CN104849958B - A kind of semi-transparent half hides panel, touch panel and preparation method thereof and display device - Google Patents
A kind of semi-transparent half hides panel, touch panel and preparation method thereof and display device Download PDFInfo
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- CN104849958B CN104849958B CN201510290853.8A CN201510290853A CN104849958B CN 104849958 B CN104849958 B CN 104849958B CN 201510290853 A CN201510290853 A CN 201510290853A CN 104849958 B CN104849958 B CN 104849958B
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Abstract
The embodiment of the present invention provides a kind of semi-transparent half and hides panel, touch panel and preparation method thereof and display device, is related to field of display technology, solves the phenomenon that irregular colour in white touch panel.This method comprises: negativity white photoresist and the transparent photoresist of positivity are respectively coated on substrate, white photoresist layer and positivity photoresist layer are formed；First time exposure is carried out to the positivity photoresist layer, forms the first photoresist pattern after the photoresist of exposure area is removed after development, wherein is covered with unexposed white photoresist under the first photoresist pattern；Black photoresist is coated on the first photoresist pattern and the white photoresist being exposed, forms black photoresist layer；Second is carried out to the black photoresist layer to expose, the white photoresist layer and the first photoresist pattern covered under the black photoresist layer covered on the first photoresist pattern, the first photoresist pattern is removed after development, forms lightproof area.This method can be applied in the manufacturing process of touch panel.
Description
Technical field
The present invention relates to field of display technology, more particularly to a kind of semi-transparent half screening panel, touch panel and preparation method thereof
And display device.
Background technique
OGS (One Glass Solution, monolithic glass formula) touch panel hides semi-transparent half and is directly formed on panel
Conductive film and sensor make semi-transparent half to hide panel while playing a dual role of protecting internal structure glass and touch sensing.
Wherein, semi-transparent half screening panel plate can be specifically divided into according to the color of lightproof area: the black semi-transparent half made using black color blocking
Panel is hidden, and hides panel using the white semi-transparent half of white color blocking production.
Semi-transparent for white half hides panel, as shown in Figure 1, white photoresist 02 is provided on glass substrate 01, due to white
The OD value of photoresist is lower, therefore, in order to meet shading requirement, needs to cover one layer of black light in the upper surface of white photoresist 02
Resistance 03 covers color meeting pastiness after upper black photoresist 03, this requires white photoresists but if white photoresist 02 is relatively thin behind
02 is thick as far as possible.
But when the white photoresist 02 of formation is thicker, after first time exposure development, the trapezoidal white that will form
Photoresist 02, in this way, black photoresist 03 is coated on trapezoidal white photoresist 02, after second of exposure development, due to black
Photoresist 03 accumulates in the edge of white photoresist 02, therefore the black photoresist 03 of 02 edge of white photoresist is difficult to wash by development
Fall, thus cause the problem of white 02 edge of photoresist remains black photoresist 03, and then causes semi-transparent half to hide on panel
The phenomenon that irregular colour.
Summary of the invention
The embodiment of the present invention provides a kind of semi-transparent half and hides panel, touch panel and preparation method thereof and display device,
Solves the phenomenon that white semi-transparent half hides irregular colour on panel.
In order to achieve the above objectives, the embodiment of the present invention adopts the following technical scheme that
The embodiment of the present invention provides a kind of semi-transparent half production method for hiding panel, comprising:
Negativity white photoresist and the transparent photoresist of positivity are respectively coated on substrate, forms white photoresist layer and positivity photoresist
Layer；
First time exposure is carried out to the positivity photoresist layer, forms the first light after the photoresist of exposure area is removed after development
Hinder pattern, wherein unexposed white photoresist is covered under the first photoresist pattern；
Black photoresist is coated on the first photoresist pattern and the white photoresist being exposed, forms black photoresist layer；
Second is carried out to the black photoresist layer to expose, and the black covered on the first photoresist pattern is removed after development
The white photoresist layer and the first photoresist pattern covered under photoresist layer, the first photoresist pattern forms lightproof area.
Further, the being negative property of black photoresist.
