CN104965395A - Fixed focusing device for photoetching direct-writing system - Google Patents
Fixed focusing device for photoetching direct-writing system Download PDFInfo
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- CN104965395A CN104965395A CN201510434693.XA CN201510434693A CN104965395A CN 104965395 A CN104965395 A CN 104965395A CN 201510434693 A CN201510434693 A CN 201510434693A CN 104965395 A CN104965395 A CN 104965395A
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Abstract
The invention discloses a fixed focusing device for a photoetching direct-writing system. The fixed focusing device comprises a fixed focusing assembly and a continuous focusing assembly, wherein an exposure light path sequentially penetrates through the fixed focusing assembly and the continuous focusing assembly to finish focusing; the fixed focusing assembly comprises a plurality of fixed thickness regions with different thicknesses; the thickness of the continuous focusing assembly can linearly change; the fixed focusing assembly is capable of changing the fixed thickness region through which the exposure light path penetrates; and the continuous focusing assembly is capable of changing the thickness of the position through which the exposure light path penetrates. By virtue of respective characteristics of the fixed focusing assembly and the continuous focusing assembly, the fixed focusing assembly is capable of fixedly changing the focusing amount within a large range when glass regions with different thicknesses are selected; the continuous focusing assembly is capable of realizing continuous focusing when corresponding to one glass thickness of the fixed focusing assembly; large-range continuous focusing can be realized when the fixed focusing assembly and the continuous focusing assembly are used together; and the fixed focusing device is reasonable in design and is convenient and fast in focusing.
Description
Technical field
The present invention relates to the straight write device field of mask-free photolithography in PCB printed circuit board industry, specifically provide the device that a kind of focal plane thick for different pcb board regulates.
Background technology
In mask-free photolithography straight-writing system, the focal plane of lithographic objective regulates the quality directly affecting photofabricated product.The focal depth range of usual lithographic objective is less, and the thickness of slab difference of printed circuit board (PCB) is usually far beyond focal depth range.Focusing module in current lithographic equipment many realizes function of focusing among a small circle, needs to select different backing plate to adjust focal plane when thickness of slab gap is larger.Like this, the printed circuit board (PCB) aborning for different size thickness of slab needs repeatedly to change backing plate back focusing, reduces production capacity, directly affects productivity effect.
Summary of the invention
For solving the problems of the technologies described above, the invention provides a kind of mixing focus control for photoetching write-through system, it comprises fixing focusing component and continuous focusing component, exposure light path completes focusing through described fixing focusing component and continuous focusing component successively, described fixing focusing component has the different fixed thickness region of some thickness, the thickness of described continuous focusing component can linear change, described fixing focusing component can change the fixed thickness region that described exposure light path passes, and described continuous focusing component can change the thickness of described exposure light path through position.
Preferably, described fixing focusing component comprises the trapezoidal sheet glass with multiple different fixed thickness, and described trapezoidal sheet glass completes exposure light path by left and right displacement and selects through the thickness of position.
Preferably, described continuous focusing component comprises the identical prism wedge of two pieces of angles of wedge, and the hypotenuse of described two prism wedges is parallel to each other, and described two prism wedges complete exposure light path along the displacement of hypotenuse parallel direction and change through the thickness of position.
Preferably, a position in described two prism wedges is fixed, displacement another complete exposure light path and change through the thickness of position.
Preferably, described trapezoidal sheet glass and prism wedge complete displacement by drive unit.
The present invention has following beneficial effect:
Present invention utilizes fixing focusing group and continuous focusing group feature separately, fixing focusing group can change focusing amount on a large scale when selecting the glassy zone of different-thickness internal fixtion, and focusing group can realize continuous focusing when correspondence fixes a certain thickness of glass of focusing group continuously, can realize focusing continuously on a large scale after both are used in combination, reasonable in design, focus convenient and swift.
Certainly, implement arbitrary product of the present invention might not need to reach above-described all advantages simultaneously.
Accompanying drawing explanation
In order to be illustrated more clearly in the technical scheme of the embodiment of the present invention, be briefly described describing the required accompanying drawing used to embodiment below, apparently, accompanying drawing in the following describes is only some embodiments of the present invention, for those of ordinary skill in the art, under the prerequisite not paying creative work, other accompanying drawing can also be obtained according to these accompanying drawings.
