CN105032718A - Continuous horizontal dipping film coating system and method - Google Patents
Continuous horizontal dipping film coating system and method Download PDFInfo
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- CN105032718A CN105032718A CN201510353804.4A CN201510353804A CN105032718A CN 105032718 A CN105032718 A CN 105032718A CN 201510353804 A CN201510353804 A CN 201510353804A CN 105032718 A CN105032718 A CN 105032718A
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Abstract
The invention belongs to the technical field of film plating, and discloses a continuous horizontal dipping film coating system and a method. The continuous horizontal dipping film coating system comprises a robot, a robot control center and a circulating slide rail, wherein the robot and the robot control center are in signal connection; the robot is slidingly arranged on the circulating slide rail; the circulating slide rail is used for circularly sliding the robot; the robot is provided with an operation arm; multiple suckers for absorbing substrate base pieces are arranged at the front end of the operation arm; the robot drives the operation arm to act; and a film plating solution tank and a cleaning tank are formed beside the circulating slide rail. The system and the method integrate the dipping film plating, the cleaning and the drying as a whole, so that the defects of discontinuous procedures and long time consumption in the prior art are overcome, the full-automatic high-stability production of the dipping film plating with any area can be realized, the defect of severe uniformity deviation in upper, middle and lower areas of vertical pull dipping is overcome, and all points of horizontal dipping film plating are consistent, and the uniformity is excellent.
Description
Technical field
The invention belongs to coating technique field, be specifically related to the horizontal immersion Plating membranous system of a kind of continuity and method.
Background technology
Equipment for producing thin film is referred to and to be prepared into by multi-function membrane on substrate by the equipment of preparing film on the substrate of cleaning and to possess certain specific function.And flood plated film and refer to and be impregnated in specific solution by a certain specific substrate, thus on substrate, form the film preparation mode possessing certain function.
It is domestic at present that to do relatively ripe in dipping plated film be the mode adopting Best-Effort request plated film.Best-Effort request plated film also claims vertically to lift plated film, the mode that employing vertically lifts, by controlling pull rate, lift time, coating times and the optimization of plated film spacing parameter thus the effect of realization formation functional membrane.Vertical lift mode is technology relatively more conventional at present, but it exists a lot of limitation:
1, functional membrane is uneven.The even otherness of film in functional membrane each region in upper, middle and lower that vertical lift plated film is formed can reach about 10%, even larger.Especially time for large-area vertical lift plated film, the bottom of substrate enters into solution the earliest, leaves solution the latest, causes under equal dipping plating conditions, solution accompanying by region, upper, middle and lower has very large difference, thus has influence on optics and the electrology characteristic of final functional membrane;
What 2, at present vertical lift plated film all adopted is the mode of fixture, the wide cut of fixture gripping glass edge is optimum at about 10mm, in the process of vertical plated film, these clamp base can be immersed in solution or cleaning fluid, cause in the processing procedures such as air-dry technique in lift process or follow-up, all have remaining current and reenter face, cause face to occur a large amount of defects, thus have influence on the steady production of technique.Generally, for meticulous plated film, do not allow fixture to touch substrate coated surface, because the region touched cannot form plated film in the solution, yield rate and the use of final terminal can have been affected;
3, because area increases, the uniformity of the functional membrane that vertical lift plated film is formed can significantly decline, and therefore vertical lift is mainly still applied in the scientific research field of small size at present.For small size, such as 3cm*3cm, the uniformity of vertical lift plated film does not have impact, and consider that getting centre the most evenly puts from scientific research angle, without the need to worrying the uniformity of whole, and for large area, the substrate of such as 1400*1100mm, then very harsh to the requirement of its uniformity, this is that current vertical lift mode cannot be stablized and is achieved;
