CN104641286B - Wavelength conversion type spatial light modulating apparatus - Google Patents
Wavelength conversion type spatial light modulating apparatus Download PDFInfo
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- CN104641286B CN104641286B CN201380048513.3A CN201380048513A CN104641286B CN 104641286 B CN104641286 B CN 104641286B CN 201380048513 A CN201380048513 A CN 201380048513A CN 104641286 B CN104641286 B CN 104641286B
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/35—Non-linear optics
- G02F1/37—Non-linear optics for second-harmonic generation
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/30—Polarising elements
- G02B5/3083—Birefringent or phase retarding elements
- G02B5/3091—Birefringent or phase retarding elements for use in the UV
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
- G02F1/1362—Active matrix addressed cells
- G02F1/136277—Active matrix addressed cells formed on a semiconductor substrate, e.g. of silicon
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/29—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the position or the direction of light beams, i.e. deflection
- G02F1/292—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the position or the direction of light beams, i.e. deflection by controlled diffraction or phased-array beam steering
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/35—Non-linear optics
- G02F1/353—Frequency conversion, i.e. wherein a light beam is generated with frequency components different from those of the incident light beams
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70283—Mask effects on the imaging process
- G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133553—Reflecting elements
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/35—Non-linear optics
- G02F1/353—Frequency conversion, i.e. wherein a light beam is generated with frequency components different from those of the incident light beams
- G02F1/3534—Three-wave interaction, e.g. sum-difference frequency generation
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F2203/00—Function characteristic
- G02F2203/12—Function characteristic spatial light modulator
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F2203/00—Function characteristic
- G02F2203/18—Function characteristic adaptive optics, e.g. wavefront correction
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- Optics & Photonics (AREA)
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- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Optical Modulation, Optical Deflection, Nonlinear Optics, Optical Demodulation, Optical Logic Elements (AREA)
- Liquid Crystal (AREA)
Abstract
The wavelength conversion type spatial light modulating apparatus of the present invention possesses：Space modulating sections (10), with phase-modulation face (10a), it inputs the laser (L1) of the wavelength zone longer than ultra-violet (UV) band, and each phase to laser (L1) in multiple regions of two-dimensional arrangements is modulated and produces modulation laser (L2)；Wavelength conversion section (20), there is the light entrance face for receiving the modulation laser (L2) from space modulating sections (10) output, and the wavelength convert of laser (L2) will be modulated into the wavelength of ultra-violet (UV) band；And as transfer optical system (30), the phase-modulation face of space modulating sections (10) and the light entrance face of wavelength conversion section (20) are combined in a manner of optically turning into conjugated system each other.Thus, spatially phase modulated ultraviolet laser can be exported, and realizes the wavelength conversion type spatial light modulating apparatus that can reduce the influence to space modulating sections.
Description
Technical field
The present invention relates to wavelength conversion type spatial light modulating apparatus.
Background technology
Non-patent literature 1 records ultraviolet using the progress of MEMS (Micro Electro Mechanical Systems) mirror
Technology of the light (wavelength 400nm) in the phase-modulation on Fourier blade face.MEMS mirror used in the non-patent literature 1 can be included in
The light of more than 200nm below 900nm wave-length coverage carries out spatially phase-modulation.
In addition, non-patent literature 2 is recorded using the liquid-crystal apparatus that the light of the wave-length coverage comprising ultra-violet (UV) band can be allowed to pass through,
Carry out technology of the broadband light in the phase-modulation on Fourier blade face.Liquid-crystal apparatus used in the non-patent literature 2 will include for energy
Spatially phase-modulation is carried out in the light of more than 260nm below 1100nm wave-length coverage.In addition, the non-patent literature 2 is made
The assessment result of liquid crystal in itself is recorded in non-patent literature 3.
In addition, non-patent literature 4 records the technology that the light of 350nm frequency bands is carried out to spatially phase-modulation.This is non-specially
Phasing device used in sharp document 4, it is contemplated that having diffraction optical element (DOE:Diffractive Optics
Elements) the device of the modulation pattern of this fixation.
In addition, non-patent literature 5 is recorded using the pulse shape control of Ultra-Violet Laser as purpose, the phase on Fourier blade face
The technology of wavelength convert is carried out after the modulation of position.
Look-ahead technique document Prior Art
Non-patent literature
Non-patent literature 1：M.Hacker et al.,“Micromirror SLM for femtosecond pulse
shaping in the ultraviolet”,Applied Physics B,Vol.76,pp.711-714(2003)
Non-patent literature 2：T.Tanigawa et al.,“Spatial light modulator of 648pixels
with liquid crystal transparent from ultraviolet to near-infrared and its
chirp compensation application”,Optics Letters,Vol.34,No.11,pp.1696-1698
(2009)
Non-patent literature 3：K.Hazu et al.,“Spatial light modulator with an over-two-
octave bandwidth from ultraviolet to near infrared”,Optics Letters,Vol.32,
pp.3318-3320(2007)
Non-patent literature 4：A.Holle et a1.,“Optimizing UV laser focus profiles for
improved MALDI performance”,Journal of Mass Spectrometry,Vol.41,pp.705-716
(2006)
Non-patent literature 5：P.Nuernberger et al.,“Generation of shaped ultraviolet
pulses at the third harmonic of titanium-sapphire femtosecond laser
radiation”,Applied Physics B,Vol.88,pp.519-526(2007)
The content of the invention
Invent problem to be solved
In recent years, in the field of Laser Processing, laser is subjected to spatially phase-modulation using spatial light modulator.It is logical
Crossing can be by laser shaping into arbitrary graphic pattern using spatial light modulator, and can realize the processing with various features.
In addition, in recent years, in the field of Laser Processing, attempt the processing by Ultra-Violet Laser.By the processing of Ultra-Violet Laser, phase
Compared with the processing by near infrared light or visible ray, because laser is easily absorbed by various materials, a footpath can be made small thus can be carried out
Microfabrication, the heat affecting to processing object reduce and have many merits.Therefore, make to process by the processing of Ultra-Violet Laser
Material the scope of application it is wider, and high quality and fine processing can be realized.In addition, Ultra-Violet Laser is also applied in photoetching
The processing that the utilization of exposure, irradiation to ultraviolet hardening resin etc. chemically acts on.
