CN104991347A - Laser shaping illuminator based on microlens array - Google Patents

Laser shaping illuminator based on microlens array Download PDF

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Publication number
CN104991347A
CN104991347A CN201510418889.XA CN201510418889A CN104991347A CN 104991347 A CN104991347 A CN 104991347A CN 201510418889 A CN201510418889 A CN 201510418889A CN 104991347 A CN104991347 A CN 104991347A
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CN
China
Prior art keywords
microlens array
laser
shaping
laser shaping
luminaire
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Pending
Application number
CN201510418889.XA
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Chinese (zh)
Inventor
范志刚
陈婷
薛文慧
陈守谦
张旺
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Harbin Institute of Technology
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Harbin Institute of Technology
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Priority to CN201510418889.XA priority Critical patent/CN104991347A/en
Publication of CN104991347A publication Critical patent/CN104991347A/en
Pending legal-status Critical Current

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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
    • G02B27/0938—Using specific optical elements
    • G02B27/095—Refractive optical elements
    • G02B27/0955—Lenses
    • G02B27/0961—Lens arrays
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
    • G02B27/0916—Adapting the beam shape of a semiconductor light source such as a laser diode or an LED, e.g. for efficiently coupling into optical fibers
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
    • G02B27/0927—Systems for changing the beam intensity distribution, e.g. Gaussian to top-hat

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Optical Elements Other Than Lenses (AREA)

Abstract

The invention discloses a laser shaping illuminator based on a microlens array. The laser shaping illuminator is composed of a laser beam expanding and collimating system, a microlens array group and a rear-arranged beam expanding system, a laser beam with non-uniformly distributed light intensity emitted by a laser light source passes through the laser beam expanding and collimating system and is subjected to divergence angle compression to form approximate parallel light beams, the non-uniformly distributed light beams are subjected to differential and integral operations through the microlens array group, uniform illumination effect can be formed in a distant field, the rear-arranged beam expanding system can reduce area of an illumination region, and finally the area of the illumination region in proportion to distance is formed in the distant field. The light intensity distribution can be uniformized when the laser shaping illuminator is used for shaping a non-uniform light source, the illumination area in a certain shape is obtained in the distant field under the condition of reducing energy loss as much as possible, and the uniformity can reach above 90%.

