CN1048402A - Polishing fluid - Google Patents
Polishing fluid Download PDFInfo
- Publication number
- CN1048402A CN1048402A CN 89104530 CN89104530A CN1048402A CN 1048402 A CN1048402 A CN 1048402A CN 89104530 CN89104530 CN 89104530 CN 89104530 A CN89104530 A CN 89104530A CN 1048402 A CN1048402 A CN 1048402A
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- CN
- China
- Prior art keywords
- polishing
- polishing fluid
- water
- fluid
- ammonium
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Abstract
A kind of polishing fluid that is used for the polishing of ferrous metal piece surface, its composition are to add a spot of ammonium oxalate, sulfuric acid, phosphoric acid, glycerol, Tai-Ace S 150, ammonium persulphate and sodium lauryl sulphate in water.Be suitable in centrifugal polishing machine adopting this polishing fluid that part is polished, polishing velocity is fast, and can prevent the part bump and the striking mark that stays.
Description
The present invention relates to a kind of polishing fluid that is used for metal surface polishing, particularly a kind of polishing fluid to ferrous metal piece surface polishing usefulness.
In the prior art, most of metal parts glossing is to adopt mechanical grinding method, and promptly the mutual friction effect of grinding medium and piece surface is to reach the purpose to the piece surface polishing.This technology, long-acting rate consuming time is low, poor working environment, floor space are big.The employing centrifugal polishing machine that has in the recent period improves glossing, and it uses mill liquid undetermined and abrasive material, and the part after polishing will separate with abrasive material, and complex operation separates more difficult to finding especially.According to the polishing fluid of principles of chemistry preparation, part contacts with polishing fluid, utilizes enrichment principle in the chemistry, concentration difference in regional area is carried out chemical action earlier to outstanding position steel body, makes piece surface smooth, do not stay sleek, good smooth is arranged, then can overcome the shortcoming of abrasive polishing technology.The composition of the polishing fluid that Japan is used is to add a spot of copper sulfate CuSO in water
42H
2O, petroleum benzene sodium sulfonate, phosphoric acid H
3PO
4With sodium phosphate Na
3P
2O
8Adopt this polishing fluid, can be created in the phenomenon that steel piece surface has cupric ion absorption when polishing time is long, generally needing the control polishing time is 1 hour, in addition, the surperficial cushion effect of this polishing fluid is not enough, to without the part that quenches, is easy to generate the striking mark phenomenon.
The object of the present invention is to provide a kind of to ferrous metal part polishing usefulness, have enough surperficial cushion effect and a fast polishing fluid of polishing velocity.
For achieving the above object, the composition of this polishing fluid is: by weight, and ammonium oxalate (COOH)
22H
2O is 0.1～2%, sulfuric acid H
2SO
4Be 0.06～0.8%, phosphoric acid H
3PO
4Be 0.05～0.4%, glycerol C
2H
8O
3Be 0.05～0.6%, Tai-Ace S 150 Al
2(SO
4)
3Be 0.002～0.02%, ammonium persulphate (NH
4)
2S
2O
8Be 0.02～0.2% and sodium lauryl sulphate CH
3(CH
2)
11SO
4Na is 0.006～0.04%, and all the other are water H
2O.
Ferrous metal is contacting with air for a long time, because water in air steam and oxygen can produce layer of oxide layer lentamente to metallic surface generation erosion action to a certain degree in the metallic surface.In like manner, handle, comprise tempering,, also can comparatively fast form zone of oxidation if without the processing under the anoxic condition at quench hot.Adopt this polishing fluid, make Fe in the zone of oxidation
2+Or Fe
3+Can remove zone of oxidation with the oxalic acid reaction.Make Fe
2+Or Fe
3+Can more successfully react with oxalic acid, its essential condition is that polishing fluid has suitable pH value, thereby contains sulfuric acid H in polishing fluid
2SO
4With phosphoric acid H
3PO
4Simultaneously, phosphoric acid H
3PO
4Can play certain light effect to the metallic surface, because P
3+Existence, can play the very thin bright layer of one deck in the metallic surface, thereby improve smooth finish.
