CN104837784A - Method for renewing chemical solution used for device for etching liquid crystal glass, nozzle for chemical solution renewal, and chemical solution for renewal - Google Patents
Method for renewing chemical solution used for device for etching liquid crystal glass, nozzle for chemical solution renewal, and chemical solution for renewal Download PDFInfo
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- CN104837784A CN104837784A CN201280077613.4A CN201280077613A CN104837784A CN 104837784 A CN104837784 A CN 104837784A CN 201280077613 A CN201280077613 A CN 201280077613A CN 104837784 A CN104837784 A CN 104837784A
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C15/00—Surface treatment of glass, not in the form of fibres or filaments, by etching
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F2203/00—Function characteristic
- G02F2203/68—Green display, e.g. recycling, reduction of harmful substances
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- Optics & Photonics (AREA)
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- Crystallography & Structural Chemistry (AREA)
- Cleaning By Liquid Or Steam (AREA)
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Abstract
The invention relates to a method for renewing a chemical solution used for a device for etching liquid crystal glass, a nozzle for chemical solution renewal and the chemical solution for renewal. The renewing of a chemical solution used for the device for etching liquid crystal glass is promoted in order to maintain an optimum environment when etching liquid crystal glass, and thereby make it possible to obtain a high-quality liquid crystal glass component. The method for renewing a chemical solution used for the device for etching liquid crystal glass is configured that a chemical solution discharge nozzle and a suction nozzle are disposed in an etching solution tank for containing the chemical solution, the chemical solution is discharged and suctioned in a state in which the nozzles are immersed in the chemical solution, the discharging and the suctioning using the above nozzles are performed simultaneously, and a uniform stress is applied to the chemical solution, whereby the renewing of the chemical solution is promoted.
Description
Technical field
The present invention relates to a kind of update method of the liquid for liquid-crystalline glasses etching system, liquid renewal nozzle and renewal liquid.
Background technology
Liquid-crystalline glasses is etched by chemical treatment, but for this reason and application treatment process can be roughly divided into the reduction (Slimming Method) for the purpose of thin plate, lightweight and be processed as the method for forming pattern of object with shape of product.At this, one of inevitable problem in chemical treatment is exactly the reaction of processed material and etching solution and the solid matter generated.Hinder liquid-flow if cause because of the accumulation of this solid matter and pollute aggravation, being then difficult to carry out the etching liquid management based on continuous filtration treatment process, or being difficult to tackle high-precision producing apparatus.
Further, etching reagent is about to as the nozzle during liquid-crystalline glasses that spued to by the etching solution relative to liquid-crystalline glasses assembly etc., uses nozzle smaller compared with etching system according to various situation.Why using small nozzle, is because 1 liquid-crystalline glasses assembly needs multiple small nozzle, and etching solution in multiple nozzle will inevitably be caused to spue the homogenizing problem of condition.The deviation of the etching of liquid-crystalline glasses component internal also can affect product specification, is therefore difficult to the homogenizing being realized liquid-crystalline glasses component internal by combined small-sized nozzle, and needs essence countermeasure.
Know through investigation conventional art, there is the photo-resist removal device of No. 2002-251794, Japanese Patent Publication, although the object of this device is replace medicine with the displacement/scavenging solution by spraying from multiple spray nozzle and removed, and, rotate by making glass raw sheet keeper and rock displacement/scavenging solution, but be also the example of a small nozzle.And, in No. 2003-91885, Japanese Patent Publication, possess liquid as the component removing photoresist oxidant layer to spue nozzle, this nozzle carries out on the basis of ultrasonic vibration while making glass substrate rotate, photoresist is removed liquid and drips to glass baseplate surface, the nozzle for this is also small nozzle.So, the nozzle spued for etching solution is generally small nozzle.
Patent documentation 1: No. 2002-251794, Japanese Patent Publication
Patent documentation 2: No. 2003-91885, Japanese Patent Publication
Summary of the invention
The present invention completes in view of the foregoing, and its problem is etching in order to carry out liquid-crystalline glasses with the state maintaining optimum environment and promotes the renewal of the liquid for liquid-crystalline glasses etching system, and obtains the liquid-crystalline glasses assembly of high-quality thus.Further, another problem of the present invention is the liquid being used for etching system spued to liquid-crystalline glasses component integration simultaneously and aspirate above-mentioned liquid, realizes high-precision glass etching thus.