Description

Based on the laser shaping luminaire of microlens array
Technical field
The invention belongs to infrared optical system design field, relate to a kind of laser shaping luminaire based on microlens array.
Background technology
Since First laser instrument comes out, various types of laser instrument is developed out in succession, and the laser technology in future will face larger opportunity and innovative space.
For most laser, on the route of transmission of light beam, Laser Transmission direction is hyperbolic-type, and perpendicular on the xsect of transmission path, the light distribution of laser is Gaussian curve type.But in the major applications of laser, need uniform light distribution.High-power incident laser beam, due to the light distribution of Gaussian, concentration of energy at the center of light beam, thus causes the damage of Laser Processing material.And light intensity is the laser beam of flat-top distribution, then can improve the damage threshold of laser greatly.
At present, widely used laser shaping device has LCD space light modulator, binary optical elements, birefringent lens group, random phase plate, non-spherical lens, microlens array etc.
Microlens array has now been widely used in illuminator and imaging system, and it has the features such as volume is little, quality is light, loss is little, and the orthopedic systems structure of formation is simple, use is flexible, is widely used.
Summary of the invention
The object of this invention is to provide a kind of laser shaping luminaire based on microlens array, application native system carries out shaping to non-homogeneous light source and can realize homogenize, and when reducing energy loss as far as possible, obtain the lighting area of definite shape in far field, uniformity coefficient can reach more than 90%.
The object of the invention is to be achieved through the following technical solutions:
A kind of laser shaping luminaire based on microlens array, be made up of laser bundle-enlarging collimation system, microlens array group and rearmounted beam-expanding system, the laser beam of the light intensity non-uniform Distribution that LASER Light Source sends compresses the angle of divergence after laser bundle-enlarging collimation system, form less parallel light beam, by microlens array group, non-uniform distribution light beam is carried out to the process of differential integration again, Uniform Illumination effect can be formed in far field, rearmounted beam-expanding system can reduce field of illumination area, finally forms the field of illumination area be directly proportional to distance in far field.
In the present invention, described LASER Light Source is LASER Light Source or other intensity distribution in cross-section source of parallel light pockety.
In the present invention, described laser bundle-enlarging collimation system is the Single wavelength beam-expanding system of two panels eyeglass composition, and its form is galilean telescope system.
In the present invention, footpath, described microlens array group rim of the mouth shape determines the shape of field of illumination.Footpath, the rim of the mouth shape of microlens array group is square, and filling rate reaches the highest, and field of illumination shape is square.
In the present invention, described rearmounted beam-expanding system is for overcoming the diffraction effect restriction of system, and shorten system longitudinal size, rearmounted beam-expanding collimation system is the Single wavelength beam-expanding system of two panels eyeglass composition, and its form is galilean telescope system.
In the present invention, the spacing of described laser bundle-enlarging collimation system and microlens array group and microlens array group and rearmounted beam-expanding system is not strict with.
In the present invention, it is Single wavelength infrared laser wave band that described laser shaping luminaire is suitable for target wave band, and whole eyeglass uses fused silica material to form.
Laser shaping luminaire based on microlens array provided by the invention is for being embodied as non-homogeneous beam shaping, the Uniform Illumination realizing certain area and shape in far field is developed, be mainly used in laser or other non-uniform light intensity source of parallel light, its core design is microlens array group, to obtain far field Uniform Illumination effect.Compared to prior art, tool has the following advantages:
1, can be used in the light source of various Single wavelength infrared laser;
2, shaping can be carried out to the source of parallel light of any light distribution, to the light distribution not requirement of light source;
3, apply native system, in far field, the uniformity coefficient that illumination can reach more than 90% is carried out to object section;
4, concentrate in field of illumination by the luminous flux of luminaire, energy loss is few, and capacity usage ratio is high;
5, system uses rearmounted beam-expanding system to highly shortened system dimension;
6, system is illuminator, and belong to non-imaged design, the tolerance that processing is installed is not high, debugs easily, is easy to realize.
Accompanying drawing explanation
Fig. 1 is the structural drawing of the laser shaping luminaire based on microlens array;
Fig. 2 is the planimetric map of the laser shaping luminaire based on microlens array;
Fig. 3 is the illumination uniformity simulation result of the laser shaping luminaire based on microlens array.
Embodiment
Below in conjunction with accompanying drawing, technical scheme of the present invention is further described; but be not limited thereto; everyly technical solution of the present invention modified or equivalent to replace, and not departing from the spirit and scope of technical solution of the present invention, all should be encompassed in protection scope of the present invention.
As shown in Figure 1-2, the laser shaping luminaire based on microlens array provided by the invention is made up of laser bundle-enlarging collimation system 1, microlens array group 2 and rearmounted beam-expanding system 3.Light source is laser or nearly parallel light source, the laser beam of light intensity non-uniform Distribution compresses the angle of divergence after laser bundle-enlarging collimation system 1, form less parallel light beam, by microlens array group 2, non-uniform distribution light beam is through differential integration again, changing beam angle by rearmounted beam-expanding system 3, in far field, superposition forms Uniform Illumination effect to last beamlet.
In said system, for avoiding high-power laser pulse to focus on, laser bundle-enlarging collimation system 1 and rearmounted beam-expanding collimation system 3 all adopt galilean telescope system structure, are made up of two panels eyeglass, the focal length of lens is larger with effective clear aperture, introduces wavefront distortion amount little.
In said system, use the principle of microlens array integrator, after light beam is carried out first differential, the process of integration can meet system request for utilization.Gaussian beam is divided into infinitesimal light beam by lenticule, and every light beams homogeneity is separately much better than Gaussian beam homogeneity.Every Shu Weiyuan light is substantially identical by far field image space in object section, after superposition, realize Gaussian beam flat-top.
In said system, due to field of illumination be parallel infinitesimal light beam through lenticule in operating distance place imaging, then operating distance place illumination shape is determined by microlens array sub-lens shape, and square array has the high advantage of filling rate, and microlens array selects square array.
In said system, in microlens array group 2, first microlens array does infinitesimal process to incident laser beam, and differential is thinner, and illumination uniformity is better.But unit dimension exists minimum value, therefore to improve infinitesimal quantity, need to expand emergent light spot.Rearmounted beam-expanding system 3 can reduce field of illumination area, and shortens system length.
In said system, if footpath, microlens array rim of the mouth is p, focal length is f ', can obtain microlens array F/# and is θ without the beam exit angle of rearmounted beam-expanding system 1, computing formula is as follows:
F / # = f ′ p
θ 1 = ± p 2 f ′ = ± 1 2 ( F / # )
In said system, footpath, rim of the mouth is the diffraction angle that the microlens array of p causes spread outfor:
The one-wavelength laser wavelength that λ uses for the even optical illumination detection system of infrared laser.
θ spread outwith θ 1following relation need be met:
That is: p >=2.44 λ (F/#).
From above formula, F/# determines the size of p, and F/# is inversely proportional to operating distance place lighting area again, less lighting area, and p is larger for footpath, rim of the mouth; P is larger, and effective infinitesimal number is fewer, also larger on the impact of homogeneity.Now, meeting | θ spread out|≤| θ 1| when, by adding of rearmounted beam-expanding system, make microlens array F/# constant, when angle of diffraction does not increase, reduce lighting area.
In said system, in microlens array group 2, two panels microlens array parameter is identical, and spacing is focal length of micro-lens array f '.The spacing of laser bundle-enlarging collimation system 1 and microlens array group 2 and microlens array group 2 and rearmounted beam-expanding system 3 is not strict with.
Total system obtains the illumination figure at operating distance place as shown in Figure 3 by procedure simulation after docking, and the Illumination Distribution uniformity coefficient outside removing edge reaches more than 90%.