But compared near infrared light or visible ray, the photon energy of Ultra-Violet Laser is big, therefore is using space light modulation
When Ultra-Violet Laser is carried out spatially phase-modulation by device, the situation for the action for having influence on spatial light modulator is had.For example,
The situation of LCOS (Liquid crystal on silicon) type spatial light modulator, liquid is arranged on because Ultra-Violet Laser passes through
The alignment films of crystal layer or its both sides and make it that its grade little by little deteriorates, therefore to be stably modulated action and become difficult.
The present invention in view of this problem points and research and develop, its object is to provide wavelength conversion type spatial light modulating apparatus, its
Spatially phase modulated Ultra-Violet Laser can be exported, and the influence to space modulating sections can be reduced.
The means to solve the problem
In order to solve above-mentioned problem, wavelength conversion type spatial light modulating apparatus of the invention, it is characterized in that, possess：Space
Modulating sections, there is phase-modulation face, it inputs the laser of the wavelength zone longer than ultra-violet (UV) band, and in multiple areas of two-dimensional arrangements
Each phase to laser in domain is modulated and produces modulation laser；Wavelength conversion section, have and receive from space modulating sections
The light entrance face of the modulation laser of output, and the wavelength convert of laser will be modulated into the wavelength of ultra-violet (UV) band；And as shifting optical system
System, by the phase-modulation face of space modulating sections and the light entrance face of wavelength conversion section, optically to turn into conjugated system each other
Mode be combined.
The wavelength conversion type spatial light modulating apparatus possesses space modulating sections and wavelength conversion section.Space modulating sections are defeated
Enter the laser of the wavelength zone (such as visual field etc.) longer than ultra-violet (UV) band and phase-modulation spatially is carried out to the laser.Cause
And significantly decreased compared to the situation of input Ultra-Violet Laser, the influence of the action to space modulating sections.In addition, wavelength turns
Change wavelength of the portion by the wavelength convert of the modulation laser exported from space modulating sections into ultra-violet (UV) band.Thus, can suitably export
Spatially phase modulated Ultra-Violet Laser.
Generally, when applying spatially unequal phase-modulation to laser, the laser display is using each modulation point as spot light
Propagation characteristic.Thus, the phase distribution system of the laser after phase-modulation little by little changes with the traveling of laser.In view of this
Kind problem, above-mentioned wavelength conversion type spatial light modulating apparatus shifts optical system by picture, by the phase-modulation of space modulating sections
Face and the light entrance face of wavelength conversion section, it is combined in a manner of optically turning into conjugated system each other.Thus, make in space
The phase distribution that the phase-modulation faces of modulating sections assigns laser is transferred to light entrance face (that is, the wavelength convert of wavelength conversion section
Face), and the state that laser can be imparted to desired phase distribution carries out wavelength convert.Thus, according to above-mentioned wavelength convert
Type spatial light modulating apparatus, it can suitably export the Ultra-Violet Laser after being applied in desired phase-modulation.
The effect of invention
According to the wavelength conversion type spatial light modulating apparatus of the present invention, can export spatially phase modulated ultraviolet sharp
Light, and the influence to space modulating sections can be reduced.
Brief description of the drawings
Fig. 1 is the schematic overview of the structure of the wavelength conversion type spatial light modulating apparatus of the 1st embodiment.
Fig. 2 is the schematic diagram of the optic modulating device of the concrete example of above-mentioned optic modulating device.
Fig. 3 is the schematic diagram of the concrete example as transfer optical system and above-mentioned defined optical system.
Fig. 4 is the sectional view as the SLM modules shown by the example of space modulating sections.
Fig. 5 is reflection-type SLM top view.
Fig. 6 is the sectional view along line VI -- VI of the reflection-type SLM shown in Fig. 5.
Fig. 7 (a)~(d) is the result of the optic modulating device generation character pattern using present embodiment as embodiment
Schematic diagram.
Fig. 8 is the schematic diagram of the example of the phase pattern of Fresnel lens shape.
Fig. 9 is that point when carrying out phase-modulation using the phase pattern for the Fresnel lens that focal length is 12m observes picture
Schematic diagram.
Figure 10 is to turn during BBO is crystallized from modulation laser (wavelength 515nm) towards the wavelength of ultraviolet laser (wavelength 258nm)
Change the chart that the relation of the focal length of efficiency and the phase pattern of Fresnel lens shape is mapped.
Figure 11 (a) (b) is the schematic diagram of the example of the phase pattern of cylindrical lens shape.
Figure 12 is the schematic diagram of the example of the phase pattern of one-dimensional diffraction light palisade.
Figure 13 is the observation of situation when phase-modulation is carried out using the phase pattern for the lens pillar that focal length is 8m
The schematic diagram of picture.
Figure 14 is the situation that phase-modulation is carried out using the phase pattern for the two-value diffraction grating that grating spacings are 200 μm
Observe the schematic diagram of picture.
Figure 15 is that the picture for the variation for shifting optical system as the picture of above-mentioned embodiment shifts the structure of optical system 33
Into schematic diagram.
Figure 16 is the schematic overview for the optic modulating device for forming the 2nd embodiment.
Figure 17 is the schematic diagram as the optic modulating device of the concrete example of above-mentioned optic modulating device.
Embodiment
Hereinafter, while referring to the drawings while describe in detail the present invention wavelength conversion type spatial light modulating apparatus embodiment.
In addition, in schema explanation, same symbol is added to same key element and omits repeat specification.
(the 1st embodiment)
Fig. 1 is wavelength conversion type spatial light modulating apparatus (the hereinafter referred to as light modulation dress of the 1st embodiment of the present invention
Put) composition generalized schematic.The optic modulating device 1A of present embodiment possesses space modulating sections 10, wavelength conversion section 20
And as shifting optical system 30.
Space modulating sections 10 have what each phase to input light in multiple regions of two-dimensional arrangements was modulated
Phase-modulation face 10a.The space modulating sections 10 of present embodiment are for example made up of LCOS type spatial light modulators.Spatial light is adjusted
Portion 10 processed is by the wavelength zone longer than ultra-violet (UV) band (such as visual field and infrared region.Specifically more than wavelength 400nm) swash
Light L1 input phases modulate face 10a, in each modulation laser L1 in above-mentioned multiple regions phase, and perpendicular to laser L1's
After phase-modulation as defined in each point execution of the section (hereinafter referred to as beam profile) of optical axis, the laser after output phase modulation
(hereinafter referred to as modulating laser) L2.
