CN104607420B - 小尺寸kdp晶体表面磁-射流清洗装置及清洗工艺 - Google Patents
小尺寸kdp晶体表面磁-射流清洗装置及清洗工艺 Download PDFInfo
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- CN104607420B CN104607420B CN201510020968.5A CN201510020968A CN104607420B CN 104607420 B CN104607420 B CN 104607420B CN 201510020968 A CN201510020968 A CN 201510020968A CN 104607420 B CN104607420 B CN 104607420B
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- Prior art keywords
- crystal
- cleaning
- kdp
- plane
- abluent
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
- B08B7/04—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by a combination of operations
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- Cleaning In General (AREA)
- Cleaning By Liquid Or Steam (AREA)
Abstract
Description
Claims (8)
Priority Applications (1)
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CN201510020968.5A CN104607420B (zh) | 2015-01-15 | 2015-01-15 | 小尺寸kdp晶体表面磁-射流清洗装置及清洗工艺 |
Applications Claiming Priority (1)
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CN201510020968.5A CN104607420B (zh) | 2015-01-15 | 2015-01-15 | 小尺寸kdp晶体表面磁-射流清洗装置及清洗工艺 |
Publications (2)
Publication Number | Publication Date |
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CN104607420A CN104607420A (zh) | 2015-05-13 |
CN104607420B true CN104607420B (zh) | 2016-08-17 |
Family
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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CN201510020968.5A Expired - Fee Related CN104607420B (zh) | 2015-01-15 | 2015-01-15 | 小尺寸kdp晶体表面磁-射流清洗装置及清洗工艺 |
Country Status (1)
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CN (1) | CN104607420B (zh) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN106757346B (zh) * | 2016-12-19 | 2019-10-22 | 山东大学 | 一种保护水溶液生长晶体表面台阶的方法 |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002212786A (ja) * | 2001-01-17 | 2002-07-31 | Ebara Corp | 基板処理装置 |
JP2005191511A (ja) * | 2003-12-02 | 2005-07-14 | Dainippon Screen Mfg Co Ltd | 基板処理装置および基板処理方法 |
CN100541709C (zh) * | 2006-01-26 | 2009-09-16 | 大日本网目版制造株式会社 | 基板处理装置以及基板处理方法 |
JP2008153322A (ja) * | 2006-12-15 | 2008-07-03 | Dainippon Screen Mfg Co Ltd | 二流体ノズル、基板処理装置および基板処理方法 |
JP5058085B2 (ja) * | 2008-07-02 | 2012-10-24 | 東京エレクトロン株式会社 | 基板洗浄装置 |
JP5712061B2 (ja) * | 2011-06-16 | 2015-05-07 | 株式会社荏原製作所 | 基板処理方法及び基板処理ユニット |
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2015
- 2015-01-15 CN CN201510020968.5A patent/CN104607420B/zh not_active Expired - Fee Related
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CN104607420A (zh) | 2015-05-13 |
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Legal Events
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C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C53 | Correction of patent for invention or patent application | ||
CB03 | Change of inventor or designer information |
Inventor after: Liu Zengwen Inventor after: Xu Guoqiang Inventor after: Huang Chuanzhen Inventor after: Wang Jun Inventor after: Zhu Hongtao Inventor after: Liu Hanlian Inventor before: Liu Zengwen Inventor before: Huang Chuanzhen Inventor before: Wang Jun Inventor before: Zhu Hongtao Inventor before: Liu Hanlian Inventor before: Xu Guoqiang |
|
COR | Change of bibliographic data |
Free format text: CORRECT: INVENTOR; FROM: LIU ZENGWEN HUANG CHUANZHEN WANG JUN ZHU HONGTAO LIU HANLIAN XU GUOQIANG TO: LIU ZENGWEN XU GUOQIANG HUANG CHUANZHEN WANG JUN ZHU HONGTAO LIU HANLIAN |
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C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20160817 Termination date: 20180115 |
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CF01 | Termination of patent right due to non-payment of annual fee |