4, vertical lift plated film mode is not suitable for the quick switching of different-thickness substrate.In vertical lift process, solution tank design is with flat, high design, and substrate wants full wafer to be impregnated into bottom, means that the weight along with glass is heavier, and it is higher to rise in solution face, more easily overflows.The substrate of such as 1400 (L) * 1100 (W) * 3 (T) mm and 1400 (L) * 1100 (W) * 4 (T) mm, with under homalographic, its weight difference 4.5KG, when equal solution cell body volume, there will be overflow in various degree, when causing various substrates to switch, needs go constantly to carry out fluid infusion by extra device, increase additional investment cost;
5, the beat of vertical lift plated film needs for a long time, by the impact of different size, different-thickness glass, its pull rate is very slow, otherwise is easy to cause solution unstable, and solution instability causes the functional membrane instability finally formed on substrate until affect uniformity.Especially, the functional membrane of major part dipping plated film is all what to need through operation process such as follow-up cleanings, so means that the mode adopting vertical lift cleaning can time of at substantial, thus cannot large-scale production;
6, vertical lift plated film can be very sensitive to the defect of substrate surface and attaching particles thereof, and in vertical lift process, these defects or attaching particles, at functional membrane surface sliding, cause finally forming defect on functional membrane surface, affect final product yield;
7, for the coated glass of architecture-integral, consider from security standpoint, its thickness of glass is 4mm, 6mm or 8mm or thicker, from outward appearance angle, build very harsh to the appearance color coherence request of glass, mean the requirement of uniformity higher, therefore adopt the mode of vertical lift, its limitation can highlight more;
8, for large-area vertical lift plated film, need the solution cell body that design is very dark, such as the glass of 1.4 meters high, mean that cell body needs are higher than 1.4 meters, and excessively dark solution tank, easily cause partial function solution can deposit to bottom, thus to cause in cell body solution from top to bottom concentration progressively promote, be unfavorable for the uniformity preparation of functional membrane.
Summary of the invention
In order to overcome the shortcoming of prior art with not enough, primary and foremost purpose of the present invention is to provide a kind of continous way horizontal immersion Plating membranous system, full-automatic, the high stability that can realize any area dipping plated film are produced, and significantly reduce operation operation and the time spent by cleaning.
The technical scheme realizing above-mentioned purpose is as follows:
The horizontal immersion Plating membranous system of a kind of continous way, comprise robot, robot controlling center and circulation slide rail, robot is connected with robot controlling center signal, and described robot slidingtype is arranged on circulation slide rail, and circulation slide rail is used for robot cycle and slides; Described robot is provided with motion arm, and described motion arm front end arranges several sucker for absorption substrate substrate, and robot drives motion arm action; Circulation slide rail side is other is provided with coated solution groove and rinse bath.
Preferably, the horizontal immersion Plating membranous system of described continous way also comprises substrate base prerinse and navigation system, described substrate base prerinse and navigation system are arranged at by circulation slide rail side, for carrying out prerinse to substrate base and locating, to meet the requirement of follow-up filming process.
Preferably, the horizontal immersion Plating membranous system of described continous way also comprises drying system, and described drying system is arranged on by circulation slide rail side; Preferably, described drying system is oven or air blade device.
Preferably, the quantity of described robot is at least one; Preferred, the quantity of described robot is 1 ~ 5.
Preferably, the horizontal cross-section of described coated solution groove is greater than the area of substrate base.
Preferably, place coated solution in described coated solution groove, described coated solution is polystyrene microsphere solution, silicon dioxide microsphere solution or polymethyl methacrylate (PMMA) microspheres solution.
Preferably, the horizontal cross-section of described rinse bath is greater than the area of substrate base.
Preferably, place cleaning fluid in described rinse bath, described cleaning fluid is deionized water.
Preferably, described substrate base is hard substrates, or deposits the hard substrates of function film;
Described function film is metal-oxide film or blended metal oxide film; The material of described function film is Al-Doped ZnO, tin indium oxide, boron-doping zinc oxide, fluorine doped tin oxide or gallium-doped zinc oxide, or Al-Doped ZnO, tin indium oxide, boron-doping zinc oxide, fluorine doped tin oxide and gallium-doped zinc oxide both mix any.
