronic-grade copper oxide powder Pending CN105036174A (en)

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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107983374A (en) * 2016-03-22 2018-05-04 湖州慧金材料科技有限公司 The method that activity spherical cuprous chloride catalyst is prepared using atomized molten system
CN108862364A (en) * 2018-09-21 2018-11-23 东北大学 A kind of molten salt solvent method preparation nanometer Cu2The method of O particle
CN114956152A (en) * 2021-12-27 2022-08-30 昆明理工大学 Method for preparing needle-shaped CuO powder by ultrasonic atomization

Citations (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1228388A (en) * 1998-03-05 1999-09-15 川聚有限公司 Method for preparing cupric oxide powder
CN1657422A (en) * 2005-01-27 2005-08-24 北京科技大学 Device and method for preparing nanometer tungsten trioxide powder using ultrasonic spray microwave drying method
CN1683266A (en) * 2004-04-16 2005-10-19 天津理工学院 Device and process for producing nano TiO2 film by supersonic atomization
CN1994889A (en) * 2006-11-21 2007-07-11 浙江大学 Process for preparing oxide nano sphere
CN101235475A (en) * 2008-02-29 2008-08-06 浙江大学 Method for preparing copper indium sulfide thin film
CN101302032A (en) * 2008-01-08 2008-11-12 上海谐尔纳米科技有限公司 Preparation of cupric oxide nano-material
CN101318689A (en) * 2008-05-16 2008-12-10 深圳市危险废物处理站 Method for preparing monoclinic system crystalline state cupric oxide and uses thereof
CN101367555A (en) * 2008-09-27 2009-02-18 浙江华友钴业股份有限公司 Novel methods for preparing cobalt oxide, nickel oxide and copper oxide
CN101773803A (en) * 2010-01-14 2010-07-14 同济大学 Method for preparing dichloro dicyclopentadienyl titanium and cis-platinum nano-particles by atomization ultrasound polarity difference technology
CN102408123A (en) * 2011-07-16 2012-04-11 湖南海纳新材料有限公司 Preparation method of superfine copper oxide powder
CN102951671A (en) * 2012-10-22 2013-03-06 洛阳师范学院 Preparation method of copper oxide nano particle
CN103482619A (en) * 2013-09-09 2014-01-01 东南大学 Graphene-copper oxide three-dimensional foam composite material

Patent Citations (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1228388A (en) * 1998-03-05 1999-09-15 川聚有限公司 Method for preparing cupric oxide powder
CN1683266A (en) * 2004-04-16 2005-10-19 天津理工学院 Device and process for producing nano TiO2 film by supersonic atomization
CN1657422A (en) * 2005-01-27 2005-08-24 北京科技大学 Device and method for preparing nanometer tungsten trioxide powder using ultrasonic spray microwave drying method
CN1994889A (en) * 2006-11-21 2007-07-11 浙江大学 Process for preparing oxide nano sphere
CN101302032A (en) * 2008-01-08 2008-11-12 上海谐尔纳米科技有限公司 Preparation of cupric oxide nano-material
CN101235475A (en) * 2008-02-29 2008-08-06 浙江大学 Method for preparing copper indium sulfide thin film
CN101318689A (en) * 2008-05-16 2008-12-10 深圳市危险废物处理站 Method for preparing monoclinic system crystalline state cupric oxide and uses thereof
CN101367555A (en) * 2008-09-27 2009-02-18 浙江华友钴业股份有限公司 Novel methods for preparing cobalt oxide, nickel oxide and copper oxide
CN101773803A (en) * 2010-01-14 2010-07-14 同济大学 Method for preparing dichloro dicyclopentadienyl titanium and cis-platinum nano-particles by atomization ultrasound polarity difference technology
CN102408123A (en) * 2011-07-16 2012-04-11 湖南海纳新材料有限公司 Preparation method of superfine copper oxide powder
CN102951671A (en) * 2012-10-22 2013-03-06 洛阳师范学院 Preparation method of copper oxide nano particle
CN103482619A (en) * 2013-09-09 2014-01-01 东南大学 Graphene-copper oxide three-dimensional foam composite material

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107983374A (en) * 2016-03-22 2018-05-04 湖州慧金材料科技有限公司 The method that activity spherical cuprous chloride catalyst is prepared using atomized molten system
CN108862364A (en) * 2018-09-21 2018-11-23 东北大学 A kind of molten salt solvent method preparation nanometer Cu2The method of O particle
CN114956152A (en) * 2021-12-27 2022-08-30 昆明理工大学 Method for preparing needle-shaped CuO powder by ultrasonic atomization
CN114956152B (en) * 2021-12-27 2024-01-23 昆明理工大学 Method for preparing needle-like CuO powder by ultrasonic atomization

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Effective date of registration: 20160708

Address after: 737100 Jinchang Gansu economic and Technological Development Zone Jinchang Xu industry and Trade Co., Ltd.

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Address before: 737100 Jinchang economic and Technological Development Zone, Fuzhou Road, east of Gansu, south of Tai'an Road

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