The mixing focus control structural representation for photoetching write-through system that Fig. 1 provides for the embodiment of the present invention.
Embodiment
Below in conjunction with the accompanying drawing in the embodiment of the present invention, be clearly and completely described the technical scheme in the embodiment of the present invention, obviously, described embodiment is only the present invention's part embodiment, instead of whole embodiments.Based on the embodiment in the present invention, those of ordinary skill in the art, not making other embodiments all obtained under creative work prerequisite, belong to the scope of protection of the invention.
As shown in Figure 1, embodiments provide a kind of mixing focus control for photoetching write-through system, it comprises fixing focusing component and continuous focusing component, exposure light path completes focusing through described fixing focusing component and continuous focusing component successively, described fixing focusing component has the different fixed thickness region of some thickness, the thickness of described continuous focusing component can linear change, described fixing focusing component can change the fixed thickness region that described exposure light path passes, and described continuous focusing component can change the thickness of described exposure light path through position.
Described fixing focusing component comprises the trapezoidal sheet glass 1 with multiple different fixed thickness, and trapezoidal sheet glass 1 completes exposure light path by left and right displacement and selects through the thickness of position.
Described continuous focusing component comprises the identical prism wedge of two pieces of angles of wedge, be respectively prism wedge 2 and lower prism wedge 3,, the hypotenuse of two prism wedges is parallel to each other, and two prism wedges complete exposure light path along the displacement of hypotenuse parallel direction and change through the thickness of position.
A position in two prism wedges described in the present embodiment is fixed, displacement another complete exposure light path and change through the thickness of position.On the present embodiment is fixing in focussing process, prism wedge 2 is motionless, allow lower prism wedge 3 along direction shown in left arrow along inclined-plane parallel motion, then focusing group continuously can change along the glass gross thickness of optical axis direction thereupon, and focal plane also can be corresponding to optical axis direction continuous moving, realizes focusing continuously.
The present embodiment, when reality is focused, moves trapezoidal sheet glass 1 according to the thickness of photofabricated product, selects thickness of glass region suitable in fixing focusing group, and then mobile lower prism wedge 3, realizes focusing on a large scale.Trapezoidal sheet glass 1 completes displacement with prism wedge 3 by drive unit.
Present invention utilizes fixing focusing group and continuous focusing group feature separately, fixing focusing group can change focusing amount on a large scale when selecting the glassy zone of different-thickness internal fixtion, and focusing group can realize continuous focusing when correspondence fixes a certain thickness of glass of focusing group continuously, can realize focusing continuously on a large scale after both are used in combination, reasonable in design, focus convenient and swift.
The disclosed preferred embodiment of the present invention just sets forth the present invention for helping above.Preferred embodiment does not have all details of detailed descriptionthe, does not limit the embodiment that this invention is only described yet.Obviously, according to the content of this instructions, can make many modifications and variations.This instructions is chosen and is specifically described these embodiments, is to explain principle of the present invention and practical application better, thus makes art technician understand well and to utilize the present invention.The present invention is only subject to the restriction of claims and four corner and equivalent.
Claims (5)
1. the mixing focus control for photoetching write-through system, it is characterized in that, comprise fixing focusing component and continuous focusing component, exposure light path completes focusing through described fixing focusing component and continuous focusing component successively, described fixing focusing component has the different fixed thickness region of some thickness, the thickness of described continuous focusing component can linear change, described fixing focusing component can change the fixed thickness region that described exposure light path passes, and described continuous focusing component can change the thickness of described exposure light path through position.
2. as claimed in claim 1 for the mixing focus control of photoetching write-through system, it is characterized in that, described fixing focusing component comprises the trapezoidal sheet glass with multiple different fixed thickness, and described trapezoidal sheet glass completes exposure light path by left and right displacement and selects through the thickness of position.
3. as claimed in claim 1 for the mixing focus control of photoetching write-through system, it is characterized in that, described continuous focusing component comprises the identical prism wedge of two pieces of angles of wedge, the hypotenuse of described two prism wedges is parallel to each other, and described two prism wedges complete exposure light path along the displacement of hypotenuse parallel direction and change through the thickness of position.
