CN104923463A - Potassium dihydrogen phosphate (KDP) optical surface planarization method - Google Patents

Potassium dihydrogen phosphate (KDP) optical surface planarization method Download PDF

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CN104923463A
CN104923463A CN201510261654.4A CN201510261654A CN104923463A CN 104923463 A CN104923463 A CN 104923463A CN 201510261654 A CN201510261654 A CN 201510261654A CN 104923463 A CN104923463 A CN 104923463A
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kdp
time
optical
crystal
optical surface
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Inventor
蔡长龙
刘卫国
姬娇
刘欢
周顺
陈智利
秦文罡
惠迎雪
包强
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Xian Technological University
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Xian Technological University
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Abstract

The invention relates to a potassium dihydrogen phosphate (KDP) optical surface planarization method. According to an existing KDP crystal ultraprecision machining method, polishing solution is left on the surfaces of KDP crystals, and small ripples are generated on the surfaces of the KDP crystals, so that the optical surface quality of the KDP crystals is affected. KH2PO4 optical crystal materials turned and polished through a single-point diamond serve as the objected to be machined. The optical surface of the KH2PO4 optical crystal materias is coated with a polymer film through a self-rotation gluing method. A polymer layer with low surface roughness is formed on the surface of the KH2PO4 optical crystal materials after vacuum heat processing, and the upper surface of the polymer layer is a planarization surface. The polymer film which is good in mechanical performance, stable in property and low in surface roughness is formed on the surface of the KDP, the process is simple, the requirement for equipment is low, and the cost is low. A good planarization effect can be obtained on the optical surface of the KDP, and the application prospects are good.

