CN104575251B - Single layer relief pattern Microlens anti-counterfeiting mark - Google Patents
Single layer relief pattern Microlens anti-counterfeiting mark Download PDFInfo
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- CN104575251B CN104575251B CN201310495595.8A CN201310495595A CN104575251B CN 104575251 B CN104575251 B CN 104575251B CN 201310495595 A CN201310495595 A CN 201310495595A CN 104575251 B CN104575251 B CN 104575251B
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- picture
- micro
- array
- microlens
- counterfeiting mark
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- G—PHYSICS
- G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
- G09F—DISPLAYING; ADVERTISING; SIGNS; LABELS OR NAME-PLATES; SEALS
- G09F3/00—Labels, tag tickets, or similar identification or indication means; Seals; Postage or like stamps
- G09F3/02—Forms or constructions
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B3/00—Simple or compound lenses
- G02B3/0006—Arrays
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Theoretical Computer Science (AREA)
- Credit Cards Or The Like (AREA)
- Holo Graphy (AREA)
- Diffracting Gratings Or Hologram Optical Elements (AREA)
Abstract
Microlens array figure and micro- picture and text array pattern are overlaped the present invention relates to a kind of, composition only has the Microlens anti-counterfeiting mark of one layer of relief pattern structure.The Microlens anti-counterfeiting mark of this single layer relief pattern structure, the not appearing picture under ordinary lamp and lantern illumination or natural light have anti-fake concealment, and special micro- picture and text amplification phenomenon and dynamic effect can be shown under point light source irradiation.Its structure novel is unique, and can directly be produced using existing laser holographic molding equipment and technique, product form multiplicity, and the scope of application is very wide.
Description
Technical field
The present invention relates to a kind of Microlens anti-counterfeiting marks more particularly to a kind of that microlens array is Chong Die with micro- picture and text array
Together, the Microlens anti-counterfeiting mark of the single layer relief pattern structure of composition.
Background technique
Have at present and use the anti-fake safety line with dynamic effect on the banknote of multiple countries, such as Sweden's version in 2006
1000 Kronas, 50000 won of banknotes of South Korea's distribution in 2010.Some companies in recent years, if hewlette-packard is also in its production
The anti-counterfeiting mark with dynamic effect is used on product.In these anti-fake safety lines and anti-counterfeiting mark, the image of amplification can root
Continuous dislocation is generated according to the variation of people's observation visual angle.Their essential structure is all by miniature convex lens array layer and miniature
The double-layer structure that the superposition of picture and text array layer is constituted, the distance between two layers are determined by the focal length parameter of lens.Its shortcoming
It is that the face type of miniature convex lens surface protrusion increases the thickness of anti-fake safety line and anti-counterfeiting mark.
It is disclosed in Chinese patent 201020143542.1,201220325232.0 using miniature binary phase lens
(also known as Fresnel zone lens) array replaces the Microlens anti-counterfeiting mark of miniature convex lens array production.Because binary phase is micro-
Lens belong to the planar lenses with relief surface structure, so being capable of the opposite thickness for reducing anti-counterfeiting mark.And it obtains
Micro- picture and text amplification effect and Dynamic Recognition feature and using miniature convex lens array production anti-fake safety line or anti-counterfeiting mark
It is identical.It is still micro-lens arrays layer and micro- picture and text array stack by the anti-counterfeiting mark that binary phase microlens array is constituted
Add the double-layer structure of composition, the distance between two layers are also determined by the focal length parameter of lens.
Summary of the invention
The present invention is directed to micro-lens arrays layer used by existing Microlens anti-counterfeiting mark and the superposition of micro- picture and text array layer
The double-layer structure of composition provides a kind of Microlens anti-counterfeiting mark with single layer relief pattern structure.This lenticule anti-counterfeiting label
Know the not appearing picture under ordinary lamp and lantern illumination or natural light, and micro- picture and text amplification phenomenon can be shown under point light source irradiation
And dynamic effect.
