CN104903245B - Stress-free ozonated deionized water (DIO3) recirculation reclaim system and method - Google Patents
Stress-free ozonated deionized water (DIO3) recirculation reclaim system and method Download PDFInfo
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- 238000000034 method Methods 0.000 title claims description 52
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 title claims description 24
- 239000008367 deionised water Substances 0.000 title claims description 20
- 229910021641 deionized water Inorganic materials 0.000 title claims description 20
- 239000007788 liquid Substances 0.000 claims abstract description 249
- 239000003054 catalyst Substances 0.000 claims abstract description 228
- 239000007789 gas Substances 0.000 claims description 131
- 239000012530 fluid Substances 0.000 claims description 48
- 239000002912 waste gas Substances 0.000 claims description 17
- 239000004065 semiconductor Substances 0.000 claims description 14
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 claims description 13
- 238000004519 manufacturing process Methods 0.000 claims description 10
- 229910052756 noble gas Inorganic materials 0.000 claims description 10
- 229910052760 oxygen Inorganic materials 0.000 claims description 9
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 8
- AMWRITDGCCNYAT-UHFFFAOYSA-L hydroxy(oxo)manganese;manganese Chemical compound [Mn].O[Mn]=O.O[Mn]=O AMWRITDGCCNYAT-UHFFFAOYSA-L 0.000 claims description 8
- 239000001301 oxygen Substances 0.000 claims description 8
- 239000012535 impurity Substances 0.000 claims description 6
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 4
- 229910052799 carbon Inorganic materials 0.000 claims description 4
- 238000010438 heat treatment Methods 0.000 claims description 3
- 238000003825 pressing Methods 0.000 claims description 3
- WAEMQWOKJMHJLA-UHFFFAOYSA-N Manganese(2+) Chemical compound [Mn+2] WAEMQWOKJMHJLA-UHFFFAOYSA-N 0.000 claims description 2
- 238000006243 chemical reaction Methods 0.000 claims description 2
- 238000010790 dilution Methods 0.000 claims description 2
- 239000012895 dilution Substances 0.000 claims description 2
- 238000011084 recovery Methods 0.000 description 13
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 9
- 229910002092 carbon dioxide Inorganic materials 0.000 description 8
- 239000001569 carbon dioxide Substances 0.000 description 8
- 238000006385 ozonation reaction Methods 0.000 description 8
- 229910021642 ultra pure water Inorganic materials 0.000 description 7
- 239000012498 ultrapure water Substances 0.000 description 7
- 238000004140 cleaning Methods 0.000 description 5
- 238000007872 degassing Methods 0.000 description 4
- 238000005530 etching Methods 0.000 description 3
- 238000001802 infusion Methods 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000001259 photo etching Methods 0.000 description 2
- 229920002120 photoresistant polymer Polymers 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 238000005086 pumping Methods 0.000 description 2
- 239000002699 waste material Substances 0.000 description 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 238000001311 chemical methods and process Methods 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 230000003111 delayed effect Effects 0.000 description 1
- PUFKGWVZPFANLN-UHFFFAOYSA-N dioxomanganese oxocopper Chemical compound O=[Cu].O=[Mn]=O PUFKGWVZPFANLN-UHFFFAOYSA-N 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 238000005183 dynamical system Methods 0.000 description 1
- 239000000284 extract Substances 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 238000011049 filling Methods 0.000 description 1
- 239000013505 freshwater Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 238000004377 microelectronic Methods 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 238000004064 recycling Methods 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- 238000012552 review Methods 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 230000009897 systematic effect Effects 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- -1 unworn part) Chemical compound 0.000 description 1
Abstract
The present invention provides the system of a kind of recirculation ozonated liquid in one aspect.This system includes: catalyst, and catalyst includes at least two entrance and at least two outlet.The second liquid source of catalyst and the first-class body source of the first catalyst porch and the second catalyst porch fluidly connects, and the second catalyst entrance receives gas, the gas of the liquid that this gas clean-up receives from the first catalyst porch at least partially.The gas of this removing flows out catalyst in the first catalyst exit.The second liquid source in catalyst and the second catalyst exit fluidly connects, and at least one of liquid in this catalyst discharge catalyst, the liquid of discharge flows out catalyst in the second catalyst exit.Catalyst includes that the 3rd entrance fluidly connected with first liquid source, the 3rd entrance allow the liquid under first liquid source release ambient pressure.
Description
Technical field
Present invention relates generally to the device used in wet-cleaning semiconductor device, system and method.In particular it relates to such system, this system can purify, can recycled liquid can be from treating to remove liquid to be recycled undesirable gas.
Background technology
Microelectronic chip as such as integrated circuit is to manufacture from the wafer of relatively large semi-conducting material.This process generally includes multiple continuous print step, and these steps include the following: and produce etching mask by photoetching process；The material layer that etching is limited by mask；Photo etched mask is removed by certain combination of wet method and dry chemical techniques；Oxide layer was removed before being for further processing；Deposited material layer；And/or rinse to remove remaining chemicals.Photoetching process mask can be formed by the polymeric material of referred to as photoresist.After removing the mask of photoresist, generally carrying out last cleaning step, this step is referred to as rinses and/or wet-cleaning.In some systems, cleaning step also processes at other and applies between step.