For solving described problem, the present invention is directed to the update method of the liquid for liquid-crystalline glasses etching system, adopt following means, namely in the etching liquid cell of filling liquid, configure spuing of liquid use nozzle and suction nozzle, and carry out the spuing of liquid under the state of soaking said nozzle in liquid, aspirate, carry out using the spuing of said nozzle, aspirating to apply uniform stress to liquid simultaneously, promote the renewal of liquid thus.
The present invention relates to a kind of etching of liquid-crystalline glasses, the liquid used is mainly etching reagent for etch processes and etching solution, or for for cleaning by glass ingredient and the reaction of etching solution and the scavenging solution etc. of the clean of the etching system of the solids component generated.
Etching system is moved into the conveying belt of liquid-crystalline glasses, the nozzle of the etching solution that to spue to the liquid-crystalline glasses on conveying belt, the pipe arrangement of supply etching solution and various valvegears etc. by the inside of the etching liquid cell at device and is formed, and the part contacted with their etching solution is usually in the state of being drenched by etching solution.And can not flow under non-operating state, and etching solution can leak sometimes, and therefore under non-operating state, aforesaid liquid becomes branch dry.So, drenched by etching solution if repeatedly occur and drying, then solids component all can become layer and repeatedly pile up at every turn on the surface of etching system, its result, solids component is deposited in the part that contacts with etching solution and hinders the flowing of etching solution, even if the etching system of precision is also more and more difficult to play its original performance.So, the etching solution for etching for liquid-crystalline glasses becomes inducement etching system being caused to bad impact, is therefore equivalent to the liquid in the present invention.But must clean the solids component of etching solution in addition, the scavenging solution therefore cleaning etching system etc. is also most important as the liquid in the present invention.Ensure accurate etching and processing by suitably implementing more newly arriving of the liquids such as above-mentioned etching solution, scavenging solution, and etching system maintains best state all the time after cleaning, therefore, it is possible to stably implement accurate etching and processing.
And, in the update method of the liquid for liquid-crystalline glasses etching system of the present invention, the nozzle spuing and aspirate for liquid has following structure, be and the entirety of the liquid-crystalline glasses assembly of etch processes object carried out the spuing of liquid, aspirated simultaneously, and possess the opening portion of the slit-shaped of the length of more than the length with liquid-crystalline glasses assembly.At this, the meaning of the nozzle in the present invention is specifically described.In Fig. 1; 11 is nozzle of the present invention; 12 is the liquid level of etching solution; 13 is the resist formed by photosensitive material image; 14 is the opening portion of opening thereon; 15 is liquid-crystalline glasses, and 16 is the protection material be made up of adhesive sheet, and protection becomes the metal deposition film 17 of the sensor drive driving circuit in pattern formation method.Above-mentioned be only the structure of liquid-crystalline glasses 15 one example.When starting shown in Fig. 1 etches, more shallow relative to the width K degree of depth J1 of opening portion 14, by spue stress and the sufficient effect that obtains needed for the etching solution in outlet opening portion from nozzle 11, therefore actually not can think to there is the obstacle that etching solution discharges.
And carry out etching reaction, and if as shown in Figure 2 opening portion 14 increase to degree of depth J2, then the distance that etching solution arrives open bottom from nozzle 11 increases, and the resistance R of the discharge direction be therefore subject to from etching solution becomes the trend of increase.Resistance R represents with R=J/K (J is degree of depth J1 or J2).Therefore, there is the renewal decrease in efficiency of liquid (be now etching solution) of the inside of opening portion 14 and the situation that declines of the etching characteristic of vertical direction, and when attachment reaction product in small nozzle and when piling up, it affects obviously.
Therefore known in Fig. 2, if the stress of suction is applied to resist opening portion 14 from nozzle 11, then stress acts on to J2 direction, using the resist opening portion 14 corresponding with nozzle 11 contact distance (length) as L and be multiplied by act on section J2 (degree of depth) × K (width) amass, namely suitable with the volume of J2 × K × L liquid is upgraded.By the renewal of liquid, if in the liquid of identical systems, then can by the liquid being equivalent to the amount of the cumulative volume aspirated by nozzle 11 at one time in be supplied to the such as bottom of liquid tank, promote that liquid upgrades, and especially maintains optimum regime by the etching characteristic of vertical direction thus.