The technical solution adopted by the present invention to solve the technical problems is: first on computers by the microlens array of design
Figure and micro- picture and text array pattern overlap, and recycle microelectronics platemaking equipment by microlens array and micro- picture and text array
Overlapping figure is exposed on photoetching hectograph, and the photoresist mother matrix with relief surface structure is made after development.Then photoetching is utilized
Glue mother matrix completes production of the invention by having the manufacture craft of laser holographic anti counterfeiting label.
Microlens array in the present invention uses binary phase microlens array, also known as Fresnel zone microlens array.
There are two types of the arrangement modes of microlens array.One is what is provided in patent 201020143542.1 to arrange according to square mode
Microlens array.Another kind is the lenticule battle array arranged according to equilateral triangle mode provided in patent 201220325232.0
Column.The microlens array arrangement mode actually selected is determined when microlens array designs.
The arrangement mode of micro- picture and text array in the present invention is consistent with the arrangement mode of the microlens array of selection.Micro- picture and text
The unit size of array can be equal with the unit size of microlens array, can also be unequal but be close.
When microlens array figure in the present invention and micro- picture and text array pattern are overlapped, the horizontal directions of two figures (or
Vertical direction) angle a suitable angle is selected within the scope of 0 degree to 45 degree, to put micro- picture and text suitably
Greatly.This suitable angle needs to determine or be determined by experiment by calculating in advance.
Random speckle is filled on micro- picture and text, the contrast for the micro- picture and text being amplified can be increased.
Structure feature of the invention is the figure of only one layer relief surface structure, the concave-convex fluctuating very little of relief pattern,
Generally within 1 micron.Therefore the general thickness of anti-counterfeiting mark can accomplish very little, including basement membrane and Information Level
General thickness accomplishes 10 microns, has ultra-slim features.Graphic element in the present invention can be made larger, and such as 100 to 200
Micron, thus can be with micro- the picture and text pattern, such as number, character, Chinese character, logo etc. of comparison complexity.The present invention may be used also
To be fabricated to blocking film mark.These are all that the Microlens anti-counterfeiting mark of double-layer structure is difficult to.
Product of the invention has following observation identification feature:
1, the not appearing picture under ordinary lamp and lantern illumination or natural light, has anti-fake concealment；
2, the micro- picture and text array image being amplified can be shown under point light source (such as single led light source) irradiation, and
The micro- picture and text array image being amplified continuous moving with the translation of point light source, shows behavioral characteristics；
3, during point light source is close to or far from mark, micro- picture and text pattern has the phenomenon that continuously zooming.
The above observation identification feature is that the present invention is different from other anti-fake safety lines and the exclusive feature of anti-counterfeiting mark.
The invention has the advantages that the Microlens anti-counterfeiting mark of single layer relief pattern structure only has one layer of relief surface knot
The figure of structure has ultra-slim features, can be with micro- picture and text pattern of comparison complexity.And it is special to have exclusive observation identification
Sign, i.e. concealment under ordinary light source and the behavioral characteristics under point light source and continuously zooming phenomenon.Single layer relief pattern structure
Microlens anti-counterfeiting mark be that a kind of safety is very high, identify very convenient and have distinctive anti-counterfeiting mark.
Structure of the invention novel and unique, product form, which has, to be pasted mark, hot-stamping mark, Anti-fake packaging film, anti-fake tie rod, prevents
Pseudo- safety line etc., the scope of application is very wide, especially suitable for the anti-fake of paper money coin safety line, certificate, bank card, admission ticket etc., and it is each
Class high-grade goods and special article it is anti-fake.
Detailed description of the invention
Present invention will be further explained below with reference to the attached drawings and examples.
Fig. 1 is partial cross section's enlarged diagram of essential structure of the invention.
Fig. 2 is the microlens array schematic diagram Chong Die with micro- picture and text array of the embodiment of the present invention.
Specific embodiment
As shown in Figure 1,1 is transparent plastic basement membrane, 2 be the Information Level applied on the surface of transparent plastic basement membrane 1, and 3 are
The overlapping figure of the microlens array and micro- picture and text array with relief surface structure made on Information Level 2.
