CN104846377A - Full automatic etching solution recovery device - Google Patents
Full automatic etching solution recovery device Download PDFInfo
- Publication number
- CN104846377A CN104846377A CN201510294829.1A CN201510294829A CN104846377A CN 104846377 A CN104846377 A CN 104846377A CN 201510294829 A CN201510294829 A CN 201510294829A CN 104846377 A CN104846377 A CN 104846377A
- Authority
- CN
- China
- Prior art keywords
- etching solution
- valve
- arm
- liquid dish
- etching
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- ing And Chemical Polishing (AREA)
Abstract
The invention relates to a full automatic etching solution recovery device which comprises an etching cabinet (1), a conveying device (3), a liquid catch dish (4), a liquid catch pipe (5) and a recovery pool (6); an etching solution spray header (2) is arranged above the conveying device (3), and the liquid catch dish (4) is fixedly mounted under the conveying device (3); one end of the liquid catch pipe (5) is connected to the bottom of the liquid catch dish (4), and the other end of the liquid catch pipe (5) is connected with a first branch pipe (7) and a second branch pipe (10) in parallel; the other end of the first branch pipe (7) and the other end of the second branch pipe (10) are respectively communicated with the recovery pool (6); the pipeline of the first branch pipe (7) is provided with a first valve (9) and a first filter (8), and the pipeline of the second branch pipe (10) is provided with a second valve (12) and a second filter (11). The invention has the advantages of high degree of automation, high recovery rate and continuous recovery.
Description
Technical field
The present invention relates to etching system, particularly a kind of full-automatic etching solution retrieving arrangement.
Background technology
Etching machine can be divided into chemical etcher and electrolytic etching apparatus two class.Be use chemical solution in chemical milling, via chemical reaction to reach the object of etching, chemical etcher is technology material chemical reaction or physical shock effect removed.Nowadays seen on market automatic type chemical etcher is by high-pressure spraying and is formed continuously uninterrupted feed state by etched plate translational motion and carry out workpiece corrosion to enhance productivity, increase spray with by the useful area of etching metal plate and etch degree of uniformity, no matter in etch effect, speed and environment and the comfort level of improving operator, be all better than the etching of spilling formula; Through repeatedly testing spraying pressure at 1-2 Kg/cm
2when by etching workpiece the etching trowel used for plastering stain that remains can be fallen by effectively clear place, etching speed is greatly improved in conventional etch method.But etching solution is at spray after product, and also have a large amount of unreacted etching solution, etching solution reclaims by existing etching solution retrieving arrangement, but the rate of recovery is low, and containing impurity in etching solution, cannot all reclaim.
Summary of the invention
The object of the invention is to the shortcoming overcoming prior art, the full-automatic etching solution retrieving arrangement that a kind of level of automation is high, the rate of recovery is high and can reclaim continuously is incessantly provided.
Object of the present invention is achieved through the following technical solutions: a kind of full-automatic etching solution retrieving arrangement, it comprises etching rack, transport unit, liquid dish, adapter and pond for recovering, described transport unit is horizontally through etching rack, the top of transport unit is provided with etching solution spray header, described liquid dish is fixedly mounted on the below of transport unit, one end of adapter is connected with the bottom of liquid dish, the other end of adapter is connected in parallel to the first arm and the second arm, the other end of the first arm is communicated with pond for recovering respectively with the other end of the second arm, the pipeline of the first arm is provided with the first valve and the first strainer, the pipeline of the second arm is provided with the second valve and the second strainer.
Described etching solution spray header is multiple, and multiple etching solution spray header is arranged on etching machine cashier's office in a shop evenly and at intervals along the delivery direction of transport unit.
The cross section undulate structure of described liquid dish, liquid dish is also provided with collector groove, and collector groove is arranged along the trough of liquid dish, and collector groove is communicated with adapter.
The first described valve and the second valve are magnetic valve.
Pipeline between the first described strainer and pond for recovering, between the second strainer and pond for recovering is respectively arranged with under meter.