Wavelength conversion section 20 has the light entrance face for receiving the modulation laser L2 exported from space modulating sections 10, and will adjust
Wavelength (such as 200nm~400nm) of the laser L2 processed wavelength convert into ultra-violet (UV) band.Wavelength conversion section 20 is by after wavelength convert
Ultra-Violet Laser L3 is exported to optic modulating device 1A outside.
As wavelength conversion section 20, believed using the phase of light wave information before wavelength convert and the phase of light wave after wavelength convert
Property of the breath with certain functional relation.Therefore, wavelength conversion section 20 is formed containing such as nonlinear optical crystal, by producing
Raw modulation laser L2 higher hamonic wave (the 2nd higher hamonic wave etc.), modulation laser L2 is converted into Ultra-Violet Laser L3.For example, non-
Linear optics crystallization produces the situation of the 2nd higher hamonic wave, due to producing and the modulation laser L2 of input beam profile each point
Square proportional output light of electric field, therefore the amount of phase modulation of the beam profile each point for modulating laser L2, can be obtained
There is the Ultra-Violet Laser L3 of 2 times of amount of phase modulation in each point.In addition, the mode for producing higher hamonic wave is one certainly, wavelength
The composition of converter section 20 is not limited to this.
Herein, generally, when spatially unequal phase-modulation puts on laser, the laser display using each modulation point as
The propagation characteristic of spot light.Thus, modulation laser L2 phase distribution little by little changes with modulation laser L2 traveling.Cause
This, in present embodiment, as transfer optical system 30 by the intensity of phase-modulation face 10a modulation laser L2 beam profile and
Phase distribution, it is transferred to the intensity and phase distribution of the beam profile of the light entrance face (wavelength convert face) of wavelength conversion section 20.
That is, the picture transfer optical system 30 of present embodiment be arranged in space modulating sections 10 and wavelength conversion section 20 it
Between optical system, the phase-modulation face 10a of space modulating sections 10 and the light entrance face of wavelength conversion section 20, to be each
The mode of optical conjugated system combines.As transfer optical system 30 includes one or more lens and form.As shifting
The composition of optical system 30 is preferably the 4f optical systems for having and making characteristic corresponding to directional light to directional light foundation, can also
It is to link multiple 4f optical systems and form, but is not limited to these.For example, as transfer optical system 30 can also be by 1 list
Lens make phase-modulation face 10a and the light entrance face of wavelength conversion section 20 form the optical system of conjugation.In addition, as shifting optics
The mutual relation of front and rear imaging surface of system 30 can also be amplification, equimultiple, reduce it is any.
By this effect as shifting optical system 30, will be given in the phase-modulation face 10a of space modulating sections 10
Modulation laser L2 phase distribution be transferred to the light entrance face (wavelength convert face) of wavelength conversion section 20, can be in modulation laser L2
Maintain to carry out wavelength convert in the state of desired phase distribution.In other words, the modulation laser L2 each points in wavelength convert face
The amount of phase modulation of amount of phase modulation and the phase-modulation face 10a of space modulating sections 10 conjugate point turns into formed objects.By
This, the amount of phase modulation of beam profile each point when can suitably control wavelength convert.
, can be by the ultraviolet of wavelength conversion section 20 by possessing above composition according to the optic modulating device 1A of present embodiment
The spatial phase modulation amount of laser L3 beam profile each point, is suitably controlled by the phase-modulation of space modulating sections 10,
Therefore the Ultra-Violet Laser L3 that desired phase-modulation is applied with beam profile each point can suitably be exported.
Fig. 2 is the schematic diagram as the optic modulating device 1B of above-mentioned optic modulating device 1A concrete example.Light shown in Fig. 2 is adjusted
Device 1B processed is also equipped with light source in addition to above-mentioned space modulating sections 10, wavelength conversion section 20 and as transfer optical system 30
41, optical beam expander 42, attenuator 43, collector lens 44 and machine table 45.
Light source 41 exports such as wavelength 515nm, the wide 1.0ps of pulse, repetition rate number 100Hz pulse laser as laser
L1.Light source 41 is suitably constituted by such as ultra-short pulse laser source 41a and the 2nd higher hamonic wave (SHG) converting unit 41b.In light
When the output wavelength 515nm of source 41 light is as laser L1, ultra-short pulse laser source 41a output wavelengths 1030nm light.SHG is changed
Unit 41b produces the light of the 2nd higher hamonic wave, i.e. wavelength 515nm of the light.The laser L1 exported from light source 41 is by optical beam expander
42 and attenuator 43 be adjusted to after optimal beam profile and luminous intensity, inject space modulating sections 10.Furthermore it is preferred that
Ground, attenuator 43 are for example formed comprising wavelength plate 43a and light beam of polarized light spectroscope 43b.
As transfer optical system 30 is made up of the relay optical system comprising 2 lens 31,32.It has been observed that as transfer
Optical system 30 is by the light entrance face of the phase-modulation face of space modulating sections 10 and wavelength conversion section 20 with conjugated system each other
Mode be combined.
Wavelength conversion section 20 is such as BBO crystallizations, LBO crystallizations, CLBO crystallizations etc. suitable for producing ultra-violet (UV) band higher hamonic wave
Nonlinear optical crystal.In this example, due to using ultra-short pulse laser source 41a as light source 41, even if by nonlinear optics knot
Brilliant thickness is set as fully keeping below the length as the conjugate relation of transfer optical system 30, also can sufficiently be changed
Efficiency.In addition, when using the light source (continuous light source etc.) beyond the 41a of ultra-short pulse laser source to be used as light source 41, in order to improve
Wavelength conversion efficiency, the nonlinear optical crystal of strip can be used as wavelength conversion section 20.It is thus preferred that as shifting light
System 30 has the big conjugated system of the depth of focus of the width for the nonlinear optical crystal for also allowing for optical axis direction.
In optic modulating device 1B, the phase-modulation face of space modulating sections 10 and the wavelength convert face of wavelength conversion section 20
(nonlinear optical crystal face) by forming conjugate relation each other as shifting the relay optical system of optical system 30.Thus, will
Modulation wave surface in phase-modulation face transfers to nonlinear optical crystal face.Moreover, the light (modulation laser L2) transferred exists
The light of 1/2 wavelength is converted into nonlinear optical crystal, is projected as Ultra-Violet Laser L3.Now, the phase of the wave surface of light is projected
Position modulation voltage becomes to assign 2 times of the amount of phase modulation of space modulating sections 10.Thereby, it is possible to be appropriately carried out Ultra-Violet Laser L3
The wave surface modulation of (wavelength 258nm).