4., as claimed in claim 3 for the mixing focus control of photoetching write-through system, it is characterized in that, a position in described two prism wedges is fixed, displacement another complete exposure light path and change through the thickness of position.
5. the mixing focus control for photoetching write-through system as described in any one of claim 2-4, is characterized in that, described trapezoidal sheet glass and prism wedge complete displacement by drive unit.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510434693.XA CN104965395A (en) | 2015-07-21 | 2015-07-21 | Fixed focusing device for photoetching direct-writing system |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510434693.XA CN104965395A (en) | 2015-07-21 | 2015-07-21 | Fixed focusing device for photoetching direct-writing system |
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| Publication Number | Publication Date |
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| CN104965395A true CN104965395A (en) | 2015-10-07 |
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| CN201510434693.XA Pending CN104965395A (en) | 2015-07-21 | 2015-07-21 | Fixed focusing device for photoetching direct-writing system |
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Citations (9)
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|---|---|---|---|---|
| JPS61117831A (en) * | 1984-11-14 | 1986-06-05 | Hitachi Ltd | Focusing device |
| EP0378033A1 (en) * | 1988-12-30 | 1990-07-18 | ETAT FRANCAIS représenté par le Ministre des Postes, Télécommunications et de l'Espace | Process for setting up a photolithographic exposure machine |
| US6281966B1 (en) * | 1998-02-27 | 2001-08-28 | Canon Kabushiki Kaisha | Exposure apparatus and device manufacturing method |
| CN101126905A (en) * | 2007-09-19 | 2008-02-20 | 芯硕半导体（合肥）有限公司 | Direct-writing lithography device with focusing device |
| CN102778820A (en) * | 2012-08-17 | 2012-11-14 | 杭州士兰明芯科技有限公司 | Maskless graphic exposure system based on spatial light modulator |
| CN202975473U (en) * | 2012-11-08 | 2013-06-05 | 中国电子科技集团公司第十一研究所 | Optical focal plane compensating device based on three wedge prisms |
| CN103488062A (en) * | 2013-10-14 | 2014-01-01 | 天津芯硕精密机械有限公司 | Wedge-shaped prism focusing device capable of bidirectionally sliding |
| CN104238285A (en) * | 2014-09-10 | 2014-12-24 | 中国电子科技集团公司第四十五研究所 | Laser direct writing type photoetching system capable of dynamically focusing |
| CN104570624A (en) * | 2014-09-28 | 2015-04-29 | 江苏影速光电技术有限公司 | Focusing system for laser direct writing type lithography machine and control method thereof |
-
2015
- 2015-07-21 CN CN201510434693.XA patent/CN104965395A/en active Pending
Patent Citations (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61117831A (en) * | 1984-11-14 | 1986-06-05 | Hitachi Ltd | Focusing device |
| EP0378033A1 (en) * | 1988-12-30 | 1990-07-18 | ETAT FRANCAIS représenté par le Ministre des Postes, Télécommunications et de l'Espace | Process for setting up a photolithographic exposure machine |
| US6281966B1 (en) * | 1998-02-27 | 2001-08-28 | Canon Kabushiki Kaisha | Exposure apparatus and device manufacturing method |
| CN101126905A (en) * | 2007-09-19 | 2008-02-20 | 芯硕半导体（合肥）有限公司 | Direct-writing lithography device with focusing device |
| CN102778820A (en) * | 2012-08-17 | 2012-11-14 | 杭州士兰明芯科技有限公司 | Maskless graphic exposure system based on spatial light modulator |
| CN202975473U (en) * | 2012-11-08 | 2013-06-05 | 中国电子科技集团公司第十一研究所 | Optical focal plane compensating device based on three wedge prisms |
| CN103488062A (en) * | 2013-10-14 | 2014-01-01 | 天津芯硕精密机械有限公司 | Wedge-shaped prism focusing device capable of bidirectionally sliding |
| CN104238285A (en) * | 2014-09-10 | 2014-12-24 | 中国电子科技集团公司第四十五研究所 | Laser direct writing type photoetching system capable of dynamically focusing |
| CN104570624A (en) * | 2014-09-28 | 2015-04-29 | 江苏影速光电技术有限公司 | Focusing system for laser direct writing type lithography machine and control method thereof |
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