CN104977809B - A kind of vertical control parameter calibration method of litho machine - Google Patents
A kind of vertical control parameter calibration method of litho machine Download PDFInfo
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- CN104977809B CN104977809B CN201410137059.5A CN201410137059A CN104977809B CN 104977809 B CN104977809 B CN 104977809B CN 201410137059 A CN201410137059 A CN 201410137059A CN 104977809 B CN104977809 B CN 104977809B
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Abstract
The present invention proposes a kind of vertical control parameter calibration method of litho machine, it is characterised in that：Comprise the following steps：Step 1：Initialization work stage, mask platform, mask focusing and leveling sensor, coaxial alignment subsystem；Step 2：Upload mask；Step 3：Mask alignment mark is moved into coaxial alignment position；Step 4：Mask platform is set to specify step-length catenary motion within the specified range, work stage follows mask platform to move；Step 5：Record mask focusing and leveling sensor and work stage grating scale reading that each pacing is measured；Repeat step 4 is until mask platform completes the catenary motion in the specified range；Step 6：Calculate two groups of proportionality coefficients of data；Step 7：The more proportionality coefficient of new mask focusing and leveling sensor on the basis of the measurement data of work stage grating scale.
Description
Technical field
The present invention relates to technical field of manufacturing semiconductors, further, it is related to a kind of vertical control parameter school of litho machine
Quasi- method.
Background technology
In litho machine, there is two sets of independent object spaces and the vertical control device of image space substrate：Work stage and mask platform.Phase
That answers just has two sets of independent vertical measuring sets：Mask focusing and leveling sensor and grating scale.Two sets of measurement apparatus without
Before calibration, respective measurement scale is followed respectively.So in actual use, object space can not be accurate with the catenary motion amount of image space
The preferable proportionate relationship of foundation move, it is necessary to can be used after calibrating.
In the prior art, United States Patent (USP) US5625436A discloses a kind of scanning-exposure apparatus and exposure method, the exposure
Device include in have：The distributed architecture of scan exposure, the splicing of many object lens and object lens.Exposure method include in have：Base
Plate face shape record, adjustable object lens multiplying power and scan exposure speed, the alignment device used for measurement real estate shape and
According to the method that the change of marker graphic obtains real estate shape.The invention belong to substrate surface shape measurement during online production,
Compensation method and device, before not referring to measuring surface shape, to the measurement and the calibration process of compensation method.
The content of the invention
In order to overcome defect of the prior art, the present invention to propose off-line calibration object space and two sets of vertical control systems of image space
Proportionality coefficient, the measurement of alignment surface shape compensation method and compensation precision.
The present invention proposes a kind of vertical control parameter calibration method of litho machine, it is characterised in that：Comprise the following steps：
Step 1：Initialization work stage, mask platform, mask focusing and leveling sensor, coaxial alignment subsystem；
Step 2：Upload mask；
Step 3：Mask alignment mark is moved into coaxial alignment position；
Step 4：Mask platform is set to specify step-length catenary motion within the specified range, work stage follows mask platform to move；
Step 5：Record mask focusing and leveling sensor and work stage grating scale reading that each pacing is measured；Repeat to walk
Rapid 4 until mask platform completes the catenary motion in the specified range；
Step 6：Calculate work stage grating scale and two groups of proportionality coefficients of data of mask focusing and leveling sensor；
Step 7：The focusing of more new mask is adjusted on the basis of the proportionality coefficient being calculated by the measurement data of work stage grating scale
The proportionality coefficient of sensor.
Wherein, the step 4 also comprises the following steps：
Step 4.1：Mask platform is with specified step-length catenary motion；
Step 4.2：Work stage follows mask platform to move according to the preferable position of focal plane that coaxial alignment search, measurement are obtained,
Record the contrast-data of each step；
Step 4.3：:Numerical value according to work stage grating scale vertical position and contrast finds extreme point.
Wherein, intended by the way that the numerical value of the work stage grating scale vertical position and contrast is made into least square method high-order
Close, find extreme point.
