CN204661828U - A kind of full-automatic etching solution retrieving arrangement - Google Patents
A kind of full-automatic etching solution retrieving arrangement Download PDFInfo
- Publication number
- CN204661828U CN204661828U CN201520370765.4U CN201520370765U CN204661828U CN 204661828 U CN204661828 U CN 204661828U CN 201520370765 U CN201520370765 U CN 201520370765U CN 204661828 U CN204661828 U CN 204661828U
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- CN
- China
- Prior art keywords
- etching solution
- arm
- liquid dish
- adapter
- transport unit
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Abstract
The utility model relates to a kind of full-automatic etching solution retrieving arrangement, it comprises etching rack (1), transport unit (3), liquid dish (4), adapter (5) and pond for recovering (6), the top of transport unit (3) is provided with etching solution spray header (2), liquid dish (4) is fixedly mounted on the below of transport unit (3), one end of adapter (5) is connected with the bottom of liquid dish (4), the other end of adapter (5) is connected in parallel to the first arm (7) and the second arm (10), the other end of the first arm (7) is communicated with pond for recovering (6) respectively with the other end of the second arm (10), the pipeline of the first arm (7) is provided with the first valve (9) and the first strainer (8), the pipeline of the second arm (8) is provided with the second valve (12) and the second strainer (11).The utility model has the advantage of: level of automation is high, the rate of recovery is high and can reclaim continuously incessantly.
Description
Technical field
The utility model relates to etching system, particularly a kind of full-automatic etching solution retrieving arrangement.
Background technology
Etching machine can be divided into chemical etcher and electrolytic etching apparatus two class.Be use chemical solution in chemical milling, via chemical reaction to reach the object of etching, chemical etcher is technology material chemical reaction or physical shock effect removed.Nowadays seen on market automatic type chemical etcher is by high-pressure spraying and is formed continuously uninterrupted feed state by etched plate translational motion and carry out workpiece corrosion to enhance productivity, increase spray with by the useful area of etching metal plate and etch degree of uniformity, no matter in etch effect, speed and environment and the comfort level of improving operator, be all better than the etching of spilling formula; Through repeatedly testing spraying pressure at 1-2 Kg/cm
2when by etching workpiece the etching trowel used for plastering stain that remains can be fallen by effectively clear place, etching speed is greatly improved in conventional etch method.But etching solution is at spray after product, and also have a large amount of unreacted etching solution, etching solution reclaims by existing etching solution retrieving arrangement, but the rate of recovery is low, and containing impurity in etching solution, cannot all reclaim.
Utility model content
The purpose of this utility model is the shortcoming overcoming prior art, provides the full-automatic etching solution retrieving arrangement that a kind of level of automation is high, the rate of recovery is high and can reclaim continuously incessantly.
The purpose of this utility model is achieved through the following technical solutions: a kind of full-automatic etching solution retrieving arrangement, it comprises etching rack, transport unit, liquid dish, adapter and pond for recovering, described transport unit is horizontally through etching rack, the top of transport unit is provided with etching solution spray header, described liquid dish is fixedly mounted on the below of transport unit, one end of adapter is connected with the bottom of liquid dish, the other end of adapter is connected in parallel to the first arm and the second arm, the other end of the first arm is communicated with pond for recovering respectively with the other end of the second arm, the pipeline of the first arm is provided with the first valve and the first strainer, the pipeline of the second arm is provided with the second valve and the second strainer.
Described etching solution spray header is multiple, and multiple etching solution spray header is arranged on etching machine cashier's office in a shop evenly and at intervals along the delivery direction of transport unit.
The cross section undulate structure of described liquid dish, liquid dish is also provided with collector groove, and collector groove is arranged along the trough of liquid dish, and collector groove is communicated with adapter.
The first described valve and the second valve are magnetic valve.
Pipeline between the first described strainer and pond for recovering, between the second strainer and pond for recovering is respectively arranged with under meter.
The utility model has the following advantages:
1, etching solution of the present utility model is being injected in after on product through spray header, under self gravitation effect, falls in liquid dish, carry out remaining etching solution recovery, filter the etching solution with impurity through strainer in removal process, whole process all can be carried out automatically, and level of automation is high.
2, etching solution enters liquid dish completely being injected in after on product, and the cross section of liquid dish is wavy shaped configuration, and arranges collector groove at trough place, and collector groove is communicated with adapter, and be conducive to remaining etching solution and enter adapter, organic efficiency increases substantially.
3, between adapter with pond for recovering, branch road in parallel is respectively arranged with, each branch road is provided with magnetic valve, strainer and under meter, fed back by the under meter of the wherein branch road magnetic valve to correspondence, if flow is lower than rated value, then close this way solenoid valve, open another way solenoid valve simultaneously, the strainer of flow lower than rated value one tunnel is cleaned, another road is reclaimed etching solution simultaneously, can realize reclaiming continuously incessantly.
Accompanying drawing explanation
Fig. 1 is structural representation of the present utility model;
Fig. 2 is the plan structure schematic diagram of liquid dish;
Fig. 3 is A-A sectional structure schematic diagram in Fig. 2;
In figure: 1-etches rack, 2-etching solution spray header, 3-transport unit, 4-liquid dish, 5-adapter, 6-pond for recovering, 7-first arm, 8-first strainer, 9-first valve, 10-second arm, 11-second strainer, 12-second valve, 13-collector groove.