The present invention also provides a kind of method adopting the horizontal immersion Plating membranous system of above-mentioned continous way to carry out plated film, comprises the steps:
S01, absorption substrate base: the robot of starting point starts, and by the back side of the sucker suction substrate base on motion arm, then enters next step operation;
Substrate base, first through prerinse, improves the cleanliness factor of substrate base, positions in the exercisable scope of motion arm then delivering to robot, the sucker of motion arm can be drawn from the back side of substrate base smoothly.By adjusting the quantity of sucker and adsorption strength to adapt to the substrate base of different-thickness, different size.
S02, coating film treatment: the robot drawing substrate base is slid near coated solution groove by circulation slide rail, the motion arm of absorption substrate base is made to be positioned at directly over coated solution groove, by robot controlling center control operation arm upset adjustment, make the face down of substrate base, then substrate base immerses in coated solution by step-down operation arm, after reaching dip time, substrate base is detached coated solution by lifting motion arm, then enters next step operation;
When substrate base is immersed coated solution, under decrease speed ratio faster situation, solution can cause vibrations, and has impulsive force to substrate base front, and final functional membrane can be caused unstable.Therefore, preferably, described substrate base is before entering coated solution, adjustment motion arm makes the front of the substrate base of absorption and horizontal plane have inclination angle, after substrate base is immersed in coated solution, the front of substrate base is adjusted to level, after reaching dip time, be adjusted in the front of substrate base and have inclination angle with horizontal plane, then substrate base is detached coated solution by lifting motion arm.Preferred, described inclination angle is 3 ~ 15 degree.
S03, cleaning treatment: substrate base is after coating film treatment, by circulation slide rail, the robot drawing substrate base is slid near rinse bath, the motion arm of absorption substrate base is made to be positioned at directly over rinse bath, by robot controlling center control operation arm upset adjustment, make the face down of substrate base, then substrate base immerses in cleaning fluid by step-down operation arm, adjustment motion arm makes substrate base front be parallel to horizontal plane, motion arm is driven again by robot motion, the substrate base that motion arm is drawn in horizontal plane Multidirectional reciprocating translational motion to carry out level cleaning, after reaching scavenging period, stopping level being cleaned, substrate base is detached cleaning fluid by lifting motion arm, then next step operation is entered,
Preferably, the time of described level cleaning is 0.5 ~ 2min;
S04, dry process: the robot drawing substrate base, after cleaning treatment, is slid into drying system by circulation slide rail by substrate base, put into substrate base and carry out air-dry in drying system, complete whole horizontal immersion Plating membrane process; Robot turns back to starting point by circulation slide rail, and the operation of S01 to S04 is carried out in circulation.
Preferably, described drying system is oven, and the baking temperature of described oven is 40 ~ 80 DEG C;
The quantity of oven is not limited to 1, carries out quantitative design according to process rhythm.
Definition: the one side that substrate base need carry out coating film treatment is front, is the back side with the one side of vis-a-vis.
The present invention has following advantage and effect relative to prior art:
(1) dipping plated film, cleaning treatment and dry process become one by the present invention, overcome the defect of discontinuous, the consuming time length of operation in prior art, and full-automatic, the high stability that can realize any area dipping plated film are produced.
(2) instant invention overcomes the defect vertically lifting and be immersed in region, upper, middle and lower and occur serious confonnality deviations, level dipping plated film each point is consistent, has excellent uniformity.
(3) the present invention adopts the mode that the back of the body is inhaled, the operations such as plated film dipping and cleaning treatment are carried out by sucker suction substrate base, without the need to arranging fixture, solve fixture in vertical lift dipping process and the defects such as the drawing lines brought are slided to the defective effect of functional membrane and lift process blemish, can the yield of significantly improving product.