In addition, as shown in Fig. 2 modulated Ultra-Violet Laser L3 from the nonlinear optical crystal face of wavelength conversion section 20 via
Defined optical system (such as 4f optical systems) is guided to workpiece A working position, thus, it is possible to processing object
Thing A is processed with desired pattern.In addition, in this example, collector lens 44 is illustrated as above-mentioned defined optical system system,
But set optical system not limited to this.
Fig. 3 is the schematic diagram of the concrete example as transfer optical system 30 and above-mentioned set optical system.Shown in Fig. 2
Optic modulating device 1B, in order to which the phase distribution given by the phase-modulation face 10a of space modulating sections 10 is correctly transferred
To the wavelength convert face 20a of wavelength conversion section 20, preferably phase-modulation face 10a and wavelength convert face 20a are with Fourier
The relation of conjugation.For example, as shown in figure 3, it is preferred that make the focal length of the distance of phase-modulation face 10a and lens 31 and lens 31
F1 (such as 250mm) is equal, make the focal length f2 of the distance of lens 31 and lens 32 and focal length f1 and lens 32 (such as
100mm) and it is equal, make lens 32 and wavelength convert face 20a distance equal with focal length f2.Furthermore it is preferred that make ripple
Long conversion surface 20a and lens 44 distance and the distance for making lens 44 and imaging surface 46 (surface of workpiece), each with
The focal length f3 (such as 200mm) of lens 44 is equal.
By this as shifting optical system 30, phase-modulation face 10a and wavelength convert face 20a is set to establish each other to should be used as
Optical system is reduced, and is wavelength convert face 20a modulating laser L2 caused by the 10a of phase-modulation face in Fourier conjugate planes
Imaging.Moreover it is preferred that during actual progress microfabrication, phase-modulation face 10a phase distribution is transferred to thing lens 44
Pupil face, obtain appropriately sized pattern.
Schematic sides of the Fig. 4 as SLM (Spatial Light Modulator) module 11 of the example of space modulating sections 10
Sectional view.The prism 13 and reflection-type SLM14 that the SLM modules 11 possess housing 12 and are accommodated in inside housing 12.Housing 12 has
There is the outward appearance of substantially straight cube shape, a side of its a pair of sidewalls is provided with opening 12a, and the opposing party is provided with opening 12b.From Fig. 2
Laser L1 is injected opening 12a by shown light source 41.
Prism 13 is that one section is in the tetrahedron for forming triangle, is had：Among three sides comprising the triangle
One side the 1st face 13a, the 2nd face 13b comprising another side and the 3rd face 13c comprising remaining one side.In the 1st face 13a shapes
Into the multilayer dielectric film mirror 18a for having reflection laser L1, in dielectric matter of the 2nd face 13b formed with similarly reflection laser L1
Multilayer mirror 18b.Prism 13 is placed in shell in a manner of axis vertical take-off of its thickness direction with linking opening 12a and opening 12b
On the bottom plate 12c of body 12.Moreover, the opening 12a of the 1st face 13a of prism 13 towards housing 12 is configured, the 2nd face 13b is towards opening
12b is configured.3rd face 13c of prism 13 is configured on the bottom plate 12c of housing 12.
Reflection-type SLM14 is configured in the top of prism 13 in the inside of housing 12.Reflection-type SLM14 receive obliquely from the front by
Multilayer dielectric film mirror 18a reflection laser L1, make laser L1 reflect, and by multiple regions of two-dimensional arrangements (as
Element) each phase-modulation carried out to laser L1 and produces modulation laser L2.In addition, reflection-type SLM14 is by involving 16, mechanism
Hold.Involve mechanism 16 to adjust reflection-type SLM14 angle and be fixed on housing 12, and hang lower reflection-type SLM14.Involving
It is configured with to control reflection-type SLM14 circuit substrate 17 between mechanism 16 and the top plate 12d of housing 12.
Fig. 5 and Fig. 6 is the schematic diagram of reflection-type SLM14 configuration example.Fig. 5 is reflection-type SLM14 top view.In addition,
Fig. 6 is the sectional view along the line VI -- VI of the reflection-type SLM14 shown in Fig. 5.Reflection-type SLM14 such as Fig. 5 of present embodiment
The shown multiple pixel region 14a for possessing two-dimensional arrangements.In addition, reference picture 6, reflection-type SLM14 possesses silicon substrate 14b, driving
Circuit layer 14c, multiple pixel electrode 14d, multilayer dielectric film 14e, liquid crystal layer 14f, nesa coating 14g and transparency carrier
14h。
Transparency carrier 14h mainly contains the photopermeability material such as glass, the laser L of injection is passed through to reflection-type
SLM14 inside.Nesa coating 14g is formed on the transparency carrier 14h back side, mainly contains the conduction through laser L1
Property material (such as ITO) and form.Multiple pixel electrode 14d arrange according to the arrangement of multiple pixel region 14a shown in Fig. 5
Into two dimension shape, it is arranged in along nesa coating 14g on silicon substrate 14b.Each pixel electrode 14d is for example by this metal material of aluminium
Form, these Surface Machining is into flat and smooth.Multiple pixel electrode 14d are by being arranged at drive circuit layer 14c Active Phased Array
Column circuits and drive.Active array circuit is correspondingly intended to control to each from the modulation laser L2 of reflection-type SLM14 outputs light image
Pixel electrode 14d application voltage.
Liquid crystal layer 14f is configured between multiple pixel electrode 14d and nesa coating 14g, in its both sides (liquid crystal layer 14f
Between pixel electrode 14d, and between liquid crystal layer 14f and nesa coating 14g) it is each configured with alignment films 14j and 14k.Liquid
Crystal layer 14f is corresponding to modulate laser L1 phase by the electric field that each pixel electrode 14d and nesa coating 14g are formed.That is, by
Active array circuit applies voltage in a certain pixel electrode 14d, then the shape between nesa coating 14g and pixel electrode 14d
Into electric field.The electric field is each for multilayer dielectric film 14e's and liquid crystal layer 14f, is given with the ratio corresponding to each thickness
To apply.Moreover, change liquid crystal molecule C orientation corresponding to the size for the electric field for being applied to liquid crystal layer 14f.
