CN104656317A - Display device, array substrate and preparation method thereof - Google Patents
Display device, array substrate and preparation method thereof Download PDFInfo
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- CN104656317A CN104656317A CN201510098822.2A CN201510098822A CN104656317A CN 104656317 A CN104656317 A CN 104656317A CN 201510098822 A CN201510098822 A CN 201510098822A CN 104656317 A CN104656317 A CN 104656317A
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- cavity structure
- array base
- base palte
- supporting zone
- chock insulator
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1339—Gaskets; Spacers; Sealing of cells
- G02F1/13394—Gaskets; Spacers; Sealing of cells spacers regularly patterned on the cell subtrate, e.g. walls, pillars
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
- G02F1/1362—Active matrix addressed cells
- G02F1/136286—Wiring, e.g. gate line, drain line
- G02F1/136295—Materials; Compositions; Manufacture processes
Abstract
The embodiment of the invention provides a display device, an array substrate and a preparation method thereof. The array substrate is provided with a first surface, wherein a supporting area for supporting a spacer is arranged on the first surface; a cavity structure is arranged in the array substrate; the supporting area is positioned in an orthographic projection area of the first surface, of the cavity structure, so that when the supporting area is stressed by the spacer, a part, positioned between the cavity structure and the supporting area, of the array substrate, can be depressed towards the cavity structure. According to the embodiment of the invention, contact moire fringes caused by the displacement of the spacers can be avoided.
Description
Technical field
The embodiment of the present invention relates to display technique field, particularly relates to a kind of display device, array base palte and preparation method thereof.
Background technology
Existing Thin Film Transistor-LCD (Thin Film Transistor-Liquid Crystal Display, TFT-LCD) is made up of the array base palte be oppositely arranged, color membrane substrates and the liquid crystal layer between array base palte and color membrane substrates usually.Under normal circumstances, liquid crystal is instilled to form liquid crystal cell after array base palte and color membrane substrates box being encapsulated.Be provided with chock insulator matter between array base palte and color membrane substrates, chock insulator matter is connected with color membrane substrates usually.After color membrane substrates and array base palte encapsulate box, chock insulator matter longitudinally aligns with the TFT of array base palte usually.With reference to Fig. 1, the nearest one deck indicated with "/" shape diagonal line hatches of array base palte distance color membrane substrates is the first insulation course, distance color membrane substrates time near with " " one deck of indicating of shape diagonal line hatches is the second insulation course.
When display panels is subject to external force extruding, chock insulator matter deforms, thus it is thick with the box maintaining liquid crystal cell to produce reacting force.Meanwhile, in view of chock insulator matter array substrate also can have larger pressure, if external force is enough large, the pressure of chock insulator matter array substrate even can cause chock insulator matter to be shifted thus occur contact moire.
Summary of the invention
The object of the embodiment of the present invention is to provide a kind of display device, array base palte and preparation method thereof, to avoid being shifted the contact moire caused because of chock insulator matter.
For solving the problems of the technologies described above, the embodiment of the present invention provides scheme as follows:
The embodiment of the present invention provides a kind of array base palte, and described array base palte has first surface, described first surface has the supporting zone supporting chock insulator matter,
A cavity structure is provided with in described array base palte;
Described supporting zone is positioned at the orthogonal projection region of described cavity structure at described first surface, make described supporting zone when being subject to the pressure of described chock insulator matter, the part between described cavity structure and described supporting zone of described array base palte can cave in described cavity structure.
Preferably, described cavity structure is positioned at the insulation course of described array base palte.
Preferably, described cavity structure is positioned at the insulation course near described first surface.
Preferably, described array base palte is provided with at least one extends to described cavity structure via from a conducting region, described conducting region is positioned at the orthogonal projection region of described cavity structure at described first surface.
Preferably, described conducting region is arranged in the orthogonal projection region region except described supporting zone except of described cavity structure at described first surface.
The embodiment of the present invention also provides a kind of display device comprising above-described array base palte.