Further, second is carried out to the black photoresist layer to expose, removed on the first photoresist pattern after development
The white photoresist layer and the first photoresist pattern covered under the black photoresist layer of covering, the first photoresist pattern is formed
Lightproof area, comprising:
Described second is carried out to the black photoresist layer expose, remove after development and cover on the first photoresist pattern
Black photoresist；
By developing process and stripping technology, the unexposed white photoresist is removed, and by the first photoresist pattern
It is removed with the unexposed white photoresist, forms lightproof area in the substrate.
Further, on substrate after the white photoresist of coating, further includes:
The white photoresist layer is carried out soft roasting.
Further, black photoresist is coated on the first photoresist pattern and the white photoresist being exposed, forms black
After photoresist layer, further includes:
The black photoresist layer is carried out soft roasting.
Further, second of exposure is being carried out to the black photoresist layer, the first photoresist pattern is removed after development
The white photoresist layer and the first photoresist pattern covered under the black photoresist layer of upper covering, the first photoresist pattern, shape
After lightproof area, further includes:
Insulating layer is formed on the black photoresist and transmission region of reservation.
The embodiment of the present invention also provides a kind of semi-transparent half and hides panel, and the semi-transparent half screening panel is semi-transparent by any of the above-described
Half production method for hiding panel is made.
In addition, the embodiment of the present invention provides a kind of production method of touch panel, and after forming the insulating layer, institute
State method further include:
Production touches driving electrodes, separates with the touch driving electrodes to form capacitor therebetween on the insulating layer
The touch sensible electrode of switching node and the touch sensible electrode is coupled to measure capacitance variations at capacitive coupling node
Touch control sensing circuit.
Correspondingly, the embodiment of the present invention also provides a kind of touch panel, the touch panel is by above-mentioned touch panel
Production method is made.
Further, the embodiment of the present invention also provides a kind of display device, including above-mentioned touch panel.
The embodiment of the present invention provides a kind of semi-transparent half and hides panel, touch panel and preparation method thereof and display device,
Negativity white photoresist and the transparent photoresist of positivity are respectively coated on substrate, forms white photoresist layer and positivity photoresist layer；In turn, right
Positivity photoresist layer carries out first time exposure, and since photoresist is positivity in positivity photoresist layer, and therefore white being negative property of photoresist exposes
The photoresist in light region is removed after development, and the first photoresist pattern is formed after unexposed photoetching adhesive curing, at this point, the
Unexposed white photoresist is covered under one photoresist pattern, and the white photoresist in the first unlapped region of photoresist pattern is exposed
Light；In this way, coating black photoresist on the first photoresist pattern and the white photoresist being exposed, black photoresist layer is formed；And to black
Coloured light resistance layer carries out second and exposes, and the black photoresist layer covered on the first photoresist pattern is removed after development, at this point, due to first
The white photoresist covered under photoresist pattern is unexposed, and white being negative property of photoresist, therefore, unexposed white photoresist after development
It is removed, the first photoresist pattern and white photoresist removing remove therewith, are finally formed on substrate by the white photoresist after exposing
With the lightproof area for the black photoresist composition being covered on white photoresist, it can be seen that covered on removing the first photoresist pattern
Black photoresist layer when, be not in the black light covered on the first photoresist pattern since the thickness of the first photoresist pattern is smaller
Resistance layer is difficult to the problem of removing of developing, and more will not remain the black photoresist that do not wash off in the edge of white photoresist, and then not
While increasing exposure frequency, solves the phenomenon that white semi-transparent half hides irregular colour in panel.
Detailed description of the invention
In order to more clearly explain the embodiment of the invention or the technical proposal in the existing technology, to embodiment or will show below
There is attached drawing needed in technical description to be briefly described, it should be apparent that, the accompanying drawings in the following description is only this
Some embodiments of invention for those of ordinary skill in the art without creative efforts, can be with
It obtains other drawings based on these drawings.
Fig. 1 is the structural schematic diagram of semi-transparent half screening panel in the prior art；
Fig. 2 is the flow diagram that one kind semi-transparent half that the embodiment of the present invention provides hides the production method of panel；
Fig. 3 is the structural schematic diagram one that one kind provided in an embodiment of the present invention semi-transparent half hides panel；
Fig. 4 is the structural schematic diagram two that one kind provided in an embodiment of the present invention semi-transparent half hides panel；
Fig. 5 is the structural schematic diagram three that one kind provided in an embodiment of the present invention semi-transparent half hides panel；
Fig. 6 is a kind of structural schematic diagram one of mask plate provided in an embodiment of the present invention；
Fig. 7 is a kind of structural schematic diagram two of mask plate provided in an embodiment of the present invention；
Fig. 8 is the structural schematic diagram four that one kind provided in an embodiment of the present invention semi-transparent half hides panel；
Fig. 9 is the structural schematic diagram five that one kind provided in an embodiment of the present invention semi-transparent half hides panel；
Figure 10 is the structural schematic diagram six that one kind provided in an embodiment of the present invention semi-transparent half hides panel；
Figure 11 is a kind of structural schematic diagram three of mask plate provided in an embodiment of the present invention.