Claims (9)

1. the laser shaping luminaire based on microlens array, it is characterized in that described laser shaping luminaire is by laser bundle-enlarging collimation system, microlens array group and rearmounted beam-expanding system are formed, the laser beam of the light intensity non-uniform Distribution that LASER Light Source sends compresses the angle of divergence after laser bundle-enlarging collimation system, form less parallel light beam, by microlens array group, non-uniform distribution light beam is carried out to the process of differential integration again, Uniform Illumination effect can be formed in far field, rearmounted beam-expanding system can reduce field of illumination area, finally form the field of illumination area be directly proportional to distance in far field.
2. the laser shaping luminaire based on microlens array according to claim 1, is characterized in that described LASER Light Source is LASER Light Source or other intensity distribution in cross-section source of parallel light pockety.
3. the laser shaping luminaire based on microlens array according to claim 1, it is characterized in that described laser bundle-enlarging collimation system is the Single wavelength beam-expanding system of two panels eyeglass composition, its form is galilean telescope system.
4. the laser shaping luminaire based on microlens array according to claim 1, is characterized in that footpath, the rim of the mouth shape of described microlens array group determines the shape of field of illumination.
5. the laser shaping luminaire based on microlens array according to claim 4, it is characterized in that footpath, the rim of the mouth shape of described microlens array group is for square, filling rate reaches the highest, and field of illumination shape is square.
6. the laser shaping luminaire based on microlens array according to claim 1, it is characterized in that described rearmounted beam-expanding system is the Single wavelength beam-expanding system of two panels eyeglass composition, its form is galilean telescope system.
7. the laser shaping luminaire based on microlens array according to claim 1, is characterized in that the spacing of described laser bundle-enlarging collimation system and microlens array group and microlens array group and rearmounted beam-expanding system is not strict with.
8. the laser shaping luminaire based on microlens array according to claim 1, it is characterized in that described laser shaping luminaire is suitable for target wave band is Single wavelength infrared laser wave band.
9. the laser shaping luminaire based on microlens array according to claim 1, is characterized in that whole eyeglasses of described laser shaping luminaire use fused silica material to form.
CN201510418889.XA 2015-07-16 2015-07-16 Laser shaping illuminator based on microlens array Pending CN104991347A (en)

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Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105467599A (en) * 2015-12-25 2016-04-06 深圳乐行天下科技有限公司 Laser plastic-surgery optical component
CN106291949A (en) * 2016-11-09 2017-01-04 中国航空工业集团公司北京航空制造工程研究所 A kind of apparatus for shaping of laser beam
CN108445640A (en) * 2018-02-28 2018-08-24 北京控制工程研究所 A kind of coaxial uniform illumination system of relative pose vision measurement sensor
CN108469680A (en) * 2018-03-30 2018-08-31 中国科学院长春光学精密机械与物理研究所 A kind of laser light source
WO2018184324A1 (en) * 2017-04-07 2018-10-11 深圳市光峰光电技术有限公司 Light source system and projection device
CN110927981A (en) * 2019-11-18 2020-03-27 中国科学院上海技术物理研究所 High-uniformity single-photon area light source generating device
CN111715997A (en) * 2019-03-21 2020-09-29 中国科学院微电子研究所 System and method for homogenizing Gaussian laser
CN111795921A (en) * 2020-07-14 2020-10-20 南京理工大学 Particle counter sensor beam homogenization and sharpening illumination system
CN111880315A (en) * 2020-08-12 2020-11-03 中国科学院长春光学精密机械与物理研究所 Laser lighting equipment
CN112567294A (en) * 2018-08-16 2021-03-26 索尼公司 Light source device and projection display device
CN113253468A (en) * 2021-04-13 2021-08-13 中国人民解放军战略支援部队航天工程大学 Laser homogenizing and shaping system based on micro-lens array
CN114296245A (en) * 2021-12-09 2022-04-08 华中光电技术研究所（中国船舶重工集团公司第七一七研究所） Raman beam shaping device

Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4203652A (en) * 1977-02-15 1980-05-20 Canon Kabushiki Kaisha Beam shaping optical system
EP0723834A1 (en) * 1995-01-25 1996-07-31 Lumonics Ltd. Laser apparatus
JP2005147109A (en) * 2003-11-20 2005-06-09 National Institute Of Advanced Industrial & Technology Laser type multi-point ignition device for internal combustion engine
CN201221753Y (en) * 2008-05-15 2009-04-15 郑维彦 Even high efficiency lighting system applied to night viewing system
CN102837128A (en) * 2012-08-28 2012-12-26 中国科学院光电研究院 Laser direct writing machining system by using liquid crystal light valve reshaping
CN103246066A (en) * 2013-05-17 2013-08-14 中国科学院光电技术研究所 Optical system for homogenizing planar array semiconductor laser beam
CN103969832A (en) * 2014-05-27 2014-08-06 哈尔滨工业大学 Laser beam-expanding dodging device based on microlens array
CN104267504A (en) * 2014-10-10 2015-01-07 中国科学院光电技术研究所 Laser beam homogenization method based on central off-axis microlens array
CN104460005A (en) * 2014-11-17 2015-03-25 北京工业大学 Method for optimizing excimer laser micro-lens array beam homogenizing device

Patent Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4203652A (en) * 1977-02-15 1980-05-20 Canon Kabushiki Kaisha Beam shaping optical system
EP0723834A1 (en) * 1995-01-25 1996-07-31 Lumonics Ltd. Laser apparatus
JP2005147109A (en) * 2003-11-20 2005-06-09 National Institute Of Advanced Industrial & Technology Laser type multi-point ignition device for internal combustion engine
CN201221753Y (en) * 2008-05-15 2009-04-15 郑维彦 Even high efficiency lighting system applied to night viewing system
CN102837128A (en) * 2012-08-28 2012-12-26 中国科学院光电研究院 Laser direct writing machining system by using liquid crystal light valve reshaping
CN103246066A (en) * 2013-05-17 2013-08-14 中国科学院光电技术研究所 Optical system for homogenizing planar array semiconductor laser beam
CN103969832A (en) * 2014-05-27 2014-08-06 哈尔滨工业大学 Laser beam-expanding dodging device based on microlens array
CN104267504A (en) * 2014-10-10 2015-01-07 中国科学院光电技术研究所 Laser beam homogenization method based on central off-axis microlens array
CN104460005A (en) * 2014-11-17 2015-03-25 北京工业大学 Method for optimizing excimer laser micro-lens array beam homogenizing device

Cited By (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105467599A (en) * 2015-12-25 2016-04-06 深圳乐行天下科技有限公司 Laser plastic-surgery optical component
CN106291949B (en) * 2016-11-09 2018-09-07 中国航空工业集团公司北京航空制造工程研究所 A kind of apparatus for shaping of laser beam
CN106291949A (en) * 2016-11-09 2017-01-04 中国航空工业集团公司北京航空制造工程研究所 A kind of apparatus for shaping of laser beam
CN108693688B (en) * 2017-04-07 2020-09-15 深圳光峰科技股份有限公司 Light source system and projection equipment
WO2018184324A1 (en) * 2017-04-07 2018-10-11 深圳市光峰光电技术有限公司 Light source system and projection device
CN108693688A (en) * 2017-04-07 2018-10-23 深圳市光峰光电技术有限公司 Light-source system and projection device
CN108445640A (en) * 2018-02-28 2018-08-24 北京控制工程研究所 A kind of coaxial uniform illumination system of relative pose vision measurement sensor
CN108469680A (en) * 2018-03-30 2018-08-31 中国科学院长春光学精密机械与物理研究所 A kind of laser light source
CN112567294A (en) * 2018-08-16 2021-03-26 索尼公司 Light source device and projection display device
CN111715997A (en) * 2019-03-21 2020-09-29 中国科学院微电子研究所 System and method for homogenizing Gaussian laser
CN110927981A (en) * 2019-11-18 2020-03-27 中国科学院上海技术物理研究所 High-uniformity single-photon area light source generating device
CN111795921A (en) * 2020-07-14 2020-10-20 南京理工大学 Particle counter sensor beam homogenization and sharpening illumination system
CN111795921B (en) * 2020-07-14 2023-08-22 南京理工大学 Illumination system for particle counter sensor beam homogenization and sharpening
CN111880315A (en) * 2020-08-12 2020-11-03 中国科学院长春光学精密机械与物理研究所 Laser lighting equipment
CN113253468A (en) * 2021-04-13 2021-08-13 中国人民解放军战略支援部队航天工程大学 Laser homogenizing and shaping system based on micro-lens array
CN114296245A (en) * 2021-12-09 2022-04-08 华中光电技术研究所（中国船舶重工集团公司第七一七研究所） Raman beam shaping device
CN114296245B (en) * 2021-12-09 2024-03-01 华中光电技术研究所（中国船舶重工集团公司第七一七研究所） Raman beam shaping device

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Application publication date: 20151021