The preparation method of the embodiment of the present invention also a kind of array base palte, comprising:
Form described array base palte, described array base palte has first surface, described first surface has the supporting zone supporting chock insulator matter, is provided with a cavity structure in described array base palte; Described supporting zone is positioned at the orthogonal projection region of described cavity structure at described first surface, make described supporting zone when being subject to the pressure of described chock insulator matter, the part between described cavity structure and described supporting zone of described array base palte can cave in described cavity structure.
Preferably, described cavity structure is positioned at the insulation course of described array base palte.
Preferably, described cavity structure is positioned at the insulation course near described first surface.
Preferably, described array base palte is provided with at least one extends to described cavity structure via from a conducting region, described conducting region is positioned at the orthogonal projection region of described cavity structure at described first surface.
Preferably, described conducting region is arranged in the orthogonal projection region region except described supporting zone except of described cavity structure at described first surface.
As can be seen from the above, the embodiment of the present invention at least has following beneficial effect:
Display panel stressed larger time described supporting zone be subject to the pressure of described chock insulator matter and chock insulator matter caved in described cavity structure, thus to avoid because chock insulator matter is shifted the contact moire caused.In addition, decrease the requirement in chock insulator matter material deformation ability, thus reduce the difficulty in chock insulator matter selection.
Accompanying drawing explanation
Fig. 1 represents the structural representation of existing TFT-LCD;
Fig. 2 A, 2B, 2C represent the virgin state of the topology example one, two, three of a kind of array base palte that the embodiment of the present invention provides respectively;
Fig. 3 A, 3B, 3C represent the pressured state of the topology example one, two, three of a kind of array base palte that the embodiment of the present invention provides respectively;
Fig. 4 A represents the via example that topology example one basis of a kind of array base palte that the embodiment of the present invention provides provides further;
Fig. 4 B represents another via example that topology example one basis of a kind of array base palte that the embodiment of the present invention provides provides further;
Fig. 5 represents the structural representation under the TFT-LCD display panel virgin state that the better embodiment of the embodiment of the present invention provides;
Fig. 6 represent TFT-LCD display panel that the better embodiment of the embodiment of the present invention provides be subject to external force squeezed state under structural representation;
Fig. 7 represent the first insulation course that the better embodiment of the embodiment of the present invention provides compressed by chock insulator matter after metamorphosis schematic diagram;
What Fig. 8 represented the array base palte that the better embodiment of the embodiment of the present invention provides overlooks design sketch;
The preparation flow schematic diagram of this cavity structure when Fig. 9 represents that cavity structure that the better embodiment of the embodiment of the present invention provides is in the position that Fig. 5 provides.
Embodiment
For making the object of the embodiment of the present invention, technical scheme and advantage clearly, below in conjunction with the accompanying drawings and the specific embodiments the embodiment of the present invention is described in detail.
Fig. 2 A, 2B, 2C represent the virgin state of the topology example one, two, three of a kind of array base palte that the embodiment of the present invention provides respectively; Fig. 3 A, 3B, 3C represent the pressured state of the topology example one, two, three of a kind of array base palte that the embodiment of the present invention provides respectively.With reference to Fig. 2 A, 2B, 2C, 3A, 3B, 3C, the embodiment of the present invention provides a kind of array base palte 1, and described array base palte 1 has first surface 2, described first surface 2 has the supporting zone 4 supporting chock insulator matter 3, it is characterized in that:
A cavity structure 5 is provided with in described array base palte 1;
Described supporting zone 4 is positioned at the orthogonal projection region of described cavity structure 5 at described first surface 2, make described supporting zone 4 when being subject to the pressure of described chock insulator matter 3, the part between described cavity structure 5 and described supporting zone 4 of described array base palte 1 can cave in described cavity structure 5.
Visible, display panel (as display panels) stressed larger time as described in supporting zone be subject to as described in chock insulator matter pressure and make chock insulator matter to as described in cavity structure cave in, thus to avoid because chock insulator matter is shifted the contact moire caused.In addition, decrease the requirement in chock insulator matter material deformation ability, thus reduce the difficulty in chock insulator matter selection.
