CN104733990A - Extreme ultraviolet laser amplification device and use method thereof - Google Patents
Extreme ultraviolet laser amplification device and use method thereof Download PDFInfo
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- CN104733990A CN104733990A CN201510143579.1A CN201510143579A CN104733990A CN 104733990 A CN104733990 A CN 104733990A CN 201510143579 A CN201510143579 A CN 201510143579A CN 104733990 A CN104733990 A CN 104733990A
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- extreme ultraviolet
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Abstract
The invention relates to an extreme ultraviolet laser amplification device and a use method thereof. The extreme ultraviolet laser amplification device comprises a light source, wherein a beam splitting piece is installed at one side of the light source and divides the light source into a stimulation light beam and a driving light beam, a delay device is installed at one side of the stimulation light beam, a first total reflective mirror and a second total reflective mirror are installed at one side of the delay device, an energy controller is installed between the first total reflective mirror and the second total reflective mirror, a 1/4 wave plate is installed under the second total reflective mirror, and a beam combination piece is installed under the 1/4 wave plate; a third total reflective mirror is installed under the driving light beam and located at one side of the beam combination piece, a focusing lens is installed at the other side of the beam combination piece, a gas box is installed at one side of the focusing lens, an aluminum film is installed at one side of the gas box, and extreme ultraviolet laser is arranged at one side of the aluminum film. The extreme ultraviolet laser amplification device and the use method thereof are simple in structure, easy to operate and high in practicability, not only can be used for generation and amplification of extreme ultraviolet laser, but also can be used for excited state feather research of other atom and molecule gas.
Description
Technical field
The present invention relates to a kind of extreme ultraviolet laser amplifying device and using method thereof, the driving light source utilizing particular design and the inert gas being in excitation state interact produce and amplify high order harmonic component, thus obtain extreme ultraviolet laser, be applicable to the field such as generation and amplification of extreme ultraviolet laser (high order harmonic component), be also applicable to the dynamics research field of excitation state gas (atom or molecule).
Background technology
EUV light source is of crucial importance and indispensable in modern production or life.Such as, in modern production, EUV light source plays an important role in fields such as the processing of high accuracy micro-nano structure, high accuracy engraving, high accuracy imagings; In the modern life, CT (Computed Tomography, CT scan), DR (Digital Radiography, radiography) extensive use, required light source is also extreme ultraviolet and even X ray wave band.But the performance in extreme ultraviolet laser source is obviously better than common EUV light source, this is because extreme ultraviolet laser source is coherent source, phase information reliably can be obtained more accurately.
Extreme ultraviolet laser generally obtains (high field high-order harmonics spectrum produces higher-order nonlinear system, and the high frequency multiplication obtaining fundamental frequency light exports, thus obtains extreme ultraviolet laser) with the form of high order harmonic component, but the raw and inefficiency of this mode pole difficult labour.Therefore, the present invention is proposed.
Summary of the invention
For the above-mentioned technical problem of prior art, the object of the present invention is to provide a kind of extreme ultraviolet laser amplifying device and using method thereof, interact produce and amplify high order harmonic component with the inert gas being in excitation state by the driving light source of particular design, thus obtain the output of efficient high order harmonic component, a high order harmonic component generation efficiency order of magnitude (ten times) higher than the efficiency of traditional high order harmonic component production method of the method, provide not only the new tool that extreme ultraviolet laser efficiently exports, and will the tremendous expansion of association area be promoted.
For achieving the above object, the present invention is achieved by the following technical solutions:
A kind of extreme ultraviolet laser amplifying device, comprise light source, the side of described light source is provided with beam splitting chip, light source is divided into excitation beam and drives light beam by described beam splitting chip, the side of described excitation beam is provided with time-delay mechanism, the side of described time-delay mechanism is provided with the first total reflective mirror and the second total reflective mirror, described first total reflective mirror is positioned at the top of the second total reflective mirror, between described first total reflective mirror and the second total reflective mirror, energy controller is installed, and the below of the second total reflective mirror is provided with quarter wave plate, the below of described quarter wave plate is provided with closes bundle sheet; The below of described driving light beam is provided with the 3rd total reflective mirror, described 3rd total reflective mirror is positioned at the side of closing bundle sheet, the described opposite side closing bundle sheet is provided with condenser lens, the side of described condenser lens is provided with gas box, the side of described gas box is provided with aluminium film, and the side of described aluminium film is extreme ultraviolet laser, because extreme ultraviolet laser is easily by Atmospheric Absorption, so whole interaction process is placed in vacuum environment, therefore gas box, aluminium film and extreme ultraviolet laser are all placed in vacuum environment.