Nozzle 20 of the present invention improves the undesirable condition produced because of etch processes by aforesaid method, not only effective to etch processes, also subtend etching system etc. scavenging solution spue effectively, therefore as shown in Figure 3, for spuing liquid to liquid-crystalline glasses assembly 22 entirety, and possesses the slit-shaped openings portion 21 of the length M of more than the length N with liquid-crystalline glasses assembly simultaneously.Having the liquid-crystalline glasses assembly 22 of multiple product 23 shown in Fig. 3, is blank (remaining white) between each product 23.In addition, Fig. 3 only represents concept, in reality unlikely.
Wherein, if can to spue liquid, then without the need to having the length of more than the length N of liquid-crystalline glasses assembly 22, such as, by linking multiple slit-shaped openings portion shorter than above-mentioned length to form nozzle to liquid-crystalline glasses assembly 22 entirety simultaneously.Nozzle can be considered roughly to be divided into about 2,3, to make these liquids that simultaneously spues, also this be considered in feasible region.But, when combining multiple nozzle, at the boundary member generation Karman vortex street of multiple liquid stream, no matter it affects size all can have influence on glass assembly.Therefore, except forcing unavoidable situation or can obtaining except the situation of larger interests with this, interests are less.Although there is this situation, is not only 1 slit-shaped openings portion, is still divided into multiple, all meet important document of the present invention, this point can be understood from above-mentioned explanation.
Fig. 4 is the sketch chart (above-mentioned Fig. 1, Fig. 2 and Fig. 3 can be thought of as a part of Fig. 4) applying soak type etching system of the present invention.In this figure, liquid-crystalline glasses assembly 22 is moved by conveying belt 24, while be subject to the effect of spuing of etching solution in the etching liquid cell 25 of device, and is subject to suction function.26 is injector (ejector), and 27 is the circuit that spues, and 28 is suction circuit, and they have the valve of flow rate adjustable respectively.At the pipe end of these circuit 27,28, nozzle 27a, the 28a with the function of described nozzle 11 establish across liquid-crystalline glasses assembly about 22, and pumping fluid in the mode becoming uniform stress by pump via return curcuit 29 at liquid tank internal reflux, realize the renewal of liquid thus.
As mentioned above, scavenging solution for cleaning by the solids component being attached to liquid-crystalline glasses assembly and generate for the device of its etch processes and the glass ingredient of accessory class and the reaction of etching solution is had as being used for the liquid of liquid-crystalline glasses etching system in the present invention.Further, this scavenging solution is formed using nitric acid, hydrogen peroxide, halate and acid-salt thereof as neccessary composition.
General raw material used so far can be used as the liquid-crystalline glasses assembly becoming object of the present invention.Usually, have the ultra-clear glasses for thin film transistor (TFT), backboard glass (also for ultra-clear glasses) etc. for contact panel accordingly, but the present invention also can be applicable to above-mentioned glass material and various glass material other than the above.
As relative to the etching reagent of the liquid-crystalline glasses assembly be made up of above-mentioned various glass material and medicament, usually use hydrochloric acid, sulfuric acid, nitric acid, fluoric acid, acid ammonium fluoride and neutral Neutral ammonium fluoride ... Deng.Further, the oxide compound of aluminium or potassium is such as there is in glass ingredient composition as stablizer.Therefore, the reaction product of composition producing etching solution and add as stablizer, and the problem producing that this reaction product separates out as the low hydrophobic salt of solubleness.
The material separated out such as has Na in soda ash system backboard glass
2o, K
2o, Ca
2o, MgO, Al
2o
3deng, also have BaO, ZrO etc. in ultra-clear glasses.By the positively charged ion of these solids components and the F of etching composition
-reaction generate the low hydrophobic salt of above-mentioned solubleness (hreinafter referred to as " salt ").
Along with the high-precision refinement of LCD product, also require the precision of the device of the manufacture about glass etching, utensil etc., in the liquid of high precision int, gap nozzle etc. are also subject to the impact of " salt ", are difficult to maintain precision with standing state.If with this kind of state, then, when " salt " residues in LCD product and liquid-crystalline glasses assembly, bad impact can be caused on the quality of product.
