CN1046053A - Make the method for optical waveguide mask plate - Google Patents
Make the method for optical waveguide mask plate Download PDFInfo
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- CN1046053A CN1046053A CN 89101891 CN89101891A CN1046053A CN 1046053 A CN1046053 A CN 1046053A CN 89101891 CN89101891 CN 89101891 CN 89101891 A CN89101891 A CN 89101891A CN 1046053 A CN1046053 A CN 1046053A
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- optical waveguide
- mask plate
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Abstract
Make the method for optical waveguide mask plate, belong to the Micrometer-Nanometer Processing Technology field.The present invention adopts method of optics to make the optical waveguide mask plate, earlier former figure is decomposed, cast out the same unit figure, after the different units figure amplified by CAD, data are sent into picture generator, and production unit figure base plate, then base plate is dwindled on step and repeat camera and cause life size and be spliced into former figure, its nodal point number of optical waveguide mask plate that adopts this method to make can reduce by 1 to 2 order of magnitude, and is significant with the fiber waveguide device that contains complex figure to development low-loss optically waveguide device.
Description
The present invention relates to a kind of optics making sheet technology, belong to the Micrometer-Nanometer Processing Technology field.
The optical waveguide mask plate is the core of fiber waveguide device, two elongated black lines are arranged on mask plate, article two, between the black line passage, two broadening of passage, can connect optical fiber, light form with ripple in passage is propagated, so claim that this passage is an optical waveguide, interlude in optical waveguide is very thin, can control light wave.The feature of fiber waveguide device figure is that the size of length and width direction differs greatly, and is example with the monomode optical waveguide device, and its length breadth ratio is about 5000: 1, lines for a long 20mm, its width has only 4 μ m, and the corner of lines is very little, generally at 0.5 °～1.5 °.In order to reduce the transmission loss (TL) of light in waveguide, require the edge (being the inside edge of black line) of optical waveguide very smooth, corner can not have sudden change.The method of processing optical waveguide mask plate mainly is two kinds at present, and high-velocity electron beam exposure and picture generator are made.
The method that the high-velocity electrons exposure machine is made the optical waveguide mask plate is to utilize electron beam, the lamina membranacea that scribbles electron sensitive resist is carried out raster pattern point by point scanning form exposure figure, and the diameter of electron beam and step pitch size can directly influence the figure machining precision.The diameter of general electron beam is 0.5 μ m.When electron beam processing linear figure, its precision is no problem, but when processing oblique line bar, the edge of processed lines just can produce stepped appearance inevitably, step pitch when the height of ladder equals electron beam scanning, when for example doing 0.7 ° oblique line, from the figure that is made into survey ladder height H=0.4～0.5 μ m, ladder period L=40 μ m has 79 ladders approximately reaching on the oblique line of 3.78mm.Therefore light by the time cause very big loss.This just becomes the critical defect of present electron beam exposure method.
The method that so-called picture generator is made the optical waveguide mask plate is to adopt computer-aided design (CAD) and picture generator, by computer-aided design (CAD), the optical waveguide figure that needs are made converts the receptible serial data of picture generator to, these serial data general records are on computer magnetic tape, tape is contained on the picture generator, the computing machine of picture generator is partly read the data on the tape, and according to the instruction driving device and the opticator that are comprised in the data, template is exposed, generate the optical waveguide figure.Then template is developed, steps such as corrosion are made into the optical waveguide mask plate.Picture generator utilizes a rectangular light spot that template is exposed, and using one by one, rectangle is spliced into the figure that needs.In the lines corner, need two rectangle angulations, their joint must some be overlapping, and this lap will cause multiexposure, multiple exposure, forms overexposure, thereby developing, can make the lines chap in the corrosion process, produces node.In position, lines broadening part, the situation of a plurality of rectangle repeated exposure is also arranged, also can produce node in the broadening part.The height of surveying every limit node is 0.3～0.4 μ m.In addition,, in order to prevent the crack, also to have a bit overlappingly in splicing place of two rectangles, also node can occur at straight line portion.Therefore a lot of nodes just occurred in the lay the grain waveguide, these nodes have seriously influenced the quality of fiber waveguide device.
The objective of the invention is to improve the method for existing making optical waveguide mask plate, a kind of new method for making is provided, can produce the very smooth optical waveguide mask plate in corner, oblique line and broadening position, improve the quality of fiber waveguide device.
Formation of the present invention is when carrying out computer-aided design (CAD), earlier the former figure of optical waveguide mask plate is decomposed, former figure is divided into several unit, cast out the identical unit of figure, the figure of each different units is amplified back converting to by computer-aided design (CAD) have the serial data that picture generator can be accepted form, this serial data is input to picture generator, on photographic plate, make the different units figure that amplifies by picture generator, the photographic plate of the different units figure that has amplification is placed on the step and repeat camera, unit figure is contracted to former design size, then template is spliced exposure, on template, form complete optical waveguide figure, after develop, technologies such as corrosion are made the optical waveguide mask plate.
Accompanying drawing 1 is the optical waveguide mask plate part that makes of electron beam exposure method, has amplified 1,000 times;
Accompanying drawing 2 is the optical waveguide mask plate parts that make of picture generator, has amplified 1,000 times;
Accompanying drawing 3 is the synoptic diagram that produce repeated exposure when exposing with picture generator;
Accompanying drawing 4 is the optical waveguide mask plate parts that make of the inventive method, above two be rotation angle position, below two be that oblique line changes wide position, all put 1,000 times.
The invention will be further described below in conjunction with drawings and Examples.Present embodiment carries out as follows.