Embodiment: Fig. 2 is that a kind of binary phase microlens array used in the embodiment of the present invention and micro- picture and text array are (miniature
The array of text " good fortune ") partial enlargement diagram that overlaps.200 microns of focal length of micro-lens array, microlens array list
150 microns of elemental size.145 microns of array cell sizes of micro- picture and text " good fortune ", single " good fortune " word word are 80 microns high.Microlens array and
Micro- picture and text array is arranged using square mode, horizontal direction (or the vertical side of microlens array and micro- picture and text array after overlapping
To) angle be 5 degree.The overlay chart shape of this microlens array and micro- picture and text array is swashed at photoresist mother matrix, then through having
Light holographic anti-counterfeiting label manufacture craft produces aluminium film label adhering of the invention.
Claims (1)
1. single layer relief pattern Microlens anti-counterfeiting mark, it is characterized in that: by microlens array figure and micro- picture and text array pattern weight
It stacks, composition only has the Microlens anti-counterfeiting mark of one layer of relief pattern structure.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310495595.8A CN104575251B (en) | 2013-10-22 | 2013-10-22 | Single layer relief pattern Microlens anti-counterfeiting mark |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310495595.8A CN104575251B (en) | 2013-10-22 | 2013-10-22 | Single layer relief pattern Microlens anti-counterfeiting mark |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN104575251A CN104575251A (en) | 2015-04-29 |
| CN104575251B true CN104575251B (en) | 2018-12-04 |
Family
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201310495595.8A Active CN104575251B (en) | 2013-10-22 | 2013-10-22 | Single layer relief pattern Microlens anti-counterfeiting mark |
Country Status (1)
| Country | Link |
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| CN (1) | CN104575251B (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101913270B1 (en) * | 2016-12-20 | 2018-10-30 | 주식회사 미래기술연구소 | Manufacturing method of hologram for anti-counterfeit having arbitarary hypertext |
| CN108647975A (en) * | 2018-04-03 | 2018-10-12 | 王登顺 | Method for anti-counterfeit and application are precisely compared based on random sprinkling overlay image |
| CN108828700A (en) * | 2018-07-18 | 2018-11-16 | 中国科学院光电技术研究所 | It is a kind of based on microlens array and micrographics array can be along the preparation method for the motion graphics that a direction moves |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN201765751U (en) * | 2010-03-29 | 2011-03-16 | 侯德胜 | Microlens anti-counterfeiting mark |
| CN202631770U (en) * | 2012-07-06 | 2012-12-26 | 侯德胜 | Microlens array used for constituting microlens anti-counterfeiting mark |
| CN203503242U (en) * | 2013-10-22 | 2014-03-26 | 成都得迈科贸有限公司 | Micro lens anti-counterfeiting mark with single-layer embossed pattern |
| JP2014241595A (en) * | 2014-07-17 | 2014-12-25 | オリンパス株式会社 | Imaging apparatus |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101434176B (en) * | 2008-12-25 | 2012-11-07 | 中钞特种防伪科技有限公司 | Optical anti-counterfeiting element and product with the same |
-
2013
- 2013-10-22 CN CN201310495595.8A patent/CN104575251B/en active Active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN201765751U (en) * | 2010-03-29 | 2011-03-16 | 侯德胜 | Microlens anti-counterfeiting mark |
| CN202631770U (en) * | 2012-07-06 | 2012-12-26 | 侯德胜 | Microlens array used for constituting microlens anti-counterfeiting mark |
| CN203503242U (en) * | 2013-10-22 | 2014-03-26 | 成都得迈科贸有限公司 | Micro lens anti-counterfeiting mark with single-layer embossed pattern |
| JP2014241595A (en) * | 2014-07-17 | 2014-12-25 | オリンパス株式会社 | Imaging apparatus |
Non-Patent Citations (1)
| Title |
|---|
| 采用微光刻技术制作缩微文字和加密文字;侯德胜;《中国防伪》;20050731(第8期);第151-17页 * |
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| CN104575251A (en) | 2015-04-29 |
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