Specific embodiment
In being described below, for illustration and not for limitation, propose such as specific system structure, interface, technology it
The detail of class, to understand thoroughly the present invention.However, it will be clear to one skilled in the art that there is no these specific
The present invention also may be implemented in the other embodiments of details.In other situations, omit to well-known device, circuit and
The detailed description of method, in case unnecessary details interferes description of the invention.
In addition, term " first ", " second " are used for descriptive purposes only and cannot be understood as indicating or suggesting relative importance
Or implicitly indicate the quantity of indicated technical characteristic.Define " first " as a result, the feature of " second " can be expressed or
Implicitly include one or more of the features.In the description of the present invention, unless otherwise indicated, the meaning of " plurality " is two
It is a or more than two.
The embodiment of the present invention provides a kind of semi-transparent half production method for hiding panel, as shown in Figure 2, comprising:
101, negativity white photoresist and the transparent photoresist of positivity are respectively coated on substrate, forms white photoresist layer and positivity light
Resistance layer.
Specifically, as shown in figure 3, the white photoresist of negativity and the transparent photoresist of positivity, shape are respectively coated on substrate 01
At white photoresist layer 11 and the positivity photoresist layer 12 on the white photoresist layer 11.
Wherein, photoresist can be divided into positivity photoresist and negativity photoresist, and the part that light is shone in positivity photoresist can be dissolved in photoresist
Developer solution, the part without shining light will not be dissolved in photoresist developer solution；Correspondingly, the part for shining light in negativity photoresist will not
It is dissolved in photoresist developer solution, the part without shining light can be dissolved in photoresist developer solution.
In addition, coating negativity white photoresist on substrate 01, is formed after white photoresist layer 11, white light can also be hindered
Layer 11 carries out soft roasting (Soft bake), so that the solvent evaporative removal in white photoresist layer 11, and then in white photoresist layer 11
Upper coating positive photoresist forms positivity photoresist layer 12, increases the adhesive force between white photoresist layer 11 and positivity photoresist layer 12.
It should be noted that substrate 01 can be specially glass substrate, or the flexibility pasted on the glass substrate is saturating
Bright substrate.Moreover, it should it is clear that, semi-transparent half be related in the embodiment of the present invention hides panel, refers to by certain area
The panel of the transmission region of lightproof area and certain area composition, also, the present invention is to the area of lightproof area and transmission region
Size is not intended to be limited in any.
102, first time exposure is carried out to positivity photoresist layer, forms the first light after the photoresist of exposure area is removed after development
Hinder pattern, wherein unexposed white photoresist is covered under the first photoresist pattern.
As shown in figure 4, in a step 102, the is carried out to the positivity photoresist layer 12 formed in step 101 using mask plate 31
Single exposure, since the photoresist in positivity photoresist layer 12 is positivity, the photoresist of exposure area becomes after illumination can
Molten substance forms the first photoresist pattern 13 after development after the photoresist of removal exposure area.
At this point, as shown in figure 5, due to white the being negative property of photoresist in white photoresist layer 11, in white photoresist layer 11
The region 21 not being exposed is covered by the first photoresist pattern 13, and the white photoresist in the region dissolves in photoresist developer solution, and
The region 22 being exposed in white photoresist layer 11 is not covered with.
Optionally, when making the semi-transparent half screening panel in touch panel, since lightproof area is generally arranged at semi-transparent half
Surrounding or the both ends of panel are hidden, it is thereby possible to select mask plate 31 as shown in Figure 6, wherein black is opaque area
Domain, white is transmission region, in this way, transmission region to be arranged in the surrounding of mask plate 311, make on substrate 01 with transmission region pair
The white photoresist answered is exposed.Or mask plate 31 as shown in Figure 7 is selected, transmission region is arranged in mask plate 31
Both ends, equally make on substrate 01 it is corresponding with transmission region white photoresist be exposed.