Described energy controller comprises half-wave plate and analyzer, and described half-wave plate is positioned at the top of analyzer, by the rotary tuning energy of half-wave plate.
Described time-delay mechanism is for forming right angle reflector by two total reflective mirrors and being placed on time delay guide rail.
A using method for extreme ultraviolet laser amplifying device, comprises the following steps:
(1) driving light source, is divided into excitation beam and driving light beam by beam splitting chip by light source;
(2) excitation beam in step (1) is regulated time delay between two bundle laser by time-delay mechanism, and regulate the output energy of excitation beam by the energy controller of half-wave plate and analyzer composition; The ellipse degree of bias of excitation beam is regulated by quarter wave plate;
(3) the driving light beam in the excitation beam in step (2) and step (1) is carried out conjunction bundle by closing bundle sheet, then focus on gas box place by condenser lens;
(4) the conjunction Shu Jiguang after focusing in step (3) and the inert gas in gas box are interacted and produce and amplify high order harmonic component, the high order harmonic component of output carries out the filtration of fundamental frequency light by aluminium film, finally obtain extreme ultraviolet laser source.
Extreme ultraviolet laser of the present invention produce and amplification principle as follows: first, inert gas (or all the other atom and molecule gases) is energized into high energy excitation state by excitation beam; Then drive light beam and the inert gas being in high energy excitation state interact (high-order nonlinear process) produce and amplify high order harmonic component; Finally, the mixed light beam of output falls fundamental frequency light by aluminium membrane filtration, the final extreme ultraviolet laser obtaining amplification.Generally, drive light beam and the inert gas being in ground state (not being excited) also to interact generation high order harmonic component, but inefficiency; But inert gas is by interacting with driving light beam after excitation beam preexciting again, and the high order harmonic component of output can obtain the enhancing of an order of magnitude (ten times), thus obtains the extreme ultraviolet laser output of amplifying.
Beneficial effect of the present invention is as follows:
1, time-delay mechanism is for regulating the time delay of two bundle laser, and the pulse arrival gas box making the pulse of excitation beam prior to driving light beam, thus realize the preexciting of inert gas;
2, the energy controller of half-wave plate and analyzer composition is for regulating the output energy of excitation beam, makes its power density at gas box place close to the power density needed for ionized inert gas;
3, quarter wave plate is for regulating the ellipse degree of bias of excitation beam, thus suppresses the spontaneous radiation of high order harmonic component, improves the excitation state inverted population of inert gas;
4, drive light beam to produce high order harmonic component for driving the inert gas that is stimulated, therefore it is greater than power density needed for ionized inert gas at the power density requirements at gas box place;
The present invention is divided into excitation beam by special light path design and drives light beam in time domain, excitation beam is mainly used in excited inert gas and produces excitation state (inert gas is energized into excitation state from ground state), drives light beam to be mainly used in driving inert gas produce and amplify high order harmonic component.These apparatus and method can be used for generation and the amplification of extreme ultraviolet laser, also can be used for the dynamics research of excitation state gas (atom or molecule); The extreme ultraviolet laser utilizing this device to produce can be used for detection and the engraving of micro-nano structure, and what also can be used for inner tangent plane penetrates shooting.This device light light conversion efficiency is high, simple to operate, and applicability is strong.
Structure of the present invention is simple, operates simple and easy, and applicability is strong, not only may be used for generation and the amplification of extreme ultraviolet laser, and may be used for the excitation state characteristic research of all the other atom and molecule gases.