Wherein, the catenary motion scope in the step 4 determines according to mask focusing and leveling sensor accurate measurement scope.
Wherein, two groups of proportionality coefficients of data of least square fitting are used in the step 6.
The vertical control parameter calibration method of a kind of litho machine proposed by the present invention, by measuring calibration object space and image space two
The proportionality coefficient of vertical control system is covered, so that the measurement of alignment surface shape compensation method and compensation precision.
Brief description of the drawings
Can be obtained further by following detailed description of the invention and institute's accompanying drawings on the advantages and spirit of the present invention
Solution.
Fig. 1 is litho machine structural representation of the present invention；
Fig. 2 is alignment mark schematic diagram of the present invention；
Fig. 3 is the vertical control parameter calibration method flow chart of litho machine of the present invention；
Fig. 4 is the vertical control parameter calibration method alignment focal plane search schematic diagram of litho machine of the present invention.
Specific embodiment
The specific embodiment that the invention will now be described in detail with reference to the accompanying drawings.
As shown in figure 1, Fig. 1 is litho machine structural representation of the present invention, including：Work stage 1, mask platform 2, mask focusing is adjusted
The measuring beam exit end 3 of sensor, the receiving terminal 4 of mask focusing and leveling sensor, CCD 5, object lens 7, and it is coaxial right
Barebone 8.Work stage 1 is used to carry CCD image sensor 5 to different alignment vertical positions.Mask platform 2, covers for carrying
Alignment mark 6 on masterplate is to different vertical positions.Mask focusing and leveling sensor, is being moved through for measuring mask
Cheng Zhong, the vertical height value of reality of object plane.Object lens 7, for the alignment mark on object plane mask to be imaged to CCD 5.Together
Axle, for the alignment mark image that CCD5 samplings are obtained to be processed, according to result, controls work stage 1 to Barebone 8
Different height is moved to find out clearly image space.
Fig. 2 is the mask alignment mark schematic diagram used on mask of the present invention.
Fig. 3 is the vertical control parameter calibration method flow chart of litho machine of the present invention, is comprised the following steps：
Step one：Initialization work stage 1, mask platform 2, mask focusing and leveling sensor, coaxial alignment subsystem；
Step 2：Upload the mask with mask alignment mark；
Step 3：Mask alignment mark 6 is moved into coaxial alignment position；
Step 4：Mask platform 2 is set first to specify step-length catenary motion, the range of movement to be passed according to mask focusing and leveling
Sensor accurate measurement scope determines.Then, each mask platform vertical position, the reason that work stage 1 is searched for according to coaxial alignment, measurement is obtained
Think that position of focal plane follows mask platform to move, record the contrast-data of each step.Finally, by work stage grating scale vertical position with
The numerical value of contrast makees least square method high order fitting, and finds extreme point.As shown in figure 4, in alignment focal plane search schematic diagram
In, the extreme point is exactly most clearly contrast highest work stage alignment position.
Step 5：Now work stage grating scale and mask focusing and leveling sensor reading are recorded, repeat step four is until cover
Die station 2 completes to specify the catenary motion in the range of mask focusing and leveling sensor accurate measurement.
Step 6：Model is calculated：With two groups of least square fitting work stage grating scale and mask focusing and leveling sensor
The proportionality coefficient of data, the proportionality coefficient is vertical control parameter calibrator quantity (the mask focusing tune required by present method invention
Sensor proportionality coefficient to be calibrated).
Step 7：Work stage focusing is updated on the basis of the proportionality coefficient being calculated by the measurement data of work stage grating scale
The proportionality coefficient of leveling sensor.
Simply preferred embodiment of the invention described in this specification, above example is only used to illustrate the present invention
Technical scheme rather than limitation of the present invention.All those skilled in the art pass through logic analysis, reasoning under this invention's idea
Or the limited available technical scheme of experiment, all should be within the scope of the present invention.