The present invention has the following advantages:
1, etching solution of the present invention is being injected in after on product through spray header, under self gravitation effect, falls in liquid dish, carry out remaining etching solution recovery, filter the etching solution with impurity through strainer in removal process, whole process all can be carried out automatically, and level of automation is high.
2, etching solution enters liquid dish completely being injected in after on product, and the cross section of liquid dish is wavy shaped configuration, and arranges collector groove at trough place, and collector groove is communicated with adapter, and be conducive to remaining etching solution and enter adapter, organic efficiency increases substantially.
3, between adapter with pond for recovering, branch road in parallel is respectively arranged with, each branch road is provided with magnetic valve, strainer and under meter, fed back by the under meter of the wherein branch road magnetic valve to correspondence, if flow is lower than rated value, then close this way solenoid valve, open another way solenoid valve simultaneously, the strainer of flow lower than rated value one tunnel is cleaned, another road is reclaimed etching solution simultaneously, can realize reclaiming continuously incessantly.
Accompanying drawing explanation
Fig. 1 is structural representation of the present invention;
Fig. 2 is the plan structure schematic diagram of liquid dish;
Fig. 3 is A-A sectional structure schematic diagram in Fig. 2;
In figure: 1-etches rack, 2-etching solution spray header, 3-transport unit, 4-liquid dish, 5-adapter, 6-pond for recovering, 7-first arm, 8-first strainer, 9-first valve, 10-second arm, 11-second strainer, 12-second valve, 13-collector groove.
Embodiment
Below in conjunction with accompanying drawing, the present invention will be further described, but protection scope of the present invention is not limited to the following stated.
As shown in Figure 1, a kind of full-automatic etching solution retrieving arrangement, it comprises etching rack 1, transport unit 3, liquid dish 4, adapter 5 and pond for recovering 6, described transport unit 3 is horizontally through etching rack 1, the top of transport unit 3 is provided with etching solution spray header 2, described liquid dish 4 is fixedly mounted on the below of transport unit 3, one end of adapter 5 is connected with the bottom of liquid dish 4, the other end of adapter 5 is connected in parallel to the first arm 7 and the second arm 10, the other end of the first arm 7 is communicated with pond for recovering 6 respectively with the other end of the second arm 10, the pipeline of the first arm 7 is provided with the first valve 9 and the first strainer 8, the pipeline of the second arm 8 is provided with the second valve 12 and the second strainer 11.
Further, described etching solution spray header 2 is multiple, and multiple etching solution spray header 2 is arranged on etching rack 1 evenly and at intervals along the delivery direction of transport unit 3, sprays equably product, improves product etching quality.
Further, as shown in Figures 2 and 3, the cross section undulate structure of described liquid dish 4, liquid dish 4 is also provided with collector groove 13, and collector groove 13 is arranged along the trough of liquid dish 4, and collector groove 13 is communicated with adapter 5.
The first described valve 9 and the second valve 12 are magnetic valve.
Pipeline between the first described strainer 8 and pond for recovering 6, between the second strainer 11 and pond for recovering 6 is respectively arranged with under meter.
Working process of the present invention is as follows: product moves along delivery direction on transport unit 3, etching solution is injected on product surface by etching solution spray header 2, remaining etching solution and impurity are under self gravitation effect, fall in liquid dish 4, collected by the collector groove 13 at liquid dish 4 trough place, then be recycled in pond for recovering 6 by adapter 5.Branch road in parallel is respectively arranged with between adapter 5 with pond for recovering 6, each branch road is provided with magnetic valve, strainer and under meter, fed back by the under meter of the wherein branch road magnetic valve to correspondence, if flow is lower than rated value, then close this way solenoid valve, open another way solenoid valve simultaneously, the strainer of flow lower than rated value one tunnel is cleaned, another road is reclaimed etching solution simultaneously, can realize reclaiming continuously incessantly.