Therefore, above-mentioned " salt " will be cleaned in the present invention as another important important document.Being advanced the exploitation of above-mentioned scavenging solution by the present inventor, find out through repetition test, is best using nitric acid, hydrogen peroxide, halate and acid-salt thereof as principal constituent as scavenging solution.This part contriver recognizes that these the one-tenth grouping of nitric acid, hydrogen peroxide, hydracid or its acid-salt produces and closes best cleaning performance, the present invention one be based upon find this combination the fact on.How mentioned component is worked, does not also find out.In addition, the technology itself of above-mentioned " salt " is dissolved by mentioned component also not known.
Composition as the scavenging solution relative to the solids component in the present invention wishes nitric acid, the hydrogen peroxide of 0.2 ~ 2.5mol, the halate of 0.2 ~ 7.0mol or its acid-salt containing 0.5 ~ 3.0mol.In addition, preferred numerical range is the nitric acid of 0.5 ~ 2.0mol, the hydrogen peroxide of 0.5 ~ 2.0mol, 0.5 ~ 3.0mol halate and acid-salt thereof.The lower limit of nitric acid is 0.5mol, the lower limit of hydrogen peroxide is 0.2mol, if lower than this value, then oxidizing reaction, cleaning reaction can become slow.Further, if nitric acid is more than 3.0mol, then start to carry out nitric acid decomposition reaction, if hydrogen peroxide is more than 2.5mol, then start sharply to carry out ineffective treatment decomposition reaction, thus not preferred.With regard to halate or its acid-salt, if lower than 0.2mol, then chelatropic reaction is just slow, also can not dissolve, be therefore set in above-mentioned scope even if drop into more than the amount of 7.0mol.In the present invention, use this scavenging solution to clean the liquid-crystalline glasses assembly after etching and to relate to the device, utensil etc. of glass etching manufacture, the quality that can contribute to the LCD product maintaining high-precision refinement thus improves.
Further, the present invention, in liquid-crystalline glasses etching system, provides the nozzle spuing and aspirate being used in liquid.This nozzle is preferably and spues liquid to etch processes object and liquid-crystalline glasses component integration simultaneously, and possess the slit-shaped openings portion of the length of more than the length with liquid-crystalline glasses assembly, and for promoting that above-mentioned liquid upgrades, in liquid, possess the pump orifice of aspiration medicinal liquid.Can enumerate as its reason: by carrying out the spuing of liquid, aspirate simultaneously, the mutual interference caused by the flowing of multiple liquid can be avoided; When not aspirating when only spuing, wall in opening portion 14 produces eddy current and cannot obtain the smooth outflow of liquid, but the flowing of the rectification by the length direction that carries out aspirating the opening portion 14 that just can obtain along described Fig. 1, Fig. 2, can obtain the fine concavo-convex effect carrying out shaping to the side, opening portion formed by etching.In addition, the situation of laminar flow and turbulent flow is also considered as above-mentioned flowing.
Liquid nozzle of the present invention not only uses when implementing the washing out method based on the scavenging solution of the solids component generated in liquid-crystalline glasses etching system, is certainly also used in etch processes.Namely, in the liquid in the present invention, etching reagent and etching solution and the scavenging solution etc. containing solids component become object.Further, no matter in their which work for the treatment of, be and promote that liquid upgrades and uses nozzle of the present invention.
Invention effect
Scavenging solution involved in the present invention as above forms and plays a role, play the etching for carrying out liquid-crystalline glasses with the state of the environment maintaining the best, and promote the renewal of the liquid being used for liquid-crystalline glasses etching system, obtain the effect of the liquid-crystalline glasses assembly of high-quality thus.And, according to the present invention by the liquid that spues to liquid-crystalline glasses component integration simultaneously, and aspirate above-mentioned liquid simultaneously, and remove the reaction product of glass ingredient and etching solution completely as far as possible, play thus and realize high-precision glass etching, and the effect of the liquid-crystalline glasses assembly of high-quality can be obtained.And, liquid nozzle involved in the present invention is as above formed, and to spue liquid to liquid-crystalline glasses component integration simultaneously, and apply effect in the mode of aspirating above-mentioned liquid, therefore for the solids component be made up of reaction product, the precision of the device, utensil etc. that relate to the manufacture of glass etching can be remained high precision by cleaning this solids component, and realize the glass etching of high-quality.