(4) the present invention significantly reduces operation operation and the time spent by cleaning; can realize the circular flow of robot system In-line formula, the beat solving the design of conventional tank formula or multi-groove type design appearance causes the defect that cannot accomplish scale production slowly.
Accompanying drawing explanation
Fig. 1 is the structural representation of the horizontal immersion Plating membranous system of continous way described in the embodiment of the present invention.
Fig. 2 is the structural representation that in embodiment, substrate base drawn by robot and motion arm.
Fig. 3 is that in embodiment coating film treatment step, substrate base immerses and detaches the operating diagram of coated solution.
Fig. 4 be in embodiment cleaning treatment step substrate base at the top view of rinse bath duty.
Detailed description of the invention
Below in conjunction with embodiment and accompanying drawing, the present invention is described in further detail, but embodiments of the present invention are not limited thereto.
As shown in Figure 1, the horizontal immersion Plating membranous system of a kind of continous way, comprise robot 1, robot controlling center 2 and circulation slide rail 3, robot 1 is connected with robot controlling center 2 signal, described robot 1 slidingtype to be arranged on circulation slide rail 3, and circulation slide rail 3 circulates for robot 1 and slides;
Described robot 1 is provided with motion arm 4, and described motion arm 4 front end arranges several sucker 6 for absorption substrate substrate 5, and robot 1 drives motion arm 4 action; Circulation slide rail 3 side is other is provided with coated solution groove 7 and rinse bath 8.
The horizontal immersion Plating membranous system of described continous way also comprises substrate base prerinse and navigation system 9, for carrying out prerinse to substrate base and locating, to meet the requirement of follow-up filming process.
The horizontal immersion Plating membranous system of described continous way also comprises drying system 10, and described drying system 10 is oven, and described oven is arranged on by circulation slide rail 3 side.
The horizontal cross-section of described coated solution groove 7 is greater than the area of substrate base, place coated solution in described coated solution groove 7, described coated solution is polystyrene microsphere solution, silicon dioxide microsphere solution or polymethyl methacrylate (PMMA) microspheres solution.
The horizontal cross-section of described rinse bath 8 is greater than the area of substrate base, and place cleaning fluid in described rinse bath 8, described cleaning fluid is deionized water.
Described substrate base 5 is hard substrates, or deposits the hard substrates of function film;
Described function film is metal-oxide film or blended metal oxide film; The material of described function film is Al-Doped ZnO, tin indium oxide, boron-doping zinc oxide, fluorine doped tin oxide or gallium-doped zinc oxide, or Al-Doped ZnO, tin indium oxide, boron-doping zinc oxide, fluorine doped tin oxide and gallium-doped zinc oxide both mix any.
Adopt the horizontal immersion Plating membranous system of above-mentioned continous way to carry out the method for plated film, comprise the steps:
S01, absorption substrate base: the robot 1 of starting point starts, as shown in Figure 2, robot, by the back side of the sucker 6 absorption substrate substrate 5 on motion arm 4, then enters next step operation;
Substrate base 5 first can carry out prerinse in substrate base prerinse and navigation system 9, improve the cleanliness factor of substrate base 5, then position in the exercisable scope of motion arm 4 delivering to robot 1, the sucker 6 of motion arm 4 can be drawn from the back side of substrate base 5 smoothly.By adjusting the quantity of sucker and adsorption strength to adapt to the substrate base of different-thickness, different size.
