CN104877634A - Grinding medium containing cleaning and brightening chemical components for mechanical polishing and preparation method - Google Patents
Grinding medium containing cleaning and brightening chemical components for mechanical polishing and preparation method Download PDFInfo
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- CN104877634A CN104877634A CN201510339193.8A CN201510339193A CN104877634A CN 104877634 A CN104877634 A CN 104877634A CN 201510339193 A CN201510339193 A CN 201510339193A CN 104877634 A CN104877634 A CN 104877634A
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- mechanical polishing
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- cleaning blast
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Abstract
The invention discloses a grinding medium containing cleaning and brightening chemical components for mechanical polishing and a preparation method, and relates to mechanical polishing. The grinding medium containing the cleaning and brightening chemical components for the mechanical polishing comprises the following raw material compositions in percentage by weight: 45-55 percent of unsaturated resin 191, 0.8-1 percent of promoter, 0.5-1.2 percent of curing agent, 38-45 percent of aluminum oxide, 2-5 percent of sodium dodecyl benzene sulfonate, 0.8-1 percent of sodium lauryl sulfate and 2-5 percent of polyethylene glycol 2000, wherein the total amount is 100 percent. The preparation method comprises the following steps: adding the unsaturated resin 191 and the aluminum oxide powder into a stirring barrel to stir; then adding the sodium dodecyl benzene sulfonate, the sodium lauryl sulfate, the polyethylene glycol 2000 and the promoter to stir; adding a curing agent; stirring and then pouring into a mold; vibrating, standing, demolding, and pouring out to obtain the grinding medium. Chemical additives are not required to be added, so the production cost can be reduced, and the polishing effect and the working efficiency are improved.
Description
Technical field
The present invention relates to mechanical polishing, especially relate to one and contain cleaning blast Chemical Composition grinding medium and preparation method thereof for mechanical polishing.
Background technology
Existing traditional mechanical polishing method, at oscillating mill, workpiece is dropped in the mechanical means such as eddy current light polishing machine, add grinding block (grinding medium) again, water and chemical additive, after starting machinery, workpiece and medium, water and additive constantly mix rolling resistance, reach the object of polishing.The shortcoming of the method must add chemical additive in addition, and not only operation is loaded down with trivial details, and addition is not easy to grasp, and causes polishing effect not good, or waste material increases cost.
Summary of the invention
The object of the invention is to the shortcoming existed for existing mechanical polishing method, one is provided not need to add chemical additive, can reduce production cost, raising polishing effect and containing for mechanical polishing of working efficiency clean blast Chemical Composition grinding medium and preparation method thereof.
Describedly contain cleaning blast Chemical Composition grinding medium raw material by mass percentage for mechanical polishing and consist of:
Described unsaturated polyester 191 referred to as UPR, belong to thermosetting resin, the product originating from Changzhou Huari New Material Co., Ltd. can be adopted.
Described promotor can adopt benzoyl peroxide etc.
Described solidifying agent can adopt xylidine etc.
Described aluminum oxide can adopt granular size to be 800-1000 object 800#-1000# aluminum oxide, its effect is thrown for the fine grinding essence of workpiece, if use the alumina product that order number is larger instead, then there is higher cutting force, overlap use is played in the rough polishing deburring being applicable to workpiece, and 800#-1000# aluminum oxide can adopt the product originating from Zhengzhou Yi Yang Aluminum company limited.
Described Macrogol 2000 refers to that molecular weight is the polyoxyethylene glycol of 2000, can adopt the product originating from Jiangsu Hai'an Petrochemical Plant.
It is described that to contain the preparation method of cleaning blast Chemical Composition grinding medium for mechanical polishing as follows:
Unsaturated polyester 191 and aluminum oxide powder are joined in agitation vat, stir, add Sodium dodecylbenzene sulfonate, sodium laurylsulfate, Macrogol 2000, promotor again, stir, finally add solidifying agent, after stirring, pour in mould, vibration, leave standstill, the demoulding is poured out, and obtains and contains cleaning blast Chemical Composition grinding medium for mechanical polishing.
The described standing time can be 4 ~ 5h.
The present invention does not need to add chemical additive, can reduce production cost, improves polishing effect and working efficiency.
Embodiment
The present invention is further illustrated for following examples.
Embodiment 1
It is described that to contain the preparation method of cleaning blast Chemical Composition grinding medium for mechanical polishing as follows:
Unsaturated polyester 191 and aluminum oxide powder are joined in agitation vat, stir, add Sodium dodecylbenzene sulfonate, sodium laurylsulfate, Macrogol 2000, promotor again, stir, finally add solidifying agent, after stirring, pour in mould, vibration, after leaving standstill 4 ~ 5h, the demoulding is poured out, and obtains and contains cleaning blast Chemical Composition grinding medium for mechanical polishing.
Describedly contain cleaning blast Chemical Composition grinding medium raw material in mass ratio for mechanical polishing and consist of:
Embodiment 2
Similar to Example 1, contain cleaning blast Chemical Composition grinding medium raw material in mass ratio for mechanical polishing described in its difference is and consist of:
Embodiment 3
Similar to Example 1, contain cleaning blast Chemical Composition grinding medium raw material in mass ratio for mechanical polishing described in its difference is and consist of:
Embodiment 4
Similar to Example 1, contain cleaning blast Chemical Composition grinding medium raw material in mass ratio for mechanical polishing described in its difference is and consist of:
Embodiment 5
Similar to Example 1, contain cleaning blast Chemical Composition grinding medium raw material in mass ratio for mechanical polishing described in its difference is and consist of:
Claims (9)
1. contain cleaning blast Chemical Composition grinding medium for mechanical polishing, it is characterized in that its raw material by mass percentage consists of:
2. contain cleaning blast Chemical Composition grinding medium for mechanical polishing as claimed in claim 1, it is characterized in that described unsaturated polyester 191 adopts the product originating from Changzhou Huari New Material Co., Ltd..