Description

KDP optical surface flattening method
Technical field
the invention belongs to optical element surface planarization field, be specifically related to a kind of KDP optical surface flattening method.
Background technology
KDP crystal is potassium dihydrogen phosphate (KH 2pO 4) abbreviation of crystal.KDP crystal is a kind of very excellent non-linear optical crystal material, there is the features such as larger nonlinear optical coefficients, wider transmission region, excellent optical homogeneity and higher laser damage threshold, now be widely used in the high-tech areas such as laser frequency-doubling device, parametric oscillation, Electro-optical Modulation, PZT (piezoelectric transducer) and fast optical switch based, in inertial confinement fusion, KDP crystal is then used to optical frequency-doubling converter and electrooptical switching.But KDP crystal has easy deliquescence, fragility is high, to features such as variations in temperature are responsive, hardness is low, be extremely unfavorable for the processing of KDP crystal, therefore the polishing of KDP crystal, particularly the polishing of the KDP crystal of large scale high optical quality is very difficult.The ultraprecise processing method of current KDP crystal mainly contains Single point diamond turning o technology, Technique of Magnetorheological Finishing, ion beam etching polishing technology etc., but Technique of Magnetorheological Finishing at KDP plane of crystal remaining slurry, cannot be able to be removed.Single point diamond turning o technology then can produce Microscale waveness at KDP plane of crystal, affects the optical surface quality of KDP crystal.Ion beam direct etching polishing KDP plane of crystal then efficiency is low and cannot ensure surface quality.
Summary of the invention
The object of this invention is to provide a kind of KDP optical surface flattening method, can be formed on KDP surface a bed roughness low, without the polymer film of beauty defects, utilized in ion beam etching polishing technology.
The technical solution adopted in the present invention is:
KDP optical surface flattening method, is characterized in that:
Comprise the following steps:
With the KH after Single point diamond turning o polishing 2pO 4optical crystal material, as processing object, adopts the method for spin gluing at KH 2pO 4the optical surface coating one layer of polymeric film of optical crystal material, then at KH after vacuum heat 2pO 4optical crystal material surface forms the low polymeric layer of layer of surface roughness, and the upper surface of polymeric layer is planarized surface.
The coating adhesive of described polymer film selects BCB-1500 glue;
The condition of spin gluing is: slow-speed of revolution 500r/min ~ 600r/min, time 18s, high rotating speed 4000r/min ~ 5000r/min, time 50s ~ 60s;
The condition of vacuum heat is: temperature 50 C ~ 100 DEG C, time 4h ~ 38h, heating-up time 30min ~ 1h.
The coating adhesive of described polymer film selects BCB-700 glue;
The condition of spin gluing is: slow-speed of revolution 500r/min ~ 600r/min, time 18s, high rotating speed 2500r/min ~ 3000r/min, time 50s ~ 60s;
The condition of vacuum heat is: temperature 50 C ~ 100 DEG C, time 4h ~ 38h, heating-up time 30min ~ 1h.
The coating adhesive of described polymer film selects the dilution glue of BCB-700, and the volume ratio of glue and diluent n-butyl acetate is 2:1;
The condition of spin gluing is: slow-speed of revolution 500r/min ~ 600r/min, time 18s, high rotating speed 2000r/min ~ 3000r/min, time 50s ~ 60s;
The condition of vacuum heat is: temperature 50 C ~ 100 DEG C, time 4h ~ 38h, heating-up time 30min ~ 1h.
The present invention has the following advantages:
The present invention is using the KDP after Single point diamond turning o polishing as processing object, adopt the method for spin gluing at KDP optical surface coating one layer of polymeric film, form one deck satisfactory mechanical property, stable in properties, polymer film that surface roughness is low on KDP surface after vacuum heat, technical process is simple, low for equipment requirements, with low cost, good flattening effect can be obtained at KDP optical surface, and application prospect is considerable.
Accompanying drawing explanation
Fig. 1 for described in example 1 after single-point diamond pre-polish(ing), KDP crystal exemplar 1 optical surface roughness testing result before planarized, institute's use detecting instrument is Talysurf CCI-2000 non-contact surface contourgraph, and measurement category is 0.18 × 0.18mm.
Wherein:
A figure is the roughness measurement results after the gaussian filtering on KDP surface;
B figure is the three-dimensional appearance figure of KDP surface measurement point.
Fig. 2 is KDP crystal exemplar 1 optical surface roughness testing result after planarization.
Wherein:
A figure is the roughness measurement results after the gaussian filtering on KDP surface;
B figure is the three-dimensional appearance figure of KDP surface measurement point.
Fig. 3 for described in example 2 after single-point diamond pre-polish(ing), planarized before KDP crystal exemplar 2 optical surface roughness testing result, institute's use detecting instrument is Talysurf CCI-2000 non-contact surface contourgraph.