Deionized water (the DIO that ozone processes3-water) it is used in semi-conductor industry well-known, such as, for wet clean process and/or the etching of tungsten layer because of it.But, DIO3It it not stable fluid.Such as, ozone can about 12 minutes half-life decay (depending on temperature, water chemistry etc.).Current system is generally by operation DIO3Constant flow solve this problem, the method had not only expended big but also had wasted.
Summary of the invention
It is one advantage of the present invention that, the cost relevant with running fluid delivery system (such as, processing) for wet wafer reduces.Another advantage is that, it may use that agranular pump (such as, centrifugal pump).Another advantage is that, it can supply continuous print DIO3Stream, it is less than current system wastes.Another advantage is that, the waste gas discharged from fluid delivery system can be secondary.Another advantage is that, a compact container can be used.
In one aspect, the present invention provides the system of recirculation ozonated liquid.This system includes that catalyst, catalyst include at least two entrance and at least two outlet.The second liquid source of catalyst and the first-class body source of the first catalyst porch and the second catalyst porch fluidly connects, and second catalyst entrance receive gas, the gas of the liquid that this gas clean-up receives at least some of from the first catalyst porch.The gas of this removing flows out catalyst in the first catalyst exit.The second liquid source in catalyst and the second catalyst exit fluidly connects, and this catalyst discharges the liquid at least some of catalyst, and the liquid of discharge flows out catalyst in the second catalyst exit.Catalyst includes that the 3rd entrance fluidly connected with first liquid source, the 3rd entrance allow the liquid under first liquid source release ambient pressure.
In certain embodiments, including at least partially by the second catalyst outlet from liquid at least some of of catalyst discharge of the liquid received in the first catalyst porch.
In certain embodiments, catalyst includes the 4th entrance fluidly connected with the 3rd fluid supply, and the 4th entrance receives fresh liquid from the 3rd fluid supply, and its replacement is at least some of from the liquid of catalyst discharge.
In certain embodiments, catalyst includes any cylinder, sheet-pile body or bubble cylinder tamped.
In certain embodiments, this system includes the first pump fluidly connected with catalyst, first pump fluidly connects with catalyst in the following manner: a) at least one entrance of the first pump fluidly connected with the second of catalyst the outlet, and b) the first delivery side of pump of fluidly connecting with second liquid source.
In certain embodiments, the first delivery side of pump is fluidly connected with catalyst by the 4th entrance of catalyst.
In certain embodiments, the first pump includes centrifugal pump.
In certain embodiments, this system includes that self-destruction parts, self-destruction parts include at least one entrance, and the entrance of these self-destruction parts and the outlet of the first catalyst fluidly connect.In certain embodiments, the entrance of self-destruction parts receives gas at least some of removed by catalyst.
In certain embodiments, with dry air (CDA) or other noble gas of cleaning, heat or be diluted in the gas that self-destruction parts first access point receives.
In certain embodiments, the gas of the removing that the outlet discharge of self-destruction parts receives at self-destruction component entry is at least some of.
In certain embodiments, measuring the gas flowing at self-destruction knockdown export, this information is for the control of system.
In certain embodiments, self-destruction parts use catalyst that the gas of reception is converted to oxygen, and discharge oxygen by the outlet of self-destruction parts.In certain embodiments, catalyst include following in any one: (i) product based on manganese oxide or (ii) product based on carbon.
In certain embodiments, (i) includes the deionized water (DIO of ozonisation from catalyst the second exit at any liquid that catalyst first access point receives or (ii) discharges3)。
In certain embodiments, the gas received at catalyst first access point includes: (i) O3, (ii) O2, (iii) CO2, (iv) N2, dry air (CDA) that (iv) cleans, (v) noble gas, (vi) impurity gas, (vii) waste gas, (viii) is from the waste gas in second liquid source, or their any combination.
In certain embodiments, the part of the gas removed from liquid includes: (i) O3, (ii) O2, (iii) CO2, or their any combination.In certain embodiments, the gas received at catalyst first access point is the waste gas from second liquid source.
In certain embodiments, first liquid source includes the instrument in semiconductor fabrication process.
In certain embodiments, measure the temperature of liquid, by heat exchanger or discard liquid and control temperature of liquid.
In certain embodiments, second liquid source includes DIO3Water delivery system.
On the other hand, the present invention includes the system of recirculation ozonated liquid.This system includes the first catalyst, first catalyst includes at least four entrance and at least two outlet, wherein, the first liquid source of the first catalyst and the first catalyst first access point fluidly connects, second entrance of the first catalyst receives gas, this gas clean-up carrys out the Part I of the gas of the liquid that comfortable first catalyst first access point receives, the gas removed flows out the first catalyst in first catalyst the first exit, in first catalyst discharge catalyst, liquid is at least some of, the liquid discharged flows out the first catalyst in first catalyst the second exit.This system also includes the second catalyst, second catalyst includes at least one entrance and at least one outlet, wherein, second catalyst fluidly connects with the first catalyst in the first exit of the second catalyst first access point and the second catalyst, first entrance of the second catalyst receives the liquid from first catalyst the first outlet, the Part II of the gas from liquid removed by second catalyst, first outlet release of the second catalyst has the liquid of the Part II of the gas of removing, 3rd entrance of the first catalyst by fluidly connecting with the first of the second catalyst the outlet, liquid is discharged into the first catalyst, and wherein, first catalyst includes the 4th entrance fluidly connected with first liquid source, 4th entrance of the first catalyst allows the liquid under first liquid source release ambient pressure.