3. contain cleaning blast Chemical Composition grinding medium for mechanical polishing as claimed in claim 1, it is characterized in that described promotor is benzoyl peroxide.
4. contain cleaning blast Chemical Composition grinding medium for mechanical polishing as claimed in claim 1, it is characterized in that described solidifying agent is xylidine.
5. contain cleaning blast Chemical Composition grinding medium for mechanical polishing as claimed in claim 1, it is characterized in that described aluminum oxide adopts granular size to be 800 ~ 1000 object 800#-1000# aluminum oxide.
6. contain cleaning blast Chemical Composition grinding medium for mechanical polishing as claimed in claim 5, it is characterized in that described 800#-1000# aluminum oxide adopts the product originating from Zhengzhou Yi Yang Aluminum company limited.
7. contain cleaning blast Chemical Composition grinding medium for mechanical polishing as claimed in claim 1, it is characterized in that described Macrogol 2000 refers to that molecular weight is the polyoxyethylene glycol of 2000, adopt the product originating from Jiangsu Hai'an Petrochemical Plant.
8. contain the preparation method of cleaning blast Chemical Composition grinding medium as claimed in claim 1 for mechanical polishing, it is characterized in that its concrete steps are as follows:
Unsaturated polyester 191 and aluminum oxide powder are joined in agitation vat, stir, add Sodium dodecylbenzene sulfonate, sodium laurylsulfate, Macrogol 2000, promotor again, stir, finally add solidifying agent, after stirring, pour in mould, vibration, leave standstill, the demoulding is poured out, and obtains and contains cleaning blast Chemical Composition grinding medium for mechanical polishing.
9. contain the preparation method of cleaning blast Chemical Composition grinding medium as claimed in claim 8 for mechanical polishing, it is characterized in that the described standing time is 4 ~ 5h.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510339193.8A CN104877634A (en) | 2015-06-18 | 2015-06-18 | Grinding medium containing cleaning and brightening chemical components for mechanical polishing and preparation method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510339193.8A CN104877634A (en) | 2015-06-18 | 2015-06-18 | Grinding medium containing cleaning and brightening chemical components for mechanical polishing and preparation method |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN104877634A true CN104877634A (en) | 2015-09-02 |
Family
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201510339193.8A Pending CN104877634A (en) | 2015-06-18 | 2015-06-18 | Grinding medium containing cleaning and brightening chemical components for mechanical polishing and preparation method |
Country Status (1)
| Country | Link |
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| CN (1) | CN104877634A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106147708A (en) * | 2016-06-30 | 2016-11-23 | 安徽智博新材料科技有限公司 | A kind of simple ceramic disk vibropolish abrasive material |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101134294A (en) * | 2007-09-21 | 2008-03-05 | 浙江工业大学 | Sphericity part fixed abrasive lapping method |
| CN101225281A (en) * | 2007-12-17 | 2008-07-23 | 河南省联合磨料磨具有限公司 | Polishing film and method for making same |
| CN101525400A (en) * | 2009-03-16 | 2009-09-09 | 南京工业大学 | Low-loss unsaturated polyester composite water jet abrasive and preparation method thereof |
| CN103555272A (en) * | 2013-09-25 | 2014-02-05 | 沈阳建筑大学 | Preparation of high wear resistant polishing abrasive by modified ultrafine alumina |
| CN104493734A (en) * | 2014-12-23 | 2015-04-08 | 广东奔朗新材料股份有限公司 | Latent curing epoxy resin binder diamond grinding tool and preparation method thereof |
-
2015
- 2015-06-18 CN CN201510339193.8A patent/CN104877634A/en active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101134294A (en) * | 2007-09-21 | 2008-03-05 | 浙江工业大学 | Sphericity part fixed abrasive lapping method |
| CN101225281A (en) * | 2007-12-17 | 2008-07-23 | 河南省联合磨料磨具有限公司 | Polishing film and method for making same |
| CN101525400A (en) * | 2009-03-16 | 2009-09-09 | 南京工业大学 | Low-loss unsaturated polyester composite water jet abrasive and preparation method thereof |
| CN103555272A (en) * | 2013-09-25 | 2014-02-05 | 沈阳建筑大学 | Preparation of high wear resistant polishing abrasive by modified ultrafine alumina |
| CN104493734A (en) * | 2014-12-23 | 2015-04-08 | 广东奔朗新材料股份有限公司 | Latent curing epoxy resin binder diamond grinding tool and preparation method thereof |
Non-Patent Citations (1)
| Title |
|---|
| 郑武城，等: "《光学化工辅料》", 30 April 1985 * |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106147708A (en) * | 2016-06-30 | 2016-11-23 | 安徽智博新材料科技有限公司 | A kind of simple ceramic disk vibropolish abrasive material |
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| PB01 | Publication | ||
| EXSB | Decision made by sipo to initiate substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| RJ01 | Rejection of invention patent application after publication |
Application publication date: 20150902 |
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| RJ01 | Rejection of invention patent application after publication |