Wherein:
A figure is the roughness measurement results after the gaussian filtering on KDP surface;
B figure is the three-dimensional appearance figure of KDP surface measurement point.
Fig. 4 is KDP crystal exemplar 2 optical surface roughness testing result after planarization.
Wherein:
A figure is the roughness measurement results after the gaussian filtering on KDP surface;
B figure is the three-dimensional appearance figure of KDP surface measurement point.
Fig. 5 for described in example 3 after single-point diamond pre-polish(ing), planarized before KDP crystal exemplar 3 optical surface roughness testing result, institute's use detecting instrument is Talysurf CCI-2000 non-contact surface contourgraph.
Wherein:
A figure is the roughness measurement results after the gaussian filtering on KDP surface;
B figure is the three-dimensional appearance figure of KDP surface measurement point.
Fig. 6 is KDP crystal exemplar 3 optical surface roughness testing result after planarization.
Wherein:
A figure is the roughness measurement results after the gaussian filtering on KDP surface;
B figure is the three-dimensional appearance figure of KDP surface measurement point.
Fig. 7 for described in example 4 after single-point diamond pre-polish(ing), planarized before KDP crystal exemplar 4 optical surface roughness testing result, institute's use detecting instrument is Talysurf CCI-2000 non-contact surface contourgraph.
Wherein:
A figure is the roughness measurement results after the gaussian filtering on KDP surface;
B figure is the three-dimensional appearance figure of KDP surface measurement point.
Fig. 8 is KDP crystal exemplar 4 optical surface roughness testing result after planarization.
Wherein:
A figure is the roughness measurement results after the gaussian filtering on KDP surface;
B figure is the three-dimensional appearance figure of KDP surface measurement point.
Detailed description of the invention
Below in conjunction with detailed description of the invention, the present invention will be described in detail.
KDP optical surface flattening method involved in the present invention, Microscale waveness can be produced in order to solve Single point diamond turning o KDP plane of crystal and the problem of surface quality cannot be ensured with ion beam direct etching polishing KDP plane of crystal, and on the basis of Single point diamond turning o KDP crystal, at KDP plane of crystal coating one layer of polymeric film, surperficial Microscale waveness is covered, formed on KDP surface a bed roughness low, without the polymer film of beauty defects, utilized in ion beam etching polishing technology, specifically comprised the following steps:
With the KH after Single point diamond turning o polishing 2pO 4optical crystal material is as the processing object (KH after polishing 2pO 4optical crystal material surface roughness is at about 2nm), adopt the method for spin gluing at KH 2pO 4the optical surface coating one layer of polymeric film of optical crystal material, then at KH after vacuum heat 2pO 4optical crystal material surface formation one deck satisfactory mechanical property, stable in properties, the polymeric layer that surface roughness is low, the upper surface of polymeric layer is planarized surface.
(1) when the coating adhesive of described polymer film selects BCB-1500 glue:
The condition of spin gluing is: slow-speed of revolution 500r/min ~ 600r/min, time 18s, high rotating speed 4000r/min ~ 5000r/min, time 50s ~ 60s;
The condition of vacuum heat is: temperature 50 C ~ 100 DEG C, time 4h ~ 38h, heating-up time 30min ~ 1h.
(2) when the coating adhesive of described polymer film selects BCB-700 glue:
The condition of spin gluing is: slow-speed of revolution 500r/min ~ 600r/min, time 18s, high rotating speed 2500r/min ~ 3000r/min, time 50s ~ 60s;
The condition of vacuum heat is: temperature 50 C ~ 100 DEG C, time 4h ~ 38h, heating-up time 30min ~ 1h.
(3) coating adhesive of described polymer film selects the dilution glue of BCB-700, and the volume ratio of glue and diluent n-butyl acetate is 2:1:
The condition of spin gluing is: slow-speed of revolution 500r/min ~ 600r/min, time 18s, high rotating speed 2000r/min ~ 3000r/min, time 50s ~ 60s;
The condition of vacuum heat is: temperature 50 C ~ 100 DEG C, time 4h ~ 38h, heating-up time 30min ~ 1h.
The polymeric layer that said method is formed effectively can be covered KDP surface Microscale waveness, and this polymer film surface roughness is at about 1.2nm, through ion beam etching, surface effect can be delivered to KDP plane of crystal, thus can carry out Ultraprecise polished to KDP crystal.The proposition of this technical scheme is beneficial to based on ion beam etching polishing KDP crystal, compensate for the technological deficiency of Single point diamond turning o polishing and ion beam direct etching polishing KDP crystal.Its surface roughness can be reduced at ultra-smooth optical element surface coated polymer, because the polymer of coating has liquid fluidity, initial film is formed at element surface by the mode of rotary coating, due to the mobility of liquid, the initial film formed effectively can improve the element surface pattern that surface still exists defect, can form the stable media coating with good electrical and mechanical performance after solidification.Through repeatedly testing, planarization of the present invention effectively can improve the surface quality of KDP crystal optical surface, the chemical composition of KDP crystal and crystal composition structure can not be made to change, can not affect the optical property of original crystal.