On the other hand, the method that the present invention provides recirculation ozonated liquid.The method includes supplying liquids and gases to catalyst；With gas clean-up from gas at least some of of liquid；And the liquid from a catalyst discharge part.
In certain embodiments, liquid is fed to catalyst under ambient pressure.
In certain embodiments, the method includes at least some of supply of the liquid discharged from catalyst is returned to catalyst.
In certain embodiments, the method includes replacing at least some of of the liquid that gives off from catalyst with fresh liquid.
In certain embodiments, the method includes by first pump liquid pressing to giving off from catalyst.
In certain embodiments, the method includes removing at least one of gas from the first pump by the second pump.
In certain embodiments, the method includes heating with CDA or other noble gas or the gas of dilution removing.
In certain embodiments, the method includes the gas of removing is converted to O2.In certain embodiments, the method includes the gas of output conversion.In certain embodiments, the method includes that the gas measuring output gas flows and uses information for the control of system.
In certain embodiments, the method includes measuring the temperature of a liquid and/or by heat exchanger or abandon liquid and control temperature of liquid.
In certain embodiments, the liquid being fed to catalyst includes the deionized water (DIO of ozonisation3)。
In certain embodiments, gas is (i) O3, (ii) O2, (iii) CO2, (iv) N2, dry air (CDA) that (iv) cleans, (v) noble gas, (vi) impurity gas, (vii) waste gas, (viii) is from the waste gas in second liquid source, or their any combination.
In certain embodiments, the part of the gas cleared out of from liquid includes (i) O3, (ii) O2, (iii) CO2, or their any combination.
In certain embodiments, the tools supply that liquid is used from semiconductor fabrication process is to catalyst.
Accompanying drawing explanation
With reference to the description made below in conjunction with accompanying drawing, the advantage of the invention described above be may be better understood together with further advantage.Accompanying drawing is not necessarily to scale；It it is usually the principle focusing on explanation invention.
Figure 1A be according to illustrative embodiment of the present invention for recirculation and the schematic diagram of the system of withdrawal liquid (such as, the deionized water of ozonisation).
Figure 1B be according to illustrative embodiment of the present invention for recirculation and the schematic diagram of the system of withdrawal liquid (such as, the deionized water of ozonisation).
Fig. 2 A is flow chart, and the method for recycled liquid according to illustrative embodiment of the present invention is described.And
Fig. 2 B is flow chart, illustrate according to illustrative embodiment of the present invention for method to liquid degassing.
Detailed description of the invention
Systematic review
Usually, the present invention includes the system and method reclaiming and re-using the liquid discharged from instrument (such as, semiconductor technology manufactures instrument).Such as, the deionized water (DIO of ozonisation3) fluid delivery system can be to semiconductor fabrication process instrument offer DIO3.Semiconductor manufacturing tool discharges a part of DIO3(such as, unworn part), is caught this DIO again by recovery system3。
Usually, recovery system snubber contact device and pump (such as, centrifugal pump) is caught and the liquid of this discharge of recirculation again.Due to liquid can with no pressure (such as, be under ambient pressure), so, bubble can be avoided the occurrence of in any porch of fluid delivery system and pump.Before liquid recycle is returned to fluid delivery system by pump, recovery system can use catalyst to remove from the undesirable gas of the part in liquid.
Figure 1A illustrates the recirculation according to illustrated embodiment of the present invention and reclaims the system 100 of no pressure liquid (such as, the deionized water of the ozonisation under ambient pressure).From the point of view of summary, system so can be such as useful in using the semiconductor fabrication process with the instrument of no pressure liquid outlet.Current system would generally waste liquid, because current system is not any unnecessary liquid of draining, it is simply that can not the stress-free liquid of recirculation suitably.From the viewpoint of finance and economics and environment, it is possible to reclaim and the system of recirculation no pressure liquid is favourable.
System 100 includes first liquid source (such as, " instrument ") 110, second liquid source (such as, " fluid delivery system ") 120, and recovery system 140.
Instrument
In an illustrated embodiment, instrument 110 performs one or more semiconductor fabrication process (such as, etch or clean semiconductor wafer).In certain embodiments, instrument 110 can perform the other type of process about semiconductor manufacturing or other side.Instrument 110 includes the liquid inlet 111 fluidly connected with delivery system 120, and the liquid outlet 112,113 fluidly connected with recovery system 140.In certain embodiments, instrument 110 includes multiple instrument.In certain embodiments, instrument 110 includes any amount of entrance and/or outlet.
Fluid delivery system
Shown fluid delivery system 120 can produce fluid and deliver fluid (that is, liquid and/or gas) to instrument 110 and recovery system 140.Fluid delivery system 120 can receive the liquid of recovery from system 140, and this will be discussed further below.In certain embodiments, fluid delivery system 120 includes LIQUOZON system.