Embodiment
Below in conjunction with accompanying drawing, the utility model is further described, but protection domain of the present utility model is not limited to the following stated.
As shown in Figure 1, a kind of full-automatic etching solution retrieving arrangement, it comprises etching rack 1, transport unit 3, liquid dish 4, adapter 5 and pond for recovering 6, described transport unit 3 is horizontally through etching rack 1, the top of transport unit 3 is provided with etching solution spray header 2, described liquid dish 4 is fixedly mounted on the below of transport unit 3, one end of adapter 5 is connected with the bottom of liquid dish 4, the other end of adapter 5 is connected in parallel to the first arm 7 and the second arm 10, the other end of the first arm 7 is communicated with pond for recovering 6 respectively with the other end of the second arm 10, the pipeline of the first arm 7 is provided with the first valve 9 and the first strainer 8, the pipeline of the second arm 8 is provided with the second valve 12 and the second strainer 11.
Further, described etching solution spray header 2 is multiple, and multiple etching solution spray header 2 is arranged on etching rack 1 evenly and at intervals along the delivery direction of transport unit 3, sprays equably product, improves product etching quality.
Further, as shown in Figures 2 and 3, the cross section undulate structure of described liquid dish 4, liquid dish 4 is also provided with collector groove 13, and collector groove 13 is arranged along the trough of liquid dish 4, and collector groove 13 is communicated with adapter 5.
The first described valve 9 and the second valve 12 are magnetic valve.
Pipeline between the first described strainer 8 and pond for recovering 6, between the second strainer 11 and pond for recovering 6 is respectively arranged with under meter.
Working process of the present utility model is as follows: product moves along delivery direction on transport unit 3, etching solution is injected on product surface by etching solution spray header 2, remaining etching solution and impurity are under self gravitation effect, fall in liquid dish 4, collected by the collector groove 13 at liquid dish 4 trough place, then be recycled in pond for recovering 6 by adapter 5.Branch road in parallel is respectively arranged with between adapter 5 with pond for recovering 6, each branch road is provided with magnetic valve, strainer and under meter, fed back by the under meter of the wherein branch road magnetic valve to correspondence, if flow is lower than rated value, then close this way solenoid valve, open another way solenoid valve simultaneously, the strainer of flow lower than rated value one tunnel is cleaned, another road is reclaimed etching solution simultaneously, can realize reclaiming continuously incessantly.
Claims (5)
1. a full-automatic etching solution retrieving arrangement, it is characterized in that: it comprises etching rack (1), transport unit (3), liquid dish (4), adapter (5) and pond for recovering (6), described transport unit (3) is horizontally through etching rack (1), the top of transport unit (3) is provided with etching solution spray header (2), described liquid dish (4) is fixedly mounted on the below of transport unit (3), one end of adapter (5) is connected with the bottom of liquid dish (4), the other end of adapter (5) is connected in parallel to the first arm (7) and the second arm (10), the other end of the first arm (7) is communicated with pond for recovering (6) respectively with the other end of the second arm (10), the pipeline of the first arm (7) is provided with the first valve (9) and the first strainer (8), the pipeline of the second arm (10) is provided with the second valve (12) and the second strainer (11).
2. the full-automatic etching solution retrieving arrangement of one according to claim 1, it is characterized in that: described etching solution spray header (2) is for multiple, and multiple etching solution spray header (2) is arranged in etching rack (1) evenly and at intervals along the delivery direction of transport unit (3).
3. the full-automatic etching solution retrieving arrangement of one according to claim 1, it is characterized in that: the cross section undulate structure of described liquid dish (4), liquid dish (4) is also provided with collector groove (13), collector groove (13) is arranged along the trough of liquid dish (4), and collector groove (13) is communicated with adapter (5).
4. the full-automatic etching solution retrieving arrangement of one according to claim 1, is characterized in that: described the first valve (9) and the second valve (12) are magnetic valve.
5. the full-automatic etching solution retrieving arrangement of one according to claim 1, is characterized in that: the pipeline between described the first strainer (8) and pond for recovering (6), between the second strainer (11) and pond for recovering (6) is respectively arranged with under meter.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201520370765.4U CN204661828U (en) | 2015-06-02 | 2015-06-02 | A kind of full-automatic etching solution retrieving arrangement |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201520370765.4U CN204661828U (en) | 2015-06-02 | 2015-06-02 | A kind of full-automatic etching solution retrieving arrangement |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN204661828U true CN204661828U (en) | 2015-09-23 |
Family
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201520370765.4U Expired - Fee Related CN204661828U (en) | 2015-06-02 | 2015-06-02 | A kind of full-automatic etching solution retrieving arrangement |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN204661828U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104846377A (en) * | 2015-06-02 | 2015-08-19 | 成都虹华环保科技股份有限公司 | Full automatic etching solution recovery device |
-
2015
- 2015-06-02 CN CN201520370765.4U patent/CN204661828U/en not_active Expired - Fee Related
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104846377A (en) * | 2015-06-02 | 2015-08-19 | 成都虹华环保科技股份有限公司 | Full automatic etching solution recovery device |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20150923 Termination date: 20200602 |