Accompanying drawing explanation
Fig. 1 is extreme ultraviolet laser amplifying device schematic diagram of the present invention;
Fig. 2 is the device schematic diagram of the embodiment of the present invention 1;
Fig. 3 is the output high order harmonic component spectrum of the embodiment of the present invention 1 and the graph of a relation of delay switch;
Fig. 4 is the output high order harmonic component spectrum of the embodiment of the present invention 1 and the graph of a relation of excitation beam power density;
Fig. 5 and Fig. 6 is the extreme ultraviolet laser amplification effect figure of the embodiment of the present invention 1.
Embodiment
Below in conjunction with specific embodiment, the present invention is further illustrated, but protection scope of the present invention is not limited to this.
As shown in Figure 1, extreme ultraviolet laser amplifying device of the present invention, comprise light source 13, the side of light source 13 is provided with beam splitting chip 1, light source is divided into excitation beam 14 and drives light beam 15 by beam splitting chip 1, the side of excitation beam 14 is provided with time-delay mechanism 2, and time-delay mechanism 2 is for forming right angle reflector by two total reflective mirrors and being placed on time delay guide rail.The side of time-delay mechanism 2 is provided with the first total reflective mirror 9 and the second total reflective mirror 10, first total reflective mirror 9 is positioned at the top of the second total reflective mirror 10, between first total reflective mirror 9 and the second total reflective mirror 10, energy controller is installed, energy controller comprises half-wave plate 3 and analyzer 4, half-wave plate 3 is positioned at the top of analyzer 4, by the rotary tuning energy of half-wave plate 3.
The below of the second total reflective mirror 10 in the present invention is provided with quarter wave plate 5, and the below of quarter wave plate 5 is provided with closes bundle sheet 6; Drive the below of light beam 15 that the 3rd total reflective mirror 8 is installed, 3rd total reflective mirror 8 is positioned at the side of closing bundle sheet 6, the opposite side closing bundle sheet 6 is provided with condenser lens 7, the side of condenser lens 7 is provided with gas box 11, the side of gas box 11 is provided with aluminium film 12, and the side of aluminium film 12 is extreme ultraviolet laser 16, because extreme ultraviolet laser 16 is easily by Atmospheric Absorption, so whole interaction process is placed in vacuum environment, therefore gas box 11, aluminium film 12 and extreme ultraviolet laser 16 are all placed in vacuum environment.
The using method of extreme ultraviolet laser amplifying device of the present invention, comprises the following steps:
(1) driving light source 13, is divided into excitation beam 14 and driving light beam 15 by beam splitting chip 1 by light source;
(2) excitation beam 14 in step (1) is regulated time delay between two bundle laser by time-delay mechanism 2, and regulate the output energy of excitation beam 14 by the energy controller that half-wave plate 3 and analyzer 4 form; The ellipse degree of bias of excitation beam 14 is regulated by quarter wave plate 5;
(3) the driving light beam 15 in the excitation beam 14 in step (2) and step (1) is carried out conjunction bundle by closing bundle sheet 6, then focus on gas box 11 place by condenser lens 7;
(4) the conjunction Shu Jiguang after focusing in step (3) and the inert gas in gas box 11 are interacted and produce and amplify high order harmonic component, the high order harmonic component of output carries out the filtration of fundamental frequency light by aluminium film 12, finally obtain extreme ultraviolet laser source 16.
embodiment 1
Be illustrated in figure 2 and be applied to 800nm femtosecond laser and drive argon gas to produce efficient extreme ultraviolet to export experiment: 1 for 800nm beam splitting chip, and energy beam splitting ratio is 1:1; 2 is the controlled time-delay mechanism of 200mm light path; 3 is 800nm half-wave plate; 4 is reflective film polarizer, i.e. analyzer; 5 is the quarter wave plate of 800nm; 6 restraint sheet for 800nm closes; 7 is the condenser lens of focal length 500mm; Second total reflective mirror of 8 is the 3rd total reflective mirror, 9 of 800nm to be first total reflective mirror, 10 of 800nm be 800nm; 11 is length is the gas box of 20mm, and inside is filled with the argon gas that air pressure is 20torr; 12 is aluminium films that 500nm is thick; 17 be the U.S. be concerned with company produce 800nm Ti∶Sapphire laser femto-second laser, output parameter is 8mJ/40fs/1kHz; 18 is EUV light source special CCD(model Princeton Instruments, SX 400); 19 is common program control computers; 20 and 21 is program control lines.Time-delay mechanism 2 is connected with program control computer 19 by program control line with special CCD 18, and therefore, delays time to control and data acquisition have computer program controlled completing.