Embodiment 1:
Comprise the following steps: first utilize Single point diamond turning o to be 50 × 50 × 10 mm to size 2iI class KDP crystal exemplar 1 carry out turnery processing, again using the exemplar 1 through Single point diamond turning o as processing object, the planarized glue of employing BCB-1500 carries out gluing on exemplar 1 surface planarized, planarized main technologic parameters controls: slow-speed of revolution 600r/min, time 18s, high rotating speed 5000r/min, time 60s, vacuum heat treatment temperature 80 DEG C, time 4h, heating-up time 1h.White light interferometer is adopted to measure exemplar 2 surface roughness, sweep limits is 0.18 × 0.18mm, exemplar 1 before planarized and planarized after roughness measurement results as depicted in figs. 1 and 2, from Fig. 1 and Fig. 2, after Single point diamond turning o, the surface roughness root mean square Sq of exemplar 1 is 2.2592 nm, and the surface roughness root mean square Sq of planarized rear exemplar 1 is 1.2759 nm.The present embodiment planarized after, the roughness value of KDP plane of crystal decreases, and surface roughness improves.
Embodiment 2:
Comprise the following steps: first utilize Single point diamond turning o to be 50 × 50 × 10 mm to size 2iI class KDP crystal exemplar 2 carry out turnery processing, again using the exemplar 2 through Single point diamond turning o as processing object, the planarized glue of employing BCB-1500 carries out gluing on exemplar 2 surface planarized, planarized main technologic parameters controls: slow-speed of revolution 600r/min, time 18s, high rotating speed 5000r/min, time 60s, vacuum heat treatment temperature 80 DEG C, time 4h, heating-up time 1h.White light interferometer is adopted to measure exemplar 2 surface roughness, sweep limits is 0.18 × 0.18mm, exemplar 2 before planarized and planarized after roughness measurement results as shown in Figure 3 and Figure 4, from Fig. 3 and Fig. 4, after Single point diamond turning o, the surface roughness root mean square Sq of exemplar 2 is 2.1014nm, and the surface roughness root mean square Sq of planarized rear exemplar 2 is 1.3291 nm.The present embodiment planarized after, the roughness value of KDP plane of crystal decreases, and surface roughness improves.
Embodiment 3:
Comprise the following steps: first utilize Single point diamond turning o to be 50 × 50 × 10 mm to size 2iI class KDP crystal exemplar 3, again using the exemplar 3 through Single point diamond turning o as processing object, the planarized glue adopting BCB-700 to dilute carries out gluing on exemplar 3 surface planarized, planarized main technologic parameters controls: slow-speed of revolution 600r/min, time 18s, high rotating speed 3000r/min, time 60s, vacuum heat treatment temperature 80 DEG C, time 4h, heating-up time 1h.White light interferometer is adopted to measure exemplar 3 surface roughness, sweep limits is 0.18 × 0.18mm, exemplar 3 before planarized and planarized after roughness measurement results as shown in Figure 5 and Figure 6, from Fig. 5 and Fig. 6, after Single point diamond turning o, exemplar 3 surface roughness root mean square Sq is 2.0266nm, and the surface roughness root mean square Sq of planarized rear exemplar 3 is 1.3118 nm.The present embodiment planarized after, the roughness value of KDP plane of crystal decreases, and surface roughness improves.
Embodiment 4:
Comprise the following steps: first utilize Single point diamond turning o to be 50 × 50 × 10 mm to size 2iI class KDP crystal exemplar 4, again using the exemplar 4 through Single point diamond turning o as processing object, the planarized glue adopting BCB-700 to dilute carries out gluing on exemplar 4 surface planarized, planarized main technologic parameters controls: slow-speed of revolution 600r/min, time 18s, high rotating speed 3000r/min, time 60s, vacuum heat treatment temperature 80 DEG C, time 4h, heating-up time 1h.White light interferometer is adopted to measure exemplar 4 surface roughness, sweep limits is 0.18 × 0.18mm, exemplar 4 before planarized and planarized after roughness measurement results as shown in Figure 7 and Figure 8, from Fig. 7 and Fig. 8, after Single point diamond turning o, exemplar 4 surface roughness root mean square Sq is 2.233nm, and the surface roughness root mean square Sq of planarized rear exemplar 4 is 1.2976 nm.The present embodiment planarized after, the roughness value of KDP plane of crystal decreases, and surface roughness improves.
Content of the present invention is not limited to cited by embodiment, and the conversion of those of ordinary skill in the art by reading description of the present invention to any equivalence that technical solution of the present invention is taked, is claim of the present invention and contains.