Wherein, described cavity structure 5 can be prism structure, such as rectangular structure, up-narrow and down-wide trapezium structure or trapezium structure wide at the top and narrow at the bottom; Such as, or described cavity structure 5 also can be arc-shaped structure, ellipsoidal configuration or tube structure etc.; Or, also can be other arbitrary structures.
In topology example one shown in Fig. 2 A, 3A, described supporting zone 4 illustrates with thick line, described cavity structure 5 illustrates at the dotted line of the orthogonal projection region of described first surface 2 band arrow, the described region of first surface 2 between two arrows comprises the region shown in thick line, thus shows described supporting zone 4 and be positioned at described orthogonal projection region.
Under the virgin state of the topology example one shown in Fig. 2 A, described cavity structure 5 is rectangular structure.Correspondingly, under the pressured state of the topology example one shown in Fig. 3 A, display panel is squeezed, described chock insulator matter 3 is subject to the pressure of color membrane substrates, thus pressure F is produced to described supporting zone 4, the part between described cavity structure 5 and described supporting zone 4 of described array base palte 1 is caved in described cavity structure 5, thus avoids described chock insulator matter 3 and be shifted.
In topology example two shown in Fig. 2 B, 3B, described supporting zone 4 illustrates with thick line, described cavity structure 5 illustrates at the dotted line of the orthogonal projection region of described first surface 2 band arrow, the described region of first surface 2 between two arrows comprises the region shown in thick line, thus shows described supporting zone 4 and be positioned at described orthogonal projection region.
Under the virgin state of the topology example two shown in Fig. 2 B, described cavity structure 5 is trapezium structure wide at the top and narrow at the bottom.Correspondingly, under the pressured state of the topology example two shown in Fig. 3 B, display panel is squeezed, described chock insulator matter 3 is subject to the pressure of color membrane substrates, thus pressure F is produced to described supporting zone 4, the part between described cavity structure 5 and described supporting zone 4 of described array base palte 1 is caved in described cavity structure 5, thus avoids described chock insulator matter 3 and be shifted.
In topology example three shown in Fig. 2 C, 3C, described supporting zone 4 illustrates with thick line, described cavity structure 5 illustrates at the dotted line of the orthogonal projection region of described first surface 2 band arrow, the described region of first surface 2 between two arrows comprises the region shown in thick line, thus shows described supporting zone 4 and be positioned at described orthogonal projection region.
Under the virgin state of the topology example three shown in Fig. 2 C, described cavity structure 5 is up-narrow and down-wide trapezium structure.Correspondingly, under the pressured state of the topology example three shown in Fig. 3 C, display panel is squeezed, described chock insulator matter 3 is subject to the pressure of color membrane substrates, thus pressure F is produced to described supporting zone 4, the part between described cavity structure 5 and described supporting zone 4 of described array base palte 1 is caved in described cavity structure 5, thus avoids described chock insulator matter 3 and be shifted.
In the embodiment of the present invention, described cavity structure 5 can be positioned at the TFT structure of described array base palte 1, but may array substrate electric property affect greatly like this, in order to avoid this problem, described cavity structure 5 can be positioned at the insulation course of described array base palte 1.
Further, in order to make the part between described cavity structure and described supporting zone of described array base palte more thinner to have larger deformability, described cavity structure 5 specifically can be positioned at the insulation course near described first surface 2.
In the embodiment of the present invention, in order to alleviate the weight of array base palte, make display panel more lightening, with reference to the example that Fig. 4 A provides on topology example one basis, Ke Yiyou:
Described array base palte 1 is provided with at least one extends to described cavity structure 5 via 7 from a conducting region 6, described conducting region 6 is positioned at the orthogonal projection region of described cavity structure 5 at described first surface 2.