In an illustrated embodiment, fluid delivery system 120 includes: the liquid outlet 121 that (i) fluidly connects with instrument 110, (ii) liquid inlet 122 fluidly connected with recovery system 140, and the gas outlet 123 that (iii) fluidly connects with recovery system 140.Man skilled in the art recognizes, other embodiment can include more or less of such entrance and/or outlet.
In various embodiments, liquid is the deionized water (DIO of ozonisation3), deionized water (DI-water), ultra-pure water (UPW), hydrogen-fluoride (HF), acid, alkali, solvent, or their any combination.In various embodiments, gas is oxygen (O2), carbon dioxide (CO2), ozone (O3)、(N2) clean dry air (CDA), waste gas (such as, from fluid delivery system 110), or their any combination.Man skilled in the art recognizes, several examples of the liquids and gases that these citings simply can be produced by fluid delivery system 120 and be delivered, and other embodiments can include other gas and/or liquid, to replace gas discussed here and/or liquid, or add in them.
Recovery system
Usually, recovery system 140 reclaims the liquid discharged from instrument 110, to be recycled to fluid delivery system 120 and instrument 110.In an illustrated embodiment, recovery system 140 include snubber contact device (or " catalyst ") the 150, first pump 160, self-destruction parts the 170, second pump the 180, the 3rd fluid supply (or, " fresh liquid body source ") 185, and relevant valve V1-V8 and sensor 158,175.In certain embodiments, liquid is stress-free liquid.
Snubber contact device
Shown catalyst 150 is easy to recirculation and reclaims the no pressure liquid (such as, the liquid under ambient pressure) exported by instrument 110.Specifically, catalyst 150 (i), before liquid recycle returns to fluid delivery system 120 and instrument 110, removes harmful or gas not from liquid, and (ii) can allow the recirculation flow of system 100 manipulation change.The recirculation flow of this change can be manipulated by means of fluid cushion.The fresh water of catalyst (buffer) can be rich in the gas needed, such as, in order to allows to implement stable concentration in second liquid source 120 and controls.In an illustrated embodiment, catalyst 150 can be cylinder, cylinders or other suitable shape.Such as, catalyst 150 can be the cylinder of one or more filling, sheet-pile body, and/or bubble cylinder.
In an illustrated embodiment, catalyst 150 includes: (i) entrance 151-154, and (ii) outlet 155-157.Some embodiment can use greater or lesser number of entrance and/or outlet.Catalyst 150 is fluidly connected with instrument 110 by catalyst entrance 151,152.Specifically, entrance 151,152 receives liquid (such as, the DIO discharged in outlet 112,113 by instrument 110 respectively3).Liquid can be at (that is, no pressure) under ambient pressure.Can pass through separating liquid to catalyst 150 between two entrances 151,152, the no pressure of instrument 110 just can be maintained to export.Such as, this can prevent the swabbing in instrument 110 exit, and this phenomenon can cause the negative pressure interrupting flowing from the liquid of instrument 110.Two outlets 112 and 113 in first liquid source 110 may be connected to two entrances 151 and 152 of the discharge pipe line of catalyst 150.Discharge pipe line between tool outlet 112 and catalyst entrance 151 can be approximately 15mm.Discharge pipe line between tool outlet 113 and catalyst entrance 152 can be approximately 6.55mm.The discharge pipe line that discharge pipe line diameter group is 40mm in this length magnitude is cheap.
In an illustrated embodiment, catalyst 150 is fluidly connected with delivery system 120 by catalyst entrance 153.The outlet 123 of fluid delivery system 120 can supply the mixture of gas or gas to catalyst 150.The gas supplied by fluid delivery system 120 can be used to remove the gas of a part for liquid, such as ozone in catalyst 150.The gas of supply such as comprises the steps that (i) O3, (ii) O2, (iii) CO2, (iv) N2, dry air (CDA) that (iv) cleans, (v) noble gas, (vi) impurity gas, (vii) waste gas, (viii) is from the waste gas of fluid delivery system 120, or their any combination.
Catalyst 150 is fluidly connected with fresh liquid body source 185 by entrance 154.In an illustrated embodiment, fresh liquid body source 185 supplies fresh liquid to catalyst 150, such as, and ultra-pure water (UPW).The replaceable liquid discharged from catalyst 150 of this UPW, such as, is carried out recirculation by outlet 156, or is disposed by outlet 157.In certain embodiments, fresh liquid body source 185 can be a part for fluid delivery system 120.
Liquid stream from fresh liquid body source 185 can fluid level based on liquid level sensor 158, in this Sensor monitoring and/or control contactor 150.Liquid level sensor 158 such as guarantees that the liquid level in catalyst 150 is maintained in required liquid level (such as, the lowest or the highest).
Catalyst 150 is fluidly connected with self-destruction parts 170 by catalyst outlet 155.As above and be discussed below, before liquid recycle, can remove gas (such as, O that is harmful or that do not want from the liquid in catalyst 1503).In an illustrated embodiment, gas (such as, the O of removing3) export 155 entrances 171 being discharged into self-destruction parts 170 from catalyst.