Accompanying drawing explanation
Fig. 1 is the cross sectional illustration figure of the relation represented between liquid nozzle involved in the present invention and the carrying out of etching reaction.
Fig. 2 is the cross sectional illustration figure representing the state that identical reaction is carried out further.
Fig. 3 be represent possess liquid-crystalline glasses assembly and there is this liquid-crystalline glasses assembly length more than the vertical view of an example of nozzle of the present invention in slit-shaped openings portion of length.
Fig. 4 is the cross sectional illustration figure of the example representing the device directly used in the enforcement of engraving method involved in the present invention.
In figure: 11-nozzle, 12-liquid level, 13-resist, 14-opening portion, 15-liquid-crystalline glasses; 16-protects material, 17-metal deposition film, 20-nozzle, the example in 21-slit-shaped openings portion, 22-liquid-crystalline glasses assembly; 23-product, 24-conveying belt, 25-etching liquid cell, 26-injector.
Embodiment
< embodiment >
Below, the present invention is further described by embodiment.In update method for the liquid of liquid-crystalline glasses etching system involved in the present invention, use the described etching system shown in Fig. 4.Specifically, be configured in the etching liquid cell 25 of filling liquid, configure spuing of liquid across liquid-crystalline glasses assembly about 22 and use nozzle 27a and suction nozzle 28a, and carry out the spuing of liquid under the state of soaking said nozzle 27a, 28a in liquid, aspirate, and carry out utilizing the spuing of said nozzle 27a, 28a simultaneously, aspirate, uniform stress is applied to liquid, promotes the renewal of liquid thus.
Liquid-crystalline glasses assembly 22 is subject to the effect of spuing of etching solution while by conveying belt 24 movement in etching liquid cell 25, and is subject to suction function.Further, with reference to the described explanation of figure 4 be all the content of embodiment.Further, certainly directly washing unit is formed by etching system.When confirming cleaning performance, use the etching system of Fig. 4 to implement the etching of liquid-crystalline glasses, its result, use the pipe arrangement of having separated out the solids component generated by the reaction of glass ingredient and etching solution, and be impregnated in scavenging solution involved in the present invention.
In addition, using backboard glass as above-mentioned liquid-crystalline glasses, being etched by being impregnated into this general engraving method in the etching solution that is made up of fluoric acid and hydrochloric acid under the condition of 35 DEG C.Therefore, infer that the solids component to separate out in pipe arrangement inwall is positively charged ion, fluorine and negatively charged ion etc.Cut off a part for above-mentioned pipe arrangement and be dipped in scavenging solution of the present invention, as aftermentioned to obtaining mud containing the liquid of composition through cleaning processes and it can be used as sample to confirm the experiment of the effect of the scavenging solution upgraded based on liquid of the present invention.
Table 1 relates to the scavenging solution of the solids component in liquid-crystalline glasses etching system involved in the present invention.
Table 1
Concentration represents with mol, and beyond composition is water.
The dry incrustation scale of the ultra-clear glasses of 1g drying is dropped in the scavenging solution of 100g above-mentioned 1 ~ 7, after stirring 1 hour with 30 DEG C, filter and the filter paper that burns, utilize irradiation light (lamp) to residual mud irradiation light, measure the weight becoming " salt " of lapse rate drying regime, and study rate of fall-off.The results are shown in table 2.
Table 2
| Scavenging solution | Rate of fall-off |
| 1 | 62.4％ |
| 2 | 70.5％ |
| 3 | 95.6％ |
| 4 | 58.2％ |
| 5 | 45.6％ |
| 6 | 23.2％ |
| 7 | 5.3％ |
In the clean-out system 3 that rate of fall-off is maximum, the pipe arrangement being actually used in etching system and evolution reaction product soaks after 1 hour can confirm with liquid temperature 25 DEG C, the solids component separated out almost loses through cleaning, and the cleaning performance based on scavenging solution of the present invention is remarkable.Further, confirm after carrying out identical experiment to scavenging solution 4, the solids component of separating out remains about 4 one-tenth in area, is significantly improved compared with the comparative example of scavenging solution 5 ~ 7.Confirm the effect of scavenging solution 1 to 4 performance as the scavenging solution of object of the present invention thus.