Detailed process is as follows: (1) connects experimental provision by shown in Fig. 2, and starts laser system and stored program controlled; (2) control time-delay mechanism 2 and regulate the time delay of two bundle laser, adjustable range is-5 ~ 80ps(psec, namely 10
-12s, positive sign represents the pulse of excitation beam 14 prior to the pulse arrival gas box 11 driving light beam 15); (3) regulated the output energy of excitation beam 14 by energy controller, make it in the power density 0 ~ 2 × 10 at gas box 11 place
14w/cm
2tunable, comprise the power density 1 × 10 needed for argon gas ionization
14w/cm
2; (4) regulated the ellipse degree of bias of excitation beam 14 by quarter wave plate 5, thus suppress the spontaneous radiation of high order harmonic component, about 10 ~ 20 ° of the anglec of rotation; (5) power density about 1.5 × 10 of light beam 15 at gas box 11 place is driven
14w/cm
2, interact with the argon gas being in excitation state and produce high order harmonic component, and record exported high order harmonic component signal by CCD.
Application extreme ultraviolet laser amplifying device as shown in Figure 2, the experiment Output rusults obtained as shown in figures 3 to 6, in Fig. 3, negative number representation argon gas not yet excites (being in ground state), it is just overlapping that laser is restrainted in null representation two, positive number represents that argon gas is excited (being in high energy excitation state), can find, the high order harmonic component productive rate after exciting is apparently higher than the high order harmonic component productive rate before exciting.Fig. 4 can find, only has the power density of excitation beam close to the power density 1 × 10 needed for argon gas ionization
14w/cm
2time neighbouring, the high order harmonic component of output just can be enhanced amplification.This is because, if the power density of excitation beam 14 is too low, be then not enough to produce enough high energy excited state particle numbers; If the power density of excitation beam 14 is too high, then cause bound state electronic remote from, thus become ionic state from excitation state, be unfavorable for generation and the amplification of high order harmonic component equally.In order to more clearly give expression to the amplification effect before and after exciting, we extract high order harmonic component output intensity and contrast from Fig. 3.As shown in Figure 5, output stage time is 19th ~ 33rd, and corresponding wavelength 24 ~ 42nm, can find, before exciting, the intensity of (negative) is only 0.2 × 10
6near, time overlapping, the output intensity of (zero) is even zero, and excites the intensity of rear (positive number) up to 2 × 10
6, strengthen nearly ten times; In addition, can also find, strengthen life-span about 30 picoseconds of effect.Equally, we extract separately 25th high order harmonic component (corresponding wavelength 32nm) and contrast, and as shown in Figure 6, also can find to there is similar enhancing effect.
The present invention is divided into excitation beam 14 by special light path design and drives light beam 15 in time domain, excitation beam 14 is mainly used in excited inert gas and produces excitation state (inert gas is energized into excitation state from ground state), drives light beam 15 to be mainly used in driving inert gas produce and amplify high order harmonic component.These apparatus and method can be used for generation and the amplification of extreme ultraviolet laser, also can be used for the dynamics research of excitation state gas (atom or molecule); The extreme ultraviolet laser utilizing this device to produce can be used for detection and the engraving of micro-nano structure, and what also can be used for inner tangent plane penetrates shooting.This device light light conversion efficiency is high, simple to operate, and applicability is strong.
Structure of the present invention is simple, operates simple and easy, and applicability is strong, not only may be used for generation and the amplification of extreme ultraviolet laser, and may be used for the excitation state characteristic research of all the other atom and molecule gases.
Above-described embodiment only illustrates inventive concept of the present invention for explaining, but not the restriction to rights protection of the present invention, all changes utilizing this design the present invention to be carried out to unsubstantiality, all should fall into protection scope of the present invention.