Claims (5)
1. a full-automatic etching solution retrieving arrangement, it is characterized in that: it comprises etching rack (1), transport unit (3), liquid dish (4), adapter (5) and pond for recovering (6), described transport unit (3) is horizontally through etching rack (1), the top of transport unit (3) is provided with etching solution spray header (2), described liquid dish (4) is fixedly mounted on the below of transport unit (3), one end of adapter (5) is connected with the bottom of liquid dish (4), the other end of adapter (5) is connected in parallel to the first arm (7) and the second arm (10), the other end of the first arm (7) is communicated with pond for recovering (6) respectively with the other end of the second arm (10), the pipeline of the first arm (7) is provided with the first valve (9) and the first strainer (8), the pipeline of the second arm (8) is provided with the second valve (12) and the second strainer (11).
2. the full-automatic etching solution retrieving arrangement of one according to claim 1, it is characterized in that: described etching solution spray header (2) is for multiple, and multiple etching solution spray header (2) is arranged in etching rack (1) evenly and at intervals along the delivery direction of transport unit (3).
3. the full-automatic etching solution retrieving arrangement of one according to claim 1, it is characterized in that: the cross section undulate structure of described liquid dish (4), liquid dish (4) is also provided with collector groove (13), collector groove (13) is arranged along the trough of liquid dish (4), and collector groove (13) is communicated with adapter (5).
4. the full-automatic etching solution retrieving arrangement of one according to claim 1, is characterized in that: described the first valve (9) and the second valve (12) are magnetic valve.
5. the full-automatic etching solution retrieving arrangement of one according to claim 1, is characterized in that: the pipeline between described the first strainer (8) and pond for recovering (6), between the second strainer (11) and pond for recovering (6) is respectively arranged with under meter.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510294829.1A CN104846377A (en) | 2015-06-02 | 2015-06-02 | Full automatic etching solution recovery device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510294829.1A CN104846377A (en) | 2015-06-02 | 2015-06-02 | Full automatic etching solution recovery device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN104846377A true CN104846377A (en) | 2015-08-19 |
Family
ID=53846352
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201510294829.1A Pending CN104846377A (en) | 2015-06-02 | 2015-06-02 | Full automatic etching solution recovery device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN104846377A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20170341937A1 (en) * | 2016-05-31 | 2017-11-30 | City University Of Hong Kong | Method of producing graphene-based materials, obtainable materials and their use |
| CN109302803A (en) * | 2018-10-17 | 2019-02-01 | 刘兆 | A kind of two-sided etching machine of printed circuit board |
| WO2019036936A1 (en) * | 2017-08-23 | 2019-02-28 | 深圳市柔宇科技有限公司 | Developing solution recovery system |
| CN109402636A (en) * | 2018-12-24 | 2019-03-01 | 陈振龙 | Intelligent etching equipment with sweeps recovery structure and controllable temperature |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20080087645A1 (en) * | 2006-10-12 | 2008-04-17 | M-Fsi Ltd. | Regeneration method of etching solution, an etching method and an etching system |
| CN202270404U (en) * | 2011-10-10 | 2012-06-13 | 上海众一石化工程有限公司 | Self-cleaning filter |
| CN202876512U (en) * | 2012-10-11 | 2013-04-17 | 中芯国际集成电路制造(北京)有限公司 | Circulating device of cleaning filter |
| CN204097605U (en) * | 2014-09-24 | 2015-01-14 | 山东英利实业有限公司 | A kind of fiber spinning dope filter |
| CN204180391U (en) * | 2014-08-21 | 2015-02-25 | 江苏迪飞达电子有限公司 | Pcb board etching machine |