S02, coating film treatment: the robot 1 having drawn substrate base 5 is slid near coated solution groove 7 by circulation slide rail 3, the motion arm 4 of absorption substrate base 5 is made to be positioned at directly over coated solution groove 7, by robot controlling center 2 control operation arm 4 upset adjustment, make the face down of substrate base 5, then substrate base 5 immerses in coated solution by step-down operation arm 4, after reaching dip time, substrate base 5 is detached coated solution by lifting motion arm 4, then enters next step operation;
When substrate base 5 is immersed coated solution, under decrease speed ratio faster situation, solution can cause vibrations, and has impulsive force to substrate base 5 front, and final functional membrane can be caused unstable.Therefore, as shown in Figure 3, described substrate base 5 is before entering coated solution, adjustment motion arm 4 makes the front of the substrate base 5 of absorption and horizontal plane have inclination angle, after substrate base 5 is immersed in coated solution, the front of substrate base 5 is adjusted to level, after reaching dip time, be adjusted in the front of substrate base 5 and have inclination angle with horizontal plane, then substrate base 5 is detached coated solution by lifting motion arm 4.
Described inclination angle is 3 ~ 15 degree, and in the present embodiment, inclination angle adopts 5 degree.
S03, cleaning treatment: substrate base 5 is after coating film treatment, by circulation slide rail 3, the robot 1 drawing substrate base 5 is slid near rinse bath 8, the motion arm 4 of absorption substrate base 5 is made to be positioned at directly over rinse bath 8, by robot controlling center 2 control operation arm 4 upset adjustment, make the face down of substrate base 5, then substrate base 5 immerses in cleaning fluid by step-down operation arm 4, adjustment motion arm 4 makes substrate base 5 front be parallel to horizontal plane, moved by robot 1 again and drive motion arm 4, the substrate base 5 that motion arm 4 is drawn in horizontal plane Multidirectional reciprocating translational motion to carry out level cleaning, as shown in Figure 4, it is the top view of substrate base in rinse bath work, composition graphs 4, the substrate base 5 that motion arm 4 is drawn is at the X-axis of horizontal plane and Y direction alternating translational movement, after scavenging period to be achieved, stop level cleaning, substrate base 5 is detached cleaning fluid by lifting motion arm 4, then enters next step operation,
Described cleaning fluid is deionized water; Described scavenging period is 0.5 ~ 2min;
S04, dry process: the robot 1 drawing substrate base 5, after cleaning treatment, is slid into drying system 10 by circulation slide rail 3 by substrate base 5, put into substrate base 5 and carry out air-dry in drying system 5, complete whole horizontal immersion Plating membrane process; Robot 1 turns back to starting point by circulation slide rail 3, and the operation of S01 to S04 is carried out in circulation.
Drying system 10 described in the present embodiment is oven, and the baking temperature of described oven is 40 ~ 80 DEG C;
The quantity of oven is not limited to 1, carries out quantitative design according to process rhythm.
In the horizontal immersion Plating membranous system of above-mentioned continous way, according to operation and beat, the robot of more than two also can be set, each robot all can complete whole filming process alone, in the horizontal immersion Plating membranous system of described continous way, robot forms circulation by circulation slide rail and produces, and at one time, each robot carries out different process links respectively.If First robot is after completing immersion Plating zona joint, enter into cleaning link, second robot just starts immersion Plating zona joint; After First robot completes cleaning link, enter oven or air blade device carries out drying, or directly get back to initial position, namely second robot enter cleaning link.So move in circles, realize the work that multiple stage robot carries out pipeline system simultaneously.
Above-described embodiment is the present invention's preferably embodiment; but embodiments of the present invention are not restricted to the described embodiments; change, the modification done under other any does not deviate from Spirit Essence of the present invention and principle, substitute, combine, simplify; all should be the substitute mode of equivalence, be included within protection scope of the present invention.
Claims (10)
1. the horizontal immersion Plating membranous system of continous way, it is characterized in that: the horizontal immersion Plating membranous system of described continous way comprises robot, robot controlling center and circulation slide rail, robot is connected with robot controlling center signal, described robot slidingtype is arranged on circulation slide rail, and circulation slide rail is used for robot cycle and slides; Described robot is provided with motion arm, and described motion arm front end arranges several sucker for absorption substrate substrate, and robot drives motion arm action; Circulation slide rail side is other is provided with coated solution groove and rinse bath.
