CN104977815A - Scanning table for direct-writing exposure system - Google Patents
Scanning table for direct-writing exposure system Download PDFInfo
- Publication number
- CN104977815A CN104977815A CN201510383235.8A CN201510383235A CN104977815A CN 104977815 A CN104977815 A CN 104977815A CN 201510383235 A CN201510383235 A CN 201510383235A CN 104977815 A CN104977815 A CN 104977815A
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- China
- Prior art keywords
- floor beam
- laminate floor
- panel
- lifting drive
- deck plate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Abstract
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Claims (6)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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CN201510383235.8A CN104977815B (en) | 2015-07-03 | 2015-07-03 | Scan table in write-through exposure system |
Applications Claiming Priority (1)
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CN201510383235.8A CN104977815B (en) | 2015-07-03 | 2015-07-03 | Scan table in write-through exposure system |
Publications (2)
Publication Number | Publication Date |
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CN104977815A true CN104977815A (en) | 2015-10-14 |
CN104977815B CN104977815B (en) | 2018-02-23 |
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Family Applications (1)
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CN201510383235.8A Active CN104977815B (en) | 2015-07-03 | 2015-07-03 | Scan table in write-through exposure system |
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CN (1) | CN104977815B (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN112130423A (en) * | 2020-09-15 | 2020-12-25 | 合肥芯碁微电子装备股份有限公司 | Direct-writing type photoetching machine sucker pressing plate device and control method thereof |
WO2023019725A1 (en) * | 2021-08-19 | 2023-02-23 | 杭州新诺微电子有限公司 | Movable board pressing structure, exposure machine having said structure, and board pressing method of exposure machine |
Citations (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001109160A (en) * | 1999-10-08 | 2001-04-20 | Hitachi Electronics Eng Co Ltd | Mask deflection correction mechanism for base plate exposure device |
US20050134829A1 (en) * | 2003-12-17 | 2005-06-23 | Asml Netherlands B.V. | Lithographic apparatus, device manufacturing method, and device manufactured thereby |
CN101105640A (en) * | 2006-07-14 | 2008-01-16 | Asml荷兰有限公司 | Lithographic apparatus and device manufacturing method |
CN101369523A (en) * | 2008-10-17 | 2009-02-18 | 格兰达技术(深圳)有限公司 | IC material strip laser mark printing machine and its operation mode |
CN201593026U (en) * | 2009-06-24 | 2010-09-29 | 邹明刚 | Automatic detonator waist tag machine |
CN102222626A (en) * | 2010-04-15 | 2011-10-19 | 日月光半导体制造股份有限公司 | Machine bench for semiconductor technology |
CN102575342A (en) * | 2010-02-09 | 2012-07-11 | 富士电机株式会社 | Flexible substrate position control device |
CN103008957A (en) * | 2012-12-27 | 2013-04-03 | 中国重汽集团柳州运力专用汽车有限公司 | Compressing device for carriage side plate of self-dumper |
CN104084721A (en) * | 2014-06-27 | 2014-10-08 | 龙口丛林中德车体系统工程有限公司 | Anti-edge-warping IGM welding machine and welding method thereof |
CN104377156A (en) * | 2014-09-26 | 2015-02-25 | 南通富士通微电子股份有限公司 | Fixing device |
CN205121156U (en) * | 2015-07-03 | 2016-03-30 | 苏州微影光电科技有限公司 | Directly write scanning platform in formula exposure system |
-
2015
- 2015-07-03 CN CN201510383235.8A patent/CN104977815B/en active Active
Patent Citations (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001109160A (en) * | 1999-10-08 | 2001-04-20 | Hitachi Electronics Eng Co Ltd | Mask deflection correction mechanism for base plate exposure device |
US20050134829A1 (en) * | 2003-12-17 | 2005-06-23 | Asml Netherlands B.V. | Lithographic apparatus, device manufacturing method, and device manufactured thereby |
CN101105640A (en) * | 2006-07-14 | 2008-01-16 | Asml荷兰有限公司 | Lithographic apparatus and device manufacturing method |
CN101369523A (en) * | 2008-10-17 | 2009-02-18 | 格兰达技术(深圳)有限公司 | IC material strip laser mark printing machine and its operation mode |
CN201593026U (en) * | 2009-06-24 | 2010-09-29 | 邹明刚 | Automatic detonator waist tag machine |
CN102575342A (en) * | 2010-02-09 | 2012-07-11 | 富士电机株式会社 | Flexible substrate position control device |
CN102222626A (en) * | 2010-04-15 | 2011-10-19 | 日月光半导体制造股份有限公司 | Machine bench for semiconductor technology |
CN103008957A (en) * | 2012-12-27 | 2013-04-03 | 中国重汽集团柳州运力专用汽车有限公司 | Compressing device for carriage side plate of self-dumper |
CN104084721A (en) * | 2014-06-27 | 2014-10-08 | 龙口丛林中德车体系统工程有限公司 | Anti-edge-warping IGM welding machine and welding method thereof |
CN104377156A (en) * | 2014-09-26 | 2015-02-25 | 南通富士通微电子股份有限公司 | Fixing device |
CN205121156U (en) * | 2015-07-03 | 2016-03-30 | 苏州微影光电科技有限公司 | Directly write scanning platform in formula exposure system |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN112130423A (en) * | 2020-09-15 | 2020-12-25 | 合肥芯碁微电子装备股份有限公司 | Direct-writing type photoetching machine sucker pressing plate device and control method thereof |
WO2023019725A1 (en) * | 2021-08-19 | 2023-02-23 | 杭州新诺微电子有限公司 | Movable board pressing structure, exposure machine having said structure, and board pressing method of exposure machine |
Also Published As
Publication number | Publication date |
---|---|
CN104977815B (en) | 2018-02-23 |
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Legal Events
Date | Code | Title | Description |
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C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
CB02 | Change of applicant information |
Address after: 215636 Zhangjiagang City, Jiangsu Province, the new town of the sea dam road, Suzhou, micro shadow Photoelectric Technology Co., Ltd. Applicant after: SUZHOU WEIYING LASER TECHNOLOGY CO.,LTD. Address before: 215636 Zhangjiagang City, Jiangsu Province, the new town of the sea dam road, Suzhou, micro shadow Photoelectric Technology Co., Ltd. Applicant before: ADVANCED MICROLITHO INSTRUMENT, Inc. |
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CB02 | Change of applicant information | ||
GR01 | Patent grant | ||
GR01 | Patent grant | ||
PE01 | Entry into force of the registration of the contract for pledge of patent right |
Denomination of invention: Scanning stage in direct writing exposure system Effective date of registration: 20210128 Granted publication date: 20180223 Pledgee: Jiujiang Pohu new city investment and Construction Co.,Ltd. Pledgor: SUZHOU WEIYING LASER TECHNOLOGY Co.,Ltd. Registration number: Y2021980000823 |
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PE01 | Entry into force of the registration of the contract for pledge of patent right | ||
PC01 | Cancellation of the registration of the contract for pledge of patent right |
Date of cancellation: 20230508 Granted publication date: 20180223 Pledgee: Jiujiang Pohu new city investment and Construction Co.,Ltd. Pledgor: SUZHOU WEIYING LASER TECHNOLOGY CO.,LTD. Registration number: Y2021980000823 |
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PC01 | Cancellation of the registration of the contract for pledge of patent right |