When laser L1 injects liquid crystal layer 14f through transparency carrier 14h and nesa coating 14g, laser L1 is passing through
Modulated during liquid crystal layer 14f by liquid crystal molecule C, after multilayer dielectric film 14e reflections, after being modulated once again by liquid crystal layer 14f
Take out.Multilayer dielectric film 14e is configured between multiple pixel electrode 14d and liquid crystal layer 14f, the surface with pixel electrode 14d
The light reflex co-operating having, laser L1 is reflected with high reflectance.
Effect obtained by optic modulating device 1A, 1B of the present embodiment formed by possessing the above is illustrated.Should
Optic modulating device 1A, 1B possess space modulating sections 10 and wavelength conversion section 20.Space modulating sections 10 are inputted than ultra-violet (UV) band more
The laser L1 of long wavelength zone, and spatially phase-modulation is carried out to laser L1.Thus, compared to the feelings of input Ultra-Violet Laser
Shape, the influence of the action to space modulating sections 10 significantly decrease.In addition, wavelength conversion section 20, will be from space modulating sections
Wavelength of the modulation laser L2 of the 10 outputs wavelength convert into ultra-violet (UV) band.Thus, can suitably export spatially phase modulated
Ultra-Violet Laser L3.
In addition, optic modulating device 1A, 1B shifts optical system 30 by picture, by the phase-modulation of space modulating sections 10
The face 10a and wavelength convert face 20a of wavelength conversion section 20 is combined in a manner of optically turning into conjugated system each other.By
This, the phase distribution that will be given in the phase-modulation face 10a of space modulating sections 10 to laser L1, is transferred to wavelength conversion section 20
Wavelength convert face 20a, and wavelength turn can be carried out in the state of laser L2 modulate desired phase distribution is assigned
Change.Thus, according to optic modulating device 1A, 1B of present embodiment, the Ultra-Violet Laser L3 after desired phase-modulation will can be applied
Suitably export.
In addition, such as present embodiment, space modulating sections 10 can also have：Liquid crystal layer 14f, corresponding to the big of application electric field
The small phase to laser L1 is modulated；Alignment films 14j and 14k, it is configured at liquid crystal layer 14f both sides；And multiple electrodes 14d,
The each of multiple regions is arranged at, voltage caused by application electric field will be made to put on liquid crystal layer 14f.When Ultra-Violet Laser is through so
Space modulating sections 10 liquid crystal layer 14f and alignment films 14j and 14k, liquid crystal layer 14f and alignment films 14j and 14k are little by little bad
Change.According to optic modulating device 1A, 1B of present embodiment, due to by the laser L1 input spaces of the wavelength zone longer than ultra-violet (UV) band
Modulating sections 10, therefore such influence on liquid crystal layer 14f and alignment films 14j and 14k is reduced, and can suitably export sky
Between upper phase modulated Ultra-Violet Laser L3.
In addition, such as present embodiment, it is preferable that wavelength conversion section 20 includes nonlinear optical crystal.Thus, energy will be than purple
The modulation laser L2 of the longer wavelength zone of outskirt wavelength is appropriately converted to the wavelength of ultra-violet (UV) band.
In addition, such as present embodiment, it is preferable that as transfer optical system 30 includes 4f optical systems.Thus, energy will be in sky
Between modulating sections 10 the phase distributions given to laser L1 of phase-modulation face 10a, be suitably transferred to wavelength conversion section 20
Light entrance face 20a.
Herein, Fig. 7 is that the optic modulating device 1B for using present embodiment produces result of the character pattern as embodiment
Schematic diagram.In the present embodiment, character pattern " H ", " P ", " K " and " HPK " is produced, and use is arranged on the (reference picture of imaging surface 46
3) intensity distribution of beam profile instrument observation Ultra-Violet Laser L3 (wavelength 258nm) generation pattern.Further, determine from laser
L1 (wavelength 515nm) arrives Ultra-Violet Laser L3 (wavelength 258nm) wavelength conversion efficiency.
As a result, it is 12.8% in the wavelength conversion efficiency for not carrying out the state of phase-modulation.In contrast, adjusted by phase
Wavelength conversion efficiency when system produces character pattern " H " is 9.2%, and wavelength conversion efficiency when producing character pattern " P " is
8.4%, wavelength conversion efficiency when producing character pattern " K " is 8.6%.Like this, the confirmed word formed by 1 word
In pattern, it seriously can not undermine wavelength conversion efficiency and generate pattern.
In addition, wavelength conversion efficiency when producing character pattern " HPK " is 1.8%.By the amount of phase modulation that SLM gives with
The complexity of generation pattern and become big.Slight modulation of the character pattern " HPK " formed by 3 words due to space spacing
So that the high angle scattering composition of light becomes more.Thus, when transferring modulation laser L2 as transfer optical system 30, wavelength is turned
Change the ratio increase of the big composition of incident angle of the nonlinear optical crystal in portion 20.
The composition for the incident angle allowed when i.e., more than wavelength convert becomes more, because these compositions are not helped to wavelength convert
Help, it is taken as that wavelength conversion efficiency reduces.So, when generation pattern becomes complexity, have because by nonlinear optics
Crystallization allowing the limitation at angle and causing the situation of wavelength conversion efficiency reduction.In order to solve this problem, for example, can be used together
Control program estimates wavelength conversion efficiency and becomes phase-modulation below certain certain value to limit.In addition, for example, giving both
In the state of fixed phase-modulation, turn into the angle adjustment of maximum nonlinear optical crystal to carry out wavelength conversion efficiency, because
This can seek to mitigate efficiency reduction.
In addition, present embodiment is by applying the phase-modulation of Fresnel lens shape, and Ultra-Violet Laser L3 optically focused can be made
Position (image space) is in optical axis direction only displacement any distance.The control of this image space is for example to carry out 3-dimensional multiple spot
Desired function when processing simultaneously.Fig. 8 is the schematic diagram of the phase diagram case of Fresnel lens shape.In addition, Fig. 9 is using Jiao
Point distance carries out the situation of phase-modulation for the phase pattern of 12m Fresnel lens, and is the schematic diagram of display point observation picture.