Self-destruction parts
At least some of (such as, the ozone) of the gas given off from catalyst 150 is converted to the second gas (such as, oxygen) by shown self-destruction parts 170.Harmful or the gas not that self-destruction parts 170 can will be discharged from catalyst 150, is converted to the gas such as can being discharged into safely in surrounding by outlet 172.In an illustrated embodiment, self-destruction parts 170 use one or more catalyst (such as, with manganese oxide (such as, the carulite of some carbon-based product added)) effectively the gas (such as, ozone) removed to be converted to the second gas (such as, oxygen).
Centrifugal pump
The first shown pump 160 extracts liquid to make recirculation by outlet 156 from catalyst 150, and can be to liquid pressing, such as, in order to use to instrument 110.A part for liquid additionally can be pumped into fluid delivery system the 120, second pump 180 by pump 160, and/or returns to catalyst 150.In an illustrated embodiment, the first pump 160 is centrifugal pump, but it can be other type of pump (such as, membrane pump etc.) in other embodiments.Connect: (i) connects catalyst 150 by pump intake 161 and pump discharge 162 pump 160 and following component fluidic, (ii) connected with fluid delivery system 120 by pump discharge 162, and alternatively (iii) is connected with the second pump 180 by pump discharge 162,163.
Liquid infusion pump
The second shown pump 180 is with pressurization DIO in a small amount3Run, to remove gas (such as, CO from the first pump 1602), such as, it is enriched with gas in avoiding pump 160.Alternatively, the second pump 180 can replace DIO with CDA3Run.In an illustrated embodiment, the second pump 180 is liquid infusion pump.Some embodiment can use other type of pump, or abandons the second pump completely.
Heat exchanger
Usually, in pump 150, temperature of liquid circulates along with pump 160 and raises.In order to maintain recovery system 140 and whole system 100 suitably to run, liquid is positively retained in certain temperature window (such as, 20 to 24 DEG C).In certain embodiments, heat exchanger is used to keep temperature of liquid (such as, in temperature required window).Heat exchanger can be in parallel with the second pump 180.In other embodiments, the temperature of liquid is maintained by discharging a part of hot liquid from pump 160.
Valve
In an illustrated embodiment, valve V1-V8 controls between all parts of system 100 or parts self are interior gas and liquid flowing.Such as, valve V1-V8 can include following any one: any valve known to two-way valve, check-valves, pilot valve, flow restrictor, regulation valve, Controlled valve, man skilled in the art, and/or their any combination.Although there is shown valve V1-V8, but man skilled in the art recognizes that some embodiment can use more or less so valve.
Sensor
System 140 can include multiple sensor, such as liquid level (note: refer to liquid level for liquid, refers to gas position or gas level for gas, the most same) sensor 158 and gas flowmeter 175.Sensor 158 can be used to monitor and/or the liquid in control contactor 150 and/or the liquid level of gas.Shown gas flowmeter 175 monitors by self-destruction parts 170 by exporting the flow of 172 expellant gas.This information can be used for the control of system.Such as, gas flowmeter 175 may detect to change than liquid level sensor 158 and reacts the change in volume of catalyst content liquid quickly.Such as, owing to liquid is by the slow drip of catalyst 150, the change of liquid level may be delayed.Information from gas flowmeter 175 can allow preferably dynamical system to control with system stability such as to guarantee that enough liquid is supplied to second liquid source 120.Liquid level sensor 158 can provide the instruction of lower state liquid level.
Other sensor (not shown) also can be used to monitor and/or control gas and the parameter of the flow of liquid or pressure etc in such as system 140 other parts.
Second catalyst
In certain embodiments, the second catalyst is used for from liquid removing gas not further.Figure 1A be according to illustrated embodiment of the present invention for recirculation and the system schematic 102 of withdrawal liquid (such as, the deionized water of ozonisation).Second catalyst 190 fluidly connects with the first catalyst 150, pump 160, pump the 180, the 3rd fluid supply 185, second liquid source 122 and liquid level 191.
Second catalyst 190 receives the liquid from the first catalyst 150 by outlet 156 at the second catalyst 190 first entrance 193, and this liquid has the Part I of the gas not cleared out of by the first catalyst 150.Pump 180 and valve V9 can act as vacuum action, to allow the liquid from the first controller 150 to flow to the second catalyst 190.
Second catalyst 190 accepts the liquid (such as, ultra-pure water) from the 3rd fluid supply 185 at the second catalyst entrance 194.The Part II of not gas removed from liquid by second catalyst 190.Second catalyst 190 has the liquid extracted out by pump 160 from outlet 192.The Part I of the liquid flowing out the second catalyst 190 flows into second liquid source 120 by entrance 122.The Part II of the liquid flowing out the second catalyst 190 is passed back in catalyst 150 by entrance 154.
Second catalyst 190 connects with liquid level 191.Liquid level 191 can detect the fluid level in the second catalyst 190.
Fig. 2 A and 2B is flow chart, it is shown that according to example embodiment shown in the present invention for recirculation and the demonstration methods of withdrawal liquid.For the purpose of illustration, recirculation and degassing are respectively indicated as two separate flow charts in Fig. 2 A and Fig. 2 B.Although all steps are discussed in specific order, but man skilled in the art recognizes, all steps can also be without same order and perform, or relative to a figure or two figures, perform with other step simultaneously.