In the embodiment of the present invention, in order to strengthen the mobility of liquid crystal, to reduce the generation of gravity mura phenomenon; And, the acting force of liquid crystal antagonism ambient pressure is increased in order to there be liquid crystal to flow out from cavity when display panels is squeezed serious, thus realize maintaining the thick effect of box, see another example that Fig. 4 B provides on topology example one basis, Ke Yiyou:
Described conducting region 6 is arranged in described cavity structure 5 in the region of the orthogonal projection region of described first surface 2 except described supporting zone 4.
Like this, avoid via and pushed down by chock insulator matter, make liquid crystal can free flow between described cavity structure and liquid crystal cell.
The embodiment of the present invention also provides a kind of display device, comprises above-described array base palte.
The embodiment of the present invention also provides a kind of preparation method of array base palte, comprising:
Form described array base palte, described array base palte has first surface, described first surface has the supporting zone supporting chock insulator matter, is provided with a cavity structure in described array base palte; Described supporting zone is positioned at the orthogonal projection region of described cavity structure at described first surface, make described supporting zone when being subject to the pressure of described chock insulator matter, the part between described cavity structure and described supporting zone of described array base palte can cave in described cavity structure.
Wherein, described cavity structure can be positioned at the insulation course of described array base palte.
Further, described cavity structure can be positioned at the insulation course near described first surface.
In the embodiment of the present invention, Ke Yiyou:
Described array base palte is provided with at least one extends to described cavity structure via from a conducting region, described conducting region is positioned at the orthogonal projection region of described cavity structure at described first surface.
In the embodiment of the present invention, described conducting region can be arranged in the orthogonal projection region region except described supporting zone except of described cavity structure at described first surface.
For the embodiment of the present invention being set forth clearly clear, provide the better embodiment of the embodiment of the present invention below.
This better embodiment provides a kind of display device, array base palte and preparation method.
This better embodiment has prepared a kind of liquid crystal display and display panels, on basis prepared by available liquid crystal display and display panels, by changing the modular construction of array base palte, thus reach and can maintain the thick object of liquid crystal cell dexterously, effectively can also reduce the defect of gravity mura in addition.
This better embodiment in particular to a kind of liquid crystal indicator, array base palte and preparation method.Array base palte comprises array base palte conventional at present and arranges, difference is the structure of array base palte: the array base palte position that the chock insulator matter (as color membrane substrates stilt) between color membrane substrates with array base palte is corresponding arranges one deck cavity structure, above the TFT mechanism being arranged on array base palte corresponding to chock insulator matter.Part between this cavity structure and chock insulator matter is by can the material of deformation form, thus when chock insulator matter is subject to downward pressure, this part can cave in the direction of TFT mechanism, to cushion this pressure, also just avoids the displacement of chock insulator matter thus.
This cavity structure specifically can be arranged on the second insulation course, and (distance color membrane substrates is secondary near, with " " shape diagonal line hatches sign) in, and surperficial altogether with the first insulation course (distance color membrane substrates is nearest, indicates with "/" shape diagonal line hatches), as shown in Figure 5.This cavity structure specifically can also to be arranged in the second insulation course and away from the first insulation course.Certainly, in order to realize larger buffering, this cavity structure specifically can also be arranged in the first insulation course, with make between this cavity structure and chock insulator matter by can the part that formed of shape-changing material enough thin.Wherein, the first insulation course and the second insulation course can be all silicon nitride layers, also can be made up of the insulating material of similar nature.
Like this, when display panel is subject to external force extruding, as shown in Figure 6, because the part between this cavity structure and chock insulator matter under stress can deformation, the cavity volume of this cavity structure can diminish, thus in a disguised form adds the deformability of chock insulator matter.Fig. 7 shows the first insulation course and is subject to ambient pressure because of display panel thus metamorphosis after being compressed by chock insulator matter.
Further, the part between this cavity structure and chock insulator matter can be got through, form via, to alleviate the weight of array base palte, thus reach the lightening effect of display device.The number of via can be one or more.For the situation that via number is multiple, with reference to Fig. 8, via can distribute at interval, to ensure this part, as the first insulation course, for the support degree of chock insulator matter.