In addition, in Fig. 9, chart G11 shows the light intensity distributions of X direction, and chart G12 represents the light intensity distributions of y direction.Separately
Outside, point observation seems that image space when never carrying out phase-modulation is risen to set by collector lens side movement 22mm position
Beam profile instrument observation picture.Phase tune is carried out by using the phase pattern of Fresnel lens shape as shown in figure 9, confirming
System, image space can change in optical axis direction.
In addition, Figure 10 be will the modulation laser L2 (wavelength 515nm) that be crystallized from BBO towards Ultra-Violet Laser L3 (wavelength 258nm)
Wavelength conversion efficiency and relation with the focal length of the phase pattern of Fresnel lens shape, the chart mapped.Figure 10
In, transverse axis represents focal length (unit：Meter), the longitudinal axis represents wavelength conversion efficiency (unit：%).As shown in Figure 10, understand
To when focal length is more than 10m, sufficient wavelength conversion efficiency can be obtained.Thus, in this composition, using Fresnel
During lentiform phase pattern, preferably focal length is more than 10m.But the scope of this appropriate focal length is certainly
Changed according to the optical system of construction.
In addition, in the higher hamonic wave conversion of nonlinear optical crystal, optical axis there are in vertical face and allow angle big
Direction of principal axis and allow the small direction of principal axis in angle.Thus, by only to allowing the big direction of principal axis in angle to carry out phase-modulation, not making wavelength
Conversion efficiency reduces, and can give larger phase-modulation.The phase pattern of phase-modulation is carried out as this only single shaft direction
Example, there is lens pillar and one-dimensional diffraction grating.Figure 11 (a) and Figure 11 (b) is the signal of the example of the phase pattern of lens pillar shape
Figure.In addition, Figure 12 is the schematic diagram of the example of the phase pattern of one-dimensional diffraction light palisade.
When using the phase pattern of lens pillar shape, the shape shape of the section vertical with Ultra-Violet Laser L3 optical axis direction
It is linear as being extended in single shaft direction.Thus, it can effectively carry out being all together processing to the processing object face of large area.Separately
Outside, when using the phase pattern of one-dimensional diffraction light palisade, can be consequently adapted to more by Ultra-Violet Laser L3 optical axis difference into multiple
The purposes such as point while processing.So, even in the situation for carrying out the only phase-modulation in single shaft direction, it can also produce and add to various
The effective Ultra-Violet Laser L3 of work purposes.
Figure 13 is the observation for the situation that the phase pattern using the lens pillar that focal length is 8m is carried out to phase-modulation
The schematic diagram of picture.In addition, in Figure 13, chart G21 represents the light intensity distributions of X direction, and chart G22 represents y direction
Light intensity distributions.In addition, this observation seems when not carrying out phase-modulation, light beam of the beam diameter as 50 μm of position is arranged on
The observation picture of section plotter.As shown in figure 13, confirm and phase-modulation is carried out by using the phase pattern of lens pillar shape, can fit
Locality forms the Ultra-Violet Laser L3 with linear section shape.In addition, in direction corresponding with Figure 13 transverse direction, will have
When the phase pattern of the lens pillar shape of curvature further writes reflection-type SLM14, relative to the longitudinal direction of the profile observed
A width of 50 μm of light beam, a width of elongation of the light beam of transverse direction is to 600 μm.
Figure 14 is the situation that phase-modulation is carried out using the phase pattern for the two-value diffraction grating that grating spacings are 200 μm
Observe the schematic diagram of picture.This observation is as the image observed for the beam profile instrument set by the imaging surface 46 shown in Fig. 3.Such as
Shown in Figure 14, occur 2 point P1 and P2 for corresponding to 1 diffraction light by diffraction.These point P1 and P2 are from 0 position P0 positions
Move on to what the positions of 1.3mm or so transverse directions was observed.
(variation)
Figure 15 is the variation of the picture transfer optical system 30 as above-mentioned embodiment, as the structure of transfer optical system 33
Into schematic diagram.Picture transfer optical system 33 includes single lens 34 and formed, by the single lens 34, by space light modulation
The phase-modulation face 10a in portion 10 and light entrance face (wavelength convert face) 20a of wavelength conversion section 20 is to be each conjugated system
Mode be combined.Specifically, the distance f1 of the focal length f of lens 34, phase-modulation face 10a and lens 34 and thoroughly
Mirror 34 and wavelength convert face 20a distance f2, which are set to, meets relationship below (1).
[formula 1]
Optic modulating device 1B, which also may replace shown in Fig. 3, possesses the transfer light of the picture shown in Figure 15 as transfer optical system 30
System 33.In this case, the effect of above-mentioned embodiment also can suitably be obtained.
(the 2nd embodiment)
Figure 16 is the generalized schematic of the composition of the optic modulating device of the 2nd embodiment of the present invention.Present embodiment
Optic modulating device 1C possesses space modulating sections 10, wavelength conversion section 20 in the same manner as the optic modulating device 1A of the 1st embodiment
And as shifting optical system 30.In optic modulating device 1C, it is with optic modulating device 1A differences, forms wavelength conversion section 20
Nonlinear optical crystal, receive the light beams different from modulation laser L2 exported from space modulating sections 10 together in light entrance face
L4 and modulation laser L2, laser L2's and light beam L4 and frequency or difference frequency are modulated to produce Ultra-Violet Laser L3 by producing.Root
According to this composition, available number of wavelengths increase after conversion, and the reduction of wavelength conversion efficiency can be effectively prevented from.
Laser L1s of the light beam L4 preferably before input space modulating sections 10 makes the light of one part partial wave.Thus,
Make modulation laser L2 and light beam L4 fully synchronous, can suitably produce the Ultra-Violet Laser L3 of ultrashort pulse.In addition, light beam L4
Can be the light in space modulating sections 10 change way.In addition, the laser that can also will enter into before space modulating sections 10
L1 is converted into utilization after appropriate state as light beam L4.
Figure 17 is the optic modulating device 1D of the concrete example as above-mentioned optic modulating device 1C schematic diagram.Light shown in Figure 17
Modulating device 1D except the space modulating sections 10 shown in Fig. 2, wavelength conversion section 20, as transfer optical system 30, light source 41, light
Beyond beam expander 42 and attenuator 43, light beam splitter 51, speculum 52a~52d, optical beam expander 54, decay are also equipped with
The plate 57 of device 55 (wavelength plate 55a and light beam of polarized light spectroscope 55b), variable optical delay system 56 and λ/2.