Method for recycling
Specifically, Fig. 2 A is flow chart, it is shown that according to the method for the demonstration recirculation of illustrated embodiment of the present invention.
In step 200, liquid (such as, DIO3) it is fed to first liquid source (such as, the instrument 110 as described in figure 1 above A) from second liquid source (such as, the fluid delivery system 120 as described in figure 1 above A).For example, referring to Figure 1A, liquid can be fed to instrument entrance 111 by fluid delivery system outlet 121.
In step 210, catalyst (such as, the catalyst 150 as described in figure 1 above A) receives from first liquid source (such as, the catalyst entrance 151,152 as described in figure 1 above A) and is in the liquid under ambient pressure.Such as, by allowing the gas flowing out catalyst entrance 152 by exporting 113 from first liquid source 110 to liquid outlet 112, this ambient pressure can be kept.Such as, this structure keeps consistent flowing to control in first liquid source, and prevents from forming negative pressure in its any exit.
In a step 220, a part for the liquid that catalyst discharge receives from first liquid source.Specifically, the first pump (such as, the centrifugal pump 160 as described in figure 1 above A) is from catalyst (such as, exporting 156 by the catalyst as described in figure 1 above A) pumping liquid.The liquid of discharge can be pressurizeed by the first pump, as shown in step 230.
When in the first pump, liquid is in circulation, liquid absorbs the electric energy being used for running the first pump, thus, raises the temperature of liquid.In order to keep continuous print recirculation, to monitor and control temperature of liquid, as shown in step 240.In certain embodiments, heat exchanger (such as, the heat exchanger as described in figure 1 above A) is used for guaranteeing that liquid is maintained in the running temperature of license (such as, 20 to 24 DEG C).Adding or substitute and use heat exchanger, the liquid of part heat can be drained from the first pump, in order to keeps suitable temperature window.
Not disturbing it to run in order to ensure the gas formed in the first pump, available selectable second pump (such as, the liquid infusion pump 180 as described in figure 1 above A) removes gas, from the first pump as shown in step 250.
In step 260, the liquid discharged from catalyst is substituted with the fresh liquid (such as, UPW) from the 3rd fluid supply (such as, the 3rd fluid supply 185 as described in figure 1 above A).Owing to fresh liquid may not contain the gas (such as, ozone) of necessity, so, the waste gas from fluid delivery system can be fed to catalyst, in order to keep constant or gas (such as, the ozone) concentration of substantial constant wherein.
Liquid level in catalyst is monitored, from the flow rates controlled of the 3rd fluid supply, with liquid level optimal in guaranteeing catalyst by sensor (such as, the liquid level sensor 158 as described in figure 1 above A).The linear flow of fresh liquid can be had from the 3rd fluid supply to catalyst.
In step 270, the first pump is by a part of liquid pumping to fluid delivery system 120 (such as, at the entrance 122 as described in figure 1 above A), and a part of liquid returns to catalyst.In certain embodiments, before fresh liquid contactor (such as, as described in figure 1 above A by entrance 154) receives, the liquid being pumped back to catalyst mixes with the fresh liquid from the 3rd fluid supply.From a part of liquid and the mixing of fresh liquid of the first pump, such as, it can be ensured that in catalyst, liquid maintains suitable gas (such as, ozone) level, because fresh liquid can not contain the gas required.
Degassing method
Specifically, Fig. 2 B is flow chart, it is shown that demonstration degassing method according to an embodiment of the invention.
In step 300, catalyst (such as, the catalyst 150 as described in figure 1 above A) receives one or more gases from second liquid source (such as, the fluid delivery system 120 as described in figure 1 above A) in catalyst porch.For example, referring to Figure 1A, gas can be fed to catalyst entrance 153 from fluid delivery system outlet 123.One or more gases may is that (i) O3, (ii) O2, (iii) CO2, (iv) N2, dry air (CDA) that (iv) cleans, (v) noble gas, (vi) impurity gas, (vii) waste gas, (viii) is from the waste gas in second liquid source, or their any combination.
In the step 310, the gas of reception liquid from catalyst removes the gas (such as, ozone) that a part is harmful or does not wants.Such as, due to the different partial pressures of that do not want in liquid or harmful gas, so gas can be eliminated.The gas removed is discharged into self-destruction parts (such as, the self-destruction parts 170 as described in figure 1 above A) from catalyst, as shown in step 320.For example, referring to Figure 1A, the gas of removing can be discharged into self-destruction component entry 171 from catalyst outlet 155.Alternatively, the gas of removing can be heated and/or dilute with CDA or other noble gas, such as, to reduce the dew point of gas, thus, prevents or reduce the condensation in self-destruction parts 170, as shown in step 330.
In step 340, the gas (such as, ozone) removed is converted to the second gas (such as, oxygen) by self-destruction parts.As described in figure 1 above A, self-destruction parts can use one or more catalyst (such as, with the manganese oxide of some additional carbon-based product) that the gas of removing is converted to the second gas.Then second gas by the outlet of self-destruction parts, discharge in a secured manner or be discharged in surrounding, as shown in step 350.For example, referring to Figure 1A, the second gas can be discharged by self-destruction knockdown export 172.