In addition, in order to avoid gravity mura problem, in the via formed, have at least a via can walk around chock insulator matter and opening in liquid crystal cell, thus make interiorly with liquid crystal cell in this cavity structure to be communicated with by this at least one via.Like this, because this cavity structure is communicated with liquid crystal cell inside, liquid crystal can circulate naturally, farthest can reduce the possibility that gravity mura phenomenon occurs.
Be described in detail as follows for the array base-plate structure shown in Fig. 5, Fig. 6: be that a state under ambient pressure is not occurring display panel shown in Fig. 5, the normal contact array substrate of chock insulator matter, box is normally thick, under display panel is subject to External Force Acting, due to cavity structure corresponding below chock insulator matter, effectively can there is deformation in it, by parallel form before, there is bending to cavity structure direction, thus effectively can be reached an effect of chock insulator matter generation deformation by its deformation.Bending situation can see Fig. 6.In addition, because liquid crystal cell inside can be communicated with cavity structure inside by via, liquid crystal can at these two spatial flows, when display panel be subject to external force extrude serious, because liquid crystal flows out to liquid crystal cell inside outward in cavity structure inside, an acting force of liquid crystal cell internal resistance ambient pressure can be increased, thus also can realize maintaining the thick effect of box.In addition, due to the existence of via, the effect that display panel is lightening can also be realized.
This better embodiment particularly relates to a kind of modular construction of array base palte, by changing the structure of array base palte, pass through cavity structure, effectively can maintain liquid crystal cell by the part generation deformation between this cavity structure and chock insulator matter thick, but also effectively can be avoided the generation of the defects such as gravity mura by the cavity capacity of this cavity structure and liquid crystal from the circulation naturally between this cavity structure and liquid crystal cell inside.The formation of via simultaneously can also realize the lightening effect of display panels.
This better embodiment is on basis prepared by existing display, by changing a kind of implementation method of display array panel construction.
This cavity structure is in the situation of the position that Fig. 5 provides, with reference to Fig. 9, this cavity structure can be prepared as follows:
Step 901, the second insulation course rete formed applies photoresist;
Step 902, carries out exposure imaging to described photoresist, forms the photoetching agent pattern only exposing this cavity structure corresponding region;
Step 903, adopts etching technics to etch away the partial insulative layer rete of this cavity structure corresponding region;
Step 904, stripping photoresist pattern, forms the second insulation course being provided with this cavity structure.
After prepared the second insulation course comprising this cavity structure according to above-mentioned steps 901 ~ step 903, the first insulation course prepared can be pressed together on this second insulation course, thus form array base palte.
Situation in first insulation course and coplanar with the upper surface of the second insulation course is arranged on for this cavity structure, the first insulation course comprising this cavity structure can have been prepared with reference to step 901 ~ step 903, then, this first insulation course is turned (making this cavity structure down) to be pressed together on the second insulation course of preparing, thus form array base palte.
And in the insulation course this cavity structure being arranged on to array base palte and with the situation on other insulation course surface altogether, after the cavity having prepared this cavity structure according to above-mentioned steps 901 ~ step 903, a film can be spread, so that insulating material above supporting in the process continuing the remainder making this cavity structure place insulation course by the mode of chemical vapor deposition on this cavity.
Certainly, if adopt material sputter procedure to make material above the cavity of this cavity structure, above-mentioned paving thin film also can be played a supporting role, thus does not cause in material sputter procedure, and the phenomenon of material tenesmus occurs.
Certainly, here the example that several typical cases that simply show cavity structure realize, those skilled in the art realize on the basis of principle clear, be easy to expect cavity structure other various implementation under above-mentioned various facilities and other possibility facilities, for saving length, do not repeat them here.
The above is only the embodiment of the embodiment of the present invention; should be understood that; for those skilled in the art; under the prerequisite not departing from embodiment of the present invention principle; can also make some improvements and modifications, these improvements and modifications also should be considered as the protection domain of the embodiment of the present invention.