Light beam splitter 51 is configured between the ultra-short pulse laser source 41a of light source 41 and SHG converting units 41b, and is made
From the laser L0 of ultra-short pulse laser source 41a outputs a part of difference.In addition, laser L0 wavelength such as 1030nm.Pass through
The laser L0 of one side of difference is adjusted to optimal light beam wheel by light beam splitter 51 by optical beam expander 54 and attenuator 55
Wide and luminous intensity, by being adjusted to appropriate polarisation by the plate 57 of λ/2 again after variable optical delay system 56, via speculum
52d, the nonlinear optical crystal of wavelength conversion section 20 is injected as light beam L4.In nonlinear optical crystal, produce using for example
Wavelength 343nm Ultra-Violet Laser L3 caused by non-coaxial and frequency.
Herein, in order to suitably carry out the wavelength convert of wavelength conversion section 20, modulation laser L2 light pulse and structure are formed
Into light beam L4 light pulse, it is necessary on the nonlinear optical crystal of wavelength conversion section 20, made with fully overlapping degree
Optical path length between two light paths turns into identical.Present embodiment is due to being to use ultrashort pulse, it is necessary to critically enters to be about to optical path length
It is adjusted to identical, therefore utilizes variable optical delay system 56.In addition, it is being not provided with the shape of the variable optical delay system 56
Under state, variable optical delay system 56 is preferably inserted into the shorter light path of optical path length, as such, it can be that insertion laser L1 or modulation
Mode in laser L2 light path.
Figure 17 is show above-mentioned optic modulating device 1C one, and composition in addition can certainly.For example, it is also possible to
It is that laser L1 is set as wavelength 1030nm, light beam L4 is set as to the composition of wavelength 515nm light.In addition, by laser L1
It is set as in wavelength 515nm composition, when a part of the laser L1 by the use of wavelength 515nm is as light beam L4, passes through generation
With frequency and produce wavelength 258nm Ultra-Violet Laser L3.
According to optic modulating device 1C, 1D of present embodiment, the optic modulating device with above-mentioned 1st embodiment can be reached
1A, 1B same effect.In addition, according to present embodiment, the Ultra-Violet Laser L3 and light beam of nonlinear optical crystal can will be injected
In L4 a side to allow angle to be set to larger.
The wavelength conversion type spatial light modulating apparatus of the present invention is not limited to above-mentioned embodiment, can do other various changes
Shape.For example, above-mentioned embodiment is to illustrate LCOS types as space modulating sections, but the space modulating sections of the present invention are unlimited fixed
In this.For example, as space modulating sections, it is possible to use can be in each area for allowing surface configuration to change of each and every one more pixel regions
Segment type MEMS (Micro Electro Mechanical Systems) mirror.In MEMS mirror, make concavo-convex institute's shape using each section
Into surface configuration turn into the phase pattern that is modulated the wave surface of laser.In addition, as space modulating sections,
Deformable mirror can be used.Its surface configuration of deformable mirror turns into phase pattern.Under any situation, all having can be than using spatial light
The modulated wavelength zone of modulation portion monomer obtains the feature of shorter wavelengths of modulation light.
The wavelength conversion type spatial light modulating apparatus of above-mentioned embodiment possesses following composition：Space modulating sections, have
Phase-modulation face, it inputs the laser of the wavelength zone longer than ultra-violet (UV) band, and in each to swashing of multiple regions of two-dimensional arrangements
The phase of light is modulated and produces modulation laser；Wavelength conversion section, has light entrance face, and the light entrance face is received from space
The modulation laser of modulating sections output, and the wavelength convert of laser will be modulated into the wavelength of ultra-violet (UV) band；And as shifting optical system,
The light entrance face in the phase-modulation face of space modulating sections and wavelength conversion section is tied in a manner of being each conjugated system
Close.
In addition, wavelength conversion type spatial light modulating apparatus is alternatively following composition；Space modulating sections have：Liquid crystal layer,
Correspond to the size for applying electric field and be modulated the phase of laser；Alignment films, it is configured at the both sides of liquid crystal layer；And multiple electricity
Pole, each of multiple regions is arranged at, liquid crystal layer, which is applied, makes voltage caused by application electric field.As being passed through when Ultra-Violet Laser
The liquid crystal layer and alignment films of space modulating sections, liquid crystal layer and alignment films can be deteriorated little by little.It is empty according to above-mentioned wavelength conversion type
Between optic modulating device, by the laser input space modulating sections of the wavelength zone longer than ultra-violet (UV) band, therefore to liquid crystal layer and orientation
This influence of film is reduced, and can suitably export spatially phase modulated Ultra-Violet Laser.
In addition, the wavelength conversion section of wavelength conversion type spatial light modulating apparatus is alternatively the structure comprising nonlinear optical crystal
Into.Thus, the wavelength of the modulation laser of the wavelength zone longer than ultra-violet (UV) band can be appropriately converted to the wavelength of ultra-violet (UV) band.At this
Situation, nonlinear optical crystal can also modulate the higher hamonic wave of laser by the wavelength convert of laser into ultra-violet (UV) band by producing
Wavelength.Or wavelength conversion section can also receive the light different from the modulation laser exported from space modulating sections in light entrance face
Beam and modulation laser, the wavelength convert of laser will be modulated into the ripple of ultra-violet (UV) band using modulation laser and above-mentioned different light beam
It is long.In the situation, wavelength conversion section can also include nonlinear optical crystal, by produce modulation laser and light beam and frequency or it is poor
Frequently the wavelength convert of laser will be modulated into the wavelength of ultra-violet (UV) band.Furthermore it is preferred that above-mentioned different light beam is from being input to space
The light of laser difference before modulating sections.
In addition, wavelength conversion type spatial light modulating apparatus can also include 4f optical systems as shifting optical system
Form.Thus, the phase distribution for assigning laser in the phase-modulation face of space modulating sections can be made suitably to be transferred to wavelength to turn
Change the light entrance face in portion.
Utilization possibility in industry
The present invention is suitable as：Spatially phase modulated Ultra-Violet Laser can be exported and can be reduced to space light modulation
The wavelength conversion type spatial light modulating apparatus of the influence in portion.