Claims (4)
1. an extreme ultraviolet laser amplifying device, it is characterized in that: comprise light source, the side of described light source is provided with beam splitting chip, light source is divided into excitation beam and drives light beam by described beam splitting chip, the side of described excitation beam is provided with time-delay mechanism, the side of described time-delay mechanism is provided with the first total reflective mirror and the second total reflective mirror, described first total reflective mirror is positioned at the top of the second total reflective mirror, between described first total reflective mirror and the second total reflective mirror, energy controller is installed, and the below of the second total reflective mirror is provided with quarter wave plate, the below of described quarter wave plate is provided with closes bundle sheet; The below of described driving light beam is provided with the 3rd total reflective mirror, described 3rd total reflective mirror is positioned at the side of closing bundle sheet, the described opposite side closing bundle sheet is provided with condenser lens, the side of described condenser lens is provided with gas box, the side of described gas box is provided with aluminium film, the side of described aluminium film is extreme ultraviolet laser, and described gas box, aluminium film and extreme ultraviolet laser are all placed in vacuum environment.
2. extreme ultraviolet laser amplifying device as claimed in claim 1, it is characterized in that: described energy controller comprises half-wave plate and analyzer, described half-wave plate is positioned at the top of analyzer.
3. extreme ultraviolet laser amplifying device as claimed in claim 1, is characterized in that: described time-delay mechanism is for forming right angle reflector by two total reflective mirrors and being placed on time delay guide rail.
4. a using method for extreme ultraviolet laser amplifying device, is characterized in that comprising the following steps: (1) driving light source, by beam splitting chip, light source is divided into excitation beam and driving light beam;
(2) excitation beam in step (1) is regulated time delay between two bundle laser by time-delay mechanism, and regulate the output energy of excitation beam by the energy controller of half-wave plate and analyzer composition; The ellipse degree of bias of excitation beam is regulated by quarter wave plate;
(3) the driving light beam in the excitation beam in step (2) and step (1) is carried out conjunction bundle by closing bundle sheet, then focus on gas box place by condenser lens;
(4) the conjunction Shu Jiguang after focusing in step (3) and the inert gas in gas box are interacted and produce and amplify high order harmonic component, the high order harmonic component of output carries out the filtration of fundamental frequency light by aluminium film, finally obtain extreme ultraviolet laser source.
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| CN201510143579.1A CN104733990A (en) | 2015-03-31 | 2015-03-31 | Extreme ultraviolet laser amplification device and use method thereof |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105136828A (en) * | 2015-09-14 | 2015-12-09 | 温州大学 | Device and method for measuring molecular nuclear distance |
| CN109546522A (en) * | 2018-11-29 | 2019-03-29 | 广东工业大学 | A kind of high repetition frequency extreme ultraviolet pulse generating device |
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| US6700905B1 (en) * | 1999-09-14 | 2004-03-02 | Japan Science And Technology Corporation | Ultrawide-band light pulse generation |
| CN204668714U (en) * | 2015-03-31 | 2015-09-23 | 绍兴文理学院 | A kind of extreme ultraviolet laser amplifying device |
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2015
- 2015-03-31 CN CN201510143579.1A patent/CN104733990A/en active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6700905B1 (en) * | 1999-09-14 | 2004-03-02 | Japan Science And Technology Corporation | Ultrawide-band light pulse generation |
| CN204668714U (en) * | 2015-03-31 | 2015-09-23 | 绍兴文理学院 | A kind of extreme ultraviolet laser amplifying device |
Non-Patent Citations (3)
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|---|
| N. HAY等: "high order harmonic generation in laser aligned molecules", 《PHYSICAL REVIEW A》 * |
| 卢发铭: "千赫兹飞秒激光驱动17-40nm高次谐波辐射研究", 《中国优秀硕士学位论文全文数据库基础科学辑》 * |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105136828A (en) * | 2015-09-14 | 2015-12-09 | 温州大学 | Device and method for measuring molecular nuclear distance |
| CN109546522A (en) * | 2018-11-29 | 2019-03-29 | 广东工业大学 | A kind of high repetition frequency extreme ultraviolet pulse generating device |
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