The first step is artificially decomposed the former design drawing of optical waveguide mask plate, is divided into some unit, analyzes each unit figure, and every kind of unit figure is got one, casts out the identical unit of other figures, and the figure of each different units is amplified back input computing machine.Each unit figure is numbered.Figure is input to computer method two kinds: a kind of is directly by key in data, and another kind is that these data demonstrate unit figure by computer-aided design (CAD) (CAD) on screen by the input of mouse type scaler.Inspection figure, consistent until figure with former design, then this graph data is left on the tape by tape memory.Treat that the whole designs of unit figure finish, and install to tape on the picture generator.What present embodiment adopted is the 3600F picture generator.Because be to adopt the 3600F picture generator, so the data layout on the tape must be the form that 3600F can read.
In second step, 3600F carries out unit figure and makes according to the data on the tape.Unit figure is produced on the photographic plate.The making unit figure that the back has obtained amplifying on photographic plate that finishes.It is pointed out that at this moment figure is exaggerated, but node not amplifying, still is 0.3～0.4 μ m.
In the 3rd step, the photographic plate that will have unit figure is put into step and repeat camera, and what present embodiment adopted is the 3696PR step and repeat camera.3696PR is contracted to former design size with unit figure, according to the numbering of unit figure, template is spliced exposure.Dimension of picture and node size are reduced together in the process of dwindling, and actual effect is that the node on the template is reduced.Enlargement factor is big more in CAD, and the multiple that node dwindles is also big more.But the graphic element that the big more 3600F of enlargement factor can hold is just few more, and it is more little to be equivalent to the visual angle, needs the unit number of division just many more.According to actual tests, enlargement factor is 5～10 times can satisfy actual needs, the wide 4 μ m of for example former lines, the high 0.4 μ m of node.The wide 40 μ m of lines after amplifying 10 times, the high 0.4 μ m of node is contracted to the wide 4 μ m of lines again, at this moment the high 0.04 μ m of node.Like this, the node in unit figure has just almost disappeared, as shown in Figure 4.When splicing, also exist the problem of repeated exposure, therefore when decomposing figure, must be selected in former figure cut-off rule the straight line coupling part of figure.Because straight line splicing repeated exposure zone is minimum.When splicing on 3696PR, because the degree of regulation of 3696PR is 0.1 μ m, the overlay region of coupling part can be controlled within the 0.1 μ m theoretically, and the height of node can not surpass 0.1 μ m yet.The node that produces when considering splicing, so the division unit number can not be too many, be according to the size of figure, shape is taken all factors into consideration.
The 4th step, the figure that generates on the template is tested, made amendment in undesirable place.Modification can be carried out on 3696PR, also can make amendment to photographic plate on 3600F, and the optical waveguide figure that generates on template meets the requirements.
The 5th step, with template develop, technology such as corrosion, make the optical waveguide mask plate at last.
Advantage of the present invention is owing to the method that has adopted optics is made the fiber waveguide mask plate, so the ladder that has produced when having eliminated with electron beam exposure machine making oblique line and lines broadening. Again owing to adopting unit figure to amplify, so eliminated the node that overexposure produces. Another advantage of the present invention is to splice owing to adopting former figure to decompose production unit again, so just complex figure has been oversimplified, thereby has been improved the ability that develops new fiber waveguide device, especially development low-loss optically waveguide device is had important meaning.
Claims (3)
1, a kind of method of making the optical waveguide mask plate, comprise by computer-aided design (CAD), convert the figure of optical waveguide to picture generator receptible serial data, picture generator generates the optical waveguide figure according to this serial data in the mask plate substrate, make the optical waveguide mask plate through overexposure, corrosion treatment again, it is characterized in that:
A, the former figure of optical waveguide mask plate is decomposed, be divided into several unit, cast out the identical unit of figure, the figure of each different units is amplified the back convert to by computer-aided design (CAD) and have the serial data that picture generator can be accepted form;
B, the serial data of the variant cell image that converts to by computer-aided design (CAD) is input to picture generator, on photographic plate, makes the different units figure that amplifies by picture generator;
C, the photographic plate of the different units figure that has amplification, be placed on the step and repeat camera, unit figure is contracted to former design size, then template is spliced exposure, on template, form complete optical waveguide figure.
2, the method for making optical waveguide mask plate as claimed in claim 1, the enlargement factor that it is characterized in that unit figure is 5～10.
3, the method for making optical waveguide mask plate as claimed in claim 1 is characterized in that the cut-off rule of former figure is selected in the straight line coupling part of figure.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 89101891 CN1018958B (en) | 1989-03-26 | 1989-03-26 | Photoconductive mask mfg. method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 89101891 CN1018958B (en) | 1989-03-26 | 1989-03-26 | Photoconductive mask mfg. method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1046053A true CN1046053A (en) | 1990-10-10 |
| CN1018958B CN1018958B (en) | 1992-11-04 |
Family
ID=4854456
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 89101891 Expired CN1018958B (en) | 1989-03-26 | 1989-03-26 | Photoconductive mask mfg. method |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN1018958B (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110109325A (en) * | 2018-02-01 | 2019-08-09 | 李冰 | A kind of splicing optical waveguide structure and preparation method thereof |
-
1989
- 1989-03-26 CN CN 89101891 patent/CN1018958B/en not_active Expired
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110109325A (en) * | 2018-02-01 | 2019-08-09 | 李冰 | A kind of splicing optical waveguide structure and preparation method thereof |
Also Published As
| Publication number | Publication date |
|---|---|
| CN1018958B (en) | 1992-11-04 |
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