| CN204661828U (en) * | 2015-06-02 | 2015-09-23 | 成都虹华环保科技股份有限公司 | A kind of full-automatic etching solution retrieving arrangement |
-
2015
- 2015-06-02 CN CN201510294829.1A patent/CN104846377A/en active Pending
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20080087645A1 (en) * | 2006-10-12 | 2008-04-17 | M-Fsi Ltd. | Regeneration method of etching solution, an etching method and an etching system |
| CN202270404U (en) * | 2011-10-10 | 2012-06-13 | 上海众一石化工程有限公司 | Self-cleaning filter |
| CN202876512U (en) * | 2012-10-11 | 2013-04-17 | 中芯国际集成电路制造(北京)有限公司 | Circulating device of cleaning filter |
| CN204180391U (en) * | 2014-08-21 | 2015-02-25 | 江苏迪飞达电子有限公司 | Pcb board etching machine |
| CN204097605U (en) * | 2014-09-24 | 2015-01-14 | 山东英利实业有限公司 | A kind of fiber spinning dope filter |
| CN204661828U (en) * | 2015-06-02 | 2015-09-23 | 成都虹华环保科技股份有限公司 | A kind of full-automatic etching solution retrieving arrangement |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20170341937A1 (en) * | 2016-05-31 | 2017-11-30 | City University Of Hong Kong | Method of producing graphene-based materials, obtainable materials and their use |
| US10160653B2 (en) * | 2016-05-31 | 2018-12-25 | City University Of Hong Kong | Method of producing graphene-based materials, obtainable materials and their use |
| WO2019036936A1 (en) * | 2017-08-23 | 2019-02-28 | 深圳市柔宇科技有限公司 | Developing solution recovery system |
| CN109302803A (en) * | 2018-10-17 | 2019-02-01 | 刘兆 | A kind of two-sided etching machine of printed circuit board |
| CN109402636A (en) * | 2018-12-24 | 2019-03-01 | 陈振龙 | Intelligent etching equipment with sweeps recovery structure and controllable temperature |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN104846377A (en) | Full automatic etching solution recovery device | |
| CN104190961A (en) | Novel machine tool | |
| CN203956113U (en) | Novel lathe | |
| CN204661828U (en) | A kind of full-automatic etching solution retrieving arrangement | |
| CN205912345U (en) | PCB board automatic processing equipment | |
| CN104841661A (en) | Automatic high-pressure cleaning system | |
| CN205764223U (en) | A kind of aluminium section bar processing unit (plant) with antirust function | |
| CN206855130U (en) | A kind of high speed drill attacks machine device for filtering cutting fluid | |
| CN212287070U (en) | Large-scale grinding machine cutting fluid recovery unit for manufacturing of precision machine tool | |
| CN208179252U (en) | Multifunctional mold polishing system | |
| CN108083654A (en) | Environmentally protective glass post-processing frosting processing unit (plant) | |
| CN215508063U (en) | Cleaning equipment for automobile parts | |
| CN205289121U (en) | Washing liquid circulating and filtering system of bearing cleaning machine | |
| CN204999949U (en) | Expensive metal recycling device of high -efficient type | |
| CN204996238U (en) | Filter equipment of sheet glass attenuate etching spent acid | |
| CN205765249U (en) | A kind of coolant filtering recovering device being applicable to sawing machine | |
| CN202398560U (en) | Spray type demoulding machine | |
| CN206881910U (en) | Medium cage for the working chamber of iron remover for slurry | |
| CN205818196U (en) | A kind of mortar recovery system conveying pipeline apparatus for placing | |
| CN204074597U (en) | A kind of Wafer Cleaning wastewater recycling system | |
| CN204486372U (en) | Copper cash ultrasonic cleaning equipment | |
| CN203565875U (en) | Transfer bin for replacing copper powder with iron | |
| CN205127971U (en) | Liquaemin resin cleaning system | |
| CN104226641A (en) | Radio frequency tag acid and alkaline washing equipment | |
| CN104384014A (en) | Ceramic iron removal machine |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| EXSB | Decision made by sipo to initiate substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| RJ01 | Rejection of invention patent application after publication |
Application publication date: 20150819 |
|
| RJ01 | Rejection of invention patent application after publication |