In order to consider reaction uniformity and improve smooth finish that metal parts and polishing fluid place centrifugal polishing machine to polish.In centrifugal polishing machine, clash into mutually between the part, to producing striking mark without the part that quenched.Therefore be added with glycerol C in this polishing fluid
2H
8O
3As buffer reagent, the while is lubricate again.Because polishing fluid itself is a tart, part polishing back breaks away from after the polishing fluid, is easy to get rusty.So this polishing fluid is added with ammonium oxalate (COOH)
22H
2O and ammonium persulphate (NH
4)
2S
2O
8, making has certain ammonium ion in the solution, acid etching is had certain shock absorption.Be added with sodium lauryl sulphate CH in the polishing fluid
3(CH
2)
11SO
4The Na purpose is it on the one hand is that to remove the dirt of steel piece surface dirty, is as dispersion agent on the other hand, makes that each concentration of component can better be distributed in around each steel part in the solution.
Operating procedure is as follows: 1. polish pre-treatment: the smeary part is arranged, and especially the oil tempering part need have sodium phosphate Na earlier
3PO
4, yellow soda ash Na
2CO
3Or 105
#Degreaser is removed the piece surface greasy dirt; 2. adopt this polishing fluid to polish in centrifugal polishing machine, press part dimension, polishing time was controlled at 0.5～1 hour; 3. part is rinsed well with tap water immediately after polishing, put into then 1%～2% 105
#Degreaser gets rusty preventing.
The processing of polishing back waste liquid only needs it is imported the waste liquid tank precipitation after a few hours, and the pH value of clear liquid above measuring is if PH at 6～9 o'clock, can discharge.If do not reach above-mentioned requirements, only need to add sodium hydroxide a little, can discharge when regulating so far pH value.
This polishing fluid has following advantage compared with prior art: can improve polishing speed; The phenomenon that cupric ion absorption can not occur at steel piece surface; Have enough surperficial cushion effects, not can because of when polishing part mutual bump stay striking mark, the surface smoothness of polish parts can improve than original surface smoothness
2
Specific embodiment is: adopt this polishing fluid to polish in centrifugal polishing machine to small parts such as Steel Traveler, draw point and steel hooks respectively.The composition of used polishing fluid is: by weight, and ammonium oxalate (COOH)
22H
2O is 0.2～1%, sulfuric acid H
2SO
4Be 0.12～0.4%, phosphoric acid H
3PO
4Be 0.1～0.2%, glycerol C
2H
8O
3Be 0.1～0.3%, Tai-Ace S 150 Al
2(SO
4)
3Be 0.005 ~ 0.01%, Guo Liu Suan ammonium (NH4)
2S
2O
8Be 0.04～0.1% and sodium lauryl sulphate CH
3(CH
2)
11SO
4Na is 0.012～0.02%, and all the other are water H
2O.Winter room temperature below 5 ℃ the time, directly with 80 ℃ hot water, polishing time is 40～45 minutes to the water of polishing fluid; Room temperature is more than 15 ℃ the time, and it is about 40 minutes that the water of polishing fluid is just directly used room temperature water, polishing time; Summer as long as use cold water, polish and got final product in about 20 minutes.Piece surface smooth finish after the polishing improves
2, no striking mark.
Claims (2)
1, a kind of polishing fluid that is used for the polishing of ferrous metal part is characterized in that the composition of polishing fluid is: by weight, and ammonium oxalate (COOH)
22H
2O is 0.1～2%, sulfuric acid H
2SO
4Be 0.06～0.8%, phosphoric acid H
3PO
4Be 0.05～0.4%, glycerol C
2H
O
3Be 0.05～0.6%, Tai-Ace S 150 Al
2(SO
4)
3Be 0.002～0.02%, ammonium persulphate (NH
4)
2S
2O
3Be 0.02～0.2% and sodium lauryl sulphate CH
3(CH
2)
11SO
4Na is 0.006～0.04%, and all the other are water H
2O.