2. the horizontal immersion Plating membranous system of a kind of continous way according to claim 1, is characterized in that: the horizontal immersion Plating membranous system of described continous way also comprises substrate base prerinse and navigation system.
3. the horizontal immersion Plating membranous system of a kind of continous way according to claim 1, is characterized in that: the horizontal immersion Plating membranous system of described continous way also comprises drying system, and described drying system is arranged on by circulation slide rail side.
4. the horizontal immersion Plating membranous system of a kind of continous way according to claim 1, is characterized in that: the quantity of described robot is at least one.
5. the horizontal immersion Plating membranous system of a kind of continous way according to claim 1, is characterized in that: the horizontal cross-section of described coated solution groove is greater than the area of substrate base; The horizontal cross-section of described rinse bath is greater than the area of substrate base.
6. the horizontal immersion Plating membranous system of a kind of continous way according to claim 1, is characterized in that: described substrate base is hard substrates, or deposits the hard substrates of function film.
7. adopt the horizontal immersion Plating membranous system of continous way described in any one of claim 1 ~ 6 to carry out the method for plated film, comprise the steps:
S01, absorption substrate base: the robot of starting point starts, and by the back side of the sucker suction substrate base on motion arm, then enters next step operation;
S02, coating film treatment: the robot drawing substrate base is slid near coated solution groove by circulation slide rail, the motion arm of absorption substrate base is made to be positioned at directly over coated solution groove, by robot controlling center control operation arm upset adjustment, make the face down of substrate base, then substrate base immerses in coated solution by step-down operation arm, after reaching dip time, substrate base is detached coated solution by lifting motion arm, then enters next step operation;
S03, cleaning treatment: substrate base is after coating film treatment, by circulation slide rail, the robot drawing substrate base is slid near rinse bath, the motion arm of absorption substrate base is made to be positioned at directly over rinse bath, by robot controlling center control operation arm upset adjustment, make the face down of substrate base, then substrate base immerses in cleaning fluid by step-down operation arm, adjustment motion arm makes substrate base front be parallel to horizontal plane, motion arm is driven again by robot motion, the substrate base that motion arm is drawn in horizontal plane Multidirectional reciprocating translational motion to carry out level cleaning, after reaching scavenging period, stopping level being cleaned, substrate base is detached cleaning fluid by lifting motion arm, then next step operation is entered,
S04, dry process: the robot drawing substrate base, after cleaning treatment, is slid into drying system by circulation slide rail by substrate base, put into substrate base and carry out air-dry in drying system, complete whole horizontal immersion Plating membrane process; Robot turns back to starting point by circulation slide rail, and the operation of S01 to S04 is carried out in circulation.
8. film plating process according to claim 7, it is characterized in that: in step S01, substrate base is first through prerinse, improve the cleanliness factor of substrate base, then position in the exercisable scope of motion arm delivering to robot, the sucker of motion arm can be drawn from the back side of substrate base smoothly.
9. film plating process according to claim 7, it is characterized in that: in step S02, described substrate base is before entering coated solution, adjustment motion arm makes the front of the substrate base of absorption and horizontal plane have inclination angle, after substrate base is immersed in coated solution, the front of substrate base is adjusted to level, after reaching dip time, be adjusted in the front of substrate base and have inclination angle with horizontal plane, then substrate base is detached coated solution by lifting motion arm.
10. film plating process according to claim 7, is characterized in that: the time of the cleaning of level described in step S02 is 0.5 ~ 2min; Drying system described in step S03 is oven, and the baking temperature of described oven is 40 ~ 80 DEG C.
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| CN113001848A (en) * | 2021-02-24 | 2021-06-22 | 桂林恒保健康防护有限公司 | Preparation method of medical gloves with uniform thickness |
| CN115445852A (en) * | 2022-08-19 | 2022-12-09 | 东莞市周翔塑胶科技有限公司 | Automatic hardening treatment equipment for lens surface |
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| CN105032718B (en) | 2017-08-22 |
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