Claims (4)
1. the vertical control parameter calibration method of a kind of litho machine, it is characterised in that：Comprise the following steps：
Step 1：Initialization work stage, mask platform, mask focusing and leveling sensor, coaxial alignment subsystem；
Step 2：Upload mask；
Step 3：Mask alignment mark is moved into coaxial alignment position；
Step 4：Mask platform is set to specify step-length catenary motion within the specified range, work stage follows mask platform to move；
Step 5：Record mask focusing and leveling sensor and work stage grating scale reading that each pacing is measured；Repeat step 4
Until mask platform completes the catenary motion in the specified range；
Step 6：Calculate work stage grating scale and two groups of proportionality coefficients of data of mask focusing and leveling sensor；
Step 7：More new mask focusing and leveling is passed on the basis of the proportionality coefficient being calculated by the measurement data of work stage grating scale
The proportionality coefficient of sensor；
The step 4 also comprises the following steps：
Step 4.1：Mask platform is with specified step-length catenary motion；
Step 4.2：Work stage follows mask platform to move according to the preferable position of focal plane that coaxial alignment search, measurement are obtained, and records
The contrast-data of each step；
Step 4.3：Numerical value according to work stage grating scale vertical position and contrast finds extreme point.
2. the vertical control parameter calibration method of litho machine as claimed in claim 1, it is characterised in that by by the work stage
Least square method high order fitting is made in grating scale vertical position with the numerical value of contrast, finds extreme point.
3. the vertical control parameter calibration method of litho machine as claimed in claim 1, it is characterised in that hanging down in the step 4
Determine according to mask focusing and leveling sensor accurate measurement scope to range of movement.
4. the vertical control parameter calibration method of litho machine as claimed in claim 1, it is characterised in that used in the step 6
Two groups of proportionality coefficients of data of least square fitting.
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| CN201410137059.5A CN104977809B (en) | 2014-04-08 | 2014-04-08 | A kind of vertical control parameter calibration method of litho machine |
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| CN201410137059.5A CN104977809B (en) | 2014-04-08 | 2014-04-08 | A kind of vertical control parameter calibration method of litho machine |
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| CN104977809A CN104977809A (en) | 2015-10-14 |
| CN104977809B true CN104977809B (en) | 2017-06-27 |
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| CN112444200B (en) * | 2019-08-28 | 2021-12-31 | 上海微电子装备（集团）股份有限公司 | Workbench equipment and method for measuring vertical zero clearing error of workbench |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW440749B (en) * | 1995-12-26 | 2001-06-16 | Toshiba Corp | Optical exposure apparatus of scanning exposure system and its exposing method |
| CN1476629A (en) * | 2000-11-22 | 2004-02-18 | 株式会社尼康 | Aligner, aligning method and method for fabricating device |
| CN101221368A (en) * | 2008-01-21 | 2008-07-16 | 上海微电子装备有限公司 | Real-time detecting and correcting device and method for position of object plane and image plane |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH07201713A (en) * | 1993-12-28 | 1995-08-04 | Sony Corp | Aligner and aligning method |
| JP2006279029A (en) * | 2005-03-01 | 2006-10-12 | Canon Inc | Method and device for exposure |
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2014
- 2014-04-08 CN CN201410137059.5A patent/CN104977809B/en active Active
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW440749B (en) * | 1995-12-26 | 2001-06-16 | Toshiba Corp | Optical exposure apparatus of scanning exposure system and its exposing method |
| CN1476629A (en) * | 2000-11-22 | 2004-02-18 | 株式会社尼康 | Aligner, aligning method and method for fabricating device |
| CN101221368A (en) * | 2008-01-21 | 2008-07-16 | 上海微电子装备有限公司 | Real-time detecting and correcting device and method for position of object plane and image plane |
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Address after: 201203 Shanghai Zhangjiang High Tech Park of Pudong New Area Zhang Road No. 1525 Patentee after: Shanghai microelectronics equipment (Group) Limited by Share Ltd Address before: 201203 Shanghai Zhangjiang High Tech Park of Pudong New Area Zhang Road No. 1525 Patentee before: Shanghai Micro Electronics Equipment Co., Ltd. |