Symbol description
1A、1B、1C、1D：Optic modulating device
10：Space modulating sections
10a：Phase-modulation face
11：SLM modules
12：Housing
13：Prism
14：Reflection-type SLM
20：Wavelength conversion section
20a：Light entrance face (wavelength convert face)
30：As transfer optical system
31、32：Lens
33：As transfer optical system
34：Lens
41：Light source
41a：Ultra-short pulse laser source
41b：Converting unit
42：Optical beam expander
43：Attenuator
44：Collector lens
45：Machine table
46：Imaging surface
51：Light beam splitter
54：Optical beam expander
55：Attenuator
56：Variable optical delay system
57：The plate of λ/2
A：Workpiece
L1：Laser
L2：Modulate laser
L3：Ultra-Violet Laser
Claims (13)
- A kind of 1. wavelength conversion type spatial light modulating apparatus, it is characterised in thatPossess：Space modulating sections, there is phase-modulation face, it inputs the laser of the wavelength zone longer than ultra-violet (UV) band, and in two-dimensional arrangements Each phase to the laser in multiple regions be modulated and produce modulation laser；Wavelength conversion section, there is the light entrance face for receiving the modulation laser from space modulating sections output, and by institute The wavelength convert of modulation laser is stated into the wavelength of ultra-violet (UV) band；AndAs transfer optical system, by the phase-modulation face of the space modulating sections and the light of the wavelength conversion section The plane of incidence, it is combined in a manner of optically turning into conjugated system each other.
- 2. wavelength conversion type spatial light modulating apparatus as claimed in claim 1, it is characterised in thatThe space modulating sections have：The liquid crystal layer for corresponding to the size of application electric field and being modulated to the phase of the laser；It is configured at the alignment films of the both sides of the liquid crystal layer；AndIt is arranged at each of the multiple region and the voltage for producing the application electric field is put on into the multiple of the liquid crystal layer Electrode.
- 3. wavelength conversion type spatial light modulating apparatus as claimed in claim 1 or 2, it is characterised in thatThe wavelength conversion section includes nonlinear optical crystal.
- 4. wavelength conversion type spatial light modulating apparatus as claimed in claim 3, it is characterised in thatThe nonlinear optical crystal is turned the wavelength of the modulation laser by producing the higher hamonic wave of the modulation laser Change the wavelength of ultra-violet (UV) band into.
- 5. wavelength conversion type spatial light modulating apparatus as claimed in claim 1, it is characterised in thatThe wavelength conversion section, the light entrance face receive it is described modulation laser and with it is defeated from the space modulating sections The different light beam of the modulation laser that goes out, using the modulation laser and the light beam by the wavelength convert of the modulation laser Into the wavelength of ultra-violet (UV) band.
- 6. wavelength conversion type spatial light modulating apparatus as claimed in claim 5, it is characterised in thatThe wavelength conversion section includes nonlinear optical crystal, by produce it is described modulation laser and the light beam and frequency or it is poor Frequently, the wavelength by the wavelength convert of the modulation laser into ultra-violet (UV) band.
- 7. the wavelength conversion type spatial light modulating apparatus as described in claim 5 or 6, it is characterised in thatThe light beam is the light from input to the laser partial wave before the space modulating sections.
- 8. wavelength conversion type spatial light modulating apparatus as claimed in claim 1 or 2, it is characterised in thatIt is described to include 4f optical systems as shifting optical system.
- 9. wavelength conversion type spatial light modulating apparatus as claimed in claim 3, it is characterised in thatIt is described to include 4f optical systems as shifting optical system.
- 10. wavelength conversion type spatial light modulating apparatus as claimed in claim 4, it is characterised in thatIt is described to include 4f optical systems as shifting optical system.
- 11. wavelength conversion type spatial light modulating apparatus as claimed in claim 5, it is characterised in thatIt is described to include 4f optical systems as shifting optical system.
- 12. wavelength conversion type spatial light modulating apparatus as claimed in claim 6, it is characterised in thatIt is described to include 4f optical systems as shifting optical system.
- 13. wavelength conversion type spatial light modulating apparatus as claimed in claim 7, it is characterised in thatIt is described to include 4f optical systems as shifting optical system.
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|---|---|---|---|
| JP2012-205773 | 2012-09-19 | ||
| JP2012205773A JP5947172B2 (en) | 2012-09-19 | 2012-09-19 | Wavelength conversion type spatial light modulator |
| PCT/JP2013/073670 WO2014045865A1 (en) | 2012-09-19 | 2013-09-03 | Wavelength conversion-type spatial light modulation device |
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| CN104641286A CN104641286A (en) | 2015-05-20 |
| CN104641286B true CN104641286B (en) | 2017-11-24 |
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|---|---|
| US (1) | US10429720B2 (en) |
| EP (1) | EP2899591B1 (en) |
| JP (1) | JP5947172B2 (en) |
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| JP6570427B2 (en) | 2015-11-06 | 2019-09-04 | 浜松ホトニクス株式会社 | Image acquisition apparatus, image acquisition method, and spatial light modulation unit |
| GB2547926B (en) * | 2016-03-03 | 2020-04-29 | Dualitas Ltd | Display system |
| JP6654948B2 (en) * | 2016-03-30 | 2020-02-26 | 浜松ホトニクス株式会社 | Method and apparatus for measuring pulse light waveform |
| EP3296723A1 (en) * | 2016-09-14 | 2018-03-21 | ASML Netherlands B.V. | Illumination source for an inspection apparatus, inspection apparatus and inspection method |
| JP6732627B2 (en) * | 2016-10-19 | 2020-07-29 | 浜松ホトニクス株式会社 | Laser light irradiation device |
| JP7120903B2 (en) * | 2018-10-30 | 2022-08-17 | 浜松ホトニクス株式会社 | LASER PROCESSING APPARATUS AND LASER PROCESSING METHOD |
| US11897056B2 (en) | 2018-10-30 | 2024-02-13 | Hamamatsu Photonics K.K. | Laser processing device and laser processing method |
| JP2020069685A (en) * | 2018-10-30 | 2020-05-07 | Ｄｇｓｈａｐｅ株式会社 | Foil transfer apparatus |
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| WO2014045865A1 (en) | 2014-03-27 |
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| JP2014059511A (en) | 2014-04-03 |
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