Certainly, semi-transparent half set-up mode for hiding lightproof area in panel is not limited thereto, such as: it can be only by substrate 01
Some edge be set as lightproof area, other regions are transmission region, and the present invention is not limited in any way this.
103, black photoresist is coated on the first photoresist pattern and the white photoresist being exposed, and forms black photoresist layer.
As shown in figure 8, by step 103, the white light that is exposed in the first photoresist pattern 13 and white photoresist layer 11
Black photoresist is coated in resistance, forms black photoresist layer 14.At this point, the black photoresist of coating can be positivity black photoresist, it can also
To be negativity black photoresist, the embodiment of the present invention is not intended to be limited in any this.
In addition, coating black photoresist on substrate 01, formed after black photoresist layer 14, it can also be to black photoresist layer 14
Carry out soft roasting (Soft bake) so that the solvent evaporative removal in black photoresist layer 14, and then increase black photoresist layer 14 with
Adhesive force between first photoresist pattern 13.
104, second is carried out to black photoresist layer to expose, the black photoresist covered on the first photoresist pattern is removed after development
The white photoresist layer and the first photoresist pattern covered under layer, the first photoresist pattern forms lightproof area.
As shown in figure 9, at step 104, second is carried out to the black photoresist layer 14 formed in step 103 and is exposed, this
When, it, can be directly using the mask plate 31 in step 102, in identical bits when in black photoresist layer 14 being the resistance of negativity black light
It sets and second of exposure is carried out to black photoresist layer 14, at this point, the black photoresist being exposed is covered on the white photoresist being exposed,
And unexposed black photoresist is covered on the first photoresist pattern 13.
At this point, since the part for shining light in negativity photoresist will not be dissolved in photoresist developer solution, the part without shining light
Photoresist developer solution can be dissolved in, and be respectively overlay in the first about 13 photoresist pattern black photoresist and white photoresist it is unexposed,
Therefore, after the development of photoresist developer solution, the black photoresist covered on the first photoresist pattern 13 can be removed, meanwhile, it can be with
Remove the white photoresist covered under the first photoresist pattern 13, so make the first photoresist pattern 13 respectively with white photoresist layer 11 and black
Coloured light resistance layer 14 is removed, and finally, is formed as shown in Figure 10 semi-transparent half and is hidden panel, wherein the semi-transparent half screening panel includes by protecting
The lightproof area of white photoresist layer 11 and black photoresist layer 14 composition stayed.
Or it when in black photoresist layer 14 being the resistance of positivity black light, can be used and transmission region in mask plate 31
The mask plate 32 (as shown in figure 11) that is reversed with light tight region, so that unexposed black photoresist is covered on and is exposed
On white photoresist, and the black photoresist being exposed is covered on the first photoresist pattern 13.
At this point, since the part for not shining light in negativity photoresist can be dissolved in photoresist developer solution, and shone in positivity photoresist
The part of light can be dissolved in photoresist developer solution, and positivity black photoresist can absorb the light of exposure, therefore, expose journey by control
Degree, the black photoresist being covered on the first photoresist pattern 13 are exposed, and dissolve in photoresist developer solution, and are covered on the first photoresist figure
White photoresist under case 13 is unexposed, also dissolves in photoresist developer solution, therefore, still can pass through above-mentioned developing process and removing
Technique forms as shown in Figure 10 semi-transparent half and hides panel.
As can be seen that pass through above-mentioned steps 101-104, since black photoresist layer being coated on the first photoresist pattern 13,
And first photoresist pattern 13 thickness it is smaller, therefore, the black photoresist covered on the first photoresist pattern 13 can all pass through
Developing process is washed off, and there is no accumulating in the edge of white photoresist due to black light resistance, and then is difficult to wash off white photoresist side
The problem of black photoresist at edge, correspondingly, provided in an embodiment of the present invention semi-transparent half production method for hiding panel, it can be not
While increasing exposure frequency, disposable removal is covered on the black photoresist and white photoresist of the first about 13 photoresist pattern, no
Black photoresist can be remained in the edge of the white photoresist of reservation, and then improve the color homogeneity of white touch panel.