Claims (4)

1.KDP optical surface flattening method, is characterized in that:
Comprise the following steps:
With the KH after Single point diamond turning o polishing 2pO 4optical crystal material, as processing object, adopts the method for spin gluing at KH 2pO 4the optical surface coating one layer of polymeric film of optical crystal material, then at KH after vacuum heat 2pO 4optical crystal material surface forms the low polymeric layer of layer of surface roughness, and the upper surface of polymeric layer is planarized surface.
2. KDP optical surface flattening method according to claim 1, is characterized in that:
The coating adhesive of described polymer film selects BCB-1500 glue;
The condition of spin gluing is: slow-speed of revolution 500r/min ~ 600r/min, time 18s, high rotating speed 4000r/min ~ 5000r/min, time 50s ~ 60s;
The condition of vacuum heat is: temperature 50 C ~ 100 DEG C, time 4h ~ 38h, heating-up time 30min ~ 1h.
3. KDP optical surface flattening method according to claim 1, is characterized in that:
The coating adhesive of described polymer film selects BCB-700 glue;
The condition of spin gluing is: slow-speed of revolution 500r/min ~ 600r/min, time 18s, high rotating speed 2500r/min ~ 3000r/min, time 50s ~ 60s;
The condition of vacuum heat is: temperature 50 C ~ 100 DEG C, time 4h ~ 38h, heating-up time 30min ~ 1h.
4. KDP optical surface flattening method according to claim 1, is characterized in that:
The coating adhesive of described polymer film selects the dilution glue of BCB-700, and the volume ratio of glue and diluent n-butyl acetate is 2:1;
The condition of spin gluing is: slow-speed of revolution 500r/min ~ 600r/min, time 18s, high rotating speed 2000r/min ~ 3000r/min, time 50s ~ 60s;
The condition of vacuum heat is: temperature 50 C ~ 100 DEG C, time 4h ~ 38h, heating-up time 30min ~ 1h.
CN201510261654.4A 2015-05-21 2015-05-21 Potassium dihydrogen phosphate (KDP) optical surface planarization method Pending CN104923463A (en)

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105922083A (en) * 2016-04-28 2016-09-07 西安工业大学 Surface polishing method of monopotassium phosphate crystals
CN106835035A (en) * 2017-04-21 2017-06-13 西安工业大学 A kind of method of potassium dihydrogen phosphate crystalloid optical surface planarization

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102990480A (en) * 2012-12-19 2013-03-27 中国人民解放军国防科学技术大学 Optical component surface cleaning method based on ion beam polishing
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Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102990480A (en) * 2012-12-19 2013-03-27 中国人民解放军国防科学技术大学 Optical component surface cleaning method based on ion beam polishing
US20140205742A1 (en) * 2013-01-24 2014-07-24 Tokyo Electron Limited Real time process control of the polymer dispersion index

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
姬娇等: ""光学元件表面平坦化工艺研究"", 《中国真空学会2014学术年会论文摘要集》 *

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105922083A (en) * 2016-04-28 2016-09-07 西安工业大学 Surface polishing method of monopotassium phosphate crystals
CN105922083B (en) * 2016-04-28 2018-02-23 西安工业大学 The surface polishing method of potassium dihydrogen phosphate crystalloid
CN106835035A (en) * 2017-04-21 2017-06-13 西安工业大学 A kind of method of potassium dihydrogen phosphate crystalloid optical surface planarization
CN106835035B (en) * 2017-04-21 2019-01-18 西安工业大学 A kind of method of potassium dihydrogen phosphate crystalloid optical surface planarization

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