2, polishing fluid according to claim 1 is characterized in that the composition of polishing fluid is: by weight, and ammonium oxalate (COOH)
22H
2O is 0.2～1%, sulfuric acid H
2SO
4Be 0.12～0.4%, phosphoric acid H
3PO
4Be 0.1～0.2%, glycerol C
2H
8O
3Be 0.1～0.3%, Tai-Ace S 150 Al
2(SO
4)
3Be 0.005～0.01%, ammonium persulphate (NH
4)
2S
2O
8Be 0.04～0.1% and sodium lauryl sulphate CH
3(CH
2)
11SO
4Na is 0.012～0.02%, and all the other are water H
2O.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 89104530 CN1048402A (en) | 1989-06-30 | 1989-06-30 | Polishing fluid |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 89104530 CN1048402A (en) | 1989-06-30 | 1989-06-30 | Polishing fluid |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN1048402A true CN1048402A (en) | 1991-01-09 |
Family
ID=4855588
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 89104530 Pending CN1048402A (en) | 1989-06-30 | 1989-06-30 | Polishing fluid |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN1048402A (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101864247A (en) * | 2010-07-20 | 2010-10-20 | 南京航空航天大学 | Abrasive material-free polishing fluid for chemical mechanical polishing of rigid fragile material |
| CN103468205A (en) * | 2013-09-23 | 2013-12-25 | 无锡阳工机械制造有限公司 | Polishing anticorrosion slurry for metal tools |
| CN103484866A (en) * | 2013-09-23 | 2014-01-01 | 无锡阳工机械制造有限公司 | Polishing anti-corrosion slurry |
| CN103484865A (en) * | 2013-09-23 | 2014-01-01 | 无锡阳工机械制造有限公司 | Metal polishing and corrosion-resistant slurry |
| CN104480522A (en) * | 2014-12-03 | 2015-04-01 | 南京三乐电子信息产业集团有限公司 | Solution for electrochemical deburring and oxide layer removal of tantalum-foil material primary emitter for magnetron and deburring method |
-
1989
- 1989-06-30 CN CN 89104530 patent/CN1048402A/en active Pending
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101864247A (en) * | 2010-07-20 | 2010-10-20 | 南京航空航天大学 | Abrasive material-free polishing fluid for chemical mechanical polishing of rigid fragile material |
| CN101864247B (en) * | 2010-07-20 | 2012-07-25 | 南京航空航天大学 | Abrasive material-free polishing fluid for chemical mechanical polishing of rigid fragile material |
| CN103468205A (en) * | 2013-09-23 | 2013-12-25 | 无锡阳工机械制造有限公司 | Polishing anticorrosion slurry for metal tools |
| CN103484866A (en) * | 2013-09-23 | 2014-01-01 | 无锡阳工机械制造有限公司 | Polishing anti-corrosion slurry |
| CN103484865A (en) * | 2013-09-23 | 2014-01-01 | 无锡阳工机械制造有限公司 | Metal polishing and corrosion-resistant slurry |
| CN103468205B (en) * | 2013-09-23 | 2015-09-09 | 无锡阳工机械制造有限公司 | A kind of polishing anti-corrosive pulp for iron tool |
| CN103484865B (en) * | 2013-09-23 | 2016-04-13 | 无锡阳工机械制造有限公司 | A kind of medal polish anti-corrosive pulp |
| CN103484866B (en) * | 2013-09-23 | 2016-05-18 | 无锡阳工机械制造有限公司 | A kind of polishing anti-corrosive pulp |
| CN104480522A (en) * | 2014-12-03 | 2015-04-01 | 南京三乐电子信息产业集团有限公司 | Solution for electrochemical deburring and oxide layer removal of tantalum-foil material primary emitter for magnetron and deburring method |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C01 | Deemed withdrawal of patent application (patent law 1993) | ||
| WD01 | Invention patent application deemed withdrawn after publication |