Correspondingly, the production method for hiding panel based on above-mentioned semi-transparent half, the embodiment of the present invention also provide a kind of such as Figure 10
Shown in semi-transparent half hide panel, semi-transparent half to hide panel be made by above-mentioned steps 101-104 for this.
Further, the embodiment of the present invention also provides a kind of production method of touch panel, above-mentioned steps 104 it
Afterwards, further includes:
105, insulating layer is formed on the black photoresist and transmission region of reservation.
Specifically, can be formed on the transmission region on substrate as shown in Figure 10 and the region for remaining with black photoresist exhausted
Edge layer.
106, production touches driving electrodes, separates with the touch driving electrodes to be formed therebetween on the insulating layer
The touch sensible electrode of capacitive coupling node and the touch sensible electrode is coupled to measure capacitor at capacitive coupling node
The touch control sensing circuit of variation.
Wherein, the transmission region that the touch driving electrodes and touch sensible electrode are hidden with semi-transparent half on panel is corresponding, should
The lightproof area that touch control sensing circuit is hidden with semi-transparent half on panel is corresponding, ultimately forms white OGS touch panel.
Correspondingly, the production method based on above-mentioned touch panel, the embodiment of the present invention also provides a kind of touch panel, should
Touch panel is made by above-mentioned steps 101-106.
Further, the embodiment of the invention also provides a kind of display devices comprising above-mentioned touch panel.Wherein, institute
Stating display device can be with are as follows: liquid crystal display panel, Electronic Paper, oled panel, mobile phone, tablet computer, television set, display, notebook
Any products or components having a display function such as computer, Digital Frame, navigator.
The embodiment of the present invention provides a kind of semi-transparent half and hides panel, touch panel and preparation method thereof and display device,
Negativity white photoresist and the transparent photoresist of positivity are respectively coated on substrate, forms white photoresist layer and positivity photoresist layer；In turn, right
Positivity photoresist layer carries out first time exposure, and since photoresist is positivity in positivity photoresist layer, and therefore white being negative property of photoresist exposes
The photoresist in light region is removed after development, and the first photoresist pattern is formed after unexposed photoetching adhesive curing, at this point, the
Unexposed white photoresist is covered under one photoresist pattern, and the white photoresist in the first unlapped region of photoresist pattern is exposed
Light；In this way, coating black photoresist on the first photoresist pattern and the white photoresist being exposed, black photoresist layer is formed；And to black
Coloured light resistance layer carries out second and exposes, and the black photoresist layer covered on the first photoresist pattern is removed after development, at this point, due to first
The white photoresist covered under photoresist pattern is unexposed, and white being negative property of photoresist, therefore, unexposed white photoresist after development
It is removed, the first photoresist pattern and white photoresist removing remove therewith, are finally formed on substrate by the white photoresist after exposing
With the lightproof area for the black photoresist composition being covered on white photoresist, it can be seen that covered on removing the first photoresist pattern
Black photoresist layer when, be not in the black light covered on the first photoresist pattern since the thickness of the first photoresist pattern is smaller
Resistance layer is difficult to the problem of removing of developing, and the black photoresist to wash off will not be more remained in the edge of white photoresist, and then not
While increasing exposure frequency, solves the phenomenon that white semi-transparent half hides irregular colour in panel.
In the description of this specification, particular features, structures, materials, or characteristics can be real in any one or more
Applying can be combined in any suitable manner in example or example.
The above description is merely a specific embodiment, but scope of protection of the present invention is not limited thereto, any
Those familiar with the art in the technical scope disclosed by the present invention, can easily think of the change or the replacement, and should all contain
Lid is within protection scope of the present invention.Therefore, protection scope of the present invention should be based on the protection scope of the described claims.
Claims (9)
1. a kind of semi-transparent half production method for hiding panel characterized by comprising
Negativity white photoresist and the transparent photoresist of positivity are respectively coated on substrate, form white photoresist layer and is located at the white light
Positivity photoresist layer on resistance layer；
First time exposure is carried out to the positivity photoresist layer, forms the first photoresist figure after the photoresist of exposure area is removed after development
Case, wherein unexposed white photoresist is covered under the first photoresist pattern；
Black photoresist is coated on the first photoresist pattern and the white photoresist being exposed, forms black photoresist layer；
Second is carried out to the black photoresist layer to expose, and the black photoresist covered on the first photoresist pattern is removed after development
The white photoresist layer and the first photoresist pattern covered under layer, the first photoresist pattern forms lightproof area, comprising:
Described second is carried out to the black photoresist layer to expose, and the black covered on the first photoresist pattern is removed after development
Photoresist；
By developing process and stripping technology, the unexposed white photoresist is removed, and by the first photoresist pattern and institute
Unexposed white photoresist removing is stated, forms the lightproof area in the substrate.