In step 360, the gas flowing at self-destruction knockdown export is measured.This measurement can be used for the control of system.For example, referring to Figure 1A, gas flowmeter 175 can measure the gas flowing of at self-destruction knockdown export 172.
Man skilled in the art is it will be appreciated that for content described here can various changes can be made, amendment and other embodiment, without departing from the spirit and scope of the present invention.Therefore, the present invention is not limited solely to the description of property described above.
Claims (39)
1. a system for recirculation ozonated liquid, this system includes:
Catalyst, catalyst includes at least two entrance and at least two outlet, and described catalyst is first
Catalyst porch with include the first liquid source of instrument and in the second catalyst porch and second liquid source
Fluidly connecting, and described second catalyst entrance receives gas, this gas clean-up comes comfortable described first and connects
Gas at least some of of the described ozonated liquid that tentaculum porch receives, and described ozonated liquid is come
From the described instrument in described first liquid source, the gas of this removing is connecing described in the first catalyst exit outflow
Tentaculum,
Wherein, described catalyst fluidly connects with described second liquid source in the second catalyst exit,
In this catalyst described catalyst of discharge, the ozonated liquid of described removing is at least some of, the liquid of discharge
Described catalyst is flowed out to be fed to be connected to described the of described instrument in described second catalyst exit
Two fluid supplies, and
Wherein, described catalyst includes the 3rd entrance fluidly connected with described first liquid source, and this is years old
Three entrances allow the described ozonated liquid under described first liquid source release ambient pressure.
2. the system as claimed in claim 1, it is characterised in that receive in described first catalyst porch
The including at least partially of liquid: export, by described second catalyst, the liquid discharged from described catalyst
At least some of.
3. the system as claimed in claim 1, it is characterised in that described catalyst includes and the 3rd fluid supply
The 4th entrance fluidly connected, the 4th entrance receives fresh liquid from the 3rd fluid supply, and it is replaced from institute
State liquid at least some of that catalyst is discharged.
4. the system as claimed in claim 1, it is characterised in that described catalyst includes any post tamped
Body, sheet-pile body or bubble cylinder.
5. the system as claimed in claim 1, it is characterised in that this system also includes with catalyst fluidly
First pump of connection, the first pump fluidly connects with catalyst in the following manner: pass through a) to connect with described
At least one entrance of the first pump that described second outlet of tentaculum fluidly connects, and b) with described the
Described first delivery side of pump that two fluid supplies fluidly connect.
6. system as claimed in claim 5, it is characterised in that the described outlet of described first pump is by institute
The 4th entrance stating catalyst fluidly connects with described catalyst.
7. system as claimed in claim 5, it is characterised in that described first pump includes centrifugal pump.
8. the system as claimed in claim 1, it is characterised in that this system also includes self-destruction parts, described
Self-destruction parts include at least one entrance, the described entrance of these self-destruction parts and described first catalyst outlet stream
The connection of body ground.
9. system as claimed in claim 8, it is characterised in that the described entrance of described self-destruction parts receives
The gas removed by described catalyst at least some of.
10. system as claimed in claim 9, it is characterised in that with CDA or other noble gas, heating
Or the gas that the described first access point being diluted in described self-destruction parts receives.
11. systems as claimed in claim 9, it is characterised in that the described outlet of described self-destruction parts is discharged
Gas at least some of in the removing that porch described in described self-destruction parts receives.
12. systems as claimed in claim 11, it is characterised in that measure exit described in described self-destruction parts
Gas flowing, this information is for the control of system.
13. systems as claimed in claim 11, it is characterised in that described self-destruction parts use catalyst by
The gas received is converted to oxygen, and discharges oxygen by the described outlet of described self-destruction parts.
14. systems as claimed in claim 13, it is characterised in that described catalyst include following in any
One: (i) product based on manganese oxide or (ii) product based on carbon.
15. the system as claimed in claim 1, it is characterised in that (i) enters described in described catalyst first
Received at Kou or (ii) is included ozone from any liquid of the second exit discharge described in described catalyst
Deionized water (the DIO changed3)。
16. the system as claimed in claim 1, it is characterised in that at described second entrance of described catalyst
The gas that place receives includes: (i) O3, (ii) O2, (iii) CO2, (iv) N2, (iv) cleans
Dry air (CDA), (v) noble gas, (vi) impurity gas, (vii) waste gas, (viii)
From the waste gas in second liquid source, or their any combination.
17. the system as claimed in claim 1, it is characterised in that the institute of the gas removed from described liquid
State part to include: (i) O3, (ii) O2, (iii) CO2, or their any combination.
18. systems as claimed in claim 17, it is characterised in that at described second entrance of described catalyst
The described gas that place receives is the waste gas from described second liquid source.
19. the system as claimed in claim 1, it is characterised in that described instrument is used for semiconductor fabrication process
In.
20. the system as claimed in claim 1, it is characterised in that measure the temperature of liquid, pass through heat exchange
Device or discard liquid to control temperature of liquid.