Claims (11)
1. an array base palte, described array base palte has first surface, described first surface has the supporting zone supporting chock insulator matter, it is characterized in that:
A cavity structure is provided with in described array base palte;
Described supporting zone is positioned at the orthogonal projection region of described cavity structure at described first surface, make described supporting zone when being subject to the pressure of described chock insulator matter, the part between described cavity structure and described supporting zone of described array base palte can cave in described cavity structure.
2. array base palte according to claim 1, is characterized in that, described cavity structure is positioned at the insulation course of described array base palte.
3. array base palte according to claim 2, is characterized in that, described cavity structure is positioned at the insulation course near described first surface.
4. the array base palte according to claim 1,2 or 3, it is characterized in that, described array base palte is provided with at least one extends to described cavity structure via from a conducting region, described conducting region is positioned at the orthogonal projection region of described cavity structure at described first surface.
5. the array base palte according to claim 1,2 or 3, is characterized in that, described conducting region is arranged in the orthogonal projection region region except described supporting zone except of described cavity structure at described first surface.
6. a display device, is characterized in that, comprises the array base palte as described in claim arbitrary in claim 1 to 5.
7. a preparation method for array base palte, is characterized in that, comprising:
Form described array base palte, described array base palte has first surface, described first surface has the supporting zone supporting chock insulator matter, is provided with a cavity structure in described array base palte; Described supporting zone is positioned at the orthogonal projection region of described cavity structure at described first surface, make described supporting zone when being subject to the pressure of described chock insulator matter, the part between described cavity structure and described supporting zone of described array base palte can cave in described cavity structure.
8. preparation method according to claim 7, is characterized in that, described cavity structure is positioned at the insulation course of described array base palte.
9. preparation method according to claim 8, is characterized in that, described cavity structure is positioned at the insulation course near described first surface.
10. the array base palte according to claim 7,8 or 9, it is characterized in that, described array base palte is provided with at least one extends to described cavity structure via from a conducting region, described conducting region is positioned at the orthogonal projection region of described cavity structure at described first surface.
11. array base paltes according to claim 7,8 or 9, it is characterized in that, described conducting region is arranged in the orthogonal projection region region except described supporting zone except of described cavity structure at described first surface.
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| CN201510098822.2A CN104656317B (en) | 2015-03-06 | 2015-03-06 | A kind of display device, array base palte and preparation method thereof |
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| US20100201934A1 (en) * | 2009-02-12 | 2010-08-12 | Tpo Displays Corp. | Display panel and method for forming the same |
| CN102955297A (en) * | 2012-10-22 | 2013-03-06 | 京东方科技集团股份有限公司 | Liquid crystal display panel and manufacturing method thereof |
| CN103885251A (en) * | 2014-03-07 | 2014-06-25 | 京东方科技集团股份有限公司 | Display panel, manufacturing method thereof and display device |
| CN103969892A (en) * | 2014-04-24 | 2014-08-06 | 京东方科技集团股份有限公司 | Array substrate, preparation method of array substrate and display panel |
| CN104035239A (en) * | 2014-05-08 | 2014-09-10 | 京东方科技集团股份有限公司 | Substrate and display device |
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- 2015-03-06 CN CN201510098822.2A patent/CN104656317B/en active Active
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20100201934A1 (en) * | 2009-02-12 | 2010-08-12 | Tpo Displays Corp. | Display panel and method for forming the same |
| CN102955297A (en) * | 2012-10-22 | 2013-03-06 | 京东方科技集团股份有限公司 | Liquid crystal display panel and manufacturing method thereof |
| CN103885251A (en) * | 2014-03-07 | 2014-06-25 | 京东方科技集团股份有限公司 | Display panel, manufacturing method thereof and display device |
| CN103969892A (en) * | 2014-04-24 | 2014-08-06 | 京东方科技集团股份有限公司 | Array substrate, preparation method of array substrate and display panel |
| CN104035239A (en) * | 2014-05-08 | 2014-09-10 | 京东方科技集团股份有限公司 | Substrate and display device |
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