Then, the experiment confirming the intensity of the liquid-crystalline glasses obtained by the present invention has been carried out.In the structure of Fig. 1, alkali-rich glass at 100mm × 150mm is formed with to the liquid-crystalline glasses assembly of the 0.55mm of circuit by resist, the nozzle of conical spray pattern is set from the distance from top 150mm, irradiate to press 0.15mpa in pipe arrangement, and make above-mentioned glass move+80mm with the speed of rotation of 6rpm, obtained glass is supplied examination glass assembly as one.And, utilize same sample, make the gap nozzle of 120mm length carry out injection suction from the distance from top 20mm with pump discharge flow 150 liters/min for sample, and make above-mentioned glass move+80mm with the speed of 6rpm, obtained glass is supplied examination glass assembly as another.
Above-mentioned 2 kinds of styles are suspended to strength at break trier as examination assembly, and the stress measured by putting on respective glass assembly surface produces the intensity when destroying.Its test-results is shown in table 3 as strength at break.
Table 3
| Circular cone is sprayed | Strength at break (Mpa) | Nozzle of the present invention | Strength at break (Mpa) |
| 1 | 357 | 1 | 467 |
| 2 | 366 | 2 | 485 |
| 3 | 374 | 3 | 472 |
Known according to table 3, compared with the nozzle of conical spray pattern, based on gap nozzle intensity involved in the present invention, in maximum example 2, increase by 33%, in minimum example 3, also increase by 26%, intensity significantly improves.
In addition, carried out the liquid-crystalline glasses for confirming to be obtained by the present invention, the experiment of slipperiness on etching and processing face.The ultra-clear glasses of 340mm × 460mm × 0.7mm is used as sample, the soak type etching system shown in Fig. 4 is used to etch this sample, until thickness of slab reaches 0.4mm, afterwards, utilize the abrasive be made up of cerium oxide that the sample machinery taken out from above-mentioned etching system is ground to 0.38mm.Relatively after the sample and washing of the drying of etching after washing after No. 3 liquids soak 60 seconds washing and drying, the quantity of the scar of more than 100 μm of above-mentioned inside glass that produced by above-mentioned grinding.
The results are shown in table 4.
Table 4
| Clean without liquid | Scar quantity | Liquid cleans | Scar quantity |
| 1 | 20 | 1 | 0 |
| 2 | 18 | 2 | 0 |
| 3 | 25 | 3 | 2 |
According to table 4, by means of only mechanical mill liquid, and in sample without the cleaning based on liquid (scavenging solution of the present invention), remain the scar of about 20, and scar residual in the sample utilizing scavenging solution process of the present invention is no more than 2, according to the Be very effective of the known liquid cleaning of this point.
The cleaning of above-mentioned liquid can prove that scavenging solution of the present invention is for eliminating scratch and recovering slipperiness and play significant effect, and this explanation can make the liquid-crystalline glasses obtained by etching technique of the present invention significantly reduce to produce because of scar to break.Further, known by the measurement of the strength at break of the liquid-crystalline glasses of table 3, the strength at break of liquid-crystalline glasses significantly improves, but judges that abrasive disappearance contributes to strength at break.On the other hand, known possess in the liquid renewal nozzle in the slit-shaped openings portion of the length of more than the length with liquid-crystalline glasses assembly involved in the present invention, can use spue than large 3 one-tenth of pyramid type spray pattern powerful, suction force.Therefore, can complement each other with in above-mentioned effect according to the present invention, effectively manufacture high-precision liquid-crystalline glasses assembly.
According to the present invention so formed, glass etching processing can be carried out under ideal conditions.And, scavenging solution involved in the present invention and liquid nozzle is used to clean, almost can clean the device, utensil etc. of the manufacture relating to glass etching thus completely, and owing to maintaining their precision accurately, therefore, it is possible to maintain by scavenging solution of the present invention and liquid nozzle the performance relating to the device, utensil etc. of the manufacture of glass etching all the time with the state of the best, and by scavenging solution of the present invention and liquid nozzle cleaning glass material, the liquid-crystalline glasses assembly of high-quality can be manufactured thus.