21. the system as claimed in claim 1, it is characterised in that described second liquid source includes DIO3Water is passed
Send system.
22. systems as claimed in claim 5, it is characterised in that also include with following in any one fluidly
Second pump of connection: described the first of (i) described first pump exports, or the second of (ii) described first pump goes out
Mouthful.
23. the system as claimed in claim 22, it is characterised in that described second pump includes syringe pump.
The system of 24. 1 kinds of recirculation ozonated liquid, this system includes:
First catalyst, described first catalyst includes that at least four entrance and at least two export, wherein,
Described first catalyst fluidly connects with first liquid source at first access point described in described first catalyst,
Described second entrance of described first catalyst receives gas, and this gas clean-up carrys out comfortable described first catalyst
The Part I of gas of described ozonated liquid that receives of described first access point, the gas of removing is in institute
Described first catalyst is flowed out in described first exit stating the first catalyst, and institute discharged by described first catalyst
Stating ozonated liquid at least some of of described removing in the first catalyst, the ozonated liquid of discharge exists
Described first catalyst is flowed out in described second exit of described first catalyst；And
Second catalyst, described second catalyst includes that at least one entrance exports with at least one, wherein,
Described second catalyst fluidly connects with described first catalyst at the first access point of described second catalyst
Logical, described first entrance of described second catalyst receives described second outlet from described first catalyst
The ozonated liquid of discharge, the of the gas from the ozonated liquid discharged removed by described second catalyst
Two parts, the described first outlet release of described second catalyst has the institute of the Part II of the gas of removing
State ozonated liquid, and be discharged into described first catalyst by the 3rd entrance of described first catalyst, with
And
Wherein, described first catalyst includes the 4th entrance fluidly connected with described first liquid source,
Described 4th entrance of described first catalyst allows the liquid under described first liquid source release ambient pressure.
The method of 25. 1 kinds of recirculation ozonated liquid, the method includes:
To catalyst supply (i) from the ozonated liquid of instrument and (ii) gas；
At least some of of the gas from described ozonated liquid is removed by catalyst with described gas；
A part for the ozonated liquid of described removing is discharged from described catalyst；And
By the ozonated liquid of the described discharge from described catalyst be fed at least partially connect
Fluid delivery system in described instrument.
26. methods as claimed in claim 25, it is characterised in that described liquid is fed under ambient pressure
Described catalyst.
27. methods as claimed in claim 25, it is characterised in that also include to discharge from described catalyst
At least some of supply of described liquid returns to described catalyst.
28. methods as claimed in claim 25, it is characterised in that also include replacing from described with fresh liquid
The liquid that catalyst gives off at least some of.
29. methods as claimed in claim 25, it is characterised in that also include being connect from described by the first pump
The described liquid pressing given off in tentaculum.
30. methods as claimed in claim 29, it is characterised in that also include by the second pump from the first pump
Remove at least some of of gas.
31. methods as claimed in claim 25, it is characterised in that also include with CDA or other indifferent gas
The gas that body heating or dilution are removed.
32. methods as claimed in claim 25, it is characterised in that also include being converted to the gas of removing
O2。
33. methods as claimed in claim 32, it is characterised in that also include the gas exporting described conversion.
34. methods as claimed in claim 33, it is characterised in that also include the gas measuring described output gas
Body flows and uses this information for the control of system.
35. methods as claimed in claim 25, it is characterised in that also include measuring the temperature of a liquid and/or passing through
Heat exchanger or abandon liquid to control temperature of liquid.
36. methods as claimed in claim 25, it is characterised in that the liquid being fed to catalyst includes ozone
Deionized water (the DIO changed3)。
37. methods as claimed in claim 25, it is characterised in that described gas is (i) O3, (ii) O2,
(iii)CO2, (iv) N2, dry air (CDA) that (iv) cleans, (v) noble gas, (vi)
Impurity gas, (vii) waste gas, (viii) is from the waste gas in second liquid source, or their any combination.
38. methods as claimed in claim 25, it is characterised in that the part of the gas cleared out of from liquid
Including (i) O3, (ii) O2, (iii) CO2, or their any combination.
39. methods as claimed in claim 25, it is characterised in that described instrument is used in semiconductor fabrication process
In.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610982023.6A CN106395954B (en) | 2012-11-08 | 2013-11-04 | The recycling recovery system of the ozonated deionized water (DIO3) of no pressure |
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201261724006P | 2012-11-08 | 2012-11-08 | |
| US61/724,006 | 2012-11-08 | ||
| US13/836,842 US9056262B2 (en) | 2012-11-08 | 2013-03-15 | Pressure-less ozonated Di-water (DIO3) recirculation reclaim system |
| US13/836,842 | 2013-03-15 | ||
| PCT/US2013/068304 WO2014074455A1 (en) | 2012-11-08 | 2013-11-04 | Pressure-less ozonated d i -water (di03) recirculation reclaim system and method |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201610982023.6A Division CN106395954B (en) | 2012-11-08 | 2013-11-04 | The recycling recovery system of the ozonated deionized water (DIO3) of no pressure |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN104903245A CN104903245A (en) | 2015-09-09 |
| CN104903245B true CN104903245B (en) | 2016-11-30 |
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