2. manufacturing method according to claim 1, which is characterized in that the being negative property of black photoresist.
3. manufacturing method according to claim 1, which is characterized in that on substrate after the white photoresist of coating, further includes:
The white photoresist layer is carried out soft roasting.
4. manufacturing method according to claim 1, which is characterized in that in the first photoresist pattern and the white being exposed
Black photoresist is coated on photoresist, is formed after black photoresist layer, further includes:
The black photoresist layer is carried out soft roasting.
5. production method described in any one of -4 according to claim 1, which is characterized in that carried out to the black photoresist layer
Second of exposure, removes after development and covers under the black photoresist layer covered on the first photoresist pattern, the first photoresist pattern
The white photoresist layer of lid and the first photoresist pattern are formed after lightproof area, further includes:
Insulating layer is formed on the black photoresist and transmission region of reservation.
6. a kind of semi-transparent half hides panel, which is characterized in that described semi-transparent half hides panel by any one of described claim 1-5 half
Half production method for hiding panel is made thoroughly.
7. a kind of production method of touch panel, which is characterized in that
It is also wrapped on the basis of the production method of semi-transparent half screening panel of the production method of the touch panel described in claim 5
It includes:
Production touches driving electrodes, separates with the touch driving electrodes to form capacitive coupling therebetween on the insulating layer
The touch sensible electrode of node and the touch sensible electrode is coupled to measure the touching of capacitance variations at capacitive coupling node
Control sensing circuit.
8. a kind of touch panel, which is characterized in that the touch panel by the touch panel in the claim 7 production side
Method is made.
9. a kind of display device, which is characterized in that including touch panel as claimed in claim 8.
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| CN107445489B (en) * | 2016-05-30 | 2023-07-07 | 蓝思科技（长沙）有限公司 | Preparation method of glass plate containing colored ink grain patterns and glass plate |
| CN111048559B (en) * | 2019-11-25 | 2022-11-22 | 信利（惠州）智能显示有限公司 | Display screen, cover plate and manufacturing method of cover plate |
| CN111710236B (en) * | 2020-04-24 | 2022-04-08 | 河北叁迪光学科技有限公司 | U-shaped surrounding curved screen and spraying exposure method thereof |
| CN111628117B (en) * | 2020-06-04 | 2023-06-27 | 南京华易泰电子科技有限公司 | Method for improving photoresist stripping effect in OLED (organic light emitting diode) manufacturing process |
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| CN203376704U (en) * | 2013-06-21 | 2014-01-01 | 江西沃格光电科技有限公司 | Touch panel and shielding layer thereof |
| CN104360785A (en) * | 2014-12-02 | 2015-02-18 | 合肥鑫晟光电科技有限公司 | Touch screen panel, touch screen and display device |
| CN104635993A (en) * | 2015-03-17 | 2015-05-20 | 蚌埠玻璃工业设计研究院 | Method for preparing white frame in white OGS touch screen |
| CN104656997A (en) * | 2015-03-13 | 2015-05-27 | 京东方科技集团股份有限公司 | Touch base plate and touch display device |
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| KR101656456B1 (en) * | 2009-10-30 | 2016-09-12 | 삼성전자주식회사 | Half-tone phase shift photomask blank and half-tone phase shift photomask and methods of fabricating the same |
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| CN203376704U (en) * | 2013-06-21 | 2014-01-01 | 江西沃格光电科技有限公司 | Touch panel and shielding layer thereof |
| CN104360785A (en) * | 2014-12-02 | 2015-02-18 | 合肥鑫晟光电科技有限公司 | Touch screen panel, touch screen and display device |
| CN104656997A (en) * | 2015-03-13 | 2015-05-27 | 京东方科技集团股份有限公司 | Touch base plate and touch display device |
| CN104635993A (en) * | 2015-03-17 | 2015-05-20 | 蚌埠玻璃工业设计研究院 | Method for preparing white frame in white OGS touch screen |
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