Claims (4)
1., for a update method for the liquid of liquid-crystalline glasses etching system, it is characterized in that,
In the etching liquid cell of filling liquid, configure spuing of liquid use nozzle and suction nozzle,
Carry out the spuing of liquid under the state of soaking said nozzle in liquid, aspirate,
Carry out using the spuing of said nozzle, aspirating simultaneously, and apply uniform stress to liquid, promote the renewal of liquid thus.
2., for a liquid renewal nozzle for liquid-crystalline glasses etching system, it is characterized in that,
Described liquid renewal nozzle is ejection for liquid and suction nozzle,
Described liquid renewal nozzle possesses: slit-shaped openings portion, in order to spue to the entirety of etch processes object and liquid-crystalline glasses assembly simultaneously, aspiration medicinal liquid and have the length of more than the length of liquid-crystalline glasses assembly.
3. the renewal liquid for liquid-crystalline glasses etching system, its for for the liquid of liquid-crystalline glasses etching system being that cleaning is attached to liquid-crystalline glasses assembly, the device that uses in the etch processes of liquid-crystalline glasses assembly and accessory class, the scavenging solution of solids component that generated by the reaction of glass ingredient and etching solution, wherein
This renewal liquid using nitric acid, hydrogen peroxide, halate or its acid-salt as neccessary composition.
4. the renewal liquid for liquid-crystalline glasses etching system according to claim 3, wherein,
The halate of the nitric acid containing 0.5 ~ 3.0mol, the hydrogen peroxide of 0.2 ~ 2.5mol and 0.2 ~ 7.0mol or its acid-salt.
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| PCT/JP2012/082088 WO2014091561A1 (en) | 2012-12-11 | 2012-12-11 | Method for renewing chemical solution used for device for etching liquid crystal glass, nozzle for chemical solution renewal, and chemical solution for renewal |
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| Publication Number | Publication Date |
|---|---|
| CN104837784A true CN104837784A (en) | 2015-08-12 |
| CN104837784B CN104837784B (en) | 2017-03-01 |
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| CN201280077613.4A Active CN104837784B (en) | 2012-12-11 | 2012-12-11 | For the update method of the medicinal liquid of liquid-crystalline glasses Etaching device, medicinal liquid renewal nozzle and renewal medicinal liquid |
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| JP (1) | JP5986223B2 (en) |
| KR (1) | KR101681441B1 (en) |
| CN (1) | CN104837784B (en) |
| HK (1) | HK1208855A1 (en) |
| WO (1) | WO2014091561A1 (en) |
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| JP2005231919A (en) * | 2004-02-17 | 2005-09-02 | Seiko Epson Corp | Etching liquid, etching method, base plate with recessed part, micro lens base plate, transmission type screen, and rear type projector |
| KR100835745B1 (en) * | 2006-12-29 | 2008-06-09 | 최찬규 | Method for slimming glass |
| CN101630635B (en) * | 2009-08-25 | 2011-11-30 | 满纳韩宏电子科技(南京)有限公司 | glass substrate etching device |
| JP5382342B2 (en) * | 2009-11-30 | 2014-01-08 | セイコーエプソン株式会社 | Nozzle, etching solution supply device and etching method |
| WO2012111602A1 (en) * | 2011-02-17 | 2012-08-23 | シャープ株式会社 | Wet etching apparatus and wet etching method |
| JP5492164B2 (en) * | 2011-09-09 | 2014-05-14 | 国立大学法人大阪大学 | Surface processing method and surface processing apparatus |
-
2012
- 2012-12-11 WO PCT/JP2012/082088 patent/WO2014091561A1/en active Application Filing
- 2012-12-11 CN CN201280077613.4A patent/CN104837784B/en active Active
- 2012-12-11 KR KR1020157015312A patent/KR101681441B1/en active IP Right Grant
- 2012-12-11 JP JP2014551770A patent/JP5986223B2/en active Active
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2015
- 2015-09-18 HK HK15109192.0A patent/HK1208855A1/en unknown
Also Published As
| Publication number | Publication date |
|---|---|
| JP5986223B2 (en) | 2016-09-06 |
| KR20150083909A (en) | 2015-07-20 |
| WO2014091561A1 (en) | 2014-06-19 |
| JPWO2014091561A1 (en) | 2017-01-05 |
| HK1208855A1 (en) | 2016-03-18 |
| CN104837784B (en) | 2017-03-01 |
| KR101681441B1 (en) | 2016-11-30 |
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